CN101169601B - Focusing leveling measuring system - Google Patents
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- CN101169601B CN101169601B CN2007101707486A CN200710170748A CN101169601B CN 101169601 B CN101169601 B CN 101169601B CN 2007101707486 A CN2007101707486 A CN 2007101707486A CN 200710170748 A CN200710170748 A CN 200710170748A CN 101169601 B CN101169601 B CN 101169601B
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Abstract
The invention relates to a measuring system of focusing and leveling and consists of a light source module (1), an illuminating optical module (2), an objective grating (3), a first imaging module (4), a first offset panel (5), a measured object (6), a second offset panel (7), a second imaging module (8), a DRC module and still a detecting module (12), wherein, the DRC module consists of a beam splitter (9) and an image inverter (10). Compared with the prior measuring system of focusing and leveling, the invention has higher stability, repeatability and measuring accuracy and can average the measurement error on the measured object (6) caused by an uneven local reflectivity as well as the measurement error caused by the light-intensity variation of the light source and the integral variation of the reflectivity of the measured object. In addition, the invention has the advantages of simple structure and poorer sensibility to the measured object.
Description
Technical field
The present invention relates to a kind of measuring system, relate in particular to a kind of measuring system that is used for the photo-etching machine focusing leveling.
Background technology
Litho machine is one of visual plant of large scale integrated circuit production, and as shown in Figure 1, its function is that the figure on the mask plate is transferred on the silicon chip 6 (silicon chip is made a general reference all here and is exposed object, comprises substrate, plated film and photoresist) by a certain percentage.Focusing and leveling measuring system 102 is one of important subsystems of litho machine, it is responsible for measuring the surface position information of silicon chip, so that with the work stage system 104 of clamping silicon chip the zone that is exposed of silicon chip is within the depth of focus of photo-etching machine objective lens system 103, and the figure on the mask plate 101 is transferred on the silicon chip ideally always.
Along with the resolution of projection mask aligner improves constantly, depth of focus constantly reduces, to the measuring accuracy of litho machine interior focusing leveling subsystem with can to measure performance demands such as exposure area in real time also more and more higher, the implementation method of the focusing and leveling measuring system of form such as baroceptor and capacitive transducer has been difficult to meet the demands, therefore the focusing and leveling measuring system that is adopted in the step-scan at present is photoeletric measuring system, as: based on the photoelectric measurement method (U.S. Pat 5191200) of grating and 4 quadrant detector, photo-detection method (U.S. Pat 6765647B1) based on slit and 4 quadrant detector, based on pin hole and area array CCD (Charge Coupled Device, charge-coupled image sensor) photo-detection method (U.S. Pat 6081614) and based on PSD (Position Sensitive Device, position sensitive detector) photoelectric measurement method (Chinese patent: 200610117401.0 and Focusing and leveling system using PSDs for thewafer steppers.Proc.SPIE, 1994,2197:997-1003.).
For above-mentioned these existing focusing and leveling measuring systems, their system is all comparatively complicated, and except U.S. Pat 5 191200 other all be non-difference measurement system, measurement stability is relatively poor relatively.And in above-mentioned these existing focusing and leveling measuring systems, except that the measuring accuracy based on other focusing and leveling measuring system the photo-detection method (U.S. Pat 6765647B1) of slit and 4 quadrant detector all can be subjected to the influence of the local reflectance inequality of single measurement hot spot inside on the measurand and produce measuring error.
Summary of the invention
Adopted the detection of similar Moire fringe among the present invention, eliminated of the influence of measurand local reflectance inequality, improved the measuring accuracy of whole measuring system and insensitive the variation of measurand to the focusing and leveling measuring system measuring accuracy.
A kind of focusing and leveling measuring system, comprise light source module, illumination optics module, thing grating, first image-forming module, the first biasing flat board, measurand, dull and stereotyped and second image-forming module of second biasing, also comprise DRC module and detecting module, wherein the DRC module also comprises beam splitter and image inverter; Described beam splitter, the light beam that is used for entering the DRC module is divided into two bundles, and a branch of direct imaging is at the detecting module place, and another bundle enters image inverter; Described image inverter is used for being imaged on the detecting module place with after entering its light beam inverted image; Described detecting module is used to survey the positional information of measurand;
Described first image-forming module and second image-forming module are the imaging system of picture Fang Yuanxin at least measurand one side.
Wherein said detecting module comprises two groups of probe units, and described two groups of probe units are separated by half Moire fringe cycle and place perpendicular to the moving direction of Moire fringe.
Wherein said detecting module also can include only one group of probe unit, and described one group of probe unit is placed perpendicular to the moving direction of Moire fringe.
Wherein said probe unit is the unit energy detector array.
Wherein said first biasing is dull and stereotyped and second biasing is dull and stereotyped, is used to regulate the measurement zero point of focusing and leveling measuring system, and when adjusting, relatively rotate and regulated quantity identical.
The present invention is meant compared with prior art to have the following advantages and good effect owing to adopted above technical characterictic:
1, adopted from the difference principle, improved the repeated and stable of whole measuring system;
2, adopt similar Moire fringe detection method, helped improving resolution, and can on average fall the part of measurand and the error that whole reflectivity inequality causes;
Description of drawings
Fig. 1 is the litho machine synoptic diagram;
Fig. 2 is new focusing and leveling systematic schematic diagram;
Fig. 3 is the DRC module diagram;
Fig. 4 (a) is the picture that does not have the thing grating of inverted image;
Fig. 4 (b) is the picture of the thing grating of process inverted image;
Fig. 4 (c) is the relation of the position between two gratings that do not have relative tilt;
Fig. 4 (d) is the relation of the position between two gratings that relative tilt is arranged;
Fig. 5 (a) is the synoptic diagram of one of DRC module embodiment;
Fig. 5 (b) is the relation between the image planes place two beam splitting coordinate systems;
Fig. 6 is the concrete selection and the position of probe unit;
Fig. 7 is a probe unit output signal synoptic diagram.
Embodiment
Principle of the present invention as shown in Figure 2, this focusing and leveling measuring system is a photoeletric measuring system based on principle of triangulation, X-Y-Z coordinate wherein is a right hand rectangular coordinate system, wherein the Z axle is along the optical axis 105 of projection lens of lithography machine, as shown in Figure 1.The principle of work of this focusing and leveling measuring system is to have carried the positional information of measurand 6 along the Z axle after detecting light beam is by measurand 6 reflections, and the detecting light beam that carries positional information is detected by the detecting module of surveying along the M axle 12.Can obtain the Z of measurand 6 upper surfaces, Rx (rotating), the information of Ry (around the rotation of Y-axis) by multimetering around X-axis.
Shine on the thing grating 3 after light process beam lighting optical module 2 shapings that light source module 1 sends among Fig. 2; Thing grating 3 is imaged onto tested silicon chip (making a general reference all measurands here) 6 places by first image-forming module 4, forms at silicon chip 6 upper surfaces and measures hot spot.Wherein first image-forming module 4 and second image-forming module 8 are imaging systems of picture Fang Yuanxin in a side of silicon chip 6 at least.And the effect of dull and stereotyped 5 and second biasing dull and stereotyped 7 of first biasing here mainly is the measurement zero point that is used for regulating this focusing and leveling measuring system, dull and stereotyped 5 and second biasing dull and stereotyped 7 of first biasing should guarantee that it can relatively rotate when regulating, and regulated quantity is identical.The detection hot spot at silicon chip 6 upper surface places is imaged onto detecting module 12 places by second image-forming module 8 once more.Wherein dull and stereotyped 7, second image-forming module 8 of second biasing generally is the identical device of structure with dull and stereotyped 5, first image-forming module 4 of first biasing, and symmetric arrangement.Before arriving on the detecting module 12, also passed through DRC (Divider-Reverser-Combiner, beam splitting-inverted image-close bundle) module from the light beam of second image-forming module, 8 outgoing.Wherein DRC module significant feature is that imaging beam with 8 outgoing of second image-forming module is divided into two bundles, a branch of direct imaging is (the detection operations face of module 12 should be positioned on the image planes of module 8) on the detecting module 12, and another bundle is upside down in detecting module 12 places through behind the inverted image along the M direction.
The DRC module is general main to be made of beam splitter 9, image inverter 10 and bundling device 11, and bundling device 11 also can omit under certain conditions certainly.Enter the DRC light beam and at first be divided into two-beam by a certain percentage according to energy by beam splitter 9, wherein a branch of by image inverter 10 along M axle inverted image, another bundle does not have through any processing; Then, two-beam is synthesized by bundling device 11 once more and arrives detecting module 12, as shown in Figure 3.The picture of answering at the corresponding thing grating pair of I and II place is shown in Fig. 4 (a); Behind M axle inverted image, the picture of answering at the corresponding grating pair in position III place is shown in Fig. 4 (b) through image inverter 10; After two beam splitting are synthesized by bundling device 11 once more, if the corresponding picture of two beam splitting does not have angle along the M axle, then the relation of the position between the position IV place two grating pictures is shown in Fig. 4 (c), if between the picture of two beam splitting along the M axle angle is arranged position between position IV place two grating pictures relation shown in Fig. 4 (d), they can form the striped of similar horizontal Moire fringe because when two have certain included angle between as grating, suppose that two cycles as grating were P, the fringe period of the similar Moire fringe that they form is S, when the angle theta between two gratings is very little, S=P/ θ (wherein the unit of θ is a radian) is arranged then.Because Moire fringe has amplification to the cycle of grating, this helps improving the layout of resolution and photodetector, simultaneously Moire fringe also can on average fall the measuring error that the measuring error that the local reflectance inequality on the measurand 6 causes and the foozle of grating itself etc. cause, so the method for leveling and focusing measuring system of the present invention is identical with the way of general detection two grating Moire fringes.
According to the transformation relation of coordinate system as can be known, the Z of measurand 6 upper surfaces is converted into the M of grating picture on detecting module 12 to positional information to information; The Z forward correspondence of measurand 6 the M forward of detecting module 12 place's grating pictures before not inserting the DRC module; After inserting the DRC module, in two pictures that detecting module 12 places become, along M to that picture that is squeezed, its coordinate system also by along M to being inverted, as shown in Figure 3.Like this when measurand 6 is moved z on the Z direction, the picture that is not squeezed along M to move apart from m
1For:
m
1＝αz (1)
The picture that is squeezed along M to move apart from m
2For:
m
2＝-αz (2)
Wherein α is and structure and the overall relevant constant of enlargement ratio.
That is to say when measurand 6 when Z moves z, insert two picture grating relative motions after the DRC module apart from m
1m
2For:
m
1m
2＝2αz (3)
When adopting Moire fringe to measure, the distance that this moment, the class Moire fringe moved
Δ＝2αz/θ (4)
Wherein θ is the angle between two pictures, shown in Fig. 4 (d).
Therefore, when detect with detecting module 12 two picture grating relative motions apart from the time, just can obtain and not insert the DRC module and have only the resolution of twice under the situation that a grating picture moves with measurand 6 before.And these two relevant to moving with the Z of measurand 6 as only relatively moving between the grating, and be not subjected to the influence of the distortion such as mechanical vibration, heat and stress etc. of whole measuring system fully, be that measuring system of the present invention is " from difference " measuring system, eliminated of the influence of above-mentioned factor fully, and compared with traditional optical grating ruler measurement system and to have improved 2 times resolution the measuring repeatability of whole measuring system and stability.
Below in conjunction with a specific embodiment, the unconventional module among the principle of the invention figure is provided specific design and explanation.Because the present invention is the system that adopts multimetering, each point measurement in the multiple spot is identical on principle and the structure, so here only make an explanation based on a measurement point, other measurement point is identical fully therewith from principle, structure etc.
As shown in Figure 2, in the present invention, in except that DRC module and detecting module 12, therefore other module all is general module, at this DRC module and detecting module 12 is provided concrete design and explanation.
Because the measurement range of focusing and leveling Department of Survey is generally all very little, as litho machine for the 100nm node, its whole measurement range is less than 1mm, therefore, in little measurement range, consider the factors such as cost that reduce Project Realization as far as possible, the present invention has provided the specific design scheme of a DRC module as shown in Figure 5.The image planes of final two beam splitting have certain included angle β along optical axis direction in this scheme, generally generally can reduce the value of the θ in the above-mentioned formula (4) as far as possible for the resolution that improves whole measuring system, and β and θ have definite proportional relationship, therefore the β angle generally also needs very little, like this in very little measurement range, because the non-linear of total system that the β angle causes is very little, and this non-linear be determine constant, so can eliminate by demarcating, thereby can eliminate fully from the influence that the β of angle Fig. 5 of Project Realization brings, and the existence at β angle greatly reduces DRC Module Design complexity and has reduced cost.
In Fig. 5, (a) be the specific design synoptic diagram of DRC, (b) be the relative position relation between the corresponding image planes place two beam splitting coordinate systems of this DRC module; Wherein incident light is divided into two divided beams that energy equates by beam splitter 9, and first part of light beam passed through first catoptron 201, and a picture of the thing grating 3 among Fig. 2 becomes to image planes shown in Figure 5 203 places the most at last; After second part of light beam reflected by second catoptron 202, another of thing grating 3 looks like to become image planes 203 places of answering to picture the most at last, as shown in Figure 5, two separately light beam image planes 203 finally intersect on the intersection point of two beam splitting optical axises, and detector module 12 is image planes 203 places that are placed on Fig. 5.Because here beam splitter 9 is semi-transparent semi-reflecting beam splitter, therefore first part of beam splitting is reflected twice and the light of beam splitting for the second time only is reflected once, promptly the number of times that is reflected of two beam splitting light differs and is odd number, according to the imaging characteristics of catoptron as can be known the specific design of the DRC module that provides of Fig. 5 possessed function in the DRC principle schematic shown in Figure 3 fully, the coordinate of two beam splitting and corresponding picture thereof develops relation as shown in Figure 5, can eliminate from project angle fully as for the influence of the angle β between two image planes here.
Detecting module among Fig. 2 can be selected linear CCD or unit energy detector array, as shown in Figure 6.Here, linear CCD is identical with the effect of unit energy detector array, all be used for surveying light intensity, only the general relative small in resolution of size of the pixel cell of CCD (its effect here is equivalent to the unit energy detector in the unit energy detector array) is than higher.Because the measurement range of focusing and leveling measuring system is generally smaller, can make the cycle of adopting a Moire fringe cover the corresponding measurement range of whole focusing and leveling measuring system by design.Because focusing and leveling measuring system here is real-time absolute measuring system, thereby if will adopt a plurality of Mores to cover the measurement range of whole focusing and leveling measuring system the cycle time, should adopt the grating that is similar to absolute grating chi to design the thing grating 3 of system of the present invention, and this form generally there is no need for the measuring system that is similar to the little measurement range of the such high precision of the present invention.Thereby, only introduce the situation that the measurement range of whole focusing and leveling measuring system realizes in the cycle at a corresponding Moire fringe here.As shown in Figure 6, linear CCD or unit energy detector array are placed perpendicular to the moving direction of Moire fringe, and the sensitive direction of linear CCD also is perpendicular to the moving direction of Moire fringe, one group of CCD or unit energy detector array just can meet the demands on view of function, but consider that two groups of such detector cells can eliminate the noise that temperature etc. causes, thereby the effect of two groups of such probe unit realizations is generally better, generally should make such two groups of probe units Moire fringe periodic arrangement of being separated by half, as shown in Figure 6.
And when focusing and leveling measuring system of the present invention is worked, the preliminary signal schematic representation of measuring system as shown in Figure 7, (a) is the signal schematic representation of output when " in vain ", Moire fringe was got on the detecting module among the figure, at this time Zui Da light intensity is assumed to 2A, then to be similar to amplitude be that the dutycycle of 2A is 1: 1 a square-wave signal to its signal, and its minimum value is 0; When measurand move finally make Moire fringe move half period after, " deceiving " striped of Moire fringe has been got on the detecting module, then the output signal of detecting module is shown in Fig. 7 (c), be an approximate constant signal, i.e. the identical A that is all of light intensity signal that surveys of each energy probe unit of each pixel of linear CCD or energy-probe array.And the signal shown in Fig. 7 (b) is when getting on the detecting module in the middle of " deceiving " " in vain " Moire fringe, the signal of its output.And signal from (a) to (c) is that the position of measurand is one to one to interior phase value of the variation of next (a) and a Moire fringe cycle again.Thereby finally can obtain the particular location of measurand.Be noted that in addition since linear CCD or unit energy detector array generally should be in the size on the direction that moves perpendicular to Moire fringe greater than the size of Moire fringe on this direction.So, signal among Fig. 7 (a) and (b), (c) can adopt each sensing unit to carry out normalized with respect to the gross energy that total sensing unit detects, and can eliminate the influence to whole measuring system of light source intensity variation or measurand reflectivity overall variation like this.
Since focusing and leveling measuring system of the present invention finally be detect between the two picture gratings along M to relative displacement, this with traditional optical grating ruler measurement in the relative position relation that detects between scale grating and the indication grating be the same on principle, so the probe unit of probe unit in the focusing and leveling measuring system of the present invention and grating chi is similar.Because the resolution that commercial at present grating chi can have been accomplished 1nm, so after only needing a spot of modification, the input of the maturation of existing grating chi and processing subsystem can be applied in the system of the present invention fully, have so just significantly reduced realization cost of the present invention.
The also general way that detects the formed Moire fringe of two picture gratings that adopts in system of the present invention, this optical grating ruler measurement system with existing maturation is the same.For the system that detects the formed Moire fringe of two gratings, two gratings are more little unfavorable more to detecting along the contrast of big more its formed Moire fringe in the gap on the optical propagation direction, so should reduce by two gratings as far as possible along the gap on the optical propagation direction.And for existing optical grating ruler measurement system, because its scale grating and indication grating all are the entity gratings, owing to the above-mentioned gap between them such as the reason of friction and pollution etc. can not be too little; And for system of the present invention owing to be picture by two gratings, just virtual presence forms Moire fringe as grating, so these two pictures between the grating can be zero along the gap on the optical propagation direction fully, thereby with respect to traditional grating chi, system of the present invention can reduce or even eliminate the measuring error that bring in this gap fully, no matter and since in the system of the present invention two as grating in theory the size in grating cycle do not have the measuring error brought owing to diffraction, thereby these all characteristics further improve the measuring accuracy of system of the present invention with respect to existing optical grating ruler measurement system.
Compare with existing focusing and leveling measuring system, system of the present invention has higher certainty of measurement, and because the higher repeatability that " from difference " of the present invention principle determines and stable, in addition, because detecting characteristic, class Moire fringe of the present invention determined that its variation to local reflectance on the measurand is insensitive; And adopting the light intensity that single sensing unit (pixel of CCD) is detected to carry out normalized with respect to the gross energy that all sensing units detect, and make system of the present invention change insensitive to variation or the measurand overall reflectivity of its light source intensity, it is relatively strong to measurand and technology adaptive capacity to be that system of the present invention has, and uses difficulty and cost thereby the production efficiency that finally can improve whole litho machine reduces.
The present invention in the advantage, can obviously find out on structure on having above performance, compares with existing similar focusing and leveling measuring system, and system of the present invention not only structure is simple, and realizes that difficulty and cost are lower.
Claims (5)
1. focusing and leveling measuring system, comprise light source module (1), illumination optics module (2), thing grating (3), first image-forming module (4), first biasing dull and stereotyped (5), measurand (6), second biasing dull and stereotyped (7) and second image-forming module (8), it is characterized in that, also comprise beam splitting-inverted image-close bundle module and detecting module (12), wherein beam splitting-inverted image-close the bundle module also comprises beam splitter (9) and image inverter (10);
Described beam splitter (9), the light beam that is used for entering beam splitting-inverted image-close bundle module is divided into two bundles, and a branch of direct imaging is located at detecting module (12), and another bundle enters image inverter (10);
Described image inverter (10) is used for being imaged on detecting module (12) and locating after entering its light beam inverted image;
Described detecting module (12) is used to survey the positional information of measurand (6);
Described first image-forming module and second image-forming module are the imaging system of picture Fang Yuanxin at least measurand one side.
2. a kind of focusing and leveling measuring system as claimed in claim 1 is characterized in that described detecting module (12) comprises two groups of probe units, and described two groups of probe units are separated by half Moire fringe cycle and place perpendicular to the moving direction of Moire fringe.
3. a kind of focusing and leveling measuring system as claimed in claim 1 is characterized in that described detecting module (12) includes only one group of probe unit, and described one group of probe unit is placed perpendicular to the moving direction of Moire fringe.
4. as claim 2 or 3 described a kind of focusing and leveling measuring systems, it is characterized in that described probe unit is the unit energy detector array.
5. a kind of focusing and leveling measuring system as claimed in claim 1, it is characterized in that described first biasing dull and stereotyped (5) and second biasing dull and stereotyped (7), be used to regulate the measurement zero point of focusing and leveling measuring system, and when regulating, relatively rotate and regulated quantity identical.
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Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102129183B (en) * | 2010-01-19 | 2014-05-21 | 上海微电子装备有限公司 | Focusing and levelling measuring device |
| CN102778822B (en) * | 2011-10-20 | 2014-08-13 | 中国科学院光电研究院 | Focusing and leveling device |
| CN103472677B (en) * | 2012-06-08 | 2015-09-30 | 上海微电子装备有限公司 | The vertical photoelectric detection system of substrate and method |
| CN104749901B (en) * | 2013-12-31 | 2017-08-29 | 上海微电子装备有限公司 | A kind of focusing leveling device |
| CN104049474B (en) * | 2014-07-01 | 2015-12-30 | 中国科学院光电技术研究所 | A kind of nanometer focusing test method of Moire fringe Phase-Resolved Analysis |
| CN105807571B (en) * | 2014-12-31 | 2018-08-24 | 上海微电子装备（集团）股份有限公司 | A kind of litho machine focusing and leveling system and its focusing and leveling method |
| CN106292197B (en) * | 2015-05-24 | 2018-03-30 | 上海微电子装备（集团）股份有限公司 | A kind of focusing leveling device and method based on image processing techniques |
| CN106647174B (en) * | 2015-10-30 | 2018-08-14 | 上海微电子装备（集团）股份有限公司 | A kind of focusing leveling device and focusing and leveling method |
| CN105242501B (en) * | 2015-11-10 | 2017-07-11 | 中国科学院光电技术研究所 | A kind of high-precision focusing and leveling measuring system |
| CN106679629B (en) * | 2017-01-13 | 2021-03-23 | 西南交通大学 | Ruler type level meter based on grating diffraction and method for measuring inclined plane inclination angle |
| CN110501878B (en) * | 2018-05-18 | 2021-05-14 | 上海微电子装备（集团）股份有限公司 | Focusing and leveling device, photoetching equipment and focusing and leveling method |
| CN114509923B (en) * | 2022-01-28 | 2023-11-24 | 复旦大学 | Focusing and leveling device in deep ultraviolet objective lens design and application thereof |
| CN116222984B (en) * | 2023-05-09 | 2023-07-25 | 上海隐冠半导体技术有限公司 | Grating ruler reflectivity measuring device |
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| US6765647B1 (en) * | 1998-11-18 | 2004-07-20 | Nikon Corporation | Exposure method and device |
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