CN1987312A - Steam drying system and its water draining device and method - Google Patents
Steam drying system and its water draining device and method Download PDFInfo
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- CN1987312A CN1987312A CN 200510111679 CN200510111679A CN1987312A CN 1987312 A CN1987312 A CN 1987312A CN 200510111679 CN200510111679 CN 200510111679 CN 200510111679 A CN200510111679 A CN 200510111679A CN 1987312 A CN1987312 A CN 1987312A
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Abstract
A steam drying system is composed of a steam drying bath and a water draining unit. Said water draining unit consists of draining tube, channel switching unit, the first and the second draining channels, and a control unit for controlling said channel switching unit to selectively connecting the draining tube with the first or the second draining channel. Its draining method features that the DIW in system is respectively drained according to the system state for reclaiming part of DIW.
Description
Technical field
The wafer that the present invention relates in the ic manufacturing process cleans and dry technology, especially relates to a kind of steam drying system and drainage arrangement thereof and method.
Background technology
Because each assembly and line are quite fine in the integrated circuit, therefore in the manufacture process,, be easy to cause the damage of circuit function in the chip if suffer the pollution of grit, metal, form short circuit or the formation that causes the inefficacy of integrated circuit and influence geometric properties such as open circuit.Therefore in manufacturing process except will getting rid of the external pollution source, a lot of manufacturing steps of integrated circuit are as all needing to carry out wet-cleaning or dry method cleaning after the cmp.
(Chemical mechanical polishing CMP) is a kind of processing procedure of planarization to cmp, removes the film of substrate surface by chemical reaction and mechanical lapping, and makes substrate surface more level and smooth, smooth.CMP also is applied to removing substrate surface metal connecting line, dielectric layer, barrier layer, etching stopping layer and protective layer etc.
After cmp, need clean wafer.This is because after grinding, has a large amount of abrasive grains and some other residue and stays on the wafer, and these can harm follow-up operation, influence the yield of wafer, must wash.
At present, general with cleaning agent wafer the cleaning earlier handled wafer with deionized water (DIW) subsequently.After with the washed with de-ionized water wafer, utilize dry run to remove the moisture of wafer surface again.
Dry method can be divided into three kinds: Spin Dryer, utilize centrifugal force that the moisture content of wafer surface is removed; Maragoni Dryer utilizes surface tension that the moisture content of wafer surface is removed; IPA Vapor Dryer utilizes IPA (isopropyl alcohol, Isopropyl Alcohol) and water to be total to molten principle the moisture content of wafer surface is removed.
IPA Vapor Dryer is a method commonly used at present, and its step comprises: wafer enters steam drying groove (Vapor Dryer Tank); Add water and cover wafer; Spray IPA steam forms the IPA thin layer at the water surface in the steam drying groove; Slowly mention wafer (or draining reduction horizontal plane); Utilize the water on the surface tension principle effect removal wafer, continuing simultaneously provides IPA steam; Wafer is mentioned (draining or water have been arranged then) on the water surface, at last with heated nitrogen (or decompression simultaneously) drying.
Seeing also Fig. 1, is a kind of schematic diagram (No. 03115530.8 reference of Chinese patent) of steam drying system of prior art.
Steam drying system comprises wafer steam drying groove 2, wherein holds wafer and carries device 3, and this wafer carries and have a plurality of grooves on the device 3 (figure does not show) to carry a plurality of wafers 5; Steam generator 6, it is arranged on steam drying groove 2 tops, contains the nitrogen of IPA steam in order to generation; Heater 7 contains the nitrogen of IPA in order to heating; Tube connector 8, it is connected 2 of steam generator 6 and steam drying grooves, to transmit the steam that produced to steam drying groove 2; With delivery pipe 9, it is arranged on steam drying groove 2 bottoms, with the discharging steam.
This steam drying system also comprises deionized water supply section (figure does not show) and deionized water discharge section, is respectively applied for supplying deionized water or discharge deionized water wherein in steam drying groove 2.
The course of work of the steam drying system of the prior art is as described below: in steam drying groove 2, the wafer that a plurality of wafer 5 vertical being carried on are had a plurality of grooves carries on the device 3, then with deionized water (DIW) clean wafers.Then, transmit contain isopropyl alcohol (IPA) steam nitrogen to chip steam drying groove 2, to remove on wafer 5 and at the moisture content on steam drying groove 2 inner surfaces.The nitrogen that contains the IPA steam in transmission is to steam drying groove after 2 a period of times, transmit heated nitrogen to the steam drying groove 2 with evaporation IPA with make wafer 5 dryings.Then, will contain the nitrogen of IPA via outside the delivery pipe 9 exhaust steam dry slots 2.After finishing above-mentioned steps, wafer 5 is shifted out from steam drying groove 2, to carry out other subsequent treatment of wafer.
But there are some defectives in the steam drying system of the prior art: can cause the waste of DIW, increase the cost of processing of wafers.This is because meeting DIW without interruption keeps certain humidity in the steam drying system, and plays the effect of cleaning steam drying groove and corresponding pipeline.When the moist wafer of this steam drying system, the DIW in the steam drying groove can constantly overflow side by side to the bottom; Behind this steam drying system drying crystal wafer, steam can be discharged from delivery pipe, and the DIW in the steam drying groove also can discharge additional again then DIW.Therefore, must cause the waste of the DIW when the steam drying system free time (Idle).
In view of this, need improve the draining mechanism of the steam drying groove of steam drying system.
Summary of the invention
At above-mentioned defective, the problem to be solved in the present invention provides a kind of steam drying system and drainage arrangement and method, according to the state of system wherein DIW is discharged respectively, realizes the recycling of part DIW, reduce the consumption of DIW, improve the wafer cost benefit.
In order to address the above problem, the technical solution used in the present invention is: a kind of steam drying system is provided, comprises steam drying groove, delivery pipe; Also comprise:
Access switching unit, its first end is connected in this delivery pipe, and the fluid that is used for self-discharging pipe in future is shunted;
First discharge-channel is connected in second end of this access switching unit;
Second discharge-channel is connected in the 3rd end of this access switching unit;
Control module is used for controlling this access switching unit according to the state generation control signal of this steam drying system, and selectivity makes delivery pipe be communicated with first discharge-channel or second discharge-channel.
Preferably, described first discharge-channel is communicated with the deionized water feed path of this steam drying groove; Described second discharge-channel is connected to Waste Water Treatment.
Preferably, described first discharge-channel is connected to recovery and processing system; Described second discharge-channel is connected to Waste Water Treatment.
Preferably, when steam drying system was in idle condition, first end of access switching unit and the path between second end were opened, and closed the path between its first end and the 3rd end; When steam drying system was in running status, first end of access switching unit and the path between the 3rd end were opened, and closed the path between its first end and second end.
Preferably, described access switching unit is an electric T-shaped valve.
Preferably, this control module comprises:
The detection signal input is used to receive at steam drying system and detects the detection signal that is produced;
Processing unit is used for described detection signal is analyzed, and generates control signal corresponding and output according to the residing state of steam drying system;
The control signal output is used for exporting described control signal to access switching unit.
The drainage arrangement of steam drying system provided by the invention comprises delivery pipe; Also comprise:
Access switching unit, its first end is connected in this delivery pipe, and the fluid that is used for self-discharging pipe in future is shunted;
First discharge-channel is connected in second end of this access switching unit;
Second discharge-channel is connected in the 3rd end of this access switching unit;
Control module is used for controlling this access switching unit according to the state generation control signal of this steam drying system, and selectivity makes delivery pipe be communicated with first discharge-channel or second discharge-channel.
The water discharge method of steam drying system provided by the invention comprises step:
1) receives the detection signal that steam drying system is detected generation;
2) this detection signal is analyzed, according to the state generation control signal corresponding of steam drying system;
3) fluid of steam drying system being discharged according to this control signal is shunted: the deionized water when making that steam drying system is in idle condition enters first discharge-channel; Making has the deionized water of IPA steam to enter second discharge-channel mixing when steam drying system is in running status.
Preferably, described step 3) realizes by electric T-shaped valve.
Preferably, also comprise after the described step 3): the deionized water that enters first discharge-channel directly is back to steam drying system and carries out cycling and reutilization, perhaps through recycling back recycling.
Compared with prior art, the invention has the beneficial effects as follows: owing to the invention provides a kind of novel draining mechanism, its state according to steam drying system is the discharge-channel that deionized water is selected in idle (Idle) or operation (Run), thereby the deionized water in the time of can be with idle condition carries out cycling and reutilization, reduce the consumption of DIW effectively, improve the wafer cost benefit.
Description of drawings
Fig. 1 is a kind of schematic diagram of steam drying system of prior art;
Fig. 2 is the schematic diagram of an embodiment of steam drying system of the present invention;
Fig. 3 is the schematic diagram of control module shown in Figure 2;
Fig. 4 is the schematic diagram of triple valve shown in Figure 2;
Fig. 5 is the schematic diagram of another embodiment of steam drying system of the present invention;
Fig. 6 is the flow chart of the water discharge method of steam drying system of the present invention.
The specific embodiment
Seeing also Fig. 2, is the schematic diagram of an embodiment of steam drying system of the present invention.
This steam drying system comprises steam drying groove 110, delivery pipe 120, triple valve 130, first discharge-channel 140, second discharge-channel 150 and control module 160.
This steam drying groove 110 is used for bearing wafer (figure does not show), provides the withering space of wafer after cleaning, and wafer accommodating in steam drying groove 110 received admittedly and can be adopted multiple prior art to realize that this does not give unnecessary details.
This steam drying groove 110 has deionized water feed path 111, is used to receive the injection of deionized water.
This delivery pipe 120 is connected in the bottom of steam drying groove 110, the deionized water that is used for exhaust steam dry slot 110 comprises the deionized water that IPA steam is arranged that mixes of 110 kinds of discharges of steam drying groove when steam drying system is in deionized water that the free time overflows in the steam drying groove 110 during (Idle) state and steam drying system and is in operation (Run) state.
First end of triple valve 130 is connected in these delivery pipe 120, the second ends and is connected in first discharge-channel, 140, the three ends and is connected in second discharge-channel 150.Triple valve 130 is used in the future the fluid of self-discharging pipe 120 and shunts: make the deionized water when steam drying system is in idle condition enter first discharge-channel 140, and mix the deionized water that IPA steam arranged of steam drying system when being in running status enters second discharge-channel 150.
First discharge-channel 140 is communicated with the deionized water feed path 111 of this steam drying groove 110, realizes the cycling and reutilization of deionized water.
150 of second discharge-channels are connected to wastewater treatment center (figure does not show), emit after program is according to the rules handled.
In addition, this steam drying system comprises that also IPA supplies with part (figure does not show), is used for supplying IPA steam and nitrogen, and this part can adopt multiple prior art to realize, for example, adopts IPA as shown in Figure 1 to supply with part, and this does not give unnecessary details.
See also Fig. 3, in the present embodiment, this control module 160 comprises detection signal input 161, processing unit 162 and control signal output 163.
Wherein, detection signal input 161 is used to receive at steam drying system and detects the detection signal that is produced and send processing unit 162 to.
162 pairs of described detection signals of processing unit are analyzed, and generate corresponding triple valve control signal and output according to the residing state of steam drying system.
163 of control signal outputs export described control signal to triple valve 130 to realize the control to triple valve 130.
Need to prove that the detection signal that detection signal input 161 receives can be the detection signal that detector that existing steam drying system has itself produces.Certainly, can set up new detecting unit (figure does not show) yet and come the steam detection system is detected in steam drying system of the present invention, this does not give unnecessary details.
Described detection signal can be the multiple signal that can be used for differentiating the state of steam drying system, for example, can be that IPA supplies with the switching-on and switching-off state of part or the concentration of IPA steam etc.
See also Fig. 4, in the present embodiment, this triple valve 130 is electric three passes shunting valves, is used for shunting according to the fluid of delivery pipe 120 being discharged from the control signal of control module 160.
In addition, the performance for further sophisticated systems can also be provided with spring reset and manual control function in triple valve 130.
Seeing also Fig. 5, is the schematic diagram of the steam drying system of the second embodiment of the present invention.
This embodiment and first embodiment are roughly the same.Steam drying system comprises that steam drying groove 110, delivery pipe 120, triple valve 130, first discharge-channel 140, second discharge-channel 150 and control module 160, IPA supply with part (figure does not show).
This steam drying groove 110 is used for bearing wafer (figure does not show), provides the withering space of wafer after cleaning.
This delivery pipe 120 is connected in the bottom of steam drying groove 110, is used for the deionized water of exhaust steam dry slot 110.
First end of triple valve 130 is connected in these delivery pipe 120, the second ends and is connected in first discharge-channel, 140, the three ends and is connected in second discharge-channel 150.Triple valve 130 is used in the future the fluid of self-discharging pipe 120 and shunts: make the deionized water when steam drying system is in idle condition enter first discharge-channel 140, and mix the deionized water that IPA steam arranged of steam drying system when being in running status enters second discharge-channel 150.
150 of second discharge-channels are connected to Waste Water Treatment (figure does not show), emit after program is according to the rules handled.
What this embodiment was different with first embodiment is,
First discharge-channel 140 directly is not communicated with the deionized water feed path (figure does not show) of this steam drying groove 110, but is connected to deionized water recovery and processing system (figure does not show), carries out recycling after certain recycling process.
Seeing also Fig. 6, is the flow chart of steam drying system of the present invention when carrying out draining.
Step S610 receives the detection signal that steam drying system is detected generation;
Step S620 analyzes this detection signal, according to the state generation control signal corresponding of steam drying system;
Step S630, shunt according to the fluid that this control signal is discharged the steam drying groove: the deionized water when making that steam drying system is in idle condition enters first discharge-channel; Making has the deionized water of IPA steam to enter second discharge-channel mixing when steam drying system is in running status.
Wherein, among the described step S630, realize shunting by the electric three passes shunting valve.Specifically: when steam drying system was in idle condition, the control triple valve was opened the path between its first end and second end, and closes the path between its first end and the 3rd end, makes deionized water enter first discharge-channel from delivery pipe; When steam drying system was in running status, the control triple valve was opened the path between its first end and the 3rd end, and closes the path between its first end and second end, makes that mixing the deionized water that IPA is arranged enters second discharge-channel from delivery pipe.
In addition, the deionized water that enters first discharge-channel can directly be back to the steam drying groove and carry out cycling and reutilization, also can be through recycling after certain recycling.
In sum, core concept of the present invention is improved the draining mechanism of steam drying system.Novel drainage arrangement is provided in steam drying system, drainage arrangement comprises access switching unit, control module and drainage channel, thereby the deionized water that different conditions is discharged is down shunted, and realizes the recycling of part DIW, reduce the consumption of DIW, improve the wafer cost benefit.
The above only is a preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (15)
1. a steam drying system comprises steam drying groove, delivery pipe; It is characterized in that, also comprise:
Access switching unit, its first end is connected in this delivery pipe, and the fluid that is used for self-discharging pipe in future is shunted;
First discharge-channel is connected in second end of this access switching unit;
Second discharge-channel is connected in the 3rd end of this access switching unit;
Control module is used for controlling this access switching unit according to the state generation control signal of this steam drying system, and selectivity makes delivery pipe be communicated with first discharge-channel or second discharge-channel.
2. steam drying system as claimed in claim 1 is characterized in that, described first discharge-channel is communicated with the deionized water feed path of this steam drying groove; Described second discharge-channel is connected to Waste Water Treatment.
3. steam drying system as claimed in claim 1 is characterized in that, described first discharge-channel is connected to recovery and processing system; Described second discharge-channel is connected to Waste Water Treatment.
4. steam drying system as claimed in claim 1 is characterized in that, when steam drying system was in idle condition, first end of access switching unit and the path between second end were opened, and closed the path between its first end and the 3rd end; When steam drying system was in running status, first end of access switching unit and the path between the 3rd end were opened, and closed the path between its first end and second end.
5. steam drying system as claimed in claim 1 is characterized in that described access switching unit is an electric T-shaped valve.
6. steam drying system as claimed in claim 1 is characterized in that, this control module comprises:
The detection signal input is used to receive at steam drying system and detects the detection signal that is produced;
Processing unit is used for described detection signal is analyzed, and generates control signal corresponding and output according to the residing state of steam drying system;
The control signal output is used for exporting described control signal to access switching unit.
7. the drainage arrangement of a steam drying system comprises delivery pipe, it is characterized in that, also comprises:
Access switching unit, its first end is connected in this delivery pipe, and the fluid that is used for self-discharging pipe in future is shunted;
First discharge-channel is connected in second end of this access switching unit;
Second discharge-channel is connected in the 3rd end of this access switching unit;
Control module is used for controlling this access switching unit according to the state generation control signal of this steam drying system, and selectivity makes delivery pipe be communicated with first discharge-channel or second discharge-channel.
8. the drainage arrangement of steam drying system as claimed in claim 7 is characterized in that, described first discharge-channel is communicated with the deionized water feed path of this steam drying system; Described second discharge-channel is connected to Waste Water Treatment.
9. the drainage arrangement of steam drying system as claimed in claim 7 is characterized in that, described first discharge-channel is connected to recovery and processing system; Described second discharge-channel is connected to Waste Water Treatment.
10. the drainage arrangement of steam drying system as claimed in claim 7, it is characterized in that, when steam drying system was in idle condition, first end of access switching unit and the path between second end were opened, and closed the path between its first end and the 3rd end; When steam drying system was in running status, first end of access switching unit and the path between the 3rd end were opened, and closed the path between its first end and second end.
11. the drainage arrangement of steam drying system as claimed in claim 7 is characterized in that, described access switching unit is an electric T-shaped valve.
12. the drainage arrangement of steam drying system as claimed in claim 7 is characterized in that, this control module comprises:
The detection signal input is used to receive at steam drying system and detects the detection signal that is produced;
Processing unit is used for described detection signal is analyzed, and generates control signal corresponding and output according to the residing state of steam drying system;
The control signal output is used for exporting described control signal to access switching unit.
13. the water discharge method of a steam drying system is characterized in that, comprises step:
1) receives the detection signal that steam drying system is detected generation;
2) this detection signal is analyzed, according to the state generation control signal corresponding of steam drying system;
3) fluid of steam drying system being discharged according to this control signal is shunted: the deionized water when making that steam drying system is in idle condition enters first discharge-channel; Making has the deionized water of IPA steam to enter second discharge-channel mixing when steam drying system is in running status.
14. the water discharge method of steam drying system as claimed in claim 13 is characterized in that, described step 3) realizes by electric T-shaped valve.
15. the water discharge method of steam drying system as claimed in claim 13, it is characterized in that, also comprise after the described step 3): the deionized water that enters first discharge-channel directly is back to steam drying system and carries out cycling and reutilization, perhaps through recycling back recycling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101116792A CN100449700C (en) | 2005-12-19 | 2005-12-19 | Steam drying system and its water draining device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101116792A CN100449700C (en) | 2005-12-19 | 2005-12-19 | Steam drying system and its water draining device and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1987312A true CN1987312A (en) | 2007-06-27 |
| CN100449700C CN100449700C (en) | 2009-01-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005101116792A Expired - Fee Related CN100449700C (en) | 2005-12-19 | 2005-12-19 | Steam drying system and its water draining device and method |
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| CN (1) | CN100449700C (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI243261B (en) * | 1996-06-14 | 2005-11-11 | Seiko Epson Corp | Pull-up drying method and apparatus |
| JPH10321589A (en) * | 1997-05-06 | 1998-12-04 | Motorola Inc | Method for removing residue from wafer |
| JPH11265873A (en) * | 1998-03-17 | 1999-09-28 | Dainippon Screen Mfg Co Ltd | Substrate drying equipment and substrate treating equipment using the same |
| JP2002085943A (en) * | 2000-09-14 | 2002-03-26 | Sony Corp | Wafer dryer |
| US6907890B2 (en) * | 2002-02-06 | 2005-06-21 | Akrion Llc | Capillary drying of substrates |
| JP2004356356A (en) * | 2003-05-29 | 2004-12-16 | Oki Electric Ind Co Ltd | Method for judging completion of cleaning and cleaning apparatus |
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2005
- 2005-12-19 CN CNB2005101116792A patent/CN100449700C/en not_active Expired - Fee Related
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| CN100449700C (en) | 2009-01-07 |
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Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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Granted publication date: 20090107 Termination date: 20181219 |
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