JP2009071201A - Cleaning device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To solve a problem that it is not possible for a conventional cleaning device to prevent cleaning anomaly caused by a rise in pressure of a cleaning liquid at a flow inlet of a cleaning container. <P>SOLUTION: A cleaning device 110 has a structure including: a cleaning container 1 in which a cleaning liquid 3 circulates by means of a pump 5 and which has a flow inlet at its upper part and a flow exit at its lower part and houses an object to be cleaned therein; and a pipe 101 from which the cleaning liquid 3 is discharged at an upper part of a cleaning tower 2 that houses the cleaning container 1 therein. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a cleaning apparatus.

2. Description of the Related Art In recent years, semiconductor packages using flip chips have been proposed in the field of manufacturing semiconductor devices and the like with increasing speed and integration. In particular, in the flip chip type joining, there are many types using solder, and flux is used for joining the flip chip bump and the substrate as an interposer. If such flux remains as dirt in the semiconductor package, it affects the filling property of the underfill resin injected between the chip and the substrate, and voids are generated, or at the substrate-resin or chip-substrate interface. There has been a problem in that the reliability of the semiconductor package is impaired.
Furthermore, due to the miniaturization of products and technological progress, the gap between the chip and the substrate becomes narrow, and the gap is about 50 micrometers. Therefore, it becomes more difficult to clean the flux remaining in the gap between the chip and the substrate.

  As a cleaning apparatus for solving such a problem, for example, Patent Documents 1 and 2 are cited. A conventional cleaning apparatus will be described below with reference to FIG.

First, the configuration of a conventional cleaning apparatus will be described.
FIG. 3 is a schematic diagram showing a conventional cleaning apparatus that performs cleaning with a circulating forced liquid flow. As shown in FIG. 3, the cleaning apparatus 300 includes a cleaning container a that stores an object to be cleaned, a cleaning tower b that holds the cleaning container a, a cleaning liquid c that performs cleaning, a cleaning liquid tank d that stores the cleaning liquid c, and a cleaning liquid tank. A pump e that feeds the cleaning liquid c in d to the inside of the cleaning tower b, and a pipe x that guides the cleaning liquid c from the cleaning liquid tank d to the inside of the cleaning tower b through the pump e. And the to-be-cleaned object is wash | cleaned because the washing | cleaning liquid c flows through the inside of the washing | cleaning container a. Further, the cleaning device 300 includes a return line f for returning the liquid to the cleaning liquid tank d, an air supply line g for performing liquid cutting and drying, a heater h and an air blower i for generating hot air for drying, and the air that has been blown. Exhaust air exhaust line j, gas-liquid separator k that separates the water contained in the exhaust air, return line 1 that returns the gas-liquid separated liquid to cleaning liquid tank d, and switching valves Va to Vf that switch between these lines. I have.

Next, the operation of the cleaning apparatus 300 will be described.
First, as shown in FIG. 3, the cleaning container “a” containing the object to be cleaned is installed inside the cleaning tower “b”. The valves Vc to Vf are closed and the valves Va and Vb are opened. Thereby, the washing tower b is in a sealed state.
Subsequently, the pump e is operated to circulate the cleaning liquid c. That is, the cleaning liquid c stored in the cleaning liquid tank d by the pump e is sent to the cleaning tower b through the pipe x, passes through the inside of the cleaning container a disposed inside the cleaning tower b, and returns from the cleaning tower b. It is discharged to f and returns to the cleaning liquid tank d through the return line f. As the cleaning liquid c passes through the cleaning container a, the object to be cleaned in the cleaning container a is cleaned.
Note that Patent Document 3 is cited as a prior art document related to the present invention.
JP-A-8-332463 JP-A-9-155310 JP-A-5-331492

However, in the cleaning apparatus described with reference to FIG. 3, since the cleaning liquid discharged from the pump e is a fixed amount, the liquid amount of the cleaning liquid flowing inside the cleaning container a varies depending on the number, size, shape, and the like of the object to be cleaned. . That is, the amount of the cleaning liquid flowing inside the cleaning container a decreases due to an increase in the amount of objects to be cleaned. As a result, the amount of the cleaning liquid discharged from the pump e and sent into the cleaning tower b is larger than the amount of the cleaning liquid flowing inside the cleaning container a, and the pressure in the cleaning tower b becomes uneven. That is, the pressure of the cleaning liquid at the inlet of the cleaning liquid in the cleaning container a is higher than the pressure of the cleaning liquid at the outlet.
Such an increase in the pressure of the cleaning liquid at the inlet of the cleaning container a generates a pool of cleaning liquid at the inlet of the cleaning container a, hinders a smooth liquid flow, and causes uneven cleaning. Further, if the allowable pressure resistance of the cleaning tower b is exceeded, the cleaning liquid may blow out, or the cleaning tower may be damaged.

The cleaning device according to the present invention comprises:
A cleaning container that has an inlet at the top, an outlet at the bottom, and contains an object to be cleaned;
A washing tower holding the washing container therein;
A cleaning liquid tank for storing the cleaning liquid;
A first pipe provided so that the cleaning liquid circulates between the cleaning liquid tank and the cleaning tower;
A pump provided in the first pipe, for sending the cleaning liquid from the cleaning liquid tank to the cleaning tower;
A second pipe for discharging the cleaning liquid from the upper part of the cleaning tower;
With
The cleaning object is cleaned by flowing the cleaning liquid from the inlet to the outlet.

  This cleaning apparatus is a cleaning container in which a cleaning liquid is circulated by a pump, and has an inlet at an upper part and an outlet at a lower part, and stores an object to be cleaned therein, and a cleaning tower that stores the cleaning container therein It has the structure provided with the 2nd piping which discharges cleaning liquid in the upper part. According to the cleaning device having such a structure, the flow of the cleaning liquid is hindered by the presence of the object to be cleaned in the cleaning container, the amount of the cleaning liquid at the inlet becomes larger than the amount of the cleaning liquid at the outlet, and is further delivered by the pump. Even when the pressure at the inlet increases due to the cleaning liquid, since the second pipe for discharging the cleaning liquid is provided in the upper part of the cleaning tower, an increase in the pressure at the inlet of the cleaning container can be suppressed. Therefore, it is possible to reduce the occurrence of cleaning unevenness by suppressing the pool of cleaning liquid at the inlet of the cleaning container and maintaining a smooth liquid flow. In addition, it is possible to suppress blowout of cleaning liquid, damage to the cleaning tower, and the like due to exceeding the allowable pressure resistance of the cleaning tower. Thereby, it is possible to realize a cleaning apparatus that reduces the occurrence of cleaning abnormality and has a stable cleaning quality.

  According to the present invention, it is possible to realize a cleaning apparatus that reduces the occurrence of cleaning abnormality and has stable cleaning quality.

  Hereinafter, preferred embodiments of a cleaning apparatus according to the present invention will be described in detail with reference to the drawings. In the description of the drawings, the same reference numerals are assigned to the same elements, and duplicate descriptions are omitted.

(First embodiment)
FIG. 1 is a cross-sectional view showing a first embodiment of a cleaning apparatus according to the present invention.
The cleaning apparatus 110 includes a cleaning container 1 for storing an object to be cleaned, a cleaning tower 2 for holding the cleaning container 1, a cleaning liquid 3 for cleaning, a cleaning liquid tank 4 for storing the cleaning liquid 3, and a cleaning liquid 3 in the cleaning liquid tank 4 as a cleaning tower. 2 to the inside of the cleaning tower 2 from the cleaning liquid tank 4 to the inside of the cleaning tower 2, the pipe 6 for returning the liquid from the cleaning tower 2 to the cleaning liquid tank 4, and the cleaning tower 2 is provided with a pipe 101 (second pipe) for discharging the cleaning liquid 3 in the interior of 2 and a control unit 103. And the to-be-cleaned object is wash | cleaned because the washing | cleaning liquid 3 flows from an inflow port to an outflow port.

As shown in FIG. 1, the cleaning device 110 further includes a blower supply line 7 for draining and drying, a heater 8 and a blower 9 for generating hot air for drying, and an exhaust line 10 for exhausting the blown air. , A gas-liquid separator 11 for separating water contained in the exhaust air, a return line 12 for returning the gas-liquid separated liquid to the cleaning liquid tank 4, and valves V1 to V6 for switching the path of the cleaning liquid 3.
Furthermore, a flow meter 100 for measuring the flow rate of the cleaning liquid 3 that has passed through the cleaning tower 2, a flow meter 102 for detecting the liquid flow rate to the pipe 101, and a pressure for measuring the pressure of the cleaning liquid 3 at the inlet and the outlet of the cleaning container 1. A total of P1 and P2 and a valve V100 for controlling the liquid flow in the pipe 101 (second pipe) are provided.

The cleaning container 1 has an inlet through which the cleaning liquid flows into the upper part, and an outlet through which the cleaning liquid that has flowed in from the inlet enters the lower part. The cleaning container 1 is a basket-like container, and the cleaning liquid flows in from the upper opening, and the cleaning liquid flows out from the lower and side openings.
It is installed inside the cleaning tower 2 in a state where an object to be cleaned is accommodated.
The cleaning container 1 is held inside the cleaning tower 2 by a protrusion formed on the inner wall of the cleaning tower 2 at the periphery of the inlet of the cleaning container 1.

  The cleaning tower 2 includes a pipe 20 that guides the cleaning liquid 3 from the cleaning tank 4 to the cleaning tower 2, a pipe 6 that guides the cleaning liquid from the cleaning tower 2, a pipe 101 (second pipe), and a pipe provided with a valve V <b> 5. Is connected. The upper surface of the cleaning tower 2 is covered with an openable lid.

  The pipe 20 and the pipe 6 (first pipe) are arranged so that the cleaning liquid circulates between the cleaning tower 2 and the cleaning liquid tank 4. The pipe 20 is provided with a valve V1. When the valve V1 is open, the cleaning liquid 3 is sent from the cleaning liquid tank 4 to the cleaning tower 2 through the pipe 20. The pipe 6 is provided with a valve V2. When the valve V2 is open, the cleaning liquid 3 is sent from the cleaning tower 2 to the cleaning liquid tank 4 through the pipe 6.

The pipe 101 (second pipe) is provided in the upper part of the cleaning tower 2. The upper part of the cleaning tower 2 means above the inlet of the cleaning container 1 and above the pipe 6 that returns the liquid from the cleaning tower 2 to the cleaning liquid tank 4. By providing the pipe 101 at a portion where the pressure of the cleaning liquid 3 particularly increases due to a decrease in the amount of the cleaning liquid 3 flowing inside the cleaning container 1, the increase in the pressure can be suppressed.
In addition, the pipe 101 is provided with a valve V100. When the valve V100 is open, the cleaning liquid 3 is discharged from the upper part of the cleaning tower 2 and sent to the cleaning liquid tank 4. That is, the cleaning liquid 3 at the inlet of the cleaning container 1 circulates between the cleaning tower 2 and the cleaning liquid tank 4 by flowing through either the cleaning container 1 or the pipe 101.

  The pump 5 is provided in the pipe 20 and sends the cleaning liquid 3 from the cleaning liquid tank 4 to the cleaning tower 2. The pump 5 delivers a fixed amount of cleaning liquid for an arbitrarily set time. The cleaning liquid 3 is forcibly circulated in the cleaning device 110 by the pump 5 and can clean the object to be cleaned. It has a function of controlling the circulation of the cleaning liquid 3 in the cleaning device 110.

The pressure gauge P <b> 1 measures the pressure of the cleaning liquid 3 at the inlet at the top of the cleaning container 1.
The pressure gauge P <b> 2 measures the pressure of the cleaning liquid 3 at the liquid outlet at the bottom of the cleaning container 1.

The flow meter 100 measures the liquid flow rate in the pipe 6 of the cleaning liquid 3 passing through the inside of the cleaning container 1 and discharged from the cleaning tower 2.
The flow meter 102 measures the liquid flow rate in the pipe 101 of the cleaning liquid 3 discharged from the cleaning tower 2 without passing through the inside of the cleaning container 1.

The control unit 103 measures the pressure of the cleaning liquid 3 at the inlet of the cleaning container 1 with the pressure gauge P1, opens the valve V100 based on the measurement result of the pressure gauge P1, and supplies the cleaning liquid 3 at the inlet to the pipe 101. By guiding, the amount of the cleaning liquid 3 at the inlet can be reduced and the pressure can be lowered. That is, the control unit 103 has a function of opening the valve V100 from the closed state to the open state when the value indicated by the pressure gauge P1 is equal to or greater than the arbitrarily set pressure value.
Thus, by appropriately adjusting the open / close state of the valve V100 based on the measurement result of the pressure gauge P1, the flow rate of the cleaning liquid 3 at the inlet is controlled, and the pressure of the cleaning liquid 3 at the inlet is adjusted more accurately. In addition, it is possible to suppress abnormal cleaning.

Next, the operation of the cleaning device 110 will be described.
First, as shown in FIG. 1, a cleaning container 1 containing an object to be cleaned is installed inside a cleaning tower 2. Valves V3 to V6 are closed and valves V1 and V2 are opened. Thereby, the washing tower 2 is in a sealed state.
Subsequently, the pump 5 is operated to circulate the cleaning liquid 3. That is, the cleaning liquid 3 stored in the cleaning liquid tank 4 by the pump 5 is sent to the cleaning tower 2 through the pipe 20, passes through the outlet from the inlet of the cleaning container 1 disposed inside the cleaning tower 2, and then passes through the cleaning tower 2. 2 is discharged to the pipe 6 and returns to the cleaning liquid tank 4 through the pipe 6. As the cleaning liquid 3 flows from the inlet of the cleaning container 1 to the outlet, the object to be cleaned in the cleaning container 1 is cleaned.

  At this time, due to an increase in the number of objects to be cleaned in the cleaning container 1, the cleaning liquid 3 becomes difficult to flow inside the cleaning container 1, the amount of cleaning liquid at the inlet becomes larger than the amount of cleaning liquid at the outlet, and the object to be cleaned is cleaned. The amount of the cleaning liquid 3 to be reduced will decrease. Further, the amount of the cleaning liquid sent from the pump 5 to the inlet is a fixed amount. For this reason, the amount of the cleaning liquid 3 at the inlet increases, and the pressure at the inlet increases. That is, the pressure of the cleaning liquid 3 at the inlet of the cleaning container 1 becomes high, and the pressure in the cleaning tower 2 becomes uneven.

The effect of this embodiment will be described.
In the cleaning apparatus described in Patent Document 1, even if the number of the objects to be cleaned changes depending on the number and size, there is no structure for adjusting the pressure of the cleaning liquid at the inlet of the cleaning container 1, and the cleaning liquid is continuously circulated. Therefore, when the amount of the cleaning liquid flowing inside the cleaning container 1 decreases, the amount of the cleaning liquid forcedly circulated is larger than the amount of the cleaning liquid flowing in from the inlet of the cleaning container 1, and the cleaning liquid at the inlet of the cleaning container 1 is increased. The pressure increases.
On the other hand, in the cleaning apparatus 110 according to the present embodiment, the cleaning container 1 has an inlet at the upper part and an outlet at the lower part, and stores an object to be cleaned therein. The cleaning tower 2 has a structure including a second pipe 101 for discharging the cleaning liquid 3 in the upper part.
According to the cleaning device 110 having such a structure, the flow of the cleaning liquid 3 is hindered by the presence of an object to be cleaned in the cleaning container 1 at the time of cleaning, and the amount of the cleaning liquid 3 at the inlet becomes the amount of the cleaning liquid 3 at the outlet. Since the pipe 101 for discharging the cleaning liquid 3 is provided at the upper part of the cleaning tower 2 even when the pressure at the inlet is increased by the cleaning liquid 3 delivered by the pump 5, the cleaning container It is possible to suppress an increase in the pressure at one inlet. For this reason, generation | occurrence | production of a washing | cleaning nonuniformity etc. can be reduced by suppressing the pool of the washing | cleaning liquid 3 at the inflow port of the washing | cleaning container 1, and hold | maintaining a smooth liquid flow. In addition, blowout of the cleaning liquid 3 and damage to the cleaning tower 2 due to exceeding the allowable pressure resistance of the cleaning tower 2 can be suppressed. Accordingly, it is possible to realize the cleaning apparatus 110 that reduces the occurrence of cleaning abnormality and has a stable cleaning quality.
Thus, according to the present embodiment, the cleaning apparatus 110 that reduces the occurrence of cleaning abnormality and has a stable cleaning quality is realized.

  In addition, the cleaning apparatus 110 in the present embodiment includes a control unit 103. According to the cleaning apparatus 110 having such a structure, by measuring the pressure inside the cleaning container 1, that is, the pressure inside the cleaning tower 2, the control unit 103 opens and closes the associated valve 100 from the measured value, and the inlet The pressure increase can be further suppressed. By using a closed loop system, abnormalities that occur during cleaning can be avoided, and stable cleaning quality can be obtained.

(Second Embodiment)
FIG. 2 is a schematic view showing a second embodiment of the cleaning apparatus according to the present invention. Whereas the first embodiment is configured to reduce the inlet pressure by the pipe 101, the present embodiment reduces the inlet pressure by the control unit 104 that controls the rotation speed of the liquid discharge motor of the pump 5. It is a configuration.
The cleaning device 220 includes a control unit 104 that controls the number of revolutions of the liquid discharge motor of the pump 5 instead of the second pipe. Other configurations and operations are the same as those in the first embodiment.

  As shown in FIG. 2, the control unit 104 is provided in the pump 5. The control unit 104 measures the pressure of the cleaning liquid 3 at the inlet of the cleaning container 1 with the pressure gauge P1, and controls the pump 5 based on the measurement result of the pressure gauge P1 to reduce the cleaning liquid 3 sent into the cleaning tower 2. As a result, the liquid flow rate of the cleaning liquid 3 at the inlet can be reduced, and the pressure thereof can be lowered.

Also in the present embodiment, the pressure of the inlet is measured at the time of cleaning, and the liquid flow rate of the cleaning liquid at the inlet is reduced based on the measured value, so that it is suitable for stably providing high cleaning quality. A cleaning device 220 having a structure is realized.
In the first embodiment, when the value indicated by the pressure gauge P1 at the inlet of the cleaning tower 2 is equal to or higher than a pressure value that is arbitrarily set, the valve V100 is opened and the amount of cleaning liquid is adjusted through the second pipe. In the second embodiment, the cleaning liquid discharge amount of the pump 5 is controlled by the control unit 104 to reduce the liquid amount of the cleaning liquid at the inlet and control the pressure gauge P1 to be constant. It is the structure to do.

  In 2nd Embodiment, since it is not necessary to provide the piping 101, there exists an effect that it becomes structurally simple. Other effects of this embodiment are the same as those of the above embodiment.

The cleaning device according to the present invention is not limited to the above-described embodiment, and various modifications can be made. For example, in the present embodiment, the control unit has shown an example in which the pressure at the inlet is measured using the pressure gauge P1, but the pressure at the outlet is further measured using the pressure gauge P2, and the pressure gauges P1, P2 are measured. The flow rate of the cleaning liquid at the inlet may be controlled based on both measurement results. As a result, the state of cleaning in the cleaning tower 2 can be detected more accurately, and the flow rate of the cleaning liquid can be adjusted more appropriately.
Furthermore, in addition to the measurement by the pressure gauges P1 and P2, either or both of the flow meters 100 and 102 may be used. As a result, the liquid pressure and the liquid flow rate are constantly monitored, and an abnormality during cleaning can be detected quickly and the occurrence of the abnormality can be notified to an operator or the like.
Moreover, the washing container 1 should just be a container which can accommodate to-be-cleaned object inside, and the number and magnitude | size of an inflow port and an outflow port are not specifically limited.

It is a mimetic diagram showing a 1st embodiment of a cleaning device by the present invention. It is a schematic diagram which shows 2nd Embodiment of the washing | cleaning apparatus by this invention. It is a schematic diagram which shows the conventional washing | cleaning apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 110 Cleaning apparatus 220 Cleaning apparatus 1 Cleaning container 2 Cleaning tower 3 Cleaning liquid 4 Cleaning liquid tank 5 Pump 6 Piping 7 Air supply line 8 Heater 9 Blower 10 Exhaust line 11 Gas-liquid separator 12 Return line 20 Piping V1-V6 Valve P1 Pressure gauge P2 Pressure gauge 100 Flow meter 101 Piping (second piping)
102 Flow meter 103 Control unit 104 Control unit V100 Valve

Claims (3)

A cleaning container that has an inlet at the top, an outlet at the bottom, and contains an object to be cleaned;
A washing tower holding the washing container therein;
A cleaning liquid tank for storing the cleaning liquid;
A first pipe provided so that the cleaning liquid circulates between the cleaning liquid tank and the cleaning tower;
A pump provided in the first pipe, for sending the cleaning liquid from the cleaning liquid tank to the cleaning tower;
A second pipe for discharging the cleaning liquid from the upper part of the cleaning tower;
With
A cleaning apparatus configured to clean the object to be cleaned by flowing a cleaning liquid from the inlet to the outlet. The cleaning device according to claim 1,
The apparatus further includes a control unit that measures the pressure of the cleaning liquid at the inlet and guides the cleaning liquid at the inlet to the second pipe based on the measurement result, thereby reducing the pressure of the cleaning liquid at the inlet. A cleaning device characterized by. The cleaning device according to claim 1,
A controller that measures the pressure of the cleaning liquid at the inlet, reduces the amount of cleaning liquid sent to the cleaning tower by controlling the pump based on the measurement result, and further reduces the pressure of the cleaning liquid at the inlet A cleaning apparatus comprising:

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