CN1632857A - LED Display Panel and Its Digital/Analog Converter - Google Patents

LED Display Panel and Its Digital/Analog Converter Download PDF

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CN1632857A
CN1632857A CNA2005100046133A CN200510004613A CN1632857A CN 1632857 A CN1632857 A CN 1632857A CN A2005100046133 A CNA2005100046133 A CN A2005100046133A CN 200510004613 A CN200510004613 A CN 200510004613A CN 1632857 A CN1632857 A CN 1632857A
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孙文堂
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Abstract

A light emitting diode display panel comprises a substrate, pixels and a digital/analog converter. The substrate has a first area and a second area, the thin film transistor formed in the first area has a first channel doping concentration, and the thin film transistor formed in the second area has a second channel doping concentration. The pixels are arranged in the second region. The digital/analog converter comprises a plurality of switch circuits and a plurality of current sources, wherein the switch circuits are selectively conducted according to the gray-scale values and are arranged in the second area. The plurality of current sources are respectively electrically connected with the plurality of corresponding switch circuits and respectively selectively output a current to generate a pixel current according to the conducting states of the plurality of corresponding switch circuits, and the pixel current is configured in the first area. The critical voltage offset of the thin film transistor in the first area is smaller than that of the thin film transistor in the second area.

Description

发光二极管显示面板及其数字/模拟转换器LED Display Panel and Its Digital/Analog Converter

技术领域technical field

本发明涉及一种发光二极管显示面板,且特别涉及一种数字/模拟转换器。The invention relates to a light-emitting diode display panel, and in particular to a digital/analog converter.

背景技术Background technique

发光二极管像素的发光亮度与所流经的像素电流成正比,故其多以电流方式驱动。藉由驱动电路依据不同的灰阶值提供对应的像素电流,使得发光二极管像素依照像素电流产生对应的亮度。所以像素电流的大小直接影响发光二极管像素的发光亮度。而一般产生像素电流的方法有很多种,多以薄膜晶体管作为电流源,依据2N个灰阶值设定N个电流源并分别产生N个电流大小,依序为(20)I、(21)I、(22)I...(2N-1)I等,N是为正整数。在显示过程时,依据灰阶值开启对应的电流源,并将开启的电流源所输出的电流加总后输出,以为像素电流。The luminance of LED pixels is proportional to the pixel current flowing through them, so they are mostly driven by current. The driving circuit provides corresponding pixel currents according to different grayscale values, so that the light emitting diode pixels generate corresponding brightness according to the pixel currents. Therefore, the size of the pixel current directly affects the light-emitting brightness of the LED pixel. In general, there are many ways to generate pixel current. Most of them use thin film transistors as current sources. N current sources are set according to 2 N gray scale values and N currents are generated respectively. The sequence is (2 0 )I, ( 2 1 )I, (2 2 )I...(2 N-1 )I, etc., N is a positive integer. During the display process, the corresponding current sources are turned on according to the gray scale value, and the currents output by the turned on current sources are summed up and output as the pixel current.

请参照图1,其绘示乃传统数字/模拟转换器的电路架构示意图。以数字/模拟转换器100用以产生8种像素电流IP为例说明,其包括9个薄膜晶体管QA1~QA3、QB1~QB3及QC1~QC3。薄膜晶体管QA1~QA3均用来当成电流源,其通道宽度与长度的比值分别为W/L、2W/L及4W/L,以分别产生不同大小的电流I、2I、4I。Please refer to FIG. 1 , which shows a schematic diagram of a circuit structure of a conventional digital/analog converter. Taking the digital/analog converter 100 for generating 8 types of pixel current IP as an example, it includes 9 thin film transistors QA1 - QA3 , QB1 - QB3 and QC1 - QC3 . The thin film transistors QA1 - QA3 are all used as current sources, and the ratios of channel width to length are W/L, 2W/L and 4W/L respectively, so as to generate currents I, 2I, 4I of different magnitudes respectively.

假设,当灰阶值D为数据信号(D2 D2 D0)=(110)2时,薄膜晶体管QB1不导通,电流I经由薄膜晶体管QC1、QA1至地电压,而薄膜晶体管QB2、QB3因数据信号D2与D1为高电位以导通,故电流2I、4I分别经由薄膜晶体管QB2、QB3及QA2、QA3至地电压,并以为像素电流IP。因此数字/模拟转换器100所输出的像素电流IP将为2I+4I=6I,并输出至对应的像素,以显示灰阶值D=(110)2所代表的亮度。Suppose, when the gray scale value D is the data signal (D2 D2 D0) = (110) 2 , the thin film transistor QB1 is not turned on, the current I goes to the ground voltage through the thin film transistors QC1, QA1, and the thin film transistors QB2, QB3 are caused by the data signal D2 and D1 are at a high potential to conduct, so the currents 2I and 4I respectively go through the thin film transistors QB2 , QB3 and QA2 , QA3 to the ground voltage, and become the pixel current IP. Therefore, the pixel current IP output by the digital/analog converter 100 will be 2I+4I=6I, and output to the corresponding pixel to display the brightness represented by the gray scale value D=(110) 2 .

但是,数字/模拟转换器100目前多以低温多晶硅制程技术来实现,以将其整合至发光二极管显示器的显示面板中。电流源是由低温多晶硅薄膜晶体管QA1~QA3来实现,或以其他由薄膜晶体管为架构所组成的电路来达成电流源。但不论怎样的架构,利用低温多晶硅技术所制作出的薄膜晶体管,其临界电压(threshold voltage)与载子迁移率的偏移量(Variation)都会因激光结晶制程而造成变异,使得每个作为电流源的薄膜晶体管,例如QA1~QA3,其彼此的临界电压与载子迁移率的偏移量将变得不一样,造成数字/模拟转换器100输出的像素电流IP将会与灰阶值D所对应的电流有误差产生,而无法达到预定的发光亮度。However, currently, the digital/analog converter 100 is mostly realized by low-temperature polysilicon process technology, so as to be integrated into the display panel of the LED display. The current source is realized by low-temperature polysilicon thin film transistors QA1 - QA3 , or other circuits composed of thin film transistors are used to realize the current source. However, no matter what the structure is, the threshold voltage (threshold voltage) and carrier mobility shift (Variation) of thin-film transistors produced by low-temperature polysilicon technology will vary due to the laser crystallization process, making each transistor as a current Source thin film transistors, such as QA1 to QA3, have different threshold voltages and carrier mobility offsets, so that the pixel current IP output by the digital/analog converter 100 will be equal to the gray scale value D Errors occur in the corresponding current, and the predetermined luminous brightness cannot be achieved.

请参照图2,其为传统电流源分布示意图。传统的解决方法是让产生电流I、2I、4I、8I的电流源在空间上平均分布,即每个电流源理想上均产生固定电流I,例如依比例用两个电流源产生2I,用四个电流源产生4I,用8个电流源产生8I等,以此类推。请参考图2,空间上平均分布是指,当灰阶值D所对应的像素电流IP为8I时,用八个电流源产生8I,其八个电流源分别为图2中的A、B、C、D、E、F、G、H,并将八个电流源A、B、C、D、E、F、G、H是分散在左右两边,藉由这种将产生8I的电流源在空间上平均分布以降低每一像素电流IP间彼此的差异。但此种做法会大幅增加了数字/模拟转换器100的面积。故为了解决因薄膜晶体管的临界电压及载子迁移率会因激光结晶制程而造成变异,所造成每个薄膜晶体管彼此的临界电压与载子迁移率的偏移量不同,使得画面不均匀的问题,是业界急需解决的课题之一。Please refer to FIG. 2 , which is a schematic diagram of traditional current source distribution. The traditional solution is to distribute the current sources that generate currents I, 2I, 4I, and 8I evenly in space, that is, each current source ideally generates a fixed current I. For example, two current sources are used in proportion to generate 2I, and four One current source produces 4I, eight current sources produce 8I, etc., and so on. Please refer to Figure 2, the average distribution in space means that when the pixel current IP corresponding to the grayscale value D is 8I, eight current sources are used to generate 8I, and the eight current sources are A, B, C, D, E, F, G, H, and the eight current sources A, B, C, D, E, F, G, H are scattered on the left and right sides, and this will generate a current source of 8I in Spatially evenly distributed to reduce the difference between each pixel current IP. However, this method will greatly increase the area of the digital/analog converter 100 . Therefore, in order to solve the problem that the threshold voltage and carrier mobility of thin film transistors will vary due to the laser crystallization process, resulting in different offsets between the threshold voltage and carrier mobility of each thin film transistor, resulting in uneven images. , is one of the issues that the industry urgently needs to solve.

发明内容Contents of the invention

有鉴于此,本发明的目的就是在提供一种发光二极管显示面板及其数字/模拟转换器,以解决每个以薄膜晶体管实现的电流源,其彼此的临界电压偏移量不一样的问题,以提高画面品质。In view of this, the object of the present invention is to provide a light-emitting diode display panel and its digital/analog converter, so as to solve the problem that the threshold voltage offsets of each current source implemented by a thin film transistor are different from each other, to improve picture quality.

根据本发明的目的,提出一种数字/模拟转换器,其是用于发光二极管显示面板。发光二极管显示面板具有基板与至少一个像素。基板具有第一区域与第二区域。像素至少包括一个第一薄膜晶体管及一发光二极管。第一薄膜晶体管用以根据像素电流以驱动发光二极管。第一薄膜晶体管是配置于第二区域。数字/模拟转换器包括多个开关电路与多个电流源。多个开关电路分别以至少一个第二薄膜晶体管达成并根据一灰阶值选择性地导通。多个开关电路是配置于第二区域。多个电流源分别以至少一个第三薄膜晶体管达成并分别与对应的多个开关电路电性连接,并依据所对应的多个开关电路的导通状态,以各自选择性地输出一电流以产生像素电流。多个电流源是配置于第一区域。According to the object of the present invention, a digital/analog converter is provided for a light emitting diode display panel. The LED display panel has a substrate and at least one pixel. The substrate has a first area and a second area. The pixel at least includes a first thin film transistor and a light emitting diode. The first thin film transistor is used to drive the light emitting diode according to the pixel current. The first thin film transistor is arranged in the second area. The digital/analog converter includes multiple switching circuits and multiple current sources. A plurality of switch circuits are respectively realized by at least one second thin film transistor and are selectively turned on according to a gray scale value. A plurality of switch circuits are arranged in the second area. The plurality of current sources are respectively realized by at least one third thin film transistor and are respectively electrically connected to the corresponding plurality of switch circuits, and each selectively outputs a current according to the conduction state of the corresponding plurality of switch circuits to generate pixel current. Multiple current sources are arranged in the first area.

其中,形成于第一区域的薄膜晶体管是具有第一通道掺杂浓度,形成于第二区域的薄膜晶体管是具有第二通道掺杂浓度。在低温多晶硅制程下,第一区域的薄膜晶体管的临界电压(Threshold Voltage)偏移量(variation)为第一偏移量,第二区域中的薄膜晶体管的临界电压偏移量为第二偏移量,第一偏移量是小于第二偏移量。Wherein, the thin film transistors formed in the first region have a first channel doping concentration, and the thin film transistors formed in the second region have a second channel doping concentration. Under the low-temperature polysilicon process, the threshold voltage (Threshold Voltage) deviation (variation) of the thin film transistor in the first region is the first deviation, and the threshold voltage deviation of the thin film transistor in the second region is the second deviation amount, the first offset is less than the second offset.

根据本发明的另一目的,提出一种发光二极管显示面板,其包括基板、像素与数字/模拟转换器。基板具有第一区域与第二区域。像素至少包括一个第一薄膜晶体管及一发光二极管。第一薄膜晶体管用以根据像素电流驱动发光二极管并配置于第二区域。数字/模拟转换器依据灰阶值以输出像素电流,其包括多个开关电路与多个电流源。多个开关电路分别以至少一个第二薄膜晶体管达成并根据灰阶值选择性地导通。多个开关电路配置于第二区域。多个电流源分别以至少一个第三薄膜晶体管达成。多个电流源是分别与对应的多个开关电路电性连接并依据所对应的多个开关电路的导通状态,以各自选择性地输出一电流以产生像素电流。多个电流是配置于第一区域。According to another object of the present invention, a light emitting diode display panel is provided, which includes a substrate, pixels and a digital/analog converter. The substrate has a first area and a second area. The pixel at least includes a first thin film transistor and a light emitting diode. The first thin film transistor is used to drive the light emitting diode according to the pixel current and is arranged in the second area. The digital/analog converter outputs the pixel current according to the grayscale value, which includes a plurality of switch circuits and a plurality of current sources. A plurality of switch circuits are respectively realized by at least one second thin film transistor and are selectively turned on according to the gray scale value. A plurality of switch circuits are arranged in the second area. The plurality of current sources are realized by at least one third thin film transistor respectively. The plurality of current sources are respectively electrically connected to the corresponding plurality of switch circuits and selectively output a current according to the conduction states of the corresponding plurality of switch circuits to generate the pixel current. Multiple currents are configured in the first area.

其中,形成于第一区域的薄膜晶体管是具有第一通道掺杂浓度,形成于第二区域的薄膜晶体管是具有第二通道掺杂浓度。在低温多晶硅制程下,第一区域的薄膜晶体管的临界电压(Threshold Voltage)偏移量(variation)为第一偏移量,第二区域中的薄膜晶体管的临界电压偏移量为第二偏移量,第一偏移量是小于第二偏移量。Wherein, the thin film transistors formed in the first region have a first channel doping concentration, and the thin film transistors formed in the second region have a second channel doping concentration. Under the low-temperature polysilicon process, the threshold voltage (Threshold Voltage) deviation (variation) of the thin film transistor in the first region is the first deviation, and the threshold voltage deviation of the thin film transistor in the second region is the second deviation amount, the first offset is less than the second offset.

为让本发明的上述目的、特征、和优点能更明显易懂,下文特举一较佳实施例,并配合附图,作详细说明如下。In order to make the above-mentioned purpose, features, and advantages of the present invention more comprehensible, a preferred embodiment will be described in detail below together with the accompanying drawings.

附图说明Description of drawings

图1为传统数字/模拟转换器的电路架构示意图。FIG. 1 is a schematic diagram of a circuit architecture of a conventional digital/analog converter.

图2为传统电流源分布示意图。Fig. 2 is a schematic diagram of traditional current source distribution.

图3为低温多晶硅薄膜晶体管的掺杂剂量与临界电压的实验结果图。FIG. 3 is an experimental result diagram of doping dose and threshold voltage of a low-temperature polysilicon thin film transistor.

图4为依照本发明一较佳实施例的一种电激发光体显示面板的示意图。FIG. 4 is a schematic diagram of an electroluminescence display panel according to a preferred embodiment of the present invention.

图5A为以薄膜晶体管做为电流源的一例的电路示意图。FIG. 5A is a schematic circuit diagram of an example of a thin film transistor as a current source.

图5B为以薄膜晶体管做为电流源的另一例的电路示意图。FIG. 5B is a schematic circuit diagram of another example using a thin film transistor as a current source.

图6为以数字/模拟转换器408(1)为一例的电路架构示意图。FIG. 6 is a schematic diagram of the circuit structure of the digital/analog converter 408 ( 1 ) as an example.

附图符号说明Description of reference symbols

100:数字/模拟转换器100: Digital/Analog Converter

400:发光二极管显示面板400: LED display panel

402:基板402: Substrate

404:数据驱动电路404: Data drive circuit

406:像素阵列406: pixel array

408:数字/模拟转换器408: Digital/Analog Converter

410:扫描驱动电路410: Scan driving circuit

晶体管:QA1、QA2、QA3、QB1、QB2、QB3、QC1、QC2、QC3、Q1、Q2、Q3Transistors: QA1, QA2, QA3, QB1, QB2, QB3, QC1, QC2, QC3, Q1, Q2, Q3

具体实施方式Detailed ways

低温多晶硅薄膜晶体管在制程时,在不同的通道掺杂浓度下,制造出的薄膜晶体管,其临界电压会有不同的偏移量(Variation)。请参照图3,其所绘示乃低温多晶硅薄膜晶体管以XeCl激光在能量350mJ/cm2的条件下所得到的掺杂剂量与临界电压的实验结果图。横轴代表通道掺杂浓度的掺杂剂量(dopingdosage),以cm-2为单位。纵轴代表临界电压Vt,以伏特(voltage)为单位。曲线N为NMOS的掺杂剂量与其临界电压偏移量的关系曲线,曲线P为PMOS的掺杂剂量与其临界电压偏移量的关系曲线。在不同的掺杂剂量下,形成不同的通道掺杂浓度,使得薄膜晶体管会有不同的临界电压偏移量,误差节线(error bar)E是用以代表临界电压偏移量(Variation)的大小。例如,在掺杂剂量为1.0E+13cm-2时,NMOS的临界电压偏移量(Variation)的大小是对应至误差节线E的长度。误差节线E越长表示偏移量越大,亦即表示NMOS的临界电压的差异性越大。因此可知,曲线N中,NMOS的临界电压偏移量最大是在掺杂剂量为1.0E+13cm-2时。During the manufacturing process of low-temperature polysilicon thin film transistors, the thin film transistors manufactured under different channel doping concentrations have different variations in the threshold voltage. Please refer to FIG. 3 , which shows the experimental results of the doping dose and the threshold voltage of the low-temperature polysilicon thin film transistor using the XeCl laser at an energy of 350 mJ/cm 2 . The horizontal axis represents the doping dosage (doping dosage) of the channel doping concentration, in cm −2 . The vertical axis represents the threshold voltage Vt in units of volts. Curve N is a relationship curve between the dopant dose of NMOS and its threshold voltage offset, and curve P is a relationship curve between the dopant dose of PMOS and its threshold voltage offset. Under different doping doses, different channel doping concentrations are formed, so that thin film transistors will have different threshold voltage shifts, and the error bar E is used to represent the threshold voltage shift (Variation) size. For example, when the doping dose is 1.0E+13cm −2 , the threshold voltage variation (Variation) of the NMOS corresponds to the length of the error node E. The longer the error node line E, the larger the offset, that is, the larger the difference of the threshold voltage of the NMOS. Therefore, it can be seen that in the curve N, the maximum threshold voltage shift of the NMOS is when the doping dose is 1.0E+13cm −2 .

利用此关系,找出某一掺杂剂量下的所形成的通道掺杂浓度,制造出的薄膜晶体管,其临界电压偏移量最小,即误差节线最短。例如将PMOS经由掺杂硼(Boron)来改变其通道掺杂浓度(channel doping),并找出PMOS的临界电压偏移量(Variation)最小时的通道掺杂浓度,例如图3中的A点,其掺杂剂量为8.0E+12cm-2时,PMOS的临界电压的偏移量(Variation)是为最小。故以此掺杂剂量8.0E+12cm-2所制作出来的薄膜晶体管,其用以做为电流源使用时,各个电流源所输出的电流与理想值的差异将最小,使得数字/模拟转换吕所输出的像素电流更接近理想值。Using this relationship, find out the doping concentration of the formed channel under a certain doping dose, and the manufactured thin film transistor has the smallest threshold voltage shift, that is, the shortest error node line. For example, change the channel doping concentration (channel doping) of PMOS by doping boron (Boron), and find out the channel doping concentration when the threshold voltage shift (Variation) of PMOS is the smallest, such as point A in Figure 3 , when the dopant dose is 8.0E+12cm -2 , the threshold voltage shift (Variation) of PMOS is the smallest. Therefore, when the thin film transistor manufactured with this dopant dose of 8.0E+12cm -2 is used as a current source, the difference between the current output by each current source and the ideal value will be the smallest, so that the digital/analog conversion Lu The output pixel current is closer to the ideal value.

请参照图4,其绘示乃依照本发明一较佳实施例的一种电激发光体显示面板的示意图。电激发光体显示面板包括基板402、数据驱动电路404、扫描驱动电路410与像素阵列406。基板402例如为电激发光体显示基板,其是具有一第一区域L1与一第二区域L2。像素阵列406由多个像素所组成,每个像素至少包括一个薄膜晶体管Q1及一个电激发光体,电激发光体例如为有机发光二极管(Organic Light Emitting Diode)或高分子有机发光二极管(Ploymer Light Emitting Diode)(薄膜晶体管Q1与电激发光体未绘示在图4中)。故电激发光体显示面板例如发光二极管显示面板。薄膜晶体管Q1是用以根据像素电流以驱动发光二极管。薄膜晶体管Q1是配置在第二区域L2。扫描驱动电路410是依序输出扫描信号至像素阵列406以使每个像素接收对应的像素电流IP′(1)~IP′(X),X是为正整数,扫描驱动电路410是配置在第二区域L2。Please refer to FIG. 4 , which is a schematic diagram of an electroluminescence display panel according to a preferred embodiment of the present invention. The electroluminescent display panel includes a substrate 402 , a data driving circuit 404 , a scanning driving circuit 410 and a pixel array 406 . The substrate 402 is, for example, an electroluminescence display substrate, which has a first region L1 and a second region L2. The pixel array 406 is composed of a plurality of pixels, and each pixel includes at least one thin film transistor Q1 and an electroluminescent body, such as an organic light emitting diode (Organic Light Emitting Diode) or a polymer organic light emitting diode (Polymer Light Emitting Diode). Emitting Diode) (thin film transistor Q1 and electroluminescent body are not shown in FIG. 4). Therefore, the electroluminescence display panel is, for example, a light emitting diode display panel. The TFT Q1 is used to drive the LED according to the pixel current. The thin film transistor Q1 is disposed in the second region L2. The scanning driving circuit 410 sequentially outputs scanning signals to the pixel array 406 so that each pixel receives the corresponding pixel current IP'(1)~IP'(X), X is a positive integer, and the scanning driving circuit 410 is configured in the second Second area L2.

数据驱动电路404依据灰阶值以输出像素电流IP′(1)~IP′(X)并包括多个数字/模拟转换器408(1)~408(X)。每个数字/模拟转换器408(1)~408(X)均包括多个开关电路与多个电流源(多个开关电路与多个电流源未绘示于图4中)。多个开关电路是分别以至少一个薄膜晶体管Q2达成。多个开关电路是根据灰阶值选择性地导通,并配置于第二区域L2。多个电流源是分别以至少由一个薄膜晶体管Q3达成并分别与对应的开关电路电性连接,以依据所对应的开关电路的导通状态,以各自选择性地输出一电流以产生像素电流IP。多个电流源是配置于第一区域L1。其中,形成于第一区域L1的薄膜晶体管,例如薄膜晶体管Q3,是具有第一通道掺杂浓度,形成于第二区域L2的薄膜晶体管,例如薄膜晶体管Q1与Q2,是具有第二通道掺杂浓度,于低温多晶硅制程下,第一区域L1的薄膜晶体管Q3的临界电压(ThresholdVoltage)偏移量(variation)为一第一偏移量,而第二区域L2中的薄膜晶体管Q1、Q2的临界电压偏移量为第二偏移量,第一偏移量是小于第二偏移量。The data driving circuit 404 outputs pixel currents IP′(1)˜IP′(X) according to grayscale values and includes a plurality of digital/analog converters 408(1)˜408(X). Each of the digital/analog converters 408(1)˜408(X) includes a plurality of switch circuits and a plurality of current sources (the plurality of switch circuits and the plurality of current sources are not shown in FIG. 4 ). A plurality of switch circuits are realized by at least one thin film transistor Q2 respectively. A plurality of switch circuits are selectively turned on according to the gray scale value, and are arranged in the second area L2. The plurality of current sources are respectively implemented by at least one thin film transistor Q3 and are electrically connected to the corresponding switch circuits, so as to selectively output a current according to the conduction state of the corresponding switch circuits to generate the pixel current IP . A plurality of current sources are disposed in the first area L1. Wherein, the thin film transistors formed in the first region L1, such as the thin film transistor Q3, have the first channel doping concentration, and the thin film transistors formed in the second region L2, such as the thin film transistors Q1 and Q2, have the second channel doping concentration. Concentration, under the low-temperature polysilicon process, the threshold voltage (Variation) of the thin film transistor Q3 in the first region L1 is a first deviation, and the threshold voltage of the thin film transistors Q1 and Q2 in the second region L2 The voltage offset is the second offset, and the first offset is smaller than the second offset.

进一步来说,本实施例与传统不同的地方在于:传统作法方面,整个驱动电路,例如数据驱动电路或者扫描驱动电路,均与像素阵列以同一通道掺杂浓度制作于同一基板402上,此通道掺杂浓度例如为第二通道掺杂浓度,在第二通道掺杂浓度下,PMOS与NMOS的临界电压的绝对值是相近,以利电路设计。但在此通道掺杂浓度下,薄膜晶体管的临界电压偏移量较大,例如图3中掺杂剂量为2.0E+12cm-2时,PMOS与NMOS的临界电压是接近对称(于图3中的B、C两点)。然,此时PMOS的误差节线E′相较于其他掺杂剂量下为大,所以此掺杂剂量(2.0E+12cm-2)下PMOS的临界电压偏移量较大。而本实施例于每个数字/模拟转换器408中,多个电流源以具有第一通道掺杂浓度的薄膜晶体管,例如薄膜晶体管Q3,来实现。藉由本实施例的精神,经由实验找出此使临界电压的偏移量最小时的掺杂剂量,以此掺杂剂量所产生的通道掺杂浓度作为第一通道掺杂浓度,以此第一通道掺杂浓度下形成薄膜晶体管Q3设置于基板402中的第一区域L1中。如此,将可得到临界电压偏移量最小的薄膜晶体管Q3,以减少以薄膜晶体管Q3实现的多个电流源彼此间的元件差异,以使多个电流源产生的电流大小均能接近于理想值。Further, the difference between this embodiment and the conventional ones is that in the traditional method, the entire driving circuit, such as the data driving circuit or the scanning driving circuit, is fabricated on the same substrate 402 as the pixel array with the same channel doping concentration, and the channel The doping concentration is, for example, the second channel doping concentration. Under the second channel doping concentration, the absolute values of the threshold voltages of PMOS and NMOS are similar to facilitate circuit design. However, at this channel doping concentration, the threshold voltage shift of the thin film transistor is relatively large. For example, when the doping dose is 2.0E+12cm -2 in FIG. 3, the threshold voltages of PMOS and NMOS are nearly symmetrical (in FIG. point B and C). However, at this time, the error node line E′ of the PMOS is larger than that of other dopant dosages, so the threshold voltage shift of the PMOS is larger at this dopant dosage (2.0E+12cm −2 ). In this embodiment, in each digital/analog converter 408 , a plurality of current sources are realized by thin film transistors having a first channel doping concentration, such as thin film transistor Q3 . With the spirit of this embodiment, the dopant dose that minimizes the offset of the threshold voltage is found through experiments, and the channel doping concentration generated by the doping dose is used as the first channel doping concentration, and the first channel doping concentration is used as the first channel doping concentration. The thin film transistor Q3 formed under the channel doping concentration is disposed in the first region L1 of the substrate 402 . In this way, the thin film transistor Q3 with the smallest threshold voltage shift can be obtained, so as to reduce the element difference between the multiple current sources realized by the thin film transistor Q3, so that the magnitude of the current generated by the multiple current sources can be close to the ideal value .

而以薄膜晶体管实现电流源的方法有很多种,请参照图5A与图5B,图5A为以薄膜晶体管做为电流源的一例的电路示意图,图5B为以薄膜晶体管做为电流源的另一例的电路示意图。图5A与图5B中,薄膜晶体管Q3皆以不同的W/L比设定薄膜晶体管Q3导通时的电流的大小,以达到输出电流(20)I、(21)I...(2N-1)I。或者,利用电流镜的方式来实现电流源。所以不论以何种薄膜晶体管所组成电流源架构,皆以具有第一通道掺杂浓度的薄膜晶体管Q3来实现。如此,每个数字/模拟转换器408中的多个电流源所输出的每一级电流大小,都将变得更均匀。There are many ways to implement a current source with thin film transistors. Please refer to FIG. 5A and FIG. 5B. FIG. 5A is a schematic circuit diagram of an example of using a thin film transistor as a current source, and FIG. 5B is another example of using a thin film transistor as a current source. The schematic diagram of the circuit. In FIG. 5A and FIG. 5B , the thin film transistor Q3 uses different W/L ratios to set the magnitude of the current when the thin film transistor Q3 is turned on, so as to achieve the output current (2 0 )I, (2 1 )I...( 2 N-1 )I. Alternatively, a current source can be realized by means of a current mirror. Therefore, no matter what kind of thin film transistors are used to form the current source structure, it is realized by the thin film transistor Q3 having the first channel doping concentration. In this way, the magnitude of each stage of current output by the multiple current sources in each digital/analog converter 408 will become more uniform.

请参照图6,其绘示乃以数字/模拟转换器408(1)为一例的电路架构示意图。将做为电流源的薄膜晶体管Q3(1)~Q3(N),设置于第一区域L1。由于临界电压偏移量是为最小,所以每一级电流源所输出的电流(20)I、(21)I...(2N-1)I彼此间的差异将大幅减少,而将多个开关电路以薄膜晶体管Q2(0)~Q2(N-1)与Q2(0′)~Q2(N-1′)来实现,并设置于第二区域L2。如此,数字/模拟转换器408(1)产生的像素电流IP′(1)与数字/模拟转换器408(X)产生的像素电流IP′(X),彼此差异将更小。当所有的数字/模拟转换器408(1)~408(K)接收的相同的灰阶值D时,每个数字/模拟转换器408(1)~408(K)输出的像素电流IP′(1)~IP′(K)彼此差异将比传统更小,也更接近灰阶值D所对应的电流大小,使整个显示画面显示出相同的亮度比传统的更为均匀。Please refer to FIG. 6 , which shows a schematic circuit structure diagram of the digital/analog converter 408 ( 1 ) as an example. Thin film transistors Q3 ( 1 ) to Q3 (N) serving as current sources are disposed in the first region L1 . Since the critical voltage offset is the minimum, the difference between the output currents (2 0 )I, (2 1 )I...(2 N-1 )I of each stage of current source will be greatly reduced, and A plurality of switch circuits are realized by thin film transistors Q2(0)˜Q2(N−1) and Q2(0′)˜Q2(N−1′), and are disposed in the second region L2. In this way, the difference between the pixel current IP'(1) generated by the D/A converter 408(1) and the pixel current IP'(X) generated by the D/A converter 408(X) will be smaller. When all the digital/analog converters 408(1)-408(K) receive the same gray scale value D, the pixel current IP'( 1)~IP'(K) will be smaller than the traditional ones, and will be closer to the current corresponding to the gray scale value D, so that the entire display screen will display the same brightness and be more uniform than the traditional one.

而在对于每个数字/模拟转换器408所包括的多个开关电路与其他电路,其他电路例如扫描驱动电路410、像素阵列406及数据驱动电路404,对于薄膜晶体管的临界电压偏移量,并不会对其运作产生太大的影响。所以数据驱动电路404中除了多个电流源外,其余电路均设置于基板402的第二区域L2中。于使用第二通道掺杂浓度的第二区域L2中,PMOS与NMOS的临界电压的绝对值是相近,以利电路设计。或者要将扫描驱动电路410整合在显示面板上时,也将其设置于基板402的第二区域L2。For the plurality of switching circuits and other circuits included in each digital/analog converter 408, other circuits such as the scan driving circuit 410, the pixel array 406 and the data driving circuit 404, for the threshold voltage offset of the thin film transistor, and It will not have much impact on its operation. Therefore, except for a plurality of current sources in the data driving circuit 404 , other circuits are all disposed in the second region L2 of the substrate 402 . In the second region L2 using the second channel doping concentration, the absolute values of the threshold voltages of PMOS and NMOS are similar, which is convenient for circuit design. Alternatively, when the scan driving circuit 410 is to be integrated on the display panel, it is also disposed in the second area L2 of the substrate 402 .

本发明上述实施例所揭露的发光二极管显示面板及其数字/模拟转换器,藉由找出临界电压偏移量最小时的通道掺杂浓度,以此通道掺杂浓度制造出的薄膜晶体管,其临界电压偏移量最小,并将数字/模拟转换器中的多个电流源以此薄膜晶体管实现,使得每一级电流源的电流大小,都将会更接近理想值。In the light-emitting diode display panel and its digital/analog converter disclosed in the above-mentioned embodiments of the present invention, by finding the channel doping concentration at which the threshold voltage shift is the smallest, the thin film transistors manufactured with the channel doping concentration are obtained. The critical voltage offset is the smallest, and multiple current sources in the digital/analog converter are implemented with the thin film transistors, so that the current magnitude of each stage of the current source will be closer to the ideal value.

综上所述,虽然本发明已以一较佳实施例揭露如上,然其并非用以限定本发明,任何熟习此技艺者,在不脱离本发明的精神和范围内,当可作各种的更动与润饰,因此本发明的保护范围当视后附的权利要求所界定者为准。In summary, although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Anyone skilled in this art can make various modifications without departing from the spirit and scope of the present invention. Changes and modifications, so the protection scope of the present invention shall prevail as defined by the appended claims.

Claims (14)

1. digital/analog converter, be used for a LED display panel, this LED display panel has a substrate and at least one pixel, this substrate is to have a first area and a second area, this pixel comprises a first film transistor and a light emitting diode at least, this the first film transistor be in order to according to a pixel current to drive this light emitting diode, this first film transistor is to be disposed at this second area, this digital/analog converter comprises:
A plurality of on-off circuits are to reach with at least one second thin film transistor (TFT) respectively, and described on-off circuit is that described on-off circuit is to be configured in this second area according to an optionally conducting of GTG value; And
A plurality of current sources, be to reach with at least one the 3rd thin film transistor (TFT) respectively, described current source is to electrically connect with corresponding described on-off circuit respectively, and the conducting state of the pairing described on-off circuit of foundation, optionally to export an electric current separately to produce this pixel current, described current source is to be configured in this first area;
Wherein, the thin film transistor (TFT) that is formed on this first area is to have a first passage doping content, the thin film transistor (TFT) that is formed on this second area is to have a second channel doping content, under the low temperature polycrystalline silicon processing procedure, the critical voltage side-play amount of the thin film transistor (TFT) of this first area is one first side-play amount, the critical voltage side-play amount of the thin film transistor (TFT) in this second area is one second side-play amount, and this first side-play amount is less than this second side-play amount.
2. digital/analog converter as claimed in claim 1 wherein, in this digital/analog converter, has only described current source to be configured in this first area.
3. LED display panel comprises:
One substrate has a first area and a second area;
One pixel comprises a first film transistor and a light emitting diode at least, and this first film transistor is in order to driving this light emitting diode according to a pixel current, and this first film transistor is to be configured in this second area; And
One digital/analog converter, to export this pixel current, this digital/analog converter comprises according to a GTG value for it:
A plurality of on-off circuits are to reach with at least one second thin film transistor (TFT) respectively, and described on-off circuit is that described on-off circuit is to be configured in this second area according to an optionally conducting of GTG value; And
A plurality of current sources, be to reach with at least one the 3rd thin film transistor (TFT) respectively, described current source is to electrically connect with corresponding described on-off circuit respectively, and the conducting state of the pairing described on-off circuit of foundation, optionally to export an electric current separately to produce this pixel current, described current source is to be configured in this first area;
Wherein, the thin film transistor (TFT) that is formed on this first area is to have a first passage doping content, the thin film transistor (TFT) that is formed at this second area is to have a second channel doping content, under the low temperature polycrystalline silicon processing procedure, the critical voltage side-play amount of the thin film transistor (TFT) of this first area is one first side-play amount, the critical voltage side-play amount of the thin film transistor (TFT) in this second area is one second side-play amount, and this first side-play amount is less than this second side-play amount.
4. display panel as claimed in claim 3 wherein, in this digital/analog converter, has only described current source to be arranged on this first area.
5. display panel as claimed in claim 3, wherein, this display panel more comprises scan driving circuit, so that this pixel receives this pixel current, this scan drive circuit is arranged on this second area to this scan drive circuit output one scan signal to this pixel.
6. LED display panel is to comprise:
One substrate has a first area and a second area, and the thin film transistor (TFT) that is formed at this first area has a first passage doping content, and the thin film transistor (TFT) that is formed at this second area has a second channel doping content;
One pixel comprises a first film transistor and an Organic Light Emitting Diode at least, and this first film transistor is in order to driving this Organic Light Emitting Diode according to a pixel current, and this first film transistor is this second area of configuration;
Scan driving circuit, be output one scan signal to this pixel so that this pixel receives this pixel current, this scan drive circuit is to be disposed at this second area; And
One data drive circuit, to export this pixel current, this data drive circuit comprises a digital/analog converter according to a GTG value, this digital/analog converter comprises:
A plurality of on-off circuits are to be arranged at this second area and to be reached by the thin film transistor (TFT) of this second area, and described on-off circuit is according to this optionally conducting of GTG value; And
A plurality of current sources, be arranged on this first area and reached by the thin film transistor (TFT) of this first area, described current source is to electrically connect with corresponding described on-off circuit respectively, and the conducting state of the pairing described on-off circuit of foundation, optionally export an electric current separately to produce this pixel current;
Wherein, the critical voltage side-play amount of the thin film transistor (TFT) of this first area is one first side-play amount, and the critical voltage side-play amount of the thin film transistor (TFT) in this second area is one second side-play amount, and this first side-play amount is less than this second side-play amount.
7. electroluminescence body display panel is to comprise:
One pixel comprises a first film transistor and an electroluminescence body, this first film transistor be in order to according to a pixel current to drive this electroluminescence body;
A plurality of on-off circuits are that each is reached with one second thin film transistor (TFT) with a second channel doping content at least, and described on-off circuit is according to an optionally conducting of GTG value; And
A plurality of current sources, be that each is reached with one the 3rd thin film transistor (TFT) with a first passage doping content at least, described current source is to electrically connect with corresponding described on-off circuit respectively, and the conducting state of the pairing described on-off circuit of foundation, optionally to export an electric current separately to produce this pixel current;
Wherein, this first passage doping content is different with this second channel doping content.
8. electroluminescence body display panel as claimed in claim 7, wherein, the critical voltage side-play amount that the critical voltage side-play amount that described the 3rd thin film transistor (TFT) is had is had less than described second thin film transistor (TFT).
9. electroluminescence body display panel as claimed in claim 7, wherein, the critical voltage side-play amount that this first passage doping content is described the 3rd thin film transistor (TFT) is hour pairing doping content.
10. electroluminescence body display panel as claimed in claim 7, wherein, this second thin film transistor (TFT) and the 3rd thin film transistor (TFT) are low-temperature polysilicon film transistors.
11. an electroluminescence body display base plate comprises:
A plurality of electroluminescence bodies;
A plurality of current sources are reached by a plurality of thin film transistor (TFT)s with a first passage doping content; And
A plurality of on-off circuits, reached by a plurality of thin film transistor (TFT)s with a second channel doping content, these a plurality of current sources are to electrically connect with a plurality of on-off circuits of corresponding this respectively, and according to the conducting state of pairing this a plurality of on-off circuits to drive these a plurality of electroluminescence bodies of correspondence;
Wherein, this first passage doping content is different with this second channel doping content.
12. electroluminescence body display base plate as claimed in claim 11, wherein, this first passage doping content is the critical voltage side-play amount hour pairing doping content of these a plurality of thin film transistor (TFT)s with this first passage doping content.
13. electroluminescence body display base plate as claimed in claim 11, wherein, the critical voltage side-play amount of these a plurality of thin film transistor (TFT)s with this first passage doping content is less than these a plurality of critical voltage side-play amounts with thin film transistor (TFT) of this second channel doping content.
14. electroluminescence body display base plate as claimed in claim 11, wherein, these a plurality of thin film transistor (TFT)s with this first passage doping content are low-temperature polysilicon film transistors with these a plurality of thin film transistor (TFT)s with this second channel doping content.
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Cited By (2)

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WO2016145726A1 (en) * 2015-03-16 2016-09-22 深圳市华星光电技术有限公司 Low temperature polysilicon thin film transistor array substrate manufacturing method
CN107221291A (en) * 2017-07-31 2017-09-29 上海天马微电子有限公司 Display substrate, display panel, driving method of display panel and display device

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Publication number Priority date Publication date Assignee Title
US5909187A (en) * 1997-08-26 1999-06-01 C-Cube Microsystems Current steering circuit for a digital-to-analog converter
JPH1188177A (en) * 1997-09-05 1999-03-30 Rohm Co Ltd D/a converter
CN1266658C (en) * 2003-10-20 2006-07-26 友达光电股份有限公司 Pixel Structure of Active Organic Light Emitting Diodes

Cited By (4)

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Publication number Priority date Publication date Assignee Title
WO2016145726A1 (en) * 2015-03-16 2016-09-22 深圳市华星光电技术有限公司 Low temperature polysilicon thin film transistor array substrate manufacturing method
US10269974B2 (en) 2015-03-16 2019-04-23 Shenzhen China Star Optoelectronics Technology Co., Ltd. Method of manufacturing lower temperature polycrystal silicon thin film transistor array substrate
CN107221291A (en) * 2017-07-31 2017-09-29 上海天马微电子有限公司 Display substrate, display panel, driving method of display panel and display device
CN107221291B (en) * 2017-07-31 2019-04-23 上海天马微电子有限公司 Display substrate, display panel, driving method of display panel and display device

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