CN1603453A - Multiple arc plasma plating process - Google Patents
Multiple arc plasma plating process Download PDFInfo
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- CN1603453A CN1603453A CN 200410067482 CN200410067482A CN1603453A CN 1603453 A CN1603453 A CN 1603453A CN 200410067482 CN200410067482 CN 200410067482 CN 200410067482 A CN200410067482 A CN 200410067482A CN 1603453 A CN1603453 A CN 1603453A
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- plated film
- plating
- bias voltage
- vacuum tightness
- arc current
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Abstract
Example coating craft and so on multi- arcs, belongs to the coating processing area of technology. Including below step:To is plated a surface to carry on activation processing, the clean is clean; Will clean is plated to fix in transfers on, in the stove hall the vacuum degree will maintain 1.0-5.0 X 10 -2 Pa, simultaneously, is plated to heat up to 100-150 DEG C; Is plated the Canadian negative bias, the voltage value will be 50-200V, simultaneously joins argon 10-100ml/min, shells 1-2min; Selects the titanium, the zirconium or the chromium is the substrate material, plates the system first floor; According to the different coating color, in the vacuum degree is 1.0-3.0 X 10 -1 Pa, the bias voltage is 20-100V, the arc current is under the 50-100A condition, carries on the coating. Uses end product coating chromatic aberration which this invention produces slightly, contact surface binding force good, can the effective addressing escape the membrane question, its coating qualified rate may reach above 95%, enhanced coating product becoming a useful adult rate, the cost has been low.
Description
Technical field
The invention belongs to the plated film processing technique field, be specifically related to multiple arc plasma plating process.
Background technology
Multiple arc plasma body coating process is meant, on vacuum coating film equipment, under the certain vacuum state, use targets such as titanium, zirconium, chromium, pass through electric-arc heating, excite the atoms metal nuclear power from the formation plasma body, and react, form one deck densification and rete attractive in appearance at matrix surface with medium, reactant gases.Its color has golden yellow, rose gold, black, blueness, purple etc.Workpiece to be plated can be stainless steel, plated item, tool steel and glass, plastics etc.The finished product that adopts existing multiple arc plasma body coating process to produce exists that the coating aberration is big, problems such as interface binding power difference and demoulding, and generally about 80%, lumber recovery is low, cost is high for its plated film product qualified rate, energy consumption is big.
Summary of the invention
Problems such as the present invention exists in the prior art in order to overcome that the coating aberration is big, interface binding power difference and demoulding, purpose has been to provide a kind of technical scheme of multiple arc plasma plating process.
Described multiple arc plasma plating process is characterized in that may further comprise the steps:
(1) activation treatment is carried out on the plating piece surface, clean up;
(2) plating piece that cleans up is fixed on the pivoted frame in the coating equipment burner hearth, vacuum tightness keeps 1.0-5.0 * 10 in the burner hearth
-2Pa simultaneously, is heated to 100-150 ℃ with plating piece;
(3) plating piece is added negative bias voltage, magnitude of voltage is 50-200V, adds argon gas 10-100ml/min simultaneously, bombardment plating piece 1-2min;
(4) selecting titanium, zirconium or chromium for use is substrate material, is coated with bottom;
(5) according to different coating colors, in burner hearth, add reactant gases, be 1.0-3.0 * 10 in vacuum tightness
-1Pa, bias voltage are 20-100V, and arc current is under the 50-100A condition, carries out plated film.
Adopt technology of the present invention simple, reasonable, the finished product coating aberration that production obtains is little, interface binding power good, can effectively solve the demoulding problem, and its plated film qualification rate can reach more than 95%, and the lumber recovery, the cost that have improved the plated film product are low.
Embodiment
The present invention includes following processing step: activation treatment is carried out on the plating piece surface, and its technology is: with concentration is that the dilute inorganic acid solution of 5-10% was cleaned 3-5 minute.Solved in the former technology clean thoroughly, workpiece surface has problems such as water mark, white point, part demoulding, wipe clean workpiece surface with the softish chamois leather again, the sheet material of a 1219 * 2438mm only cleans with present method needed to finish in 5 minutes, and cleaned completely; The plating piece that cleans up is fixed on the pivoted frame in the coating equipment burner hearth, and vacuum tightness keeps 1.0-2.0 * 10 in the burner hearth
-2Pa, the best selects 1.5 * 10 for use
-2Pa simultaneously, is heated to 100-150 ℃ with plating piece; Plating piece is added negative bias voltage, and magnitude of voltage is 50-200V, adds argon gas 10-100ml/min simultaneously, and bombardment plating piece 1-2min is so that remove the small amount of dust and the dirt of plating piece remained on surface; Open ionization source, selecting titanium, zirconium or chromium etc. for use is substrate material in conjunction with strong target, is coated with bottom; According to different coating colors, in burner hearth, add in the reactant gasess such as nitrogen, oxygen, acetylene, methane, propane one or more.In vacuum tightness is 1.0-3.0 * 10
-1Pa, bias voltage are 20-100V, and arc current is under the 50-100A condition, carries out plated film; Plated film is closed ionization source and vacuum unit after finishing, and opens inflation valve, is inflated to atmospheric condition in burner hearth, takes out workpiece to be plated.
Carry out plated film according to different coating colors by following embodiment, other step in the coating process as mentioned above:
Embodiment one: golden yellow plating: vacuum tightness is 3.8 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add nitrogen N
2, flow is 150-500ml/min, the plated film time is 5-10min.
Embodiment two: plating rose gold: vacuum tightness is 2.5 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=1.5-5: 1, plated film time 5-12min.
Embodiment three: the black coating look: vacuum tightness is 1.8 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=1: 2-10, the plated film time is 4-10min.
Embodiment four: plating is blue: vacuum tightness is 2.0 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add oxygen O
2, the plated film time is 2-6min.
Embodiment five: the plating purple: vacuum tightness is 1.6 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add oxygen O
2, the plated film time is 3-7min.
Claims (8)
1. multiple arc plasma plating process is characterized in that may further comprise the steps:
(1) activation treatment is carried out on the plating piece surface, clean up;
(2) plating piece that cleans up is fixed on the pivoted frame in the coating equipment burner hearth, vacuum tightness keeps 1.0-5.0 * 10 in the burner hearth
-2Pa simultaneously, is heated to 100-150 ℃ with plating piece;
(3) plating piece is added negative bias voltage, magnitude of voltage is 50-200V, adds argon gas 10-100ml/min simultaneously, bombardment plating piece 1-2min;
(4) selecting titanium, zirconium or chromium for use is substrate material, is coated with bottom;
(5) according to different coating colors, in burner hearth, add reactant gases, be 1.0-5.0 * 10 in vacuum tightness
-1Pa, bias voltage are 20-100V, and arc current is under the 50-100A condition, carries out plated film.
2. multiple arc plasma plating process as claimed in claim 1 is characterized in that carrying out plated film according to different coating colors by following processing parameter:
Golden yellow plating: vacuum tightness is 1.0-4.0 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add nitrogen N
2, flow is 150-500ml/min, the plated film time is 5-10min.
Plating rose gold: vacuum tightness is 1.0-3.5 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=1.5-5: 1, plated film time 5-12min.
The black coating look: vacuum tightness is 1.0-3.0 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=1: 2-10, the plated film time is 4-10min.
Plating is blue: vacuum tightness is 1.0-3.0 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add oxygen O
2, the plated film time is 2-6min.
The plating purple: vacuum tightness is 1.0-3.0 * 10
-1Pa, bias voltage are 20-100V, and arc current is 50-100A, add oxygen O
2, the plated film time is 3-7min.
3. multiple arc plasma plating process as claimed in claim 1 is characterized in that the plating piece surface carries out poling processing technique and be: with concentration is that the dilute inorganic acid solution of 5-10% was cleaned 3-5 minute.
4. multiple arc plasma plating process as claimed in claim 1 is characterized in that the interior vacuum tightness of burner hearth is 1.5 * 10 in the step (2)
-2Pa, plating piece are heated to 100-150 ℃.
5. multiple arc plasma plating process as claimed in claim 1 is characterized in that step (5) is 1.0-4.5 * 10 in vacuum tightness
-1Pa, bias voltage are 20-100V, and arc current is under the 50-100A condition, carries out plated film.
6. multiple arc plasma plating process as claimed in claim 2 is characterized in that carrying out plated film according to different coating colors by following processing parameter:
Golden yellow plating: vacuum tightness is 2.0-4.0 * 10
-1Pa, bias voltage are 30-100V, and arc current is 60-100A, add nitrogen N
2, flow is 150-500ml/min, the plated film time is 5-10min.
Plating rose gold: vacuum tightness is 1.0-3.0 * 10
-1Pa, bias voltage are 25-100V, and arc current is 60-100A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=2.0-5: 1, plated film time 5-12min.
The black coating look: vacuum tightness is 1.0-2.5 * 10
-1Pa, bias voltage are 30-100V, and arc current is 60-100A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=1: 3-10, the plated film time is 4-10min.
Plating is blue: vacuum tightness is 1.5-3.0 * 10
-1Pa, bias voltage are 30-100V, and arc current is 60-100A, add oxygen O
2, the plated film time is 2-6min.
The plating purple: vacuum tightness is 1.5-3.0 * 10
-1Pa, bias voltage are 30-100V, and arc current is 60-100A, add oxygen O
2, the plated film time is 3-7min.
7. multiple arc plasma plating process as claimed in claim 2 is characterized in that carrying out plated film according to different coating colors by following processing parameter:
Golden yellow plating: vacuum tightness is 2.5-4.0 * 10
-1Pa, bias voltage are 35-100V, and arc current is 60-90A, add nitrogen N
2, flow is 150-500ml/min, the plated film time is 5-10min.
Plating rose gold: vacuum tightness is 2.0-3.0 * 10
-1Pa, bias voltage are 35-100V, and arc current is 50-90A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=2.5-5: 1, plated film time 5-12min.
The black coating look: vacuum tightness is 1.0-2.0 * 10
-1Pa, bias voltage are 25-100V, and arc current is 50-90A, add nitrogen N
2With acetylene C
2H
2, ratio is N
2: C
2H
2=1: 4-10, the plated film time is 4-10min.
Plating is blue: vacuum tightness is 1.5-2.5 * 10
-1Pa, bias voltage are 25-100V, and arc current is 50-90A, add oxygen O
2, the plated film time is 2-6min.
The plating purple: vacuum tightness is 1.5-2.5 * 10
-1Pa, bias voltage are 25-100V, and arc current is 50-90A, add oxygen O
2, the plated film time is 3-7min.
8. multiple arc plasma plating process as claimed in claim 1 is characterized in that described reactant gases is one or more in nitrogen, oxygen, acetylene, methane, the propane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100674829A CN100529162C (en) | 2004-10-26 | 2004-10-26 | Multiple arc plasma plating process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100674829A CN100529162C (en) | 2004-10-26 | 2004-10-26 | Multiple arc plasma plating process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1603453A true CN1603453A (en) | 2005-04-06 |
| CN100529162C CN100529162C (en) | 2009-08-19 |
Family
ID=34666628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100674829A Expired - Fee Related CN100529162C (en) | 2004-10-26 | 2004-10-26 | Multiple arc plasma plating process |
Country Status (1)
| Country | Link |
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| CN (1) | CN100529162C (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101337831B (en) * | 2008-08-08 | 2012-01-25 | 朱元义 | Method for metalizing surface of ceramic |
| CN104178737A (en) * | 2014-09-01 | 2014-12-03 | 苏州安洁科技股份有限公司 | Film accumulation method on metal surface capable of changing color by changing gas |
| CN105002462A (en) * | 2015-06-26 | 2015-10-28 | 金华万得福日用品股份有限公司 | Rose gold tableware coating method |
| CN105349950A (en) * | 2015-11-24 | 2016-02-24 | 厦门建霖工业有限公司 | Method for improving stability of vacuum multi-arc plated layer |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1014909B (en) * | 1987-08-28 | 1991-11-27 | 北京量具刃具厂 | Cleaning technique for steel product before film-plating |
| CN1043961A (en) * | 1989-08-21 | 1990-07-18 | 机械电子工业部北京机械工业自动化研究所 | Magnetic control arc ion plating method |
| CN1021836C (en) * | 1991-04-20 | 1993-08-18 | 中国科学院电工研究所 | Ion plating technology for titanium carbonitride coatings |
-
2004
- 2004-10-26 CN CNB2004100674829A patent/CN100529162C/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101337831B (en) * | 2008-08-08 | 2012-01-25 | 朱元义 | Method for metalizing surface of ceramic |
| CN104178737A (en) * | 2014-09-01 | 2014-12-03 | 苏州安洁科技股份有限公司 | Film accumulation method on metal surface capable of changing color by changing gas |
| CN104178737B (en) * | 2014-09-01 | 2017-12-01 | 苏州安洁科技股份有限公司 | Reach the method for changing the film layer of color and accumulating by changing gas in metal surface |
| CN105002462A (en) * | 2015-06-26 | 2015-10-28 | 金华万得福日用品股份有限公司 | Rose gold tableware coating method |
| CN105349950A (en) * | 2015-11-24 | 2016-02-24 | 厦门建霖工业有限公司 | Method for improving stability of vacuum multi-arc plated layer |
| CN105349950B (en) * | 2015-11-24 | 2018-04-10 | 厦门建霖工业有限公司 | A kind of method for improving vacuum multi sphere coated coating stability |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100529162C (en) | 2009-08-19 |
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Granted publication date: 20090819 Termination date: 20111026 |