CN1347136A - Liquid state film drying method and device - Google Patents
Liquid state film drying method and device Download PDFInfo
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- CN1347136A CN1347136A CN 01140672 CN01140672A CN1347136A CN 1347136 A CN1347136 A CN 1347136A CN 01140672 CN01140672 CN 01140672 CN 01140672 A CN01140672 A CN 01140672A CN 1347136 A CN1347136 A CN 1347136A
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Abstract
The invention provides a liquid film drying method and device thereof. This liquid film drying method includes a process for providing a through hole 204, and for allowing a rectifying plate 200 to come close to the substrate 101 to be treated at distance where the rectifying plate 200 does not come into contact with the liquid film; a process for rotating the rectifying plate 200 for generating the air current between the substrate 101 to be treated and the lower surface of the rectifying plate 200; and a process for bringing the liquid film containing a dissolved substance into contact with the air current, for removing the solvent in the liquid film, and for forming a solid-phase film made of the dissolved substance on the substrate 101 to be treated.The invention is able to increase uniformity in film thickness, and at the same time to control treatment time for improving throughput in a liquid film drying method for removing a solvent in a liquid film formed on a substrate to be treated.
Description
Technical field
The present invention relates to liquid film drying means that is used for method of forming coating film and liquid film drying device in semiconductor, liquid crystal device manufacturing technology.
Background technology
Up to now; on processed substrate, form after diaphragm etc. contains the liquid film of solvent; in the drying process of this liquid film, adopt the simple baking that on hot plate, processed substrate is heated always, and the hypobaric drying method that in being connected to the chamber of vacuum pump, carries out reduced pressure treatment.
But, in baking,,, exist the bad problem of uniformity of formed thickness so produce the fluctuating of thickness because the volatilization of solvent is very responsive to temperature.
In addition, in using the hypobaric drying method of vacuum pump, near the saturated vapor pressure of solvent the time, take a long time to remove and desolvate the problem that causes productivity ratio to descend.In addition, this productivity ratio is subjected to the influence of physical property He the amount of dripping of solvent, can not the control and treatment time.
Summary of the invention
As mentioned above, using hot plate to adopt in the technology of the dry liquid film of baking, exist the problem of membrane thickness unevenness.In addition, in hypobaric drying method, exist and to control the problem that causes productivity ratio to descend to the processing time.
The purpose of this invention is to provide a kind of in the liquid film drying process, thereby can also control the liquid film drying means and the liquid film drying device of boosting productivity to the processing time in the inhomogeneity while that obtains good thickness.
For achieving the above object, the present invention adopts following structure.
(1) the present invention's's (claim 1) is characterized as, in the liquid film drying means of the solvent in removing the liquid film that contains solute that is formed on the processed substrate, comprise following operation: make cowling panel with more than one through hole with not with the operation of aforementioned liquid film contact distance near the top of this processed substrate, make aforementioned cowling panel rotation, operation producing air-flow above this processed substrate and between this cowling panel lower surface makes liquid film contact the solvent of removing in the aforementioned liquid film with aforementioned air-flow, on aforementioned processed substrate, form the operation of immobilon-p by aforementioned solute.
Preferred form of the present invention is as described below.
(a) between aforementioned processed substrate and aforementioned cowling panel lower surface, import air-flow, utilize the rotation of aforementioned cowling panel, the pressure differential that produces between aforementioned processed substrate and aforementioned cowling panel lower surface are carried out.
(b) direction of the air-flow that produces between aforementioned processed substrate and the aforementioned cowling panel lower surface is changed in time.The difference of the pressure of pressure between aforementioned processed substrate and the aforementioned cowling panel lower surface and aforementioned cowling panel upper surface is changed, the direction of the air-flow that produces between aforementioned processed substrate and the aforementioned cowling panel lower surface is changed in time.
(c) make the central shaft of aforementioned cowling panel different with the center of aforementioned processed substrate.Aforesaid different amount is changed in time.Make aforementioned processed substrate to the direction rotation opposite with the direction of rotation of aforementioned cowling panel.
(2) the present invention's's (claim 8) is characterized as, in the liquid film drying means of the solvent in removing the liquid film that contains solute that is formed on the processed substrate, comprise following operation: make cowling panel with the distance that do not contact aforementioned liquid film near the operation directly over this processed substrate, the operation of decompression state will be maintained around reaching between aforementioned cowling panel and the aforementioned processed substrate, make aforementioned cowling panel rotation, operation producing air-flow above the aforementioned processed substrate and between this cowling panel lower surface makes aforementioned liquid film contact aforementioned air-flow, remove the solvent in the liquid film, on aforementioned processed substrate, form the operation of immobilon-p by aforementioned solute.
(3) drying device of the liquid film of (claim 9) according to the present invention, it is characterized by, it has with the lower part: with the processed substrate subtend configuration that forms the liquid film contain solvent on the surface, cowling panel with more than one through hole, make the rotary driving part of this cowling panel rotation, with the air flow control panel of the peristome side subtend configuration of the through hole of the aforementioned cowling panel of the reverse side of aforementioned processed substrate, make the above-below direction drive division of the relative variation of distance of the distance of aforementioned cowling panel and aforementioned processed substrate and aforementioned cowling panel and aforementioned air flow control panel.
(4) the present invention's's (claim 10) is characterized as, it possesses has: with the processed substrate subtend configuration that forms the liquid film contain solvent on the surface, cowling panel with an above through hole, make the rotary driving part of this cowling panel rotation, and to the outer gas stream generator of aforementioned through hole supply air flow.More than the preferred form of two inventions as described below.
(a) further have and aforementioned processed substrate and cowling panel be contained in inner decompression chamber and be connected to vacuum pump in the aforementioned decompression chamber, that exhaust is carried out in this decompression chamber inside.
(b) have a plurality of through holes on aforementioned cowling panel, its configuration mode is: when rotated each through hole in time with much at one ratio by the arbitrary portion on the processed substrate.
The present invention has following effect and effect by said structure.
By high speed rotating cowling panel above processed substrate, on substrate, produce flowing of uniform airflow, can promptly make uniformly and film.In addition, by the revolution of suitable setting cowling panel and the distance between processed substrate and the cowling panel, be not subjected to the physical property of solvent and the amount of dripping about, can carry out the control in processing time, can boost productivity.
The cowling panel and the decompression state between the substrate that are produced when cowling panel is rotated import air-flow as actuating force, can improve the efficient of drying process.
Change in time by the direction that makes air-flow, can suppress to form more uniform film along the gradient of the film thickness distribution of the flow direction of air-flow.
Central shaft by making cowling panel and the biasing of the central shaft of processed substrate can prevent singular point, improve the uniformity of thickness.In addition, change in time, can further improve the uniformity of thickness by making amount of bias.In addition, also rotate, can improve drying efficiency by making processed substrate.
With between aforementioned cowling panel and the aforementioned processed substrate with and maintain decompression state on every side, prevent from producing the operation of air-flow on the aforementioned processed substrate and between this cowling panel lower surface and be accompanied by the rapid volatilization generation turbulent flow of depressing solvent at saturated steam, the thickness distribution that can obtain to film uniformly when aforementioned cowling panel from rotating.
By the cowling panel with more than one through hole is rotated on processed substrate, making between processed substrate and the cowling panel becomes decompression state.Import air-flow from this through hole, can make the liquid film drying on the processed substrate.The distance by making aforementioned cowling panel and aforementioned processed substrate and the distance of aforementioned cowling panel and aforementioned air flow control panel relatively change, can make pressure between aforementioned cowling panel and the aforementioned processed substrate and the pressure between aforementioned air flow control panel and the aforementioned processed substrate have difference, can change the direction of air-flow according to this pressure differential.
By with the outer gas stream generator to the through hole supply air flow that is located on the cowling panel, can make the liquid film drying on the processed substrate effectively.
Along with the time is disposed a plurality of through holes in much at one the ratio mode by the arbitrary portion on the processed substrate, make air-flow contact processed substrate equably by each through hole when rotated, can form uniform film.
The working of an invention form
Form of implementation of the present invention is described with reference to the accompanying drawings.
[first kind of form of implementation]
Before explanation drying device of the present invention and method, the formation of liquid film 1 is described with Fig. 1 at first.Fig. 1 is used to illustrate the formation method of the liquid film (diaphragm) of first kind of form of implementation of the present invention.
As shown in Figure 1, make soup discharge nozzle 110 in processed substrate 101 upper edge y directions with the reciprocating while of the speed of 1m/ses, move processed substrate along the x direction successively, soup is dripped with the form of wire (unicursal shape), by the soup that on whole of the processed substrate of diameter 200mm, drips, on whole of processed substrate 101, form the liquid film 102 that contains resist (resist) A (solute).
Secondly, utilize the solvent that makes cowling panel rotate the air-flow liquid towards film that is produced to carry out drying with rotating mechanism.Fig. 2 represents the schematic configuration of liquid film drying device.
As shown in Figure 2, cowling panel 200 is first disk 201 of 250mm by the diameter with respect to the configuration of processed substrate subtend and constitutes through second disk 202 of the diameter 250mm of rotary driving part 203 configurations, at the air-flow introducing port 204 of the middle body through diameter 20mm of first disk 201, rotary driving part 203, second disk 202.Have to the drive division of Z direction and air flow guiding control boards 205 processed substrate 101 same diameter with second disk, 202 subtends, spaced apart configuration.
Below, the drying means that utilizes this liquid film drying device is described.
At first, as shown in Figure 3, at the gap configuration cowling panel 200 that forms above the processed substrate 101 of liquid film 102 with 20mm.Secondly, the distance setting with air flow guiding control board 205 and cowling panel 200 is greater than the 30mm of processed substrate 101 with the distance (20mm) of cowling panel 200.Under this configuration status, cowling panel 200 was rotated for 5 seconds with 3000rpm.
At this moment, when between more processed substrate and the cowling panel and during the decompression state that is produced between cowling panel and the air flow guiding control board, the decompression degree between processed substrate and the cowling panel is big.Thereby,, air-breathing with this decompression difference from the opening of second disk, 202 sides of air-flow introducing port 204 as actuating force, from the opening exhaust of first disk, 201 sides, in the air-flow introducing port 204 of cowling panel 200, form downward air-flow.Whereby, between the processed substrate and first disk, form the air-flow that flows to peripheral part from the center.When between the processed substrate and second disk, flowing through air-flow, the liquid film 102 on the processed substrate 101, from the central part of substrate to periphery with solvent seasoning.
Then, as shown in Figure 4, be less than the distance between processed substrate and the cowling panel (20mm) with the distance setting between air flow guiding control board 205 and the cowling panel 200, be 10mm, make cowling panel 200 rotate for 5 seconds at this state with 3000rpm.
At this moment, when carry out between processed substrate and the cowling panel as before and cowling panel and air flow guiding control board between during the comparison of the decompression state that produced, the decompression degree between cowling panel and the air flow guiding control board is big.Thereby as actuating force, air-breathing from the peristome of first disk, 201 sides of air-flow introducing port 204, from the peristome exhaust of second disk, 202 sides, the air-flows in the air-flow introducing port 204 of cowling panel 200 upwards flow with this decompression difference.Between the processed substrate and first disk, form the air-flow at the center that flows to from periphery.Liquid film 102 on the processed substrate 101 is along with flowing of the air-flow between the processed substrate and first disk, from outer circumferential center dry solvent.
By above-mentioned operation is carried out six times alternately repeatedly, in the time in 60 seconds altogether, make the solvent seasoning in the liquid film 102.At last, make the lower surface of cowling panel 200 break away from the surface of processed substrate 101, be formed uniformly not at last film (immobilon-p) of the resist A that departs from airflow direction with the thickness of 300nm with respect to the whole base plate face.
In this form of implementation, as shown in Figure 5, change the distance of cowling panel 200 and air flow guiding control board 205, oppositely change flowing of liquid film 102 overdraughts alternately, the homogeneous film thickness that obtains not depart from along airflow direction distributes.
In addition, the revolution by suitably setting cowling panel and the distance of processed substrate and cowling panel can not be subjected to the control in processing time of the influence of the physical property of solvent and the amount of dripping, and can boost productivity.
In addition, in the drying means according to the liquid film of this form of implementation, the distance of cowling panel and processed substrate and cowling panel and air flow guiding control board is not limited to the described relation of this form of implementation with the relativeness of time.In addition, the revolution of cowling panel also is not limited to 3000rpm.Can suitably set them according to the soup that uses.
In addition, in this form of implementation, the distance of cowling panel and processed substrate, the magnitude relationship of the distance of cowling panel and air flow guiding control board, realize by mobile air flow guiding control board, but also processed substrate and air flow guiding control board can be fixed, relatively mobile cowling panel is realized.
In addition,, except that the scanning rubbing method of this form of implementation, also can adopt mind-set periphery (perhaps in contrast) therefrom, also can adopt other to make the method for liquid film with the drip spiral rubbing method of soup of helical form as the manufacture method of liquid film.
[second kind of form of implementation]
At first, the same with first kind of form of implementation, the liquid film of formation resist A on whole processed real estate.
Secondly, carry out the drying of the solvent of liquid film with cowling panel with rotating mechanism shown in Figure 6.
As Fig. 6 (a), (b) shown in, cowling panel 601 is the disk with the diameter 250mm of processed substrate 101 subtends configuration.Form the hole 603 of φ 5mm on cowling panel 601, these holes and radius form helical form side by side with the pitch that broadens gradually at interval pro rata.With the face of the processed substrate 101 side subtends of cowling panel 601 on, 1.5kg/cm for example more than atmospheric pressure
2Connection can be controlled the airflow provider 603 of certain pressure.
Why on cowling panel 601 to dispose through hole with the pitch that broadens at interval in spiral helicine mode with respect to radius is proportional, be for when cowling panel 601 rotation, the hole 603 of disk on the surface of processed substrate 101 in the unit interval no matter on what radial location equal through holes by similar number.Under the situation of this form of implementation, for example, when the pitch of locating the hole of diameter 5mm when the most peripheral (r=100mm) of substrate was 30mm, the pitch P r in the hole at each radius r place was by formula Pr=30 * (r/100) expression below.
Below, the drying process that adopts drying device shown in Figure 6 is described.
As shown in Figure 7, cowling panel 601 is configured in the distance of liquid film 102 top 10mm, carries out 60 seconds processing to direction (direction opposite) rotation of figure, carry out the drying of liquid film with the coiling direction of spiral with 2000rpm.Then, make cowling panel 601 leave the surface of processed substrate 101, form filming of the thick resist B of 300nm at last.
In this form of implementation, liquid film 102 on the processed substrate 101 always contacts equably with air-flow from the spiral helicine hole 603 vertical discharges of cowling panel 601, discharges the drying of carrying out liquid film by these air-flows smoothly to the substrate peripheral direction along the hand of spiral.Utilize above-mentioned technology, can obtain smooth film thickness distribution very uniformly.
In this form of implementation, by top airflow provider is set at cowling panel, and its pressure is set in more than the atmospheric pressure, can increase the air-flow velocity of discharge, carry out drying efficiently, but can according to circumstances not establish airflow provider yet, only utilize the real estate that produces by the rotation of cowling panel and the decompression degree between the cowling panel lower surface to produce air-flow as actuating force.Suitable adjustment can be carried out according to employed soup in the number of the through hole of the cowling panel that sets in addition,, aperture, pitch and revolution, gap.
In addition, manufacture method as liquid film, except the described scanning rubbing method of this form of implementation, also can adopt from central division to periphery (or in contrast) with the drip spiral rubbing method of soup of spiral helicine mode, also can adopt the manufacture method of other liquid film.
[the third form of implementation]
Make superfine nozzle in processed substrate upper edge y direction with the reciprocating while of the speed of 1m/sec, move processed substrate successively along the x direction, with the mode of wire (unicursal shape) soup that drips, by the soup that on whole base plate (φ 200mm), drips, on the whole surface of processed substrate, form the liquid film of resist A.
Then, carry out the drying of liquid film with drying device shown in Figure 8.Fig. 8 represents the simple structure according to the drying device of the third form of implementation of the present invention.
As shown in Figure 8, processed substrate 101 is provided with rotary rectifier plate (disk) the 801 subtends ground that is arranged in the chamber 802.Chamber 802 connects vacuum pump 803, can reduce the air pressure in the chamber.
Below the drying process that uses drying device shown in Figure 8 is described.
At first, the distance of setting processed substrate 101 and cowling panel 801 is 5mm, (15Torr/sec.) pressure in the chamber 802 is reduced pressure with certain speed with vacuum pump 803.Secondly, the pressure chamber 802 in reaches the stage as about 2Torr of solvent saturated vapor pressure, cowling panel is rotated and keeps carrying out for 30 seconds the drying of solvent with the revolution of 2000rpm.
Then, make cowling panel 801 break away from the surface of processed substrate 101, take out from chamber 802, the last resist C that forms thickness 300nm on processed substrate 101 films.
In the hypobaric drying method of prior art, as shown in Figure 9, under the saturated steam pressure condition of solvent, the solvent of volatilization forms turbulent flow, thereby causes the problem in the surperficial formed membrane thickness unevenness of liquid film 102.
In this form of implementation, as shown in figure 10,, can prevent that the volatilization of solvent when saturated vapor pressure from becoming turbulent condition by solvent atmosphere being discharged to the periphery of substrate with laminar condition, reduce inhomogeneously by what turbulent flow produced, obtain uniform film thickness distribution.
In this form of implementation, adopting does not have the cowling panel of peristome, but is not limited to this, can adopt in second kind of form of implementation employed opening to have the opening cowling panel in a plurality of holes yet.In addition, in this form of implementation, chamber except that with part that vacuum pump is connected be closed structure, but under the situation that peristome is set on the cowling panel, airflow provider as shown in figure 11 also can be set on chamber top, one in the chamber supply air flow simultaneously handle.In addition, the distance of cowling panel and substrate, revolution, vacuum degree also can be according to employed soup appropriate change.At last,, except that the scanning rubbing method of this form of implementation, also can adopt from central division to periphery (perhaps opposite), also can adopt other liquid film manufacture method in addition with the drip spiral rubbing method of soup of helical form as the manufacture method of liquid film.
[the 4th kind of form of implementation]
Figure 12 is the diagram of expression according to the simple structure of the drying device of the 4th kind of form of implementation of the present invention.In Figure 12, identical label is used at the position identical with Fig. 2, and omits the explanation to it.
At first, so that form mode that the central shaft of the processed substrate of resist liquid film overlaps with the cowling panel central shaft with the close cowling panel of the distance of 20mm, and begin to rotate with 3000rpm.Meanwhile, also make processed substrate begin rotation with 30rpm along the direction opposite with the direction of rotation of cowling panel.Then, the central shaft that makes cowling panel simultaneously moves to the peripheral part of the processed substrate speed with 10mm/s.When the central shaft of cowling panel arrives the peripheral part of processed substrate, the termination axle side of the processed substrate of middle mind-set of cowling panel is moved with the speed of 10mm/s.By three this repeatedly shuttle-scanning motions, carry out the dried of solvent altogether with 60 seconds, form the resist film of thickness 300nm.
In this form of implementation, different with first kind of form of implementation, flowing of air-flow is always downward, still, makes solvent seasoning by making cowling panel and processed substrate relative motion equably on the whole surface of substrate.
By making the central shaft biasing of cowling panel central shaft and processed substrate, can prevent singular point, improve the uniformity of thickness.In addition, make amount of bias change the uniformity that can further improve thickness in time.In addition, processed substrate also is rotated, can improves drying efficiency.
In liquid film drying means according to this form of implementation, make the cowling panel side shifting, but processed substrate-side is moved, cowling panel and processed substrate both are moved.In addition, the revolution of cowling panel, distance also are not limited to 300rpm, 20mm, can suitably set according to employed soup.Simultaneously, according to circumstances, also can not change amount of bias, amount of bias is immobilized.Manufacture method as liquid film, except that the scanning rubbing method in this form of implementation, also can adopt from central division to periphery (perhaps opposite) with the drip spiral rubbing method of soup of spiral helicine mode, also can adopt the manufacture method of other liquid film in addition.
In addition, the invention is not restricted to above-mentioned form of implementation.For example, as long as without prejudice to purport of the present invention, in liquid film itself can not thrown scope outside the substrate, the revolution of cowling panel can be in the scope of 500～4000rpm, and the distance of substrate and cowling panel can be in the scope of 5～30mm.
In addition, the present invention can carry out all distortion and be implemented in the scope that does not exceed its purport.
The effect of invention
According to the described the present invention of above explanation, by making cowling panel high-speed rotary on processed substrate Turn to, produce flowing of uniform air-flow at substrate, can carry out equably drying, can be rapid Make uniformly and film.
The simple declaration of accompanying drawing
Fig. 1 explanation is according to the formation method of the liquid film of first kind of form of implementation.
Fig. 2 represents the simple structure according to the liquid film drying device of first kind of form of implementation.
Fig. 3 is used to illustrate the drying means that adopts liquid film drying device shown in Figure 2.
Fig. 4 is used to illustrate the drying means that adopts liquid film drying device shown in Figure 2.
Fig. 5 is used to illustrate the drying means that adopts liquid film drying device shown in Figure 2.
Fig. 6 represents the simple structure according to the liquid film drying device of second kind of form of implementation.
Fig. 7 is used to illustrate the drying means that adopts liquid film drying device shown in Figure 6.
Fig. 8 represents the simple structure according to the liquid film drying device of the third form of implementation.
Fig. 9 illustrates existing problem in the existing drying under reduced pressure method.
Figure 10 is used to illustrate the drying means that adopts liquid film drying device shown in Figure 8.
Figure 11 represents the simple structure according to the variation of the liquid film drying device of the third form of implementation.
Figure 12 is used to illustrate the drying means according to the 4th kind of form of implementation.
Claims (12)
1, the liquid film drying means is characterized by, and comprises following operation:
Make cowling panel not contacting the distance that is formed at the liquid film that contains solute on the processed substrate near the operation above should processed substrate with more than one through hole,
Make the rotation of aforementioned cowling panel, make the operation of generation air-flow between the lower surface of this processed substrate top and this cowling panel,
Make liquid film contact the solvent of removing in the aforementioned liquid film, on aforementioned processed substrate, form the operation of the immobilon-p that constitutes by aforementioned solute with aforementioned air-flow.
2, liquid film drying means as claimed in claim 1, wherein,
Utilize the pressure differential that produces between aforementioned processed substrate that the rotation of aforementioned cowling panel causes and the aforementioned cowling panel lower surface, between aforementioned processed substrate and aforementioned cowling panel lower surface, import air-flow.
3, liquid film drying means as claimed in claim 1 is characterized by, and the direction of the air-flow that produces between the lower surface of aforementioned processed substrate top and aforementioned cowling panel is changed in time.
4, liquid film drying means as claimed in claim 3 is characterized by,
The difference of the pressure at pressure between aforementioned processed substrate and the aforementioned cowling panel lower surface and aforementioned cowling panel upper surface place is changed,
The airflow direction that produces between the top of aforementioned processed substrate and the aforementioned cowling panel lower surface is changed in time.
5, liquid film drying means as claimed in claim 1 is characterized by, and makes the central shaft of aforementioned cowling panel and the center-biased of aforementioned processed substrate.
6, liquid film drying means as claimed in claim 5 is characterized by, and aforesaid amount of bias is changed in time.
7, liquid film drying means as claimed in claim 5 is characterized by, and makes aforementioned processed substrate to the direction rotation opposite with the direction of rotation of aforementioned cowling panel.
8, the drying means of liquid film is characterized by and comprises following operation:
Make cowling panel not contacting the distance that is formed at the liquid film that contains solute on the processed substrate near the operation directly over this processed substrate,
With between aforementioned cowling panel and the aforementioned processed substrate and remain on the operation of decompression state on every side,
Make the rotation of aforementioned cowling panel, above the aforementioned processed substrate and produce the operation of air-flow between the lower surface of this cowling panel,
Make aforementioned liquid film contact the solvent of removing in the liquid film, on aforementioned processed substrate, form the operation of the immobilon-p that constitutes by aforementioned solute with aforementioned air-flow.
9, liquid film drying device is characterized in that possessing and has with lower member:
With processed substrate subtend cowling panel configuration, that have more than one through hole that forms the liquid film that contains solvent on the surface,
Make the rotary driving part of this cowling panel rotation,
With the air flow control panel of the peristome side subtend configuration of the through hole of the aforementioned cowling panel of the reverse side of aforementioned processed substrate,
Make the above-below direction drive division of the relative variation of distance of the distance of aforementioned cowling panel and aforementioned processed substrate and aforementioned cowling panel and aforementioned air flow control panel.
10, liquid film drying device is characterized in that possessing with lower member:
With the cowling panel with an above through hole of the processed substrate subtend configuration that forms the liquid film that contains solvent on the surface,
Make the rotary driving part of this cowling panel rotation,
Outer gas stream generator to aforementioned through hole supply air flow.
11, as claim 9 or 10 described liquid film drying devices, it is characterized in that further having:
Aforementioned processed substrate and cowling panel are contained in decompression chamber in it,
Be connected with aforementioned decompression chamber, to the vacuum pump of this chamber interior exhaust.
12, as claim 9 or 10 described liquid film drying devices, it is characterized by,
On aforementioned cowling panel, have a plurality of through holes,
Each through hole is with when rotated along with the time disposes in much at one the ratio mode by the arbitrary portion on the processed substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000296089A JP2002110513A (en) | 2000-09-28 | 2000-09-28 | Liquid film drying method and device thereof |
| JP296089/2000 | 2000-09-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1347136A true CN1347136A (en) | 2002-05-01 |
| CN1201375C CN1201375C (en) | 2005-05-11 |
Family
ID=18778415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 01140672 Expired - Fee Related CN1201375C (en) | 2000-09-28 | 2001-09-20 | Liquid state film drying method and device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2002110513A (en) |
| CN (1) | CN1201375C (en) |
| TW (1) | TW516084B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105177528A (en) * | 2015-07-10 | 2015-12-23 | 京东方科技集团股份有限公司 | Vacuum decompression device |
| CN107081231A (en) * | 2017-05-26 | 2017-08-22 | 浦江之音科技有限公司 | A kind of Multi-functional paint spraying equipment |
| CN109786587A (en) * | 2019-03-22 | 2019-05-21 | 纳晶科技股份有限公司 | A kind of film production device and technique |
| CN111540846A (en) * | 2019-05-08 | 2020-08-14 | 广东聚华印刷显示技术有限公司 | Reduced pressure drying device and reduced pressure drying method |
| CN114963742A (en) * | 2021-06-29 | 2022-08-30 | 南昌工学院 | Air uniform heating equipment for heating based on lacquer |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3973517B2 (en) * | 2002-08-30 | 2007-09-12 | シーケーディ株式会社 | Liquid film forming method or liquid film forming apparatus |
| JP5954266B2 (en) * | 2013-06-27 | 2016-07-20 | 東京エレクトロン株式会社 | Coating film forming device |
| JP5929852B2 (en) * | 2013-07-29 | 2016-06-08 | 東京エレクトロン株式会社 | Coating film forming apparatus, coating film forming method, and storage medium |
-
2000
- 2000-09-28 JP JP2000296089A patent/JP2002110513A/en active Pending
-
2001
- 2001-09-14 TW TW90122870A patent/TW516084B/en active
- 2001-09-20 CN CN 01140672 patent/CN1201375C/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105177528A (en) * | 2015-07-10 | 2015-12-23 | 京东方科技集团股份有限公司 | Vacuum decompression device |
| CN107081231A (en) * | 2017-05-26 | 2017-08-22 | 浦江之音科技有限公司 | A kind of Multi-functional paint spraying equipment |
| CN109786587A (en) * | 2019-03-22 | 2019-05-21 | 纳晶科技股份有限公司 | A kind of film production device and technique |
| CN111540846A (en) * | 2019-05-08 | 2020-08-14 | 广东聚华印刷显示技术有限公司 | Reduced pressure drying device and reduced pressure drying method |
| CN114963742A (en) * | 2021-06-29 | 2022-08-30 | 南昌工学院 | Air uniform heating equipment for heating based on lacquer |
Also Published As
| Publication number | Publication date |
|---|---|
| TW516084B (en) | 2003-01-01 |
| JP2002110513A (en) | 2002-04-12 |
| CN1201375C (en) | 2005-05-11 |
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