CN1288979A - Technology process and equiment for depositing permalloy film electrically - Google Patents
Technology process and equiment for depositing permalloy film electrically Download PDFInfo
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- CN1288979A CN1288979A CN 00125288 CN00125288A CN1288979A CN 1288979 A CN1288979 A CN 1288979A CN 00125288 CN00125288 CN 00125288 CN 00125288 A CN00125288 A CN 00125288A CN 1288979 A CN1288979 A CN 1288979A
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Abstract
The present invention relates to an electrodeposition process of permalloy film and its equipment. The temp. of electrodeposition solution is controlled in the range of 25-35 deg.C, the electrodepasition solution is stirred by utilizing its self-body kinetic energy and by means of stirring machine, and the positive and negative output ends of power supply are directly over-connected to the anode and cathode of solution cell. Said invention possesses the advantages of saving energy, good product quality and convenient and simple operation, can be used for producing high-quality permalloy film.
Description
The present invention relates to a kind of galvanic deposit permalloy film technology and facilities and equipments thereof, belong to electrochemical electro-deposition techniques field.
Permalloy refers to weight ratio=17～23 of the Fe and the Ni of component: 83～77, especially refer to the iron-nickel alloy of the weight ratio of the Fe and the Ni of component=20: 80.The permalloy film industrial application is extensive: work has protection, anticorrosive or the structural membrane of decoration character or the functional membrane that work has electromagnetic property.For a long time, the technician generally adopts electrodeposition technology to prepare permalloy film.Though background technology can preparation quality still can permalloy film, find out that from desired working conditions of background technology and needed facilities and equipments background technology has following shortcoming.The needed facilities and equipments of background technology are mainly by the temperature controlled water bath case, liquid bath, agitator and power supply are formed, the temperature controlled water bath case is moisture, cushion block, temperature sensor, the water temperature setting device, water temperature indicator, the electric heating temperature controlled water bath case of electricradiator and switch, liquid bath is to contain the groove lid, anode, the container of negative electrode and electric depositing solution, agitator is to contain motor, machine governor, the rotor agitator of rotor and switch, power supply is to contain positive output end, negative output terminal, varistor, the direct supply of current indicator and switch, fill with electric depositing solution in the liquid bath, groove covers anode is installed, the rotating shaft of negative electrode and rotor, anode, negative electrode and rotor are immersed in the electric depositing solution, fill with water in the temperature controlled water bath case, liquid bath is placed in the water that is immersed on the cushion block in the temperature controlled water bath case, temperature sensor is close to the outer wall of liquid bath, the positive output end of power supply is through varistor, current indicator is connected with anode, the negative output terminal of power supply is connected with negative electrode, the temperature controlled water bath case, agitator and power supply are connected with the electric main net through switch separately.When implementing electrodeposition technology, pure Ni plate and be deposited thing and be suspended on anode and negative electrode respectively.The working temperature that the electric depositing solution that background technology adopts requires is generally higher, (sees and electroplates handbook (first volume), the 2nd edition between 50～70 ℃, 1998, Beijing: National Defense Industry Press publishes, chief editor: Zhang Yuncheng etc., PP568～570), for making solution constant temperature, the temperature controlled water bath case often gets works, and power consumption is many, adds that moisture evaporation is fast in the solution, strength of solution changes thereupon, causes the same a collection of finished product component difference of preparation successively; The rotor stirred solution of agitator is no matter rotor with the rotation of what rotating speed, always that rotor is difficult to solution stirring is even, directly has influence on the quality of finished product; Power supply is powered to liquid bath through varistor, regulating rheostat, change the electric current that flows into liquid bath, purport makes galvanic deposit carry out under the condition of optimum value in current density (electric current/be deposited the surface-area of thing), when being deposited shape of thing (especially abnormity) and the frequent change of size, the precise current value is difficult for determining, optimum current density is difficult to obtain, add all factors, irregular as solution stirring, the fluctuation of solution resistance, voltage of supply, galvanic deposit current potential etc. causes actual current density to fluctuate near the optimum current density value, causes the difference of finished product component.
An object of the present invention is to release a kind of galvanic deposit permalloy film technology that does not have the background technology shortcoming, the working temperature that the electric depositing solution of this process using requires is lower, between 25～35 ℃.
Another object of the present invention is to release a kind of equipment of implementing the described technology of last purpose.
Fig. 1 is the structural representation that the present invention relates to equipment, and 1 is the temperature controlled water bath case among the figure, the 11st, and water, the 12nd, cushion block, the 2nd, liquid bath, the 21st, groove lid, the 22nd, negative electrode, the 23rd, anode, the 24th, electric depositing solution, the 3rd, agitator, the 31st, liquid-inlet pipe, the 32nd, drain pipe, the 33rd, nozzle, the 4th, power supply.This equipment is combined by known device, for for simplicity, and the parts that not shown insider is familiar with.The elliptical parts are in respect of the temperature sensor that temperature controlled water bath case 1 comprises, water temperature setting device, water temperature indicator, electricradiator and switch; Flow setting device, flow indicator, constant flow pump and switch that agitator 3 comprises; Voltage setting device, voltage indicator and switch that power supply 4 comprises.
The objective of the invention is to show accompanying drawings by what realize by the following technical solutions.
A kind of galvanic deposit permalloy film technology is implemented in following equipment, it is characterized in that step:
The first step is put and is decided processing condition, and it is fixed that the flow of the water temperature of temperature controlled water bath case 1, agitator 3 and the voltage of power supply 4 are put arbitrarily in the scope of 25～35 ℃, 5000～15000 milliliters/hour and 1.3～1.6 volts respectively;
The second step installing electrodes, pure Ni plate be deposited thing, promptly electrical conductor or the surperficial isolator that is coated with conductive layer hang on anode 23 and negative electrode 22 respectively;
The 3rd step preparation electric depositing solution 24, every liter of electric depositing solution 24 contains Ni
2+, Fe
2+, H
3BO
3, NaCl and soluble saccharin be respectively 10～15 grams, 0.1～0.4 gram, 20～30 grams, 20～30 grams and 0.6～0.9 gram, regulates pH value to 1.5～3.5 of this solution with hydrochloric acid, and this solution is filled with liquid bath 2;
The 4th step was implemented galvanic deposit, temperature controlled water bath case 1 powers on, and the temperature for the treatment of water 11 rises to puts when deciding water temperature, and agitator 3 and power supply 4 power on, the permalloy film uniform deposition is in the surface that is deposited thing that hangs on negative electrode 22, film deposition rate be 400～2500 dusts/minute;
The 5th step finished product, when the thickness of waiting to go on foot described film met the demands, temperature controlled water bath case 1, agitator 3 and power supply 4 removed electricity, take off from negative electrode 22 and are deposited thing, obtain finished product, the Fe of finished product component and the weight ratio of Ni=17～23: 83～77.
Galvanic deposit permalloy film technology according to above-mentioned is characterized in that, water temperature, flow and voltage are put respectively due to 30 ℃, 14000 milliliters/hour and 1.5 volts; Being deposited thing is copper sheet or copper facing sheet glass; Every liter of electric depositing solution contains NiSO
46H
2O, NiCl
26H
2O, FeSO
47H
2O, H
3BO
3, NaCl and soluble saccharin be respectively 14.7 grams, 35.3 grams, 1.2 grams, 25 grams, 25 grams and 0.75 gram, with the pH value to 3.0 that hydrochloric acid is regulated this solution, film deposition rate be 1800 dusts/minute, the Fe of finished product component and the weight ratio of Ni=20: 80.
A kind of equipment of implementing above-mentioned galvanic deposit permalloy film technology, by temperature controlled water bath case 1, liquid bath 2, agitator 3 and power supply 4 are formed, temperature controlled water bath case 1 is moisture 11, cushion block 12, temperature sensor, the water temperature setting device, water temperature indicator, the electric heating temperature controlled water bath case of electricradiator and switch, liquid bath 2 is to contain groove lid 21, negative electrode 22, the container of anode 23 and electric depositing solution 24, agitator 3 is to contain liquid-inlet pipe 31, drain pipe 32, nozzle 33, the flow setting device, flow indicator, the fluid stirrer of constant flow pump and switch, power supply 4 is to contain positive output end, negative output terminal, the voltage setting device, the D.C. regulated power supply of voltage indicator and switch, electric depositing solution 24 is arranged in the liquid bath 2, on the groove lid 21 negative electrode 22 and anode 23 are installed, negative electrode 22 and anode 23 are immersed in the electric depositing solution 24, water 11 is arranged in the temperature controlled water bath case 1, liquid bath 2 is placed on the cushion block 12 and is immersed in the water 11, temperature sensor is close to the outer wall of liquid bath 2, temperature controlled water bath case 1, agitator 3 and power supply 4 are connected with the electric main net by switch separately, it is characterized in that, on the groove lid 21 liquid-inlet pipe 31 is installed also, drain pipe 32 and nozzle 33, liquid-inlet pipe 31, drain pipe 32 and nozzle 33 are immersed in the electric depositing solution 24, the positive output end of power supply 4 is connected the water temperature of temperature controlled water bath case 1 with anode 23 respectively with negative output terminal with negative electrode 22, the putting of the voltage of the flow of agitator 3 and power supply 4 decided scope and is respectively 25～35 ℃, 5000～15000 milliliters/hour and 1.3～1.6 volts.
Compare with background technology, the present invention has following advantage:
1. energy-conservation.The working temperature that the electric depositing solution 24 that the present invention adopts requires is lower, between 25～35 ℃.Put when deciding water temperature when room temperature is higher than, the electricradiator in the temperature controlled water bath case 1 is not worked, not power consumption, and the homo(io)thermism of electric depositing solution 24 is in room temperature; Put when deciding water temperature when room temperature is lower than,,, do not work for a long time and get final product the power consumptive province so the electricradiator in the temperature controlled water bath case 1 only needs short period of time work because both are more or less the same.
2. solution stirring is even, quality of finished product good.The patent No. that the present invention adopts the inventor to invent is that the liquid agitation device of ZL002162.8 is as agitator 3, constant flow pump sucks the part electric depositing solution 24 in the liquid bath 2 from liquid-inlet pipe 31, through constant flow pump, drain pipe 32, discharge from nozzle 33, the diameter of nozzle 33 is more much smaller than the diameter of liquid-inlet pipe 31, therefore it is much bigger that liquid discharging current speed ratio sucks flow velocity, discharge the big liquid energy height of flow velocity, the electric depositing solution 24 that is enough to evoke in the whole liquid bath 2 circulates, electric depositing solution 24 is stirred fully and homogeneous perfect, guarantee that electrodeposition technology is by the uniform high-quality permalloy film of the surface deposition thickness of hypostasis.
3. voltage stabilizing power supply, easy and simple to handle.The present invention adopts D.C. regulated power supply to liquid bath 2 power supplies, and the output voltage of power supply can be put fixed, puts regularly and need not estimate the surface-area that is deposited thing, and is easy and simple to handle.
The present invention is particularly suitable for the laboratory of R﹠D institution and factory and is used for the different shape (especially abnormity) and the big or small permalloy film of small serial production high quality and good reproducibility.
Claims (3)
1. a galvanic deposit permalloy film technology is implemented in the described equipment of claim 3, it is characterized in that step:
The first step is put and is decided processing condition, and it is fixed that the flow of the water temperature of temperature controlled water bath case 1, agitator 3 and the voltage of power supply 4 are put arbitrarily in the scope of 25～35 ℃, 5000～15000 milliliters/hour and 1.3～1.6 volts respectively;
The second step installing electrodes, pure Ni plate be deposited thing, promptly electrical conductor or the surperficial isolator that is coated with conductive layer hang on anode 23 and negative electrode 22 respectively;
The 3rd step preparation electric depositing solution 24, every liter of electric depositing solution 24 contains Ni
2+, Fe
2+, H
3BO
3, NaCl and soluble saccharin be respectively 10～15 grams, 0.1～0.4 gram, 20～30 grams, 20～30 grams and 0.6～0.9 gram, regulates pH value to 1.5～3.5 of this solution with hydrochloric acid, and this solution is filled with liquid bath 2;
The 4th step was implemented galvanic deposit, temperature controlled water bath case 1 powers on, and the temperature for the treatment of water 11 rises to puts when deciding water temperature, and agitator 3 and power supply 4 power on, the permalloy film uniform deposition is in the surface that is deposited thing that hangs on negative electrode 22, film deposition rate be 400～2500 dusts/minute;
The 5th step finished product, when the thickness of waiting to go on foot described film met the demands, temperature controlled water bath case 1, agitator 3 and power supply 4 removed electricity, take off from negative electrode 22 and are deposited thing, obtain finished product, the Fe of finished product component and the weight ratio of Ni=17～23: 83～77.
2. galvanic deposit permalloy film technology according to claim 1 is characterized in that, water temperature, flow and voltage are put respectively due to 30 ℃, 14000 milliliters/hour and 1.5 volts; Being deposited thing is copper sheet or copper facing sheet glass; Every liter of electric depositing solution contains NiSO
46H
2O, NiCl
26H
2O, FeSO
47H
2O, H
3BO
3, NaCl and soluble saccharin be respectively 14.7 grams, 35.3 grams, 1.2 grams, 25 grams, 25 grams and 0.75 gram, the pH value to 3.0 of regulating this solution with hydrochloric acid; Film deposition rate be 1800 dusts/minute, the Fe of finished product component and the weight ratio of Ni=20: 80.
3. equipment of implementing claim 1 or 2 described galvanic deposit permalloy film technologies, by temperature controlled water bath case 1, liquid bath 2, agitator 3 and power supply 4 are formed, temperature controlled water bath case 1 is moisture 11, cushion block 12, temperature sensor, the water temperature setting device, water temperature indicator, the electric heating temperature controlled water bath case of electricradiator and switch, liquid bath 2 is to contain groove lid 21, negative electrode 22, the container of anode 23 and electric depositing solution 24, agitator 3 is to contain liquid-inlet pipe 31, drain pipe 32, nozzle 33, the flow setting device, flow indicator, the fluid stirrer of constant flow pump and switch, power supply 4 is to contain positive output end, negative output terminal, the voltage setting device, the D.C. regulated power supply of voltage indicator and switch, electric depositing solution 24 is arranged in the liquid bath 2, on the groove lid 21 negative electrode 22 and anode 23 are installed, negative electrode 22 and anode 23 are immersed in the electric depositing solution 24, water 11 is arranged in the temperature controlled water bath case 1, liquid bath 2 is placed on the cushion block 12 and is immersed in the water 11, temperature sensor is close to the outer wall of liquid bath 2, temperature controlled water bath case 1, agitator 3 and power supply 4 are connected with the electric main net by switch separately, it is characterized in that, on the groove lid 21 liquid-inlet pipe 31 is installed also, drain pipe 32 and nozzle 33, liquid-inlet pipe 31, drain pipe 32 and nozzle 33 are immersed in the electric depositing solution 24, the positive output end of power supply 4 is connected the water temperature of temperature controlled water bath case 1 with anode 23 respectively with negative output terminal with negative electrode 22, the putting of the voltage of the flow of agitator 3 and power supply 4 decided scope and is respectively 25～35 ℃, 5000～15000 milliliters/hour and 1.3～1.6 volts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00125288 CN1117178C (en) | 2000-09-20 | 2000-09-20 | Technology process and equiment for depositing permalloy film electrically |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00125288 CN1117178C (en) | 2000-09-20 | 2000-09-20 | Technology process and equiment for depositing permalloy film electrically |
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| Publication Number | Publication Date |
|---|---|
| CN1288979A true CN1288979A (en) | 2001-03-28 |
| CN1117178C CN1117178C (en) | 2003-08-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 00125288 Expired - Fee Related CN1117178C (en) | 2000-09-20 | 2000-09-20 | Technology process and equiment for depositing permalloy film electrically |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1894442B (en) * | 2003-10-22 | 2012-01-04 | 内克斯系统公司 | Method and apparatus for fluid processing a workpiece |
| CN103243356A (en) * | 2012-10-11 | 2013-08-14 | 湖南理工学院 | Preparation method of iron-nickel-cobalt-molybdenum alloy foil by electrodeposition |
| CN111155167A (en) * | 2020-01-13 | 2020-05-15 | 中国原子能科学研究院 | Electroplating device |
| CN112323131A (en) * | 2020-11-03 | 2021-02-05 | 重庆圣盈达科技开发有限公司 | Method for removing bubbles on surface of electroplated workpiece |
-
2000
- 2000-09-20 CN CN 00125288 patent/CN1117178C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1894442B (en) * | 2003-10-22 | 2012-01-04 | 内克斯系统公司 | Method and apparatus for fluid processing a workpiece |
| CN103243356A (en) * | 2012-10-11 | 2013-08-14 | 湖南理工学院 | Preparation method of iron-nickel-cobalt-molybdenum alloy foil by electrodeposition |
| CN111155167A (en) * | 2020-01-13 | 2020-05-15 | 中国原子能科学研究院 | Electroplating device |
| CN112323131A (en) * | 2020-11-03 | 2021-02-05 | 重庆圣盈达科技开发有限公司 | Method for removing bubbles on surface of electroplated workpiece |
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| Publication number | Publication date |
|---|---|
| CN1117178C (en) | 2003-08-06 |
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