CN1557989A - External heating type high temperature electric heater for high vacuum thin film settling chamber - Google Patents
External heating type high temperature electric heater for high vacuum thin film settling chamber Download PDFInfo
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- CN1557989A CN1557989A CNA2004100186115A CN200410018611A CN1557989A CN 1557989 A CN1557989 A CN 1557989A CN A2004100186115 A CNA2004100186115 A CN A2004100186115A CN 200410018611 A CN200410018611 A CN 200410018611A CN 1557989 A CN1557989 A CN 1557989A
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- heat
- vacuum chamber
- electric heater
- high temperature
- hot trap
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Abstract
The externally heating high temperature electric heater suitable for use in high vacuum film depositing chamber may be used widely in the fields of semiconductor film, film material and device technology. The electric heater includes vacuum chamber, heat well, high density heating element array comprising high temperature resistant linear resistive tube type heating elements, high heat conducting metal heat dissipating block for the heating element array to be embedded in and with high temperature resisting heat dissipating glue filled in between. The heating elements are contacted closely to the non-vacuum side of the vacuum chamber heating well via the heat dissipating glue and the mechanical fastening mechanism to obtain homogeneous heat conductance, so that the great area sample in the vacuum chamber may be heated homogeneously in raised temperature without pollution to the sample and the vacuum chamber.
Description
Technical field
The present invention relates to a kind of high temperature electric heater, particularly relate to the external-heat well heater that a kind of suitable high vacuum thin film deposition chamber is used, can be widely used in semiconductor film, thin-film material and device technology field.
Background technology
Modern is that the thin-film material of representative and the physical vapor deposition (PVD) and the chemical vapor deposition (CVD) of device are the forward positions of present material and device technology with the semiconductor film, its corresponding vacuum apparatus is the nucleus equipment of modern material and device preparation, modern thin film preparation process, the CVD technology of especially constantly bringing forth new ideas has proposed very high requirement to the performance of preparation equipment. therefore, advanced vacuum film deposition equipment has constituted the important step of whole thin film material and device technology, and the sample heating properties of raising under the high vacuum super-clean environment is exactly wherein one.
Summary of the invention
The prior art situation of well heater: existing well heater has single resistance-type heating tube, curves placed in-line U type pipe and forms.Its shortcoming is: 1. be subjected to the restriction of U type pipe radius-of-curvature, tube spacing is bigger, causes the plane heating power density less, thus make be heated sample to sink to the bottom temperature lower, can only reach more than 300 degree centigrade; 2. U type tube spacing is difficult for adjusting, so the big area heating is inhomogeneous.
The objective of the invention is to solve semiconductor film and device in physical vapor deposition (PVD) and chemical vapor deposition (CVD), the new design of the technical equipment-well heater that heats under a kind of high vacuum is provided.
Technical scheme of the present invention:
The external-heat high temperature electric heater that the high vacuum thin film deposition chamber is used, it comprises vacuum chamber body 1, hot trap 2, be connected and fixed by fastening piece 4, by sealing-ring 3 sealings, sample 19 is placed in parallel in the vacuum chamber body of hot trap below by hot trap side 18, the center bottom of hot trap is provided with a piped thermometric trap 16, the middle thermopair 15 of placing.
The outside of vacuum chamber body by vacuum chamber body water-cooled tube around.
Beneficial effect of the present invention: realized that the big area sample in the vacuum chamber obtains the height uniform heating, has improved accessible sample temperature, and has thoroughly avoided the pollution of well heater to sample and vacuum chamber.
Description of drawings
Fig. 1. electric heater is faced cross-sectional view
Fig. 2. electric heater side-looking cross-sectional view
Among the figure: 1. inlet side 19. samples of the atmospheric side 18. hot traps of vacuum chamber body 2. hot trap 3. sealing-rings 4. fastening pieces 5. flange water-cooled tubes 6. vacuum chamber body water-cooled tubes 7. orthoscopic cast heating units 8. heat-conducting metal pieces 9. heating component machanical fasteners 10. heat-conducting glues 11. heating element array 12. heating component feeder lines 13. thermal insulation materials 14. adiabatic cover plate 15. thermopairs 16. thermometric traps 17. hot traps
Embodiment
Below in conjunction with accompanying drawing the present invention is further specified:
The external-heat high temperature electric heater that this high vacuum thin film deposition chamber is used, it comprises vacuum chamber body 1, hot trap 2, be connected and fixed by fastening piece 4, by sealing-ring 3 sealings, sample 19 is placed in parallel in the vacuum chamber body of hot trap below by hot trap side (18), the center bottom of hot trap is provided with a piped thermometric trap 16, the middle thermopair 15 of placing.
The outside of vacuum chamber body by vacuum chamber body water-cooled tube 6 around.
The orthoscopic cast heating unit 7 evenly distributed composition high-density heating element array 11 of hot trap 2 are put into heat-conducting metal piece 8, fix with heating component machanical fastener 9; Thermal insulation material 13 is arranged at hot trap top, and thermal insulation material top is covered by adiabatic cover plate 14; Heat-conducting glue 10 evenly is filled in the middle of high-density heating element array and the heat-conducting metal piece, and is filled in heat-conducting metal piece bottom and hot trap contact position; Heating unit is connected on the feeder line 12 after connecting in the mode of series and parallel as required in the heating component; By the sealing-ring, be provided with water-cooled tube 5 on the flange.
Electric heater is formed high-density heating element array 11 by high temperature resistant straight line resistance tubular type heating unit, can obtain maximum planes heating power density, makes sample temperature reach 500 ℃, and has thoroughly avoided the pollution of well heater to sample and vacuum chamber.
Heating element array is inlaid into high-thermal conductive metal radiating block 8, fills thermostable heat-conductive glue (10), to obtain high thermal conductivity and big area uniform heating in heating element array and heat dissipation metal interblock.
On high-thermal conductive metal radiating block 8, cover one deck insulation thermal baffle 14, prevent thermosteresis on the one hand, on the other hand, prevent that heat from conducting to heating unit end points tie point 12.
The high temperature electric heater closely contacts with the antivacuum side 17 of vacuum chamber heating trap 2 by high temperature resistant thermal paste 10 and machine riveting mechanism 9, and carries out uniformly transfer heat by thermal radiation pair and chamber body inner heating surface 18 parallel planar samples 19.
Water-cooled tube 5 is installed, to prevent vacuum-sealing place gas leakage on hot well and vacuum chamber flange connecting dish.
Vacuum chamber body 1 feeds cold water by vacuum chamber body water-cooled tube 6, and vacuum-chamber wall is cooled off.
Central authorities insert thermopair at hot well, measure the hot well underlayer temperature.
Claims (3)
1. external-heat high temperature electric heater that the high vacuum thin film deposition chamber is used, it is characterized in that: it comprises vacuum chamber body (1), hot trap (2), be connected and fixed by fastening piece (4), seal by sealing-ring (3), sample (19) is placed in parallel in the vacuum chamber body of hot trap below by hot trap side (18), the center bottom of hot trap is provided with a piped thermometric trap (16), the middle thermopair (15) of placing.
2. the external-heat high temperature electric heater that high vacuum thin film deposition chamber according to claim 1 is used is characterized in that: the outside of vacuum chamber body (1) by vacuum chamber body water-cooled tube (6) around.
3. the external-heat high temperature electric heater that high vacuum thin film deposition chamber according to claim 1 is used, it is characterized in that: orthoscopic cast heating unit (7) the evenly distributed composition high-density heating element array (11) of hot trap (2), put into heat-conducting metal piece (8), fixing with heating component machanical fastener (9) with the antivacuum side (17) of hot trap; Thermal insulation material (13) is arranged at hot trap top, and thermal insulation material top is covered by adiabatic cover plate (14); Heat-conducting glue (10) evenly is filled in the middle of high-density heating element array and the heat-conducting metal piece, and is filled in heat-conducting metal piece bottom and hot trap contact position; Heating unit in the heating component is connected on the feeder line (12) after connecting in the series and parallel mode as required; By the sealing-ring, be provided with water-cooled tube (5) on the flange.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410018611 CN1281779C (en) | 2004-01-13 | 2004-01-13 | External heating type high temperature electric heater for high vacuum thin film settling chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410018611 CN1281779C (en) | 2004-01-13 | 2004-01-13 | External heating type high temperature electric heater for high vacuum thin film settling chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1557989A true CN1557989A (en) | 2004-12-29 |
| CN1281779C CN1281779C (en) | 2006-10-25 |
Family
ID=34351850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410018611 Expired - Fee Related CN1281779C (en) | 2004-01-13 | 2004-01-13 | External heating type high temperature electric heater for high vacuum thin film settling chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1281779C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103002607A (en) * | 2011-09-14 | 2013-03-27 | 吉富新能源科技(上海)有限公司 | Device for uniformly heating photovoltaic glass |
| CN101096746B (en) * | 2006-06-30 | 2014-05-28 | 乐金显示有限公司 | Shadow mask and deposition device having the same |
| CN112542370A (en) * | 2019-09-23 | 2021-03-23 | 中微半导体设备(上海)股份有限公司 | Plasma processor and heater assembly thereof |
-
2004
- 2004-01-13 CN CN 200410018611 patent/CN1281779C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101096746B (en) * | 2006-06-30 | 2014-05-28 | 乐金显示有限公司 | Shadow mask and deposition device having the same |
| CN103002607A (en) * | 2011-09-14 | 2013-03-27 | 吉富新能源科技(上海)有限公司 | Device for uniformly heating photovoltaic glass |
| CN112542370A (en) * | 2019-09-23 | 2021-03-23 | 中微半导体设备(上海)股份有限公司 | Plasma processor and heater assembly thereof |
| CN112542370B (en) * | 2019-09-23 | 2024-04-05 | 中微半导体设备(上海)股份有限公司 | Plasma processor and heater assembly thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1281779C (en) | 2006-10-25 |
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| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20061025 Termination date: 20150113 |
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| EXPY | Termination of patent right or utility model |