CN1558294A - Developing machine bench with edge scrubbing device - Google Patents
Developing machine bench with edge scrubbing device Download PDFInfo
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- CN1558294A CN1558294A CNA2004100395159A CN200410039515A CN1558294A CN 1558294 A CN1558294 A CN 1558294A CN A2004100395159 A CNA2004100395159 A CN A2004100395159A CN 200410039515 A CN200410039515 A CN 200410039515A CN 1558294 A CN1558294 A CN 1558294A
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- side washing
- developing machine
- machine platform
- washing roller
- glass substrate
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Abstract
In the developing stage with one edge washing device, glass substrate is conveyed with one belt conveyer and soaked in developer liquid inside the dipper to develop the photoresist layer on the surface of the glass substrate. The developing stage has one edge washing roller set on side of the conveyer belt to peel off the photoresist layer on the edge in contact mode. The present invention has low cost and high production efficiency.
Description
Technical field
The present invention relates to a kind of developing machine platform, especially a kind of side washing device that is equiped with is applied to the developing machine platform of display panels processing procedure.
Background technology
Along with the thin film transistor (TFT) manufacturing technology is progressive fast, advantages such as LCD is frivolous owing to having possessed, power saving, radiationless line, and a large amount of being applied in the various electronic products such as personal digital aid (PDA), mobile computer, digital camera, Video Camera, mobile phone.
In the manufacturing technology of LCD, roughly can distinguish leading portion array (Array) processing procedure, stage casing liquid crystal born of the same parents (Cell) processing procedure and back segment module assembling (Assembly) processing procedure.Leading portion array processing procedure is in order to (Thin Film Transistor, TFT) array is made on the glass substrate with thin film transistor (TFT).Stage casing liquid crystal born of the same parents processing procedure, in order to this is manufactured with the glass substrate of thin film transistor (TFT) array, combines with another glass substrate that is manufactured with colored filter, and between two sheet glass substrates, pour into liquid crystal (Liquid Crystal, LC), to finish a display panels.And back segment module assembling processing procedure is in order to fit together this display panels and other, to constitute a complete LCD such as multiple spare parts such as backlight, circuit board, glue frame, metal outer frame.
The manufacturing technology that above-mentioned array processing procedure uses is similar to manufacture of semiconductor, need comprise that usually clean, film forming, photoresistance coating, development, etching and photoresistance divest this six kinds of processing procedures, to finish whole array processing procedure.Please refer to Fig. 1, show a known typical photoresistance coating process.At first, carry glass substrate 10 to enter photoresistance coating machine platform 2, and be positioned on the microscope carrier 20, subsequently, spray photoresistance solution in glass substrate 10 upper surfaces, then, adopt the mode of spin coating (Spin Coating), rotate this glass substrate 10, utilize centrifugal force that photoresistance solution is evenly coated on the glass substrate 10, then, see through pump 4 vacuum suctions (Vacuum Dry), have high-volatile solvent (solvent) composition in the removal photoresistance solution, make the photoresistance solution hardening, form a photoresist layer and be covered in glass substrate 10 upper surfaces.
Please refer to Fig. 2 A, in the spin coating process, glass substrate 10 is positioned over a microscope carrier 20, and, drive glass substrate 10 rotations via the rotation of microscope carrier 20, make the photoresistance solution 12 on the substrate 10 be subjected to centrifugal action, edge toward glass substrate 10 scatters gradually, simultaneously, unnecessary photoresistance solution 12 also through centrifugal action thus, outwards get rid of thus by the edge of glass substrate 10.Yet, please be simultaneously with reference to Fig. 2 B, photoresistance solution 12 at glass substrate 10 edges, except being subjected to the interface friction force F1 of 10 of photoresistance solution 12 and glass substrates, outside the flowing of retardance photoresistance solution 12, the surface tension F2 on photoresistance solution 12 surfaces has also hindered centrifugal force F3 to be ordered about unnecessary photoresistance solution 12 and outwards gets rid of, thereby the edge that causes photoresistance solution 12 to be accumulated in glass substrate 10 forms projection 14.
In addition, because the edge of glass substrate 10 often makes the connection lead, to output control signals to the passage between thin film transistor (TFT) array as liquid crystal display drive circuit, therefore, this coating accumulates on the photoresistance solution projection 14 at glass substrate 10 edges, must manage to be removed, in order to avoid the processing procedure of follow-up harness wiring is counteracted.
Generally speaking,, behind vacuum suction sclerosis photoresistance solution, make to form a photoresist layer 13 behind glass substrate 10, add one side washing (EdgeBean Remove, step EBR) usually in order to remove the photoresist layer material that this accumulates on the glass substrate edge.Please refer to Fig. 3, show known side washing processing procedure.In this side washing processing procedure, adopt special side washing solution 16, directly be sprayed at the side washing zone 15 at the edge of glass substrate with nozzle 30.This side washing solution 16 utilizes chemical reaction directly to dissolve photoresist, and to reach the purpose of side washing, simultaneously, this nozzle 30 moves along the edge of glass substrate 10, to remove the photoresist on 15 surfaces, side washing zone, glass substrate 10 edge.
Yet, as mentioned above, in the photoresistance coating process, add the step of side washing, except cost and the volume that increases whole photoresistance coating machine platform, simultaneously, also increase glass substrate and finish the whole road required time of photoresistance coating process, and cause the raising of cost of manufacture and the delay of time.In addition,, in the side washing step, must expend a large amount of side washing solution again, more cause the increase of production cost for the unnecessary photoresist of eccysis.
In view of this, the present invention proposes a kind of developing machine platform, directly utilizes developer solution to carry out the side washing processing procedure, thereby need not use special side washing solution, and still can reach the purpose of side washing.
Summary of the invention
The technical problem to be solved in the present invention is: a kind of developing machine platform is provided, has the side washing device, and can directly carry out the side washing action to glass substrate.
Another technical matters that the present invention will solve is: utilize the function of developer solution replacement side washing solution, to save the use amount of side washing solution.
For this reason, the present invention discloses the developing machine platform that a kind of framework has the side washing device, utilizes a conveying belt, transmits glass substrate and immerses the developer solution that is arranged in developing trough, carries out developing manufacture process with the photoresist layer to glass baseplate surface.This developing machine platform has a side washing roller, is arranged at the side of conveying belt, and rolling with the way of contact divests the photoresist layer that is positioned at glass substrate top surface edge place.
The present invention is because the direct old developing machine platform of use, and the simple side washing device of arranging in pairs or groups can reach the purpose of side washing, therefore, can reduce and carry out the required cost of side washing processing procedure; The present invention adds the side washing device in developing machine platform, and directly utilizes developer solution collocation side washing roller to divest the photoresist layer at glass substrate edge, can exempt the use of side washing solution, thereby can reduce the processing procedure cost; Side washing processing procedure of the present invention is to carry out simultaneously when glass substrate is carried out developing manufacture process, therefore, has saved the time cost of the required consumption of side washing processing procedure, has improved production efficiency.
Description of drawings
Fig. 1 is the synoptic diagram of a known photoresistance coating process;
Fig. 2 A, Fig. 2 B are in the step of spin coating photoresistance solution, and because of the photoresistance solution surface tension, the photoresistance solution that causes being positioned at the glass substrate edge produces projection;
Fig. 3 is the synoptic diagram of the side washing processing procedure of a known collocation photoresistance coating process;
Fig. 4 is the synoptic diagram of a known developing machine platform;
Fig. 5 A, Fig. 5 B for framework of the present invention in the side washing device of developing machine platform, the synoptic diagram of a specific embodiment;
Fig. 6 utilizes the way of contact to divest the synoptic diagram of photoresist layer for the side washing roller of side washing device of the present invention;
Fig. 7 is the synoptic diagram of height controller one specific embodiment of the present invention;
Fig. 8 is the synoptic diagram of elastic component one specific embodiment of the present invention;
Fig. 9 is the synoptic diagram of side washing width control device one specific embodiment of the present invention.
The drawing reference numeral explanation:
2, photoresistance coating machine platform 4, pump 10, glass substrate 12, photoresistance solution
14, photoresistance solution projection 13, photoresist layer 16, side washing solution 15, side washing zone
30, nozzle 200, conveying belt 300, glass substrate 400, developing trough
402, developer solution 410, side washing roller 420, motor 430, driving belt
310, photoresist layer 460, elastic component 442,452, screw rod
440, side washing width control device 450, height controller
Embodiment
Compared to conventional art the side washing step is added in the photoresistance coating process, the present invention proposes a kind of developing machine platform, combines the function of side washing, uses the side washing step is incorporated in the developing manufacture process, to simplify required consumed time of side washing and installation cost.
Please refer to Fig. 4, show a known typical developing machine platform, comprise a developing trough 400 and a conveying belt 200.Glass substrate 300 is positioned on the conveying belt 200, and see through the transmission of conveying belt 200, transmitting glass substrate 300 immerses in the developer solution 402 of developing trough 400 in regular turn, simultaneously, also by the transmission of conveying belt 200, glass substrate 300 after developing is shifted out developing trough 400, use and finish the processing procedure that glass substrate 300 surface light resistance layers are developed.
Please refer to Fig. 5 A and Fig. 5 B, show the side washing device of framework of the present invention in above-mentioned developing machine platform.This side washing device comprises a pair of side washing roller 410 and motor 420.Side washing roller 410 is arranged at the both sides, top of conveying belt 200, utilizes the way of contact to divest the photoresist layer at glass substrate 300 top surface edge places.And motor 420 sees through a driving belt 430, drives this side washing roller 410, as the power resources of described side washing roller 410.
Please refer to Fig. 6, show that side washing roller 410 of the present invention divests the synoptic diagram of photoresist layer 310 with the way of contact.As shown in FIG., the lower edge position of this side washing roller 410 touches the upper surface of glass substrate 300, and therefore, this is positioned at the photoresist layer 310 of glass substrate 300 upper surfaces, will be divested from the surface of glass substrate 300 by the mode of side washing roller 410 to roll.With regard to a preferred embodiment, damage for fear of 410 pairs of glass substrates 300 of side washing roller, this side washing roller 410 should be selected comparatively soft material for use, for example: sponge.Simultaneously, can thoroughly divest unnecessary photoresist layer 310 in order to ensure side washing roller 410, this side washing roller 410 is squeezed in the upper surface of glass substrate 300, divests photoresist layer 310 so that enough friction force to be provided.
On the other hand, with regard to a preferred embodiment, please refer to Fig. 7, this side washing roller 410 can be connected to a height controller 450.And this height controller 450 utilizes screw rod 452 to adjust these side washing roller 410 corresponding vertical ranges to glass substrate 300 upper surfaces, in other words, also change the pressure that side washing roller 410 puts on glass substrate 300, and side washing roller 410 puts on the friction force of photoresist layer 310.Simultaneously, the position of side washing roller 410 can also cooperate the thickness of different glass substrate 300, and desire to divest the degree of depth of photoresist layer, the corresponding adjustment.
Secondly, please refer to Fig. 8, this side washing roller 410 also can be connected to an elastic component 460.One end of this elastic component 460 is fixed, and other end stretching, extension is connected to side washing roller 410, and by the restoring force of spring side washing roller 410 is produced a downward pulling force.This downward pulling force promptly is that side washing roller 410 puts on the pressure on the glass substrate 300.
In addition, in order to cooperate different glass substrate 300 sizes, and different side washing width.Please refer to Fig. 9, this side washing roller 410 is connected with a side washing width control device 440.And this side washing width control device 440 utilizes screw rod 442, adjusts side washing roller 410 in the position perpendicular to conveying belt 200 throughput directions.
In addition, can also cooperate correlation parameters such as the thickness of the transfer rate of conveying belt 200 and direction of transfer and photoresist layer 310 and material, adjust the rotating speed and the rotation direction of motor 420,, and can obtain preferable edge-washing effect with the rotating speed and the rotation direction of decision side washing roller 410.Generally speaking, when the drive direction of the rotation direction of side washing roller 410 and conveying belt 200 is opposite, can obtain the edge-washing effect of greater efficiency.
In addition, side washing roller 410 can attach photoresistance thereon in the process that divests photoresist layer 310.For fear of the anti-glass substrate 300 of being stained with back of photoresistance, and influence the carrying out of side washing step, can be above side washing roller 410 or side the cleaning device of spray-type cleaning device (not shown) or other kind is set, the photoresistance that is attached on the cleaned at regular intervals side washing roller 410 is to obtain preferable edge-washing effect.
In sum, because the mode that the side washing processing procedure adopts contact to divest is carried out, therefore, except avoiding that glass substrate 300 and the photoresist layer that its top has developing pattern are damaged, also must avoid glass substrate 300 to be driven and the generation displacement by side washing roller 410.Simultaneously, must guarantee to be positioned at the unnecessary photoresist layer in glass substrate 300 edges again in the side washing processing procedure can be divested fully.Therefore, when carrying out the side washing processing procedure, must adjust above-mentioned side washing width control device 440 first, with the photoresist layer width that control is desired to divest, next, also must adjust above-mentioned height controller 450 and elastic component 460, adjust the pressure that side washing roller 410 puts on glass substrate 300 with appropriateness, simultaneously, the rotating speed that also will adjust motor 420 with turn to, with the translational speed of control side washing roller 410, to meet the restrictive condition of above-mentioned side washing processing procedure with respect to conveying belt 200.
Add the side washing processing procedure compared to classic method in the photoresistance coating process, the present invention directly utilizes developing machine platform to carry out the side washing processing procedure to have following advantage:
One, the present invention directly uses old developing machine platform, and the simple side washing device of arranging in pairs or groups can reach the purpose of side washing, therefore, can reduce the cost that carries out the required increase of side washing processing procedure.
Two, the present invention adds the side washing device in developing machine platform, and directly utilizes developer solution collocation side washing roller 410 to divest the photoresist layer at glass substrate 300 edges.The use of side washing solution can be exempted, thereby the processing procedure cost can be reduced.
Three, side washing processing procedure of the present invention is to carry out simultaneously when glass substrate is carried out developing manufacture process, therefore, can save the time cost of the required consumption of side washing processing procedure, to enhance productivity.
The above utilizes specific embodiment to describe the present invention in detail, but not limits the scope of the invention, and allly anyly is familiar with this skill person in field of the present invention, and equivalent variations of being done and modification should all covered in the scope of patent protection of the present invention.
Claims (11)
1, a kind of developing machine platform with side washing device comprises:
One developing trough accommodates developer solution;
One conveying belt is arranged among this developing trough, immerses in the developer solution in order to transmit glass substrate, develops with the photoresist layer to this glass baseplate surface; And
One side washing roller is arranged at the side of this conveying belt, and divests the photoresist layer at this glass substrate top surface edge place with the way of contact.
2, developing machine platform as claimed in claim 1 is characterized in that: comprise a revolution speed control device, in order to the rotating speed of controlling this side washing roller with turn to.
3, developing machine platform as claimed in claim 1 is characterized in that: comprise a height controller, in order to control the upright position of this side washing roller.
4, developing machine platform as claimed in claim 1 is characterized in that: this height controller is to utilize screw rod to control the upright position of this side washing roller.
5, developing machine platform as claimed in claim 1 is characterized in that: comprise an elastic component, in order to control the pressure that this side washing roller puts on this photoresist layer.
6, developing machine platform as claimed in claim 1 is characterized in that: comprise a side washing width control device, in order to control the width that this side washing roller divests this photoresist layer.
7, developing machine platform as claimed in claim 1 is characterized in that: this side washing width control device is to utilize screw rod to control the width that this side washing roller divests this photoresist layer.
8, developing machine platform as claimed in claim 1 is characterized in that: comprise that a motor sees through a driving-belt and is connected to this side washing roller, rotate to drive this side washing roller.
9, developing machine platform as claimed in claim 1 is characterized in that: the sense of rotation of this side washing roller is opposite with the throughput direction of this conveying belt.
10, developing machine platform as claimed in claim 1 is characterized in that: this side washing roller is material with the sponge.
11, developing machine platform as claimed in claim 1 is characterized in that: comprise another side washing roller, be arranged at another side of this conveying belt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410039515 CN1243287C (en) | 2004-02-05 | 2004-02-05 | Developing machine bench with edge scrubbing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410039515 CN1243287C (en) | 2004-02-05 | 2004-02-05 | Developing machine bench with edge scrubbing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1558294A true CN1558294A (en) | 2004-12-29 |
| CN1243287C CN1243287C (en) | 2006-02-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410039515 Expired - Fee Related CN1243287C (en) | 2004-02-05 | 2004-02-05 | Developing machine bench with edge scrubbing device |
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| Country | Link |
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| CN (1) | CN1243287C (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101718963B (en) * | 2010-01-14 | 2011-10-05 | 友达光电股份有限公司 | Developing outfit |
| CN106345649A (en) * | 2016-11-22 | 2017-01-25 | 中国科学技术大学 | Method and device for applying micro-nano particles |
| CN111045299A (en) * | 2020-01-02 | 2020-04-21 | 长江存储科技有限责任公司 | Developing and edge-washing equipment and developing and edge-washing method |
| CN112505957A (en) * | 2020-12-11 | 2021-03-16 | 深圳市华星光电半导体显示技术有限公司 | Substrate edge washing method, edge washing device and substrate |
-
2004
- 2004-02-05 CN CN 200410039515 patent/CN1243287C/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101718963B (en) * | 2010-01-14 | 2011-10-05 | 友达光电股份有限公司 | Developing outfit |
| CN106345649A (en) * | 2016-11-22 | 2017-01-25 | 中国科学技术大学 | Method and device for applying micro-nano particles |
| CN111045299A (en) * | 2020-01-02 | 2020-04-21 | 长江存储科技有限责任公司 | Developing and edge-washing equipment and developing and edge-washing method |
| CN111045299B (en) * | 2020-01-02 | 2023-07-21 | 长江存储科技有限责任公司 | Developing and edge washing equipment and developing and edge washing method |
| CN112505957A (en) * | 2020-12-11 | 2021-03-16 | 深圳市华星光电半导体显示技术有限公司 | Substrate edge washing method, edge washing device and substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1243287C (en) | 2006-02-22 |
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