CN1333442C - 半导体工艺用的具有远程第二阳极的电镀系统 - Google Patents
半导体工艺用的具有远程第二阳极的电镀系统 Download PDFInfo
- Publication number
- CN1333442C CN1333442C CNB018167659A CN01816765A CN1333442C CN 1333442 C CN1333442 C CN 1333442C CN B018167659 A CNB018167659 A CN B018167659A CN 01816765 A CN01816765 A CN 01816765A CN 1333442 C CN1333442 C CN 1333442C
- Authority
- CN
- China
- Prior art keywords
- electroplating
- copper
- cavity
- electroplating solution
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/678,503 | 2000-10-02 | ||
US09/678,503 US6413390B1 (en) | 2000-10-02 | 2000-10-02 | Plating system with remote secondary anode for semiconductor manufacturing |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1529903A CN1529903A (zh) | 2004-09-15 |
CN1333442C true CN1333442C (zh) | 2007-08-22 |
Family
ID=24723054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018167659A Expired - Fee Related CN1333442C (zh) | 2000-10-02 | 2001-06-04 | 半导体工艺用的具有远程第二阳极的电镀系统 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6413390B1 (zh) |
EP (1) | EP1323186B1 (zh) |
JP (1) | JP2004510888A (zh) |
KR (1) | KR100747132B1 (zh) |
CN (1) | CN1333442C (zh) |
AU (1) | AU2001275274A1 (zh) |
DE (1) | DE60140305D1 (zh) |
TW (1) | TW525245B (zh) |
WO (1) | WO2002029875A2 (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6649034B1 (en) * | 2001-06-27 | 2003-11-18 | Advanced Micro Devices, Inc. | Electro-chemical metal alloying for semiconductor manufacturing |
JP4014827B2 (ja) * | 2001-07-25 | 2007-11-28 | シャープ株式会社 | メッキ処理装置 |
US7090751B2 (en) * | 2001-08-31 | 2006-08-15 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
JP2005163080A (ja) * | 2003-12-01 | 2005-06-23 | Toshiba Corp | めっき装置及びめっき方法 |
DE102005014748B4 (de) * | 2005-03-31 | 2007-02-08 | Advanced Micro Devices, Inc., Sunnyvale | Technik zum elektrochemischen Abscheiden einer Legierung mit chemischer Ordnung |
CN102492971B (zh) * | 2011-12-28 | 2014-09-17 | 无锡科硅电子技术有限公司 | 用于半导体基片表面进行电镀的装置 |
CN102560587B (zh) * | 2012-02-08 | 2015-03-18 | 南通富士通微电子股份有限公司 | 电镀装置 |
CN103422150A (zh) * | 2012-05-22 | 2013-12-04 | 泰州宏瑞新材料有限责任公司 | 用于电镀的重金属离子浓度调节槽及电镀装置 |
JP5692268B2 (ja) * | 2013-03-25 | 2015-04-01 | トヨタ自動車株式会社 | 金属被膜の成膜装置および成膜方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0079032A1 (de) * | 1981-11-06 | 1983-05-18 | Bayerische Motoren Werke Aktiengesellschaft, Patentabteilung AJ-3 | Vorrichtung zum galvanischen Beschichten eines metallischen Werkstücks |
EP0398735A2 (en) * | 1989-05-19 | 1990-11-22 | Sun Industrial Coatings Private Limited | Plating system |
JPH04362199A (ja) * | 1991-06-06 | 1992-12-15 | Nec Corp | 電気めっき装置 |
US5723028A (en) * | 1990-08-01 | 1998-03-03 | Poris; Jaime | Electrodeposition apparatus with virtual anode |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04284691A (ja) * | 1991-03-13 | 1992-10-09 | Arumetsukusu:Kk | プリント配線板の電気めっき方法 |
JPH05339800A (ja) * | 1992-06-09 | 1993-12-21 | Nec Corp | 可溶性アノードと不溶性アノードを持つ噴流めっき装置 |
TW405158B (en) * | 1997-09-17 | 2000-09-11 | Ebara Corp | Plating apparatus for semiconductor wafer processing |
CN1168854C (zh) * | 1997-09-30 | 2004-09-29 | 塞米图尔公司 | 用于电镀半导体晶片的系统、装置和方法 |
US6024856A (en) * | 1997-10-10 | 2000-02-15 | Enthone-Omi, Inc. | Copper metallization of silicon wafers using insoluble anodes |
JP3187011B2 (ja) * | 1998-08-31 | 2001-07-11 | 日本電気株式会社 | 半導体装置の製造方法 |
US6197182B1 (en) * | 1999-07-07 | 2001-03-06 | Technic Inc. | Apparatus and method for plating wafers, substrates and other articles |
-
2000
- 2000-10-02 US US09/678,503 patent/US6413390B1/en not_active Expired - Fee Related
-
2001
- 2001-06-04 EP EP01941966A patent/EP1323186B1/en not_active Expired - Lifetime
- 2001-06-04 JP JP2002533357A patent/JP2004510888A/ja active Pending
- 2001-06-04 CN CNB018167659A patent/CN1333442C/zh not_active Expired - Fee Related
- 2001-06-04 DE DE60140305T patent/DE60140305D1/de not_active Expired - Lifetime
- 2001-06-04 WO PCT/US2001/018229 patent/WO2002029875A2/en active Application Filing
- 2001-06-04 AU AU2001275274A patent/AU2001275274A1/en not_active Abandoned
- 2001-06-04 KR KR1020037004726A patent/KR100747132B1/ko not_active IP Right Cessation
- 2001-10-02 TW TW090124242A patent/TW525245B/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0079032A1 (de) * | 1981-11-06 | 1983-05-18 | Bayerische Motoren Werke Aktiengesellschaft, Patentabteilung AJ-3 | Vorrichtung zum galvanischen Beschichten eines metallischen Werkstücks |
EP0398735A2 (en) * | 1989-05-19 | 1990-11-22 | Sun Industrial Coatings Private Limited | Plating system |
US5723028A (en) * | 1990-08-01 | 1998-03-03 | Poris; Jaime | Electrodeposition apparatus with virtual anode |
JPH04362199A (ja) * | 1991-06-06 | 1992-12-15 | Nec Corp | 電気めっき装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2002029875A2 (en) | 2002-04-11 |
DE60140305D1 (de) | 2009-12-10 |
KR100747132B1 (ko) | 2007-08-09 |
JP2004510888A (ja) | 2004-04-08 |
EP1323186B1 (en) | 2009-10-28 |
EP1323186A2 (en) | 2003-07-02 |
CN1529903A (zh) | 2004-09-15 |
TW525245B (en) | 2003-03-21 |
KR20040007399A (ko) | 2004-01-24 |
AU2001275274A1 (en) | 2002-04-15 |
US6413390B1 (en) | 2002-07-02 |
WO2002029875A3 (en) | 2002-08-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: GLOBALFOUNDRIES Free format text: FORMER OWNER: ADVANCED MICRO DEVICES INC. Effective date: 20100705 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: CALIFORNIA, THE UNITED STATES TO: CAYMAN ISLANDS, BRITISH |
|
TR01 | Transfer of patent right |
Effective date of registration: 20100705 Address after: Grand Cayman, Cayman Islands Patentee after: Globalfoundries Semiconductor Inc. Address before: American California Patentee before: Advanced Micro Devices Inc. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070822 Termination date: 20160604 |