CN1526649A - Ultrapure water making system and its running method - Google Patents
Ultrapure water making system and its running method Download PDFInfo
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- CN1526649A CN1526649A CNA200310115751XA CN200310115751A CN1526649A CN 1526649 A CN1526649 A CN 1526649A CN A200310115751X A CNA200310115751X A CN A200310115751XA CN 200310115751 A CN200310115751 A CN 200310115751A CN 1526649 A CN1526649 A CN 1526649A
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
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Abstract
The ultrapure water manufacturing system has the plurality of secondary pure water manufacturing systems equipped with the exchangeable cartridge polishers and is constituted by connecting the outlet line of the polishers of the high water quality secondary pure water manufacturing system for which high water quality is required and the outlet line of the polishers of the low water quality secondary pure water manufacturing system for which relatively low water quality is required in such a manner that the supply destinations of the treated water of the respective polishers can be changed over with each other. In the method for operating the ultrapure water manufacturing system, the polishers of the former system are exchanged, then the water treated with the polishers of the former system is supplied to the outlet line of the polishers of the latter system until the period for stabilization of the treatment performance previously determined by testing elapses, and the water treated with the polishers of the latter system is supplied to the outlet line of the polishers of the former system and the normal supply is resumed after the lapse of the period for stabilization of the treatment performance.
Description
Technical field
The present invention relates to ultrapure water manufacturing system and method for operation thereof, be particularly related to a kind of like this ultrapure water manufacturing system and method for operation thereof, wherein in a plurality of each second pure water manufacturing system that is set up in parallel, have respectively in the system of filter cartridge, even will also can supply with the ultrapure water of water conditioning after the filter cartridge replacing to each field of employment.
Background technology
Fig. 3 represents an example of existing typical ultrapure water manufacturing system.This ultrapure water manufacturing system is by the 1 st pure water manufacturing system 101 of making pure water with former water 103, and second pure water manufacturing system 102 formations that this pure water are refined into ultrapure water.In this 1 st pure water manufacturing system 101, for example utilize pretreating device 104 to remove a part of suspended matter and organism in the former water 103 such as process water after, this treating water is sent into desalting plant, for example in two three-tower type desalting plants 105.Desalting plant 105 is a kind of ion exchange units, removes the foreign ion in the treating water of pretreating device 104.Connect reverse osmosis membrane apparatus (RO device) 106 at the back segment of desalting plant 105, in RO device 106, can remove through desalting plant 105 and remove impurity such as mineral ion, organism and particulate in the ionic treating water.The back segment of RO device 106 connects vacuum degasser 107, can remove from the dissolved oxygen in the treating water of RO device 106.Back segment at vacuum degasser 107 links to each other with mixed bed formula desalting plant 108, can make high-purity water with mixed bed formula desalting plant 108, and it is supplied with 1 st pure water jar 109.Above-mentioned RO device 106 also can be arranged on before the 1 st pure water jar 109, for example with the location swap configuration of the RO device among Fig. 3 106 with mixed bed formula desalting plant 108.
Second pure water manufacturing system 102, generally the water yield according to super pure water, field of employment and the use used is provided with some series.Fig. 3 represents that second pure water manufacturing system 102 is arranged to the situation of two series of two serial 102a, 102b.
In this second pure water manufacturing system 102, for example the pure water irradiation ultraviolet radiation of 1 st pure water jar 109 being discharged with ultraviolet oxidation unit 110a, 110b even organism in the pure water or organic acid also can oxidizedly decompose, carries out sterilization simultaneously.In this back segment, be provided with the filter cartridge 111a, the 111b that itself belong to the mixed bed formula ion unit that to change, can catch and remove denier impurity of being brought into by 1 st pure water manufacturing system 101 and the composition that is decomposed generation by ultraviolet oxidation unit 110a, 110b.Before these impurity compositions that are captured reach capacity the generation leakage, must each filter cartridge of periodic replacement.From the treating water that filter cartridge 111a, 111b discharge, membrane treatment appts 112a, 112b through ultra-filtration membrane and secondary filter desert, reverse osmotic membrane etc. are housed remove particulate etc., make ultrapure water.Made ultrapure water is supplied with each field of employment 114a, 114b by each supply line 113a, 113b.
The ultrapure water of being supplied with, be used the residue ultrapure water that is not used when place 114a, 114b use, the ultrapure water of supplying with when not being used place 114a, 114b use, all sent back to 1 st pure water jar 109 via return pipeline 115a, 115b, usually at closed circuit internal recycle by 1 st pure water jar 109 → ultraviolet oxidation unit 110a, 110b → filter cartridge 111a, 111b → membrane treatment appts 112a, 112b → supply line 113a, 113b → return pipeline 115a, 115b → 1 st pure water jar 109 constitutes.Why make the ultrapure water circulation in this way; be because of for example field of employment 114a; when not using, the ultrapure water among the 114b in a single day do not shut down; water will be trapped in each unit of pipe arrangement and construction system when stopping; make bacterium produce propagation; though ion composition and organism quantity pettiness but can stripping from tube wall; often make the super pure water variation; and tend to from each unit, emit particulate under the impact when stopping and starting once more or promote stripping; even in addition at field of employment 114a; 114b uses under the occasion of ultrapure water; be sent to field of employment 114a; the ultrapure water of 114b is in case all used; at return pipeline 115a; will be detained ultrapure water in the pipe arrangement of 115b; also can produce suitable bacterial multiplication effect, perhaps often make strippings such as ion composition.
At above-mentioned the sort of general ultrapure water manufacturing system, someone proposes a kind of ultrapure water manufacturing system in patent documentation 1, this system is by the ion exchange unit that makes a plurality of filter cartridges for changing in the second pure water manufacturing system, and to the further membrane treatment appts of handling of the treating water of above-mentioned ion exchange unit processing, and optionally feed respectively as washing water among above-mentioned each ion exchange unit of its leading portion part with the non-permeate water of above-mentioned membrane treatment appts, the washing piping system that the washing draining is recovered in the 1 st pure water manufacturing system constitutes.
Patent documentation 1: the open communique (claim) of No. 15264/1994 application for a patent for invention of Japan
Summary of the invention
Yet, in above-mentioned the sort of traditional Ultrapure Water Purifiers, have following problem.
At first, in general traditional Ultrapure Water Purifiers shown in Figure 3, in changing filter cartridge 111a, 111b any one the time all must stop to make ultrapure water, can not use ultrapure water in during this, even the initial stage leachable of the ion exchange resin in the filter cartridge that the beginning water flowing also must be changed with a large amount of pure water washing initial stages of removing and follow dirt in the pipe arrangement of changing operation etc., even change operation rapidly, up to can before supplying water in the field of employment, also needing to take a long time.That is to say, filter cartridge after changing reaches the performance of regulation and must wash and wash before, even after the performance that reaches regulation, supply water to the field of employment immediately, because Cleaning preparations, also most variation of the yield rate of semiconductor article for example is so decision is just supplied water to the field of employment through (for example one thoughtful one month) after the sufficient time.
And in above-mentioned patent documentation 1, a kind of scheme has been proposed, this scheme is changed the time of operation back pure water washing in order to shorten filter cartridge, designed a kind of ion exchange unit that can change filter cartridge mutually, on one side to the optionally water flowing respectively of each ion exchange unit, supply water to the field of employment, on one side the washing filter fuse.But this scheme must strengthen the bath water part and second pure water is made scale, thereby can cause equipment that the increase of area and the increase of cost of energy are set.
Therefore, problem of the present invention is to provide a kind of like this ultrapure water manufacturing system and method for operation thereof, even also can supply with the ultrapure water of water conditioning after the filter cartridge in its second pure water manufacturing system is changed rapidly to the field of employment, compare with existing General System, area and cost of energy are set can produce substantive increasing.
In order to solve above-mentioned problem, the ultrapure water manufacturing system that the present invention relates to, comprising the 1 st pure water manufacturing system and supply with the 1 st pure water jar of using by the pure water of above-mentioned 1 st pure water manufacturing system manufacturing, reach and have the filter cartridge that to change at least, pure water in the above-mentioned 1 st pure water jar is refined into water quality requirement different multiple ultrapure water, the a plurality of second pure water manufacturing systems that are set up in parallel mutually, reach to each field of employment and supply with the ultrapure water supply line of using by the ultrapure water of each second pure water manufacturing system manufacturing, wherein so that the mode that supply place of each filter cartridge treating water can be switched mutually, will be continuous to the filter cartridge export pipeline of the relatively low low water quality second pure water manufacturing system of the filter cartridge export pipeline of the higher relatively high water quality second pure water manufacturing system of water quality requirement and water quality requirement.
In this ultrapure water manufacturing system, preferably between each filter cartridge export pipeline and each ultrapure water supply line, be provided with membrane treatment appts, the membrane treatment appts that ultra-filtration membrane and accurate filter membrane, reverse osmotic membrane etc. constitute for example is housed.
And above-mentioned ultrapure water supply line, preferably link to each other with the return pipeline of untapped ultrapure water being used to above-mentioned 1 st pure water jar foldback from above-mentioned field of employment, about from the second pure water manufacturing system to the field of employment, preferably can make untapped ultrapure water carry out common round-robin.
The method of operation of the ultrapure water manufacturing system that the present invention relates to, at least have the filter cartridge that to change comprising utilizing, a plurality of second pure water manufacturing systems that water quality requirement is different, to make by the 1 st pure water manufacturing system, the pure water that is supplied to the 1 st pure water jar is refined into ultrapure water, supply with ultrapure water to each field of employment, after it is characterized in that filter cartridge replacing to the higher relatively high water quality second pure water manufacturing system of water quality requirement, to passing through (for example week age among the aftermentioned embodiment) before between stationary phase through testing the handling property of obtaining in advance, treating water with the filter cartridge in the above-mentioned high water quality second pure water manufacturing system, supply is to the export pipeline of the filter cartridge in the relatively low low water quality second pure water manufacturing system of water quality requirement, simultaneously with the treating water of the filter cartridge in the above-mentioned low water quality second pure water manufacturing system, supply with the export pipeline of the filter cartridge in the above-mentioned high water quality second pure water manufacturing system, above-mentioned handling property after the warp, reverts to common supply between stationary phase; The treating water that is about to the filter cartridge in the above-mentioned high water quality second pure water manufacturing system supplies to the export pipeline of the filter cartridge in the above-mentioned high water quality second pure water manufacturing system, the treating water of the filter cartridge in the low water quality second pure water manufacturing system is supplied to the export pipeline of the filter cartridge in the low water quality second pure water manufacturing system.
In the method for operation of this ultrapure water manufacturing system, after the treating water of each filter cartridge is preferably handled through film, for example utilize ultra-filtration membrane and accurate filter membrane, reverse osmotic membrane etc. to handle after, supply with each field of employment.
And preferably the untapped ultrapure water in each field of employment is returned to above-mentioned 1 st pure water jar, the untapped ultrapure water in field of employment is often circulated.
Ultrapure water manufacturing system and the method for operation thereof that the present invention relates to, be applicable to and make the electronic unit material, the bath water that uses of semi-conductor manufacturing is for example more specifically said the bath water that the manufacturing of electronic unit materials such as being applicable to wafer and chip, various circuit substrate, crystal liquid substrate is used.
Above-mentioned the sort of ultrapure water manufacturing system and the method for operation thereof that the present invention relates to, to be set up in parallel the different a plurality of second pure water manufacturing systems of water quality requirement, under the occasion that is specially adapted to the filter cartridge in the higher relatively high water quality second pure water manufacturing system of water quality requirement is changed as prerequisite.And, the water quality that this moment is residual by not being replaced, the filter cartridge in the second pure water manufacturing system of the relatively low low water quality requirement of water quality requirement is handled so far can be stablized and is used, even the export pipeline that its result directly supplies with the filter cartridge in the high water quality second pure water manufacturing system with this treating water can not produce special problem yet, can keep water quality good.The present invention is conceived to just that this point just is accomplished.
That is to say, after filter cartridge in the high water quality second pure water manufacturing system is changed, the treating water of this filter cartridge is infeeded the export pipeline of the filter cartridge in the low water quality second pure water manufacturing system, promptly, infeed in the low pure water system that only requires low water quality ultrapure water, by making this plenum system keep predetermined handling property between stationary phase, the filter cartridge that is replaced during this period just can be clean by thorough washing under normal operation.And, residual through not being replaced, from the treating water of the filter cartridge in the low water quality second pure water manufacturing system, though infeeded the export pipeline of the filter cartridge in the high water quality second pure water manufacturing system, promptly infeeded manufacturing system to the higher high purity water of water quality requirement, but because the treating water of this filter cartridge so far maintains under the stable and good water quality, so as mentioned above, even also can not produced any problem in fact, can supply with the ultrapure water of the water quality of high purity water system requirements rapidly and stably by the high purity water system recoveries.The result that this pipeline switches, change above-mentioned filter cartridge after, can very promptly supply with the ultrapure water that satisfies the water quality that each field of employment requires.Among the present invention, owing to only in cartridge subexit one side switching mechanism is set, so all areas that is provided with of system do not increase, and cost of energy does not increase yet.In addition, the water of the filter cartridge that washing is changed, can directly supply with low water quality second pure water manufacturing system, also only be this water yield that flows through even for example flow through under the occasion of washing water, so area is set and cost of energy all can not increase from this angle.
After passing through during the above-mentioned predefined process stable performance, can be with common treatment system, it is the treating water of the filter cartridge in the high water quality second pure water manufacturing system, directly supply with the export pipeline of the filter cartridge in the high water quality second pure water manufacturing system, the treating water of the filter cartridge in the low water quality second pure water manufacturing system is directly supplied with the export pipeline that hangs down the filter cartridge in the water quality second pure water manufacturing system, return to common plenum system.
In sum; according to ultrapure water manufacturing system and the method for operation thereof that the present invention relates to; the ultrapure water manufacturing system that a kind of practicality can be provided and implement easily; this system and device structure was both very simple; ultrapure water water quality can be maintained on the high level again; only required minimum necessary stop time the ultrapure water manufacturing system is turned round with steady state, can not only suppress by the water yield greatly, and can also very promptly supply with predetermined ultrapure water to the field of employment with changing filter cartridge.And because area and cost of energy are set also can produce substantive increasing of system.
Description of drawings
Fig. 1 is the mechanical system synoptic diagram of the related ultrapure water manufacturing system of one embodiment of the present invention.
Fig. 2 is the mechanical system synoptic diagram of the export pipeline part of the filter cartridge in the related ultrapure water manufacturing system of expression another embodiment of the invention.
Fig. 3 is the mechanical system synoptic diagram of existing ultrapure water manufacturing system.
Embodiment
Following with reference to description of drawings ideal embodiment of the present invention.
Fig. 1 represents the ultrapure water manufacturing system that one embodiment of the present invention is related.This ultrapure water manufacturing system is by the 1 st pure water manufacturing system 1 of making pure water with former water 3, and second pure water manufacturing system 2 formations that this pure water are refined into ultrapure water.In this 1 st pure water manufacturing system 1, for example remove a part of suspended matter and organic substance in the former water 3 such as process water with pretreating device 4, this treating water is sent into desalting plant, for example in two three-tower type desalting plants 5.Desalting plant 5 is ion exchange units, can remove the foreign ion in the treating water of pretreating device 4.The back segment of desalting plant 5 links to each other with inverse osmosis film device (RO device) 6, utilizes RO device 6 can remove through desalting plant 5 and has removed impurity such as mineral ion in the ionic treating water, organism, particulate.At the back segment of RO device 6, be connected with vacuum degasser 7, can remove the oxygen that melts in the treating water of RO device 6 discharges.Back segment at vacuum degasser 7 connects mixed bed formula desalting plant 8, can make highly purified pure water with mixed bed formula desalting plant 8, and it is supplied with 1 st pure water jar 9.Above-mentioned RO device 6 also can be configured in before the 1 st pure water jar 9, and for example the RO device among Fig. 16 also can exchange setting with the position of mixed bed formula desalting plant 8.
Second pure water manufacturing system 2 generally can and make water consumption that some series are set according to super pure water, the field of employment of using, and expression second pure water manufacturing system 2 is configured to the situation of A series 2a and this two series of B series 2b in the present embodiment.
In this second pure water manufacturing system 2, for example the pure water irradiation ultraviolet radiation of 1 st pure water jar 9 being discharged with ultraviolet oxidation unit 10a, 10b even organism in the pure water or organic acid also can oxidizedly decompose, carries out the sterilization of bacterium simultaneously.At this back segment, being provided with itself is filter cartridge 11a, the 11b of the mixed bed formula ion exchange unit that can change, can catch and remove the denier impurity brought into by 1 st pure water manufacturing system 1 and decomposed the composition that generates by ultraviolet oxidation unit 10a, 10b.These impurity compositions that are captured reach capacity and produce before the leakage, must periodic replacement each filter cartridge 11a, 11b.The treating water of discharging from filter cartridge 11a, 11b can be refined into ultrapure water with removing particulate etc. as the ultrafiltration membrane treatment device 12a of membrane treatment appts with as the accurate filter membrane device 12b of membrane treatment appts in the present embodiment.The ultrapure water that is refined into is supplied with each field of employment 14a, 14b via supply line 13a, 13b.
The ultrapure water of being supplied with is at field of employment 14a, the residue ultrapure water that 14b is not used when using, and field of employment 14a, whole ultrapure waters that 14b is supplied with when not using, via pipeline 15a, 15b is returned in the 1 st pure water jar 9, often by 1 st pure water jar 9 → ultraviolet oxidation unit 10a, 10b → filter cartridge 11a, 11b → membrane treatment appts 12a, 12b → supply line 13a, 13b → return pipeline 15a, 15b → membrane treatment appts 12a, 12b → supply line 13a, 13b → return pipeline 15a, the closed circuit internal recycle that 15b → 1 st pure water jar 9 constitutes.Why make the ultrapure water circulation like this, be because as mentioned above, in order to prevent to cause bacterial multiplication because of the delay of ultrapure water, though perhaps ion composition and organism quantity pettiness but can from tube wall, stripping make the super pure water variation, perhaps in order to prevent to stop and impact when starting once more makes particulate from each unit stripping or promote stripping.
Though explanation is common operation route so far, existing structure shown in Figure 3 does not change in fact.Among the present invention, so that the mode that supply place of each filter cartridge treating water can be switched mutually, the filter cartridge of the low water quality second pure water manufacturing system that the filter cartridge of the high water quality second pure water manufacturing system that water quality requirement is higher relatively and water quality requirement are relatively low is connected.
That is to say, in the present embodiment, second pure water manufacturing system 2 is by the operation that needs purity higher (high water quality) ultrapure water in the LSI manufacturing process below 0.25 micron order, for example separate the A series 2a that uses the operation that is formed up to till gate electrode forms from element, and to the relative not high operation of water quality requirement, the B that for example uses in distribution operation series 2b constitutes.But, the division of ultrapure water streamline is not limited to above-mentioned situation, for example to the electrical condenser operation of the higher DRAM of reliability requirement, even and in the distribution operation for the washing of the contact hole lower basal plate that requires low contact impedance, also all need to use higher relatively highly purified ultrapure water.
Pipe arrangement in the treating water side of filter cartridge 11a and filter cartridge 11b, promptly, connect on filter cartridge export pipeline 16a, the 16b of each filter cartridge 11a, 11b and each membrane treatment appts 12a, 12b, be respectively equipped with component, the treating water of filter cartridge 11a also can be supplied with any one membrane treatment appts among ultra-filtration membrane device 12a and the accurate filter membrane device 12b, and the treating water of filter cartridge 11b also can be supplied with any one membrane treatment appts among ultra-filtration membrane device 12a and the accurate filter membrane device 12b.On the export pipeline 16a of filter cartridge 11a, be provided with valve V1 respectively, on its branch line 17a, be provided with valve V3, on the export pipeline 16b of filter cartridge 11b, be provided with valve V2, on its branch line 17b, be provided with valve V4, switch by these valves V1～V4, the treating water of each filter cartridge optionally can be supplied with the export pipeline of any one filter cartridge, perhaps further be supplied with in any one membrane treatment appts.
Usually during running, open valve V1 shut-off valve V3, in A series 2a, the treating water that filter cartridge 11a discharges supplied with ultra-filtration membrane device 12a, make the high purity ultrapure water, by field of employment 14a for example as the uses such as bath water of LSI substrate; And under the occasion of B series 2b, open valve V2 shut-off valve V4, and the treating water that filter cartridge 11b discharges is supplied with accurate filter membrane device 12b, make general ultrapure water, use for field of employment 14b.
The filter cartridge 11a of A series 2a removes denier impurity of being brought into by 1 st pure water manufacturing system 1 and the composition that generates in ultraviolet oxidation unit 10a, before these impurity that are captured reach capacity, change with annual frequency.
After the filter cartridge 11a of A series 2a implements to change operation, for intrasystem dirt of the initial stage of removing, make the treating water of filter cartridge flow through (having only the water that flows through on a small quantity) after a few hours, for treating water being delivered to the field of employment 14b that requires general ultrapure water, open valve V3, simultaneously shut-off valve V1.Like this, the treating water of the filter cartridge 11a that is replaced after accurate filter membrane device 12b processing, can be supplied with field of employment 14b.In order to supply with ultrapure water to the field of employment 14a that requires the high purity ultrapure water simultaneously, open valve V4, shut-off valve V2, the treating water of the device of inherent filtration in the future fuse 11b is supplied with ultra-filtration membrane device 12a, the treating water of filter cartridge 11b supplies to field of employment 14a after ultra-filtration membrane device 12a handles.Filter cartridge 11b uses owing to do not change always, so as mentioned above, also can stably supply with enough ultrapure waters of high water quality even supply to the system that requires the high purity ultrapure water, 12a handles through the ultra-filtration membrane device, can very promptly supply with and satisfy the ultrapure water of field of employment 14a to water quality requirement.
After will changing the high filter cartridge 11a of water quality requirement like this, investigated and changed the series that should supply with originally from the treating water of filter cartridge, and when supplying with ultrapure water to the influence of the washing components in the field of employment.Atom number/square centimeter) and the number of days of replacing water flowing afterwards the amount of the table 1 expression metal that adheres on silicon wafer at monitor when high purity pure water system (system of field of employment 14a) is supplied with treating water from filter cartridge 11b and washed (unit:.At this moment, filter cartridge 11b used six months.On the same day that replacing is implemented in expression in this 0 day.
Table 1
| Before the replacing | 0 | 1 | 3 | 1 week | 30 days | |
| Amount of | 1×10 9 | ?1×10 9 | ?1×10 9 | ?1×10 9 | ?1×10 9 | ?1×10 9 |
And table 2 expression is during the treating water of general pure water system supply from filter cartridge 11a, and after during this is supplied with by switch valve to the treating water of high purity pure water system supply from filter cartridge 11a, when field of employment 14a washs, atom number/square centimeter) and so far change the number of days of back water flowing the amount of metal that adheres on silicon wafer at monitor (unit:.Wherein expression on the 0th is supplied with this treating water to high purity pure water system field of employment 14a after filter cartridge 11a is changed immediately.
Table 2
| Before the replacing | 0 | 1 | 3 | 1 week | 30 days | |
| Amount of | 1×10 9 | ?9×10 9 | ?3×10 9 | ?2×10 9 | ?1×10 9 | ?1×10 9 |
As table 1 show, when changing the filter cartridge 11a that the high purity ultrapure water A of system series 2a uses, even supplying with to the field of employment 14a of high purity ultrapure water system is the treating water of the filter cartridge 11b among the general ultrapure water B of the system series 2b, not having also to find that the amount of metal that adheres on substrate surface increases, is the effective means that control metal adhesion amount is used so proof is changed series.As can be seen from Table 2, in this test example, handling property is located the filter cartridge 11a of a week after the above water flowing between stationary phase turn back to when using in the usually conduct system, not having to find that the amount of metal that adheres on substrate surface increases, is suitable so be decided to be a week at least between the stage of replacement of explanation series.But between this processing stationary phase, also, obtain between optimal period by testing in advance, and this optimum value will become with system preferably according to adopting system of the present invention.
In addition, adopt and above-mentioned same test, studied TOC (organism carbon total amount).That is to say, though the cause material does not find out that as yet when but finding the parts such as ultrapure water manufacturing semi-conductor after filter cartridge is changed in use, yield rate is variation often, and until filter cartridge change TOC in the ultrapure water of back reach stable before, need one water flowing period.
After changing filter cartridge, investigated the series that will should supply with filter cartridge originally and replaced, when supplying with ultrapure water, the TOC in the water is supplied with in the field of employment.When table 3 expression is supplied with treating water from filter cartridge 11b to high purity pure water system (system of field of employment 14a), the TOC concentration in the washing water and change the number of days of back water flowing.This moment, filter cartridge 11b used six months.Wherein represented the same day of replacing on the 0th.
Table 3
| Before the replacing | 0 | 1 | 3 | 1 week | 30 days | |
| ??TOC | 0.5 | ??0.5 | ??0.5 | ??0.5 | ??0.5 | ??0.5 |
Table 3 expression is during the treating water of general pure water system supply from filter cartridge 11a, and after this period, pass through switch valve, to the treating water of high purity pure water system supply from filter cartridge 11a, TOC concentration in the washing water when field of employment 14a washs, and the number of days of so far changing the back water flowing.Supply with this treating water to high purity pure water system field of employment 14a immediately after wherein filter cartridge 11a is changed in expression on the 0th.
Table 4
| Before the replacing | 0 | 1 | 3 | 1 week | 30 days | |
| ????TOC | 0.5 | ????3.0 | ????0.9 | ????0.7 | ????0.5 | ????0.5 |
As table 4 explanation, when changing the high purity ultrapure water A of system series 2a with filter cartridge 11a, even supply with the treating water of the filter cartridge 11b that is the general ultrapure water B of system series 2b to the field of employment 14a of high purity ultrapure water system, not finding that also TOC concentration increases in the washing water, is stably in the low-level effective means of control TOC down so proof is changed series.As can be seen from Table 4, in this test example, turning back in the usually conduct system and use by handling property being decided to be the filter cartridge 11a of a week after the above water flowing between stationary phase, do not find that TOC concentration increases in the washing water, is suitable so be decided to be a week at least between serial stage of replacement of explanation.But also preferably according to adopting system of the present invention, obtain between optimal period by testing in advance, and this optimum value will become with system between this processing stationary phase.
In addition for above-mentioned embodiment, though being situation with regard to two serial 2a, 2b, the second pure water manufacturing system describes, also can be set up in parallel series more than three among the present invention.Under being set up in parallel the above occasion of three series, under the occasion of replacing filter cartridge in the higher relatively system to water quality requirement and to water quality requirement between the filter cartridge in the relatively low system, can hand-off process water out pipeline.For example, under the represented three system's occasions of Fig. 2 the export pipeline of the filter cartridge part, the filter cartridge 21a that is set up in parallel relatively, each export pipeline 22a of 21b and 21c (system from high purity to low-purity successively), 22b and 22c, bye-pass 23a is set respectively, 23b, 23c and 23d, and valve V11, V12, V13, V14, V15, V16 and V17, can be under the situation of changing filter cartridge 21a, between export pipeline 22a and export pipeline 22b, under the situation of changing filter cartridge 21b, between export pipeline 22b and export pipeline 22c, switch supply place respectively.
Claims (8)
1. ultrapure water manufacturing system, it comprises the 1 st pure water manufacturing system, supply is by the 1 st pure water jar of the pure water of this 1 st pure water manufacturing system manufacturing, at least have the filter cartridge that to change, pure water in the above-mentioned 1 st pure water jar is refined into water quality requirement different multiple ultrapure water, the a plurality of second pure water manufacturing systems that are set up in parallel mutually, and ultrapure water supply line from the ultrapure water of making by each second pure water manufacturing system to each field of employment that supply with, it is characterized in that, so that the mode that supply place of each filter cartridge treating water can be switched mutually, the filter cartridge export pipeline of the low water quality second pure water manufacturing system that the filter cartridge export pipeline of the high water quality second pure water manufacturing system that water quality requirement is higher relatively and water quality requirement are relatively low is continuous.
2. according to the described ultrapure water manufacturing system of claim 1, it is provided with membrane treatment appts between each filter cartridge export pipeline and each ultrapure water supply line.
3. according to claim 1 or 2 described ultrapure water manufacturing systems, above-mentioned ultrapure water supply line with from above-mentioned field of employment the return pipeline that untapped ultrapure water is returned to above-mentioned 1 st pure water jar is linked to each other.
4. according to any one described ultrapure water manufacturing system in the claim 1～3, its form with the washing water manufacturing system of electronic unit material constitutes.
5. the method for operation of a ultrapure water manufacturing system, it comprises that utilization has the filter cartridge that can change at least, a plurality of second pure water manufacturing systems that water quality requirement is different, to make by the 1 st pure water manufacturing system, after the pure water that supplies to the 1 st pure water jar is refined into ultrapure water, supply with to each field of employment, it is characterized in that changing to behind the filter cartridge in the higher relatively high water quality second pure water manufacturing system of water quality requirement, until in advance before the handling property that test is obtained passed through between stationary phase, treating water with the filter cartridge in the above-mentioned high water quality second pure water manufacturing system, supply to export pipeline to the filter cartridge in the relatively low low water quality second pure water manufacturing system of water quality requirement, simultaneously with the treating water of the filter cartridge in the above-mentioned low water quality second pure water manufacturing system, supply to the export pipeline of the filter cartridge in the above-mentioned high water quality second pure water manufacturing system, above-mentioned handling property between stationary phase through after, revert to common supply, the treating water that is about to the filter cartridge in the high water quality second pure water manufacturing system supplies to the export pipeline of the filter cartridge in the high water quality second pure water manufacturing system, the treating water of the filter cartridge in the low water quality second pure water manufacturing system is supplied to the export pipeline of the filter cartridge in the low water quality second pure water manufacturing system.
6. according to the method for operation of the described ultrapure water manufacturing system of claim 5, wherein the treating water of each filter cartridge arrives each field of employment through the film treatment and supplied.
7. according to the method for operation of claim 5 or 6 described ultrapure water manufacturing systems, wherein will be returned to above-mentioned 1 st pure water jar at the untapped ultrapure water in each field of employment.
8. according to the method for operation of any one described ultrapure water manufacturing system in the claim 5～7, it makes the washing water of electronic unit material.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56874/2003 | 2003-03-04 | ||
| JP2003056874A JP4034668B2 (en) | 2003-03-04 | 2003-03-04 | Ultrapure water production system and operation method thereof |
| JP56874/03 | 2003-03-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1526649A true CN1526649A (en) | 2004-09-08 |
| CN100406393C CN100406393C (en) | 2008-07-30 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200310115751XA Expired - Fee Related CN100406393C (en) | 2003-03-04 | 2003-11-28 | Ultrapure water making system and its running method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4034668B2 (en) |
| KR (1) | KR101066461B1 (en) |
| CN (1) | CN100406393C (en) |
| TW (1) | TWI300404B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102666399A (en) * | 2009-12-18 | 2012-09-12 | 居道水再生有限公司 | Raw water hardness determination in a water treatment system via the conductivity of soft or blended water |
| CN102933503A (en) * | 2010-06-09 | 2013-02-13 | 株式会社神钢环境舒立净 | Freshwater-generating device, and freshwater-generating method |
| CN102933502A (en) * | 2010-06-09 | 2013-02-13 | 株式会社神钢环境舒立净 | Fresh water-generating device and fresh water-generating method |
| CN109476509A (en) * | 2016-09-14 | 2019-03-15 | 栗田工业株式会社 | Ultrapure Water Purifiers |
| CN112770825A (en) * | 2018-11-22 | 2021-05-07 | 野村微科学股份有限公司 | Method for starting ultrapure water production apparatus and ultrapure water production apparatus |
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| CN101573298B (en) * | 2006-12-25 | 2012-11-14 | 日本碍子株式会社 | Wastewater treatment system and method of wastewater treatment |
| JP5233138B2 (en) * | 2007-03-20 | 2013-07-10 | 栗田工業株式会社 | A method for treating concentrated wastewater from a pure water production apparatus and a treatment apparatus for the concentrated wastewater. |
| JP4941042B2 (en) * | 2007-03-26 | 2012-05-30 | 三浦工業株式会社 | Water treatment equipment |
| KR101031210B1 (en) * | 2007-06-14 | 2011-04-27 | (주)비바젠 | Water purifying divice for manufacturing pure water and ultra-pure water |
| JP6722552B2 (en) * | 2016-09-05 | 2020-07-15 | 野村マイクロ・サイエンス株式会社 | Non-regenerative ion exchange resin cleaning device and ultrapure water production system |
| CN114166712A (en) * | 2020-10-29 | 2022-03-11 | 佛山市美的清湖净水设备有限公司 | Water purification equipment, core replacement detection method and device of water purification equipment |
| KR102546282B1 (en) * | 2022-03-22 | 2023-06-21 | 삼성전자주식회사 | Apparatus for ultrapure water supply, semiconductor device manufacturing system including the same and semiconductor device manufacturing method using the same |
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| JPS63264199A (en) | 1987-04-22 | 1988-11-01 | Hitachi Ltd | Device for producing high-purity water |
| JPH0217994A (en) * | 1988-07-07 | 1990-01-22 | Toshiba Corp | Ultrapure water producer |
| JP2960258B2 (en) * | 1992-07-03 | 1999-10-06 | オルガノ株式会社 | Ultrapure water production equipment |
| JPH0755319B2 (en) * | 1992-08-03 | 1995-06-14 | 荏原インフィルコ株式会社 | Method and apparatus for producing ultra-ultra pure water from primary pure water |
| JPH0747364A (en) * | 1993-06-22 | 1995-02-21 | Japan Organo Co Ltd | Extrapure water producing device |
| KR980009694U (en) * | 1996-07-24 | 1998-04-30 | 김광호 | Pure water supply equipment of semiconductor manufacturing equipment |
| US6312589B1 (en) * | 1997-12-23 | 2001-11-06 | The Coca-Cola Company | Apparatus arranged to provide controllable water treatment customized to the conditions of water supplied to a beverage dispenser |
| CN2537702Y (en) * | 2001-09-12 | 2003-02-26 | 珠海经济特区莫高海水淡化设备工程有限公司 | Small desalting machine installed with multiple water path pipeline |
| JP2003305465A (en) | 2002-04-15 | 2003-10-28 | Mitsubishi Electric Corp | System for making pure water and method for monitoring water quality |
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2003
- 2003-03-04 JP JP2003056874A patent/JP4034668B2/en not_active Expired - Fee Related
- 2003-11-18 KR KR1020030081600A patent/KR101066461B1/en not_active IP Right Cessation
- 2003-11-27 TW TW092133273A patent/TWI300404B/en active
- 2003-11-28 CN CNB200310115751XA patent/CN100406393C/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102666399A (en) * | 2009-12-18 | 2012-09-12 | 居道水再生有限公司 | Raw water hardness determination in a water treatment system via the conductivity of soft or blended water |
| US8696912B2 (en) | 2009-12-18 | 2014-04-15 | Judo Wasseraufbereitung Gmbh | Raw water hardness determination in a water treatment system via the conductivity of soft or blended water |
| CN102666399B (en) * | 2009-12-18 | 2014-05-28 | 居道水再生有限公司 | Raw water hardness determination in a water treatment system via the conductivity of soft or blended water |
| CN102933503A (en) * | 2010-06-09 | 2013-02-13 | 株式会社神钢环境舒立净 | Freshwater-generating device, and freshwater-generating method |
| CN102933502A (en) * | 2010-06-09 | 2013-02-13 | 株式会社神钢环境舒立净 | Fresh water-generating device and fresh water-generating method |
| CN109476509A (en) * | 2016-09-14 | 2019-03-15 | 栗田工业株式会社 | Ultrapure Water Purifiers |
| CN109476509B (en) * | 2016-09-14 | 2020-06-26 | 栗田工业株式会社 | Ultrapure water production apparatus |
| CN112770825A (en) * | 2018-11-22 | 2021-05-07 | 野村微科学股份有限公司 | Method for starting ultrapure water production apparatus and ultrapure water production apparatus |
| CN112770825B (en) * | 2018-11-22 | 2023-05-12 | 野村微科学股份有限公司 | Method for starting up ultrapure water production device, and ultrapure water production device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100406393C (en) | 2008-07-30 |
| JP2004261768A (en) | 2004-09-24 |
| JP4034668B2 (en) | 2008-01-16 |
| TW200418729A (en) | 2004-10-01 |
| KR20040078534A (en) | 2004-09-10 |
| TWI300404B (en) | 2008-09-01 |
| KR101066461B1 (en) | 2011-09-23 |
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