CN1411017A - Manufacturing method of plasma display screen up and down base plate component element - Google Patents
Manufacturing method of plasma display screen up and down base plate component element Download PDFInfo
- Publication number
- CN1411017A CN1411017A CN 02139442 CN02139442A CN1411017A CN 1411017 A CN1411017 A CN 1411017A CN 02139442 CN02139442 CN 02139442 CN 02139442 A CN02139442 A CN 02139442A CN 1411017 A CN1411017 A CN 1411017A
- Authority
- CN
- China
- Prior art keywords
- pdp
- silane
- base plate
- solution
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
This invention put forward a method for processing high and low baseplate on PDP which is to perform surface modification to PDP baseplate glass, by controlling the extension of slurry on the baseplate glass to meet the needs of processing different components of PDP then to produce electrodes, baffles and dielectric layer by silk net printing method with low line-cut rate, high accuracy and smooth surface of dielectric layer and uniform thickness. Since the processed baseplate glass is durable to be washed, it can be stored in a period of time to simplify the process and increase productive efficiency.
Description
One, technical field
The invention relates to the making of flat-panel monitor, relate to the manufacture method of a kind of plasma display panel (PDP) (PDP) upper and lower base plate assembly, as making electrode, barrier and medium etc.
Two, background technology
According to applicant's data searching, related to the present invention or approaching technical data is as follows:
1. the manufacture method of a known electrode of plasma display screen assembly is the method for thin film photolithography, i.e. evaporation layer of metal film on the whole base plate surface, method with photoetching forms figure (electrode), (French Patent (FRP) N2169912 HOIJ9/00 Op.01.02.1973) then.The shortcoming of this method is the cost height, the production cycle is long, rate of finished products is low.
2. the technology that adopts thin-film technique and thick-film technique to combine applies photosensitive resin on clean base plate, exposes, develops, and stays the groove of conductor fig on the photosensitive resin film, and the method by silk screen printing is filled into slurry in the film pattern.In slurry oven dry and high-temperature sintering process, the voloxidation of photosensitive resin film stays the conductor electrode figure on substrate.(Dennis M.Gibson, A Method for Thick FilmPrinting of Conductor Fine Lines and Spacing, Solid State Technology, May1981). the shortcoming of this method is that thickness of electrode and width are difficult to reach simultaneously requirement.
3.MF method, on substrate, apply skim organic photo resin, with suitable mask, through ultraviolet exposure, the conductor powder can not combine with the resin that is exposed, and but can physically embed in the rete that is not exposed, in high-temperature sintering process, the resin voloxidation, the powder particle with the substrate sintering.(H.M.Naguib，K.L.Kavanagh，L.H.Hobbs，A?New?Process?for?Printing?FineConductor?Lines?and?Spaces?on?Large?Area?Substrates，Solid?State?Technology，October1980)。The technology of comparing this method with additive method is also not overripened.
4. also have a kind of method with silk screen printing to print photosensitive silver paste to glass substrate, photoetching forms the method for electrode then.Developed multiple photosensitive silver paste (Apr.10.2001 is an example wherein for U.S. Pat 6,214,527, B1) at present, though their performance has raising in various degree, this method exists complex process equally, the shortcoming that cost is higher relatively.
5. the method the most approaching with the present invention is the coating that applies organic material on glass plate, and the method with silk screen printing forms construction unit on coating, in sintering process, and the oxidized volatilization of organic material.(Soviet Union author certificate of invention N873861, к л .HO5K, 3/00, Op.04.01.1979).The shortcoming of this method is that formed electrode structure unit is prone to fracture, and rate of finished products is low.
Three, summary of the invention
Defective and deficiency at the whole bag of tricks in the above-mentioned prior art exists the objective of the invention is to, and propose a kind of new method of making plasma display panel (PDP) upper and lower base plate assembly.
To achieve these goals, the technical scheme that the present invention takes is, the making of plasma display panel (PDP) (PDP) upper and lower base plate assembly is carried out in the following manner:
1) joins pretreatment fluid with glass surface generation chemical reaction
Prepare different treatment fluids at the different assemblies of making:
When making electrode, barrier, adopt the base plate glass of the article on plasma body display screens (PDP) such as the aqueous solution, alcoholic solution and hydrofluoric acid of silane to carry out preliminary treatment; Wherein
The silane of the aqueous solution: 0.1%-5%, the isopropyl alcohol of 0.1-5%, the acetate of 0.1%-5%, the deionized water of 99.7%-85% or the silane of 0.1%-5%, the isopropyl alcohol of 0.1%-5%, the acetate of 0.2%-10%, the 0.1%-3% dimethyl benzylamine, the deionized water of 99.5%-77%;
The silane of alcoholic solution: 0.1%-5%, the deionized water of 1-20%, the purity of 98.9%-75% is at the ethanol more than 99.5%;
Hydrofluoric acid: concentration is the hydrofluoric acid solution of 30%-40%;
Adopt the base plate glass of the solution of silane article on plasma body display screen (PDP) of high concentration to carry out preliminary treatment when making dielectric layer;
Wherein solution of silane concentration should be greater than 90%;
2) with the solution for preparing, at room temperature soak plasma display panel (PDP) (PDP) base plate glass that had carried out PROCESS FOR TREATMENT such as cleaning and annealing, time is more than the 5h, or increase the temperature to 100 ℃ of solution, can reduce soak time to about the 1h, when adopting hydrofluoric acid solution, soak time is controlled at 15min-25min, takes out glass then and cleans and dry 20min-40min;
3) print desired slurry with the method for silk screen printing at the glass surface of handling, make electrode, barrier and dielectric layer etc., carry out drying and high-temperature heat treatment at last.
The above-mentioned silane of mentioning comprises methyltrimethoxy silane, vinyltriethoxysilane, ethyl trimethoxy silane, propyl trimethoxy silicane, trifluoro propyl trimethoxy silane.
Silane is a kind of organo-silicon compound between organic and inorganic matter, adopt article on plasma body display screen (PDP) base plate glass such as its aqueous solution, alcoholic solution or hydrofluoric acid to carry out preliminary treatment, because the chemical reaction that takes place between treatment fluid and the glass surface, reduced the surface tension of glass, hindered slurry scattering at glass surface, thereby line thickness such as the electrode that the method that makes the employing silk screen printing is made at glass surface, barrier narrow down, and have improved the fine degree of making figure.
The present invention compares with the 5th kind of method described in the background technology, because this method applies the organic material identical with the slurry organic principle, after drying, can form one deck physics film between the electrode (or barrier) of printing and the glass, the oxidation in sintering process of this tunic, volatilization, be easy to make lines fractures such as electrode attached thereto, barrier, increased the difficulty on the late detection operation; Defective very easily occurs when this layer coating of organic material made simultaneously, not anti-again cleaning is only reformed when going wrong, and has influenced the production efficiency and the rate of finished products of plasma display panel (PDP) to a great extent.By contrast, method of the present invention is to utilize chemical reaction that glass surface is carried out modification, thereby the glass of handling is not afraid of washing, and slurry directly contacts with glass surface, in heat treatment process, upper and lower base plate assembly (as electrode, barrier etc.) new fracture can not occur, has improved Practical Performance.The present invention compares with the preceding four kinds of methods described in the background technology, owing to do not adopt film and photoetching technique, so simple relatively again on the technology, cost reduces greatly.
The concentration of solution of silane or solvent difference, handling the effect of glass also can completely contradict, as adopting purer solution of silane directly to soak base plate glass, ductility and the levelling characteristic of slurry on substrate is all very good, and this point helps the making of insulating medium layer in the plasma display panel (PDP) upper and lower base plate assembly.Following embodiment 3 is the application example of this respect.
Generally speaking, the method that the present invention proposes is to carry out preliminary treatment by article on plasma body display screen (PDP) base plate glass, improve the surface tension of glass, change the wettability of slurry selectively at glass surface, can realize control to live widths such as electrode, barriers, again can autotelic increase slurry in the ductility and the levelling characteristic of substrate surface, to help making the dielectric layer of even film layer, no reticulate pattern.The present invention can be applicable to the making of plasma display panel (PDP) (PDP) upper and lower base plate electrode assembly, barrier assembly, media set, and technical process similarly.Four, embodiment
For a more clear understanding of the present invention, the present invention is described in further detail for the specific embodiment that provides according to technical scheme of the present invention below in conjunction with the inventor.
When employing was of the present invention, the different treatment fluid of different assemblies preparations at making during as making electrode, barrier, adopted the aqueous solution, alcoholic solution and hydrofluoric acid of part silane or the like, then adopts the solution of silane of high concentration during the making dielectric layer.Soak plasma display panel (PDP) (PDP) base plate glass of processing such as having carried out cleaning and annealing with the solution for preparing, after a period of time, take out glass and clean also drying, print desired slurry thereon with the method for silk screen printing again, carry out drying and high-temperature heat treatment at last.
On average reached 20% with line thickness improvement rate (promptly at same printing on glass (place's of being untreated line thickness-processing place the line thickness)/place's of being untreated line thickness * 100%) behind the argent electrode sintering of this kind method making, the resistance of electrode also descends to some extent, and the metal electrode outage of monolithic glass plate does not increase simultaneously.The barrier figure of Zhi Zuoing also is improved in this way, the dielectric layer surface smoothing of making, and no reticulate pattern, thickness is even.This shows that make plasma display panel (PDP) (PDP) upper and lower base plate assembly with method of the present invention, not only technology is simple, cheap, with short production cycle, index of correlation also can satisfy higher requirement.
Be three specific embodiments that the inventor provides according to technical scheme of the present invention below, but the invention is not restricted to these embodiment.
Embodiment 1:
The vinyltriethoxysilane aqueous solution of preparation 1%, the isopropyl alcohol and the acetate that add equivalent, plasma display panel (PDP) (PDP) base plate glass that annealing in process crosses is cleaned in strictness to be put into this solution and soaks about 1h (container of splendid attire solution is put into 100 ℃ insulating box), taking-up is clean with pure water rinsing, dry tens minutes, method with silk screen printing is made electrode at the glass surface of handling, after dry tens minutes, carry out high-temperature heat treatment again, the width of the upper substrate silver electrode that obtains is at last compared with the silver electrode width on the substrate of not doing immersion treatment, and live width improvement rate has reached 33%.
Embodiment 2:
The vinyltriethoxysilane ethanolic solution of preparation 1%, plasma display panel (PDP) (PDP) base plate glass that strictness cleaning annealing in process is crossed carries out immersion treatment (room temperature), about 23 hours, method with silk screen printing is made electrode, after dry tens minutes, carry out high-temperature heat treatment at last, electrode live width improvement rate reaches 20%.
Embodiment 3:
With plasma display panel (PDP) (PDP) base plate glass with concentration reach 99.8% vinyltriethoxysilane solution soak moments later take out dry, again with screen painting slurry with flagpole pattern, can see obviously that slurry spreads apart rapidly and levelling at substrate surface, after the drying, surface smoothing, the uniform dielectric layer of thickness have been obtained.
The foregoing description can be enumerated many, when the inventor experiment showed, the aqueous solution, alcoholic solution of preparation silane and hydrofluoric acid, as long as at formula range of the presently claimed invention, can reach purpose of the present invention, is not combined into ranks one by one at this and lifts.
Adopt the electrode that the present invention makes and barrier figure outage is low, precision is high, the dielectric layer surface smoothing of making, thickness are even; Simultaneously,, simplified production process to a certain extent again in a period of time, improved production efficiency because water-fast the washing of base plate glass of handling can be deposited.The method that the present invention proposes had both been inherited advantages such as cheap, the suitable batch process of thick film cost of manufacture, had improved the making quality again to a certain extent.
Claims (2)
1. the manufacture method of a plasma display panel (PDP) (PDP) upper and lower base plate assembly is characterized in that, carries out in the following manner:
1) joins pretreatment fluid with glass surface generation chemical reaction
Prepare different treatment fluids at the different assemblies of making:
When making electrode, barrier, adopt the base plate glass of the article on plasma body display screens (PDP) such as the aqueous solution, alcoholic solution and hydrofluoric acid of silane to carry out preliminary treatment; Wherein
The silane of the aqueous solution: 0.1%-5%, the isopropyl alcohol of 0.1-5%, the acetate of 0.1%-5%, the deionized water of 99.7%-85%; The perhaps silane of 0.1%-5%, the isopropyl alcohol of 0.1%-5%, the acetate of 0.2%-10%, 0.1%-3% dimethyl benzylamine, the deionized water of 99.5%-77%;
The silane of alcoholic solution: 0.1%-5%, the deionized water of 1-20%, the purity of 98.9%-75% is at the ethanol more than 99.5%;
Hydrofluoric acid: concentration is the hydrofluoric acid solution of 30%-40%;
Adopt the base plate glass of the solution of silane article on plasma body display screen (PDP) of high concentration to carry out preliminary treatment when making dielectric layer;
Wherein solution of silane concentration should be greater than 90%;
2) with the solution for preparing, at room temperature soak plasma display panel (PDP) (PDP) base plate glass that had carried out PROCESS FOR TREATMENT such as cleaning and annealing, time is more than the 5h, or increase the temperature to 100 ℃ of solution, can reduce soak time to about the 1h, when adopting hydrofluoric acid solution, soak time is controlled at 15min-25min, takes out glass then and cleans and dry 20min-40min;
3) print desired slurry with the method for silk screen printing at the glass surface of handling, make electrode, barrier and dielectric layer etc., carry out drying and high-temperature heat treatment at last.
2. the manufacture method of plasma display panel (PDP) as claimed in claim 1 (PDP) upper and lower base plate assembly, it is characterized in that described silane comprises methyltrimethoxy silane, vinyltriethoxysilane, ethyl trimethoxy silane, propyl trimethoxy silicane, trifluoro propyl trimethoxy silane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02139442 CN1200445C (en) | 2002-09-24 | 2002-09-24 | Manufacturing method of plasma display screen up and down base plate component element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02139442 CN1200445C (en) | 2002-09-24 | 2002-09-24 | Manufacturing method of plasma display screen up and down base plate component element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1411017A true CN1411017A (en) | 2003-04-16 |
| CN1200445C CN1200445C (en) | 2005-05-04 |
Family
ID=4750086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02139442 Expired - Fee Related CN1200445C (en) | 2002-09-24 | 2002-09-24 | Manufacturing method of plasma display screen up and down base plate component element |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1200445C (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100350593C (en) * | 2004-08-02 | 2007-11-21 | Nec液晶技术株式会社 | Method of forming wiring pattern and method of manufacturing tft substrate using the same |
| CN1843997B (en) * | 2005-04-08 | 2011-05-18 | 富士电机电子技术株式会社 | Method of plating on a glass base plate, a disk substrate, method for manufacturing the same and a perpendicular magnetic recording medium |
| CN101726163B (en) * | 2008-12-12 | 2011-09-14 | 四川虹欧显示器件有限公司 | Drying furnace for plasma display and drying method thereof |
| CN111584654A (en) * | 2020-03-31 | 2020-08-25 | 天津爱旭太阳能科技有限公司 | Method for preparing crystalline silicon solar cell electrode |
-
2002
- 2002-09-24 CN CN 02139442 patent/CN1200445C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100350593C (en) * | 2004-08-02 | 2007-11-21 | Nec液晶技术株式会社 | Method of forming wiring pattern and method of manufacturing tft substrate using the same |
| CN1843997B (en) * | 2005-04-08 | 2011-05-18 | 富士电机电子技术株式会社 | Method of plating on a glass base plate, a disk substrate, method for manufacturing the same and a perpendicular magnetic recording medium |
| CN101726163B (en) * | 2008-12-12 | 2011-09-14 | 四川虹欧显示器件有限公司 | Drying furnace for plasma display and drying method thereof |
| CN111584654A (en) * | 2020-03-31 | 2020-08-25 | 天津爱旭太阳能科技有限公司 | Method for preparing crystalline silicon solar cell electrode |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1200445C (en) | 2005-05-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1910240A1 (en) | Etching media for oxidic, transparent, conductive layers | |
| KR20070080330A (en) | Transparent electrode and praparation method thereof | |
| CN110364429B (en) | Metal nanowire film, preparation method thereof and thin film transistor array | |
| CN1200445C (en) | Manufacturing method of plasma display screen up and down base plate component element | |
| CN101055830A (en) | Making method of self-limited boundary film graphics | |
| KR101324028B1 (en) | Multi-layered metal nanowire having improved conductivity and its preparation method | |
| JPH0931630A (en) | Transparent electrically conductive film and its production | |
| JP2003533890A (en) | Etching method for producing electrodes | |
| KR20170124563A (en) | Silver nanowire synthesis with (meth)acrylate based capping agents | |
| JP4655472B2 (en) | Coating liquid for forming indium-tin oxide thin film | |
| KR101589635B1 (en) | Electrochromic window including of micro-patterned transparent conductive oxide film and preparing method thereof | |
| KR100804003B1 (en) | Process for preparing indium tin oxide film | |
| CN106119971B (en) | A kind of preparation and its application of organic and inorganic perovskite spike crystal | |
| KR101200857B1 (en) | Method for preparing transparent conductive coating film comprising branched nanowire | |
| CN1159063A (en) | Method for forming transparent conductive layer | |
| JPS6146552B2 (en) | ||
| JP4069783B2 (en) | Tin oxide thin film coating solution | |
| JP2010165888A (en) | Method of manufacturing resistor film, and resistor film | |
| JP5308117B2 (en) | Method for producing transparent conductive substrate | |
| KR100579492B1 (en) | Method for forming electrode on conducting film having insulating protective layer and device which conducting film having insulating protective layer is formed | |
| KR101008237B1 (en) | Method of forming transparent conducting film | |
| JPH07133198A (en) | Production of electric conductive thin film having orientation property | |
| JPH06107493A (en) | Formation of gold crystal | |
| JP2004176112A (en) | Method of producing thin film, and thin film comprising fine particle, produced by the method | |
| KR100406814B1 (en) | Photo-induced Hydrophilic Film and Method of Forming the Film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050504 |