CN1233983C - Two dimensions length measurement unit - Google Patents
Two dimensions length measurement unit Download PDFInfo
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- CN1233983C CN1233983C CN 02147846 CN02147846A CN1233983C CN 1233983 C CN1233983 C CN 1233983C CN 02147846 CN02147846 CN 02147846 CN 02147846 A CN02147846 A CN 02147846A CN 1233983 C CN1233983 C CN 1233983C
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- diffraction grating
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- optical interference
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Abstract
The present invention relates to a two-dimension length measurement unit which comprises a position detecting device and a signal processing circuit. The present invention is characterized in that the position detecting device comprises an orthogonal diffraction grating, a reflecting mirror, a laser, a rectangular prism, an optical interference amplifying system and a photoelectric receiver, wherein the orthogonal diffraction grating and an X-Y plane surface to be measured are fixed together, and the reflecting mirror, the laser, the rectangular prism, the optical interference amplifying system and the photoelectric receiver are positioned on the same optical path. The present invention uses the orthogonal diffraction grating as a two-dimension displacement measuring sensor so that a measuring system has the characteristics of extremely small Abel error and extremely high resolution; the orthogonal diffraction grating and the two-dimension plane surface to be measured are fixed together so as to move along with the measured two-dimension plane surface; the optical system and the photoelectric receiving element which are positioned in the detecting unit and a counting subdivision circuit are used for accurately measuring displacement in the X direction and the Y direction which are mutually orthogonal. In a word, the length measurement unit can be widely used for the aspects of the photoetching technique of semiconductors and ultraprecision machining, micro-manufacture, micro-electromechanical systems, the measurement of surface topography, the measurement of nanometer level coordinates, etc., and the present invention has the advantages of wide work range and high measuring precision.
Description
Technical field
The present invention relates to a kind of measurement mechanism, specifically, is that a kind of two dimension is surveyed long unit, and wide region, the nano-grade displacement location of two orthogonal directionss in the arbitrary plane can be realized in the long unit of this survey.
Background technology
The development of micro-electromechanical technology has proposed more and more higher requirement to precision positioning, and high-precision metering feedback unit must have been arranged in Precision Position Location System.Existing long stroke, nanoscale length measurement system great majority adopt double-frequency laser interferometry ([1] Kuang-chao Fan of system, Mu-Jung Chen.A6-degree-of-freedom measurement system for the accuracy of X-Ystages.Precision Engineering 24 (2000): 15 ~ 23) as the feedback measurement links, this system bulk is big---generally all more than the hundreds of millimeter, and each dimension measurement all needs the independent measuring system of a cover, when being used for multidimensional measure, installation is difficult to meet abbe ' s principle, therefore this system is difficult to be integrated in the miniature coordinate measuring set, and cost is higher.
Summary of the invention
The object of the present invention is to provide a kind of two dimension that can overcome above-mentioned defective to survey long unit, the long unit of this survey can be widely used in the aspects such as photoetching technique, little manufacturing, MEMS (micro electro mechanical system), measuring surface form and nanoscale measurement of coordinates of semiconductor and ultraprecise processing, and its working range is big, measuring accuracy is high.
For achieving the above object, a kind of two dimension is surveyed long unit, comprise position detecting device and signal processing circuit, it is characterized in that described position detecting device comprises the cross diffraction grating that is fixed together with X-Y plane to be measured and the catoptron, laser instrument, right-angle prism, optical interference amplification system and the photelectric receiver that are positioned on the same light path.The light beam that laser instrument sends impinges perpendicularly on cross diffraction grating, through inciding respectively behind the cross diffraction grating diffraction on 4 catoptrons, converge in twos after reflection in the 2 cover optical interference amplification systems and interfere, and received by thereafter 2 photelectric receivers respectively, again counting in signal processing circuit thereafter and A/D sub-circuit, obtain the displacement of X mutually orthogonal in same plane, Y both direction.
The center of above-mentioned 4 catoptrons lays respectively at the x of cross diffraction grating and the y intersection point place to ± 1 order diffraction light and cabinet wall, laser instrument, right-angle prism, optical interference amplification system and photelectric receiver are positioned on the normal at tank floor center, and the bottom surface normal of casing when vertical with plane, cross diffraction grating place technique effect of the present invention better.
The present invention adopts cross diffraction grating as the two-dimension displacement survey sensor, and it is minimum to make measuring system have Abel's error, the characteristics that resolution is high.Cross diffraction grating and tested two dimensional surface are fixed together, and move the displacement of accurately measuring mutually orthogonal X, Y both direction by detecting unit inner optical system, photoelectric receiving device and count fine parallel circuit thereafter with tested two dimensional surface.In a word, the long unit of this survey can be widely used in the aspects such as photoetching technique, little manufacturing, MEMS (micro electro mechanical system), measuring surface form and nanoscale measurement of coordinates of semiconductor and ultraprecise processing, and its working range is big, measuring accuracy is high.
Description of drawings
Fig. 1 surveys the structural representation of long unit for the present invention's two dimension;
Fig. 2 is cross diffraction grating measuring principle figure.
Embodiment
The present invention is further detailed explanation below in conjunction with accompanying drawing.
The present invention includes position detecting device and signal processing circuit two parts, wherein, signal processing circuit comprises grating signal amplification treatment circuit, counting and A/D sub-circuit and computing machine, and is basic identical with prior art.The structural representation of position detecting device comprises cross diffraction grating 1, catoptron 2, laser instrument 3, right-angle prism 4, optical interference amplification system 5 and photelectric receiver 6 as shown in Figure 1.
Cross diffraction grating measuring principle figure is as shown in Figure 2: the light beam that is sent by laser instrument 3 enters cross diffraction grating 1 by collimation lens L, form+1 (x) ,-1 (x) ,+1 (y) ,-1 (y) four bundles 1 order diffraction light, x and y to ± reflection by catoptron 2_1,2_3 and 2_2,2_4 respectively of 1 order diffraction light, directive right-angle prism 4, after right-angle prism 4 reflections, entering optical interference amplification system 5 interferes, interfere light to enter photelectric receiver 6, produce the signal of reflection x, the displacement of y direction.
Claims (2)
1, a kind of two dimension is surveyed long unit, comprise position detecting device and signal processing circuit, it is characterized in that described position detecting device comprises the cross diffraction grating (1) that is fixed together with X-Y plane to be measured and is positioned at catoptron (2), laser instrument (3), right-angle prism (4), optical interference amplification system (5) and photelectric receiver (6) on the same light path; The light beam that laser instrument sends impinges perpendicularly on cross diffraction grating (1), behind cross diffraction grating (1) diffraction, incide respectively on 4 catoptrons (2), converge in twos after reflection in the 2 cover optical interference amplification systems (5) and interfere, and received by thereafter 2 photelectric receivers (6) respectively, again counting in signal processing circuit thereafter and A/D sub-circuit, obtain the displacement of X mutually orthogonal in same plane, Y both direction.
2. the long unit of survey according to claim 1, it is characterized in that: described 4 catoptron (2_1,2_2,2_3, center 2_4) lays respectively at the x of cross diffraction grating (1) and the y intersection point place to ± 1 order diffraction light and casing (7) inwall, laser instrument (3), right-angle prism (4), optical interference amplification system (5) and photelectric receiver (6) are positioned on the normal of casing (7) bottom center, and the bottom surface normal of casing (7) is vertical with cross diffraction grating (1) plane, place.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02147846 CN1233983C (en) | 2002-12-13 | 2002-12-13 | Two dimensions length measurement unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02147846 CN1233983C (en) | 2002-12-13 | 2002-12-13 | Two dimensions length measurement unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1431461A CN1431461A (en) | 2003-07-23 |
| CN1233983C true CN1233983C (en) | 2005-12-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02147846 Expired - Fee Related CN1233983C (en) | 2002-12-13 | 2002-12-13 | Two dimensions length measurement unit |
Country Status (1)
| Country | Link |
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| CN (1) | CN1233983C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100561115C (en) * | 2006-12-01 | 2009-11-18 | 西安交通大学 | Measurement mechanism and measuring method based on machine vision and planar grid encoder |
| CN102280000B (en) * | 2011-06-14 | 2013-02-13 | 常州第二电子仪器有限公司 | Laser alarm |
| CN104359410B (en) * | 2014-12-01 | 2017-05-17 | 清华大学 | Displacement measurement system capable of measuring by virtue of rotatable grating |
| CN108387250A (en) * | 2018-03-28 | 2018-08-10 | 中铁十局集团第二工程有限公司 | Two-dimentional micrometer device and system |
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2002
- 2002-12-13 CN CN 02147846 patent/CN1233983C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN1431461A (en) | 2003-07-23 |
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