CN1731135A - Film stretching loading device under scanning microscopy environment and film distortion measurement method - Google Patents

Film stretching loading device under scanning microscopy environment and film distortion measurement method Download PDF

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CN1731135A
CN1731135A CN 200510086228 CN200510086228A CN1731135A CN 1731135 A CN1731135 A CN 1731135A CN 200510086228 CN200510086228 CN 200510086228 CN 200510086228 A CN200510086228 A CN 200510086228A CN 1731135 A CN1731135 A CN 1731135A
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film
microscope
stretching
electron beam
scanning electron
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CN100405040C (en
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李喜德
杨燕
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Tsinghua University
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Tsinghua University
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Abstract

The invention relates to a film-stretching loading device in scanning microscope environment and a film-deformation measuring method in the field of microscope scanning nondestructive inspection and precision machine. The device uses the designed mechanic structure, pressure ceramic driving system, force buffer system and so on which can do three-space location and angle adjustment to finish film deformation measuring on atom force scanning microscope and electron beam microscope detecting table. It can dose quantity detecting to deformation field of all region or localized region of the micro size film; the thickness of the detected film is from several micrometers to sub-micros; it can finish film original location and on line detecting under the high spacing resolution microscope atom force scanning microscope or electron beam scanning microscope environment combined with the double-exposure digital spot technique, the image related technique or micro-labeling technique.

Description

Film stretching charger and deformation of thin membrane measuring method under the scanning microscopy environment
Technical field
The invention belongs to the micro-Non-Destructive Testing of scanning and precision optical machinery field, particularly film charger and film micro area deformation detection method thereof under the scanning microscopy environment.
Background technology
Membraneous material and structure are the bases that constitutes microelectronic component (MEMS) and little electro-optical device (MEOS).Because MEMS requirement on devices film not only has good electricity, magnetic, light property, also requires the membrane structure in the device can bear mechanical load, transmission power and motion.Obviously, as the ingredient of micro element, membrane structure will participate in finishing sensing, processing and the execution function of micro element inevitably.Therefore any film that causes owing to environmental interaction lost efficacy, and all will influence micro element and reliability of structure.The distortion and the mechanism of fracture of research membraneous material and structure select all will have important significance for theories and engineering using value for the mechanical property of understanding membrane material self, the design of optimizing micro element, manufacturing and material.
As everyone knows, the mechanical property of membraneous material has than big-difference (owing to the yardstick of film, the structure of film, the unrelieved stress in the film etc.) with the mechanical property of the body material with identical chemical constitution, and therefore the direct detection to membraneous material and structure just seems particularly necessary.Yet because the special construction of film self (in thickness direction and face yardstick also more and more microscaleization), therefore traditional mechanics performance testing technology and equipment have been difficult to be directly used in micron and the deformation test of submicron thickness membraneous material and structure.The detection technique of current thin film material mainly contains indentation method (indentation), film bending method (film curving or film bending), eardrum method (bulge test), microstructure method (microstructure testing), uniaxial tension method (uniaxial tensile testing) etc.Wherein uniaxial tension is the most direct methods such as MEASUREMENTS OF THIN elastic modulus, Poisson ratio, yield strength and fracture strength.Because its theory of mechanics basis is simple and clear, there is not a too much prerequisite hypothesis, reduced the error that may cause because of theoretical treatment greatly, and the tension test operating process is simple, the performance index that can measure are many, and the test result versatility is good.But exist in the test clamping and bonding whether reliable uncertain, sample preparation with install in the micromechanics damage that may cause in detection, can't know, the sample axis with whether stretching boresighting can't be determined, because specimen length is very short usually, its effective elongation when stretching is difficult to direct measurement etc.In addition, above-mentioned measurement mostly is macroscopic measurement or carries out that this obviously can not satisfy the requirement that present microscale field is detected thin film mechanical performance under optical microscope.
Summary of the invention
The objective of the invention is based at present the high-space resolution of widespread use scan micro-platform: i.e. atomic force flying-spot microscope (AFM) and scanning electron beam microscope (SEM), provide two covers to be applicable to the microscale film micro area film uniaxial tension charger and the little deformation measurement method of film micro area thereof of AFM and SEM high-space resolution scanning circumstance respectively, and be used for deformation detection and the mechanics property analysis of micron to the submicron thickness film.
The objective of the invention is to be achieved through the following technical solutions:
A kind of based on the film stretching charger under the atomic force flying-spot microscope environment, it is characterized in that: this device comprises support and retained part, position and angle-adjusting mechanism, drive system and tensile load test section, described support and retained part comprise substrate, be arranged on and carry out the dovetail sliding axle that y adjusts to the position in the substrate, the film web joint, film connects drawing stand, described film web joint moves at dovetail sliding axle upper edge y axle, one end of tested film is connected with this web joint, and its other end is connected on the drawing stand; Described position and angle adjusting part branch comprise and are arranged on suprabasil position and angular setting frame, are arranged on suprabasil x direction dovetail sliding axle; Described drive part contains the direct current programmable power supply, by piezo-ceramic micro displacement unit that this power supply drove and the back-moving spring that is positioned at the piezo-ceramic micro displacement unit both sides, wherein an end of piezo-ceramic micro displacement unit and back-moving spring be arranged on suprabasil clamping plate and be connected, the other end is connected with slide plate, this slide plate is connected to the dovetail sliding axle with x by screw rod, promote slide plate by piezo-ceramic micro displacement unit, and drive screw rod and x realizes the film unilateral stretching to the dovetail sliding axle, extension spring make slide plate in motion process steadily and playback when unloading; Beryllium-bronze dynamometry elastic beam is contained in described tensile load test section, and beryllium-bronze dynamometry elastic beam two ends are fixed on described position and the angular setting frame.
Position described in the present invention comprises logical former and later two flat aluminium alloy plates that are connected by back-moving spring with the angular setting frame, z is to sliding axle, z to fine adjustment screw be arranged on before be connected cross bar on the flat board, one jiao of place between described two flat boards supports with steel ball, and another diagonal position penetrates rear plate with fine adjustment screw and withstands on the preceding flat board; Rear plate is fixed or is moved to sliding axle along z, and this z links together to the dovetail sliding axle to sliding axle and x, and z penetrates rear plate to fine adjustment screw and withstands on the connection cross bar; Preceding flat board and rear plate are by fastening board and lock screw locking.
The invention provides a kind of the utilization and describedly carry out the method that deformation of thin membrane is measured, it is characterized in that this method carries out as follows based on the film stretching charger under the atomic force flying-spot microscope environment:
1) tested film is clamped in respectively on web joint and the drawing stand at optical microscope lower edge stretching axis earlier, and obtaining straight film clamping by position and angular setting frame, the film stretching charger that will load then under the atomic force flying-spot microscope environment of film is put into atomic force flying-spot microscope detection platform;
2) adjust detection platform position, imaging, the sweep parameter of atomic force scanning microscope system and make it be in detected state, the drive system of utilizing the film stretching charger under the atomic force flying-spot microscope environment then is to film test piece stretching loading, and simultaneously by atomic force flying-spot microscope scanning imagery, and the sequence deformation pattern of recording sheet surveyed area;
3) the sequence deformation pattern to gained carries out the digital picture correlation analysis respectively, the double-exposure digital speckle is analyzed or little labelling method analysis, the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting the dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film;
4) utilize the tensile load of acquisition and the deformation values of film, obtain the calculating of force-displacement curve, stress-strain curve and Young modulus.
It is a kind of based on the film stretching charger under the scanning electron beam microscope environment that the present invention also provides, it is characterized in that: this device comprises support and retained part, position and angle-adjusting mechanism and tensile load test section, described support and retained part comprise the substrate of power buffering, be used for y to two vertical reeds adjusting, the micrometric displacement adjustment rack, web joint that is connected with tested film stiff end and the drawing stand that is connected with tested film free end, power cushions described two the vertical reeds of suprabasil pressing plate and the buffering substrate fuses by being arranged on; Described micrometric displacement adjustment rack is connected the top of vertical reed, and this micrometric displacement adjustment rack is connected with web joint; The power of being arranged on that comprises described position and angle-adjusting mechanism cushions suprabasil position and angular setting frame, and the power of being arranged on cushions suprabasil x direction dovetail sliding axle; Titanium alloy dynamometry elastic beam is contained in described tensile load test section, and these titanium alloy dynamometry elastic beam two ends are fixed on described position and the angular setting frame.
The invention provides a kind of the utilization and describedly carry out the method that deformation of thin membrane is measured, it is characterized in that this method carries out as follows based on the film stretching charger under the scanning electron beam microscope environment:
1) tested film is clamped in respectively on web joint and the drawing stand at optical microscope lower edge stretching axis earlier, and obtain straight film clamping by position and angular setting frame, will having loaded film stretching charger under the scanning electron beam microscope environment of film then, to put into the vacuum detecting of scanning electron beam microscope indoor;
2) adjust detection platform position, imaging, the sweep parameter of scanning electron beam microscope system and it is under the detected state, utilize power buffering substrate on the film stretching charger under the auto-loading system stretching scanning electron beam microscope environment of scanning electron beam microscope to tested film uniaxial tension then, and film is carried out the sequence deformation pattern that the two-dimensional scan imaging obtains the film surveyed area by the focused beam of scanning electron beam microscope;
3) the sequence deformation pattern to gained carries out the digital picture correlation analysis, the double-exposure digital speckle is analyzed or little labelling method analysis, the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting titanium alloy dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film;
4) utilize the tensile load of acquisition and the deformation values of film, promptly obtain the calculating of force-displacement curve, stress-strain curve and Young modulus value.
The present invention compared with prior art has the following advantages and the high-lighting effect: the technical scheme of this invention is to finish deformation of thin membrane by physical construction, Piezoelectric Ceramic system, power buffer system etc. that design can be carried out three-dimensional position and angular setting on atomic force flying-spot microscope and scanning electron beam microscope detection platform to measure.Compare with the tensile loading device under the existing optical microscope, the present invention developed based on the film stretching charger under the atomic force flying-spot microscope environment and measuring method and based on film stretching charger and measuring method under the scanning electron beam microscope environment, can carry out detection by quantitative to the universe of microscale film or the deformation field of regional area, detected film thickness from several microns to submicron thickness; Compare with existing disposable atomic force flying-spot microscope, little charger of scanning electron beam microscope environment measuring based on chip type, two kinds of pick-up units being invented can repeatedly use, and are fit to different-thickness and the membraneous material of yardstick and the deformation detection of structure.Use the stretching device of being developed in the detection, and can realize the film original position under high-space resolution mirror atomic force flying-spot microscope or the scanning electron beam microscope environment, online detection in conjunction with double-exposure digital speckle technology, image correlation technique or little labelling technique.
Description of drawings
Fig. 1: based on the front view of the tensile loading device under the atomic force flying-spot microscope testing environment.
Fig. 2: based on the vertical view of the tensile loading device under the atomic force flying-spot microscope testing environment.
Fig. 3: the front view of position and angle-adjusting mechanism.
Fig. 4: the vertical view of position and angle-adjusting mechanism.
Fig. 5: based on the front view of the tensile loading device under the scanning electron beam microscope testing environment.
Fig. 6: based on the vertical view of the tensile loading device under the scanning electron beam microscope testing environment.
Fig. 7: the atomic force flying-spot microscope scanning intensity map (coordinate unit is a micron among the figure) of iron nickel film surface.
Fig. 8: the SEM scanning intensity map on golden film surface.
Fig. 9: during atomic force flying-spot microscope tensile loading device stretching iron nickel film at the displacement field of draw direction (all data units are micron among the figure), corresponding voltage 0V~8V.
Figure 10: the displacement field vertical during atomic force flying-spot microscope tensile loading device stretching iron nickel film (all data units are micron among the figure), corresponding voltage 0-8V with draw direction.
Figure 11: during atomic force flying-spot microscope tensile loading device stretching iron nickel film at the displacement field of draw direction (all data units are micron among the figure), corresponding voltage 72V~82V.
Figure 12: the displacement field vertical during atomic force flying-spot microscope tensile loading device stretching iron nickel film (all data units are micron among the figure), corresponding voltage 72V~82V with draw direction.
Figure 13: when the scanning electron beam microscope tensile loading device stretches golden film the displacement field of draw direction (all arithemetic units are among the figure: micron, corresponding SEM load is 735N).
Figure 14: scanning electron beam microscope tensile loading device displacement field (in figure all arithemetic units be micron, corresponding SEM load be 735N) vertical when stretching golden film with draw direction.
Figure 15: double-exposure digital speckle field.
Figure 16: calculate the Young's Fringes that obtains through double-exposure digital speckle field, pairing film micro area displacement is 0.5 micron.
Figure 17: the correction spectrogram of Young's Fringes.
Figure 18: for atomic force flying-spot microscope environment down the film stretching charger and the film surface of gauge point method acquisition along the relation curve of draw direction displacement and driving voltage.
Figure 19: for the scanning electron beam microscope environment down the film stretching charger and the film surface of gauge point method acquisition along the relation curve of draw direction displacement and scanning electron beam microscope tensile load.
Embodiment
Below in conjunction with accompanying drawing principle, concrete structure and the deformation of thin membrane measuring method of film stretching charger under the scanning microscopy environment provided by the invention are done detailed explanation.
The film stretching charger: in order to adapt to atomic force flying-spot microscope (AFM) and scanning electron beam microscope (SEM) testing environment respectively, tensile loading device is two to overlap independently system, now introduces respectively:
(I). the film stretching charger under the atomic force flying-spot microscope environment
Film stretching charger under the atomic force flying-spot microscope environment designs according to Dimension 3100 atomic force flying-spot microscope test environments, this device comprises support and retained part, position and angle-adjusting mechanism, drive system and tensile load test section, described support and retained part comprise substrate 1, be arranged on and carry out the dovetail sliding axle 2 that y adjusts to the position in the substrate, film web joint 3, film connects drawing stand 5, described film web joint 3 moves at dovetail sliding axle upper edge y axle, one end of tested film is connected with this web joint, and its other end is connected on the drawing stand 5; Described position and angle adjusting part branch comprise and are arranged on suprabasil position and angular setting frame 7, are arranged on suprabasil x direction dovetail sliding axle 8; Described drive part contains the direct current programmable power supply, by piezo-ceramic micro displacement unit 10 that this power supply drove and the back-moving spring 14 that is positioned at the piezo-ceramic micro displacement unit both sides, wherein an end of piezo-ceramic micro displacement unit and back-moving spring be arranged on suprabasil clamping plate 9 and be connected, the other end is connected with slide plate 12, this slide plate is connected to the dovetail sliding axle with x by screw rod 11, promote slide plate by piezo-ceramic micro displacement unit, and drive screw rod and x realizes the film unilateral stretching to the dovetail sliding axle, extension spring make slide plate in motion process steadily and playback when unloading; Beryllium-bronze dynamometry elastic beam 6 is contained in described tensile load test section, and beryllium-bronze dynamometry elastic beam two ends are fixed on described position and the angular setting frame 7.
Position described in the present invention comprises logical former and later two flat aluminium alloy plates 7a, the 7e that is connected by back-moving spring with angular setting frame 7, z is to sliding axle 7g, z to fine adjustment screw 7d be arranged on before be connected cross bar 7h on the flat board, one jiao of place between described two flat boards supports with steel ball 7c, another diagonal position penetrates rear plate 7e with fine adjustment screw 7j and withstands on the preceding dull and stereotyped 7a, can carry out the adjustment of pitching equal angles to preceding 7a flat board by adjusting fine adjustment screw like this.Rear plate 7e fixes or moves to sliding axle 7g along z, and this z links together to dovetail sliding axle 8 to sliding axle and x, and therefore preceding dull and stereotyped 7a and rear plate 7e can carry out the position adjustment at x and z direction.Z penetrates rear plate to fine adjustment screw 7d and withstands on the connection cross bar 7h, and z is to fine adjustment screw 7d and the combination adjustment that is connected cross bar 7h like this, and dull and stereotyped 7a rotates along tensile axis (x direction).As seen, can make by said mechanism before dull and stereotyped 7a along x to z to carrying out the position adjustment, along x axle, y axle and the rotation of z axle.Preceding dull and stereotyped 7a that adjusts at last and rear plate 7e can be by fastening board 7b and lock screw 7f lockings.Because beryllium-bronze dynamometry elastic beam 6 is connected with preceding dull and stereotyped 7a, natural beryllium-bronze dynamometry elastic beam also can carry out the rotation of identical position and angle.The position and the angle of the tested film that is connected with beryllium-bronze dynamometry elastic beam middle part also just can freely have been adjusted like this.
In said apparatus, tested film 4 one end applied film web joints 3 with can carry out the dovetail sliding axle 2 that y adjusts to the position and is connected, the other end is connected platform 5 connections with the film at beryllium-bronze dynamometry elastic beam 6 middle parts; Beryllium-bronze dynamometry elastic beam 6 two ends are fixed on position and the angular setting frame 7.Adjust and, therefore can adjust the film in clamping easily to the position because position and angular setting frame can carry out x direction and z along the anglec of rotation adjustment of three coordinate axis; The position is connected to dovetail sliding axle 8 with x to sliding axle 7g by z with the angular setting frame; Piezo-ceramic micro displacement unit 10 1 ends are fixed on the clamping plate 9 that are connected with substrate 1, its other end is connected to dovetail sliding axle 8 with x with screw rod 11 by slide plate 12, back-moving spring 14 1 ends that are positioned at the piezo-ceramic micro displacement unit both sides be fixed in suprabasil clamping plate 9 and be connected, the other end is connected with slide plate 12, and slide plate steadily and when unloading is playbacked in motion process.Tensile force is provided by piezo-ceramic micro displacement unit 10 during detection, and the deformation pattern of film surveyed area is by the imaging of atomic force flying-spot microscope.Owing to adopt piezo-ceramic micro displacement unit to provide little power to drive, so the loading system compact conformation, better linearity and higher displacement loading accuracy are arranged.The dovetail sliding axle that application site and angular setting frame and the y that is positioned at the substrate front end adjust to the position, the stretching loading system can allow film to carry out position and angular setting at three coordinate directions adding when holding, and this lays a good foundation for realizing real film unilateral stretching.In loading, use the direct current programmable power supply applies substep or continuous mode to piezo-ceramic micro displacement unit 10 voltage, make it along x to promoting slide plate 12, and slide plate drags screw rod 11 and makes x x take place to displacement to dovetail sliding axle 8, and drives the position simultaneously and the angular setting frame moves and make the distortion of beryllium-bronze dynamometry elastic beam generation three-point bending.This design provides axial tension load for tested film on the one hand, has provided little tensile force value on the other hand dexterously.
When the film stretching charger under the atomic force flying-spot microscope environment is worked, place it on the scanning platform of atomic force flying-spot microscope, utilize the atomic force flying-spot microscope that the high precision sweep record is carried out in the surface structure and the distortion of film.Its concrete measuring method is carried out as follows:
1) tested film is clamped in respectively on web joint and the drawing stand at optical microscope lower edge stretching axis earlier, and obtaining straight film clamping by position and angular setting frame, the film stretching charger that will load then under the atomic force flying-spot microscope environment of film is put into atomic force flying-spot microscope detection platform;
2) adjust detection platform position, imaging, the sweep parameter of atomic force scanning microscope system and make it be in detected state, the drive system of utilizing the film stretching charger under the atomic force flying-spot microscope environment then is to film test piece stretching loading, and simultaneously by atomic force flying-spot microscope scanning imagery, and the sequence deformation pattern of recording sheet surveyed area;
3) the sequence deformation pattern to gained carries out the digital picture correlation analysis respectively, the double-exposure digital speckle is analyzed or little labelling method analysis, the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting the dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film;
4) utilize the tensile load of acquisition and the deformation values of film, obtain the calculating of force-displacement curve, stress-strain curve and Young modulus
(II) the film stretching charger under the scanning electron beam microscope environment
Film stretching charger under the scanning electron beam microscope environment is film uniaxial loading and the film micro area device for detecting deformation (as Fig. 5, Fig. 6) that cooperates the superscanss-50 scanning electron beam microscope development of day island proper Tianjin company.This device comprises support and retained part, position and angle-adjusting mechanism and tensile load test section, described support and retained part comprise the substrate 15 of power buffering, be used for y to two vertical reeds 17 adjusting, micrometric displacement adjustment rack 18, web joint 53 that is connected with tested film stiff end and the drawing stand 55 that is connected with tested film free end, power cushions suprabasil pressing plate 16 described two vertical reeds and the buffering substrate fuses by being arranged on; Described micrometric displacement adjustment rack is connected the top of vertical reed, and this micrometric displacement adjustment rack is connected with web joint; The power of being arranged on that comprises described position and angle-adjusting mechanism cushions suprabasil position and angular setting frame 57, and the power of being arranged on cushions suprabasil x direction dovetail sliding axle 58; Titanium alloy dynamometry elastic beam 56 is contained in described tensile load test section, and these titanium alloy dynamometry elastic beam two ends are fixed on described position and the angular setting frame 57.
Because used superscan ss-50 scanning electron beam microscope carries the loading positioning system, the load range is 1kN, so the scanning electron beam microscope tensile loading device of design does not have drive part.But because the load that scanning electron beam microscope provides is too big, resolution is low, can not be directly used in the detection of low-dimensional film, therefore this device has designed the substrate 15 of power buffering as the power buffer portion, bear the load that the scanning electron beam microscope loading system provides, its physical dimension meets the requirement of scanning electron beam microscope loading system anchor clamps.Similar to atomic force scanning electron microscope stretching device, designed respectively at the two ends of power buffering substrate 15 and to be used for vertical reed 17 and position and the angular setting frame 57 that y adjusts to the position.The stiff end of tested film 4 is used web joint 53 and can be carried out the vertical reed-type micrometric displacement adjustment rack 18 of y to the position adjustment and be connected, and free end is connected with the drawing stand 55 of two fixed ends at titanium alloy dynamometry elastic beam 56 middle parts of position and angular setting frame 57; The position is connected with the dovetail sliding axle 58 that x adjusts to the position to adjusting sliding axle with the z of angular setting frame by it.Self can realize the loading procedure of displacement and Load Control the scanning electron beam microscope scanning system.By power buffering substrate 15 these structures power is passed to the detection film.In order to prevent that load buffering substrate deformation from surpassing its elastic range and destroy, but post its deformation range of strain transducer real time monitoring vertically at power buffering upper surface of substrate.
When the film stretching charger under the scanning electron beam microscope environment was worked, its measuring method was carried out as follows:
1) tested film is clamped in respectively on web joint 53 and the drawing stand 55 at optical microscope lower edge stretching axis earlier, and obtain straight film clamping by position and angular setting frame, will having loaded film stretching charger under the scanning electron beam microscope environment of film then, to put into the vacuum detecting of scanning electron beam microscope indoor;
2) adjust detection platform position, imaging, the sweep parameter of scanning electron beam microscope system and it is under the detected state, utilize power buffering substrate on the film stretching charger under the auto-loading system stretching scanning electron beam microscope environment of scanning electron beam microscope to tested film uniaxial tension then, and film is carried out the sequence deformation pattern that the two-dimensional scan imaging obtains the film surveyed area by the focused beam of scanning electron beam microscope;
3) the sequence deformation pattern to gained carries out the digital picture correlation analysis, the double-exposure digital speckle is analyzed or little labelling method analysis, the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting titanium alloy dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film;
4) utilize the tensile load of acquisition and the deformation values of film, promptly obtain the calculating of force-displacement curve, stress-strain curve and Young modulus value.
No matter be that film stretching charger or the film stretching charger of using under the atomic force flying-spot microscope environment under the scanning electron beam microscope environment carries out the thin film mechanical performance detection, what obtained is the gray-coded image that forms based on surface profile or reflecting electron beam, specifically, what we obtained for the film stretching charger under the atomic force flying-spot microscope environment is the micromorphology figure or the title height map in thin film micro-zone territory before and after being out of shape by microprobe scane, see Fig. 7, and show to be similar to intensity image gray mode; To the film stretching charger under the scanning electron beam microscope environment then mainly is by the electron beam scanning film surface, receives secondary electron or back reflection electronic image and obtains the film image, and show in the mode of gray-scale intensity image, sees Fig. 8.For deformation of thin membrane, no matter be atomic force flying-spot microscope image or scanning electron beam microscope image, when film surface distortion or motion hour, these images of representing with gray scale can characterize the motion and the distortion of imaging film micro area membraneous material fully.So ask the problem of film movement, distortion to carry out Flame Image Process, thereby detect the motion and the distortion of this image with regard to the gray level image that converts to obtaining.
Usually for the motion of intensity image and deformation recognition and calculating multiple mode is arranged, in two designed covering devices of the present invention, thin film micro-zone territory motion and the detection of distortion can distinguish that the Applied Digital image is relevant, any method in double-exposure digital speckle and three kinds of methods of little labelling method, the displacement and the distortion in calculating thin film micro-zone territory.
The digital picture correlation method
Digital image technology is handled to be the degree of correlation of two width of cloth intensity images before and after the distortion, and judges the shift position in relevant subarea thus, and main mathematical relation is:
If before and after the distortion two width of cloth images be respectively f (x, y) and g (x, y), then its dependent field C (u v) is defined as:
C ( u , v ) = ∫ ∫ S f ( x , y ) g ( x + u , y + v ) dxdy - - - ( 1 )
U in the following formula, v can represent the correlation space coordinate figure, and S is the related operation subarea, and the two-dimensional cells territory that has the rigid motion characteristic in the common desirable deformed region is relevant subarea.(1) shows that v value promptly is the mobile position coordinates in subarea S distortion back as relevant pairing u when getting extreme value.Therefore carry out above-mentioned computing for the pairing intensity image of whole film micro area, can obtain the whole audience motion and the deformation distribution of this film micro area.
The product kernel mode of (1) formula can be transformed into other different associative mode usually in actual applications, subtracts each other kernel normal form, subtracts each other square kernel normal form etc. as absolute value.When COMPUTER CALCULATION, (1) uses its discrete digital normalization mode usually:
C ( i , j ) = Σ ( m , n ) ∈ S [ f ( m , n ) g ( m + i , n + j ) ] / Σ ( m , n ) ∈ S f 2 ( m , n ) Σ ( m , n ) ∈ S g 2 ( m + i , n + j ) - - - ( 2 )
Wherein, m, n, i, j is integer, and (m, n) ∈ S.
The deformation field that Fig. 9 to Figure 14 is respectively the 1.5 μ m thick iron nickel films that obtained by correlation technique and the tested film micro area of the thick proof gold film of 5 μ m distributes.
Double-exposure digital speckle method
Double-exposure digital speckle analytical approach and traditional optics speckle double-exposure method are similar substantially.Replacing with digital device on the basis of holographic plate document image, replacing double-exposure to analyze the displacement that light path is come computed image with computing machine or other digital devices.The specific algorithm of double-exposure digital speckle is as follows:
If f (x, y) and g (x y) is pairing speckle field bins before and after the measured surface distortion, continuity according to optical imagery in medium and small bin hypothesis of the relevant metering of speckle and the non-individual body motion, when enough hour of the region area of bin, the approximate rigid motion of the S of facet unit, that is:
g(x,y)=f(x-u,y-v) (3)
With two width of cloth figure additions, obtain (corresponding Figure 13):
I(x,y)=f(x,y)+g(x,y)=f(x,y)+f(x-u,y-v) (4)
Result after the addition is carried out the two-dimensional fourier transform first time
H ( ω x , ω y ) = ∫ ∫ S [ f ( x , y ) + f ( x - u , y - v ) ] exp [ - j 2 π ( xω x + y ω y ) ] dxdy - - - ( 5 )
= F ( ω x , ω y ) [ 1 + e - i ( ω x u + ω y v ) ]
It composes absolute value:
| H ( ω x , ω y ) | = 2 | F ( ω x , ω y ) | | cos ( ω x u + ω y v ) 2 | - - - ( 6 )
(6) formula promptly is equivalent to the Young fringe field that common double-exposure speckle field obtains, and sees Figure 16.Can determine the regional shift value u that asks, v by this formula.Following formula also can further be handled:
Because: | cos ( ω x u + ω y v ) 2 | ≈ 2 3 π { 1 + 4 cos 2 ( ω x u + ω y v ) 2 } = 2 π { 1 + 2 3 cos ( ω x u + ω y v ) }
So (6) formula can be written as:
| H ( ω x , ω y ) | = 4 π | F ( ω x , ω y ) | [ 1 + 2 3 cos ( ω x u + ω y v ) ] - - - ( 7 )
The Fourier conversion that tries again has to (7) represented fringe field:
G ( ξ , η ) = A ( ξ , η ) + 2 3 A ( ξ - u , η - v ) + 2 3 A ( ξ + u , η + v ) - - - ( 8 )
Wherein G (ξ η) is | H (ω x, ω y) | the Fourier conversion, (ξ η) is A The Fourier conversion.(ξ is that a position is at the former some spike function of coordinate η) to A.Like this, A (ξ η) just has three peaks, (0,0), (u, v) and (u ,-v).Can very accurately by identification local maximum find spike by computing machine this moment, thereby obtain u, v, and this results are shown in Figure 17.
Little labelling method
Little labelling method is the gauge point of tracing observation and record during as experiment with spot test specimen surface nature or manual manufacture or line, and studies the displacement or the distortion situation of test specimen with this.Wherein little gauge point can select for use single-point also can select array or two-dimensional marker point at random for use, and single marker pip displacement can be in order to represent the average displacement of test specimen, and array or random labelling point then can be to whole audience displacement and the capable detections of district's position shift-in.The principle that gauge point is used for displacement and deformation measurement is mainly gauge point Position Tracking technology and two-dimentional whole audience digital correlation technology.Wherein the Position Tracking technology adopts image processing method to calculate the position coordinates of distortion front and back gauge point, and then the displacement of gauge point before and after can determining to be out of shape by the simple mathematical computing, and then multiply by displacement and the deformation values that image magnification factor can obtain body surface position, gauge point place.The Position Tracking technology is mainly used in single gauge point, limited quantity gauge point and arrays of indicia point.And for two random labelling points, then can adopt digital picture correlation technique or the double-exposure digital speckle technology above mentioned, speckle field random labelling field before and after this is equivalent to distortion before and after distortion during its related operation.Detection principle about these two kinds of technology is same as above, does not repeat them here.Figure 18 and Figure 19 be respectively with atomic force flying-spot microscope environment down the film stretching charger and the film stretching charger under the scanning electron beam microscope environment, the detection film surface of incorporation of markings point methods acquisition is along the relation of draw direction displacement and driving voltage, tensile load.
Embodiment: the film stretching charger under the atomic force flying-spot microscope environment is used for film stretching charger under iron nickel film stretching deformation detection and the scanning electron beam microscope environment and is used for the proof gold film and advances stretcher strain and detect
Use two kinds of films that the present invention developed and detect tensile loading device, deformation field detection by quantitative to the film whole audience or regional area, detected film thickness can be from several microns to submicron thickness, the displacement detecting high precision that can provide and some parameters are chosen as: wherein for the film stretching charger under the atomic force flying-spot microscope environment, system adopts piezo-ceramic micro displacement unit to drive, voltage is differentiated 0.1V, corresponding displacement accuracy is 0.0245 μ m, the displacement range is 42.6 μ m, the size of used beryllium-bronze dynamometry elastic beam is 20mm * 2mm * 0.09mm, corresponding elasticity coefficient is K=0.411mN/ μ m, its available maximum load is 17.5mN, detect its flexural deformation by optical fibre displacement sensor, can obtain the load precision of 10 μ N; For tensile loading device under the scanning electron beam microscope environment, adopted the substrate of load buffering, carry at scanning electron beam microscope that the maximum flexibility tensile load is 760N under the stretching of tensioning system, corresponding displacement is 18.9 μ m, the elasticity coefficient of used 20mm * 2mm * 0.26mm titanium alloy dynamometry elastic beam is K=3.549mN/ μ m, its available maximum load is 67.08mN, detects its flexural deformation by optical fibre displacement sensor, can obtain the loadometer accuracy of measurement of 0.88mN.Use double-exposure digital speckle technology in the detection, or image correlation technique or little labeling method, realize original position, the online detection of high-space resolution scanning phase micro mirror.
In the experiment, film stretching charger under the utilization atomic force flying-spot microscope environment has carried out the uniaxial tension experiment to the thick iron nickel of 1.5 μ m film, Fig. 7 is the atomic force scnning micrograph of iron nickel film, and wherein, film test piece is of a size of 322 μ m * 63 μ m * 1.5 μ m.Material is the micron thickness film that forms by electro-plating method.What detect in the experiment is under the unilateral stretching condition, axial little distortion of film, and the surveyed area size is: 10 μ m * 10 μ m.According to measuring method provided above, testing process is: 1) tested film is clamped in respectively on web joint 3 and the drawing stand 5 at optical microscope lower edge stretching axis earlier, and obtaining straight film clamping by position and angular setting frame, the film stretching charger that will load then under the atomic force flying-spot microscope environment of film is put into atomic force flying-spot microscope detection platform; 2) adjust detection platform position, imaging, the sweep frequency of atomic force scanning microscope system and make it be in detected state, and the probe that makes the atomic force scanning electron microscope is in central area that film detects, pin then, film surface is attempted scanning, scanning area is set at 1 μ m * 1 μ m earlier, then according to surface condition moving atomic force flying-spot microscope detection platform and enlarge sweep limit, seek comparatively smooth, the sweep limit big regional (see figure 7) of can trying one's best; 3) drive source of setting piezo-ceramic micro displacement unit drives step-length (as step-length 2.5V), measure, promptly scan the atomic force scanning micro-image in the tested zone of a width of cloth film and be stored in calculator memory, increase driving voltage scan image more then, finish up to deformation of thin membrane so repeatedly; 4) correlation analysis of sequence deformation pattern Applied Digital image, the double-exposure digital speckle of gained are analyzed or little labelling method analysis the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting the dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film.
Film stretching charger under the applying electronic bundle flying-spot microscope environment has also carried out the uniaxial tension experiment to the thick proof gold film of 5 μ m, and Fig. 8 is the scanning electron beam microscope scanned photograph of proof gold film, and wherein, film test piece is of a size of 1.11mm * 154 μ m * 5 μ m.The micro-meter scale thickness thin film of material for forming by the heat deposition method.In the experiment, power is cushioned substrate to be stuck in the scanning electron beam microscope loading system anchor clamps, increase along with load, the substrate of power buffering deforms, make the titanium alloy dynamometry elastic beam that is fixed on its two ends and film stiff end web joint apart from increase, thereby realize purpose the axial loading of film test piece.Surveyed area size in the experiment is: 200 μ m * 150 μ m.The situation of the film stretching charger under testing process and the atomic force scanning electron microscope environment is identical, has just used this moment elasticity better and be difficult for the titanium alloy dynamometry elastic beam of discharge in the film stretching charger under the scanning electron beam microscope environment.The load step-length of scanning electron beam microscope tensile loading device is set at 10N, and image is once write down in every loading one time, stops experiment during to 735N until SEM self loading system tensile load.Image is relevant with digital picture to obtaining at last, digital speckle double-exposure or little labelling method are handled image, and the displacement field that obtains the film regional area distributes, as Figure 13 to shown in Figure 14.

Claims (5)

1. one kind based on the film stretching charger under the atomic force flying-spot microscope environment, it is characterized in that: this device comprises support and retained part, position and angle-adjusting mechanism, drive system and tensile load test section, described support and retained part comprise substrate (1), be arranged on and carry out the dovetail sliding axle (2) that y adjusts to the position in the substrate, film web joint (3), film connects drawing stand (5), described film web joint (3) moves at dovetail sliding axle upper edge y axle, one end of tested film is connected with this web joint, and its other end is connected on the drawing stand (5); Described position and angle adjusting part branch comprise and are arranged on suprabasil position and angular setting frame (7), are arranged on suprabasil x direction dovetail sliding axle (8); Described drive part contains the direct current programmable power supply, by piezo-ceramic micro displacement unit (10) that this power supply drove and the back-moving spring (14) that is positioned at the piezo-ceramic micro displacement unit both sides, wherein an end of piezo-ceramic micro displacement unit and back-moving spring be arranged on suprabasil clamping plate (9) and be connected, the other end is connected with slide plate (12), this slide plate is connected to the dovetail sliding axle with x by screw rod (11), promote slide plate by piezo-ceramic micro displacement unit, and drive screw rod and x realizes the film unilateral stretching to the dovetail sliding axle, extension spring make slide plate in motion process steadily and playback when unloading; Beryllium-bronze dynamometry elastic beam (6) is contained in described tensile load test section, and beryllium-bronze dynamometry elastic beam two ends are fixed on described position and the angular setting frame (7).
2. described based on the film stretching charger under the atomic force flying-spot microscope environment according to claim 1, it is characterized in that: described position comprises logical former and later two flat aluminium alloy plates (7a, 7e) that are connected by back-moving spring with angular setting frame (7), z is to sliding axle (7g), z to fine adjustment screw (7d) be arranged on before be connected cross bar (7h) on the flat board, one jiao of place between described two flat boards supports with steel ball (7c), and another diagonal position penetrates rear plate (7e) with fine adjustment screw (7j) and withstands on the preceding flat board (7a); Rear plate (7e) is fixing or mobile to sliding axle (7g) along z, and this z links together to dovetail sliding axle (8) to sliding axle and x, and z penetrates rear plate to fine adjustment screw (7d) and withstands on the connection cross bar (7h); Preceding dull and stereotyped (7a) and rear plate (7e) are by fastening board (7b) and lock screw (7f) locking.
3. one kind is utilized and as claimed in claim 1ly carries out the method that deformation of thin membrane is measured based on the film stretching charger under the atomic force flying-spot microscope environment, it is characterized in that this method carries out as follows:
1) tested film is clamped in respectively on web joint (3) and the drawing stand (5) at optical microscope lower edge stretching axis earlier, and obtaining straight film clamping by position and angular setting frame, the film stretching charger that will load then under the atomic force flying-spot microscope environment of film is put into atomic force flying-spot microscope detection platform;
2) adjust detection platform position, imaging, the sweep parameter of atomic force scanning microscope system and make it be in detected state, the drive system of utilizing the film stretching charger under the atomic force flying-spot microscope environment then is to film test piece stretching loading, and simultaneously by atomic force flying-spot microscope scanning imagery, and the sequence deformation pattern of recording sheet surveyed area;
3) the sequence deformation pattern to gained carries out the digital picture correlation analysis respectively, the double-exposure digital speckle is analyzed or little labelling method analysis, the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting the dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film;
4) utilize the tensile load of acquisition and the deformation values of film, obtain the calculating of power-displacement curve, stress-strain curves and Young modulus.
4. one kind based on the film stretching charger under the scanning electron beam microscope environment, it is characterized in that: this device comprises support and retained part, position and angle-adjusting mechanism and tensile load test section, described support and retained part comprise the substrate (15) of power buffering, be used for y to two vertical reeds (17) of adjusting, micrometric displacement adjustment rack (18), web joint (53) that is connected with tested film stiff end and the drawing stand (55) that is connected with tested film free end, power cushions described two the vertical reeds of suprabasil pressing plate (16) and the buffering substrate fuses by being arranged on; Described micrometric displacement adjustment rack is connected the top of vertical reed, and this micrometric displacement adjustment rack is connected with web joint; The power of being arranged on that comprises described position and angle-adjusting mechanism cushions suprabasil position and angular setting frame (57), and the power of being arranged on cushions suprabasil x direction dovetail sliding axle (58); Titanium alloy dynamometry elastic beam (56) is contained in described tensile load test section, and these titanium alloy dynamometry elastic beam two ends are fixed on described position and the angular setting frame (57).
5. one kind is utilized and as claimed in claim 4ly carries out the method that deformation of thin membrane is measured based on the film stretching charger under the scanning electron beam microscope environment, it is characterized in that this method carries out as follows:
1) tested film is clamped in respectively on web joint (53) and the drawing stand (55) at optical microscope lower edge stretching axis earlier, and obtain straight film clamping by position and angular setting frame, will having loaded film stretching charger under the scanning electron beam microscope environment of film then, to put into the vacuum detecting of scanning electron beam microscope indoor;
2) adjust detection platform position, imaging, the sweep parameter of scanning electron beam microscope system and it is under the detected state, utilize power buffering substrate on the film stretching charger under the auto-loading system stretching scanning electron beam microscope environment of scanning electron beam microscope to tested film uniaxial tension then, and film is carried out the sequence deformation pattern that the two-dimensional scan imaging obtains the film surveyed area by the focused beam of scanning electron beam microscope;
3) the sequence deformation pattern to gained carries out the digital picture correlation analysis, the double-exposure digital speckle is analyzed or little labelling method analysis, the deformation values of surveyed area when obtaining film stretching; Meanwhile the deflection value by detecting titanium alloy dynamometry elastic beam and be multiplied by the elastic constant of demarcating in advance promptly obtains little tensile load of film;
4) utilize the tensile load of acquisition and the deformation values of film, promptly obtain the calculating of power-displacement curve, stress-strain curves and Young modulus value.
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