CN1854331A - Material film plating method and device thereof - Google Patents

Material film plating method and device thereof Download PDF

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Publication number
CN1854331A
CN1854331A CN 200510025365 CN200510025365A CN1854331A CN 1854331 A CN1854331 A CN 1854331A CN 200510025365 CN200510025365 CN 200510025365 CN 200510025365 A CN200510025365 A CN 200510025365A CN 1854331 A CN1854331 A CN 1854331A
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China
Prior art keywords
light source
source
organic materials
concave mirror
heating
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Pending
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CN 200510025365
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Chinese (zh)
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孙润光
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Individual
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Individual
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Priority to CN 200510025365 priority Critical patent/CN1854331A/en
Publication of CN1854331A publication Critical patent/CN1854331A/en
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  • Physical Vapour Deposition (AREA)

Abstract

A vapor deposition method for organic material and an heat reservoir equipment for its application. It adopts radiation as heating mode to substitute resistence heating. The radiate heat source is placed on one focus of a concave mirror so that the light can be casted onto the organic sample on the other focus. In addition, the organic material is placed in a radiate-wave permeateable container with a hatch on it to let organic vapour go out and to restrict beam current angle. Advantages are high productive efficiency and high-usage of material.

Description

A kind of novel material film plating method and device
Technical field
The present invention relates to the method and apparatus of vapour deposition, relate in particular to the heat power supply device of the method and this method of realization of organic materials vapour deposition.
Background technology
Gas phase deposition technology is to utilize the method for physics or chemistry at several microns of substrate material surface deposition one deck or thinner coating material in vacuum wall body.
Chemical vapour deposition is a kind of film growth techniques commonly used in the semiconductor technology, and this technology uses the method for chemistry to come deposit film.
Organic light emitting display, be called Organic Light Emitting Diode (Organic Light EmittingDiode again, OLED), have plurality of advantages such as active illuminating, high brightness, high-contrast, ultra-thin, low-cost, reduce power consumption, the restriction of no visual angle and operating temperature range be wide, being considered to is a kind of flat panel display that has potentiality that faces the future.Along with the continuous maturation of technology and perfect, OLED has begun to be developed to the industry stage and has had many products to emerge.Yet, reduce cost and to be the important means that many businessmans acquired an advantage and defeated the rival along with the aggravation of market competition.
The OLED device is made of substrate, anode, organic material layer (hole injection layer, hole transmission layer, luminescent layer, electron transfer layer, electron injecting layer), negative electrode, organic materials just can show the organic semi-conductor characteristic being in filminess, so in the process that organic electroluminescence device is made, must be on substrate with the organic materials coated film deposition, in order to achieve the above object, in the OLED manufacturing process, generally adopt the method for resistance thermal source direct heating organic materials at present.This method is from bottom heating organic materials, forms vertical the inhomogeneous of temperature that go up so the temperature of base material often is higher than top material.If material is placed too many, at first fusing but being hampered by top material can not steam and form lower hollow, thereby make organic materials not contact thermal source and stop to evaporate.If it is very few that material is placed, just need to increase to add the number of times of material, thereby increased the preparation time of product, reduced productive rate, increased the cost of product indirectly.If non-uniform charging also can collapse and spatter phenomenon, the utilization ratio of material is low.A kind of improving technology is also arranged, in the heating boat, place Metal Ball, to reach the uniform purpose of conducting heat.
The present invention proposes a kind of heating means and device of novel evaporation thermal source, it belongs to noncontact radiation heating mode, thermal source is wherein substituted by halogen lamp, and utilizes concave mirror that light is focused on the material to be steamed, and we are the thermal source called after radiation of this heating evaporation thermal source.Material is placed in transparent the bar shaped glass or quartz container.Material surface to be steamed at first obtains heating, arrives the gasification temperature gasification, and the material of lower floor exposes to the open air out, start vaporizer under illumination.Use this method and can save material, owing to heat from the top of material, so thereby can feed more and can shorten the production time, can also avoid the pollution that the resistance wire volatile matter brings in the resistive heating mode simultaneously.The vapor phase growing apparatus that the present invention simultaneously proposes can be produced the heating source of bar shaped and isometric container, can produce like this to be suitable for the long heating source of flat pannel display for upgrading large substrates needs.
Summary of the invention
The object of the present invention is to provide a kind of heating means and device of novel organic vapor deposition thermal source, this method can be saved Coating Materials and production time, thereby reduces cost of manufacture, and can make the heating source of long strip shape.
For achieving the above object, the concrete structure of the evaporation thermal source of the present invention's proposition is:
A halogen lamp tube is placed on the focus of a concave mirror, light is focused on and is incident upon the glass that is placed on another focus or quartz bar and describe in the device on the organic film plating material.Also two halogen lamps and focusing can be placed glass or quartz bar describe device respectively, its light focusing is described in the device on the organic film plating material at glass or quartz bar.The consumption that transmitter is used for measuring and monitoring organic materials is set on halogen lamp and focusing, adjust halogen lamp and focusing focus so that control linkage system by the continuous computer of transmitter, also can adopt the height of regulating glass or quartz bar appearance device, the device of regulating material height also can be set in container, improve the consumption of rate of heating and supervision material.
Organic materials is contained in the horizontal positioned transparent vessel (glass or silica tube), on the along continuous straight runs of the top of glass or silica tube, open an elongate slot, be used for the restrain evaporation beam direction, and flow deflector is set above elongated slot, with the flow direction of restriction organic materials.The cross section of this transparent vessel (glass or silica tube) can be square or 2 sides are parallel, and the material in the container vertically is being evenly distributed, and makes the material vaporator rate even.
The thermal source that is adopted among the present invention can be that halogen lamp also can be other optical emitter.
Heating source among the present invention can be that linear light source also can be a pointolite.
Filling the machine container of material among the present invention can be that silica glass, non-alkali glass also can be other transparency and heat-proof materials.
Thermal source among the present invention can also can shine by transparent window on the organic materials of the transparent vessel in the vacuum chamber outside vacuum chamber in vacuum chamber.
Description of drawings
Fig. 1 is the vacuum unit sketch that adopts novel radiant heat source
1. vacuum bell jar; 2. pumped vacuum systems; 3. concave mirror; 4. radiating light source; 5. be with the transparent vessel of flow deflector; 6. substrate; 7. evaporation sample; 8. evaporation line
Fig. 2 is the vacuum unit sketch that adopts external novel radiant heat source
9. external concave mirror; 10. external radiating light source; 11. have the vacuum bell jar of transparent window.
Embodiment
Be described below in conjunction with the accompanying drawings:
Embodiment 1:
In vacuum bell jar 1, under the effect of pumped vacuum systems 2, make in the whole vacuum bell jar 1 to be in high vacuum state, radiating light source 4 is under the focussing force of concave mirror 3, radiant heat source sees through transparent vessel 5 and is radiated on the interior organic materials of transparent vessel, the heating organic materials, the organic materials surface is heated, and reaches gasification temperature, organic molecule is broken away from the vacuum from the organic materials surface, from slit, pass, rise on the substrate condensation and adhere to, form organic material film along flow deflector.
Embodiment 2:
In the vacuum bell jar 11 that has transparent window, under the effect of pumped vacuum systems 2, make in the whole vacuum bell jar 11 and be in high vacuum state, radiating light source 10 is under the focussing force of concave mirror 9, radiant heat source sees through transparent window and transparent vessel 5 is radiated on the interior organic materials of transparent vessel, the heating organic materials, the organic materials surface is heated, reach gasification temperature, organic molecule is broken away from the vacuum from the organic materials surface, from slit, pass, rise on the substrate condensation and adhere to, form organic material film along flow deflector.

Claims (6)

1, a kind of heating means of novel organic materials vapour deposition is characterized in that, replace resistance contact type of heating with the contactless heating of radiation; Source of radiation is placed on the focus of a concave mirror, light is focused on and is incident upon on the organic materials that is placed on another focus, organic materials is contained in and can sees through in the container of radiation wavelength, is provided with above container that an opening is used for that organic materials steams and the angle by flow deflector restrain evaporation line.
2, a kind of device of novel organic materials vapour deposition, transparent vessel, fixing base device by vacuum bell jar, pumped vacuum systems, concave mirror, radiating light source, band flow deflector constitute, by radiating light source as heating source, make organic materials gasification disengaging material surface in the transparent vessel by the radiating light source heating, reach the purpose of vapour deposition.
3, device as claimed in claim 2 is characterized in that, can be arranged in the vacuum chamber as the radiating light source of thermal source also can be arranged on outside the vacuum chamber.
4, the transparent vessel of band flow deflector as claimed in claim 2 is characterized in that, can be the point-like container, also can be linear container.
5, radiating light source as claimed in claim 2 is characterized in that, with the shape of the form fit of the described transparent vessel of claim 4, and can pointolite or linear light source; Radiating light source can be an infrared radiation source, can be the source of radiation of other wave band also, as microwave.
6, concave mirror as claimed in claim 2 is characterized in that, the coated material of concave mirror is different because of the difference of source of radiation, and its shape and radiating light source are complementary, and can be the concave mirror of pointolite, linear concave mirror that also can linear light source.
CN 200510025365 2005-04-25 2005-04-25 Material film plating method and device thereof Pending CN1854331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200510025365 CN1854331A (en) 2005-04-25 2005-04-25 Material film plating method and device thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200510025365 CN1854331A (en) 2005-04-25 2005-04-25 Material film plating method and device thereof

Publications (1)

Publication Number Publication Date
CN1854331A true CN1854331A (en) 2006-11-01

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Application Number Title Priority Date Filing Date
CN 200510025365 Pending CN1854331A (en) 2005-04-25 2005-04-25 Material film plating method and device thereof

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CN (1) CN1854331A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103074581A (en) * 2012-12-25 2013-05-01 王奉瑾 PVD equipment adopting light heating
CN109666898A (en) * 2019-01-03 2019-04-23 福建华佳彩有限公司 A kind of crucible for evaporation source

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103074581A (en) * 2012-12-25 2013-05-01 王奉瑾 PVD equipment adopting light heating
CN109666898A (en) * 2019-01-03 2019-04-23 福建华佳彩有限公司 A kind of crucible for evaporation source

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