TWI791028B - 包括可適形塗層之磨料物品及來自其之拋光系統 - Google Patents

包括可適形塗層之磨料物品及來自其之拋光系統 Download PDF

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Publication number
TWI791028B
TWI791028B TW107123677A TW107123677A TWI791028B TW I791028 B TWI791028 B TW I791028B TW 107123677 A TW107123677 A TW 107123677A TW 107123677 A TW107123677 A TW 107123677A TW I791028 B TWI791028 B TW I791028B
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TW
Taiwan
Prior art keywords
diamond
layer
conformable
abrasive
hydrophobic
Prior art date
Application number
TW107123677A
Other languages
English (en)
Chinese (zh)
Other versions
TW201910055A (zh
Inventor
陳季汎
凱李伯 提摩西 尼爾森
摩西斯 米卡拉 大衛
Original Assignee
美商3M新設資產公司
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Application filed by 美商3M新設資產公司 filed Critical 美商3M新設資產公司
Publication of TW201910055A publication Critical patent/TW201910055A/zh
Application granted granted Critical
Publication of TWI791028B publication Critical patent/TWI791028B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12—Dressing tools; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
TW107123677A 2017-07-11 2018-07-09 包括可適形塗層之磨料物品及來自其之拋光系統 TWI791028B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762530976P 2017-07-11 2017-07-11
US62/530,976 2017-07-11

Publications (2)

Publication Number Publication Date
TW201910055A TW201910055A (zh) 2019-03-16
TWI791028B true TWI791028B (zh) 2023-02-01

Family

ID=65001911

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107123677A TWI791028B (zh) 2017-07-11 2018-07-09 包括可適形塗層之磨料物品及來自其之拋光系統

Country Status (5)

Country Link
US (1) US12043785B2 (https=)
JP (1) JP7198801B2 (https=)
CN (2) CN121491923A (https=)
TW (1) TWI791028B (https=)
WO (1) WO2019012389A1 (https=)

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KR102712203B1 (ko) * 2019-07-24 2024-10-02 엠.씨.케이 (주) 연마제품 및 이의 제조방법
GB2590511B (en) * 2019-11-20 2023-10-25 Best Engineered Surface Tech Llc Hybrid CMP conditioning head
TWI859404B (zh) * 2020-01-30 2024-10-21 台灣積體電路製造股份有限公司 可攜式清潔裝置
US12370648B2 (en) 2020-01-30 2025-07-29 Taiwan Semiconductor Manufacturing Co., Ltd. Surface clean system and method
US20230116900A1 (en) * 2020-03-18 2023-04-13 3M Innovative Properties Company Abrasive Article
US20210402563A1 (en) * 2020-06-26 2021-12-30 Applied Materials, Inc. Conditioner disk for use on soft or 3d printed pads during cmp
TWI772171B (zh) * 2021-09-08 2022-07-21 明志科技大學 化學機械研磨墊修整器的保護膜及保護膜疊層
JP2024535408A (ja) * 2021-09-29 2024-09-30 インテグリス・インコーポレーテッド ポリマーバッキングプレートを備えるパッドコンディショナー
CN117464554A (zh) * 2022-07-20 2024-01-30 格科半导体(上海)有限公司 一种研磨垫修整装置

Citations (8)

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US6696157B1 (en) * 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
EP1464444A1 (en) * 2003-03-31 2004-10-06 Fuji Photo Film Co., Ltd. Abrasive pad
US20100330886A1 (en) * 2009-06-02 2010-12-30 Saint-Gobain Abrasives, Inc. Corrosion-Resistant CMP Conditioning Tools and Methods for Making and Using Same
CN102470505A (zh) * 2009-07-16 2012-05-23 圣戈班磨料磨具有限公司 用于修整cmp垫的具有平且一致平面形貌的研磨工具及制造方法
WO2014022465A1 (en) * 2012-08-02 2014-02-06 3M Innovative Properties Company Abrasive articles with precisely shaped features and method of making thereof
WO2015153601A1 (en) * 2014-04-03 2015-10-08 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same
TW201538272A (zh) * 2014-01-24 2015-10-16 3M Innovative Properties Co 具有結構化表面之研磨材料
CN105102188A (zh) * 2013-03-12 2015-11-25 国立大学法人九州大学 研磨垫及研磨方法

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US5352493A (en) 1991-05-03 1994-10-04 Veniamin Dorfman Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films
US5435816A (en) 1993-01-14 1995-07-25 Minnesota Mining And Manufacturing Company Method of making an abrasive article
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US6021559A (en) 1996-11-01 2000-02-08 3M Innovative Properties Company Methods of making a cube corner article master mold
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EP1726682A1 (en) 2005-05-26 2006-11-29 NV Bekaert SA Coating comprising layered structures of diamond like nanocomposite layers and diamond like carbon layers.
KR101024674B1 (ko) 2007-12-28 2011-03-25 신한다이아몬드공업 주식회사 소수성 절삭공구 및 그제조방법
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WO2019012388A1 (en) 2017-07-11 2019-01-17 3M Innovative Properties Company ABRASIVE ARTICLES COMPRISING CONFORMABLE COATINGS AND POLISHING SYSTEM COMPRISING THE SAME

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6696157B1 (en) * 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
EP1464444A1 (en) * 2003-03-31 2004-10-06 Fuji Photo Film Co., Ltd. Abrasive pad
US20100330886A1 (en) * 2009-06-02 2010-12-30 Saint-Gobain Abrasives, Inc. Corrosion-Resistant CMP Conditioning Tools and Methods for Making and Using Same
CN102470505A (zh) * 2009-07-16 2012-05-23 圣戈班磨料磨具有限公司 用于修整cmp垫的具有平且一致平面形貌的研磨工具及制造方法
WO2014022465A1 (en) * 2012-08-02 2014-02-06 3M Innovative Properties Company Abrasive articles with precisely shaped features and method of making thereof
CN105102188A (zh) * 2013-03-12 2015-11-25 国立大学法人九州大学 研磨垫及研磨方法
TW201538272A (zh) * 2014-01-24 2015-10-16 3M Innovative Properties Co 具有結構化表面之研磨材料
US20170008143A1 (en) * 2014-01-24 2017-01-12 3M Innovative Properties Company Abrasive material having a structured surface
WO2015153601A1 (en) * 2014-04-03 2015-10-08 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same

Also Published As

Publication number Publication date
CN121491923A (zh) 2026-02-10
US12043785B2 (en) 2024-07-23
JP2020526406A (ja) 2020-08-31
CN110914016A (zh) 2020-03-24
WO2019012389A1 (en) 2019-01-17
TW201910055A (zh) 2019-03-16
JP7198801B2 (ja) 2023-01-04
US20200172780A1 (en) 2020-06-04

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