Summary of the invention
The object of the invention is to disclose a kind of fluorine-containing epoxy resin and derivative thereof.
Another object of the present invention is to disclose the preparation method of above-mentioned Resins, epoxy and derivative.
Fluorine-containing epoxy resin disclosed by the invention and derivative have definite molecular weight, and oxirane value is consistent with theoretical value; Solidifying agent such as this epoxy compounds and derivative thereof and acid anhydrides or organic amine have lower specific inductivity, dielectric loss and lower water-intake rate through the cured resin that curing reaction forms.Therefore, having important use in high-technology fields such as microelectronics Packaging is worth.
Fluorine-containing epoxy resin of the present invention has chemical structure as follows:
Preparation process of the present invention is undertaken by following chemical synthesis route
1) with the α that replaces, α, α-trifluoromethyl acetophenone obtain fluorine-containing substituent diphenol with phenol generation condensation reaction under the catalysis of Lewis acid and HCl;
2) resulting two phenolic compound and epoxy chloropropane are reacted fluorine-containing epoxy of generation and derivative thereof under base catalysis;
3) with fluorine-containing epoxy compounds and derivative thereof, solidifying agent, curing catalyst, thinner uniform mixing by a certain percentage;
4) said mixture is poured in the mould be heating and curing, condition of cure is: 80-150 ℃ solidified 1-2 hour, 150-250 ℃ after fixing 1-3 hour;
5) cured article is slowly cooled to room temperature, peel off and obtain uniform and smooth, the no bubble in surface, flawless cured resin.
The present invention's used Lewis acid in preparation process comprises: aluminum trichloride (anhydrous), Magnesium Chloride Anhydrous, Zinc Chloride Anhydrous etc.
The present invention's used solidifying agent in preparation process comprises organic amine curing agent and organic acid anhydride solidifying agent two classes.Organic amine curing agent comprises 4,4 '-diaminodiphenyl oxide (ODA), 4,4 '-diaminodiphenylmethane (DDM), 4,4 '-diaminodiphenylsulfone(DDS) (DDS), 4,4 '-two (2,2 '-bis trifluoromethyl-4-amido phenoxy group) benzene (6FAPB), 3,3 ', 5,5 '-tetramethyl--4, the mixture of 4 '-diaminodiphenylmethane (TMDA) and any ratio thereof.The organic acid anhydride solidifying agent comprises the mixture of 4-methyl hexahydrophthalic anhydride (HMPA), 4-methyl tetrahydro phthalic anhydride (MeTHPA), HHPA (HHPA), tetrahydrophthalic anhydride (THPA) and any ratio thereof.
The present invention's used curing catalyst in preparation process comprises: 2,4,6-three (dimethylamine methyl) phenol (DMP-30), 1, the mixture of 8-binary aza-bicyclo [5.4.0.] hendecene-7 (DBU), 2-ethyl-4-methylimidazole, glyoxal ethyline, trolamine, 1-cyanoethyl-2-ethyl-4-methylimidazole and any ratio thereof.
The present invention's used thinner in preparation process comprises: the mixture of phenyl glycidyl ether (PGE), cresylglycidylether (CGE), n-butyl glycidyl ether (BGE), diglycidylaniline (DGA), glycerol triglycidyl ether (GGE) and any ratio thereof.
Fluorine-containing epoxy resin disclosed by the invention and derivative thereof have good heat-resistant stability, mechanical property, low specific inductivity and dielectric loss and lower water-intake rate; These excellent comprehensive performances make it to have the potential significant application value in microelectronics Packaging, and typically used comprises that solids epoxy plastic cement, liquid epoxy are sealed the end filler of material, epoxy conductive silver slurry, heat conduction slurry, upside-down mounting welding core etc.
Embodiment
Following embodiment 1-5 is the preparation method of fluorine-containing epoxy compounds and derivative thereof; Embodiment 6-11 is the solidification process of fluorine-containing epoxy compounds and derivative thereof.
Example 11, two (4-the hydroxy phenyl)-1-phenyl-2,2 of 1-, the preparation of 2-Halothane: induction stirring is being housed, in the there-necked flask of prolong and import and export of nitrogen, is adding α, α, 50 parts of α-trifluoromethyl acetophenones, 5 parts of 300 parts of phenol and zinc chloride, reaction mixture is heated to 100 ℃, feeds HCl gas simultaneously, reacts 2-3 hour, obtain reddish-brown liquid, pressure reducing and steaming phenol, product gets white 1 with ethyl alcohol recrystallization, two (4-hydroxy phenyl)-1 phenyl-2,2 of 1-, 2-Halothane solid.
4,4 '-two (2,3-epoxypropyl phenyl)-and 1-phenyl-2,2, the preparation of 2-Halothane: with 40 part 1, two (4-the hydroxy phenyl)-1-(3-trifluoromethyl)-2 of 1-, 2,2-Halothane and 800 parts of epoxy chloropropane, 80 parts of 48%NaOH solution add in the there-necked flask, react three hours down at 65 ℃, product extracts with methyl iso-butyl ketone (MIBK), and washes with water.Organic phase boils off whole solvents, gets colourless 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3-trifluoromethyl)-2,2,2-Halothane thick liquid.
Example 21, two (4-the hydroxy phenyl)-1-(3-trifluoromethyl)-2 of 1-, 2, the preparation of 2-Halothane: induction stirring is being housed, in the there-necked flask of prolong and import and export of nitrogen, is adding 3-trifluoromethyl-α, α, 60 parts of α-trifluoromethyl acetophenones, 5 parts in 360 parts of phenol and aluminum chloride, reaction mixture is heated to 100 ℃, feed HCl gas simultaneously, reacted 2-3 hour, and obtained reddish-brown liquid, pressure reducing and steaming phenol, product gets white 1 with ethyl alcohol recrystallization, two (4-the hydroxy phenyl)-1-(3-trifluoromethyl)-2,2 of 1-, 2-Halothane solid.
4,4 '-two (2,3-epoxypropyl phenyl)-and 1-(3-trifluoromethyl)-2,2, the preparation of 2-Halothane: with 30 part 1, two (4-the hydroxy phenyl)-1-(3-trifluoromethyl)-2 of 1-, 2,2-Halothane and 600 parts of epoxy chloropropane, 60 parts of 48%NaOH solution add in the there-necked flask, react three hours down at 65 ℃, product extracts with methyl iso-butyl ketone (MIBK), and washes with water.Organic phase boils off whole solvents, gets colourless 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3-trifluoromethyl)-2,2,2-Halothane thick liquid.
Example 31,1 '-two (4-hydroxy phenyl)-1-(4-trifluoromethyl)-2,2, the preparation of 2-Halothane: induction stirring is being housed, in the there-necked flask of prolong and import and export of nitrogen, add 4-trifluoromethyl-α, α, 40 parts of α-trifluoromethyl acetophenones, 240 parts of phenol, 4 parts of zinc chloride, reaction mixture is heated to 100 ℃, feeds HCl gas simultaneously, reacts 3-4 hour, obtain reddish-brown liquid, pressure reducing and steaming phenol, product gets white 1 with ethyl alcohol recrystallization, two (4-the hydroxy phenyl)-1-(4-trifluoromethyl)-2 of 1-, 2,2-Halothane solid.
4,4 '-two (2,3-epoxypropyl phenyl)-and 1-(4-trifluoromethyl)-2,2,2-Halothane: with 40 part 1, two (4-the hydroxy phenyl)-1-(4-trifluoromethyl)-2 of 1-, 2,2-Halothane and 800 parts of epoxy chloropropane, 80 parts of 48%NaOH solution add in the there-necked flask, react three hours down at 65 ℃, product extracts with methyl iso-butyl ketone (MIBK), and washes with water.Organic phase boils off whole solvents and gets colourless 4,4 '-two (2,3-epoxypropyl phenyl)-1-(4-trifluoromethyl)-2,2,2-Halothane thick liquid.
Example 41, two (4-the hydroxy phenyl)-1-(4-fluorophenyl)-2,2 of 1-, the preparation of 2-Halothane: with 50 parts of 4-fluoro-α, α, α-trifluoromethyl acetophenone, 300 parts of phenol and 5 parts of magnesium chlorides add in the there-necked flask, reaction mixture is heated to 100 ℃, feeds HCl gas simultaneously, reacts 3-4 hour, obtain reddish-brown liquid, pressure reducing and steaming phenol, product gets white 1 with ethyl alcohol recrystallization, two (4-the hydroxy phenyl)-1-(4-fluorophenyl)-2 of 1-, 2,2-Halothane solid.
4,4 '-two (2,3-epoxypropyl phenyl)-and 1-(4-methyl fluoride phenyl)-2,2,2-Halothane: with 50 part 1, two (4-the hydroxy phenyl)-1-(4-trifluoromethyl)-2 of 1-, 2,2-Halothane and 800 parts of epoxy chloropropane, 100 parts of 48%NaOH solution add in the there-necked flask, react three hours down at 65 ℃, product extracts with methyl iso-butyl ketone (MIBK), and washes with water.Organic phase boils off whole solvents and gets colourless 4,4 '-two (2,3-epoxypropyl phenyl)-1-(4-trifluoromethyl)-2,2,2-Halothane thick liquid.
Example 51, two (4-the hydroxy phenyl)-1-(3,5-two trifluoromethyls)-2 of 1-, 2, the preparation of 2-Halothane: induction stirring is being housed, in the there-necked flask of prolong and import and export of nitrogen, is adding 3,5-bis trifluoromethyl-α, α, 60 parts of α-trifluoromethyl acetophenones, 360 parts of phenol, 3 parts of 2 parts in aluminum chloride and zinc chloride, reaction mixture is heated to 100 ℃, feeds HCl gas simultaneously, reacts 2-3 hour, obtain reddish-brown liquid, pressure reducing and steaming phenol, product gets white 1 with ethyl alcohol recrystallization, two (4-the hydroxy phenyl)-1-(3-trifluoromethyl)-2 of 1-, 2,2-Halothane solid.
4,4 '-two (2,3-epoxypropyl phenyl)-1-(3, the 5-bis trifluoromethyl phenyl)-2,2, the preparation of 2-Halothane: with 40 part 1, two (4-the hydroxy phenyl)-1-(3 of 1-, the 5-bis trifluoromethyl phenyl)-2,2,2-Halothane and 800 parts of epoxy chloropropane, 80 parts of 48%NaOH solution add in the there-necked flask, react three hours down at 65 ℃, product extracts with methyl iso-butyl ketone (MIBK), and washes with water.Organic phase boils off whole solvents, gets colourless 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3-trifluoromethyl)-2,2,2-Halothane thick liquid.4,4 '-diaminodiphenyl oxide (DDE), 4,4 '-diaminodiphenylsulfone(DDS) (DDS), 4-methyl hexahydrophthalic anhydride (HMPA), 4,4 '-two (2,2 '-bis trifluoromethyl-4-amido phenoxy group) benzene (6FAPB), 3,3 ', 5,5 '-tetramethyl--4,4 '-diaminodiphenylmethane (TMDA) etc.
Example 6 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-phenyl-2,2,100 parts of 2-Halothane Resins, epoxy, 4,25 parts of 4 '-diaminodiphenyl oxides (ODA), 2,4,0.5 part of 6-three (dimethylamine methyl) phenol, 10 parts of phenyl glycidyl ethers (PGE), be heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 150 ℃ solidified 1 hour, and 200 ℃ solidified 2 hours, 250 ℃ of after fixing 2 hours.Under the room temperature slowly the cooling, peel off obtain the surface uniform and smooth, whole clearing is even, no bubble, flawless cured resin disk.Recording its volume specific resistance is 1.89 * 10
15Ω cm, 25 ℃ of specific inductivity 3.23 when recording 1MHz, dielectric loss 0.0072 (Q shows method, down with).Water-intake rate is 0.56% (immersion recorded after 24 hours under the room temperature, down together)
Example 7 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3-trifluoromethyl)-2,2,100 parts of 2-Halothane, 4,25 parts of 4 '-diaminodiphenyl oxides (DDE), 2,4,0.5 part of 6-three (dimethylamine methyl) phenol, 12 parts of cresylglycidylethers (CGE), be heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 150 ℃ solidified 1 hour, and 210 ℃ solidified 2 hours, 250 ℃ of after fixing 2 hours.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 8.32 * 10
15Ω cm, 25 ℃ of specific inductivity 3.32 when recording 1MHz, dielectric loss 0.0057.Water-intake rate is 0.51%.
Example 8 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(4-trifluoromethyl)-2,2,80 parts of 2-Halothane, 4,20 parts of 4 '-diaminodiphenylsulfone(DDS)s (DDS), 1,0.3 part of 8-binary aza-bicyclo [5.4.0.] hendecene-7 (DBU), 15 parts of n-butyl glycidyl ethers (BGE) are heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 150 ℃ solidified 1 hour, and 220 ℃ solidified 2 hours, 240 ℃ of after fixing 1 hour.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 9.56 * 10
15Ω cm, 25 ℃ of specific inductivity 3.21 when recording 1MHz, dielectric loss 0.0047.Water-intake rate 0.45%
Example 9 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(4-fluorophenyl)-2,2, and 100 parts of 2-Halothane, 85 parts of 4-methyl hexahydrophthalic anhydrides (HMPA), 0.3 part of 1-cyanoethyl-2-ethyl-4-methylimidazole heats and stirs.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 80 ℃ solidified 1 hour, and 150 ℃ solidified 2 hours, 170 ℃ of after fixing 1 hour.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 9.63 * 10
16Ω cm, 25 ℃ of specific inductivity 3.10 when recording 1MHz, dielectric loss 0.0013.Water-intake rate 0.36%
Example 10 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3, the 5-bis trifluoromethyl phenyl)-2,2, the 2-Halothane is 100 parts, 4,25 parts of 4 '-two (2,2 '-bis trifluoromethyl-4-amido phenoxy group) benzene (6FAPB), 1,0.3 part of 8-binary aza-bicyclo [5.4.0.] hendecene-7 (DBU), be heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 150 ℃ solidified 1 hour, and 200 ℃ solidified 2 hours, 250 ℃ of after fixing 1 hour.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 1.93 * 10
15Ω cm, 25 ℃ of specific inductivity 3.30 when recording 1MHz, dielectric loss 0.0021.Water-intake rate 0.36%
Example 11 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3-trifluoromethyl)-2,2,100 parts of 2-Halothane, 3,3 ', 5,5 '-tetramethyl--4,25 parts of 4 '-diaminodiphenylmethane (TMDA), 0.3 part of 1-cyanoethyl-2-ethyl-4-methylimidazole, 10 parts of n-butyl glycidyl ethers (BGE) are heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 150 ℃ solidified 1 hour, and 200 ℃ solidified 2 hours, 250 ℃ of after fixing 1 hour.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 1.59 * 10
16Ω cm, 25 ℃ of specific inductivity 3.40 when recording 1MHz, dielectric loss 0.0024.Water-intake rate 0.38%
Example 12 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3, the 5-bis trifluoromethyl phenyl)-2,2, the 2-Halothane is 100 parts, 40 parts of 4-methyl hexahydrophthalic anhydrides (HMPA), 40 parts of 4-methyl tetrahydro phthalic anhydrides (MeTHPA), 2,4,0.2 part of 6-three (dimethylamine methyl) phenol,, 1,0.1 part of 8-binary aza-bicyclo [5.4.0.] hendecene-7 (DBU), 12 parts of cresylglycidylethers (CGE) are heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 100 ℃ solidified 1 hour, and 150 ℃ solidified 2 hours, 170 ℃ of after fixing 3 hours.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 1.87 * 10
15Ω cm, 25 ℃ of specific inductivity 3.34 when recording 1MHz, dielectric loss 0.0041.Water-intake rate 0.38%
Example 13 gets 4,4 '-two (2,3-epoxypropyl phenyl)-1-(3-trifluoromethyl)-2,2,100 parts of 2-Halothane, 30 parts of HHPAs (HHPA), 50 parts of tetrahydrophthalic anhydride (THPA), 1,0.1 part of 8-binary aza-bicyclo [5.4.0.] hendecene-7 (DBU), 0.2 part of 1-cyanoethyl-2-ethyl-4-methylimidazole, 5 parts of cresylglycidylethers (CGE) and 10 parts of n-butyl glycidyl ethers (BGE), be heated to fusion, stir into homogeneous phase solution, evenly mixed.It is watered cast from diameter 10cm, in the steel die of dark 5mm, 150 ℃ solidified 1 hour, and 200 ℃ solidified 2 hours, 220 ℃ of after fixing 1 hour.Slowly cooling under the room temperature is peeled off and is obtained uniform and smooth, the no bubble in surface, flawless cured resin disk.Recording its volume specific resistance is 1.49 * 10
16Ω cm, 25 ℃ of specific inductivity 3.20 when recording 1MHz, dielectric loss 0.0018.Water-intake rate 0.35%.