CN1645988A - 使用激光烧蚀形成电子和光学元件的方法 - Google Patents
使用激光烧蚀形成电子和光学元件的方法 Download PDFInfo
- Publication number
- CN1645988A CN1645988A CNA2004100821387A CN200410082138A CN1645988A CN 1645988 A CN1645988 A CN 1645988A CN A2004100821387 A CNA2004100821387 A CN A2004100821387A CN 200410082138 A CN200410082138 A CN 200410082138A CN 1645988 A CN1645988 A CN 1645988A
- Authority
- CN
- China
- Prior art keywords
- laser ablation
- polymeric layer
- laser
- polymer
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12147—Coupler
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12169—Annealing
- G02B2006/12171—Annealing using a laser beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0274—Optical details, e.g. printed circuits comprising integral optical means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0162—Silicon containing polymer, e.g. silicone
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Optical Integrated Circuits (AREA)
- Structure Of Printed Boards (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US53214503P | 2003-12-22 | 2003-12-22 | |
| US60/532,145 | 2003-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1645988A true CN1645988A (zh) | 2005-07-27 |
Family
ID=34573056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2004100821387A Pending CN1645988A (zh) | 2003-12-22 | 2004-12-21 | 使用激光烧蚀形成电子和光学元件的方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20050163415A1 (enExample) |
| EP (1) | EP1550888A1 (enExample) |
| JP (1) | JP2005181958A (enExample) |
| KR (1) | KR20050063687A (enExample) |
| CN (1) | CN1645988A (enExample) |
| TW (1) | TWI274198B (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107949454A (zh) * | 2015-09-15 | 2018-04-20 | 松下知识产权经营株式会社 | 金属构件的焊接构造以及焊接方法 |
| CN109641318A (zh) * | 2016-09-02 | 2019-04-16 | 塞浦路斯科技大学 | 飞秒激光刻写 |
| CN110208906A (zh) * | 2019-05-21 | 2019-09-06 | 中国科学院上海光学精密机械研究所 | 一种基于反应离子刻蚀的薄膜微光学结构的制备方法 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010021896A1 (en) * | 2008-08-22 | 2010-02-25 | 3M Innovative Properties Company | Light guides including laser-processed light extractors and methods |
| JP4655157B2 (ja) * | 2009-04-17 | 2011-03-23 | 住友ベークライト株式会社 | 光導波路構造体の製造方法 |
| US20100307799A1 (en) * | 2009-06-06 | 2010-12-09 | Chiang Cheng-Feng | Carrier Structure for Electronic Components and Fabrication Method of the same |
| US7949211B1 (en) | 2010-02-26 | 2011-05-24 | Corning Incorporated | Modular active board subassemblies and printed wiring boards comprising the same |
| CN102248288A (zh) * | 2011-06-30 | 2011-11-23 | 昆山市正业电子有限公司 | 一种fpc板插头识别定位方法 |
| US8633956B2 (en) | 2011-09-01 | 2014-01-21 | Hewlett-Packard Development Company, L.P. | Patterning of coated printed media |
| US9490148B2 (en) * | 2012-09-27 | 2016-11-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Adhesion promoter apparatus and method |
| US9377595B2 (en) * | 2013-12-11 | 2016-06-28 | Stan C. Petrov | Photoelectric conductive motherboard and modular system |
| CN113296178B (zh) * | 2021-06-09 | 2022-07-19 | 中国工程物理研究院激光聚变研究中心 | 一种co2激光在熔石英表面直接制备正弦相位光栅的方法 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4915981A (en) * | 1988-08-12 | 1990-04-10 | Rogers Corporation | Method of laser drilling fluoropolymer materials |
| US5169678A (en) * | 1989-12-26 | 1992-12-08 | General Electric Company | Laser ablatable polymer dielectrics and methods |
| US5059763A (en) * | 1990-06-06 | 1991-10-22 | Massachusetts Institute Of Technology | Formation of optical quality surfaces in optical material |
| US5125054A (en) * | 1991-07-25 | 1992-06-23 | Motorola, Inc. | Laminated polymer optical waveguide interface and method of making same |
| US5368900A (en) * | 1991-11-04 | 1994-11-29 | Motorola, Inc. | Multistep laser ablation method for making optical waveguide reflector |
| DE4212208A1 (de) * | 1992-04-10 | 1993-10-14 | Bosch Gmbh Robert | Verfahren zur Herstellung optischer Polymerbauelemente mit integrierter Faser-Chip-Kopplung in Abformtechnik |
| IL105925A (en) * | 1992-06-22 | 1997-01-10 | Martin Marietta Corp | Ablative process for printed circuit board technology |
| DE4240266A1 (de) * | 1992-12-01 | 1994-06-09 | Bosch Gmbh Robert | Verfahren zur Herstellung optischer Polymerbauelemente mit integrierten vertikalen Koppelstrukturen |
| DE69418698T2 (de) * | 1994-04-14 | 1999-10-07 | Hewlett-Packard Gmbh | Verfahren zur Herstellung von Leiterplatten |
| US5500540A (en) * | 1994-04-15 | 1996-03-19 | Photonics Research Incorporated | Wafer scale optoelectronic package |
| JPH10123357A (ja) * | 1996-10-24 | 1998-05-15 | Nippon Sheet Glass Co Ltd | 光導波路に対するレーザ加工方法 |
| US5895263A (en) * | 1996-12-19 | 1999-04-20 | International Business Machines Corporation | Process for manufacture of integrated circuit device |
| JP3133039B2 (ja) * | 1998-10-05 | 2001-02-05 | 日本電信電話株式会社 | 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法 |
| US6611635B1 (en) * | 1998-10-09 | 2003-08-26 | Fujitsu Limited | Opto-electronic substrates with electrical and optical interconnections and methods for making |
| US6177143B1 (en) * | 1999-01-06 | 2001-01-23 | Allied Signal Inc | Electron beam treatment of siloxane resins |
| US6313434B1 (en) * | 1999-05-27 | 2001-11-06 | International Business Machines Corporation | Method for creation of inclined microstructures using a scanned laser image |
| TWI239798B (en) * | 1999-05-28 | 2005-09-11 | Toppan Printing Co Ltd | Photo electric wiring substrate, mounted substrate, and the manufacture method of the photo electric wiring substrate |
| JP4401540B2 (ja) * | 2000-06-30 | 2010-01-20 | 浜松ホトニクス株式会社 | レーザー装置及びこれを用いた光信号増幅装置 |
| CN1555387A (zh) * | 2000-07-28 | 2004-12-15 | 古德里奇公司 | 制造光学波导管的聚合物组合物、由此制造的光学波导管及制造此波导管的方法 |
| TWI226103B (en) * | 2000-08-31 | 2005-01-01 | Georgia Tech Res Inst | Fabrication of semiconductor devices with air gaps for ultra low capacitance interconnections and methods of making same |
| KR100841597B1 (ko) * | 2000-09-13 | 2008-06-26 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | 전자 디바이스 제조 |
| WO2002054120A1 (en) * | 2000-12-28 | 2002-07-11 | Keio University | Optical signal processing circuit and method of producing same |
| US6671950B2 (en) * | 2001-03-08 | 2004-01-06 | Ppg Industries Ohio, Inc. | Multi-layer circuit assembly and process for preparing the same |
| US6731857B2 (en) * | 2001-03-29 | 2004-05-04 | Shipley Company, L.L.C. | Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom |
| US7011932B2 (en) * | 2001-05-01 | 2006-03-14 | E. I. Du Pont De Nemours And Company | Polymer waveguide fabrication process |
| JP2003131001A (ja) * | 2001-05-25 | 2003-05-08 | Shipley Co Llc | 多孔性光学物質 |
| US6661642B2 (en) * | 2001-11-26 | 2003-12-09 | Shipley Company, L.L.C. | Dielectric structure |
| US6856745B2 (en) * | 2002-07-02 | 2005-02-15 | Lucent Technologies Inc. | Waveguide and applications therefor |
| EP1434068A3 (en) * | 2002-12-02 | 2004-07-28 | Shipley Company, L.L.C. | Methods of forming waveguides that are rounded in cross section and waveguides formed therefrom |
| US6842577B2 (en) * | 2002-12-02 | 2005-01-11 | Shipley Company L.L.C. | Photoimageable waveguide composition and waveguide formed therefrom |
-
2004
- 2004-03-29 JP JP2004096538A patent/JP2005181958A/ja not_active Withdrawn
- 2004-12-15 TW TW093138884A patent/TWI274198B/zh not_active IP Right Cessation
- 2004-12-17 KR KR1020040107485A patent/KR20050063687A/ko not_active Ceased
- 2004-12-18 EP EP04257942A patent/EP1550888A1/en not_active Withdrawn
- 2004-12-21 CN CNA2004100821387A patent/CN1645988A/zh active Pending
- 2004-12-22 US US11/020,521 patent/US20050163415A1/en not_active Abandoned
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107949454A (zh) * | 2015-09-15 | 2018-04-20 | 松下知识产权经营株式会社 | 金属构件的焊接构造以及焊接方法 |
| CN109641318A (zh) * | 2016-09-02 | 2019-04-16 | 塞浦路斯科技大学 | 飞秒激光刻写 |
| CN110208906A (zh) * | 2019-05-21 | 2019-09-06 | 中国科学院上海光学精密机械研究所 | 一种基于反应离子刻蚀的薄膜微光学结构的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1550888A1 (en) | 2005-07-06 |
| TW200532269A (en) | 2005-10-01 |
| KR20050063687A (ko) | 2005-06-28 |
| TWI274198B (en) | 2007-02-21 |
| US20050163415A1 (en) | 2005-07-28 |
| JP2005181958A (ja) | 2005-07-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |