CN201035212Y - Crystal round examine optical microscope capable of providing multiple colour macro check light source - Google Patents

Crystal round examine optical microscope capable of providing multiple colour macro check light source Download PDF

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Publication number
CN201035212Y
CN201035212Y CNU2007200679817U CN200720067981U CN201035212Y CN 201035212 Y CN201035212 Y CN 201035212Y CN U2007200679817 U CNU2007200679817 U CN U2007200679817U CN 200720067981 U CN200720067981 U CN 200720067981U CN 201035212 Y CN201035212 Y CN 201035212Y
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China
Prior art keywords
light source
wafer
detection
optical microscope
macro check
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Expired - Lifetime
Application number
CNU2007200679817U
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Chinese (zh)
Inventor
陈亮
许俊
庄祈龙
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Semiconductor Manufacturing International Beijing Corp
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Semiconductor Manufacturing International Shanghai Corp
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Priority to CNU2007200679817U priority Critical patent/CN201035212Y/en
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Publication of CN201035212Y publication Critical patent/CN201035212Y/en
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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

The utility model discloses a wafer detection optical microscope which can provide multi-color macroscopic detection light sources. The prior water detection optical microscopes can only provide white light for macroscopic detection, which tends to neglect some defects on the wafer surface. The wafer detection optical microscope of the utility model comprises a macroscopic detection unit which conducts macroscopic detection to the wafer, a microscopic detection unit which conducts microscopic detection to the wafer, a wafer deliver mechanism used to deliver the wafer to the detection region and a control module which is used to control the parts to conduct wafer detection. Wherein, the macroscopic detection unit is provided with a macroscopic light source module which is used to provide macroscopic detection light source. The macroscopic light source module comprises a light source lamp, a light source output unit and a light source color selective unit which is used for users to select the color of the light source. The three parts are connected with each other. Wherein, the light source lamp of the macroscopic light source module is a multi-color lamp. The precision and reliability of macroscopic detection can be increased through using the wafer detection optical microscope of the utility model.

Description

A kind of wafer inspection optical microscope that polychrome macro check light source is provided
Technical field
The utility model relates to optical microscope, particularly a kind of wafer inspection optical microscope that polychrome macro check light source is provided.
Background technology
After semiconductor devices completes, need it to be carried out visual examination by the wafer inspection optical microscope, has the open defect that obviously can influence device quality to detect, described open defect comprises breakage, crackle, cut, attachment or pollution etc., and the inspection of described open defect is comprised macro check and micro.
Be used to provide macroscopical light source module of macro check that white light only is provided in the existing wafer inspection optical microscope, common wafer only just can be checked out the open defect on it under white light, but picture generates reflective liquid crystal (Liquid Crystal on Silicon is arranged, LCOS) wafer of element such as chip just easier discovery open defect under green glow only is difficult to guarantee that the open defect on the chip wafer is checked fully so only provide white light to carry out macro check.
The utility model content
The purpose of this utility model is to provide a kind of wafer inspection optical microscope that polychrome macro check light source is provided, and can improve the accuracy of macro check greatly by described wafer inspection optical microscope.
The purpose of this utility model is achieved in that a kind of wafer inspection optical microscope that polychrome macro check light source is provided, this optical microscope comprises the macro check unit that is used for wafer is carried out macro check, be used for wafer is carried out the micro unit of micro, being used to carry wafer to the wafer of inspection area carries mechanism and is used to control the macro check unit, the micro unit, wafer carries the control module that mechanism checks wafer, wherein, this macro check unit has the macroscopical light source module that is used to provide the macro check light source, this macroscopic view light source module comprises illuminator and is connected light source output unit on the illuminator, the illuminator of this macroscopic view light source module is a polychromatic light, this macroscopic view light source module comprises that also one is connected to the light source colour selected cell of illuminator, is used for selecting for use for the user color of illuminator.
In the wafer inspection optical microscope of above-mentioned provided polychrome macro check light source, this illuminator be light emitting diode (Light-Emitting Diode, LED).
In the wafer inspection optical microscope of above-mentioned provided polychrome macro check light source, this light source output unit is an optical fiber.
Only provide white light to carry out macro check with existing wafer inspection optical microscope and make open defect on some wafer be difficult to be detected and compare, provide polychromatic light to carry out macro check in the utility model, the user can select the light of different colours according to chips different on the wafer for use, can guarantee that so the wafer inspection optical microscope carries out the accuracy and the reliability of macro check.
Description of drawings
The wafer inspection optical microscope of polychrome macro check light source that provides of the present utility model is provided by following embodiment and accompanying drawing.
Fig. 1 is the block scheme that the wafer inspection optical microscope of polychrome macro check light source is provided of the present utility model;
Fig. 2 is the block scheme of macroscopical light source module among Fig. 1.
Embodiment
Below will be described in further detail the wafer inspection optical microscope of polychrome macro check light source that provides of the present utility model.
Referring to Fig. 1, the wafer inspection optical microscope 1 of polychrome macro check light source that provides of the present utility model comprises that macro check unit 10, micro unit 11, wafer carry mechanism 12 and control module 13.
Macro check unit 10 is used to carry out the macro check of wafer, and it comprises macroscopical light source module 100 and macro check platform 101.Macroscopic view light source module 100 is used to provide the light source of macro check.Macro check platform 101 is used to put wafer and carries out macro check, and it is rotated under the rayed that macroscopical light source module 100 is provided, and for multi-angle wafer is carried out macro check.
Micro unit 11 is used to carry out the micro of wafer.
Wafer carries mechanism 12 and is used to carry wafer to the inspection area, and when carrying out macro check, wafer carries mechanism 12 wafer is carried on the macro check platform 101, and when carrying out micro, wafer carries mechanism 12 wafer is carried to micro unit 11.
Control module 13 is used to control macro check unit 10, micro unit 11, wafer and carries 12 pairs of wafers of mechanism and carry out macro check and micro.
Referring to Fig. 2, above-mentioned macroscopical light source module 100 comprises illuminator 100a, light source output unit 100b and light source colour selected cell 100c, wherein, described illuminator 100a is a polychromatic light, described light source output unit 100b is connected on the illuminator 100a, described light source colour selected cell 100c is connected on the illuminator 100a, is used for selecting for use for the user color of illuminator 100a.Preferable described illuminator 100a can be embodied as multicolor luminous diode, and described light source output unit 100b can be embodied as optical fiber.
The process of checking by 1 pair of wafer of wafer inspection optical microscope that polychrome macro check light source is provided of the present utility model below will be described in detail in detail: at first, carry mechanism 12 by wafer wafer is carried on the macro check platform 101; Then, the light source 100a that selects the chip of examining to use by light source colour selected cell 100c; Then, 101 rotations of macro check platform are carried out multi-faceted macro check to the inspection wafer for the user under the light that light source 100a is provided; Carrying mechanism 12 by wafer afterwards is carried to micro unit 11 with wafer and carries out micro.
In sum, the utility model provides polychromatic light to carry out macro check, and the user can select the light of different colours according to different chips for use, can guarantee that so the wafer inspection optical microscope carries out the accuracy and the reliability of macro check.

Claims (3)

1. wafer inspection optical microscope that polychrome macro check light source can be provided, this optical microscope comprises the macro check unit that is used for wafer is carried out macro check, be used for wafer is carried out the micro unit of micro, being used to carry wafer to the wafer of inspection area carries mechanism and is used to control the macro check unit, the micro unit, wafer carries the control module that mechanism checks wafer, wherein, this macro check unit has the macroscopical light source module that is used to provide the macro check light source, this macroscopic view light source module comprises illuminator and is connected light source output unit on the illuminator, it is characterized in that, the illuminator of this macroscopic view light source module is a polychromatic light, this macroscopic view light source module comprises that also one is connected to the light source colour selected cell of illuminator, is used for selecting for use for the user color of illuminator.
2. the wafer inspection optical microscope that polychrome macro check light source is provided as claimed in claim 1 is characterized in that this illuminator is a light emitting diode.
3. the wafer inspection optical microscope that polychrome macro check light source is provided as claimed in claim 1 is characterized in that this light source output unit is an optical fiber.
CNU2007200679817U 2007-03-20 2007-03-20 Crystal round examine optical microscope capable of providing multiple colour macro check light source Expired - Lifetime CN201035212Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2007200679817U CN201035212Y (en) 2007-03-20 2007-03-20 Crystal round examine optical microscope capable of providing multiple colour macro check light source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2007200679817U CN201035212Y (en) 2007-03-20 2007-03-20 Crystal round examine optical microscope capable of providing multiple colour macro check light source

Publications (1)

Publication Number Publication Date
CN201035212Y true CN201035212Y (en) 2008-03-12

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101685786B (en) * 2008-09-26 2011-06-01 上海华虹Nec电子有限公司 Method for automatically monitoring peripheral deburring and flaw of silicon slice by using optical microscope
CN103604812A (en) * 2013-10-23 2014-02-26 上海华力微电子有限公司 Multipoint positioning method for wafer macroscopic defect
CN105081560A (en) * 2014-05-16 2015-11-25 灿美工程股份有限公司 Defect observation device and laser processing equipment containing defect observation device
CN105204377A (en) * 2014-06-18 2015-12-30 上海华力微电子有限公司 Method for improving product standard
CN109192673A (en) * 2018-08-27 2019-01-11 苏州精濑光电有限公司 A kind of wafer detection method
CN112858343A (en) * 2021-02-02 2021-05-28 西安中科微星光电科技有限公司 Multifunctional silicon-based liquid crystal chip online detection system and method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101685786B (en) * 2008-09-26 2011-06-01 上海华虹Nec电子有限公司 Method for automatically monitoring peripheral deburring and flaw of silicon slice by using optical microscope
CN103604812A (en) * 2013-10-23 2014-02-26 上海华力微电子有限公司 Multipoint positioning method for wafer macroscopic defect
CN105081560A (en) * 2014-05-16 2015-11-25 灿美工程股份有限公司 Defect observation device and laser processing equipment containing defect observation device
CN105204377A (en) * 2014-06-18 2015-12-30 上海华力微电子有限公司 Method for improving product standard
CN109192673A (en) * 2018-08-27 2019-01-11 苏州精濑光电有限公司 A kind of wafer detection method
CN109192673B (en) * 2018-08-27 2021-09-17 苏州精濑光电有限公司 Wafer detection method
CN112858343A (en) * 2021-02-02 2021-05-28 西安中科微星光电科技有限公司 Multifunctional silicon-based liquid crystal chip online detection system and method
CN112858343B (en) * 2021-02-02 2021-11-16 西安中科微星光电科技有限公司 Multifunctional silicon-based liquid crystal chip online detection system and method

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C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING

Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

Effective date: 20130318

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING

TR01 Transfer of patent right

Effective date of registration: 20130318

Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone

Patentee after: Semiconductor Manufacturing International (Beijing) Corporation

Address before: 201203 No. 18 Zhangjiang Road, Shanghai

Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20080312