CN1117178C - Technology process and equipment for depositing permalloy film electrically - Google Patents

Technology process and equipment for depositing permalloy film electrically Download PDF

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CN1117178C
CN1117178C CN 00125288 CN00125288A CN1117178C CN 1117178 C CN1117178 C CN 1117178C CN 00125288 CN00125288 CN 00125288 CN 00125288 A CN00125288 A CN 00125288A CN 1117178 C CN1117178 C CN 1117178C
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temperature
water bath
set
stirrer
grams
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CN1288979A (en )
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宫峰飞
凯木尔
杨燮龙
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华东师范大学
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一种电沉积坡莫合金薄膜工艺及其实施设备,属电化学的电沉积技术领域,控温水浴箱1把电沉积溶液24的温度控制在25~35℃,搅拌器3利用输运电沉积溶液24的自身动能进行溶液搅拌,电源4的正、负输出端直接跨接在液槽2的阳极23和阴极22,有节能、成品质量好和操作简便等优点,特别适于科研单位的实验室和工厂用来小批量生产高质量的坡莫合金薄膜。 An electrical deposition process and the permalloy film apparatus embodiment, the electric field of electrochemical deposition techniques belongs, the temperature of a temperature controlled water bath 24 of the electrodeposition solution controlled at 25 ~ 35 ℃, transport electrodeposition using a stirrer 3 24 itself is the kinetic energy of the solution stirred solution, positive power supply 4, the negative output terminal 23 is connected directly across the anode 2 and the cathode tank 22, energy-saving, good product quality and easy operation, particularly suitable for experimental research institutes and a chamber for small batch plant quality permalloy films.

Description

一种电沉积坡莫合金薄膜工艺及其实施设备 An electrical deposition process and the permalloy films embodiment apparatus

本发明涉及一种电沉积坡莫合金薄膜工艺及其实施设备,属电化学的电沉积技术领域。 The present invention relates to an electrodeposition process and the permalloy film apparatus embodiment, belongs to the field of electrochemical electrodeposition.

坡莫合金指组分的Fe与Ni的重量比=17~23∶83~77,尤其指组分的Fe与Ni的重量比=20∶80的铁镍合金。 Permalloy component refers to the weight ratio of Fe and Ni = 17 ~ eighty-three past eleven p.m. to 77, especially of 20:80 by weight of iron-nickel alloy components Ni and Fe ratio =. 坡莫合金薄膜工业应用广泛:作有保护、抗腐蚀或装饰性质的结构性膜或作有电磁学性质的功能性膜。 Wide permalloy film industrial applications: for protective, decorative or structural properties of corrosion-resistant film or functional film for electromagnetic properties. 长期以来,技术人员普遍采用电沉积工艺制备坡莫合金薄膜。 For a long time, commonly used in the art process for preparing electrical permalloy thin film deposition. 背景技术虽能制备质量尚可的坡莫合金薄膜,但从背景技术所要求的工作条件和所需要的实施设备看出背景技术有以下缺点。 BACKGROUND Although acceptable quality Permalloy films can be prepared, but the background art and the required operating conditions required seen BACKGROUND embodiment apparatus has the following disadvantages. 背景技术所需要的实施设备主要由控温水浴箱、液槽、搅拌器和电源组成,控温水浴箱是含水、垫块、温度传感器、水温置定器、水温指示器、电热器和开关的电热控温水浴箱,液槽是含槽盖、阳极、阴极和电沉积溶液的容器,搅拌器是含电机、电机调速器、转子和开关的转子搅拌器,电源是含正输出端、负输出端、变阻器、电流指示器和开关的直流电源,液槽内注满电沉积溶液,槽盖上安装有阳极、阴极和转子的转轴,阳极、阴极和转子浸泡在电沉积溶液内,控温水浴箱内注满水,液槽安放在垫块上浸在控温水浴箱内的水中,温度传感器紧贴液槽的外壁,电源的正输出端经变阻器、电流指示器与阳极连接,电源的负输出端与阴极连接,控温水浴箱、搅拌器和电源经各自的开关与交流市电网连接。 BACKGROUND desired embodiment of apparatus mainly controlled temperature water bath tank, tank, a stirrer and a power composition, temperature controlled water bath is aqueous, pads, a temperature sensor, the water temperature is set constant, a temperature indicator, an electric switch and heating temperature water bath, a tank containing a tank cover, the container anode, cathode and electrodeposition solution containing a stirrer motor, motor speed, the rotor and the switch rotor with a stirrer, a power supply having a positive output terminal and negative DC power output terminal of the varistor, the current indicator and a switch, the electrodeposition tank filled with the solution tank cover is attached to the shaft of the anode, cathode and a rotor, an anode, a cathode and a rotor immersed in the electrodeposition solution, temperature control inside a water bath filled with water, placed in a tank pad dipped in water controlled temperature water bath tank, through the positive output terminal of the varistor close to the tank outer wall temperature sensor, power supply, connected to the anode current indicator, the power source negative output terminal connected to the cathode, water bath temperature control, a stirrer and a power source via respective switching AC utility grid connection. 实施电沉积工艺时,纯Ni板和被沉积物分别悬挂在阳极和阴极。 When an electrodeposition process embodiment, pure Ni plate and the sediments suspended in the anode and cathode, respectively. 背景技术采用的电沉积溶液要求的工作温度一般偏高,介于50~70℃(见电镀手册(上册),第2版,1998年,北京:国防工业出版社出版,主编:张允诚等,PP568~570),为使溶液恒温,控温水浴箱得经常工作,耗电多,加上溶液中水分蒸发快,溶液浓度随之改变,导致先后制备的同一批成品组分不同;搅拌器的旋转转子搅拌溶液,不论旋转转子用什么转速旋转,旋转转子总难以把溶液搅拌均匀,直接影响到成品的质量;电源经变阻器向液槽供电,调节变阻器,改变流入液槽的电流,旨使电沉积在电流密度(电流/被沉积物的表面积)为最佳值的条件下进行,在被沉积物的形状(尤其是异形)和大小经常改变时,精确的电流值不易确定,最佳电流密度不易得到,加上种种因素,如溶液搅拌不匀,溶液电阻、电源电压、电沉积电位等的波动造成实际电流密度在最佳 It requires electrodeposition solution employed BACKGROUND high working temperature, between 50 ~ 70 ℃ (see Electroplating Handbook (Volume), 2nd edition, 1998, Beijing: National Defense Industry Press, Editor: Zhangyun Cheng like, PP568 to 570) as the solution temperature, temperature controlled water bath too often work, power, combined with a solution of fast evaporation, concentration of the solution will change, resulting in different components of the same batch has finished preparation; the rotation of the agitator the solution was stirred rotor, regardless of what the rotational speed of the rotor rotation, the total rotation of the rotor is difficult to stir the solution, directly affects the quality of the finished product; power supply through the varistor to the tank, regulating rheostat, the change in the current flowing into the tank, the purpose electrodeposited carried out at a current density (current surface area / the deposit) an optimum value of the conditions, when the changes in the shape and size of the deposits often (especially shaped), is difficult to determine an accurate current value, the optimum current density is not easy obtained, together with a variety of factors, such as uneven mixing solution, the solution resistance fluctuation, supply voltage, electrodeposition potentials resulted in the effective current densities in the preferred 流密度值附近波动,导致成品组分的差异。 Flow density value fluctuates around, leading to differences in the finished component.

本发明的一个目的是推出一种没有背景技术缺点的电沉积坡莫合金薄膜工艺,该工艺采用的电沉积溶液要求的工作温度较低,介于25~35℃。 An object of the present invention is to introduce a no slope electrodeposition disadvantages background art permalloy thin film process, the process uses low electrodeposition solution required operating temperature, between 25 ~ 35 ℃.

本发明的另一个目的是推出一种实施上个目的所述的工艺的设备。 Another object of the present invention is the introduction of a process apparatus according to the object of the embodiment.

图1是本发明涉及设备的结构示意图,图中1是控温水浴箱,11是水,12是垫块,2是液槽,21是槽盖,22是阴极,23是阳极,24是电沉积溶液,3是搅拌器,31是进液管,32是出液管,33是喷嘴,4是电源。 FIG 1 is a schematic diagram of the present invention relates to apparatus, FIG. 1 is a temperature controlled water bath, water 11, a spacer 12, a tank 2, a slot cover 21, a cathode 22, an anode 23, 24 is electrically deposition solution, 3 is a stirrer, a liquid inlet pipe 31, outlet pipe 32, a nozzle 33, a power supply 4. 该设备由公知的装置组合而成,为简便起见,图中未示出业内人士熟悉的部件。 The combination of a known device formed by means, for simplicity, not shown in FIG industry familiar member. 省略的部件计有:控温水浴箱1包含的温度传感器、水温置定器、水温指示器、电热器和开关;搅拌器3包含的流量置定器、流量指示器、恒流泵和开关;电源4包含的电压置定器、电压指示器和开关。 Parts omitted namely: a temperature sensor comprising a temperature controlled water bath, the temperature is set constant, a temperature indicator, an electric heater and a switch; a stirrer 3 comprising a flow rate is set constant, a flow indicator, a constant flow pump and a switch; 4 comprises a power supply voltage is set constant, a voltage indicator and a switch.

本发明的目的是通过采用以下技术方案实现的,现结合附图说明。 Object of the present invention is achieved by the following technical solution is now described in conjunction with the accompanying drawings.

一种电沉积坡莫合金薄膜工艺,其特征在于,步骤:第一步 置定工艺条件,控温水浴箱1的水温、搅拌器3的流量和电源4的电压分别在25~35℃、5000~15000毫升/小时和1.3~1.6伏的范围内任意置定;第二步 安装电极,把纯Ni板和被沉积物,即导电体或表面镀有导电层的绝缘体分别悬挂于阳极23和阴极22;第三步 配制电沉积溶液24,每升电沉积溶液24含Ni2+、Fe2+、H3BO3、NaCl和糖精钠分别为10~15克、0.1~0.4克、20~30克、20~30克和0.6~0.9克,用盐酸调节该溶液的pH值至1.5~3.5,把该溶液注满液槽2;第四步 实施电沉积,控温水浴箱1上电,待水11的温度升至置定水温时,搅拌器3和电源4上电,坡莫合金薄膜均匀沉积于悬挂于阴极22的被沉积物的表面,薄膜沉积速率为4.0*10-6~2.5*10-5厘米/分;第五步 成品,待上步所述薄膜的厚度满足要求时,控温水浴箱1、搅拌器3和 An electrical deposited permalloy thin film process, characterized in that, the step of: the first step is set constant voltage conditions, temperature controlled water bath temperature of 1, a stirrer, and the flow rate of power supply 3, respectively 4 25 ~ 35 ℃, 5000 to 15,000 ml / hr and within the range of 1.3 to 1.6 volts at any given set; the second step with electrodes and the plates were pure Ni deposits, i.e., electrically conductive or plated with a conductive layer of insulator 23 are suspended from the anode and cathode 22; a third electrodepositing solution preparation step 24, per liter of the electrodeposition solution containing 24 Ni2 +, Fe2 +, H3BO3, NaCl and sodium saccharin were 10 to 15 grams, of 0.1 to 0.4 g, 20 to 30 grams, and 20 to 30 grams 0.6 to 0.9 grams, the pH of the solution is adjusted with hydrochloric acid to 1.5 to 3.5, the solution was filled tank 2; a fourth embodiment electrodeposition step, an electrical box on a controlled temperature water bath, the temperature of the water 11 to be raised to set when the predetermined temperature, the stirrer 3 and 4 on the power supply, permalloy thin film uniformly deposited on the surface of the suspended sediment cathode 22, a film deposition rate of 4.0 * 10-6 to 2.5 * 10-5 cm / min; when finished fifth step, the step to be the thickness of the film to meet the requirements, a temperature controlled water bath, with a stirrer 3, and 电源4去电,从阴极22上取下被沉积物,得到成品,成品组分的Fe与Ni的重量比=17~23∶83~77。 4 to supply power, is to remove deposits from the cathode 22, to give the finished product by weight Fe, and the composition of the finished Ni ratio = 17 ~ 77 ~ eighty-three past eleven p.m..

根据上述的电沉积坡莫合金薄膜工艺,其特征在于,水温、流量和电压分别置定于30℃、14000毫升/小时和1.5伏;被沉积物为铜片或镀铜玻璃片;每升电沉积溶液含NiSO4·6H2O、NiCl2·6H2O、FeSO4·7H2O、H3BO3、NaCl和糖精钠分别为14.7克、35.3克、1.2克、25克、25克和0.75克,用盐酸调节该溶液的pH值至3.0,薄膜沉积速率为1.8*10-5厘米/分,成品组分的Fe与Ni的重量比=20∶80。 According to the electrodeposition permalloy thin film process, characterized in that the temperature, flow rate and voltage are set at opposing 30 ℃, 14000 ml / hr and 1.5 V; electrical liter; a copper or copper-plated glass sediments deposition solution containing NiSO4 · 6H2O, NiCl2 · 6H2O, FeSO4 · 7H2O, H3BO3, NaCl and sodium saccharin were 14.7 grams, 35.3 grams, 1.2 grams, 25 grams, 25 grams and 0.75 grams, adjusting pH of the solution with hydrochloric acid to 3.0, a film deposition rate of 1.8 * 10-5 cm / min, the weight of the finished component of Fe with Ni ratio = 20:80.

一种实施上述的电沉积坡莫合金薄膜工艺的设备,由控温水浴箱1、液槽2、搅拌器3和电源4组成,控温水浴箱1是含水11、垫块12、温度传感器、水温置定器、水温指示器、电热器和开关的电热控温水浴箱,液槽2是含槽盖21、阴极22、阳极23和电沉积溶液24的容器,搅拌器3是含进液管31、出液管32、喷嘴33、流量置定器、流量指示器、恒流泵和开关的液体搅拌器,电源4是含正输出端、负输出端、电压置定器、电压指示器和开关的直流稳压电源,液槽2内有电沉积溶液24,槽盖21上安装有阴极22和阳极23,阴极22和阳极23浸泡在电沉积溶液24中,控温水浴箱1内有水11,液槽2安放在垫块12上和浸在水11中,温度传感器紧贴液槽2的外壁,控温水浴箱1、搅拌器3和电源4通过各自的开关与交流市电网连接,其特征在于,槽盖21上还安装有进液管31、出液管32和喷嘴33,喷嘴33 An apparatus permalloy thin film process of electrodeposition the slope embodiment, a controlled temperature water bath tank 1, tank 2, agitator 4 and power composition 3, a temperature controlled water bath is an aqueous 11, spacer 12, a temperature sensor, Tuner set temperature, temperature indicator, heater, and an electric switch controlled temperature water bath tank, tank 2 containing the slot cover 21, a cathode 22, anode 23 and the container 24 of the electrodeposition solution, the stirrer containing liquid inlet pipe 3 31, liquid outlet pipe 32, a nozzle 33, the flow rate is set constant, a flow indicator, a stirrer the liquid pumps, and switches the constant current, the power supply having a positive output terminal 4, the negative output terminal voltage is set constant, a voltage indicator, and DC power supply switch, the electrodeposition solution tank 2 has 24, the slot cover 21 is attached to cathode 22 and anode 23, cathode 22 and anode 23 immersed in the electrodeposition solution 24, water temperature controlled water bath 1 11, tank 2 is placed on the pad 12 and immersed in the water 11, the temperature sensor against the outer wall 2 of the tank, a temperature controlled water bath, with a stirrer 3, and 4 are connected via respective power switch and AC power, wherein the slot cover 21 is also mounted on the liquid inlet pipe 31, outlet tube 32 and the nozzle 33, the nozzle 33 直径比进液管31的直径小得多,进液管31、出液管32和喷嘴33浸泡在电沉积溶液24中,电源4的正输出端和负输出端分别与阳极23和阴极22连接,控温水浴箱1是水温置定范围为25~35℃的电热控温水浴箱,搅拌器3是流量置定范围为5000~15000毫升/小时的液体搅拌器和电源4是电压置定范围1.3~1.6伏的直流稳压电源。 Much smaller diameter than the diameter of the inlet tube 31, inlet tube 31, outlet tube 32 and the nozzle 33 immersed in the electrodeposition solution 24, the positive output and a negative output terminal of the power supply 4 are connected to the anode 23 and cathode 22 , a temperature controlled water bath temperature is set to a predetermined range of 25 ~ 35 ℃ heating temperature of the water bath, a stirrer 3 is set to set the flow rate ranges from 5000 to 15000 ml / h and a stirrer a liquid supply voltage is set to a predetermined range 4 1.3 to 1.6 volt DC power supply.

与背景技术 And Background

相比,本发明有以下优点:1.节能。 Compared to the present invention has the following advantages: an energy-saving. 本发明采用的电沉积溶液24要求的工作温度较低,介于25~35℃。 The present invention employs a low electrodeposition solution 24 required operating temperature, between 25 ~ 35 ℃. 当室温高于置定水温时,控温水浴箱1内的电热器不工作,不耗电,电沉积溶液24的温度恒定于室温;当室温低于置定水温时,由于两者相差不多,所以控温水浴箱1内的电热器只需短时间工作,长时间不工作即可,耗电省。 When the temperature is higher than the given set temperature, the heater temperature water bath 1 does not work, no power, the temperature of the electrodeposition solution 24 at a constant temperature; when the temperature is lower than the given set temperature, almost the same since both, so temperature water bath heater in a short period of time just to work for a long time not to work, low power consumption.

2.溶液搅拌均匀,成品质量好。 2. Stir the solution, good product quality. 本发明采用本发明人发明的专利号为ZL00216262.8的液体搅拌装置作为搅拌器3,恒流泵把液槽2内的部分电沉积溶液24从进液管31吸入,经恒流泵、出液管32,从喷嘴33排出,喷嘴33的直径比进液管31的直径小得多,因此液体排出流速比吸入流速大得多,排出流速大的液体能量高,足以激起整个液槽2内的电沉积溶液24循环流动,使电沉积溶液24搅拌充分和均质完善,确保电沉积工艺在被沉物的表面沉积厚薄均匀的优质坡莫合金薄膜。 The present invention employs Patent No. present invention ZL00216262.8 invention is a liquid mixing device 3, the constant flow pump 24 from the suction inlet tube 31 as a part of a stirrer the electrodeposition solution in the tank 2, the constant flow pump, the liquid pipe 32, is discharged from the nozzle 33, the diameter of the nozzle 33 is much smaller than the diameter of the inlet tube 31, so that the liquid discharge flow rate larger than the suction flow, the discharge flow rate of the liquid high energy large enough to arouse the entire tank 2 electrically depositing solution 24 circulating in the electrodeposition solution was stirred for 24 full and perfect homogenization, the electrodeposition process to ensure a uniform permalloy film thickness to be deposited on the surface sediments high slope.

3.稳压供电,操作简便。 3. regulated power supply, easy to operate. 本发明采用直流稳压电源向液槽2供电,电源的输出电压可置定,置定时不需估算被沉积物的表面积,操作简便。 The present invention uses DC power supply to supply tank 2, the output voltage of the power supply can be set, set the timing does not need to estimate the surface area of ​​deposits, easy to operate.

本发明特别适于科研单位的实验室和工厂用来小批量生产高质量和重复性好的各种形状(尤其是异形)和大小的坡莫合金薄膜。 The present invention is particularly suitable for research institutes and laboratories and factories for small batch production of high quality, reproducible shapes (especially shaped) slope and size permalloy films.

Claims (3)

  1. 1.一种电沉积坡莫合金薄膜工艺,其特征在于,步骤:第一步 置定工艺条件,控温水浴箱(1)的水温、搅拌器(3)的流量和电源(4)的电压分别在25~35℃、5000~15000毫升/小时和1.3~1.6伏的范围内任意置定;第二步 安装电极,把纯Ni板和被沉积物,即导电体或表面镀有导电层的绝缘体分别悬挂于阳极(23)和阴极(22);第三步 配制电沉积溶液(24),每升电沉积溶液(24)含Ni2+、Fe2+、H3BO3、NaCl和糖精钠分别为10~15克、0.1~0.4克、20~30克、20~30克和0.6~0.9克,用盐酸调节该溶液的pH值至1.5~3.5,把该溶液注满液槽(2);第四步 实施电沉积,控温水浴箱(1)上电,待水(11)的温度升至置定水温时,搅拌器(3)和电源(4)上电,坡莫合金薄膜均匀沉积于悬挂于阴极(22)的被沉积物的表面,薄膜沉积速率为4.0*10-6~2.5*10-5厘米/分;第五步 成品,待上步所述薄膜的厚度满足要求时,控 An electrodeposition permalloy thin film process, characterized in that, the step of: the first step is set constant voltage conditions, temperature controlled water bath (1) water temperature, a stirrer (3) flow and a power supply (4) It was arbitrarily set to set in the range of 25 ~ 35 ℃, 5000 ~ 15000 ml / hr and 1.3 to 1.6 volts; a second step of mounting an electrode, and the plates were pure Ni deposits, i.e., electrically conductive or plated with a conductive layer They were suspended the anode insulator (23) and a cathode (22); a third step the electrodeposition solution formulation (24), per liter of the electrodeposition solution (24) containing Ni2 +, Fe2 +, H3BO3, NaCl and sodium saccharin were 10 to 15 grams , 0.1 to 0.4 g, 20 to 30 grams, 20 to 30 grams, and 0.6 to 0.9 grams, with hydrochloric acid to adjust pH of the solution to 1.5 to 3.5, the solution was filled tank (2); a fourth embodiment of an electrical step deposition, the temperature of the electrical temperature water bath (1), until the water (11) is raised to a given set temperature, the stirrer (3) and a power supply (4) is powered on, permalloy thin film is deposited uniformly suspended in the cathode ( deposit surface 22), the film deposition rate of 4.0 * 10-6 to 2.5 * 10-5 cm / min; when finished fifth step, the step to be to meet the requirements of the film thickness, control 水浴箱(1)、搅拌器(3)和电源(4)去电,从阴极(22)上取下被沉积物,得到成品,成品组分的Fe与Ni的重量比=17~23∶83~77。 Water bath (1), a stirrer (3) and a power supply (4) Outgoing, deposits are removed from the cathode (22), to give the finished product by weight Fe, and the composition of the finished Ni ratio = 17 ~ eighty-three past eleven p.m. ~ 77.
  2. 2.根据权利要求1所述的电沉积坡莫合金薄膜工艺,其特征在于,水温、流量和电压分别置定于30℃、14000毫升/小时和1.5伏;被沉积物为铜片或镀铜玻璃片;每升电沉积溶液含NiSO4·6H2O、NiCl2·6H2O、FeSO4·7H2O、H3BO3、NaCl和糖精钠分别为14.7克、35.3克、1.2克、25克、25克和0.75克,用盐酸调节该溶液的pH值至3.0;薄膜沉积速率为1.8*10-5厘米/分,成品组分的Fe与Ni的重量比=20∶80。 The slope of the electrodeposition of a permalloy thin-film process as claimed in claim, characterized in that the temperature, flow rate and voltage are set at opposing 30 ℃, 14000 ml / hr and 1.5 V; a copper or copper sediments glass; per liter of the electrodeposition solution containing NiSO4 · 6H2O, NiCl2 · 6H2O, FeSO4 · 7H2O, H3BO3, NaCl and sodium saccharin were 14.7 grams, 35.3 grams, 1.2 grams, 25 grams, 25 grams and 0.75 grams, adjusted with hydrochloric acid the pH of the solution to 3.0; deposition rate of 1.8 * 10-5 cm / min, the weight of the finished component of Fe with Ni ratio = 20:80.
  3. 3.一种实施权利要求1或2所述的电沉积坡莫合金薄膜工艺的设备,由控温水浴箱(1)、液槽(2)、搅拌器(3)和电源(4)组成,控温水浴箱(1)是含水(11)、垫块(12)、温度传感器、水温置定器、水温指示器、电热器和开关的电热控温水浴箱,液槽(2)是含槽盖(21)、阴极(22)、阳极(23)和电沉积溶液(24)的容器,搅拌器(3)是含进液管(31)、出液管(32)、喷嘴(33)、流量置定器、流量指示器、恒流泵和开关的液体搅拌器,电源(4)是含正输出端、负输出端、电压置定器、电压指示器和开关的直流稳压电源,液槽(2)内有电沉积溶液(24),槽盖(21)上安装有阴极(22)和阳极(23),阴极(22)和阳极(23)浸泡在电沉积溶液(24)中,控温水浴箱(1)内有水(11),液槽(2)安放在垫块(12)上和浸在水(11)中,温度传感器紧贴液槽(2)的外壁,控温水浴箱(1)、搅拌器(3)和电源(4)通过各自的开关与交流市电网连接, An apparatus as claimed in embodiment permalloy thin film process or the slope of electrodeposition in claim 1 or 2, a controlled temperature water bath tank (1), tank (2), a stirrer (3) and a power supply (4), with temperature controlled water bath (1) is an aqueous (11), spacer (12), a temperature sensor, the water temperature is set constant, a temperature indicator, an electric heater and a water bath temperature controlled switches, tank (2) containing the groove a cover (21), a cathode (22), an anode container (23) and the electrodeposition solution (24), a stirrer (3) having a liquid inlet pipe (31), the liquid outlet pipe (32), a nozzle (33), set constant flow rate, a flow rate indicator, a stirrer the liquid pumps, and switches the constant current, the power supply (4) containing a positive output, the negative output terminal of the DC power supply voltage is set constant, a voltage indicator and switches, liquid groove electrodeposition solution (2) (24), the slot cover is attached to the cathode (22) and an anode (23) (21), a cathode (22) and an anode (23) immersed in the electrodeposition solution (24), water temperature controlled water bath (1) (11), tank (2) mounted on the spacer (12) and immersed in water, the outer wall (11), a temperature sensor close to the tank (2), the temperature water bath (1), a stirrer (3) and a power supply (4) through a respective switch connected to the AC utility grid, 特征在于,槽盖(21)上还安装有进液管(31)、出液管(32)和喷嘴(33),喷嘴(33)的直径比进液管(31)的直径小得多,进液管(31)、出液管(32)和喷嘴(33)浸泡在电沉积溶液(24)中,电源(4)的正输出端和负输出端分别与阳极(23)和阴极(22)连接,控温水浴箱(1)是水温置定范围为25~35℃的电热控温水浴箱,搅拌器(3)是流量置定范围为5000~15000毫升/小时的液体搅拌器和电源(4)是电压置定范围1.3~1.6伏的直流稳压电源。 Characterized in that the further cover mounting groove (21) with a liquid inlet pipe (31), the liquid outlet pipe (32) and the nozzle (33), the diameter of the nozzle (33) than the liquid inlet pipe (31) of smaller diameter, the positive output terminal and a negative output terminal of the liquid inlet pipe (31), the liquid outlet pipe (32) and the nozzle (33) immersed in the electrodeposition solution (24), the power supply (4), respectively, the anode (23) and a cathode (22 ) is connected, controlled temperature water bath tank (1) is set to a given temperature in the range of 25 ~ 35 ℃ glow temperature water bath, a stirrer (3) is set to set the flow rate ranges from 5000 to 15000 ml / h and a stirrer a liquid supply (4) is set to a given voltage range of 1.3 to 1.6 volt DC power supply.
CN 00125288 2000-09-20 2000-09-20 Technology process and equipment for depositing permalloy film electrically CN1117178C (en)

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