CN1849550A - 用于制造光电光调制器的方法 - Google Patents

用于制造光电光调制器的方法 Download PDF

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CN1849550A
CN1849550A CNA2004800256741A CN200480025674A CN1849550A CN 1849550 A CN1849550 A CN 1849550A CN A2004800256741 A CNA2004800256741 A CN A2004800256741A CN 200480025674 A CN200480025674 A CN 200480025674A CN 1849550 A CN1849550 A CN 1849550A
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陈仙海
大卫·鲍尔温
亚历山大·纳吉
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Photon Dynamics Inc
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Abstract

在光电光调制器中，将例如聚合物分散液晶、或PDLC的光电传感材料直接涂覆在光学玻璃基底上，光学玻璃基底在其表面具有透明电极(例如铟锡氧化物(ITO))、以及可选择的钝化覆层(例如SiO2)。聚合物粘合剂薄层覆盖在PDLC层的顶部，并且接着优选地通过真空辅助将这两个覆层与聚合物薄膜(例如MylarTM)上的介质镜层合在一起。

Description

用于制造光电光调制器的方法
相关申请的交叉引用
不适用
关于在联邦政府赞助的研究或开发中做出的发明的权利声明
不适用
″序列单″、表格、或递交的磁盘上的计算机程序清单附录的参考
不适用
背景技术
本发明涉及在光电应用中使用的光电传感器材料覆层。本发明尤其涉及在玻璃基底上直接进行的PDLC(polymer dispersed liquidcrystal；聚合物分散液晶)涂覆工艺。
电压成像技术可被用来检测和测量平板薄膜晶体管(TFT)阵列中存在的缺陷。根据这种测量技术，阵列的性能被仿真为该阵列就像是被组装到TFT单元一样，然后通过使用基于光电(EO)光调制器的检测器间接地测量平板中的实际电压分布(或通过所谓的电压成像)来测量TFT阵列的特征。
电压成像系统以其最基本的形式包括光电调制器、物体成像镜、电荷耦合器件(CCD)摄像机或其他合适或相似的传感器、以及图像处理器。EO调制器的光电传感器基于聚合物基体(聚合物分散液晶，或PDLC)膜中的向列液晶滴的光散射特性。在操作过程当中，EO调制器被设置在薄膜晶体管(TFT)阵列表面上方约5-30微米处，并且对EO调制器表面上的铟锡氧化物(ITO)层的透明电极施加偏置电压。因此，EO调制器与TFT阵列电容性地耦合，从而使得PDLC层感测到与TFT阵列关联的电场。通过PDLC中的液晶(LC)材料中电场强度的任何变化，使通过PDLC层传输的入射光的强度变化，即，被调制。接着，这些光从介质镜散射，并被CCD摄像机或类似的传感器收集。可以提供入射辐射光源(例如可以为红外或可见光)对TFT阵列的夹层结构、PDLC薄膜和介质镜进行照射。
用来制造EO调制器的公知方法是使用商业的NCAP(nematiccurvilinear aligned phase；曲线定向向列相)材料，它是适于制造超大面积的光阀和显示器的一种形式的PDLC。NCAP器件由分散在聚合物薄膜(例如位于两个ITO聚脂薄膜层之间的夹层内)中并由其围绕的微米级大小的液晶滴形成。转让给光子动力学公司的两项发明描述了上述处理：
“调制器转移工艺和组装”，迈克尔A·布赖恩，美国专利6,151,153(2000)。
“调制器制造工艺和器件”，迈克尔A·布赖恩，美国专利6,211,991B1(2001)。
公知的调制器制造工艺包括在玻璃基底上层合(lamination)夹层的NCAP材料、修整侧面以及从玻璃的侧面到底部的ITO层进行电连接。传统的层合处理所具有的局限性在于表面平整度的不一致性、机械不稳定性以及极低的制造率。层合操作需要复杂的组装处理，所述组装处理降低了产率，并使得最后制成的EO调制器器件的成本较高。测试者的成本导致了测试成本，这最终间接地反映在最终产品的成本中。需要一种结构和技术消除NCAP薄膜层合和相关处理。
发明内容
根据本发明，在光电光调制器中，聚合物分散液晶(PDLC)制剂(formulation)被直接涂覆在光学玻璃基底上，光学玻璃基底在其表面上具有透明电极层(例如铟锡氧化物(ITO))，以及钝化层(例如SiO2)。接着，将聚合物粘合剂薄层涂覆在PDLC层的顶部，并且接着将这两个覆层与聚合物薄膜(例如MylarTM)上的介质镜层合在一起。利用低度真空可增进这种处理。
本发明去除了将NCAP薄膜层合到基底上的复杂工艺，并提供了一种简化的工艺来制造具有更为优良的表面平整度、表面平滑度、机械稳定性和提高的灵敏度的调制器。通过直接控制液晶的组分、分布和厚度，可以极大地降低制造成本并简化制造过程。
通过参照结合附图对本发明进行的以下详细描述，本发明将更加容易理解。
附图简要说明
图1是根据本发明制造的设备的示意性剖面图；
图2是本发明实施方案的流程图；
图3是可用来将介质镜层合到PDLC层上的真空腔的示意性剖面图。
本发明的详细描述
参照图1，在图中显示了根据本发明制造的EO调制器的光电(EO)传感器10。聚酯薄膜层1(其典型地为MylarTM薄膜)为介质镜2提供基底支持。基底/镜组合通过粘合薄膜层3结合到光电传感材料层，具体地说，结合到聚合物分散液晶(PDLC)层4的覆层。PDLC 4直接涂覆在可选的二氧化硅层5上。还具有透明电极材料层，例如直接结合到光学玻璃基底7上的铟锡氧化物(ITO 6)，光学玻璃基底7可以例如是一块BK-7型的光学玻璃。该玻璃基底或块7是光学平坦的，并在与PDLC 4的表面相对的、光学平滑的表面上具有抗反射覆层8。
参照图2，图2示出了根据本发明的EO传感器10的制造工艺。预处理步骤是准备光学玻璃基底7，例如BK-7玻璃块，并且可用抗反射层8对其进行预涂覆(步骤A)。
1)光学玻璃基底上的电极涂覆：作为制造工艺中的第一个步骤，将电极覆层施加到玻璃基底7的光学表面(步骤B)。在这一应用中可使用任何在所感兴趣的波长处透明的传导覆层。铟锡氧化物(ITO)是公知的和优选的。可选地，作为步骤B的一部分，可以将二氧化硅(SiO2)层4涂覆在传导覆层6的顶部，从而提高了其耐用性、表面润湿性和与传感材料4的粘结性。电极覆层覆盖了顶部表面、两个相对的边缘和侧表面，以用于电极连接。
2)传感材料涂覆：接下来，将传感材料4施加到电极6(以及可选的二氧化硅层7)的上方(步骤C)。可以使用任意具有光电响应的材料。然而，优选的材料包括聚合物分散液晶(PDLC)，PDLC为凝胶状的，但潜在地为挥发性液体。公知的合适材料指定为：i)TL-205/AU1033；ii)TL-205/PMMA；ii)E7/聚乙烯(甲基丙烯酸甲酯)(PMMA)；以及iv)E7/AU-1033。在制造过程中，可以使用如下的涂覆工艺：刮胶板(doctor blade)、拉丝锭(wired bar)、狭缝模具式(slot die)、旋转和弯液面(meniscus)。基于旋转涂覆的工艺是优选的。
3)边缘清理：在此之后，根据涂覆的方法，可能需要清理边缘(步骤D)。优选地使用塑胶“刀”(例如MylarTM板，未示出)将边缘清除，而不会损坏所述边缘上的ITO覆层。
4)粘合涂覆：在此之后，将粘合薄膜3施加到叠层中(步骤E)。必须使用水基的粘合剂覆盖传感材料4的顶部，以防止传感材料的表面受到损害。这种材料包括聚亚安酯分散体(例如，由位于马萨诸塞的成尔明顿的Neoresins制造的商标为Neorez的R-967)、丙烯酸脂分散体以及水生环氧树脂类。这些粘合剂必须是水基的，并且可以包含例如硅土分散体或其他低折射率的绝缘纳米颗粒(在本文的范围内，它们不会发生化学反应)。
5)介质镜(“薄膜(pellicle)”)层合：最后，在薄聚酯膜1(例如，7微米厚的MylarTM)上实现的电介质叠层2通过层合处理被施加到粘合层3的顶部(步骤F)。辅助的真空层合处理是优选的，如下所述。可将尺寸加大的薄膜1、2(图1)的侧面向下弯曲，并缚在或者以其他方式固定在基底7上，以形成传感器板，电极端可以被连接到所述侧面上的ITO层。
参照图3，在图中示出了合适的真空腔12，用来在层合处理中使用。这些层的高度被夸大地示出。工件或EO传感器10包括具有ITO层6的玻璃块7、二氧化硅层5、PDLC层4和粘合层3，并包含在内腔13中。内腔13的范围由定位设备101限定出，并且其与真空源20连通。覆盖有电介质的聚合物薄膜9的薄膜9安装在O型环框架24上，并且将薄膜9与覆盖有粘合剂3的表面并列设置。O型环24夹住薄膜9使其与固定设备101的柱之间相距足够大的缝隙22，以确保腔内的压力均衡。在真空辅助处理中(步骤F)，自动或手动地推进调整螺栓16，18，以使粘合层3靠近薄膜9、并相对于正常位置稍微倾斜地与薄膜9接触，从而使得在最初只有一侧与薄膜接合。当抵靠可伸展的薄膜9进一步挤压块7，以使它逐渐与粘合层接合时，块7被保持在该角度。典型地约为二分之一大气压到0.8个大气压的真空度(优选地约为0.75个大气压)可防止在层合的过程当中在并列的表面之间形成气泡。真空度不应该太大，以避免从挥发性物质放出太多的气体。
上面描述的是与现有技术中用来制造调制器的工艺相比简化的工艺。本发明的方法获得的器件与现有的EO传感器相比，具有更为优良的表面平整度、表面平滑度、机械稳定性和提高的灵敏度。由于材料的选择和制造过程的简化，制造成本被显著降低了。
已经参照具体的实施方案对本发明进行了描述。其他的实施方案对于本领域的普通技术人员来说是显而易见的。因此，本发明并非由上述实施方案所限制，而是由所附的权利要求来限制。

Claims (8)

1.一种用于制造光电传感器的方法，所述方法包括：
提供玻璃基底，所述基底包括光学平滑的顶面和光学平滑的底面；
用透明电极覆盖所述玻璃基底的顶面；
在所述透明电极上施加光电传感材料合成物层；
在所述光电传感材料层的所述层上施加薄的粘合层；以及
将作为介质镜层支撑膜的薄膜层合到所述粘合层，从而使所述介质镜层基本上光学平滑地抵靠所述光电传感材料。
2.如权利要求1所述的方法，其中，所述光电传感材料是聚合物分散液晶(PDLC)。
3.如权利要求1所述的方法，其中，所述层合步骤包括在真空中进行所述层合过程。
4.如权利要求3所述的方法，其中，所述真空小于0.8个大气压。
5.如权利要求3所述的方法，其中，所述真空介于二分之一个大气压和0.8个气压之间。
6.如权利要求3所述的方法，其中，在所述层合步骤中，所述薄膜逐渐与所述粘合层接合，所述薄膜和所述粘合层相对于彼此以某一角度设置。
7.如权利要求1所述的方法，其中，在所述层合步骤中，所述薄膜逐渐与所述粘合层接合，所述薄膜和所述粘合层相对于彼此以某一角度设置。
8.如权利要求7所述的方法，其中，所述真空介于二分之一个大气压和0.8个大气压之间。
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