CN1708365A - Equipment and method for washing parts - Google Patents
Equipment and method for washing parts Download PDFInfo
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- CN1708365A CN1708365A CNA2003801020750A CN200380102075A CN1708365A CN 1708365 A CN1708365 A CN 1708365A CN A2003801020750 A CNA2003801020750 A CN A2003801020750A CN 200380102075 A CN200380102075 A CN 200380102075A CN 1708365 A CN1708365 A CN 1708365A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Equipment and a method for washing parts, the device for washing a washed object in a washing container (4) assembled in a circulating line (3) for cleaning solvent (1) with the cleaning solvent (1) forcibly allowed to circulate in the washing container (4) comprising a washed object holding means for holding the washed object so that the passing direction of minute through-holes of the washed object becomes the same or nearly same direction as the flowing direction of the cleaning solvent (1) so that a high-pressure cleaning solvent flow can be passed through the through-holes; the method comprising the steps of alternately performing an ultrasonic washing and a high-pressure washing passing the high-pressure cleaning solvent flow in the through-holes of the washed object or simultaneously performing the ultrasonic washing and the high-pressure washing.
Description
Technical field
The present invention relates to the cleaning method and the cleaning device of the precision component that forms by pottery, glass and metal etc.In more detail, relate to and be used for removing cleaning method and cleaning device with abrasive material (abrasive particle), particle and the burr of surface after grinding (grinding) operation of the Precision Machining part headed by sleeve pipe (Off エ Le one Le) and the combined sleeve (cutting り ス リ one Block) (below, be called the cover tubing) and through hole inside by cleaning fluid.
Background technology
Under the situation of Precision Machining parts such as the atomizer of making the cover tubing of optical connector, engine, entry needle, need grinding step repeatedly, each grinding step is all needed to carry out cleaning by degreasing, the abrasive material of lapping liquid, the removal of particulate species.This be because, because the kind of employed lapping liquid and abrasive material is different in each grinding step, therefore when bringing lapping liquid composition and abrasive material into subsequent processing, for example, can produce can not removing and causing the cleaning by degreasing undesirable conditions such as difficulty that become of the attrition process that causes by the mixing of variety classes abrasive material abrasive material bad, that cause by the sintering of abrasive material by the mixing of lapping liquid.
In the past, by the cleaning method of the cover tubing that most of manufacturer adopted, be to be placed on the state on the special fixture or to take off and put into the state that cleans cage etc. from special fixture will overlapping tubing scatteredly, by cleanings (spy opens flat 11-47705 communique) such as ultrasonic cleaning equipment, brush formula cleaning device or the cleaning devices that sprays water with high pressure will overlap tubing.
If ultrasonic cleaning equipment, can a large amount of cover tubing of single treatment, but reason owing to the structure aspect that is cleaned thing, cleaning fluid is difficult to be impregnated into through hole inside, in addition, produce bubble easily because of cavitation effect, can not remove because accumulate in the bubble of the tapering part of cover tubing, so ultrasonic wave can't be propagated and become and can not clean.In addition, brush formula cleaning device, fragment wiry also can penetrate in the sleeve pipe sometimes, and cleaning method itself is existing problems just.In addition, the mode of spraying water with high pressure can be guaranteed cleaning to a certain degree, but has the problem of productive problem and cleaning fluid mist.Cleaning device so in the past can not all satisfy at aspects such as cleaning and productivitys.
In addition, now, usually be used in the alkaline series cleaning agent on the cleaning device, different with freon with the chlorine series solvent, so be not widely used in the cleaning of part because worry depletion of the ozone layer etc., but because undesirable aspect cleaning, so will clean the long time under high temperature, high concentration under the situation mostly, this just has the variety of issues such as part erosion of operation, stable zirconium oxides etc. such as operator's security, the neutralisation treatment of waste liquid.
And then in having the cover tubing of fine through hole, except retain abrasive material, lapping liquid and burr etc. easily in through hole, more little cleaning fluid in aperture and rinsing liquid just are difficult to be impregnated in the through hole more, clean the very difficulty that just becomes.Particularly, in the water system cleaning agent that uses bigger water (pure water) of surface tension and alkaline cleaner etc., this tendency becomes more remarkable, is not only cleaning, and rinsing and drying also need the long period.
The present invention proposes in view of this point, and its purpose is to provide a kind of cleaning device and cleaning method that can clean effectively with the part class of the precision component that has fine through hole headed by the cover tubing.
Summary of the invention
Cleaning device as a scheme of the present invention, be to utilize the cleaning fluid of compulsory circulation in aforementioned clean container to clean in the device that is cleaned thing in the clean container in the circulation line that is assembled into cleaning fluid, it is characterized in that, possessing the thing that is cleaned that will have fine through hole becomes the holding device that the mode of equidirectional or the direction approaching with it keeps with the liquid flow path direction of the perforation direction of this through hole and aforementioned cleaning fluid, and is constituted as high-pressure cleaning liquid stream and passes through in being cleaned the through hole of thing.
In addition, preferably constitute, be last chamber and following chamber with separating in the aforementioned clean container, flow into the aforementioned aforementioned cleaning fluid of going up in the chamber and mainly arrive aforementioned chamber down by the through hole that is cleaned thing by aforementioned holding device.
In addition, aforementioned holding device, preferably constitute possess the gap embed a plurality of maintenances be cleaned thing with recess and this maintenance of ratio of bottom of being arranged on this maintenances usefulness recess with the recess opening of path more, and the gap is embedded in the aforementioned through hole and the aforementioned opening connection that are cleaned thing of aforementioned maintenance with recess.
In addition, be preferably and possess the ultrasonic cleaning equipment that utilizes ultrasonic wave to clean to be cleaned thing.
Cleaning method as the part class of a scheme of the present invention is characterized in that, by the cleaning device of part class of the present invention, alternately carries out the high-pressure wash that ultrasonic wave cleans and high-pressure cleaning liquid stream is passed through repeatedly in being cleaned the through hole of thing.
Cleaning method as the part class of another form of the present invention is characterized in that, by the cleaning device of part class of the present invention, carries out the high-pressure wash that ultrasonic wave cleans and high-pressure cleaning liquid stream is passed through simultaneously in being cleaned the through hole of thing.
Description of drawings
Fig. 1 is the skeleton diagram of the cleaning device of expression embodiments of the present invention.
(a) is the plane of the stationary fixture of this device among Fig. 2, (b) is the cutaway view of this stationary fixture, (c) is the amplification view of this stationary fixture.
Fig. 3 is the cutaway view of the clean container of this device of expression.
Fig. 4 is the cutaway view of the clean container of this device of expression.
Fig. 5 is the cutaway view of the clean container of this device of expression.
Fig. 6 is the stereogram of basket of the stationary fixture of this device of expression.
Fig. 7 is the skeleton diagram of the cleaning device of expression another embodiment of the present invention.
Fig. 8 is the cutaway view of the clean container of this device of expression.
Fig. 9 is the figure of the matting of this device of expression.
Figure 10 represents the cutaway view of the clean container of this device.
Figure 11 represents the cutaway view of the clean container of this device.
Figure 12 is the skeleton diagram of the cleaning device of expression comparative example.
The specific embodiment
Below, with reference to the mode of description of drawings enforcement.
Below, present embodiment is described with reference to the accompanying drawings.
As from the flow chart in the integral body of roughly representing Fig. 1 clearly illustrates that, the cleaning device of part class, possess the liquid bath 2 that stores cleaning fluid 1, between the liquid outlet 2a of liquid bath 2 and liquid return hole 2b, make the circulation line 3 of cleaning fluid 1 circulation and be set at clean container 4 that accommodating of circulation line 3 be cleaned thing midway and liquid-feeding pump 5 that forced circulation is used, just can be implemented in thus and cleaning fluid 1 is longitudinally circulated and clean the method that is cleaned thing (below, be called the through type ablution).Moreover, as the through type ablution, used the directly comparatively suitable of straight-through (ダ イ レ Network ト パ ス) cleaning device (No. the 2621800th, waste river chemical industry (limited), trade name, patent) by cleaning method.
Spread all over the full fixture mount 12 that is provided with allly on the internal face of the pars intermedia longitudinally of clean container 4, and upload in this fixture mount 12 and to put stationary fixture described later (holding device) 11, clean container 4 is divided into chamber 4a and following chamber 4b thus.The peripheral part of stationary fixture 11 contacts with fixture mount 12 with spreading all over full week, in addition, if the sealing that figure does not show is set, can prevent that then the cleaning fluid 1 of the last chamber 4a of clean container 4 from bleeding chamber 4b by aforementioned contact portion on this contact portion.In addition, in clean container 4, be provided with the inflow entrance 4c and the flow export 4d of cleaning fluid 1 as shown in Figure 3.
The inflow entrance 4c of the last chamber 4a of clean container 4 is connected on exhaust (vacuum) pipeline 6, and the flow export 4d of following chamber 4b is connected the loopback pipeline 10 that is used for cleaning fluid 1 is sent back to liquid bath 2.Exhaust (vacuum) pipeline 6 is provided with the vavuum pump that figure does not show, from circulation line 3 branches of the front of clean container 4 tributary pipeline 7 is arranged, and is provided with the filter that figure does not show in circulation line 3, and cleaning fluid 1 is all filtered by this filter.
Circulation line 3, tributary pipeline 7, exhaust (vacuum) pipeline 6 and loopback pipeline 10 are provided with valve V1～V4, carry out the switching of circulation line 3 and exhaust (vacuum) pipeline 6 by the switching manipulation of these valves V1～V4, in addition, by utilizing tributary pipeline 7 cleaning fluid 1 directly sent back to the Flow-rate adjustment in the liquid bath 2, just can control the interior pressure of clean container 4 and the rapid rising of the interior pressure of the clean container 4 that prevents to cause by liquid-feeding pump.Moreover clean container 4 is withstand voltage structure, and the upper end of clean container is equipped with the pressure gauge of the interior pressure that is used to monitor clean container 4 by lid 8 obturations on this lid 8.
In addition, on cleaning device, possess compressor, desiccant air blast and heater, the air-supply pipeline of circulation line, discharge opeing (liquid the is cut り) usefulness of liquid bath, the rinsing liquid of the rinsing liquid that figure do not show etc., circulation line and air-supply pipeline are connected on the clean container 4.Like this, cleaned be placed on the stationary fixture 11 be cleaned thing after, can in same clean container 4, carry out rinsing, discharge opeing and drying.
As shown in Figure 2, stationary fixture 11 is tabular, and be formed with a plurality of maintenances recess 11a that is used for movable fit sleeve pipe (being cleaned an example of thing) A, it is coniform that each keeps bottom with recess 11a to be formed, this bottom with than maintenance with recess 11a more the opening 11b of path be communicated with.In addition, on the both sides of stationary fixture 11, erect the handle that is provided with the word of falling U shape.
Moreover, as described later, so long as cleaning fluid 1 mainly arrives the such structure of following chamber 4b of clean container 4 by the through hole A1 of sleeve A, the shape of maintenance usefulness recess 11a and opening 11b and position etc. are unrestricted, for example, also can be set at can chimeric with gap a plurality of sleeve A in a maintenance usefulness recess 11a.
And, use among the recess 11a in the maintenance of stationary fixture 11 by the sleeve A movable fit that will have fine through hole A1, thereby sleeve A is erect maintenance, and the opening 11b of the through hole A1 of sleeve A and stationary fixture 11 is communicated with.Stationary fixture 11, so long as can bear the pressure differential of the last chamber 4a and the following chamber 4b of the clean container 4 that produces owing to the cleaning fluid of sending here by liquid-feeding pump 51, its material and structure limit especially.
In addition, stationary fixture 11 is supported by fixture mount 12, but when rigidity less with the contact area of fixture mount 12, stationary fixture 11 is low, just the worry that is made anchor clamps 11 breakages or distortion by the cleaning fluid 1 of high pressure is arranged.Therefore, can utilize supporting material reinforcement stationary fixture 11, perhaps increase the support area of fixture mount 12 in the mode of the wash liquid stream that do not hinder the through hole A1 by sleeve A.
Below, the cleaning method of the through hole A1 of sleeve A is described.Embed sleeve A in the maintenance of stationary fixture 11 in recess 11a, this stationary fixture 11 is positioned on the fixture mount 12 of clean container 4, close the lid 8 of clean container 4.Then, open valve V3, close other valve V1, V2, V4, make vavuum pump action and will clean container 4 in decompression.Then, shut off valve V3 only opens valve V4 and extracts cleaning fluid 1, opens valve V1, V2 then and makes liquid-feeding pump 5 actions.Like this, slow shut off valve V2 after liquid-feeding pump 5 becomes the steady running state, be shown as at pressure gauge 9 authorized pressure moment stop valve V2 closing motion and keep this state.Moreover, the pressure adjustment in the clean container 4, the revolution of motor that also can be by using convertor controls liquid-feeding pump 5 carries out.
Thus, cleaning fluid 1 is forced circulation in circulation line 3, in clean container 4 cleaning fluid 1 from chamber 4a by sleeve A through hole A1 and the opening 1b of stationary fixture 11 arrive under chamber 4b.At this moment, cleaning fluid 1, hardly can between the fixture mount 12 of stationary fixture 11 and clean container 4 and the maintenance of sleeve A and stationary fixture 11 pass through between with recess 11a.
Like this, cleaning fluid 1 mainly arrives the following chamber 4b of clean container 4 by the fine through hole A1 of sleeve A, therefore cleaning fluid 1 becomes high-pressure cleaning liquid stream and by in the through hole A1, thereby can wash away foreign matters such as oil content on the hole wall that sticks to through hole A1 and abrasive material.
Cleaned after the through hole A1 of sleeve A through the stipulated time, opened flow divider V2, after the interior drops of clean container 4, liquid-feeding pump 5 has been stopped.
In addition, can exciting be set on clean container 4 as shown in Figure 3 and hyperacoustic ultrasonic oscillator 21, use through type ablution and ultrasonic cleaning process in the lump.Ultrasonic oscillator 21 is set at the sidewall and the bottom of clean container 4 usually, is connecting ultrasonic oscillator on ultrasonic oscillator 21.As ultrasonic oscillator 21, can adopt the well-known device as magnetostriction type oscillator, electrostriction oscillator.Ultrasonic wave cleans, and at shut off valve V3, V4, opens valve V1, V2, carries out thereby liquid-feeding pump 5 actions are full of in clean container 4 under the state of cleaning fluid 1, and the time that ultrasonic wave cleans is in the front and back that make cleaning fluid 1 forced circulation.
Like this, if use through type ablution and the ultrasonic cleaning process that has used same clean container 4 in the lump, alternately implement two kinds of ablutions repeatedly, then cleaning efficiency improves, and can carry out the higher cleaning of cleaning degree with the short period.Particularly, on the hole wall of through hole A1, be attached with foreign matters such as particulate to be cleaned thing very effective.For example, penetrate under the situation of the abrasive material in the hole wall of through hole A1, make abrasive material after separating from the hole wall by ultrasonic wave, float over this abrasive material in the through hole A1 by the flushing of high-pressure cleaning liquid stream in cleaning.Thus, can shorten scavenging period.In addition, do not need to guarantee that ultrasonic wave cleans special-purpose space.Moreover, implement at the same time under the situation of two kinds of ablutions, because can clean through hole A1 simultaneously, so except high-pressure cleaning liquid, also adopt the not low ultrasonic cleaning equipment of cleansing power that is undertaken by ultrasonic wave by high-pressure cleaning liquid stream and ultrasonic wave.
Fig. 4～Fig. 6, expression is used basket 13,13A, 13B and stationary fixture 11 is housed in embodiment in the clean container 4.
Basket 13 shown in Figure 4 is formed tabular, upper face side at basket 13 is provided with the recess 13a that embedding has stationary fixture 11, bottom surface sections at this recess 13a is provided with the liquid-through hole 13b corresponding with the opening 11b of stationary fixture 11, in the time of on stationary fixture 11 being embedded into recess 13a, each opening 11b of each liquid-through hole 13b and stationary fixture 11 is communicated with.In addition, erect the handle 13c that is provided with the word of falling U shape in the both sides of basket 13.Moreover, have in use under the situation of basket 13,13A, 13B of handle 13c, also handle 11c can be set on stationary fixture 11.
Basket 13A shown in Figure 5 has been formed bottom tube-like, is provided with liquid-through hole 13b in the bottom of basket 13A, and liquid-through hole is not set on trunk 13d, erects on the outward flange 13e of the upper end that is formed at basket 13A and is provided with handle 13c.And, when the basket 13A that will contain stationary fixture 11 is placed in the clean container 4, its outward flange 13e is positioned on the fixture mount 12 of clean container 4.
Basket 13B shown in 6, in order to increase the treating capacity that is cleaned thing, can accommodate stationary fixture 11 and be constituted as multisection type, side at tubular body 13d is provided with peristome 13e, both sides at this peristome 13e form guide channel 13f, the two edge portions that open and close the lid 13i of peristome 13e are embedded among the guide channel 13f sliding freely, on the biside plate of body 13d, be provided with a plurality of fixture mount 13g with appropriate intervals up and down, upper end at body 13d forms outward flange 13h, mounting knob 13c on this outward flange 13h.Like this, with horizontal lid 13f pull-up, stationary fixture 11 is inserted and is positioned on each fixture mount 13g from peristome 13e, use the inaccessible peristome 13e of lid 13i then, ride over by outward flange 13h on the fixture mount 12 of clean container 4, thereby basket 13B is placed in the clean container 4 basket 13B.
In addition, by on the contact portion of basket 13,13A, 13B and stationary fixture 11, on the contact portion of basket 13,13A, 13B and clean container 4, the sealing that figure does not show is set, can prevent that cleaning fluid 1 from leaking from this contact portion.Moreover as long as can be adapted to the size and the shape of stationary fixture 11, the size of basket 13,13A, 13B and shape do not limit especially.
Fig. 7 represents alternately to set that through type is cleaned special-purpose clean container 4 and ultrasonic wave cleans special-purpose clean container 41, utilizes these clean containers 4,41 to control a plurality of stationary fixtures 11 simultaneously and alternately carries out the device that through type is cleaned and ultrasonic wave cleans.In this device, possess compressor (diagram is omitted) and drying receptacle 42 that discharge opeing is used in addition, in this drying receptacle 42, be supplied to warm braw by heater 42a and air blast 42b.Do not have ultrasonic oscillator 21 in clean container 4, be housed in the sleeve A of the stationary fixture 11 in the clean container 4, its through hole is cleaned by the high-pressure cleaning liquid stream of the cleaning fluid 1 of circulation.In addition, clean container 41 extracts cleaning fluid 1 by the decompression that the vavuum pump that is not shown by figure brings.
The mid portion of the inside of clean container 41 is provided with fixture mount 41c as shown in Figure 8, and the anchor clamps 11 that clean container 41 is positioned on the fixture mount 41c are divided into chamber 41a and following chamber 41b, are provided with ultrasonic oscillator 21 in the bottom of clean container 41.In addition, chamber 41a upper shed has flow export 41d on clean container 41, at the bottom opening that descends chamber 41b inflow entrance 41e is arranged, and the upper end of clean container 41 is by lid 41f obturation.
Fig. 9 has represented to use the matting of device shown in Figure 7.Moreover, in this matting, utilize a plurality of operating means 20 batch (-type) ground conveyance stationary fixtures 11 that are provided with continuously.
Like this, to be cleaned after thing is placed on each of a plurality of stationary fixtures 11, described a plurality of stationary fixtures 11 are put into clean container 4,41 and clean being cleaned thing, moving successively like that and change in the adjacent clean container 4,41 and carry out alternately that through type is cleaned and ultrasonic wave cleans as shown by arrows then moved at last and changed to that drying is cleaned thing in the drying receptacle 42.Moreover, for attached to the cleaning fluid on the through hole that is cleaned thing, before the through type of subsequent processing is cleaned, carry out discharge opeing and improve cleaning efficiency in this subsequent processing.
Moreover, clean special-purpose clean container 41 as ultrasonic wave, can use as shown in Figure 10 on top and the bottom is provided with the device of ultrasonic oscillator 21 or the device of ultrasonic oscillator 21 is set in left and right sides portion as shown in Figure 11.
As employed cleaning fluid 1 in above cleaning device and cleaning method, except that pure water or water for industrial use, can also use the cleaning agent of varsol, glycol ethers compound or alcohol compound or the cleaning agent that constitutes by the mixture of they and various surfactant and water etc. or be the various cleaning agents such as cleaning agent of cleaning agent, other cationic, anionic property, nonionic by the emulsion that aforementioned mixture constitutes.Also can suitably use heater to heat and use according to the purpose of the cleaning force that improves this cleaning agent.
Employed cleaning agent in this matting, according to the material of cleaning thing and difference, still to pottery system sleeve A, the PH that is preferably the solution of actual use is 8～14 alkaline series cleaning agent.
In addition, rinsing liquid is preferably the use pure water, can use ion exchange water or running water according to the cleaning degree of desired goods.In addition in order to improve drying efficiency, can behind rinsing process, use the dehydrating agent that comprises higher solvent composition of ethanol class or volatility etc.
Moreover, be cleaned thing and be not limited to sleeve A.
The explanation of embodiment
Utilize device shown in Figure 1, the stationary fixture 11 that is placed with 100 sleeve pipes behind the grinding step that is through with is positioned on the fixture mount of clean container 4, use 3% the aqueous solution of the パ イ Application ア Le Off ァ ST-880 (trade name) of waste river chemical industry (strain) system as cleaning agent, use pure water as washings, according to the described washing test that carries out like that of table 1.Moreover clean container 4 is provided with ultrasonic oscillator 21.Cleaning fluid 1 main fine through hole A1 by sleeve pipe flows into chamber 4b down, and the interior pressure that has therefore just formed the last chamber of clean container 4 reaches 5kg/cm
2High pressure straight-through.
Comparative example, by following cleaning device according to the described washing test that carries out like that of table 1.The cleaning device of comparative example possesses the basket 101 that is provided with a plurality of liquid-through hole 100 in the bottom as shown in figure 12, this basket 101 is positioned on the cradle portion 103 in the clean container 102 clean container 102 is divided into chamber 104 and following chamber 105.And, do not use stationary fixture 11 that 100 sleeve pipes are directly put in the basket 101, with embodiment similarly, make the liquid-feeding pump action in the circulation line and lead directly to cleaning.At this moment, the interior pressure of the last chamber of clean container can not rise.
The result of test is as shown in table 1, the comparative example qualification rate rests on 50% or below it, and embodiment 1 reaches 83%, obtained goodish cleaning performance, in addition, as embodiment 2, after ultrasonic wave cleans, lead directly to cleaning, perhaps as embodiment 3, at first carry out ultrasonic wave and clean, and alternately lead directly to and clean and the ultrasonic wave cleaning, further improve qualification rate thus.Its result shows that embodiment 1 to 3 is suitable for the cleaning of the fine through hole A1 of sleeve A.
Table 1
| Condition | US cleans 1 ST-880 | DP cleans 1 ST-880 | US cleans 2 ST-880 | DP cleans 2 ST-880 | Final rinsing pure water | Dry | Result (%) qualification rate (rate fully) |
| Comparative example | ? ??- ? | 70 ℃ * 10 minutes DP | ? ??- ? | ? ??- ? | 50 ℃ * 10 minutes DP | Normal temperature * 3 minutes 100 ℃ * 7 minutes | 50% (30%) or below it |
| | ? ??- ? | 70 ℃ * 10 minutes high pressure DP | ? ??- ? | ? ??- ? | 50 ℃ * 10 minutes high pressure DP | Normal temperature * 3 minutes 100 ℃ * 7 minutes | ? ??83％(40％) ? |
| | 70 ℃ * 5 minutes | 50 ℃ * 5 minutes high pressure DP | ? ??- ? | ? ??- ? | 50 ℃ * 10 minutes high pressure DP | Normal temperature * 3 minutes 100 ℃ * 7 minutes | ? ??89％(76％) ? |
| Embodiment 3 | 70 ℃ * 5 minutes | 50 ℃ * 5 minutes high pressure DP | 70 ℃ * 5 minutes | 50 ℃ * 5 minutes high pressure DP | 50 ℃ * 10 minutes high pressure DP | Normal temperature * 3 minutes 100 ℃ * 7 minutes | ? ??93％(88％) ? |
Drying is implemented with direct-passing mode.
Rate fully is illustrated in the through hole of sleeve pipe fully the not percentage of the complete qualified samples of retained foreign body.
US is the meaning that ultrasonic wave cleans, and DP is the straight-through meaning of cleaning.
Cleaning device and cleaning method according to part class of the present invention, the cleaning fluid of high pressure is concentrated to flow into and is cleaned in the through hole of thing, can improve cleaning performance, therefore the cleaning performance of precision component of the cover tubing etc. of optical connector can be improved, the cleaning of short period can be realized with the fine through hole that is difficult to clean.In addition, be cleaned the situation that thing cleans and compared, and can carry out for example cleaning of hundreds of units, the property produced in batches raising with clean flushing singly by spraying water with high pressure in the past.
Claims (6)
1. the cleaning device of a part class, it is that cleaning fluid by compulsory circulation in aforementioned clean container cleans in the device that is cleaned thing in the clean container in the circulation line that is assembled into cleaning fluid, it is characterized in that,
Possess the thing that is cleaned that will have fine through hole and become the holding device that the mode of equidirectional or the direction approaching with it keeps with the liquid flow path direction of the perforation direction of this through hole and aforementioned cleaning fluid;
And high-pressure cleaning liquid stream passes through in being cleaned the through hole of thing.
2. the cleaning device of part class as claimed in claim 1, it is characterized in that, is last chamber and following chamber by aforementioned holding device with separating in the aforementioned clean container, and the aforementioned cleaning fluid that flow in the aforementioned upward chamber mainly arrives aforementioned chamber down by the through hole that is cleaned thing.
3. the cleaning device of part class as claimed in claim 1, it is characterized in that, aforementioned holding device, possess the gap embed a plurality of maintenances be cleaned thing with recess and this maintenance of ratio of bottom of being arranged on this maintenances usefulness recess with the recess opening of path more, and the gap is embedded in aforementioned maintenance with aforementioned through hole and the connection of aforementioned opening that is cleaned thing in the recess.
4. the cleaning device of part class as claimed in claim 1 is characterized in that, possesses to utilize ultrasonic wave to clean the ultrasonic cleaning equipment that is cleaned thing.
5. the cleaning method of a part class is characterized in that, utilizes the described cleaning device of claim 4, alternately carries out the high-pressure wash that ultrasonic wave cleans and high-pressure cleaning liquid stream is passed through in being cleaned the through hole of thing repeatedly.
6. the cleaning method of a part class is characterized in that, by the described cleaning device of claim 4, carries out the high-pressure wash that ultrasonic wave cleans and high-pressure cleaning liquid stream is passed through simultaneously in being cleaned the through hole of thing.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002310179A JP3846584B2 (en) | 2002-10-24 | 2002-10-24 | Cleaning device and cleaning method for parts |
| JP310179/2002 | 2002-10-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1708365A true CN1708365A (en) | 2005-12-14 |
| CN100336611C CN100336611C (en) | 2007-09-12 |
Family
ID=32171042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801020750A Expired - Fee Related CN100336611C (en) | 2002-10-24 | 2003-10-09 | Equipment and method for washing parts |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP3846584B2 (en) |
| KR (1) | KR100988294B1 (en) |
| CN (1) | CN100336611C (en) |
| HK (1) | HK1082930A1 (en) |
| TW (1) | TWI247632B (en) |
| WO (1) | WO2004037452A1 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101912853A (en) * | 2010-09-03 | 2010-12-15 | 任保林 | Rust-removing cleaning device for ultrasonic pulse water jet pipe wall |
| CN102522322A (en) * | 2011-12-15 | 2012-06-27 | 华东光电集成器件研究所 | Semiconductor chip cleaning device |
| TWI393595B (en) * | 2006-03-17 | 2013-04-21 | Michale Goodson J | Megasonic processing apparatus with frequencey sweeping of thickness mode transducers |
| CN106540917A (en) * | 2015-09-16 | 2017-03-29 | 泰科电子(上海)有限公司 | Ultrasonic cleaning system |
| CN107185870A (en) * | 2017-07-25 | 2017-09-22 | 安徽瑞泰汽车零部件有限责任公司 | A kind of aluminum alloy part cleaning device and cleaning method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0478978U (en) * | 1990-11-19 | 1992-07-09 | ||
| JP3988320B2 (en) | 1999-06-18 | 2007-10-10 | 荒川化学工業株式会社 | Article cleaning method and cleaning apparatus |
| JP2001162237A (en) * | 1999-12-09 | 2001-06-19 | Totoku Electric Co Ltd | Apparatus for washing coating applying die for enamel wire |
| JP3494293B2 (en) | 2000-10-25 | 2004-02-09 | 株式会社カイジョー | Method and apparatus for cleaning closed container |
| CN2514947Y (en) * | 2001-11-23 | 2002-10-09 | 亚智科技股份有限公司 | Blind guide hole and small hole cleaning device |
-
2002
- 2002-10-24 JP JP2002310179A patent/JP3846584B2/en not_active Expired - Lifetime
-
2003
- 2003-10-09 WO PCT/JP2003/012935 patent/WO2004037452A1/en active Application Filing
- 2003-10-09 KR KR1020057006911A patent/KR100988294B1/en active IP Right Grant
- 2003-10-09 CN CNB2003801020750A patent/CN100336611C/en not_active Expired - Fee Related
- 2003-10-14 TW TW092128411A patent/TWI247632B/en not_active IP Right Cessation
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2006
- 2006-03-02 HK HK06102724A patent/HK1082930A1/en not_active IP Right Cessation
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| CN106540917B (en) * | 2015-09-16 | 2020-03-31 | 泰科电子(上海)有限公司 | Ultrasonic cleaning system |
| CN107185870A (en) * | 2017-07-25 | 2017-09-22 | 安徽瑞泰汽车零部件有限责任公司 | A kind of aluminum alloy part cleaning device and cleaning method |
| CN108580424A (en) * | 2018-03-22 | 2018-09-28 | 温州医科大学附属口腔医院 | A kind of electronic odontoglyph handle cleaning device |
| CN108580424B (en) * | 2018-03-22 | 2024-01-09 | 温州医科大学附属口腔医院 | Electric tooth cleaner handle cleaning device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004037452A1 (en) | 2004-05-06 |
| JP2004141778A (en) | 2004-05-20 |
| TW200416075A (en) | 2004-09-01 |
| CN100336611C (en) | 2007-09-12 |
| JP3846584B2 (en) | 2006-11-15 |
| KR100988294B1 (en) | 2010-10-18 |
| TWI247632B (en) | 2006-01-21 |
| HK1082930A1 (en) | 2006-06-23 |
| KR20050055031A (en) | 2005-06-10 |
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