CN1445662A - System and method for automatic presetting technological parameters for ion implantation machine set - Google Patents
System and method for automatic presetting technological parameters for ion implantation machine set Download PDFInfo
- Publication number
- CN1445662A CN1445662A CN 02107191 CN02107191A CN1445662A CN 1445662 A CN1445662 A CN 1445662A CN 02107191 CN02107191 CN 02107191 CN 02107191 A CN02107191 A CN 02107191A CN 1445662 A CN1445662 A CN 1445662A
- Authority
- CN
- China
- Prior art keywords
- ion implantation
- wafer cassette
- ion
- machine set
- technological parameters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Abstract
A system and method for automatically pre-regulating the technological parameters of ion implantation bench are disclosed. The system is composed of a database for storing serial number of bench, serial number of stations, wafer ICs and technological parameters in it, an information processing server for obtaining the IC of wafer box and its related information read from database and controlling a manipulator to load the wafer box on bench, and the bench controller for preparing the formula needed by ion implantation.
Description
Technical field
The invention relates to that ion is required before implanting chooses and modulate the system and method that ion is filled a prescription to a kind of Ion Implantation Equipment platform carrying out, and particularly carrying out to shift to an earlier date the system and method for choosing and modulate the ion prescription automatically before ion implants relevant for a kind of Ion Implantation Equipment platform.
Background technology
Please refer to Fig. 1, it is the process that is known in when carrying out the ion implantation.Wherein when wafer cassette is on the mechanical arm of Ion Implantation Equipment platform, operating personnel must control mechanical arm wafer cassette is loaded on Ion Implantation Equipment platform (step s100), this load step needs 90 seconds consuming time (sec), operating personnel can choose wafer in the wafer cassette via the board controller of Ion Implantation Equipment platform and carry out ion required prescription (step s102) when implanting then, control the modulation (step s104) of filling a prescription of board controller then, when choosing step s102 and modulation step s104 therebetween and costing 15～20 minutes, after prescription modulated, operating personnel just can operate board controller control Ion Implantation Equipment platform and carry out ion implantation action (step s106) for the wafer that loads.
More than whole ion implant procedure all must have operating personnel to monitor aside and operate, no matter be to mechanical arm, board controller or Ion Implantation Equipment platform, therefore whole process all must be handled with manual type, not only waste of manpower is also lost time.In addition, because load step s100 concerns with choosing to there is no between the step s102 successively to carry out, therefore need not to carry out earlier load step s100 carries out and chooses step s102 at all again, can be when step s102 or modulation step s104 be chosen in execution, carry out load step s100 simultaneously and get final product, therefore known way is wasted 90 seconds time for no reason.
Summary of the invention
The present invention proposes a kind of automatic presetting technological parameters for ion implantation machine set system, be that the process that whole ion is implanted is given robotization, do not need lost labor and time, and in automation process, it is first Dynamic Selection prescription, with the error on reducing manually, and then modulate prescription and load wafer cassette to the Ion Implantation Equipment platform.Modulation prescription and load wafer cassette to Ion Implantation Equipment platform and can do together wherein is to save load time of 90 seconds.
This automatic presetting technological parameters for ion implantation machine set system comprises: database, netscape messaging server Netscape and board controller.
Wherein, in database, at least comprise by the other code name in station, board code name, brilliant box identification code and the formed information of technological parameter, and netscape messaging server Netscape, then be in order to obtain the identification code of wafer cassette, and obtain information from database according to the identification code of the wafer cassette obtained, in addition, the board controller is according to the technological parameter in the information, modulate wafer cassette and carry out ion required prescription when implanting, and netscape messaging server Netscape also can be controlled mechanical arm wafer cassette is loaded in the Ion Implantation Equipment platform at one time.
The present invention proposes a kind of automatic presetting technological parameters for ion implantation machine set method again, comprising: obtain the identification code of wafer cassette earlier, again according to identification code and then obtain the information that comprises station other code name, board code name, brilliant box identification code and technological parameter.Then, should carry out the ion implant procedure when learn the wafer cassette that present stage obtains via judgement, and be to be stored in the board controller and to be correct process parameter value via the technological parameter in the judgement information again, then netscape messaging server Netscape can make the board controller carry out ion modulation action according to technological parameter, and at one time, netscape messaging server Netscape also makes mechanical arm that wafer cassette is loaded on the Ion Implantation Equipment platform, implants action to allow the Ion Implantation Equipment platform carry out ion.
Wherein in above-mentioned work flow, should not carry out the ion implant procedure if judge the wafer cassette that present stage obtains, then send error messages, the wafer cassette that expression is obtained present stage should not be in the program that ion is implanted, and may be in the exposure or the program of little shadow.In addition, be wrong technological parameter if judge technological parameter, the then same error messages of also sending.
The present invention reintroduces a kind of automatic presetting technological parameters for ion implantation machine set method again, according to above-mentioned method, if in the blink after the identification code of obtaining first wafer cassette, also have second wafer cassette to exist, then after learning that via the identification code of obtaining second wafer cassette second wafer cassette and first wafer cassette are same group, obtain according to identification code again and comprise the other code name in station, the board code name, the information of wafer identification code and technological parameter, wherein, therefore can adjust automatically and implant the required amount of ions of brilliant box owing to be to have two wafers in the wafer cassette will carry out ion together to implant action.Program then is all identical with said method, is not given unnecessary details at this.
In sum, the present invention is the wafer cassette identification code of utilizing netscape messaging server Netscape to read earlier to be placed on the mechanical arm, look for information again to the database relevant for this wafer cassette identification code, comprise the station not, board and technological parameter or the like, then via after detecting, judge that technological parameter exists and under the correct situation, just can make fill a prescription the simultaneously modulation and make mechanical arm that the wafer cassette loaded ion is implanted board of board controller.
Description of drawings
Fig. 1 is a known ion implant procedure;
Fig. 2 is a block scheme of an automatic presetting technological parameters for ion implantation machine set system of the present invention;
Fig. 3 is a process flow diagram of an automatic presetting technological parameters for ion implantation machine set method of the present invention; And
Fig. 4 is a process flow diagram of another automatic presetting technological parameters for ion implantation machine set method of the present invention.
Description of reference numerals:
200: the Ion Implantation Equipment platform
202,204: implantation window
206,208: mechanical arm
210,212: wafer cassette
210a, 212a: wafer
210b, 212b: brilliant boat (cassette)
214,216: the identification code identifier
218: the board controller
220: netscape messaging server Netscape
221: information
222: database
224: parameter management system
Step s100 to step s106 be a known implementation step.
Step s300 to step s306 be an implementation step of the present invention.
Step s400 to step s430 be another implementation step of the present invention.
Embodiment
Please refer to Fig. 2, is a kind of automatic presetting technological parameters for ion implantation machine set system according to one embodiment of the invention, and therefore full automatic mode makes wafer can carry out ion and implants action, and can allow the parallel running of some process, has not only saved time but also human-saving.
Ion Implantation Equipment platform 200 of the present invention has a mechanical arm at least, for example mechanical arm 206, the wafer cassette 210 of several wafers can will be had, implant board 200 to carry out ion implantation technology via implantation window 202 loaded ions, wherein each wafer cassette all comprises the brilliant boat (cassette) of wafer (wafer) and carrying wafer.In automatic presetting technological parameters for ion implantation machine set provided by the present invention system, comprise: database 222, netscape messaging server Netscape 220 and board controller 218.
Wherein, the information 221 that comprises in the database 222, at least comprise the other code name in station, the board code name, brilliant box identification code and technological parameter, wherein brilliant box identification code is the discrimination method corresponding to wafer cassette, for example the identification code of wafer cassette 210 is 1, can be to be presented on the wafer cassette 210 by the bar code kenel, and stand other code name and board code name be each wafer cassette institute of record should existence place, that is to say, suppose that wafer current box 210 should be to be in ion to implant in the stroke, then the position at its present place should be to belong in a certain the board of ion implant station in not to implant to carry out ion, in addition, wafer in the wafer cassette of technological parameter record is carrying out ion required prescription, just prescription information such as the kind of ion and concentration when implanting.
Netscape messaging server Netscape 220 provided by the present invention can be an industrial personal computer (Industrial Personal Computer; Be called for short IPC), in order to obtaining the identification code of wafer cassette, and, obtain above-mentioned information 221 from database 22 according to the identification code of being obtained.For example, one identification code identifier 214 is arranged on wafer cassette 210, be positioned over the identification code of the wafer cassette 210 on the mechanical arm 206 in order to identification, and the identification code that netscape messaging server Netscape 220 can pick out via identification code identifier 214, and then learn the wafer cassette identification code that present pending ion is implanted.After netscape messaging server Netscape 220 is learnt the wafer cassette identification code that present pending ion implants, promptly can in database 222, obtain station that this wafer cassette should exist at present not, board with and technological parameter information why 221.
Learn the information 221 of wafer cassette at netscape messaging server Netscape 220 after, board controller 218 promptly can be according to wafer cassette, be assumed to be wafer cassette 210, the technological parameter of the information 221 in database 222, carrying out ion required prescription when implanting with modulation wafer cassette 210, and netscape messaging server Netscape 220 also can be controlled mechanical arm 206 wafer cassette 210 is implanted in the board 200 via implantation window 202 loaded ions at one time.
Though above-mentioned device can reach the function of robotization and parallel processing, and then reach the purpose of save time (the loading wafer cassette of promptly saving 90 seconds is to the Ion Implantation Equipment platform time) and human-saving, but in the process of running, but the technological parameter that might obtain is wrong parameter value, so, utilize a parameter management system (RecipeManager System in the present invention again for having avoided this situation to produce; Be called for short RMS) 224, be to be linked to netscape messaging server Netscape 220.
Wherein, parameter management system 224 comprises the technological parameter of each identification code and each identification code, after netscape messaging server Netscape 220 obtains the information 221 of wafer cassette from database 222, netscape messaging server Netscape 220 can be delivered to the technological parameter in the information 221 in the parameter management system 224, after parameter management system 224 is via comparison, can judge whether the technological parameter of the information 221 that netscape messaging server Netscape 220 is obtained is correct.
In addition, for fear of in fact in board controller 218, there is no the problem that has the ion implantation technology parameter, netscape messaging server Netscape 220 can inquire also whether board controller 218 has the ion implantation technology parameter and whether this ion implantation technology parameter is correct technological parameter, technological parameter after for example netscape messaging server Netscape 220 can be compared parameter management system 224 be delivered to board controller 218 and compare, and board controller 218 promptly can return one exist about the ion implantation technology parameter and the inquiry result of correctness to netscape messaging server Netscape 220, or another kind of situation is that netscape messaging server Netscape 220 extract ions in board controller 218 is implanted technological parameter to compare the modulation action even the correct board controller 218 of comparison result is filled a prescription.
Via above-mentioned affirmation process, can make in the process of robotization, error rate is reduced to minimum, otherwise the wafer of units up to a million promptly may be because of wrong consume for no reason easily.
Please merge with reference to Fig. 2 and Fig. 3, it is a kind of automatic presetting technological parameters for ion implantation machine set method according to another embodiment of the present invention, this Ion Implantation Equipment platform has a board controller (being the board controller 218 of Fig. 2) and at least one mechanical arm, be assumed to be the mechanical arm 206 of Fig. 2, then mechanical arm 206 will be implanted board with wafer cassette 210 loaded ions via implantation window 202.
This automatic presetting technological parameters for ion implantation machine set method comprises: step s300, obtain the identification code of wafer cassette 210 earlier, then in step s302, obtain information 221 according to the comparison of identification code, wherein information 221 comprises that the other code name in station, place, board code name and the brilliant box identification code of wafer cassette 210 reach technological parameter required when ion is implanted.
Then, when definite wafer cassette 210 is in correct program and other to the station, board occurs, and the technological parameter in the information 221 has been to be stored in the board controller, and be correct parameter value, then in step 304, make board controller 218 carry out ion preparation action according to technological parameter, and at one time, netscape messaging server Netscape 220 also can make mechanical arm 206 that wafer cassette 210 is loaded on Ion Implantation Equipment platform 200, making the action of disposing ion action and loading wafer cassette A to walk abreast carries out, to save the running time, can in step s306, wafer cassette 210 be carried out ion implant action then.
Please merge with reference to Fig. 2 and Fig. 4, it is a kind of automatic presetting technological parameters for ion implantation machine set method according to further embodiment of this invention, present embodiment is for the technological parameter of avoiding obtaining is wrong parameter value, and there is no the problem that has the ion implantation technology parameter in the board controller 218 and have necessary debug function.
This automatic presetting technological parameters for ion implantation machine set method comprises: step s400, obtain the identification code of wafer cassette 210 earlier, then in step s302, obtain information 221 according to identification code, wherein information 221 comprises that the other code name in station, place, board code name and the brilliant box identification code of wafer cassette A reach technological parameter required when ion is implanted.Wherein above-mentioned step s400 and step s402 all step s300 and the s302 with Fig. 3 are identical.
Different is in the step s404 that follows, this carries out ion and implants and move to need to judge wafer cassette that present stage obtains 210 among the embodiment of Fig. 4, if not, then send error messages (step s408), wherein, judge wafer cassette 210 that present stage obtains whether this carries out ion and implant action, whether is the other code name of ion implant station that includes according to the board controller and Ion Implantation Equipment platform code name conforms to other code name in station and board code name in the information of obtaining 221, if do not conform to, expression wafer cassette 210 now should not appear in the program of ion implantation, or wafer cassette 210 is the other or boards in other station in the ion implant procedure, so send mistake immediately, otherwise other wafer cassette of postorder be not can enter wrong program be exactly can be at the station of mistake not or board occur.
When definite wafer cassette 210 is in correct program and other to the station, after board occurs, must judge then then whether the technological parameter in the information 221 is stored in the board controller, with and parameter value whether correct (step s306), because present stage is in the ion implant procedure, therefore so-called technological parameter is meant numerical value such as the kind of ion and concentration, if this technological parameter is wrong technological parameter, then similarly send error messages (step s408), program is then revised to treat operating personnel for the brilliant boat 210 of time-out loading advances Ion Implantation Equipment platform 200, or skips present wafer cassette A and move to next wafer cassette.
If technological parameter is correct technological parameter, then make board controller 218 in step s410, carry out ion preparation action according to technological parameter, and at one time, netscape messaging server Netscape 220 also can make mechanical arm 206 that wafer cassette 210 is loaded on the Ion Implantation Equipment platform, makes the action of disposing ion action and loading wafer cassette 210 to walk abreast and carries out, to save the running time, can in step s412, wafer cassette 210 be carried out ion implant action then.
Please referring again to Fig. 4, when having two mechanical arms at the Ion Implantation Equipment platform, and might have also at another mechanical arm that other wafer cassette is placed on it has prepared to carry out ion when implanting, then need carry out other program.
Comprising: obtain the identification code of wafer cassette 210 at step s400 after, carrying out under the situation with step s402 is parallel, if in a blink (step s414), judging has other second wafer cassette (step s416), be assumed to be wafer cassette 212, be present in (above example is assumed to be mechanical arm 208) on another mechanical arm, then netscape messaging server Netscape 220 can read the identification code (step s418) of wafer cassette 212 automatically.
Wherein if time is up (step s414) and do not have second wafer cassette (step s416) on mechanical arm, then in during this period of time, obtain information 221 (step s402) according to the identification code of first wafer cassette and carry out the action that ion is implanted, but if in during this period of time, still there be second wafer cassette to add in the program of ion implantation, then at step s418, after obtaining the identification code of second wafer cassette, must be in step s420, identification code according to second wafer cassette of obtaining learns whether second wafer cassette belongs to same group with first wafer cassette, that is to say, need to judge that whether identical with first wafer cassette whether second wafer cassette be not reach prescription at the station of carrying out the ion implantation, the established technology parameter needs identical, if it is identical, then need to obtain information 221 according to the identification code of wafer cassette, otherwise under the situation that arrives in the time, can obtain information 221 (step s420) according to the identification code of first wafer cassette, second wafer cassette will be disregarded, and the cresset (not drawing) on the meeting driving device arm 208 gives operating personnel's caution.
Then, the program behind the acquired information 221 all implementation step with above-mentioned is identical, does not add at this and gives unnecessary details.
In sum, the invention has the advantages that the process that whole ion is implanted gives robotization, to save time and manpower, and in automation process, it is first Dynamic Selection technological parameter, reducing the error on artificial, and then modulation prescription and load wafer cassette simultaneously, to save load time of 90 seconds to the Ion Implantation Equipment platform.
Though the present invention with the embodiment explanation as above; right its is not in order to limiting the present invention, anyly is familiar with this operator, without departing from the spirit and scope of the present invention; when can being used for a variety of modifications and variations, so protection scope of the present invention is when being as the criterion with claims.
Claims (19)
1. automatic presetting technological parameters for ion implantation machine set system, this Ion Implantation Equipment platform has at least one mechanical arm, be via an implantation window one wafer cassette to be loaded this Ion Implantation Equipment platform, it is characterized by: this automatic presetting technological parameters for ion implantation machine set system comprises:
One database comprises at least by the other code name in a station, a board code name, a brilliant box identification code and the formed information of a technological parameter;
One netscape messaging server Netscape, in order to obtaining this identification code of this wafer cassette, and according to this identification code of this wafer cassette of being obtained, this database obtains this information certainly; And
One board controller is modulated this wafer cassette according to this technological parameter in this information and is carried out ion required prescription when implanting, and this netscape messaging server Netscape is controlled this mechanical arm this wafer cassette is loaded this Ion Implantation Equipment platform at one time.
2. automatic presetting technological parameters for ion implantation machine set as claimed in claim 1 system is characterized by: also comprise an identification code identifier, connect this netscape messaging server Netscape, be positioned over this identification code of this wafer cassette on this mechanical arm in order to identification.
3. automatic presetting technological parameters for ion implantation machine set as claimed in claim 1 system, it is characterized by: also comprise a parameter management system, link this netscape messaging server Netscape, this technological parameter that comprises each this identification code and each this identification code, whether correct via comparison with this technological parameter of judging this information that this netscape messaging server Netscape is obtained.
4. automatic presetting technological parameters for ion implantation machine set as claimed in claim 1 system, it is characterized by: wherein this netscape messaging server Netscape can inquire whether this board controller comprises whether an ion implantation technology parameter and this ion implantation technology parameter are correct technological parameter.
5. automatic presetting technological parameters for ion implantation machine set as claimed in claim 4 system is characterized by: wherein this board controller can be passed an inquiry result back this netscape messaging server Netscape.
6. automatic presetting technological parameters for ion implantation machine set as claimed in claim 1 system, it is characterized by: wherein this wafer cassette comprises a plurality of wafers.
7. automatic presetting technological parameters for ion implantation machine set as claimed in claim 1 system is characterized by: wherein this technological parameter comprises ionic species and concentration required when ion is implanted.
8. automatic presetting technological parameters for ion implantation machine set method, this Ion Implantation Equipment platform has a board controller and at least one mechanical arm, wherein this mechanical arm loads this Ion Implantation Equipment platform via an implantation window with a wafer cassette, it is characterized by: this automatic presetting technological parameters for ion implantation machine set method comprises:
Obtain this identification code of this wafer cassette;
Obtain an information according to this identification code, comprise the other code name in a station, a board code name, a brilliant box identification code and a technological parameter;
Can carry out ion and implant action and judge that this technological parameter in this information has been stored in this board controller and when judging this wafer cassette that present stage obtains for correct, then make this board controller carry out ion preparation action according to this technological parameter, and the same time, also make this mechanical arm that this wafer cassette is loaded on this Ion Implantation Equipment platform; And
Carry out ion and implant action.
9. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 8, it is characterized by: wherein judge this wafer cassette that present stage obtains whether this carries out ion and implant action whether is the other code name of an ion implant station that includes according to this board controller and an Ion Implantation Equipment platform code name conforms to the other code name in this station and this board code name in this information of obtaining.
10. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 8 is characterized by: wherein when judging that this wafer cassette that present stage obtains should not carry out ion and implant action, then send error messages.
11. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 8 is characterized by: wherein, then send error messages if this technological parameter is wrong technological parameter.
12. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 8 is characterized by: wherein this wafer cassette comprises a plurality of wafers.
13. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 8 is characterized by: wherein this technological parameter comprises ionic species and concentration required when ion is implanted.
14. automatic presetting technological parameters for ion implantation machine set method, this Ion Implantation Equipment platform has a board controller and at least one mechanical arm, wherein this mechanical arm loads this Ion Implantation Equipment platform via an implantation window with a wafer cassette, it is characterized by: this automatic presetting technological parameters for ion implantation machine set method comprises:
Obtain one first identification code of one first wafer cassette, wherein in the time, have one second wafer cassette to exist, and learn that via one second identification code of obtaining this second wafer cassette this second wafer cassette and this first wafer cassette are same group;
According to this first and this second identification code obtain an information, comprise the other code name in a station, a board code name, a brilliant box identification code and a technological parameter;
When judge that present stage obtains this first and this second wafer cassette should carry out ion and implant action and judge that this technological parameter in this information has been stored in this board controller and for correct, then make this board controller according to this technological parameter carry out this first and the ion of this second wafer cassette preparation action, and the same time, also make this mechanical arm with this first and this second wafer cassette be loaded on this Ion Implantation Equipment platform; And
Carry out ion and implant action.
15. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 14, it is characterized by: wherein judge this wafer cassette that present stage obtains whether this carries out ion and implant action whether is the other code name of an ion implant station that includes according to this board controller and an Ion Implantation Equipment platform code name conforms to the other code name in this station and this board code name in this information of obtaining.
16. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 14 is characterized by: wherein ought judge this wafer cassette that present stage obtains and should not carry out ion and implant action, then send error messages.
17. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 14 is characterized by: wherein ought judge this technological parameter is wrong technological parameter, then sends error messages.
18. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 14 is characterized by: wherein this wafer cassette comprises a plurality of wafers.
19. automatic presetting technological parameters for ion implantation machine set method as claimed in claim 14 is characterized by: wherein this technological parameter comprises ionic species and concentration required when ion is implanted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021071918A CN1308816C (en) | 2002-03-14 | 2002-03-14 | System and method for automatic presetting technological parameters for ion implantation machine set |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021071918A CN1308816C (en) | 2002-03-14 | 2002-03-14 | System and method for automatic presetting technological parameters for ion implantation machine set |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1445662A true CN1445662A (en) | 2003-10-01 |
| CN1308816C CN1308816C (en) | 2007-04-04 |
Family
ID=27810992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021071918A Expired - Fee Related CN1308816C (en) | 2002-03-14 | 2002-03-14 | System and method for automatic presetting technological parameters for ion implantation machine set |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1308816C (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100422888C (en) * | 2005-08-16 | 2008-10-01 | 力晶半导体股份有限公司 | System and method for controlling batches in layers of reaction chamber |
| CN102096377B (en) * | 2009-12-10 | 2012-08-22 | 北大方正集团有限公司 | Method and device for inputting process parameters to dose controller |
| CN106206359A (en) * | 2015-05-05 | 2016-12-07 | 中芯国际集成电路制造(上海)有限公司 | Control method in semiconductor fabrication processes and system |
| CN109558172A (en) * | 2018-11-13 | 2019-04-02 | Oppo（重庆）智能科技有限公司 | Board computer and its parameter management method, server and its parameter management method |
| CN112306004A (en) * | 2019-07-26 | 2021-02-02 | 长鑫存储技术有限公司 | Semiconductor process recipe management method and system |
| CN113013059A (en) * | 2021-02-10 | 2021-06-22 | 北京北方华创微电子装备有限公司 | Method and apparatus for updating cleaning configuration in semiconductor processing equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06196539A (en) * | 1992-12-24 | 1994-07-15 | Toshiba Corp | Simulation method for ion implantation process |
| EP0964074A3 (en) * | 1998-05-13 | 2001-02-07 | Axcelis Technologies, Inc. | Ion implantation control using optical emission spectroscopy |
-
2002
- 2002-03-14 CN CNB021071918A patent/CN1308816C/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100422888C (en) * | 2005-08-16 | 2008-10-01 | 力晶半导体股份有限公司 | System and method for controlling batches in layers of reaction chamber |
| CN102096377B (en) * | 2009-12-10 | 2012-08-22 | 北大方正集团有限公司 | Method and device for inputting process parameters to dose controller |
| CN106206359A (en) * | 2015-05-05 | 2016-12-07 | 中芯国际集成电路制造(上海)有限公司 | Control method in semiconductor fabrication processes and system |
| CN106206359B (en) * | 2015-05-05 | 2019-03-12 | 中芯国际集成电路制造(上海)有限公司 | Control method and system in semiconductor fabrication processes |
| CN109558172A (en) * | 2018-11-13 | 2019-04-02 | Oppo（重庆）智能科技有限公司 | Board computer and its parameter management method, server and its parameter management method |
| CN109558172B (en) * | 2018-11-13 | 2021-11-30 | Oppo（重庆）智能科技有限公司 | Machine computer and parameter management method thereof, server and parameter management method thereof |
| CN112306004A (en) * | 2019-07-26 | 2021-02-02 | 长鑫存储技术有限公司 | Semiconductor process recipe management method and system |
| CN113013059A (en) * | 2021-02-10 | 2021-06-22 | 北京北方华创微电子装备有限公司 | Method and apparatus for updating cleaning configuration in semiconductor processing equipment |
| CN113013059B (en) * | 2021-02-10 | 2024-06-21 | 北京北方华创微电子装备有限公司 | Method and apparatus for updating cleaning configuration in semiconductor processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1308816C (en) | 2007-04-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1120520C (en) | Method for controlling states of units of equipment arranged in system for controlling semiconductor fabricating equipments | |
| CN1037827C (en) | Automaticlly operable manufacturing and machining plant | |
| CN1131467C (en) | Method for controlling semiconductor fabricating equipments | |
| CN1135491C (en) | Integrated management of semiconductor process data | |
| CN1156889C (en) | Installation for processing wafers | |
| US20040151362A1 (en) | Method and apparatus for determining defect detection sensitivity data, control method of defect detection apparatus, and method and apparatus for detecting defect of semiconductor devices | |
| CN1308816C (en) | System and method for automatic presetting technological parameters for ion implantation machine set | |
| CN101080642A (en) | Remote test facility with wireless interface to local test facilities | |
| CN105185731A (en) | Wafer scheduling control method and system of semiconductor heat processing device | |
| CN110665822B (en) | Shell-shaped tooth appliance sorting method, sorting device and sorting equipment | |
| CN1242874C (en) | Method for controlling cutting and sorting workpieces | |
| CN1208809C (en) | Semiconductor manufacturing apparatus control system | |
| CN115826506B (en) | Water treatment control system and control device | |
| CN1139527C (en) | Substrate moving-in and moving-out system in production process and its method | |
| CN1920717A (en) | Method for sharing semiconductive machine and manufacture system using same | |
| CN1196044C (en) | Semiconductor factory automation system and method for processing semiconductor wafer cartridge | |
| CN1129167C (en) | On-line equipment system and its control method | |
| CN1279423A (en) | System and method for monitoring operation failure of stacker for automatic manufacture of semiconductor | |
| CN114326601A (en) | Non-stop production line material self-early-warning replacement method and system | |
| CN110850830B (en) | Slot type equipment for automatic process treatment and formula scheduling method thereof | |
| US7496422B2 (en) | Method for controlling a semiconductor processing apparatus | |
| CN118192475B (en) | SMT feeding method, system, platform and storage medium based on MES | |
| CN1163945C (en) | Apparatus and method for processing a bulk of semiconductor crystal chips | |
| CN117479440B (en) | Board separator control method and device, board separator and circuit board production line | |
| CN1171703A (en) | Physical packaging position information processing system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070404 Termination date: 20210314 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |