CN119998258A - 化合物、聚合性组合物、聚合物、全息记录介质、光学材料以及光学部件 - Google Patents

化合物、聚合性组合物、聚合物、全息记录介质、光学材料以及光学部件 Download PDF

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Publication number
CN119998258A
CN119998258A CN202380071361.2A CN202380071361A CN119998258A CN 119998258 A CN119998258 A CN 119998258A CN 202380071361 A CN202380071361 A CN 202380071361A CN 119998258 A CN119998258 A CN 119998258A
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China
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ring
compound
group
formula
substituent
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CN202380071361.2A
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English (en)
Chinese (zh)
Inventor
山下修治
名仓椋
矢部晃子
井上一真
佐藤宪
远田淳
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/40—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of six-membered aromatic rings
    • C07C271/42—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of six-membered aromatic rings with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/48—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of six-membered aromatic rings with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/12—Esters of monohydric alcohols or phenols
    • C08F120/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/26—Phenanthrenes; Hydrogenated phenanthrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Holo Graphy (AREA)
CN202380071361.2A 2022-10-19 2023-10-19 化合物、聚合性组合物、聚合物、全息记录介质、光学材料以及光学部件 Pending CN119998258A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022167398 2022-10-19
JP2022-167398 2022-10-19
PCT/JP2023/037815 WO2024085208A1 (ja) 2022-10-19 2023-10-19 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、並びに光学部品

Publications (1)

Publication Number Publication Date
CN119998258A true CN119998258A (zh) 2025-05-13

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CN202380071361.2A Pending CN119998258A (zh) 2022-10-19 2023-10-19 化合物、聚合性组合物、聚合物、全息记录介质、光学材料以及光学部件

Country Status (5)

Country Link
EP (1) EP4606785A4 (https=)
JP (1) JPWO2024085208A1 (https=)
CN (1) CN119998258A (https=)
TW (1) TW202432519A (https=)
WO (1) WO2024085208A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026004955A1 (ja) * 2024-06-28 2026-01-02 三菱ケミカル株式会社 組成物、重合体、ホログラム記録媒体、光学材料、並びに光学部品

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5721401A (en) 1980-07-14 1982-02-04 Mitsubishi Chem Ind Ltd Photopolymerizable composition
US4590287A (en) 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
US4713401A (en) 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
JP2538992B2 (ja) 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
JP3010880B2 (ja) 1992-02-26 2000-02-21 三菱化学株式会社 光重合性組成物
JPH06220131A (ja) 1993-01-22 1994-08-09 Nippon Kayaku Co Ltd 放射線硬化性樹脂組成物、光学材料用樹脂組成物及びその硬化物
US6482551B1 (en) 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
JP2000010277A (ja) 1998-06-19 2000-01-14 Mitsubishi Chemicals Corp 光重合性組成物
JP4761418B2 (ja) * 2001-07-04 2011-08-31 日本化薬株式会社 高屈折率（メタ）アクリル酸エステル化合物を含有する樹脂組成物およびその硬化物
JP2004198446A (ja) 2002-04-24 2004-07-15 Mitsubishi Chemicals Corp 光重合性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
US7271283B2 (en) 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
US7491441B2 (en) 2004-12-30 2009-02-17 3M Innovative Properties Company High refractive index, durable hard coats
JP5057367B2 (ja) * 2007-03-29 2012-10-24 日本化薬株式会社 活性エネルギー線硬化型樹脂組成物及びその硬化物
JP5402266B2 (ja) 2008-06-10 2014-01-29 三菱化学株式会社 光反応性組成物、光学材料、ホログラム記録層形成用組成物、ホログラム記録材料およびホログラム記録媒体
DE502008002161D1 (de) * 2008-08-08 2011-02-10 Bayer Materialscience Ag Phenylisocyanat-basierte Urethanacrylate mit hohem Brechungsindex
WO2011054795A1 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Fluorurethane als additive in einer photopolymer-formulierung
EP2354845B1 (de) 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
JP6089867B2 (ja) * 2013-03-27 2017-03-08 三菱化学株式会社 ホログラム記録媒体用組成物及びこれを用いたホログラム記録媒体並びに重合性化合物
JP6118747B2 (ja) * 2014-03-24 2017-04-19 富士フイルム株式会社 硬化性組成物、光学部品、および、化合物
JP6458645B2 (ja) 2015-05-28 2019-01-30 三菱ケミカル株式会社 含チオフェン環スルフィド基を有する化合物、及び光反応性組成物
JP2017149670A (ja) * 2016-02-24 2017-08-31 三光株式会社 ベンゾトリアゾール誘導体及びその製造方法
EP3995491A4 (en) 2019-07-08 2023-01-11 Sony Group Corporation COMPOUND, POLYMER, ORGANIC MATERIAL AND OPTICAL DEVICE, OPTICAL COMPONENT AND IMAGE DISPLAY DEVICE WITH RESPECTIVE SUCH ORGANIC MATERIAL
EP3998289A4 (en) 2019-07-08 2022-09-14 Sony Group Corporation Photosensitive composition and a hologram storage medium using same, hologram optical element, and hologram diffraction grating forming method
WO2021100654A1 (ja) 2019-11-19 2021-05-27 三菱ケミカル株式会社 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、及び光学部品
EP4317155A4 (en) * 2021-03-23 2024-07-31 Mitsubishi Chemical Corporation COMPOUND, RELATED PRODUCTION METHOD, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL AND OPTICAL COMPONENT
JP2022167398A (ja) 2021-04-23 2022-11-04 住友電気工業株式会社 光学部品及び光コネクタケーブル

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WO2024085208A1 (ja) 2024-04-25
EP4606785A4 (en) 2026-02-25
JPWO2024085208A1 (https=) 2024-04-25
TW202432519A (zh) 2024-08-16
EP4606785A1 (en) 2025-08-27

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