CN1862766A - Method for measuring parallel beam injection angle - Google Patents

Abstract

This invention discloses parallel beam injection angle measuring method. Moving faraday and beam faraday are used. The procedures are that (1) the moving faraday method is used to shelter ion beam to make the beam faraday method forming corresponding current curve graph. (2) parallel beam injection angle is computed by formula theta=arctg((X1'+X2')/2-X0)/(H-h/2), X1', X2'are 50 percent two points position of beam measuring cup current peak value, X0 is midpoint position of the cup, h is moving faraday height, H is distant between the moving faraday and beam faraday. This invention is simple and practical, its operation is easy and measuring is accurate.

Description

A kind of method for measuring parallel beam injection angle

Technical field

The present invention relates to a kind of semiconductor device production control method of measurement, relate in particular to a kind of method for measuring parallel beam injection angle.

Background technology

In the existing semiconductor integrated circuit manufacturing technology, development along with the semiconductor integrated circuit technology, integrated level is more and more higher, the wafer size of foundry is increasing, from 6 inches to 8 inches, even 12 inches, the unit component size is more and more littler in the circuit, and the automation of each semiconductor manufacturing equipment is had higher requirement.

Ion implantor is as one of key equipment of semiconductor ion doping processing line, also have higher requirement, when the wafer size of foundry arrives 8 inches or 12 inches, the requirement ion implantor has: multiple function and features such as angle favourable identity that whole aircraft reliability is good, accurately control Shu Pinzhi, low grit pollutes, injects line, when particularly ion beam arrives crystal column surface, in different position, surface, brilliant garden, the bundle spot all requires to inject with same angle.Therefore, the measuring parallel beam injection angle technology is one of technology the most key in the angled ion implanter equipment.

Summary of the invention

The present invention be directed to and accurately measure relatively situation of difficult of parallel beam implant angle in the prior art, propose a kind of new method of measurement, this method is simple and practical, measures accurately.

The present invention is achieved through the following technical solutions: a kind of method for measuring parallel beam injection angle, and use mobile faraday, surveyed bundle faraday, measuring process is:

(1) blocks ion beam by mobile faraday, make survey bundle faraday form corresponding current curve diagram;

(2) calculate parallel beam implant angle θ ≈ arctg ((X1 '+X2 ')/2-X0)/(H-h/2) according to formula,

Wherein X1 ', X2 ' are for surveying 50% two position of bundle cup current peak, and X0 is for surveying the position of bundle cup mid point, and mobile faraday highly is h, and mobile faraday's inlet and the distance of surveying between the bundle faraday inlet are H.

The present invention has following remarkable advantage:

1. method is simple, practical, easy operating.

2. measure accurately.

Description of drawings

Fig. 1 is a schematic diagram of the present invention.

Fig. 2 is a survey bundle faradic currents curve chart of the present invention.

Embodiment

Below in conjunction with specific embodiment the present invention is described in further detail:

As shown in Figure 1, after ion beam is swept out through scanning power supply, after coming out, parallel beam lens and accelerating field be injected into the wafer, at wafer position one or more are set and survey bundle faraday 2, with from left to right moving of mobile faraday 1, can measure the parallel beam implant angle of bundle faraday position according to the angle measurement of parallel beam formula.

The angle measurement of parallel beam formula:

As shown in Figure 1, mobile faraday 1 from left to right moves, and when mobile faraday 1 moved to position X1, the line of surveying bundle faraday 2 measurements began to reduce, and when mobile faraday 1 moved to position X2, the line that survey bundle faraday 2 measures returned to maximum.X0 is for surveying the position of restrainting the cup mid point, the crossing position of ion beam centerline and mobile faraday 1 upper edge that X3 sends for surveying bundle faraday 2.If mobile faraday's 1 width is W1, highly be h, the width of surveying bundle faraday 2 is W2, mobile faraday 1 and the distance of surveying between the bundle faraday 2 are H.

X3-X1＝W1/2+h*tgθ+W2/2..............................(1)

X2-X3＝W2/2+W1/2.....................................(2)

X3-X0＝H*tgθ........................................(3)

Get by (2)-(1):

2*X3-(X2+X1)＝h*tgθ.................................(4)

Get by (3) and (4):

tgθ＝((X1+X2)/2-X0)/(H-h/2).........................(5)

The parallel beam angle is:

θ＝arctg((X1+X2)/2-X0)/(H-h/2)......................(6)

Control mobile faraday and from left to right move,, calculate X1 ' and X2 ' 2 points according to diagram from surveying bundle faraday acquisition current curve diagram as shown in Figure 2.As seen from the figure

(X1’+X2’)/2≈(X1+X2)/2.............................(7)

(7) substitution formula (6) can be calculated the parallel beam angle.

Specific embodiment of the present invention elaborates summary of the invention.For persons skilled in the art, any conspicuous change of under the prerequisite that does not deviate from the principle of the invention it being done all constitutes the infringement to patent of the present invention, with corresponding legal responsibilities.

Claims (1)

1. a method for measuring parallel beam injection angle has used mobile faraday, has surveyed bundle faraday, and measuring process is:

(1) blocks ion beam by mobile faraday, make survey bundle faraday form current curve diagram;

(2) calculate parallel beam implant angle θ ≈ arctg ((X1 '+X2 ')/2-X0)/(H-h/2) according to formula,

Wherein X1 ', X2 ' are for surveying 50% two position of bundle cup current peak, and X0 is for surveying the position of bundle cup mid point, and mobile faraday highly is h, and mobile faraday's inlet and the distance of surveying between the bundle faraday inlet are H.

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