CN1762641A - Laser micro-processing method and device based on liquid crystal mask technology - Google Patents

Laser micro-processing method and device based on liquid crystal mask technology Download PDF

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Publication number
CN1762641A
CN1762641A CN 200510094160 CN200510094160A CN1762641A CN 1762641 A CN1762641 A CN 1762641A CN 200510094160 CN200510094160 CN 200510094160 CN 200510094160 A CN200510094160 A CN 200510094160A CN 1762641 A CN1762641 A CN 1762641A
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China
Prior art keywords
laser
liquid crystal
control device
laser generator
astigmatic
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Pending
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CN 200510094160
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Chinese (zh)
Inventor
张永康
顾永玉
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Jiangsu University
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Jiangsu University
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Priority to CN 200510094160 priority Critical patent/CN1762641A/en
Publication of CN1762641A publication Critical patent/CN1762641A/en
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  • Laser Beam Processing (AREA)

Abstract

The invention relates to a method and device based on the liquid crystal technology laser surface trickle process in the field of surface trickle process. The device is formed by a laser generator and light guiding system, a laser generator controller, a light diffused system, a liquid crystal display screen and display controller, a focus system and unit holder system.

Description

A kind of laser micro-processing method and device based on the liquid crystal mask technology
Affiliated technical field:
The present invention relates to surperficial micro processing field, refer in particular to a kind of laser fine method for processing and device based on the liquid crystal mask technology.
Background technology:
Common laser surface Micrometer-Nanometer Processing Technology is to adopt fine laser beam irradiation surface of the work, and illuminated part material vaporization is evaporated, and forms certain pit.By Worktable control device workpiece is moved according to certain track,, finally make surface of the work reach desired microscopic appearance in surface of the work pointwise processing.This processing mode is inefficiency on the one hand, will work out corresponding program so that the control workpiece moves by certain track according to the arrangement mode of different Surface Machining points on the other hand.
The technology the most approaching with the present invention is the mask lithography technology.The shape that the mask lithography technology will be processed according to surface of the work is made corresponding mask, and laser shines surface of the work by the hole on the mask, and the shape of ablating out and needing.But when the processing dimension can produce diffraction phenomena when mask manufacture difficulty and laser are by mask very little the time, crudy is descended even can't process.
Summary of the invention:
The objective of the invention is to provide a kind of method and apparatus of laser surface microfabrication.It can process the microscopic appearance of arbitrary shape and dimension at surface of the work, need not to make corresponding mask respectively at different pit shapes and arrangement mode, and efficient is compared greatly raising with the pointwise ablation.
The invention is characterized in and utilize LCDs, pass through, do not need the place that processes with the protection surface of the work by the figure blocking laser that shows on the display screen as mask.
The device of implementing this method comprises laser generator, laser generator control device, astigmatic system, focusing system, the workpiece clamp system that links to each other successively, it is characterized in that being provided with between astigmatic system and focusing system LCDs and display image control device, wherein astigmatic system is made up of the convex lens of one group of concave lens and a slice deep camber; Focusing system comprises the concavees lens composition of one group of convex lens and a slice deep camber; Workpiece clamp system is connected in turn by workpiece, anchor clamps, workbench and Worktable control device.
Implementation process of the present invention is as follows:
1. the pit shape that will process according to surface of the work, size and arrangement mode are worked out the display graphics file of LCDs.
2. determine technological parameters such as laser spot diameter and energy according to surface of the work working position appearance and size and working depth.
3. regulate astigmatic system focal length according to laser energy and liquid crystal display damaging thresholding.
4. regulate the focusing system focal length according to surface of the work working position appearance and size.
5. by the laser pulse of laser generator control device control laser generator by the good parameter generating of optimization, shine on the liquid crystal display through astigmatic system, show on the liquid crystal display that visual position blocking laser passes through, making by the laser beam behind the display screen becomes the hollow out figure hot spot that becomes inverse relation with display image, shines surface of the work and ablates out needed figure pit.
6. the working depth that requires according to surface of the work can repeat to ablate, till reaching requirement.
The present invention is owing to adopt LCDs as mask, can show that arbitrary graphic is to adapt to difform Surface Machining, what display screen showed simultaneously is the amplification figure of working position shape, avoided the processing dimension too hour laser beam produce diffraction by mask and cause the defective that can't process, thereby more be applicable to and the surperficial microfabrication of small scale can obtain better surface microscopic topographic.
Description of drawings:
The invention will be further described below in conjunction with Fig. 1:
The schematic diagram that Fig. 1 proposes for the present invention based on the laser fine processing unit (plant) of liquid crystal mask.
1. part 9. anchor clamps 10. workbench 11. Worktable control devices 12. numerical control systems 13. computers on laser generator control device 2. laser generators 3. laser beams 4. astigmatic system 5. LCDs, 6. display screen control devices, 7. focusing systems 8.
The specific embodiment:
Describe the details and the working condition of the concrete device of the present invention's proposition in detail below in conjunction with accompanying drawing.
The device that the present invention carries out the laser surface microfabrication comprises laser generator control device 1, laser generator 2, astigmatic system 4, LCDs 5 and display screen control device 6, focusing system 7 and workpiece clamp system and the numerical control system 12, the computer 13 that link to each other with laser generator control device 1, display screen control device 6, Worktable control device 11.Wherein astigmatic system 4 is made up of the convex lens of one group of concave lens and a slice deep camber; Focusing system 7 is made up of the concavees lens of one group of convex lens and a slice deep camber; Workpiece clamp system comprises workpiece 8, anchor clamps 9, workbench 10 and Worktable control device 11.
The laser generator produce power is the laser pulse of 8~80 nanoseconds in 10~100 Jiao Er, duration, and the facular model of laser beam (3) can be various modes such as basic mode, multimode, and it is regulated and control by laser generator control device (1).The collimated laser beam that is produced by laser generator (2) is by astigmatic system, energy density reduces when being dispersed diameter change Datong District by the concavees lens in the astigmatic system, planoconvex lens is converged to the major diameter collimated light beam of low energy densities and shines on the LCDs (5) again, display screen (5) is showing the counter-rotating enlarged image of surface of the work working position shape, be that the figure of position on display screen that does not need on the workpiece to process shows black, need the position of processing to be colourless.Laser beam passes through behind the display screen because the blocking effect of screen shot, and the formation shape hollow out hot spot consistent with workpiece working position profile, pass through focusing system (7) then, be focused the convex lens focused light spot reduced in the system, energy density increases simultaneously, diverge to parallel hollow out hot spot with surface of the work working position consistent size through concavees lens again, shine workpiece (8) surface at last.The surface of the work material absorbs machining energy and produces the pit that vaporization, evaporation form required form, according to the processing of can repeatedly ablating of working depth difference.
Owing to adopt liquid crystal mask, can change shown figure arbitrarily, therefore processing difform surface crater does not need to make mask respectively, and flexibility is big, can adapt to the needs of different machining shapes.And once can carry out multiple spot processing, compare with pointwise ablation method, efficient greatly improves.Be the amplification figure of the pit shape that will process simultaneously because of what show on the display screen, laser beam during by liquid crystal mask not can because of dimension too abortion gain interest and penetrate, can obtain good processing effect.

Claims (2)

1. the laser surface fine machining method based on the liquid crystal mask technology is characterized in that utilizing LCDs as mask; By the laser pulse of laser generator control device control laser generator by the good parameter generating of optimization, shine on the liquid crystal display through astigmatic system, show on the liquid crystal display that visual position blocking laser passes through, making by the laser beam behind the display screen becomes the hollow out figure hot spot that becomes inverse relation with display image, shines surface of the work and ablates out needed figure pit.
2. laser surface microfabrication device based on the liquid crystal mask technology, comprise the laser generator control device (1), laser generator (2), astigmatic system (4), focusing system (7), the workpiece clamp system that link to each other successively, it is characterized in that being provided with LCDs (5) and display screen control device (6) between astigmatic system (4) and focusing system (7), wherein astigmatic system (4) is made up of the convex lens of one group of concave lens and a slice deep camber; Focusing system (7) comprises the concavees lens composition of one group of convex lens and a slice deep camber; Workpiece clamp system is connected in turn by workpiece (8), anchor clamps (9), workbench (10) and Worktable control device (11).
CN 200510094160 2005-08-31 2005-08-31 Laser micro-processing method and device based on liquid crystal mask technology Pending CN1762641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200510094160 CN1762641A (en) 2005-08-31 2005-08-31 Laser micro-processing method and device based on liquid crystal mask technology

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200510094160 CN1762641A (en) 2005-08-31 2005-08-31 Laser micro-processing method and device based on liquid crystal mask technology

Publications (1)

Publication Number Publication Date
CN1762641A true CN1762641A (en) 2006-04-26

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CN 200510094160 Pending CN1762641A (en) 2005-08-31 2005-08-31 Laser micro-processing method and device based on liquid crystal mask technology

Country Status (1)

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CN (1) CN1762641A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104625416A (en) * 2014-12-29 2015-05-20 北京理工大学 Method for electronic dynamic control of crystal silicon surface periodic micro-nano structures based on square hole assistance

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104625416A (en) * 2014-12-29 2015-05-20 北京理工大学 Method for electronic dynamic control of crystal silicon surface periodic micro-nano structures based on square hole assistance
CN104625416B (en) * 2014-12-29 2016-06-22 北京理工大学 Based on square hole auxiliary electron dynamic regulation crystal silicon surface periodic micro-nano structure method

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