CN1803724A - Metal ion-injected ceramic cutter surface modification method - Google Patents
Metal ion-injected ceramic cutter surface modification method Download PDFInfo
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- CN1803724A CN1803724A CN 200610000810 CN200610000810A CN1803724A CN 1803724 A CN1803724 A CN 1803724A CN 200610000810 CN200610000810 CN 200610000810 CN 200610000810 A CN200610000810 A CN 200610000810A CN 1803724 A CN1803724 A CN 1803724A
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Abstract
The invention relates to a metal ion implantation surface modification method for ceramic cutting tool. Wherein, selecting the metal ion from Ti, Zr, Cr, Mo and W; the cutting tool contains Si3N4, composite Si3N4, composite Al2O3, hard alloy, and zirxonia. This invention uses metal vapor vacuum arc-source ion implantation apparatus, modifies cutting tool surface with proper ion and optimized technique and optimal dosage, and improves its physical properties and cutting ability.
Description
Technical field
The present invention relates to a kind of metal ion injection surface modification method of sintex, belong to the preparation and the Machining Technology field of sintex.
Background technology
Metal cutting tool surface modification technology commonly used at present has physical vapour deposition (PVD) and chemical vapor deposition (CVD).Wherein, the CVD method is commonly used in high temperature resistant tool matrix (as inserted tool) and goes up deposition film, because the CVD arts demand carries out under high temperature (750～1000 ℃), have only and use special precursor could reduce temperature of reaction, so energy consumption height, environmental pollution are serious.Compare with the CVD method, the PVD method is environmentally friendly, is fit to deposit ternary and polynary meta film.Deposition temperature low (180～500 ℃) can not reduce matrix hardness, is commonly used for the surface modification of electroconductibility good metal class cutter.But still there is the problem that film and basal body binding force are not ideal enough and deposition rate is too low.For sintex, because most of sintexes self is non-conductive, the deposition matrix as PVD technology is difficult to apply negative bias, so the PVD method is infeasible basically to sintex (especially non-conductive or weakly conducting sintex).
Ion implantation technique was as a kind of year energy particle technology, neither need to use organic precursor and high temperature, need on modified matrix, not apply negative bias yet, extensive surface modification with various conductors and non-conductive material, can improve the surface state of material, the mechanical property of raising material and photoelectric properties etc. are the adulterated important channels of semiconductor material as the metal ion method for implanting, and it should also be possible that sintex is carried out surface modification.
Summary of the invention
The objective of the invention is to utilize the high speed function of injecting of the heavy dose of metal ion of metal vapor vacuum arc (MEVVA) source ion implanter, by selecting suitable injection metal ion, injection technology of optimizing and best implantation dosage, modification is carried out on the sintex surface, reduce so that eliminate tiny crack and the defective that the sintex surface forms in machining process, improve the condition of surface of sintex, improve the surface hardness of ceramic cutting tool material, strengthen the fracture toughness property of ceramic cutting tool material, bending strength and mechanical behavior under high temperature etc., thereby the cutting power of raising sintex.
The metal ion injection surface modification method of the sintex that the present invention proposes is characterized in that, described method adopts intense beam stream Metal Ion Injection Technology that the tool matrix that cleaned is carried out surface modification according to specific processing condition implanting transition metal ion.
In above-mentioned surface modifying method, the ion of described injection is titanium, zirconium, chromium, molybdenum, tungsten.
In above-mentioned surface modifying method, described sintex is silicon nitride and composite silicon nitride, aluminum oxide and composite alumina, Wimet, zirconium white and toughened zirconia ceramics.
In above-mentioned surface modifying method, the employed ion source of described ion implantation technique is an intense beam ion source.
In above-mentioned surface modifying method, comprise in the described cutter cleaning cutter is carried out organic solvents such as tap water, alcohol, alcohol-ultrasonic wave, high purity water-ultrasonic wave multistep cleaning successively, dry step, described organic washing agent is 1: the alcohol of 1-5: 1-4, kerosene and acetone three mixed solvents.
In above-mentioned surface modifying method, in described sintex, inject (0.5-25) * 10 respectively
17Ions/cm
2Titanium, zirconium, chromium, molybdenum or tungsten transition metal ion.
In above-mentioned surface modifying method, described intense beam stream metal ion injection technology condition is acceleration voltage 20-120kV, system vacuum (1.0-8.0) * 10
-4Pa, beam intensity is 1.0-10.0mA, and ion implantation time 2-20 hour, ion implantation incident angle was 30-60 ° of angle, and ion source and sample interval are 40-120cm.
Sintex after the modification of employing present technique is compared with original sintex, has better wear resistance, thermotolerance and good cutting performance.Be applicable to the mechanical workout of high hard Materials with High Strength.Present technique also can be used for pottery and wear parts such as sintered-carbide die, nozzle are carried out surface modification.
Embodiment
Below in conjunction with embodiment technical scheme of the present invention is described further:
The present invention proposes a kind of new ceramics tool surface modification technology, it is characterized in that: adopt intense beam stream Metal Ion Injection Technology (MEVVA source ion implanter) that sintex is carried out surface modification, and comprise following content:
(1) stupalith (silicon nitride and composite silicon nitride, aluminum oxide and composite alumina, Wimet, zirconium white etc.) is carried out suitable mechanical workout, make and meet the industrial use standard shape of tool of (comprising precision and cutter geometrical dimension etc.) fully.
(2) cutter is carried out successively multisteps such as organic mixed solvent such as tap water, alcohol, alcohol-ultrasonic wave, high purity water-ultrasonic wave and clean, dry then, standby.
(3) select for use MEVVA high current ion source implanter that the sintex of above-mentioned cleaning is carried out surface modification.
(4) select for use transition metals such as metal titanium, zirconium, chromium, tantalum, vanadium, molybdenum, tungsten to do electrode (negative electrode) above-mentioned various sintexes are carried out modification.
(5) be that 40-120cm, acceleration voltage 20-120kV, ion implantation incident angle (ionic fluid and sample table normal) are under the 30-60 ° of corner condition at ion source and sample interval, keep system vacuum (1.0-8.0) * 10
-4Below the Pa, the control beam intensity is 1.0-10mA, injects the metal ions such as titanium, zirconium, chromium, molybdenum or tungsten of various dose in 2-20 hour respectively to every kind of sintex matrix.
(6) need not any post-processing step behind the sintex metal ion injection surface modification.
(7) under industrial condition, the 40Cr Hardened Steel Workpiece of hardness HRC 53～64 is carried out machining or the gray iron of hardness HB220-230 is carried out machining respectively with the cutter after the modification.
Cutter for same comprises all sintexes, any as in the sintexes such as silicon nitride and composite silicon nitride, aluminum oxide and composite alumina, Wimet, zirconium white and toughened zirconia ceramics, titanium carbonitride.
It is 1 that selected sintex cleans organic solvent: (1-5): alcohol (1-4), kerosene and acetone three mixed solvents and cleaning sequence thereof.
Used surface modification equipment is ion implanter, and used metal ion source is the MEVVA source.
The metal that is injected is the transition element metal, any as in titanium, zirconium, chromium, molybdenum, the tungsten etc.
Described ion implanting conditions be aforementioned content in the content of (5) money, and relevant implantation dosage: in various sintexes, inject (0.5-25) * 10 respectively
17Ions/cm
2Transition metal ions such as titanium, zirconium, chromium, molybdenum or tungsten.
Embodiment 1: silicon nitride ceramics is made into 08 0.3 * 30 ° of (blades of 12.7 * 12.7 * 4.76mm) of international standard shape SNGN1204, after aforementioned (2) described technology cleaning, with MEVVA II A-H type high current ion source implanter, at ion source and sample interval is that 60cm, acceleration voltage 30kV, ion implantation incident angle (ionic fluid and sample table normal) are under 50 ° of corner conditions, keeps system vacuum 8.0 * 10
-4Below the Pa, the control beam intensity is 6.0mA, injects 8.0 * 10 to each face of cutter in 15 hours
17Ions/cm
2Behind the zirconium metal ion, the cutter nano hardness is brought up to 26.5GPa, and Young's modulus is brought up to 410GPa, and bending strength is brought up to 1020MPa.At cutting speed v=400m/min, depth of cut a=0.5mm carries out machining to 40Cr steel (hardness HRC 53-64) under the depth of cut f=0.1mm/rev.When the cutter flank wear was 0.3mm, the Tool in Cutting distance improved about 5-6 doubly than original unmodified cutter after the modification.
Embodiment 2: alumina-ceramic is made into 08 0.3 * 30 ° of (blades of 12.7 * 12.7 * 4.76mm) of international standard shape SNGN1204, after aforementioned (2) described technology cleaning, with MEVVA II A-H type high current ion source implanter, at ion source and sample interval is that 60cm, acceleration voltage 60kV, ion implantation incident angle (ionic fluid and sample table normal) are under 50 ° of corner conditions, keeps system vacuum 6.0 * 10
-4Below the Pa, the control beam intensity is 8.0mA, injects 12 * 10 to each face of cutter in 8 hours
17Ions/cm
2Behind the chromium metal ion, the cutter nano hardness is brought up to 34.2GPa, and Young's modulus is brought up to 590GPa, and bending strength is brought up to 540MPa.At cutting speed v=400m/min, depth of cut a=0.5mm carries out machining to 40Cr steel (hardness HRC 53-64) under the depth of cut f=0.1mm/rev.When the cutter flank wear was 0.3mm, the Tool in Cutting distance improved about 10-12 doubly than original unmodified cutter after the modification.
Embodiment 3: Wimet is made into 08 0.3 * 30 ° of (blades of 12.7 * 12.7 * 4.76mm) of international standard shape SNGN1204, after aforementioned (2) described technology cleaning, with MEVVA II A-H type high current ion source implanter, at ion source and sample interval is that 50cm, acceleration voltage 30kV, ion implantation incident angle (ionic fluid and sample table normal) are under 50 ° of corner conditions, keeps system vacuum 8.0 * 10
-4Below the Pa, the control beam intensity is 2.0mA, injects 4.0 * 10 to each face of cutter in 20 hours
17Ions/cm
2Titanium metal ions.The cutter nano hardness is brought up to 24.5GPa, and Young's modulus is brought up to 520GPa, and bending strength is brought up to 1880MPa.At cutting speed v=400m/min, depth of cut a=0.5mm carries out machining to 40Cr steel (hardness HRC 53-4) under the depth of cut f=0.1mm/rev.When the cutter flank wear was 0.3mm, the Tool in Cutting distance improved about 8-10 doubly than original unmodified cutter after the modification.
Embodiment 4: zirconia ceramics is made into 08 0.3 * 30 ° of (blades of 12.7 * 12.7 * 4.76mm) of international standard shape SNGN1204, after aforementioned (2) described technology cleaning, with MEVVA II A-H type high current ion source implanter, at ion source and sample interval is that 60cm, acceleration voltage 40kV, ion implantation incident angle (ionic fluid and sample table normal) are under 50 ° of corner conditions, keeps system vacuum 8.0 * 10
-4Below the Pa, the control beam intensity is 4.0mA, injects 6.0 * 10 to each face of cutter in 20 hours
17Ions/cm
2The chromium metal ion.The cutter nano hardness is brought up to 23.1GPa, and Young's modulus is brought up to 320GPa, and bending strength is brought up to 1150MPa.Wear test shows that the zirconia ceramics material wear resistance after the modification significantly improves.
Claims (7)
1, the metal ion injection surface modification method of sintex is characterized in that, described method adopts intense beam stream Metal Ion Injection Technology that the cutter that cleaned is carried out surface modification according to specific processing condition implanting transition metal ion.
2, surface modifying method according to claim 1 is characterized in that, the ion of described injection is titanium, zirconium, chromium, molybdenum, tungsten.
3, surface modifying method according to claim 1 is characterized in that, described tool matrix is silicon nitride and composite silicon nitride, aluminum oxide and composite alumina, Wimet, titanium carbonitride, zirconium white and toughened zirconia ceramics.
4, surface modifying method according to claim 1 is characterized in that, the employed ion source of described ion implantation technique is an intense beam ion source.
5, surface modifying method according to claim 1, it is characterized in that, comprise in the described cutter cleaning cutter is carried out organic washing agent such as tap water, alcohol, alcohol-ultrasonic wave, high purity water-ultrasonic wave multistep cleaning successively, dry step, described organic washing agent is 1: the alcohol of 1-5: 1-4, kerosene and acetone three mixed solvents.
6, surface modifying method according to claim 1 is characterized in that, injects (0.5-25) * 10 in described sintex respectively
17Ions/cm
2Titanium, zirconium, chromium, molybdenum or tungsten transition metal ion in one or more.
7, surface modifying method according to claim 1 is characterized in that, described intense beam stream metal ion injection technology condition is acceleration voltage 20-120kV, system vacuum (1.0-8.0) * 10
-4Pa, beam intensity is 1.0-10.0mA, and ion implantation time 2-20 hour, ion implantation incident angle was 30-60 ° of angle, and ion source and sample interval are 40-120cm.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102248187A (en) * | 2011-06-02 | 2011-11-23 | 深圳市金洲精工科技股份有限公司 | Hard alloy cutter with diamond coating and preparation method thereof |
| CN102965635A (en) * | 2012-12-14 | 2013-03-13 | 西北有色金属研究院 | Processing method for improving toughness of hard film |
| CN108385074A (en) * | 2018-03-22 | 2018-08-10 | 深圳大学 | A kind of nitrogen method for implanting and its modified cutter, mold |
| CN108588636A (en) * | 2018-04-26 | 2018-09-28 | 山东大学 | A method of improving fragile material machining surface integrality |
| CN109503155A (en) * | 2018-12-26 | 2019-03-22 | 宁波泰科先进陶瓷有限公司 | A kind of ceramics hair-clippers blade and preparation method |
| CN114927632A (en) * | 2022-05-16 | 2022-08-19 | 湘潭大学 | Modified zinc metal sheet and preparation method and application thereof |
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| CN102230156A (en) * | 2011-06-21 | 2011-11-02 | 深圳市金洲精工科技股份有限公司 | Method for preparing composite hard coating on min-cutter and min-cutter |
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| US5252545A (en) * | 1987-07-14 | 1993-10-12 | The United States Of America As Represented By The United States Department Of Energy | Dense high temperature ceramic oxide superconductors |
| JPH107477A (en) * | 1996-06-19 | 1998-01-13 | Toshiba Corp | Protection coating film structure of ceramic part, gas turbine blade, ball bearing and inspection of coating film |
| CN1221715A (en) * | 1997-12-31 | 1999-07-07 | 中国科学院兰州化学物理研究所 | Surface treating method for improving ceramic surface lubrication abradability |
| CN1362537A (en) * | 2001-01-05 | 2002-08-07 | 李文英 | Metal foil and metal sheet with coated ceramic film or antioxidant metal film |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102248187A (en) * | 2011-06-02 | 2011-11-23 | 深圳市金洲精工科技股份有限公司 | Hard alloy cutter with diamond coating and preparation method thereof |
| CN102965635A (en) * | 2012-12-14 | 2013-03-13 | 西北有色金属研究院 | Processing method for improving toughness of hard film |
| CN102965635B (en) * | 2012-12-14 | 2014-11-12 | 西北有色金属研究院 | Processing method for improving toughness of hard film |
| CN108385074A (en) * | 2018-03-22 | 2018-08-10 | 深圳大学 | A kind of nitrogen method for implanting and its modified cutter, mold |
| CN108588636A (en) * | 2018-04-26 | 2018-09-28 | 山东大学 | A method of improving fragile material machining surface integrality |
| CN108588636B (en) * | 2018-04-26 | 2019-10-01 | 山东大学 | A method of improving fragile material machining surface integrality |
| CN109503155A (en) * | 2018-12-26 | 2019-03-22 | 宁波泰科先进陶瓷有限公司 | A kind of ceramics hair-clippers blade and preparation method |
| CN109503155B (en) * | 2018-12-26 | 2021-08-20 | 宁波泰科先进陶瓷有限公司 | Ceramic hair clipper blade and preparation method thereof |
| CN114927632A (en) * | 2022-05-16 | 2022-08-19 | 湘潭大学 | Modified zinc metal sheet and preparation method and application thereof |
| CN114927632B (en) * | 2022-05-16 | 2024-01-26 | 湘潭大学 | Modified zinc metal sheet and preparation method and application thereof |
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