CN1241241C - Spraying nozzle for wet processing, wet processing apparatus and method - Google Patents

Spraying nozzle for wet processing, wet processing apparatus and method Download PDF

Info

Publication number
CN1241241C
CN1241241C CNB021418845A CN02141884A CN1241241C CN 1241241 C CN1241241 C CN 1241241C CN B021418845 A CNB021418845 A CN B021418845A CN 02141884 A CN02141884 A CN 02141884A CN 1241241 C CN1241241 C CN 1241241C
Authority
CN
China
Prior art keywords
aforementioned
nozzle
vibration
processed
treatment fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB021418845A
Other languages
Chinese (zh)
Other versions
CN1404107A (en
Inventor
三森健一
芳贺宣明
小野昭一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002000758A external-priority patent/JP2003200120A/en
Priority claimed from JP2002079775A external-priority patent/JP4063562B2/en
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Publication of CN1404107A publication Critical patent/CN1404107A/en
Application granted granted Critical
Publication of CN1241241C publication Critical patent/CN1241241C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture

Abstract

To prevent break of an ultrasonic transducer in a condition where an area having no treating liquid is developed in a treating region in the course of wet treatment operation. A wet treatment nozzle 1 is provided with; an inlet opening 21b for supplying a treating liquid 2 for wet treatment of an object W to be treated to a surface W1 to be treated of the object W; an outlet opening 22b for discharging the waste treating liquid 2 after wet treatment from the surface W1; the ultrasonic transducer 48 for imparting ultrasonic vibration to the treating liquid 2 on the surface W1; and a vibrating part 46 which is in contact with the ultrasonic transducer 48. The vibrating part 46 is disposed at least at the side of the object W with respect to the ultrasonic transducer 48. Thickness T of the vibrating part 46 at the side of the object W and a wavelength &lambda of the ultrasonic vibration at the vibrating part 46 establish a relation represented by a formula: T=(n&plusmn 0.1).&lambda /2 (wherein n is an integer of not less than 2).

Description

The wet processed nozzle
Technical field
The present invention relates to for example cleaning in manufacturing process such as semiconductor device, LCDs, peel off, development, etching, plating, in the wet processed technologies such as grinding, the wet type processing device that providing chemical liquid is used on object being treated.
Background technology
At semiconductor device, field of electronic devices such as LCDs, in its manufacture process, the technology that semiconductor substrate and glass substrate as object being treated are carried out clean is absolutely necessary.In cleaning, in order to remove various removing objects in the process for making, utilize ultra-pure water, electrolytic ionic water, Ozone Water, various cleaning fluids such as hydrogen water clean, and these cleaning fluids are fed on the substrate by the nozzle of cleaning device.
Yet, when nozzle is used in the general cleaning of using prior art, exist the very big problem of cleaning fluid use amount.When for example carrying out the cleaning of the square cover plate of 500mm, utilizing this cleaning fluid to clean and utilizing the residual quantity of the particle on the cover plate after the rinsing rinse water is carried out rinsing to reach 0.5/cm with cleaning fluids such as electrolytic ionic waters 2About cleannes the time, must use about 25～30 liters/minute cleaning fluid and rinsing cleaning fluid.
Therefore, compare with this existing form, as province's liquid type cleaning nozzle that can reduce the cleaning fluid use amount significantly, treatment fluid is being fed on the processed substrate, the wet processed of using when carrying out the wet processed of processed substrate is with in the nozzle, formation has the importing path that treatment fluid is imported the introducing port that an end uses, and have the drain passageway that the treatment fluid after using is discharged to the outlet of outside usefulness at one end, it is known being provided with to the inlet opening part of processed base openings and the wet processed nozzle of outlet opening portion on the other end separately of these importing paths and drain passageway.
In addition, a kind of wet type processing device is provided, as the wet type processing device that adopts this wet processed with nozzle, it is characterized by, it is equipped with aforementioned wet processed nozzle, and by making aforementioned wet processed relatively move, handle the nozzle that processed Zone Full of aforementioned processed substrate uses or the travel mechanism of processed substrate with nozzle and aforementioned processed substrate along the processed face of aforementioned processed substrate.
That is, during according to above-mentioned wet type processing device, treatment fluid is not contacted with part outside the part of providing chemical liquid, remove, realize economizing liquid type nozzle from processed substrate.In addition, by being equipped with the travel mechanism that wet processed nozzle and processed substrate is relatively moved along the processed face of processed substrate, can handle processed Zone Full of processed substrate.
And then, for this province liquid type nozzle, the structure when being suitable for spraying ultrasonic wave, known have a wet processed nozzle shown in Figure 16.This wet processed at one end has the ingress pipe 101 of the introducing port 101a that imports treatment fluid 100 usefulness with the nozzle setting, and at one end has a discharge pipe 102 that the treatment fluid after the wet processed 100 is discharged to the outlet 102a of outside usefulness, ingress pipe 101 interconnects with the other end separately of discharge pipe 102, form connecting portion 103 with processed substrate 90 subtends, on connecting portion 103, be provided as the peristome 101b of the opening of ingress pipe 101, and as the second peristome 102b of the opening of discharge pipe 102.In the space of above-mentioned connecting portion 103 and processed substrate 90, form the processing region 105 that carries out wet processed.In addition, the ultrasonic oscillator of ultrasonic vibration being given treatment fluid 100 usefulness in the processing region 105 is set on the above-mentioned connecting portion 103.
This ultrasonic oscillator is by oscillating plate 96, the side plate of holding up from the two ends of the interarea of oscillating plate 96 97, and the ultrasonic oscillator main body 108 that is arranged on the interarea of oscillating plate 96 constitutes.During the ultrasonic wave of the thickness of vibration about, be configured to about 3mm for 1MHz.
In addition, on the outlet 102a of discharge pipe 102, be connected with drawdown pump (omitting among the figure).
Treatment fluid 100 is from the introducing port 101a supply of ingress pipe 101, arrive the first peristome 101b, owing on the outlet 102a of discharge pipe 102, be connected with drawdown pump (omitting among the figure), so, suction pressure by the control drawdown pump, for the treatment fluid 100 that is supplied to ingress pipe 101, the pressure (also comprising the surface tension of treatment fluid 100 and processed surface tension of processed substrate 90) that can control the treatment fluid 100 that contacts with the atmosphere at first peristome, 101 places is poor with atmospheric pressure.
Promptly, the pass of pressure P w (also comprising the surface tension of treatment fluid and processed surface tension of substrate 90) Pa by making the treatment fluid 100 that contacts with the atmosphere of the first peristome 101b is Pw ≈ Pa, be supplied to treatment fluid 100 substrate 90, that contact with substrate 90 can not leak into the outside of handling through the first peristome 101b, be discharged in the discharge pipe 102 with nozzle.Therefore, this wet processed nozzle is compared with the nozzle that is not province's liquid type, can reduce the use amount of treatment fluid significantly.
In addition, in the nozzle of example shown in the figure, when cleaning processed substrate 90, under the state of providing chemical liquid 100, the ultrasonic vibration of sending from oscillating plate 96 of utilizing above-mentioned ultrasonic oscillator 108 to produce is added on the processing region 105, works with treatment fluid 100 and clean processed substrate 90.
At this moment, because propagate ultrasound waves, the temperature of oscillating plate 96 rises, and simultaneously, by the treatment fluid of being supplied it is cooled off, and the temperature of oscillating plate 96 rises and is approximately about 1 ℃.
But, for the nozzle of the above-mentioned province liquid type wet processed shown in the figure with the hyperacoustic type of irradiation in the nozzle, when reducing the amount of employed treatment fluid, bubble enters this wet processed with in the processing region 105 between nozzle and the processed substrate 90, so in this processing region, there is not treatment fluid in some part.In the part that this not processed liquid is filled, the ultrasonic wave that is shone is reflected from processed substrate 90, causes the temperature of oscillating plate 96 to rise by this ultrasonic wave that is reflected.Particularly, relatively thin at oscillating plate, when being the 3mm left and right sides, this heat transferred is to ultrasonic oscillator main body 108 sides, the coupling part of oscillating plate 96 and ultrasonic oscillator main body 108 is by transient heating simultaneously, its result makes ultrasonic oscillator main body 108 peel off from oscillating plate 96, or the rising of the temperature of ultrasonic oscillator main body 108, cause that action is bad, perhaps might make it damaged.
In addition, the actual service conditions of this wet type processing device may not be through fully research.Particularly, for each wet type processing device, the possibility that may not use is arranged under optimum condition thereby exist the terms and conditions that determines mistakenly when the two sides of processed substrate makes it to vibrate.
Summary of the invention
The present invention in view of the above problems, in the hope of reaching following purpose.
1. provide a kind of in the wet processed action,, also can prevent the wet processed nozzle of the destruction of ultrasonic oscillator even in processing region, produce under the situation in the zone that does not have treatment fluid.
2. provide a kind of in the wet processed action,, also can prevent the wet processed nozzle of the temperature rising at ultrasonic oscillator place even in processing region, produce under the situation in the zone that does not have treatment fluid.
3. a kind of moving wet processed nozzle qualitatively that can improve ultrasonic oscillator is provided.
4. a kind of wet type processing device with above-mentioned wet processed with nozzle is provided.
In addition, problem of the present invention is, in above-mentioned province liquid type wet processed, clearly the optimum condition when processed substrate two sides makes it to vibrate, can carry out the wet type processing device and the wet processed method of wet processed expeditiously.
The present invention solves above-mentioned problem in the following manner, it is wet processed nozzle of the present invention, have: will carry out treatment fluid that the wet processed of object being treated uses inlet opening part to processed supply of aforementioned object being treated, and with the outlet opening portion of the aforementioned processing liquid after the aforementioned wet processed from aforementioned processed discharge, be equipped with respect to the aforementioned processing liquid on aforementioned processed and give the ultrasonic oscillator that ultrasonic vibration is used, and the vibration section that connects this ultrasonic oscillator, aforementioned vibration section is arranged on the aforementioned at least object being treated side of aforementioned ultrasonic oscillator, and the gauge T of the aforementioned vibration section of this object being treated side is set to relation in the wavelength X of the aforementioned ultrasonic vibration of this vibration section
T=(n ± 0.1) λ/2 (wherein, n is the integer below 7 more than 4) particularly preferably are set to T=(5 ± 0.1) λ/2.
In addition, in the present invention, the aforementioned object being treated side near aforementioned vibration section can be provided with lining portion.
And, constitute aforementioned lining portion, make the surface of aforementioned object being treated side have anti-reactivity and/or thermal endurance to aforementioned processing liquid.
In the present invention, the gauge T ' of aforementioned lining portion and wavelength X in the aforementioned ultrasonic vibration at this lining portion place ' relation is set at any one in following.
T’≤λ’/20
T’＝(1±0.1)·λ’/2
In the present invention, the method on the both sides of the aforementioned object being treated side that is arranged on aforementioned ultrasonic oscillator and opposition side thereof can be adopted in aforementioned vibration section.
In addition, in order to solve above-mentioned problem, wet processed nozzle of the present invention, has treatment fluid that the wet processed object being treated is used inlet opening part to processed supply of aforementioned object being treated, and with the discharge liquor of the aforementioned processing liquid after the aforementioned wet processed outlet opening portion from aforementioned processed discharge, be equipped with and give the ultrasonic oscillator that ultrasonic vibration is used the aforementioned processing liquid on aforementioned processed, be located at the lining portion of aforementioned object being treated side in abutting connection with this ultrasonic oscillator, and be located at the vibration section of aforementioned lining portion opposition side in abutting connection with aforementioned ultrasonic oscillator, the gauge T ' of aforementioned lining portion and this lining portion locate the wavelength X of aforementioned ultrasonic vibration ' relation be set in following one.
T’≤λ’/20
T’＝(1±0.1)·λ’/2
In the present invention, constitute aforementioned lining portion, make the surface of aforementioned object being treated side have anti-reactivity and/or thermal endurance with respect to aforementioned processing liquid.
And then, in above-mentioned each invention, the cooling body of this vibration section of cooling can be set on aforementioned vibration section.
Wherein, the structure of aforementioned cooling body is, cooling fluid flows through the inboard that is positioned at aforementioned vibration section and/or the cooling water pipe in the outside.
In the present invention, aforementioned cooling fluid is preferably aforementioned processing liquid and/or aforementioned discharge liquor.
In order to solve above-mentioned problem, wet type processing device of the present invention has with the lower part: above-mentioned wet processed nozzle; Treatment fluid is imported the treatment fluid introducing mechanism of using between aforementioned inlet opening part and aforementioned object being treated processed; With treatment fluid from attracting to discharge the treatment fluid recovering mechanism of usefulness between aforementioned outlet opening portion and aforementioned object being treated processed; And by making aforementioned wet processed relatively move, handle the nozzle and the object being treated relative moving mechanism of processed whole regional usefulness of aforementioned object being treated along the processed face of object being treated with nozzle and aforementioned object being treated.
Wet processed nozzle of the present invention, possessing and handled thing to be carried out treatment fluid that wet processed uses inlet opening part to processed supply of aforementioned object being treated, the discharge liquor of the aforementioned processing liquid after the aforementioned wet processed is used the nozzle from the wet processed of the outlet opening portion of aforementioned processed discharge, be equipped with respect to the aforementioned processing liquid on aforementioned processed and give the ultrasonic oscillator that ultrasonic vibration is used, and in abutting connection with the vibration section of this ultrasonic oscillator, aforementioned vibration section is arranged on the aforementioned at least object being treated side of aforementioned ultrasonic oscillator, and the relation between aforementioned hyperacoustic wavelength X at the thickness T of the aforementioned vibration section of this object being treated side and place, aforementioned vibration section is set to
T=(1 ± 0.1) λ/2 (wherein, n is the integer more than 2)
Whereby, there is the zone that does not have treatment fluid even be involved in bubble in the processing region between vibration section and object being treated processed, set the thickness of big oscillating plate, the heat that reduction is transmitted to ultrasonic oscillator from the vibration section, the temperature that prevents ultrasonic oscillator rises the destruction that can prevent ultrasonic oscillator.
Here, so-called " thickness of vibration section " is meant, from the direction of ultrasonic oscillator to the handled thing conduct acoustic waves, in other words, from processed direction of ultrasonic oscillator sensing object being treated, just, processed be the occasion of substrates such as semiconductor and liquid crystal, along the thickness of its normal direction.
In addition, so-called " thickness of the vibration section of object being treated side " only is meant the thickness of processed side, even be located at the object being treated side opposition side of ultrasonic oscillator in the vibration section, does not also comprise the thickness with object being treated side opposition side.
In addition, so-called " hyperacoustic wavelength of vibration section ", it is value by the material decision of frequency of ultrasonic and vibration section, for example, when ultrasonic vibration is worked as frequency setting at 1HMz, when the vibration section was stainless steel (SUS316L), its half-wavelength (λ/2) was about about 3mm when normal temperature is 20 ℃ under the service condition of standard.
In the present invention, thickness T is set thicker than of the prior art.When for example in the vibration section being stainless steel (SUS316L), standard thickness in the prior art is about 3mm, but when frequency of ultrasonic is 1MHz, is set at more than the twice of half-wavelength, for example 6mm.Thereby, can reduce the heat that transmits to ultrasonic oscillator.
In addition since in the integral multiple with half-wavelength (λ/2) is the prescribed limit at center setting thickness, thereby can improve the transmitance that ultrasonic vibration sees through to processed liquid from ultrasonic oscillator.
In addition, what is called does not have the zone of treatment fluid, be meant in processing region, and in the zone of above-mentioned thickness direction treatment fluid deficiency, the state that hyperacoustic major part is reflected at processed substrate surface place.
In the present invention, by thickness T being set at three times to seven times in the half-wavelength of the aforementioned ultrasonic vibration at place, this vibration section, specific is five times, make can be in the vibration section propagate ultrasound waves expeditiously, simultaneously, set thickness T bigger, further reduce the heat that transmits to ultrasonic oscillator from the vibration section, further prevent the rising of the temperature of ultrasonic oscillator, further prevent the destruction of ultrasonic oscillator.
When the setting range of thickness T surpasses in aforementioned hyperacoustic half-wavelength at this place, vibration section seven times, because because of the variation of temperature resonance point changes easily, so the vibration attenuation when the ultrasonic oscillator output ultrasonic wave vibrates can not be vibrated, so be worthless.In addition, in the time of in three times the scope that thickness T is set in hyperacoustic half-wavelength of locating less than this vibration section, under the processing region between vibration section and object being treated processed exists because of the situation that is involved in the zone that bubble do not have treatment fluid, the heat that transmits to ultrasonic oscillator from the vibration section reduces little, the temperature of ultrasonic oscillator rises, and is worthless therefore.
By thickness T being set at five times of half-wavelength, can optimum ground stably driving ultrasonic oscillator and be reduced in the possibility of the destruction of ultrasonic oscillator when occurring in the processing region not having wet processed liquid part.
In addition, in the present invention, by aforementioned object being treated side lining portion is set near aforementioned vibration section, the not direct contact vibration portion of treatment fluid, so surface, aforementioned vibration section is by wet processed, the deterioration that the vibration section is caused by treatment fluid and ultrasonic vibration can prolong life-span of vibration section, and then, can prevent that the composition of vibration section is mixed into pollution object being treated surface in the treatment fluid.
By making aforementioned lining portion have inertia and have heat resistance with respect to aforementioned processing liquid on the surface of aforementioned object being treated side, and, not only the vibration section does not directly contact with the processing of activity at high temperature with active treatment fluid, and lining portion surface is not carried out wet processed yet, so further reduce the deterioration that processed liquid in vibration section and ultrasonic wave cause, prolong the life-span of vibration section more, and then the composition that can prevent vibration section and treated side lining portion is mixed in the treatment fluid of activity and high temperature, in order to avoid pollute the object being treated surface.
Here,,, peel off, develop applicable to washing as wet processed, Wet-type etching, plating grinds etc.At this moment, as being supplied near the vibration section treatment fluid when the clean, adopt ultra-pure water, electrolytic ionic water, Ozone Water, hydrogen water etc. when lift-off processing, adopt rare NaOH, rare inorganic bases such as KOH, and amine is stripper, when development treatment, employing is rare NaOH, inorganic bases such as rare KOH, and hydrogenation trimethylammonium dilution etc., when wet etching, adopt hydrofluoric acid etch liquid etc., when plating is handled, adopt plating Cu usefulness, plating Ag uses, plating Au when milled processed, adopts SiO with plating bath etc. 2Slurry, Al 2O 3Slurry, diamond slurry etc.
Correspondingly, lining portion can be with quartzy, formations such as polyfurolresin such as PFA, and according to adopt ground treatment fluid, the vibration section can be that the stainless steel (SUS316L) that chromated oxide constitutes passivating film constitutes by the outermost surface as lining portion.
In addition, the vibration section can be by being equipped with the stainless steel of the hybrid films of aluminium oxide and chromated oxide to make as lining portion on the surface, and when treatment fluid was Ozone Water, described vibration section can be by constituting as titanium that is equipped with the electrobrightening surface of lining portion etc.In addition, as lining portion, liquid can adopt resin PEEK (polyether-ether-ketone) such as high purity aluminium oxide, sapphire, the ethylene fluoride of tetrafluoroethene, high purity glass shape carbon.
In the present invention, hyperacoustic half-wavelength by hyperacoustic thickness T ' at aforementioned lining portion place being set at this lining portion place (λ '/2) one of 1/10 following or be in certain scope at center with one times, make the loss that shines the vibrational energy on the object being treated from ultrasonic oscillator reach minimum basically, wet processed is stably carried out.Here, the thickness setting with lining portion be hyperacoustic half-wavelength at this lining portion place below 1/10 or in one times the scope time, can the vibration of ultrasonic rolling land be passed to treatment fluid expeditiously via lining portion, but therewith relatively, when the thickness setting of lining portion is become greater than aforementioned half-wavelength 1/10, one times of not enough aforementioned half-wavelength, and greater than in one times the scope of half-wavelength the time, the loss that shines the vibrational energy on the object being treated from ultrasonic oscillator increases, and is unfavorable.
In addition, the half-wavelength of the ultrasonic vibration of lining portion below 1/10 or one times numerical value, have definition width, strictly be not limited in 1/10 or and one times numerical value of half-wavelength according to can the efficiency of selection the highest state of the difference of the frequency of the state of temperature of vibration section and lining portion and the ultrasonic vibration that applied.
Specifically, when the wavelength in this vibration of the ultrasonic vibration of sending from ultrasonic oscillator was λ in season, 1/10 number range of so-called half-wavelength was preferably in the scope of λ/120～λ/20, more preferably in the scope of λ 120～λ/60.1 of so-called half-wavelength times numerical value in addition, specifically, preferably in the scope of λ/2 ± 0.5mm, more preferably in the scope of λ/2 ± 0.05mm, more preferably in the scope of λ/2 ± 0.01mm.Thickness by such setting lining portion, owing to can make the ultrasonic vibration of sending from ultrasonic oscillator effectively, so when adopting the wet processed of the ultrasonic oscillator that is equipped with this advantageous feature to carry out wet processed with nozzle, can can carry out wet processed expeditiously fully with ultrasonic vibration (ultrasonic energy) imparting treatment solution.
In the present invention, also can adopt aforementioned vibration section is arranged on mechanism on the both sides of the aforementioned object being treated side of aforementioned ultrasonic oscillator and a side in contrast.
In this case, because not only in the object being treated side, and also be equipped with the vibration section,, can form the integral body of vibration section with thickening so can vainly not increase the thickness T of the vibration section of object being treated side at its opposition side.Thereby, can not reduce ultrasonic vibration from the transmitance of ultrasonic oscillator to treatment fluid, to whole oscillator, can prevent that ultrasonic oscillator from becoming high temperature more reliably to the spread heat that is produced.
In addition, the vibration section of object being treated side and the vibration section of its opposition side can form an integral body, also can separate formation separately.
In addition, in order to solve above-mentioned problem, wet processed nozzle of the present invention, have treatment fluid that the wet processed object being treated is used to the inlet opening part of the processed surface supply of aforementioned object being treated and with the discharge liquor of the aforementioned processing liquid after the aforementioned wet processed from the wet processed of the outlet opening portion of aforementioned processed discharge with the nozzle, be equipped with the aforementioned processing liquid on aforementioned relatively processed to give the ultrasonic oscillator that ultrasonic vibration is used, near this ultrasonic oscillator, be arranged on the lining portion of aforementioned object being treated side, be arranged on the vibration section of aforementioned lining portion opposition side near aforementioned ultrasonic oscillator, wherein, the wavelength X of the thickness T ' of aforementioned lining portion and the aforementioned ultrasonic vibration of this lining portion ' relation, one of press in the relation of plane and to set:
T’≤λ’/20
T’＝(1±0.1)·λ’/2
In this case, because the vibration section is provided in the opposition side of object being treated, so ultrasonic vibration can not reduce from the transmitance of ultrasonic oscillator to treatment fluid, and the heat that is produced is distributed on the oscillator, can prevent that ultrasonic oscillator from becoming high temperature.
In addition, be set in by thickness T ' lining portion ultrasonic vibration half-wavelength (λ '/2) below 1/10 or for its 1 times in certain scope at center, can make the minimization of loss that shines the vibrational energy on the object being treated from ultrasonic oscillator, stably carry out wet processed.Here, be below 1/10 of locating in this lining portion or under the situation of 1 times scope of ultrasonic vibration half-wavelength to the thickness setting of lining portion, can propagate into ultrasonic vibration on the treatment fluid with very high efficient via lining portion, but in contrast, the thickness setting of lining portion greater than aforementioned half-wavelength 1/10,1 times of not enough aforementioned half-wavelength, and during greater than 1 times of half-wavelength, the vibrational energy loss that shines on the object being treated from ultrasonic oscillator increases, and is undesirable.
And then, by the cooling body of this vibration section of cooling is set on aforementioned vibration section, even bubble enters processing region, do not have to use for a long time under the treatment fluid state partly in generation, because temperature rise by cooling body cooling vibration section, reduction vibration section, can carry out the temperature control of vibration section, so, can prevent that the coupling part of ultrasonic oscillator and vibration section and the temperature of ultrasonic oscillator from rising, the possibility that the ultrasonic oscillator place destroys can be reduced, and the hyperacoustic stabilized driving in the wet processed process can be carried out.
In addition, by making cooling fluid constitute aforementioned cooling body in the cooling water pipe circulation in the inboard that is positioned at aforementioned vibration section and/or the outside, even produce the part that does not have treatment fluid at processing region, owing to can utilize the cooling fluid vibration section, the temperature that can prevent the vibration section rises, and prevent that the coupling part of ultrasonic oscillator and vibration section and the temperature of ultrasonic oscillator from rising, and can reduce the destruction possibility at ultrasonic oscillator place.
Here, what is called is positioned at the cooling water pipe of inboard, vibration section, for example, refer to can with vibration section setting in aggregates as the cooling water pipe of cooling holes and flow through the structure of cooling fluid with the cooling water pipe inside of being located at the lip-deep slot part in vibration section that lid covers, simultaneously, the outside, so-called vibration section refer to can make cooling fluid the cooling water pipe that connects along the surface, vibration section or, the structure that flows in the cooling water pipe that constitutes by cooling body with the slot part that utilizes the vibration section surface coverage.
In the present invention, when aforementioned cooling fluid is made of aforementioned processing liquid, and/or when constituting by aforementioned discharge liquor, cooling cooling fluid supply output mechanism needn't be set, utilize treatment fluid supply and output mechanism to carry out the supply and the discharge of cooling fluid, just the cooling of vibration section can be carried out, thereby manufacturing cost can be reduced.And then treatment fluid during as cooling fluid, the heat in the time of can be the cooling vibration section is used for the temperature control of treatment fluid.In addition, discharge liquor during as cooling fluid, can with the temperature of vibration section providing chemical liquid and carry out the cooling of vibration section irrespectively.
In addition, in above-mentioned ultrasonic oscillator, the frequency of ultrasonic vibration is preferably in the scope of 20KHz～10MHz.By this structure, when having wet processed and carry out wet processed, can carry out practical ultrasonic waves for cleaning with nozzle.
Wet type processing device of the present invention has with the lower part: above-mentioned wet processed nozzle; Treatment fluid is imported the treatment fluid introducing mechanism of using between aforementioned inlet opening part and aforementioned object being treated processed; With treatment fluid from attracting to discharge the treatment fluid recovering mechanism of usefulness between aforementioned outlet opening portion and aforementioned object being treated processed; By make aforementioned wet processed with nozzle and aforementioned object being treated along the processed face of object being treated relatively move nozzle, the object being treated relative moving mechanism of processed whole regional usefulness handling aforementioned object being treated, by having these parts, under the state of the advantage of the wet processed nozzle that keeps the invention described above, can handle object being treated whole processed, and can provide a kind of can carry out long-term and stably ultrasonic wet handle, with respect to the very high wet type processing device of its cleaning efficiency of electric power that consumes.
The invention provides a kind of wet type processing device, it is characterized by, wavelength treatment fluid in the space part between a pair of nozzle of subtend, in aforementioned interspace portion, handle in the wet type processing device of object being treated, aforementioned a pair of nozzle has the vibration applicator of vibration being given aforementioned processing liquid respectively, the vibration of giving aforementioned processing liquid from the aforementioned vibration imparting mechanism of aforementioned each nozzle is symmetrical with respect to the two sides of aforementioned object being treated.
According to the present invention, be endowed the two sides of object being treated with the relation of symmetry from the vibration of vibration imparting mechanism imparting treatment solution.That is, the vibration pressure on two sides always is maintained at equal state.
When if the vibration pressure on two sides has difference, on object being treated, apply pushing force from high side to low side, convexly curved to low-pressure side.Because the direction of power is according to the direction of the cycle changeabout of vibration, so object being treated itself vibrates.Then, because the distortion of object being treated is lowered on high-tension side vibration pressure, increase at the low-pressure side vibration pressure, the net amplitude that produces cavitation on the two sides simultaneously diminishes.In addition, only make the energy absorption of the energy of object being treated vibration from treatment fluid.
According to the present invention, because the vibration pressure on two sides is always identical, so above-mentioned phenomenon can not take place, the vibration pressure of giving the object being treated two sides plays a part to produce air pocket effectively.Thereby, utilize the high-velocity fluid that obtains by air pocket can improve the wet processed effect of cleaning etc.
In the present invention, aforementioned a pair of nozzle has the liquid contact plate on the face that is arranged on aforementioned object being treated subtend respectively, treatment fluid is imported to treatment fluid introduction part between aforementioned object being treated and the aforementioned liquids contact plate, between aforementioned object being treated and aforementioned liquids contact plate, treatment fluid is discharged to the treatment fluid discharge portion, preferably, from the vibration that aforementioned vibration imparting mechanism is given aforementioned processing liquid, middle process aforementioned liquids contact plate awards aforementioned processing liquid.In this case, treatment fluid is stably remained on the two sides of object being treated, and, fresh treatment fluid can be changed always, thereby object being treated can be handled expeditiously.
The present invention preferably, give the size (amplitude) of the vibration of aforementioned processing liquid from the aforementioned vibration imparting mechanism of aforementioned each nozzle, frequency and phase place, and the aforementioned liquids contact plate of aforementioned each nozzle is substantially the same each other with the distance between the aforementioned object being treated.Whereby, can give the two sides of aforementioned object being treated with symmetrical manner with vibration from the aforementioned vibration imparting mechanism in aforementioned each nozzle ground at an easy rate.
In the present invention, the liquid contact plate of aforementioned each nozzle and the interval of liquid contact plate are preferably below 8.0mm, and the interval between liquid contact plate and the object being treated is more than 0.1mm.
At this moment, why the interval of liquid contact plate and object being treated more than 0.1mm, is that the liquid contact plate and the object being treated of nozzle are in contact with one another owing to avoid when transmitting.In addition, the reason of the interval of liquid contact plate and liquid contact plate below 8mm is that when greater than 8mm, it is difficult that the maintenance of treatment fluid becomes, and can not handle.
In addition, more preferably, the interval of liquid contact plate and liquid contact plate is below 7mm.
In addition, in the present invention, preferably be equipped with under the constant state in the liquid contact plate that keeps aforementioned each nozzle and the interval between the aforementioned object being treated to make it to relatively move, nozzle or the travel mechanism of object being treated.Whereby, needn't strengthen liquid contact plate and just can carry out wet processed whole faces of object being treated.
In addition, the invention provides a kind of wet processed method, in the space part between a pair of nozzle that treatment fluid is remained on subtend, in aforementioned interspace portion the one side give aforementioned processing liquid with vibrate one in the face of object being treated carry out wet processed to method in, it is characterized by, give two surface vibrations of aforementioned object being treated with the relation of symmetry.
According to the present invention, be endowed the two sides of object being treated with the relation of symmetry from the vibration of vibration imparting mechanism imparting treatment solution.That is, always the vibration pressure on two sides is maintained equal state.
When if the vibration pressure on two sides is variant, can apply pushing force to object being treated from high side to low side, crooked projectedly to low-pressure side.Because the direction of power is along with the direction of the cycle changeabout of vibration, object being treated itself can vibration.Simultaneously, because the distortion of object being treated is cut down at the high-pressure side vibration pressure, uprise at the low-pressure side vibration pressure, the net amplitude that produces cavitation on two faces diminishes simultaneously.What in addition, make object being treated vibration can be the vibrational energy that absorbs treatment fluid.
According to the present invention, because the vibration pressure on two sides always equates that so above-mentioned phenomenon can not take place, the vibration pressure of giving the two sides of object being treated plays a part to produce air pocket effectively.Thereby,, can improve the wet processed effect of cleaning etc. by the high velocity liquid that obtains by air pocket stream.
In the present invention, aforementioned a pair of nozzle has respectively: be arranged on the liquid contact plate on the subtend face of aforementioned object being treated; Treatment fluid is imported between aforementioned object being treated and the aforementioned liquids contact plate to the treatment fluid introduction part; With the treatment fluid discharge portion of treatment fluid from discharging between aforementioned object being treated and the aforementioned liquids contact plate; And the vibration imparting mechanism, preferably, in the middle of aforementioned vibration imparting mechanism, give aforementioned processing liquid with vibration via the aforementioned liquids contact plate.
In this case, because treatment fluid is stably remained on the two sides of object being treated, and always can change fresh treatment fluid, so can handle object being treated effectively.
The present invention is preferably when making distance between aforementioned each liquid contact plate and the aforementioned object being treated roughly identical mutually, middle size, frequency and the essentially identical vibration of phase place difference of giving vibration through aforementioned each liquid contact plate with respect to aforementioned processing liquid.
Whereby, can with the relation of symmetry vibration be given the two sides of aforementioned object being treated at an easy rate from the aforementioned vibration imparting mechanism of aforementioned each nozzle.
In the present invention, preferably, the liquid contact plate of aforementioned each nozzle and the interval of liquid contact plate are below 8.0mm, and the interval of liquid contact plate and object being treated is more than 0.1mm.
At this moment, the interval of liquid contact plate and object being treated is that the liquid contact plate for fear of nozzle when transmitting contacts with object being treated why more than 0.1mm.In addition, the interval of liquid contact plate and liquid contact plate why below 8mm, be since when its during greater than 8mm the maintenance of treatment fluid become difficult, the cause that can not handle.
In addition, more preferably, the interval of liquid contact plate and liquid contact plate is below 7mm.
In addition, in the present invention, preferably, keeping under the constant situation in its space aforementioned each liquid contact plate and aforementioned object being treated being relatively moved.
Whereby, liquid contact plate is strengthened, all surfaces that can the wet processed object being treated.
Description of drawings
Fig. 1 is the vertical view of expression wet processed according to the present invention with first kind of form of implementation of nozzle.
Fig. 2 is the cutaway view of the II-II line of Fig. 1.
Fig. 3 is the curve chart that the impedance operator of explanation on the oscillating plate of the thickness of 9 λ/2 used.
Fig. 4 is the curve chart that the impedance operator of explanation on the oscillating plate of 5 λ/2 thickness used.
Fig. 5 is the cutaway view of expression other another kind of form of implementation of wet processed usefulness nozzle according to the present invention.
Fig. 6 is the cutaway view of expression wet processed according to the present invention with second kind of form of implementation of nozzle.
Fig. 7 is the cutaway view of expression wet processed according to the present invention with the third form of implementation of nozzle.
Fig. 8 is the cutaway view of expression according to the other form of implementation of wet type processing device of the present invention.
Fig. 9 is the cutaway view of expression according to the other form of implementation of wet type processing device of the present invention.
Figure 10 is the cutaway view of expression according to the other form of implementation of wet type processing device of the present invention.
Figure 11 is the curve chart of the relation of the thickness of expression lining portion and hyperacoustic transmitance.
Figure 12 is the vertical view of expression according to the simple structure of the 4th kind of form of implementation of wet type processing device of the present invention.
Figure 13 is the perspective view of general structure of the cleaning device of expression the 5th kind of form of implementation of the present invention.
Figure 14 is the cutaway view along B-B ' line shown in Figure 13.
Figure 15 observes shown in Figure 14 to the vertical view that cleans with nozzle 1 from being cleaned the matrix side.
Figure 16 is the cutaway view of the wet processed of prior art with nozzle.
Wherein, 1 ... clean with nozzle (wet processed nozzle) 2 ... treatment fluid (discharge liquor, cooling fluid), 21 ... import path (treatment fluid ingress pipe), 21a ... introducing port, 21b ... first peristome (inlet opening part), 22 ... discharge pipe (discharge pipe), 22a ... outlet, 22b ... second peristome (outlet opening portion), 23 ... connecting portion, 35 ... processing region, 40 ... the ultrasonic oscillator part, 46 ... oscillating plate (vibration section), 46A ... the subtend face, 48 ... ultrasonic oscillator, 49 ... lining portion, 50 ... cooling water pipe (cooling body), 50A ... cooling bath (slot part), 51 ... cleaning device (wet type device), 55,56 ... clean with nozzle (wet processed nozzle) 117 ... support plate, 121 ... the spaced walls material, W ... processed substrate (object being treated), W1 ... processed, T, T ', T " ... gauge.
Embodiment
The first kind form of implementation of wet processed according to the present invention with nozzle and wet type processing device is described below with reference to the accompanying drawings.
[first kind of form of implementation]
Fig. 1 be expression according to the wet processed of this form of implementation upward view with nozzle, Fig. 2 is the cutaway view along 1 II-II line.In the drawings, label 1 is the wet processed nozzle according to this form of implementation.
The cleaning of this form of implementation nozzle 1, as Fig. 1, shown in Figure 2, be provided with the importing path (ingress pipe) 21 of the introducing port 21a at one end have importing cleaning fluid (treatment fluid) 2 usefulness and at one end on have and the cleaning fluid (discharge liquor of the treatment fluid after the wet processed) after cleaning is discharged to the outside uses the drain passageway of outlet 22a (discharge pipe 22), these other ends separately that import path 21 and drain passageway 22 interconnect, when formation has connecting portion 23 with the subtend face 46A of processed substrate (object being treated) W subtend, be provided with and will import first peristome (inlet opening part) 21b of path 21 in these connecting portion 23 upper sheds, and second peristome of drain passageway 22 openings (outlet opening portion) 22b.This nozzle is referred to as plug-type nozzle (throttle-type nozzle).The first and second peristome 21b, 22b opens wide towards processed substrate W.Space between connecting portion 23 and the processed substrate W forms the processing region 35 that carries out wet processed.
And then, on connecting portion 23, be arranged on when cleaning processed substrate W the cleaning fluid in processing region 35 and give the ultrasonic oscillator part 40 that ultrasonic vibration is used.This ultrasonic oscillator part 40 is equipped with oscillating plate (vibration section) 46 and is arranged on the ultrasonic oscillator 48 of giving oscillating plate 46 on the interarea of oscillating plate 46, with ultrasonic vibration.Ultrasonic oscillator is electrostriction elements such as PZT, and reception produces ultrasonic vibration from the signal of telecommunication of the ultrasonic frequency that oscillator sends.This ultrasonic oscillator 48 utilizes with epoxy resin, and to be that the ultrasonic oscillator of principal component is bonding be connected on the oscillating plate 46 with bonding agent etc.
As the material that constitutes oscillating plate 46, can be from high purity glass shape carbon, stainless steel, quartz, sapphire, pottery or aluminium and alloys thereof such as aluminium oxide are selected in the titanium, magnesium etc. to use.The wet processed that is used for common clean in outfit is with under the situation of nozzle, material stainless steel as oscillating plate 46 is just enough, but when cleaning fluid is under the situations such as more intense acid and hydrofluoric acid, with formations such as sapphire or aluminium oxide ceramics, because they worsen excellent also can the preventing of tolerance of wet processed liquid, are very good for carrying out wet processed.
In addition, when carrying out wet processed, from practical angle, preferably, the ultrasonic vibration of the frequency in ultrasonic oscillator 48 output 20KHz～10MHz scopes, particularly, from the viewpoint of the thickness that can keep handling liquid layer, more preferably, frequency is more than 0.2Mhz.
In addition, the length of the wavelength X of ultrasonic vibration in oscillating plate 46 of sending from ultrasonic oscillator 48 is under the situation about making with stainless steel (SUS316L) at oscillating plate 46, is about 0.6mm in the scope of 300mm.
As shown in Figure 1, oscillating plate 46, when the wavelength of the ultrasonic vibration of sending from ultrasonic oscillator 48 in this oscillating plate 46 was λ, the hydrogen thickness T was set to
T=(n ± 0.1) λ/2 (wherein, n is the integer more than 2)
Value as n is 3～7, particularly preferably is 5.
Here, thickness T preferably is set at λ ± 0.3mm, λ 3/2 ± 0.3mm, and λ 5/2 ± 0.3mm is in the scope of λ 7/2 ± 0.3mm.This is because considered the cause of conditions such as variations in temperature.Can make the ultrasonic vibrations propagate of sending from ultrasonic oscillator 48 effectively by such setting thickness T, when employing is equipped with the cleaning of ultrasonic oscillator part 40 to carry out wet processed with nozzle 1, can fully ultrasonic vibration (ultrasonic energy) be passed to cleaning fluid 2, can carry out wet processed expeditiously.
In addition, in drain passageway 22 sides pressure control part (omitting among the figure) is set, this pressure control part (treatment fluid retracting device), in order after cleaning, to flow in the drain passageway 22 with cleaning fluid 2 after processed substrate W contacts, its set-up mode is, makes the pressure (surface tension that comprises the face that is cleaned of the surface tension of cleaning fluid and processed substrate) of the cleaning fluid that contacts with atmosphere of the peristome 21b that wins keep balance with atmospheric pressure.Above-mentioned pressure control part is made of the drawdown pump that is located at outlet 22a side.Thereby, the pressure control part of drain passageway 22 sides adopts drawdown pump, utilize the control of this drawdown pump to attract the power of the cleaning fluid of connecting portion 23, keep the pressure (surface tension that comprises the face that is cleaned of the surface tension of cleaning fluid and processed substrate W) and the atmospheric balance of the cleaning fluid that contact with atmosphere of the first peristome 21b.
Promptly, the pressure P W of the cleaning fluid that contacts with atmosphere by making the first peristome 21b (surface tension that comprises the face that is cleaned of the surface tension of cleaning fluid and processed substrate W) is Pw ≈ Pa with the pass of atmospheric pressure Pa, make to be supplied to processed substrate W and the cleaning fluid that contact with processed substrate W does not leak into the outside of cleaning the usefulness nozzle, be discharged in the drain passageway 22 by the first peristome 21b.That is, from clean with nozzle be fed on the processed substrate W cleaning fluid with the processed substrate W of supply on the part of cleaning fluid (the first and second peristome 21b, 22b) part contact is not in addition removed from substrate W.
Here, when cleaning processed substrate W,, utilize above-mentioned ultrasonic oscillator 48 to give ultrasonic vibration, with the processed substrate W of cleaning fluid 2 use cleanings cleaning fluid 2 being fed to processing region 35 under state.In addition, have the ultrasonic oscillator part 40 of the cleaning of this form of implementation with nozzle 1, when from ultrasonic oscillator 48 emission ultrasonic vibrations, ultrasonic vibration is transmitted on the oscillating plate 46, because the thickness T of oscillating plate 46 is set in a manner described, so the ultrasonic vibration of being propagated is transmitted on the cleaning fluid 2 of processing region 35 expeditiously from the subtend face 46A (with the face of the face opposition side that ultrasonic oscillator 48 is set) with the interarea opposition side of oscillating plate 46.
Clean each peristome 21b with nozzle, distance H between 22b and the processed substrate W is not below the 8mm, with in the scope that processed substrate W contacts getting final product, preferably below 6mm not with scope that substrate W contacts in, the scope that below 3mm, does not contact more preferably with substrate W.When surpassing 8mm, be difficult to be full of required cleaning usefulness at substrate W with between cleaning with nozzle, be difficult to clean.
Constitute to clean subtend face 46A with the liquid contact surface of nozzle and be by polyfurolresin such as PFA and according to used cleaning fluid situation, adopt the stainless steel of the passivating film that has only the chromated oxide formation from the teeth outwards, the stainless steel that perhaps has the hybrid films of aluminium oxide and chromated oxide from the teeth outwards, the lining portion of the respective face that the titanium etc. on electrobrightening surface constitutes is equipped with respect to Ozone Water, owing to impurity can be dissolved in the cleaning fluid, from but preferred.If, can be used for all cleaning fluids except that hydrofluoric acid very goodly with quartzy formation liquid contact surface.
Using in the nozzle arrangements according to the cleaning of this form of implementation, when the cleaning fluid 2 that is supplied to processing region 35 is hydrogen water, can act on hydrogen water ultrasonic waves for cleaning uses with nozzle, when cleaning fluid is Ozone Water, can act on the Ozone Water ultrasonic waves for cleaning uses with nozzle, when cleaning fluid is pure water, can acts on pure water rinsing ultrasonic waves for cleaning and use with nozzle.
Use in the nozzle 1 in the cleaning of this form of implementation, by the thickness setting with vibration section (oscillating plate) 46 is the integral multiple more than 2 times in half wavelength lambda/2 of the ultrasonic vibration at 46 places, vibration section, in the processing region 35 between processed the W1 of the subtend face 46A of vibration section 46 and object being treated W, be involved in the zone that bubble does not have treatment fluid 2 even exist, make oscillating plate 46 adstante febres at above-mentioned bubble area from the ultrasonic wave that processed substrate W reflects, by setting the thickness T of oscillating plate 46 bigger than thickness of the prior art, can reduce from the vibration section 46 and propagate big heat to ultrasonic oscillator 48, the temperature that prevents ultrasonic oscillator 48 rises, and prevent the breakage of ultrasonic oscillator 48, meanwhile, can also prevent that the action that the breakage of oscillating plate 46 and the coupling part of ultrasonic oscillator 48 causes is undesired.
For example, at the frequency setting with ultrasonic vibration is 1Mhz, vibration section 46 is stainless steel (SUS316L) when making, and about the about 3mm in its half wavelength lambda/2, sets the thickness T of vibration section 46 thicker than the 3mm of prior art, can make it to be 6mm, whereby, 46 heats of propagating are dispersed into the ratio increase of ultrasonic oscillator 48 part in addition from the vibration section, can reduce the heat that is delivered on the ultrasonic oscillator 48, the temperature that prevents ultrasonic oscillator 48 rises, and prevents the breakage of ultrasonic oscillator 48.
And then, preferably, the thickness T of vibration section 46 is set in 3 times to 7 times of half wavelength lambda/2 of the ultrasonic vibration at 46 places, vibration section, more preferably, 5 times of half wavelength lambda/2 by the thickness T of vibration section 46 being set at the ultrasonic vibration at 48 places in the vibration section, at 46 places, vibration section more effectively in the propagate ultrasound waves vibration, by setting the thickness T of vibration section bigger than prior art, can further reduce by 46 heats to ultrasonic wave 48 propagation from the vibration section, the temperature that further prevents ultrasonic oscillator 48 rises, and more can prevent the breakage of ultrasonic oscillator 48.
Here, the thickness setting of vibration section 46 half wavelength lambda/2 of the ultrasonic vibration at 46 places, vibration section more than 7 times the time, because factors such as variation of temperature, resonance point changes easily, so for the adjustment of the oscillator that sends the ultrasonic frequency signal of telecommunication that ultrasonic vibration uses from ultrasonic oscillator 48 is difficult to, oscillating plate 46 is difficult to vibration, is unfavorable therefore.In addition, when the thickness T with vibration section 46 is set in the scope below 3 times of half-wavelength of ultrasonic vibration of vibration section 46, in the processing region 35 between processed the W1 of the subtend face 46A of vibration section 46 and object being treated W, be involved in bubble, existing under the situation in the zone that does not have treatment fluid 2, the degree that 46 heats of propagating to ultrasonic oscillator 48 reduce from the vibration section is little, the temperature of ultrasonic oscillator 48 rises, and is not very desirable.And then, be set at 5 times of half wavelength lambda/2 of the ultrasonic vibration at 46 places, vibration section by thickness T, be suitable for stably driving the stabilized driving of ultrasonic oscillator 48 most and also be suitable for most reducing the possibility that does not have the breakage of the ultrasonic oscillator 48 that wet processed liquid 2 causes because of processing region 35 vibration section 46.
The relation of the resonance frequency of the thickness T of vibration section 46 and vibration section 46 is described here.Fig. 3 is the curve chart that is illustrated in the impedance operator when to have thickness on the oscillating plate that thickness is 9 λ/2 be the lining portion of λ/2, and Fig. 4 is the curve chart of the impedance operator when being illustrated in the lining portion that has λ/2 thickness on the oscillating plate that thickness is 5 λ/2.
As Fig. 3, shown in Figure 4, as frequency impedance characteristic to ultrasonic vibration, the point that becomes maximum is represented the resonance point of oscillating plate, and as shown in Figure 3, thickness is the impedance operator of the oscillating plate of 9 λ/2, frequency diversity bandwidth between the resonance point is narrow, and then along with the increasing of frequency of ultrasonic, the mutual frequency interval of resonance point further narrows down.Therefore, when vibration conditions such as state of temperature change, be difficult to make oscillating plate to vibrate effectively.
Therewith relatively, in this form of implementation, as shown in Figure 4, thickness is the impedance operator of the oscillating plate 46 of 5 λ/2, compare with situation shown in Figure 3, it is big that the frequency diversity bandwidth between the resonance point becomes, even vibration conditions such as state of temperature change, oscillating plate 46 is more effectively vibrated, can make the action stabilisation of wet processed with nozzle.
As mentioned above, in this form of implementation, be set in by thickness T in 3 times to 7 times the scope of half wavelength lambda/2 of ultrasonic vibration at vibration section place vibration section 46, can be effectively in the 46 places propagate ultrasound waves vibration of vibration section, owing to set the thickness T of vibration section 46 greatlyyer than prior art, propagate heats thereby reduce from the vibration section 46 to ultrasonic oscillator 48, prevent that the temperature of ultrasonic oscillator 48 from rising, reduce the possibility of the breakage of ultrasonic oscillator 48.And then, 5 times of half wavelength lambda/2 by the thickness T of vibration section 46 being set at the ultrasonic vibration at 48 places in the vibration section, can be further at 46 places, vibration section effectively in the propagate ultrasound waves vibration, by setting the thickness T of vibration section 46 bigger than prior art, reduction is 46 heats to ultrasonic oscillator 48 propagation from the vibration section, further prevent the rising of the temperature of ultrasonic oscillator 48, further prevent the breakage of ultrasonic oscillator 48, be suitable for stably driving ultrasonic oscillator 48 most and be suitable for most reducing since processing region 35 in do not have wet processed liquid 2 to cause the possibility of ultrasonic oscillator 48 breakages.
In addition, in above-mentioned form of implementation, the thickness T that only is conceived to vibration section 46 is illustrated, but in addition structure, can do various changes in the scope that does not change purport of the present invention.
In this form of implementation, to being illustrated, but also can be as shown in Figure 5 cleaning nozzle 1a also be set in the lower face side of processed substrate W cleaning the situation that is located at the upper surface side (a processed side) of processed substrate W with nozzle 1.In addition this cleaning has same structure with aforementioned described cleaning with nozzle 1 with on the nozzle 1a side connecting portion 23 ultrasonic oscillator 48 not being set.
Below based on the second kind form of implementation of description of drawings wet processed according to the present invention with nozzle and wet type processing device.
[second kind of form of implementation]
Fig. 6 is nozzle is used in expression according to the wet processed of this form of implementation a cutaway view.
In this form of implementation, be the structure of lining portion 49 with Fig. 1～first kind of form of implementation difference shown in Figure 5, give identical label for structure member in addition, and omit explanation them.
As shown in Figure 6, on the subtend face 46A of the liquid contact surface that constitutes vibration section 46, be provided with in the mode that covers subtend face 46A treatment fluid is had inertia and/or stable on heating lining portion 49.
This lining portion 49, its structure is different according to the wet processed that will be suitable for.
Here,, can comprise washing, peel off, develop wet etching, plating, processing such as grinding as wet processed.At this moment, as near the treatment fluid 2 that is fed to the vibration section 46, under the situation of clean, adopt ultra-pure water, electrolytic ionic water, Ozone Water, hydrogen water etc., particularly, can stably use negative electrode water (be created in the electrolytic ionic water cathode electrode side water (, hydrogen water adds the hydrogen water of ammonia etc., when lift-off processing, adopt rare NaOH, inorganic bases such as rare KOH, amine are stripper etc., when development treatment, adopt rare NaOH, inorganic bases such as rare KOH, hydrogenation trimethylammonium dilutions etc. under the situation of Wet-type etching, adopt hydrofluoric acid corrosive liquid etc., when plating, adopt plating Cu usefulness, plating Ag usefulness, plating Au usefulness waits plating bath, when milled processed, adopt SiO 2Slurry, Al 2O 3Slurry, diamond slurry etc.
Correspondingly, lining portion 49 can be by quartz, high-purity alpha-alumina, sapphire, PFA, polyfurolresins such as tetrafluoroethene, and PEEK (polyether-ether-ketone), formations such as high purity glass shape carbon.And then, according to used treatment fluid vibration section 46, as its lining portion 46, can only constitute stainless steel (SUS316L etc.) formation of passivating film by outermost surface by the oxide of chromium, and vibration section 46 is by being equipped with the stainless steel of the hybrid films of aluminium oxide and chromated oxide to constitute from the teeth outwards as lining portion 49, and, when handling water 2 and be Ozone Water, constitute by the titanium that is equipped with the electrobrightening faces as lining portion 49 etc.
As shown in Figure 6, be set at respect to wavelength X by thickness T ' at lining portion 49 places with the lining portion 49 of this form of implementation ' λ '/below 20 or (1 ± 0.1) λ '/2, make the vibration loss of energy that shines on the object being treated W from ultrasonic wave 48 minimize substantially, can make wet processed be in stable state.
Specifically, when the frequency setting of ultrasonic vibration under the situation that 1MHz and lining portion 49 are made by stainless steel (SUS316L), can be with its half wavelength lambda '/2 be set at about 3mm, whereby, be dispersed into the ratio increase of ultrasonic oscillator 46 part in addition from the heat of oscillating plate 46 propagation, can reduce the heat of propagating to ultrasonic oscillator 48, prevent that the temperature of ultrasonic oscillator 48 from rising, can prevent the breakage of ultrasonic oscillator 48.
In the thickness T ' of lining portion 49 with respect to wavelength X in the ultrasonic vibration at lining portion 49 places ' be set under the situation below λ '/20 times, 46 subtend face 46A place does not react with treatment fluid 2 in the vibration section, and ultrasonic vibration can be propagated on the treatment fluid 2 fully, from but very good.In addition, the thickness T ' of lining portion 49 is with respect to the wavelength X in the ultrasonic vibration at lining portion 49 places ' be set in the scope greater than the not enough λ ' in λ '/20/2, and when being set in the scope greater than λ '/2, the loss that shines the vibrational energy on the object being treated W from ultrasonic oscillator 48 increases, and is undesirable.
Here, thickness T ' for lining portion, so-called λ '/below 20, the multiple value of λ '/2, can be according to the scope of the state of temperature of vibration section 46 and lining portion 49 and hyperacoustic vibration frequency efficiency of selection the best of being given, have a definition width, strictly be not confined to one times numerical value of λ '/20 and λ '/2.
Specifically, when the wavelength in the lining portion 49 of the ultrasonic vibration of sending from ultrasonic oscillator 48 was λ ', the number range that so-called λ '/20 are following was preferably below the scope of λ '/120～λ '/20, more preferably, below the scope of λ '/120～λ '/60.In addition, the numerical value of so-called λ '/2, specifically, preferably in the scope of λ '/2 ± 0.5mm, more preferably in the scope of λ '/2 ± 0.5mm, more preferably in the scope of λ '/2 ± 0.01mm.Thickness by such setting lining portion 49, can propagate effectively from the ultrasonic vibration of ultrasonic oscillator 48, so, when adopting the wet processed that is equipped with ultrasonic oscillator part 40 to carry out wet processed with nozzle 1 with this excellent specific property, can can carry out wet processed expeditiously fully with ultrasonic vibration (ultrasonic energy) imparting treatment solution.
Use in the nozzle 1 in the wet processed of this form of implementation, can have identical effect with form of implementation recited above, meanwhile, lining portion 49 is set, have inertia and/or have thermal endurance with respect to treatment fluid 2 by this lining portion 49, the subtend face of vibration section 46 does not directly contact with treatment fluid, the surface of treated side lining portion 49 is not by wet processed, thereby can further reduce the deterioration that vibration section 46 processed liquid 2 and ultrasonic vibration cause, can further prolong the life-span of vibration section 46, and then, can prevent that the composition of vibration section 46 and treated side lining portion 49 is mixed in the treatment fluid 2, thereby prevent the pollution of processed the W1 of object being treated W.Simultaneously, in the processing region 35 between processed the W1 of the subtend face 46A of vibration section 46 and object being treated W, be involved in zone, vibration section 46 adstante febres that bubble exists does not have treatment fluid 2, for example, even the temperature in abutting connection with the vibration section 46 of treatment fluid 2 rises, 46 can produce heat conduction effectively in the vibration section, by lining portion 49 heat are dispersed in the treatment fluid 2, thereby can prevent the breakage of vibration section 46.
In addition, use in the nozzle 1 in the wet processed of this form of implementation, because by the thickness T ' that makes lining portion 49 is following or (1 ± 0.1) λ '/2, λ '/20, can propagate effectively from the ultrasonic vibration of ultrasonic oscillator 48 and vibration section 46, thereby, when carrying out wet processed with nozzle 1 with the wet processed that is equipped with ultrasonic oscillator part 40 with this excellent specific property, can be ultrasonic vibration (ultrasonic energy) imparting treatment solution fully, with handling expeditiously.And then, vibration section 46 not only is set, and lining portion 49 is set, and have more the thickness part T ' of this lining portion than the thickness T of vibration section 46, so, even be involved in bubble in the processing region between processed the W1 of the subtend face 46A of vibration section 46 and object being treated W, exist the zone that does not have treatment fluid 2, because of the ultrasonic wave from processed substrate W reflection in bubble area makes oscillating plate 46 adstante febres, owing to reduced from the vibration section 46 to going out the heat that colour table oscillator 48 is propagated, thereby the temperature that can prevent out colour table oscillator 48 rises, prevent ultrasonic oscillator 48 breakages, and can prevent that the action that the breakage of oscillating plate 46 and the coupling part of ultrasonic oscillator 48 causes is bad.
In addition, in this form of implementation, also can be the same with first kind of form of implementation shown in Figure 5, side also is provided with to clean and uses nozzle 1a below processed substrate W.
Wet processed according to the present invention the third form of implementation with nozzle and wet type processing device is described below with reference to the accompanying drawings.
[the third form of implementation]
Fig. 7 is nozzle is used in expression according to the wet processed of this form of implementation a cutaway view.
In this form of implementation, be the structure of cooling water pipe 50 with the difference of first kind of form of implementation of Fig. 1～shown in Figure 5, corresponding structure member is in addition given identical label, omits the explanation to them.
As shown in Figure 7, on vibration section 46, the cooling body as these vibration section 46 usefulness of cooling on importing path 21 sides and drain passageway 22 side both sides of connecting portion 23, is provided with cooling water pipe (cooling body) 50,50 respectively.
This cooling water pipe 50,50 utilize and vibration section 46 or importing path 21, substantially the same materials such as drain passageway 22 are made, the parallel state of subtend face 46A of side and vibration section 46 sides, reach along the direction of the paper that is substantially perpendicular to Fig. 7 and extend, its length is substantially equal to the length in the vibration section 46 of this direction.The shape that cooling water pipe 50 is made into the cross section of the direction vertical with its path direction is roughly the semicircular cooling body 50,50 cylindraceous of splitting, and the opening portion of this cooling body 50,50 is covered by the side of vibration section 46, and it is connected hermetically.The two ends of cooling water pipe 50, middle be connected respectively on outlet 22a and the not shown drawdown pump via cooling tubing 50a, these discharge pipes 22 constitute the treatment fluid recovering mechanism that attracts and discharge discharge liquor (treatment fluid) 2 usefulness of side processing region 35 with cooling water pipe 50 and drawdown pump.
Use in the nozzle 1 in the wet processed of this form of implementation, be supplied to the cleaning fluid 2 of the processing region 53 on the processed substrate W via inlet opening part 21b from the treatment fluid introducing mechanism, pass through drain passageway 22 from the 22b of outlet opening portion, be positioned at the cooling water pipe 50 of the both sides of vibration section 46 from outlet 22a process, 50 inside utilizes drawdown pump to be discharged from.That is, cooling body flows the cooling water pipe 50 of discharge liquor (treatment fluid) 2 in the outside that is positioned at vibration section 46 as cooling fluid.
Whereby, use in the nozzle 1 in the wet processed of this form of implementation, when can obtaining the effect identical with above-mentioned form of implementation, owing to can further utilize cooling fluid 2 cooling vibration sections 46, thereby the temperature that can prevent vibration section 46 rises, even when processing region 35 occurs not having the part of treatment fluid 2, owing to can utilize cooling fluid 2 cooling vibration sections 46, thereby the temperature that can prevent vibration section 46 reliably rises, prevent that the coupling part of ultrasonic oscillator 48 and vibration section 46 and the temperature of ultrasonic oscillator 48 from rising, and can reduce the possibility of the breakage of ultrasonic oscillator part 40.
In addition, by with discharge liquor 2 as cooling fluid, needn't be provided as the cooling fluid supply output mechanism of the cooling usefulness of vibration section 46 specially, discharging cooling fluid by the importing output mechanism supply of treatment fluid makes it at cooling water pipe 50,50 internal flows, just can carry out the cooling of vibration section, so can reduce the manufacturing cost and the operating cost of wet processed nozzle 1.And then, since with discharge liquor 2 as cooling fluid, so can with the state of temperature of vibration section 46 providing chemical liquid and can carry out the cooling of vibration section 46 irrespectively.
In addition, in this form of implementation, the side that cooling body 50 connects vibration section 46 is roughly the plane, but also can as shown in Figure 8 cooling bath (slot part) 50A corresponding to cooling body 50 be set on the side of vibration section 46, cover this cooling bath 50A with cooling water pipe 50, the sectional area of the cooling channel that increase is flowed as cooling fluid 2, in the flow that increases cooling fluid, increase the contact area of cooling fluid 2 and vibration section 46, can further improve cooling effectiveness.
In addition, in this form of implementation, for cooling water pipe 50,50 inner surface, the side of vibration section 46, and the inner surface of cooling bath 50A etc. and contact portion as the treatment fluid 2 of cooling fluid, also can carry out with second kind of form of implementation shown in Figure 6 in subtend face lining portion 49 same carry out surface applied and surface modification etc. with same material.In addition, as shown in Figure 9, can the inside of cooling body 50 and cooling bath 50A be provided with as cooling water pipe B with second kind of form of implementation shown in Figure 6 in the cooling of lining portion 49 same materials in manage 50B.In this case, can further reduce the deterioration that causes because of treatment fluid, further prolong the life-span of vibration section 46.
In addition, also can be in the part except that 46 sides, vibration section, for example on the interarea that connects ultrasonic oscillator 48, cooling water pipe 50 is set, and, on the surface of vibration section 46, slot part is not set, but 46 inside are provided with the cooling holes of coolant flow in the vibration section.Under the situation of this set cooling holes, the contact area of cooling fluid and vibration section 46 further increases, and can further obtain favorable cooling effect.
Below based on the four kind form of implementation of description of drawings wet processed according to the present invention with nozzle.
[the 4th kind of form of implementation]
Figure 10 is nozzle is used in expression according to the wet processed of this form of implementation a profile.
This form of implementation is vibration section 46 is configured on the side opposite with processed substrate W of ultrasonic oscillator 48 with the basic difference of first kind of form of implementation to the third form of implementation.The structure member identical with Fig. 1～Fig. 9 given identical label and omitted its detailed description in Figure 10.
In this form of implementation, be positioned at ultrasonic oscillator 48 on the side of processed substrate W lining portion 49 is set, this lining portion 49 constitutes and connects the connecting portion 23 that imports paths 21 and drain passageway 22.Because lining portion 49 contacts with treatment fluid 2, so as illustrated in second kind of form of implementation, according to the situation of treatment fluid 2, adopt inertia, the material of excellent heat resistance is made.
The thickness T ' of lining portion 49 and wavelength X in the ultrasonic vibration at this lining portion place ' relation set by one of following relation.
T’≤λ’/20
T’＝(1±0.1)·λ’/2
Set the reason of thickness T ' below in a manner described with Figure 11 explanation.Figure 11 is the curve of relation of the transmitance of the thickness T ' of expression lining portion 49 and ultrasonic vibration.
In Figure 11, solid line is the theoretical value when not considering to absorb vibration by lining portion 49, in the wavelength X of lining portion place's ultrasonic vibration ' 1/2, that is, each half-wave strong point is got maximum 1.0 (100%).But, actually, as * number experiment value shown in, the maximum of each half-wavelength shown in the dotted line among the figure gradually the decay.As can be seen from Figure 11, along with the increase of starting from scratch of the thickness T ' of lining portion 49, transmitance reduces, when being wavelength X ' 1/4 the time, transmitance becomes minimum value.Thereby, should approach zero as much as possible as the most preferred value of the thickness T ' of lining portion 49, from practical angle, as long as at λ '/below 20.Second preferred value as the thickness T ' of lining portion 49 is λ '/2 that become first maximum, from practical angle as long as in the scope of (1 ± 0.1) λ '/2.
In addition, the wavelength X of ultrasonic vibration ' basically by the frequency of ultrasonic vibration and the material decision of lining portion, but along with variation of temperature also changes slightly.Thereby, the wavelength X in the above-mentioned formula ', judge in the user mode of standard and the temperature conditions of standard.
In this form of implementation, ultrasonic oscillator 48 is provided with vibration section 46 at the opposition side of processed substrate W.The thickness T of this vibration section 46 " for near the spread heat the ultrasonic oscillator, should be enough big.In this case, since vibration section 46 not between ultrasonic oscillator 48 and treatment fluid, so needn't consider hyperacoustic transmitance.Thereby, its thickness T " and needn't consider the wavelength X of the ultrasonic vibration at 46 places in the vibration section, can in continuous scope arbitrarily, select.
In addition, the material of vibration section 46 also can be identical with the material of lining portion 49, but the most handy different material.Since vibration section 46 needn't consider to treatment fluid 2 for inertia and mar proof etc., can form with cheap material.In addition, vibration section 46, preferably, when thermal capacity was big, its heat-conductive characteristic was good, was easy to dispel the heat to the outside.
In this form of implementation, also can cooling body be set in this vibration section 46.Its concrete structure is identical with the third form of implementation shown in Figure 9, thereby omits its explanation.
According to this form of implementation, because vibration section 49 is arranged on the opposition side that ultrasonic oscillator 48 is positioned at processed substrate W side, so needn't consider to be delivered to the decay of the ultrasonic vibration on the treatment fluid 2, can be fully thick, and can stick to the formation of machining accuracy ground.Therefore, combine, can very avoid the damage that causes by the heating of ultrasonic oscillator effectively with cooling body on being located at vibration section 40.And then owing to dispose lining portion 49 at ultrasonic oscillator 48 in processed substrate W side, ultrasonic oscillator 48 can not be subjected to the damage of treatment fluid 2.In addition, because the thickness T ' that makes this lining portion 49 is the value of regulation, can prevent the decay of the ultrasonic vibration that causes because of lining portion 49 and the decline of transmitance.Thereby, can not damage ultrasonic oscillator 48 and can carry out wet processed expeditiously.
The 5th kind of form of implementation according to wet type processing device of the present invention is described below with reference to the accompanying drawings.
[the 5th kind of form of implementation]
This form of implementation is to have the example of the wet processed of above-mentioned any form of implementation with the cleaning device (wet type processing device) of nozzle.
Figure 12 is the diagram of expression according to the simple structure of the wet type processing device 51 of this form of implementation, for example is individual device for cleaning of square large-size glass substrate (the following substrate that is referred to as simply) of hundreds of millimeter as processed substrate.Label 52 among the figure is a cleaning part, and 53 is workbench (substrate waves lead aircraft structure), 54,55,56,89 is to clean to use nozzle, and 57 is board carrying machine people, and 58 is magazine, 59 for unloading magazine, and 60 is hydrogen water, Ozone Water generating unit, and 61 is the cleaning fluid reproducing unit, and W is glass substrate (a processed substrate).
The central authorities of installing upper surface as shown in the figure constitute cleaning part 52, and the workbench 53 that keeps substrate W is set.The rectangle end difference that coincide with the shape of substrate W is set on the side workbench 53, and substrate W is embedded in this concrete portion, under the state of the surface of side group plate W and the flush of workbench 53, on substrate W wavelength side workbench 53.In addition, below end difference, form spatial portion, the axle (omitting the figure) that elevation base plate is used below workbench 53 is set in this spatial portion highlightedly.The drive source (omitting among the figure) of axle such as cylinder is set on the lower end of the axle that elevation base plate is used, when utilizing board carrying with the 57 handing-over substrate W of robot, the axle that above-mentioned elevation base plate is used by the effect of cylinder moves up and down, and along with moving up and down of axle, substrate W rises or descends.
A pair of balladeur train 62 is set on the subtend position of clamping workbench 53, between these balladeur trains 62, sets up and clean with nozzle 54,55,56,89.Cleaning constitutes with four sprays of nozzle by configuration arranged side by side, and each cleans with the different cleaning method of nozzle 54,55,56,89 usefulness and cleans.Under the situation of this form of implementation, these four nozzles are respectively: by to the supply substrate Ozone Water time from ultra-violet lamp 63 irradiation ultraviolet radiations, be mainly used in and remove organic ultraviolet nozzle 54, one side is supplied Ozone Water and is simultaneously given the Ozone Water ultrasonic waves for cleaning nozzle 55 that ultrasonic vibration is cleaned with ultrasonic oscillator main body 48, one side is supplied hydrogen water and is simultaneously utilized ultrasonic oscillator main body 48 to give the hydrogen water ultrasonic waves for cleaning nozzle 56 that ultrasonic vibration is cleaned, and the supply pure water carries out the pure water rinsing nozzle 89 of rinsing.
Each cleans with nozzle 54,55,56,89 and is referred to as plug-type nozzle (economizing liquid type nozzle).In addition, Ozone Water ultrasonic waves for cleaning in these four nozzles has identical structure with the cleaning of any form of implementation of nozzle 56 and Fig. 1～illustrated in fig. 9 with nozzle with nozzle 55 and hydrogen water ultrasonic waves for cleaning, perhaps each clean with nozzle any form of implementation described in a plurality of Fig. 1～Fig. 9 is set cleaning with nozzle (in Figure 12, for a cleaning nozzle, being provided with three groups respectively imports path 21 and drain passageway 22 and connecting portions 23 and is located at ultrasonic oscillator part 40 (or ultrasonic oscillator 40a) on the connecting portion 23, and first, the second peristome 21b, 22b, with three group of first and second peristome 21b, 22b combines, and extends beyond the width of substrate W).But for convenience's sake, only expressed ultrasonic oscillator 48 in the picture group, omitted the diagram of distinguishing cleaning fluid introduction part, cleaning fluid discharge portion.In addition, clean with nozzle 54, remove be provided with ultra-violet lamp 63 replace the ultrasonic oscillator main bodys 48 and the cleaning of above-mentioned form of implementation usefulness structure of nozzle roughly the same.But for convenience's sake, express in the picture group as broad as longly and clean with introduction part, clean with discharge portion etc.
In this cleaning device 51, above-mentioned four washer jets simultaneously move along balladeur train 62 with the interval that substrate W keeps certain above substrate W successively by one side, utilize the whole zone (processed whole zone) of the face that is cleaned of four kinds of cleaning method cleaning base plate W.
Clean the travel mechanism's (nozzle, object being treated relative moving mechanism) that uses nozzle as each, the slider that can move horizontally along the linear guide on each balladeur train 62 is set respectively, on the upper surface of each slider, be erected to be provided with pillar respectively, each is cleaned with nozzle 54,55, two ends of 56,89 are fixed on these pillars.Drive sources such as motor are set on each slider, constitute the structure that each slider oneself is advanced on balladeur train 62.And, utilize the control signal that provides from the control part (omitting the figure) of device that the motor on the slider is moved, each cleans with nozzle 54,55,56,89 and moves horizontally individually.In addition, drive sources such as (omitting among the figure) such as cylinder are set on above-mentioned pillar, move up and down, can adjust each respectively and clean with nozzle 54,55,56,89 ground levels by making pillar, promptly each clean with between nozzle 54,55,56,89 and the substrate W the interval.
At cleaning part 52 ground sidepieces hydrogen water is set, Ozone Water generating unit 60 and cleaning fluid reproducing unit 61.The hydrogen water of on hydrogen water, Ozone Water generating unit 60, packing into shake manufacturing installation 64 and Ozone Water manufacturing installation 65.Any cleaning fluid can generate by hydrogen and ozone gas are dissolved in the pure water.Wherein, generate ground hydrogen water conservancy by hydrogen water making device 64 and be supplied to hydrogen water ultrasonic waves for cleaning nozzle 56 at the liquid-feeding pump 67 of the way of hydrogen water supply pipe arrangement 66 with device.Equally, by the Ozone Water that Ozone Water manufacturing installation 65 generates, utilization is arranged on Ozone Water supply pipe arrangement 68 liquid-feeding pump 69 midway and is supplied to Ozone Water ultrasonic waves for cleaning nozzle 55.In addition, the pure water supply in manufacturing line is supplied to pure water rinsing nozzle 89 with pipe arrangement (omitting the figure) with pure water.
Simultaneously, with the hydrogen water behind the filter 70, utilize the liquid-feeding pump midway 77 that is arranged on regenerated hydrogen water supply pipe arrangement 76 to be supplied to hydrogen water ultrasonic waves for cleaning nozzle 56 by hydrogen water.Equally, the liquid-feeding pump midway 79 that is arranged on regeneration Ozone Water supply pipe arrangement 78 by the Ozone Water utilization after the Ozone Water filter 71 is supplied to the Ozone Water ultrasonic waves for cleaning with nozzle 55.In addition, hydrogen water supply pipe arrangement 66 and regenerated hydrogen water supply pipe arrangement 76 are connected to hydrogen water ultrasonic waves for cleaning the place ahead with nozzle 56, can utilize valve 80 to switch, perhaps fresh hydrogen water be imported to hydrogen water ultrasonic waves for cleaning, perhaps regenerated hydrogen water be imported in this nozzle with in the nozzle 56.Same Ozone Water supply pipe arrangement 68 and regeneration Ozone Water supply pipe arrangement 78 are connected to Ozone Water ultrasonic waves for cleaning the place ahead with nozzle 55, can utilize valve 81 to switch, perhaps fresh Ozone Water be imported to the Ozone Water ultrasonic waves for cleaning with importing in this nozzle 55 in the nozzle 55 or with the Ozone Water of regenerating.In addition, hydrogen water and the Ozone Water by each filter 70,71, although removed particle wherein, but because the lowering of concentration of the contained gas in the liquid, so also can turn back to hydrogen water making device and Ozone Water manufacturing installation, supplemental hydrogen water and ozone once more through pipe arrangement.
At the sidepiece of cleaning part 52, magazine 58 is set removably, unload magazine 59.These two box 58,59 shapes are identical, can hold a plurality of substrate W, hold the substrate W of (before the wet processed) before cleaning in magazine 58, hold the substrate W that cleans finish (after the wet processed) in unloading magazine 59.Simultaneously, cleaning part 52 with magazine 58, unload magazine 59 positions in the middle board carrying machine people 57 be set.Board carrying machine people 57 has the arm 82 that the link mechanism of retractable is arranged at its top, and arm 82 can rotate and can lifting, supports and carrying substrate W at the leading section of arm 82.
The cleaning device 51 of said structure for example removes by the operator and sets cleaning nozzle 54,55,56,89 with the interval of substrate W, clean translational speed with nozzle, outside the various cleaning conditions such as the flow of cleaning fluid, control each ground action, turn round automatically by utilizing control part.Thereby, when using this cleaning device 51, if the substrate W before will cleaning is installed on the rotary knife cutter 58, there is initialize switch by the operator, utilizes board carrying machine people 57 that substrate W is transported on the workbench 53 from rotary knife cutter 58, on workbench 53, utilize each washer jet 54,55,56,89 automatically carry out ultraviolet ray successively cleans the Ozone Water ultrasonic waves for cleaning, hydrogen water ultrasonic waves for cleaning, rinsing is cleaned, and after the cleaning, utilizes board carrying machine people 57 to receive and keep and unloads in the magazine 59.
In the cleaning device 51 of this form of implementation, by the cleaning nozzle 55 that is equipped with form of implementation of the present invention, 56, and said nozzle, object being treated relative moving mechanism, the wet processed that can keep above-mentioned form of implementation is with the advantage of nozzle (clean and use nozzle), whole processed of wet processed (cleaning) substrate W.
In addition, because the cleaning device 51 of this form of implementation, its four cleanings nozzle 54,55,56,89 are respectively ultraviolet ray cleans, the Ozone Water ultrasonic waves for cleaning, hydrogen water ultrasonic waves for cleaning, different cleaning method such as rinsing carries out the structure of clean, so can just can implement various cleaning methods with a this device.Thereby, for example utilizing hydrogen water ultrasonic waves for cleaning, ozone ultrasonic cleans removes fine size particles, and then, utilize rinsing one side to wash off and carry out last fine purifiation, like this, the various things that are removed can be cleaned fully and remove attached to the cleaning fluid on the substrate surface.In addition, under the situation of the cleaning device 51 of this form of implementation, use nozzle owing to be equipped with above-mentioned province liquid type to clean, thereby can reduce the use amount of cleaning usefulness, and, clean so can implement the substrate of high efficiency high cleanliness owing to below nozzle, can not be detained liquid.Thereby, can realize being suitable for cleaning device based on the manufacturing line of the various electronic equipments of semiconductor device and LCDs etc.
In addition, technical scope of the present invention is not limited to above-mentioned form of implementation, in the scope that does not exceed purport of the present invention, can carry out various changes.For example, cleaning can be according to suitably change designs such as concrete structures with its shape of nozzle and size etc.And then, in above-mentioned form of implementation, illustrated with nozzle of the present invention, but also can be used for removing wet processed the cleaning to nozzle of the present invention that resist etc. is removed in for example etching as the example that cleans with nozzle.
The 6th kind of form of implementation of the present invention is described with reference to the accompanying drawings.
[the 6th kind of form of implementation]
Figure 13 is the overall perspective structure figure that schematically represents the cleaning device (wet type processing device) as form of implementation of the present invention, and Figure 14 is the diagram of expression along the cross-section structure of ground shown in Figure 13 B-B '.In addition, Figure 15 observes Figure 13 from substrate W side, waits shown in 14 and cleans the vertical view of being seen with nozzle at 111,111 o'clock.As Figure 13 and shown in Figure 14, the cleaning device of this form of implementation is roughly by the processed substrate W as object being treated is constituted along travel mechanism's (not shown) that moving direction A moves with respect to cleaning with nozzle 111,111.
Figure 13～cleaning shown in Figure 15 nozzle 111,111 respectively by flat substrate (liquid contact plate) 112, surround this substrate 112 periphery, be configured in the spaced walls member 121 on the substrate 112, be configured in the support plate 117 on the spaced walls member 121 and the mechanism that causes vibration 123 that is arranged on the face of opposition side that substrate 112 is positioned at processed substrate W constitutes.
Substrate 112 is according to the kind of the clean that will carry out processed substrate W, with formations such as glass substrate such as substrate metal substrate, quartz such as stainless steels.As Figure 14 and shown in Figure 15, this substrate 112 is the members that form the face that contacts with treatment fluid with processed substrate W subtend in the washer jet 111, along the long limit end of its both sides, forms a plurality of treatment fluid introducing ports 126 and treatment fluid and reclaims mouth 127.In more detail, be positioned at substrate 112 on the face on the opposition side of processed substrate W, carve along the long limit end of its both sides and in plan view, to be rectangular slot part 112A and 112B, be penetratingly formed a plurality of treatment fluid introducing ports 126 from the bottom surface of this slot part 112A to processed substrate W side, be penetratingly formed a plurality of treatment fluids from the bottom surface of slot part 112B to processed substrate W side and reclaim mouthfuls 127.Use in the nozzle 111 in the cleaning of this form of implementation, to processed substrate W providing chemical liquid (clean and use treatment fluid) 120, reclaim mouth 127 from processed substrate W recovery cleaning fluid 120 through treatment fluid by treatment fluid introducing port 126.Clamping substrate 112 between this treatment fluid introducing port 126 and treatment fluid recovery mouth 127 and the zone of processed substrate W, constitute the processing region 115 of the cleaning device of this form of implementation, be used to clean (wet processed) in abutting connection with the surface of the processed substrate W of this processing region 115.
In addition, each cleans with distance (interval that the liquid contact plate of nozzle contacts with the liquid) x between the substrate 112 of nozzle 111, and in the scope of 0.1～8mm, and each cleans with the substrate 112 of nozzle 111 identical with the distance of processed substrate W.
Above-mentioned treatment fluid introducing port 126 and treatment fluid reclaim mouthful 127 interval and apertures that have regulation respectively, supply cleaning fluid 120 equably on the Width (length direction of substrate 112) of processed substrate W, and can reclaim.In Figure 15, as an example, express 15 treatment fluid introducing ports 126 (treatment fluid reclaims mouth 127) in same aperture are uniformly-spaced arranged the example of formation along the length direction of slot part 112A (slot part 112B), but be not limited to this aperture, interval and shape, can make the flow of treatment fluid 120 even as long as reclaim the orientation (length direction of substrate 112) of mouth 127 at these treatment fluid introducing ports 126, treatment fluid, can make shape and arrangement pitch arbitrarily.
It is preferably hydrophilic that aforesaid substrate 112 is positioned at the face of processed substrate W side at least, and running through treatment fluid introducing port 126 that substrate 112 forms and treatment fluid, to reclaim mouthfuls 127 medial surface also preferably hydrophilic.Surface by making the substrate 112 that constitutes processing region 115 is hydrophilic, and the liquid stream that makes the treatment fluid 120 in the processing region 115 can improve its control performance along cunning.Be hydrophilic by the inner surface side that makes treatment fluid introducing port 126 and treatment fluid reclaim mouth 127 in addition, can make the importing of treatment fluid 120 is along sliding with reclaiming, and can make the liquid of treatment fluid 120 flow more stable.
Be located at the spaced walls member 11 on the substrate 112, as Figure 14, shown in 15, in plan view, be roughly the frame shape, the part of its circumference is projected into substrate 112 to outer circumferential side, and its peripheral part is in the same plane in the face that the face and the substrate 112 of processed substrate W side is positioned at processed substrate W side simultaneously.
That is, in other words, substrate 112 is coupled in the ladder difference portion that forms on the inner peripheral surface of the processed substrate W of being in of spaced walls member 121 side.On the side spaced walls member 121, grow limit, run through the thickness direction of spacer member 121, form hollow bulb 121A respectively along two, 121B, these hollow bulbs 121A, 121B corresponding to be formed on the substrate 112 in plan view for rectangular slot part 112A, on the position of 112B with basically with each slot part 112A, the formation that 112B is identical forms, hollow bulb 121A and slot part 112A, hollow bulb 121B is communicated with respectively with slot part 112B.Simultaneously, reclaim the part of mouth 127 as treatment fluid recoverer 114 to comprise hollow bulb 121A and treatment fluid introducing port 126 and treatment fluid.Treatment fluid 120 can be stored in these hollow bulbs 121A, in the 121B, can be at treatment fluid introduction part 113 places more equably to treatment fluid introducing port 126 providing chemical liquids 120, and can be at treatment fluid recoverer 114 more equably from treatment substrate W recycle process fluids 120.
Above-mentioned spaced walls 121 for example, preferably constitutes with hydrophobic materials such as ethylene fluorides.Because by utilizing hydrophobic material to constitute spaced walls member 121, easily treatment fluid 120 is enclosed in the outer circumferential side that surrounds substrate 112, with spaced walls member 121 area inside (processing region 115) of processed substrate W subtend in, so can improve the control performance of the liquid stream of the treatment fluid 120 in the processing region 115, treatment fluid 120 is more stably flowed.In addition, owing to can suppress the amount of the treatment fluid 120 that flows out to the outside of processing region 115, thereby, except that the use amount that can reduce treatment fluid 120, can also suppress adhering to again of the interior particle of treatment fluid 120.
On the upside that is positioned at Figure 14 of spaced walls member 121, support plate 117 is set, on the central portion of the length direction of this support plate 117, extend set handling liquid ingress pipe 117A and treatment fluid recovery tube 117B along (top among the figure) on the direction opposite with spaced walls member 121 sides, the inside of these treatment fluid ingress pipes 117A and the inside of treatment fluid recovery tube 117B are run through support plate 117 and are communicated with the opposition side of support plate 117.Simultaneously, the side that is positioned at support plate 117 of treatment fluid ingress pipe 117A, be configured in the top of hollow bulb 121A, the inside of treatment fluid ingress pipe 117A is communicated with hollow bulb 121A, the side that is positioned at support plate 117 of treatment fluid recovery tube 117B is configured in the upside of hollow bulb 121B, and the inside of treatment fluid recovery tube 117B is communicated with hollow bulb 121B.
Like this, use in the nozzle 111 in the cleaning of this form of implementation, treatment fluid 120 is by being directed to processed substrate W via hollow bulb 121A and slot part 112A to the path of treatment fluid introducing port 126 from treatment fluid ingress pipe 117A, and treatment fluid 120 is recovered and is discharged to the outside by the path of reclaiming mouthfuls 127 from treatment fluid, arrive treatment fluid recovery tube 117B via slot part 112B and hollow bulb 121B from processed substrate W.
In order to prevent at hollow bulb 121A, the leakage of the treatment fluid 120 that flows in the 121B, spacer portion member 121 and substrate 112 shown in Figure 14, and the composition surface of spaced walls member 121 and support plate 117 utilizes sealings such as encapsulant (not shown).The sealing on composition surface, if treatment fluid 120 without the composition surface to external leaks, its material and structure are had no particular limits, for example, the O ring can be set on these composition surfaces, also can be on the composition surface coating adhesive etc. seal.
Cleaning nozzle 111 in this form of implementation, in 111, by each substrate 112, support plate 117, hold in the space S that spaced walls member 121 surrounds that vibration is applied to the vibration imparting mechanism of using on the treatment fluid 120 123, its face joins on the inner surface of substrate 112.In addition, the cable 128 that drive, imparting mechanism 123 usefulness is vibrated in control is connected on the vibration imparting mechanism 123, this cable 128 runs through support plate 117, is exported to the outside of cleaning with nozzle 111 in the end side of support plate 117, is connected on the not shown drive control part.As this vibration imparting mechanism 123, can adopt the hyperacoustic ultrasonic oscillator that produces about vibration frequency 0.2～1.5MHz and produce the Langevin formula oscillator etc. that vibration frequency is hyperacoustic bolted of the lower frequency about 28～200KHz, can select optimum frequency according to the purpose of kind that is cleaned substrate W and cleaning.
In this form of implementation, give the size of cleaning by each vibration imparting mechanism 123 with the vibration of nozzle 111,111, frequency and phase place are substantially the same.In addition, cleaning is substantially the same with the distance between the processed substrate W with each substrate (liquid contact plate) 112 of nozzle 111,111.Thereby, give symmetrical vibration to processed substrate W.
Specifically, the oscillator of same specification is connected on the identical oscillator, makes it symmetry by the subtend vibration.
In addition, use in the nozzle 111,111, on the treatment fluid recovery tube 117B of each support plate 117, not shown pressure control part is set in the cleaning of this form of implementation.The effect of this pressure control part is, after clean, to be recycled to treatment fluid recovery mouth 127 in order making, to make the pressure (also comprising the surface tension of treatment fluid and the surface tension of processed substrate surface) and atmospheric pressure balance of the treatment fluid that contacts with atmosphere 120 of treatment fluid introducing port 126 sides from the treatment fluid 120 that contacts with processed substrate W of treatment fluid introducing port 116 supplies.More particularly, this pressure control part can be made of the drawdown pump that is connected on the treatment fluid recovery tube 117B, attracts the attraction of the treatment fluid 120 in the treatment fluid recovery tube 117B to reach above-mentioned and atmospheric balance by utilizing this drawdown pump control.Like this, be directed to the outside that processing region 115 interior treatment fluids 120 can not drain to treatment fluid 115, be recycled to treatment fluid and reclaim in the mouth 127.That is, the treatment fluid 120 that is directed to processed substrate W does not contact the zone beyond the processed substrate W surface in the processing region 115, is recycled in the treatment fluid recoverer 114.
In the cleaning device of this form of implementation of above structure, since clean with nozzle 111 with the face of processed substrate W subtend on placement substrate 112, run through this substrate 112 and form treatment fluid introducing port 126 and treatment fluid recovery mouth 127, thereby face that contacts with the processing region 115 that reclaims mouth 127 from treatment fluid introducing port 126 to treatment fluid and substrate 112 are in same plane.That is, treatment fluid introducing port 126 is in the end of processed substrate W side, and substrate 112 forms in the same plane of side in the end that the face of processed substrate W side and treatment fluid reclaim mouthfuls 127 processed substrate W side.By making this structure, bubble is in treatment fluid 120 is sneaked into processing region 115 time, and the position that does not have this bubble to be detained can not cause that the liquid stream of treatment fluid 120 interrupts because of the delay of bubble.Thereby the cleaning of adopting this form of implementation can stably keep the liquid stream of the treatment fluid 120 in the processing region 115 with nozzle 111 and cleaning device, can stablize and cleans processed substrate W equably.
In addition, use in the nozzle 111 in the cleaning of said structure, owing under the state that treatment fluid 120 is fed in the processing region 120, award vibration by the vibration imparting mechanism, so, treatment fluid 120 and this vibration one are worked processed substrate W is cleaned, further improve cleaning efficiency.
Simultaneously, owing to make it vibration, can add large amplitude with symmetrical manner on the two sides of object being treated.Thereby, generate air pocket easily, utilize the high velocity stream that obtains by air pocket can improve wet processed effects such as cleaning.
In addition, owing to each cleans with distance (interval of liquid contact plate and the liquid contact plate) x between the substrate 112 of nozzle 111 below 8mm, and the interval of matrix 112 and processed substrate W is more than 0.1mm, so can carry out wet processed expeditiously.In addition, when carrying, can avoid 2 contacts of two nozzles and processed substrate W.
In addition,, can carry out the cleaning on the two sides of processed substrate W simultaneously, can be suppressed to minimum to the pollution of the processed substrate W after cleaning by cleaning the both sides that are configured to processed substrate W with nozzle 111.
In addition, the cleaning that is configured in the following side of processed substrate thing forms to processed substrate W side slightly highlightedly with the surface that the spaced walls member 121 of nozzle 111 can side group plate 112 be positioned at processed substrate thing side.Adopt this structure, compare with nozzle with the cleaning of the upside that disposes the processed substrate W of side, even the downside of difficulty cleans with in the nozzle treatment fluid 120 being kept relatively in processing region 115, also can be closed to treatment fluid 120 in the processing region 115 at an easy rate, can further improve the stability of the liquid stream of treatment fluid 120.
Wet processed according to the present invention must be bigger the thickness setting of vibration section with nozzle and wet type processing device, distribute by ultrasonic vibration produce heat, can prevent that ultrasonic oscillator from getting temperature and rising.Therefore, even getting to exist on processed at object being treated is involved in bubble, does not have treatment fluid to get when regional, also can prevent the overheated breakage that causes of ultrasonic oscillator.
And then wet processed according to the present invention owing to will make specific value between the thickness of vibration section between ultrasonic oscillator and the treatment fluid and/or lining portion, can not reduce the transmitance of ultrasonic vibration with nozzle and wet type processing device in vain.Thereby, make the danger that reduces the damage ultrasonic oscillator, and the wet processed that can carry out wet processed expeditiously is with nozzle and wet type processing device.
In addition, in the present invention, in the wet type processing device of economizing the liquid type, the vibration condition when suitably selecting to give vibration from the two sides of processed substrate.Thereby, adopt the present invention, can realize the wet processed that treatment effect is good and efficient is high of two faces of object being treated.

Claims (6)

1, a kind of wet processed nozzle, have and to carry out treatment fluid that wet processed uses inlet opening part to object being treated to processed supply of aforementioned object being treated, with the discharge liquor of the aforementioned processing liquid after the aforementioned wet processed outlet opening portion, it is characterized by from aforementioned processed discharge
Described nozzle is equipped with gives the ultrasonic oscillator that the aforementioned processing liquid on aforementioned processed is used with ultrasonic vibration, the vibration section that is connected with this ultrasonic oscillator, aforementioned vibration section is arranged on the aforementioned object being treated side of aforementioned ultrasonic oscillator at least, and the relation of the wavelength X of the aforementioned ultrasonic vibration at the gauge T of the aforementioned vibration section of this object being treated side and place, this vibration section is set to
T=(n ± 0.1) λ/2, wherein, n is the integer below 7 more than 4.
2, wet processed nozzle as claimed in claim 1 is characterized by, and the relation of the wavelength X of the aforementioned ultrasonic vibration at the gauge T of the aforementioned vibration section of aforementioned object being treated side and place, this vibration section is set to
T＝(5±0.1)·λ/2。
3, wet processed nozzle as claimed in claim 1 or 2 is characterized by, and the aforementioned object being treated side in abutting connection with aforementioned vibration section is provided with lining portion.
4, wet processed nozzle as claimed in claim 3 is characterized by, and constitutes aforementioned lining portion, makes the surface of aforementioned object being treated side have anti-reactivity and/or thermal endurance to aforementioned processing liquid.
5, wet processed nozzle as claimed in claim 3 is characterized by, and the gauge T ' of aforementioned lining portion and this lining portion locate the wavelength X of aforementioned ultrasonic vibration ' relation be set in following any one
T’≤λ’/20
T’＝(1±0.1)·λ’/2。
6, wet processed nozzle as claimed in claim 1 is characterized by, and aforementioned vibration section is arranged on the aforementioned object being treated side and opposition side both sides thereof of aforementioned ultrasonic oscillator.
CNB021418845A 2001-09-04 2002-08-27 Spraying nozzle for wet processing, wet processing apparatus and method Expired - Fee Related CN1241241C (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001267799 2001-09-04
JP2001267799 2001-09-04
JP2002000758A JP2003200120A (en) 2002-01-07 2002-01-07 Device and method of wet treatment
JP2002000758 2002-01-07
JP2002079775 2002-03-20
JP2002079775A JP4063562B2 (en) 2001-09-04 2002-03-20 Wet processing nozzle and wet processing apparatus

Publications (2)

Publication Number Publication Date
CN1404107A CN1404107A (en) 2003-03-19
CN1241241C true CN1241241C (en) 2006-02-08

Family

ID=27347437

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB021418845A Expired - Fee Related CN1241241C (en) 2001-09-04 2002-08-27 Spraying nozzle for wet processing, wet processing apparatus and method

Country Status (2)

Country Link
KR (2) KR100490759B1 (en)
CN (1) CN1241241C (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG166038A1 (en) * 2003-06-24 2010-11-29 Lam Res Ag Device and method for wet treating disc-like substrates
JP3984196B2 (en) * 2003-06-24 2007-10-03 アルプス電気株式会社 Ultrasonic vibration device and wet processing device using the same
KR100722789B1 (en) * 2006-09-29 2007-05-29 아프로시스템 주식회사 Megasonic cleaning apparatus for flat panel display
KR101599214B1 (en) 2014-07-28 2016-03-15 한국기계연구원 Ultrasonic cleaning apparatus for large area

Also Published As

Publication number Publication date
CN1404107A (en) 2003-03-19
KR20040088000A (en) 2004-10-15
KR100490759B1 (en) 2005-05-19
KR20030020829A (en) 2003-03-10
KR100502751B1 (en) 2005-07-21

Similar Documents

Publication Publication Date Title
CN1084525C (en) Cleaning apparatus and cleaning method
TWI447832B (en) Equipment and methods for cleaning objects
US8083856B2 (en) Ultrasonic cleaning apparatus and ultrasonic cleaning method
CN100350552C (en) System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
CN1618119A (en) Apparatus and method for single- or double- substrate processing
CN1653211A (en) Electropolishing and/or electroplating apparatus and methods
CN1622281A (en) Method for producing semiconductor device and cleaning device for resist stripping
CN1773673A (en) Substrate processing apparatus and substrate processing method
CN1685471A (en) Methods and systems for processing a substrate using a dynamic liquid meniscus
CN1191385A (en) Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method
CN1833314A (en) Substrate processing apparatus, substrate processing method, and substrate holding apparatus
CN1153264C (en) Object separating apparatus and method, and method of manufacturing semiconductor substrate
CN101061574A (en) Substrate treatment apparatus
CN86105419A (en) Gaseous process and equipment from the substrate removing films
US7040330B2 (en) Method and apparatus for megasonic cleaning of patterned substrates
CN1223463A (en) Porous region removing method and semiconductor substrate manufacturing method
CN1269601A (en) Anodization apparatus, anodization system, and apparatus and method for treating matrix thereof
CN1579010A (en) CVD apparatus and method of cleaning the CVD apparatus
CN1208672A (en) Apparatus and method of separating sample and substrate fabrication method
CN1160761C (en) Sample processing system
CN1127753C (en) Sample processing system
CN1579011A (en) Cvd apparatus and method of cleaning the cvd apparatus
CN1241241C (en) Spraying nozzle for wet processing, wet processing apparatus and method
CN1258093A (en) Sample processing system
CN1579005A (en) Apparatus and method for depositing and planarizing thin films of semiconductor wafers

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060208

Termination date: 20120827