CN1743965B - Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method - Google Patents
Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method Download PDFInfo
- Publication number
- CN1743965B CN1743965B CN 200510086552 CN200510086552A CN1743965B CN 1743965 B CN1743965 B CN 1743965B CN 200510086552 CN200510086552 CN 200510086552 CN 200510086552 A CN200510086552 A CN 200510086552A CN 1743965 B CN1743965 B CN 1743965B
- Authority
- CN
- China
- Prior art keywords
- photoresists
- printing ink
- environment
- friendly type
- remover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 70
- 238000000034 method Methods 0.000 title abstract description 33
- 230000001172 regenerating effect Effects 0.000 title description 5
- 238000007639 printing Methods 0.000 claims abstract description 84
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000002253 acid Substances 0.000 claims abstract description 27
- 239000004094 surface-active agent Substances 0.000 claims abstract description 25
- 239000003960 organic solvent Substances 0.000 claims abstract description 22
- 150000007513 acids Chemical class 0.000 claims abstract description 20
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 238000002360 preparation method Methods 0.000 claims abstract description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 23
- 230000003213 activating effect Effects 0.000 claims description 19
- 238000003756 stirring Methods 0.000 claims description 17
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- -1 phenmethylol Chemical compound 0.000 claims description 6
- 229920000053 polysorbate 80 Polymers 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 5
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 claims description 5
- 235000019800 disodium phosphate Nutrition 0.000 claims description 5
- 235000019832 sodium triphosphate Nutrition 0.000 claims description 5
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 3
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 3
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims description 3
- 241001272567 Hominoidea Species 0.000 claims description 3
- 239000005642 Oleic acid Substances 0.000 claims description 3
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004115 Sodium Silicate Substances 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 claims description 3
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 3
- 229910000397 disodium phosphate Inorganic materials 0.000 claims description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims description 2
- 239000012467 final product Substances 0.000 claims 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 12
- 238000001035 drying Methods 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 9
- 230000008929 regeneration Effects 0.000 description 8
- 238000011069 regeneration method Methods 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 235000010210 aluminium Nutrition 0.000 description 7
- 238000011010 flushing procedure Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000012749 thinning agent Substances 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical compound [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Detergent Compositions (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200510086552 CN1743965B (en) | 2005-09-30 | 2005-09-30 | Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200510086552 CN1743965B (en) | 2005-09-30 | 2005-09-30 | Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1743965A CN1743965A (en) | 2006-03-08 |
CN1743965B true CN1743965B (en) | 2010-05-05 |
Family
ID=36139384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200510086552 Expired - Fee Related CN1743965B (en) | 2005-09-30 | 2005-09-30 | Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method |
Country Status (1)
Country | Link |
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CN (1) | CN1743965B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101364056A (en) * | 2007-08-10 | 2009-02-11 | 安集微电子(上海)有限公司 | Detergent for photo resist |
CN101251722B (en) * | 2008-03-19 | 2011-06-29 | 曹学增 | Positive photoresist striping liquid and method for making the same |
CN102662312A (en) * | 2012-04-20 | 2012-09-12 | 陕西科技大学 | Cleaning fluid and cleaning method for light sensing coating on metal matrix poly styrene (PS) plate |
CN104195576A (en) * | 2014-09-10 | 2014-12-10 | 昆山欣谷微电子材料有限公司 | Dry etching cleaning and stripping protective liquid |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1031099A (en) * | 1987-04-07 | 1989-02-15 | 纳绍荣 | Stripping liquid for regenerating prepainted relief photosensitive plate |
CN1037366A (en) * | 1988-03-14 | 1989-11-22 | 南京师范大学 | Self-stripping metallic rust remover |
CN1320143A (en) * | 1998-10-01 | 2001-10-31 | 约翰逊商业贸易公司 | Concentrated stripper composition and method |
CN1507581A (en) * | 2001-05-21 | 2004-06-23 | 东进瑟弥侃株式会社 | Resist remover composition |
-
2005
- 2005-09-30 CN CN 200510086552 patent/CN1743965B/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1031099A (en) * | 1987-04-07 | 1989-02-15 | 纳绍荣 | Stripping liquid for regenerating prepainted relief photosensitive plate |
CN1037366A (en) * | 1988-03-14 | 1989-11-22 | 南京师范大学 | Self-stripping metallic rust remover |
CN1320143A (en) * | 1998-10-01 | 2001-10-31 | 约翰逊商业贸易公司 | Concentrated stripper composition and method |
CN1507581A (en) * | 2001-05-21 | 2004-06-23 | 东进瑟弥侃株式会社 | Resist remover composition |
Also Published As
Publication number | Publication date |
---|---|
CN1743965A (en) | 2006-03-08 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: LANGFANG DEVELOPMENT DISTRICT PURUITEK INDUSTRIAL Free format text: FORMER OWNER: SHI SHENQUAN Effective date: 20090403 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20090403 Address after: Hebei Development Zone, Langfang cuiqyin Road No. 29 post encoding: 065001 Applicant after: Langfang Development Zone Print Science&Industry Trade Co.,Ltd. Address before: Beijing city Fengtai District Changxindian Daxinzhuang Industrial Zone Puruite company post encoding: 100074 Applicant before: Shi Shenquan |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
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Owner name: SHI SHENQUAN Free format text: FORMER OWNER: LANGFANG PRINT TECHNOLOGY + TRADE CO., LTD. Effective date: 20141231 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20141231 Address after: 065001 Development Zone in Langfang City, Hebei Province Road No. 29 green Patentee after: Shi Shenquan Address before: 065001 Development Zone in Langfang City, Hebei Province Road No. 29 green Patentee before: Langfang Development Zone Print Science&Industry Trade Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100505 Termination date: 20180930 |
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CF01 | Termination of patent right due to non-payment of annual fee |