CN1955089A - Substrate conveying device and substrate processing device containing the same - Google Patents
Substrate conveying device and substrate processing device containing the same Download PDFInfo
- Publication number
- CN1955089A CN1955089A CNA2006101499544A CN200610149954A CN1955089A CN 1955089 A CN1955089 A CN 1955089A CN A2006101499544 A CNA2006101499544 A CN A2006101499544A CN 200610149954 A CN200610149954 A CN 200610149954A CN 1955089 A CN1955089 A CN 1955089A
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- China
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- mentioned
- upper plate
- side buffer
- buffer
- drg
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
Abstract
The present invention relates to a basal plate conveying device comprising a bottom plate glidingly arranged on the frame track; an upper plate arranged above the bottom plate and supporting the basal plate thereon; the connecting part of the upper plate is rotatablely connected to the bottom plate; a rotation limiting device for limiting the radius of rotation of the upper plate with a given region.
Description
Technical field
The present invention relates to a kind of base board delivery device, more specifically, relate to a kind of process structural improvement, rotation easily under the state of bearing substrate, thereby the base board delivery device of raising substrate transport efficiency.
Background technology
Be generally used for flat-panel monitor (FPD; Flat Panel Display), semiconductor wafer, Liquid Crystal Display (LCD) (LCD), mask plate,, are cleaned after processes such as etching, striping, rinsing by a series of processing line with the substrate of glass etc. again.
Such processing substrate line generally includes, and is used for the upset portion of substrate overturn; Be used for accepting substrate, again it fed to the loader of the portion of cleaning from upset portion; Be used for cleaning successively the clean portion of the foreign matter on the substrate; The drying section that is used for dry substrate; Be used to unload the unloading machine of carried base board.
Handle line for aforesaid substrate, the feedway to each operation conveying substrate is its key factor effectively.
That is, these feedways need sometimes, and the substrate that will accept from a last operation continues perhaps to carry to other directions (for example, vertical direction or reversing sense) along equidirectional to subsequent processing.
But aforesaid existing feedway all has some setbacks because of the linking between a last operation and subsequent processing, the shortcoming that existence can not free conversion baseplate throughput direction.
That is, when the substrate of being accepted to subsequent processing when equidirectional is carried, can carry operation smoothly, but, when direction being converted to vertical or reversing sense, configuration upset portion in addition.
And these problems along with the The Enlargement Tendency of substrate seems more outstanding, make the conveying of substrate be difficult to carry out more, thereby influence the quality of substrate, cause the increase of substandard products.
Summary of the invention
The present invention does in view of the above problems, and it is a kind of that its purpose is to provide, through structural improvement, can under the state of bearing substrate, rotate easily, thus the base board delivery device of raising substrate transport efficiency.
To achieve these goals, base board delivery device of the present invention comprises: can be installed on the base plate on the frame rail glidingly; Be installed on above-mentioned base plate above, and the upper plate of bearing substrate in the above; The link that rotatably connects above-mentioned upper plate and base plate; Radius of rotation restriction swiveling limitation mechanism within the specific limits with above-mentioned upper plate.
Base board delivery device involved in the present invention by structural improvement, can rotate under the state of bearing substrate easily, thereby has improved the transport efficiency of substrate.
Description of drawings
Fig. 1 is the block diagram that possesses the substrate board treatment of base board delivery device of the present invention.
Fig. 2 is the stereo amplification figure of feedway among Fig. 1.
Fig. 3 is the three-dimensional exploded view of feedway among Fig. 2.
Fig. 4 is the lateral plan of feedway among Fig. 2.
Fig. 5 is the stereo amplification figure of the base plate of feedway among Fig. 3.
Fig. 6 is the view of upper plate on reference position of feedway among Fig. 3.
Fig. 7 is that the upper plate of feedway among Fig. 3 is being that benchmark is to the postrotational view of anticlockwise direction with the line of centers.
Fig. 8 is that the upper plate of feedway among Fig. 3 stops at the locational view of 90 degree after the anticlockwise direction rotation.
The specific embodiment
Below, explain the related feedway that is used for conveying substrate of embodiments of the invention with reference to accompanying drawing.
Base board delivery device proposed by the invention is applicable to general processing substrate line, describes with as shown in Figure 1 cascade type processing substrate line below.
As shown in Figure 1, possess the processing substrate line of base board delivery device of the present invention, comprising: framework 3; Can be installed on glidingly on the track r of said frame 3, send into side and sending and do back and forth movement between side, while supporting substrate G and the feedway that is used for conveying substrate (Transfer) 5 that enables to rotate freely; The side vertical transport portion 7 that sends into that after above-mentioned feedway 5 is accepted substrate G, descends; The processing unit 11 that is used for treatment substrate G; Be arranged at and handle sending into side and sending side of unit 11, be used for first delivery section 9 and second delivery section 13 of conveying substrate G; Treated substrate G is delivered to once more the side vertical transport portion 15 that sends of feedway 5.
Therefore, after carrying the substrate G that comes to be placed in feedway 5 top by a last operation, feedway 5 just marches forward along track r under the state of carrying this substrate G, and substrate G is delivered to sends into side vertical transport portion 7, perhaps retreats to sending side vertical transport portion 15 and accepts substrate G.
In addition, in such substrate transportation process, can be as required, by the throughput direction of rotationally conveying device 5 conversion baseplate G.
To shown in Figure 4, above-mentioned feedway 5 specifically can comprise: can be installed on the base plate 20 on the framework 3 track r glidingly as Fig. 2; Be rotatably mounted in the top of above-mentioned base plate 20 and move therewith, and be used for the upper plate 22 of bearing substrate G in the above; The link 30 that rotatably connects above-mentioned upper plate 22 and base plate 20; Anglec of rotation restriction swiveling limitation mechanism within the specific limits with above-mentioned upper plate 22.
Have in the feedway 5 of said structure, dash forward respectively in the both sides of above-mentioned base plate 20 and establish the first extension 26a and the second extension 26b, and the bottom surface of this first extension 26a and the second extension 26b is set on the track r of framework 3.Therefore, above-mentioned base plate 20 can slide along track r.
And above-mentioned upper plate 22 has interconnective a plurality of connecting strap 23, and the sealing of material such as its underrun sheet material.On this upper plate 22, be formed with a plurality of supporting pins 24, and, possess substrate fixing clamp 25 respectively at its corner part with the certain altitude protrusion.
Therefore, can on a plurality of supporting pins 24, place substrate G, and by the bight of substrate fixing clamp 25 fixing base G, thereby substrate G can stably be placed.
Above-mentioned link 30 comprises: be installed on the rotary cylinder assembly 36 on the plate face 29 of base plate 20; Protrusion is formed at the rotating shaft 38 on the above-mentioned cylinder assembly 36; Protrude downwards from the bottom surface of above-mentioned upper plate 22, and by being inserted in the insertion rib 60 that above-mentioned rotating shaft 38 is fixed.
The above-mentioned cylinder assembly 36 applicable rotary cylinders that rotate by oil pressure or air pressure, and this cylinder is meshed with above-mentioned rotating shaft 38.
Therefore, when cylinder rotated, rotating shaft 38 was to cw or anticlockwise direction rotation.
Its result, when above-mentioned cylinder assembly 38 drove, rotating shaft 38 was rotated thereupon, thereby drove upper plate 22 rotations that are connected setting by insertion rib 60.
In addition, the above-mentioned swiveling limitation mechanism that is set up for the anglec of rotation of controlling upper plate 22 comprises: be installed on first buffer part 32 and second buffer part 34 above the base plate 20; Protrude downwards from the bottom surface of above-mentioned upper plate 22, when upper plate 22 rotation, contact with above-mentioned first buffer part 32 and second buffer part 34 selectively, thereby the rotation of above-mentioned upper plate 22 is limited within the specific limits drg.
As Fig. 5 and shown in Figure 6, have in the swiveling limitation mechanism of said structure, above-mentioned first buffer part 32 and second buffer part 34 have same structure, and are that the center disposes symmetrically with link 30.
Above-mentioned first buffer part 32 comprises, is installed on the first interior side buffer 40 and the first outer side buffer 42 that is installed on the outside of inboard (link direction).And, first cylinder 46 is installed on the adjoining position of side buffer 40, and the piston 48 of first cylinder 46 is connected on the first outer side buffer 42 in above-mentioned first.
At this moment, the above-mentioned first outer side buffer 42 can be installed on the track r1 glidingly.
Thus, when above-mentioned first cylinder 46 drove, the first outer side buffer 42 is pushed or spurred to piston 48 open, so that the first outer side buffer 42 can be to the inside or outer side shifting.So, because the above-mentioned first outer side buffer 42 is removable, when upper plate 22 rotates, can avoid contacting with the first drg S1 through the first outer side buffer, 42 positions.
In addition, second buffer part 34 has the structure identical with first buffer part 32, and the two symmetrical configuration.
That is, above-mentioned second buffer part 34 comprises second interior side buffer 52 that is installed on inboard (link direction) and the second outer side buffer 50 that is installed on the outside.And, second cylinder 58 is installed on the adjoining position of side buffer 52, and the piston 59 of second cylinder 58 is connected on the second outer side buffer 50 in above-mentioned second.
At this moment, above-mentioned second outside buffer part 50 can be installed on the track r2 glidingly.
Thus, when above-mentioned second cylinder 58 drove, the second outer side buffer 50 is pushed or spurred to piston 59 open so that the second outer side buffer 50 can be to the inside or lateral direction move.So, because the above-mentioned second outer side buffer 50 is removable, when upper plate 22 rotates, can avoid contacting with the second drg S2 through the second outer side buffer, 50 positions.
And, be arranged at the drg of above-mentioned upper plate 22, protrude downwards from the bottom surface of upper plate 22 with certain-length, thereby when upper plate 22 rotations, can be respectively be arranged on base plate 20 on first buffer part 32 and second buffer part 34 contact.
More particularly, above-mentioned drg comprises: when upper plate 22 rotation, and the pair of outside drg that can be respectively contacts with the second outer side buffer 50 with the above-mentioned first outer side buffer 42; When upper plate 22 rotation, can be respectively with above-mentioned first in the side buffer 40 and second side buffer 52 contacted in side brake S3.
Above-mentioned pair of outside drg comprises: along certain track cw or anticlockwise direction rotation, when side buffer 42 contacts outside with first, can make upper plate 22 stop at the first drg S1 of reference position; With the above-mentioned first drg S1 balanced configuration, to the rotation of cw or anticlockwise direction, when side buffer 50 contacts outside with second, can make upper plate 22 stop at the second drg S2 of reference position along certain track.
The first drg S1 and the second drg S2 have, and when upper plate 22 revolves when being back to reference position again after turning 90 degrees to cw or anticlockwise direction from reference position, make it stop at the function of zero degree position (original position).
That is, when upper plate 22 stopped at reference position (position as shown in Figure 6), the second drg S2 contacted with the second outer side buffer 50, can keep halted state thus.At this moment, because the first outer side buffer 42 is in the state that moves to the inside under the effect of cylinder 46, thereby the first drg S1 can rotate to the position of the first outer side buffer 42.
And, when upper plate 22 to cw or anticlockwise direction revolve turn 90 degrees after, when being back to reference position again, the second drg S2 contacts with the second outer side buffer 50 again.Thus, can be fixed on reference position by the second drg S2 be the zero degree position to upper plate 22.
In addition, above-mentioned interior side brake S3 rotates along certain track cw or anticlockwise direction, and alternately contacts with the first interior side buffer 40 and the second interior side buffer 52, upper plate 22 can be fixed on the position of revolving after turning 90 degrees thus.
That is, when upper plate 22 revolves when turning 90 degrees from the reference position anticlockwise direction, interior side brake S3 then contacts with side buffer 40 in first, thus fixing upper plate 22; When reference position right-hand revolution 90 is spent, described in side brake S3 then contact with side buffer 52 in second, thereby fixing upper plate 22.
Therefore, upper plate 22 can be fixed on the position behind conter clockwise or right-hand revolution 90 degree by interior side brake S3.
As mentioned above, upper plate 22 can pass through swiveling limitation mechanism, rotates to an angle (preferably revolve to cw or anticlockwise direction and turn 90 degrees) with respect to base plate 20, perhaps is back to reference position.
Below, illustrate in greater detail working process with reference to accompanying drawing according to the base board delivery device of the embodiment of the invention.
As shown in Figure 6, when being in reference position under the state of upper plate 22 at bearing substrate, the first drg S1 is on the position of the first outer side buffer 42, and the second drg S2 then is in and second outer side buffer 50 state of contact.
At this moment, the above-mentioned first outer side buffer 42 moves down into the inboard in the effect of cylinder 46, therefore can prevent to disturb with the first drg S1.
Under this state, as shown in Figure 7, the cylinder assembly 36 of link 30 is driven, allow upper plate 22 under the state of bearing substrate (G) along direction of arrow left-hand revolution.
Along with the left-hand revolution of upper plate 22, interior side brake S3 then in first side buffer 40 directions approaching.
At this moment, the first drg S1 is in the state that breaks away from the first outer side buffer, 42 positions, and the second drg S2 is then near datum line C/L.
Under this state, be further rotated to anticlockwise direction, then as shown in Figure 8, upper plate 22 revolves to anticlockwise direction from reference position and turn 90 degrees.
That is, interior side brake S3 contacts with side buffer 40 in first, stops afterwards thereby upper plate 22 is revolved turn 90 degrees.At this moment, the first drg S1 and the second drg S2 are positioned on the datum line C/L.
On the contrary, when upper plate 22 revolves the position that turn 90 degrees when being back to reference position from anticlockwise direction, the cylinder assembly 36 of link 30 drives to reversing sense, thereby makes upper plate 22 to right-hand revolution.
And the second drg S2 rotates to the second outer side buffer 50 and contact with it, thereby can make upper plate 22 be fixed on reference position.
At this moment, the first drg S1 shifts to the position of the first outer side buffer 42, and the described first outer side buffer 42 has moved down into the inboard in the effect of cylinder 46, therefore can prevent to disturb with the first drg S1.
So, upper plate 22 turn 90 degrees by revolving to anticlockwise direction from reference position, perhaps is back to reference position from anticlockwise direction, the throughput direction of conversion baseplate G.
In addition, as shown in Figure 6, when upper plate 22 when reference position right-hand revolution 90 is spent, interior side brake S3 begins to right-hand revolution, thus side buffer 50 directions move outside second.
At this moment, second energy disperser 50 moves down to the inside in the effect of cylinder 58, can prevent from thus and will arrive the second outer side buffer 50 locational interior side brake S3 to disturb.
When upper plate 22 when clockwise direction is further rotated, interior side brake S3 with second in side buffer 52 contact.
Therefore, upper plate 22 can be fixed on the position behind right-hand revolution 90 degree.
On the contrary, when upper plate 22 when from then on the position is back to reference position, the first drg S1 rotates to the first outer side buffer 42 and contact with it, allows upper plate 22 be fixed on the reference position thus.
So, by the cw or the left-hand revolution of upper plate 22, throughput direction that can conversion baseplate G.
Only preferred embodiment of the present invention of above-mentioned explanation, and protection scope of the present invention is not limited thereto, and can carry out various modifications and change in the scope of claim, summary of the invention and accompanying drawing, and these also should belong to protection scope of the present invention.
Claims (9)
1, a kind of base board delivery device is characterized in that:
Comprise,
Can be installed on the base plate on the frame rail glidingly;
Be installed on above-mentioned base plate above, and the upper plate of bearing substrate in the above;
The link that on base plate, rotatably connects above-mentioned upper plate;
Radius of rotation restriction swiveling limitation mechanism within the specific limits with above-mentioned upper plate.
2, base board delivery device according to claim 1 is characterized in that, described link comprises:
Be installed on the cylinder assembly on the above-mentioned base plate plate face;
Protrude from the rotating shaft of above-mentioned cylinder assembly; And
Protrude downwards from the bottom surface of above-mentioned upper plate, and by being inserted in the insertion rib that above-mentioned rotating shaft is fixed,
Wherein, when above-mentioned cylinder assembly drove, rotating shaft was rotated thereupon, thereby drove by inserting the connected upper plate rotation of rib.
3, base board delivery device according to claim 1 is characterized in that, above-mentioned swiveling limitation mechanism comprises:
Be installed on first buffer part and second buffer part above the base plate;
Protrude downwards from the bottom surface of above-mentioned upper plate, when upper plate rotates, contact with above-mentioned first buffer part and second buffer part selectively, thereby with the rotation of upper plate restriction a plurality of drgs within the specific limits.
4, base board delivery device according to claim 3 is characterized in that, above-mentioned first buffer part comprises:
Be installed on the first inboard interior side buffer;
Be installed on the outside, the first outer side buffer that can move to the inside;
Be installed on the adjoining position of side buffer in above-mentioned first, and be connected first cylinder that the first outer side buffer is moved with the above-mentioned first outer side buffer.
5, base board delivery device according to claim 3 is characterized in that, above-mentioned second buffer part comprises:
Be installed on the second inboard interior side buffer;
Be installed on the outside, the second outer side buffer that can move to the inside;
Be installed on the adjoining position of side buffer in above-mentioned second, and be connected second cylinder that the second outer side buffer is moved with the above-mentioned second outer side buffer.
6, according to claim 4 or 5 described base board delivery devices, it is characterized in that above-mentioned drg comprises:
When upper plate rotates, contact with the above-mentioned first outer side buffer and the second outer side buffer selectively, thereby upper plate is fixed on pair of outside drg on the reference position;
Alternately contact with side buffer in the above-mentioned first interior side buffer and second, thereby upper plate is fixed on the 90 interior side brakes of spending on the position of rotation.
7, base board delivery device according to claim 6 is characterized in that, above-mentioned pair of outside drg comprises:
Can be along the rotation of certain track cw or anticlockwise direction, when outside the contact first during side buffer, make upper plate stop at first drg on the reference position;
With the above-mentioned first drg balanced configuration, and along certain track cw or left-hand revolution,, can make upper plate stop at second drg on the reference position when outside the contact second during side buffer.
8, base board delivery device according to claim 7 is characterized in that:
When above-mentioned first drg passed through the position of side buffer outside above-mentioned first, the above-mentioned first outer side buffer moved under the effect of cylinder to the inside, thereby can prevent that first drg and the first outer side buffer from disturbing; When above-mentioned second drg moved to second outside buffer positions, the second outer side buffer moved under the effect of cylinder to the inside, thereby can prevent that second drg and the second outer side buffer from disturbing.
9, a kind of substrate board treatment is characterized in that, comprising:
Framework;
Can be installed on the frame rail glidingly, and send into side and sending and do back and forth movement between side, while supporting substrate and the base board delivery device that enables to rotate freely;
The side vertical transport portion that sends into that after above-mentioned feedway is accepted substrate, descends;
Be used to handle the processing unit of sending into the substrate that side vertical transport portion supplied with by above-mentioned;
Again the substrate that above-mentioned processing unit was handled is delivered to the side vertical transport portion that sends of above-mentioned feedway; And
Be arranged at sending into side and sending side of above-mentioned processing unit, and after send into side vertical transport portion and accept substrate, it be delivered to above-mentioned processing unit, after handle unit and accept substrate, it is delivered to the above-mentioned delivery section of sending side vertical transport portion again.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020050100238 | 2005-10-24 | ||
| KR10-2005-0100238 | 2005-10-24 | ||
| KR1020050100238A KR100674882B1 (en) | 2005-10-24 | 2005-10-24 | Transfer for use in transmitting works |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1955089A true CN1955089A (en) | 2007-05-02 |
| CN1955089B CN1955089B (en) | 2011-09-28 |
Family
ID=38014984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006101499544A Active CN1955089B (en) | 2005-10-24 | 2006-10-19 | Substrate conveying device and substrate processing device containing the same |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100674882B1 (en) |
| CN (1) | CN1955089B (en) |
| TW (1) | TWI332930B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102136407A (en) * | 2009-12-31 | 2011-07-27 | 丽佳达普株式会社 | Guide rack of dry etcher |
| CN103687795A (en) * | 2011-07-21 | 2014-03-26 | 蒂森克虏伯系统工程股份有限公司 | Device and method for stopping and/or aligning transport goods on a conveying device, and conveying device |
| CN102645626B (en) * | 2008-02-13 | 2015-11-04 | 精工爱普生株式会社 | Conveying device |
| CN108444265A (en) * | 2018-03-26 | 2018-08-24 | 东莞市银泰玻璃有限公司 | A kind of transhipment airing device of glass plate |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101105416B1 (en) * | 2009-07-23 | 2012-01-17 | 주식회사 디엠에스 | Apparatus for processing substrate |
| KR101331507B1 (en) * | 2010-08-09 | 2013-11-20 | 엘지디스플레이 주식회사 | Substrate cleaning/drying apparatus and substrate processing apparatus comprising the same, substrate cleaning/drying method, and method for manufacturing of display device the same |
| KR102640243B1 (en) | 2023-07-31 | 2024-02-23 | (주)템스코 | Pick-up and transfer device for manufacturing shield-type OLED metal mask with synchronous opening and closing structure |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2517701Y (en) * | 2001-09-20 | 2002-10-23 | 黄平尧 | Steering device of circuit board |
| KR100500170B1 (en) * | 2003-06-25 | 2005-07-07 | 주식회사 디엠에스 | Apparatus for horizontal and up-down transporting of works |
-
2005
- 2005-10-24 KR KR1020050100238A patent/KR100674882B1/en active IP Right Grant
-
2006
- 2006-10-16 TW TW095138005A patent/TWI332930B/en active
- 2006-10-19 CN CN2006101499544A patent/CN1955089B/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102645626B (en) * | 2008-02-13 | 2015-11-04 | 精工爱普生株式会社 | Conveying device |
| CN102136407A (en) * | 2009-12-31 | 2011-07-27 | 丽佳达普株式会社 | Guide rack of dry etcher |
| CN102136407B (en) * | 2009-12-31 | 2013-11-06 | 丽佳达普株式会社 | Guide rack of substrate processing device |
| CN103687795A (en) * | 2011-07-21 | 2014-03-26 | 蒂森克虏伯系统工程股份有限公司 | Device and method for stopping and/or aligning transport goods on a conveying device, and conveying device |
| CN103687795B (en) * | 2011-07-21 | 2016-05-11 | 蒂森克虏伯系统工程股份有限公司 | For stop and/or aiming at Apparatus and method for and the conveyer of transporting cargo on conveyer |
| CN108444265A (en) * | 2018-03-26 | 2018-08-24 | 东莞市银泰玻璃有限公司 | A kind of transhipment airing device of glass plate |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI332930B (en) | 2010-11-11 |
| CN1955089B (en) | 2011-09-28 |
| TW200716468A (en) | 2007-05-01 |
| KR100674882B1 (en) | 2007-01-29 |
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Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140225 |
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Effective date of registration: 20140225 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
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| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |