CN121491923A - 制备磨料制品的方法和由其制成的抛光系统 - Google Patents
制备磨料制品的方法和由其制成的抛光系统Info
- Publication number
- CN121491923A CN121491923A CN202511709792.4A CN202511709792A CN121491923A CN 121491923 A CN121491923 A CN 121491923A CN 202511709792 A CN202511709792 A CN 202511709792A CN 121491923 A CN121491923 A CN 121491923A
- Authority
- CN
- China
- Prior art keywords
- diamond
- layer
- abrasive
- conformable
- hydrophobic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/12—Dressing tools; Holders therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
- B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762530976P | 2017-07-11 | 2017-07-11 | |
| US62/530,976 | 2017-07-11 | ||
| CN201880046028.5A CN110914016A (zh) | 2017-07-11 | 2018-07-05 | 包括可适形涂层的磨料制品和由其制成的抛光系统 |
| PCT/IB2018/054978 WO2019012389A1 (en) | 2017-07-11 | 2018-07-05 | ABRASIVE ARTICLES COMPRISING ADAPTABLE COATINGS AND POLISHING SYSTEM MANUFACTURED THEREFROM |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880046028.5A Division CN110914016A (zh) | 2017-07-11 | 2018-07-05 | 包括可适形涂层的磨料制品和由其制成的抛光系统 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN121491923A true CN121491923A (zh) | 2026-02-10 |
Family
ID=65001911
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202511709792.4A Pending CN121491923A (zh) | 2017-07-11 | 2018-07-05 | 制备磨料制品的方法和由其制成的抛光系统 |
| CN201880046028.5A Pending CN110914016A (zh) | 2017-07-11 | 2018-07-05 | 包括可适形涂层的磨料制品和由其制成的抛光系统 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880046028.5A Pending CN110914016A (zh) | 2017-07-11 | 2018-07-05 | 包括可适形涂层的磨料制品和由其制成的抛光系统 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12043785B2 (https=) |
| JP (1) | JP7198801B2 (https=) |
| CN (2) | CN121491923A (https=) |
| TW (1) | TWI791028B (https=) |
| WO (1) | WO2019012389A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102712203B1 (ko) * | 2019-07-24 | 2024-10-02 | 엠.씨.케이 (주) | 연마제품 및 이의 제조방법 |
| GB2590511B (en) * | 2019-11-20 | 2023-10-25 | Best Engineered Surface Tech Llc | Hybrid CMP conditioning head |
| TWI859404B (zh) * | 2020-01-30 | 2024-10-21 | 台灣積體電路製造股份有限公司 | 可攜式清潔裝置 |
| US12370648B2 (en) | 2020-01-30 | 2025-07-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Surface clean system and method |
| US20230116900A1 (en) * | 2020-03-18 | 2023-04-13 | 3M Innovative Properties Company | Abrasive Article |
| US20210402563A1 (en) * | 2020-06-26 | 2021-12-30 | Applied Materials, Inc. | Conditioner disk for use on soft or 3d printed pads during cmp |
| TWI772171B (zh) * | 2021-09-08 | 2022-07-21 | 明志科技大學 | 化學機械研磨墊修整器的保護膜及保護膜疊層 |
| JP2024535408A (ja) * | 2021-09-29 | 2024-09-30 | インテグリス・インコーポレーテッド | ポリマーバッキングプレートを備えるパッドコンディショナー |
| CN117464554A (zh) * | 2022-07-20 | 2024-01-30 | 格科半导体(上海)有限公司 | 一种研磨垫修整装置 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| US5352493A (en) | 1991-05-03 | 1994-10-04 | Veniamin Dorfman | Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films |
| US5435816A (en) | 1993-01-14 | 1995-07-25 | Minnesota Mining And Manufacturing Company | Method of making an abrasive article |
| SG64333A1 (en) | 1993-09-13 | 1999-04-27 | Minnesota Mining & Mfg | Abrasive article method of manufacture of same method of using same for finishing and a production tool |
| US6468642B1 (en) | 1995-10-03 | 2002-10-22 | N.V. Bekaert S.A. | Fluorine-doped diamond-like coatings |
| US6021559A (en) | 1996-11-01 | 2000-02-08 | 3M Innovative Properties Company | Methods of making a cube corner article master mold |
| US6368198B1 (en) | 1999-11-22 | 2002-04-09 | Kinik Company | Diamond grid CMP pad dresser |
| US5921856A (en) | 1997-07-10 | 1999-07-13 | Sp3, Inc. | CVD diamond coated substrate for polishing pad conditioning head and method for making same |
| US6123612A (en) | 1998-04-15 | 2000-09-26 | 3M Innovative Properties Company | Corrosion resistant abrasive article and method of making |
| US6696157B1 (en) | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
| JP2004303983A (ja) | 2003-03-31 | 2004-10-28 | Fuji Photo Film Co Ltd | 研磨パッド |
| US7160178B2 (en) | 2003-08-07 | 2007-01-09 | 3M Innovative Properties Company | In situ activation of a three-dimensional fixed abrasive article |
| EP1726682A1 (en) | 2005-05-26 | 2006-11-29 | NV Bekaert SA | Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers. |
| KR101024674B1 (ko) | 2007-12-28 | 2011-03-25 | 신한다이아몬드공업 주식회사 | 소수성 절삭공구 및 그제조방법 |
| US20090224370A1 (en) | 2008-03-10 | 2009-09-10 | Slutz David E | Non-planar cvd diamond-coated cmp pad conditioner and method for manufacturing |
| SG176629A1 (en) * | 2009-06-02 | 2012-01-30 | Saint Gobain Abrasives Inc | Corrosion-resistant cmp conditioning tools and methods for making and using same |
| US8721395B2 (en) | 2009-07-16 | 2014-05-13 | Saint-Gobain Abrasives, Inc. | Abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making |
| SG11201407232YA (en) | 2012-05-04 | 2014-12-30 | Entegris Inc | Cmp conditioner pads with superabrasive grit enhancement |
| CN104684686A (zh) | 2012-08-02 | 2015-06-03 | 3M创新有限公司 | 具有精确成形特征部的研磨元件、用其制成的研磨制品及其制造方法 |
| JP6715006B2 (ja) | 2012-08-02 | 2020-07-01 | スリーエム イノベイティブ プロパティズ カンパニー | 精密に成形された構造部を有する研磨物品及びその作製方法 |
| CN105102188B (zh) * | 2013-03-12 | 2021-06-01 | 国立大学法人九州大学 | 研磨垫及研磨方法 |
| JP2017503670A (ja) | 2014-01-24 | 2017-02-02 | スリーエム イノベイティブ プロパティズ カンパニー | 構造化表面を有する研磨材料 |
| SG11201608134YA (en) | 2014-04-03 | 2016-10-28 | 3M Innovative Properties Co | Polishing pads and systems and methods of making and using the same |
| CN106232696B (zh) | 2014-04-24 | 2020-06-05 | 3M创新有限公司 | 具有亲水表面的流体控制膜、其制造方法以及用于清洁结构化表面的方法 |
| SG11202000259RA (en) | 2017-07-11 | 2020-02-27 | 3M Innovative Properties Co | Abrasive articles including conformable coatings and polishing system therefrom |
| WO2019012388A1 (en) | 2017-07-11 | 2019-01-17 | 3M Innovative Properties Company | ABRASIVE ARTICLES COMPRISING CONFORMABLE COATINGS AND POLISHING SYSTEM COMPRISING THE SAME |
-
2018
- 2018-07-05 WO PCT/IB2018/054978 patent/WO2019012389A1/en not_active Ceased
- 2018-07-05 JP JP2020500814A patent/JP7198801B2/ja active Active
- 2018-07-05 CN CN202511709792.4A patent/CN121491923A/zh active Pending
- 2018-07-05 CN CN201880046028.5A patent/CN110914016A/zh active Pending
- 2018-07-05 US US16/629,769 patent/US12043785B2/en active Active
- 2018-07-09 TW TW107123677A patent/TWI791028B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| US12043785B2 (en) | 2024-07-23 |
| JP2020526406A (ja) | 2020-08-31 |
| CN110914016A (zh) | 2020-03-24 |
| WO2019012389A1 (en) | 2019-01-17 |
| TW201910055A (zh) | 2019-03-16 |
| JP7198801B2 (ja) | 2023-01-04 |
| US20200172780A1 (en) | 2020-06-04 |
| TWI791028B (zh) | 2023-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |