CN118558564B - A UV curing machine, control method and storage medium - Google Patents
A UV curing machine, control method and storage mediumInfo
- Publication number
- CN118558564B CN118558564B CN202311722775.5A CN202311722775A CN118558564B CN 118558564 B CN118558564 B CN 118558564B CN 202311722775 A CN202311722775 A CN 202311722775A CN 118558564 B CN118558564 B CN 118558564B
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- hydrogen
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- control module
- quartz window
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0438—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/007—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in gaseous phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention provides an ultraviolet curing machine, a control method and a storage medium. The ultraviolet curing machine comprises a process chamber, a hydrogen pipeline and a hydrogen pipeline, wherein the process chamber comprises a quartz window, a temperature control module and a pressure control module, the quartz window is used for sealing the process chamber and allowing ultraviolet light to penetrate through the quartz window to irradiate a sample in the process chamber so as to perform an ultraviolet curing process on the sample, the temperature control module and the pressure control module are used for providing a corresponding process environment with a first temperature and a first pressure in the ultraviolet curing process of the sample and providing a corresponding process environment with a second temperature and a second pressure in the hydrogen permeation process of the quartz window, and the hydrogen pipeline is connected with the process chamber and used for providing hydrogen to the process chamber in the hydrogen permeation process of the quartz window.
Description
Technical Field
The present invention relates to the field of thin film deposition, and in particular, to an ultraviolet curing station, a control method of the ultraviolet curing station, and a computer readable storage medium.
Background
In the field of semiconductor film deposition, the ultraviolet irradiation process of the ultraviolet curing machine can effectively improve the film performance. However, E' heart (i.e., si. Ident.) defects are easily generated in the structure of the quartz window of the optical lens in the process chamber due to the long-term ultraviolet radiation. The unpaired electrons in the E' can be transited to a conduction band by absorbing photons with a certain wavelength, and an absorption band with the wavelength of 200-300 nm (for example, 215 nm) as the center is generated, so that the ultraviolet transmittance of the quartz window is obviously reduced. Therefore, the existing ultraviolet curing machine generally needs to be disassembled, assembled and replaced at regular intervals so as to ensure the normal operation of equipment.
In order to overcome the above-mentioned drawbacks of the prior art, there is a need in the art for an ultraviolet curing machine station technology for performing an in-situ hydrogen permeation treatment of a disassembly-free quartz window of an ultraviolet curing machine station, so as to prolong the service life of the quartz window, improve the working efficiency of the machine station, and improve the working quality of the elevator station.
Disclosure of Invention
The following presents a simplified summary of one or more aspects in order to provide a basic understanding of such aspects. This summary is not an extensive overview of all contemplated aspects, and is intended to neither identify key or critical elements of all aspects nor delineate the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.
In order to overcome the defects in the prior art, the invention provides an ultraviolet curing machine, a control method of the ultraviolet curing machine and a computer readable storage medium, wherein the original temperature control module and pressure control module of the ultraviolet curing machine can be utilized to carry out in-situ hydrogen permeation treatment of the quartz window without disassembly, so that the service life of the quartz window is prolonged, the working efficiency of the machine is improved, and the working quality of the machine is improved.
Specifically, the ultraviolet curing machine provided by the first aspect of the invention comprises a process chamber, a hydrogen pipeline and a hydrogen pipeline, wherein the process chamber comprises a quartz window, a temperature control module and a pressure control module, the quartz window is used for sealing the process chamber and allowing ultraviolet light to irradiate a sample in the process chamber through the quartz window so as to carry out an ultraviolet curing process on the sample, the temperature control module and the pressure control module are used for providing a corresponding process environment with a first temperature and a first pressure in the ultraviolet curing process of the sample and providing a corresponding process environment with a second temperature and a second pressure in the hydrogen permeation process of the quartz window, and the hydrogen pipeline is connected with the process chamber and used for providing hydrogen to the process chamber in the hydrogen permeation process of the quartz window.
Further, in some embodiments of the invention, the temperature control module comprises a heating plate arranged inside the process chamber and used for bearing and heating the sample so as to perform the ultraviolet curing process on the sample, and/or a heating sleeve arranged in front of the process chamber and surrounding the hydrogen pipeline and used for preheating the hydrogen introduced into the process chamber so as to perform the hydrogen permeation process on the quartz window.
Further, in some embodiments of the invention, the hydrogen pipeline comprises a manual valve for closing the hydrogen pipeline in the ultraviolet curing process and opening the hydrogen pipeline in the hydrogen permeation process, and/or a filter for filtering and preprocessing the hydrogen introduced into the process chamber so as to prevent impurities from polluting the process chamber.
Further, in some embodiments of the present invention, the hydrogen pipeline further includes a diaphragm valve, a pressure gauge, a pressure regulator, and a mass flow controller, for adjusting the pressure and flow of the hydrogen gas flowing into the process chamber, so as to meet the requirements of the hydrogen permeation process.
Further, in some embodiments of the invention, the hydrogen conduit provides hydrogen to the process chamber at a predetermined first flow rate during a first stage of the hydrogen permeation process. The pressure control device controls the gas pressure in the process chamber at the second pressure. The temperature control device controls the temperature in the process chamber to the second temperature. And in response to the duration of the first stage reaching a preset first duration, the hydrogen permeation process enters a second stage, the hydrogen pipeline reduces the flow rate of the hydrogen introduced into the process chamber to a preset second flow rate, and the pressure control device reduces the air pressure in the process chamber to a preset third pressure and maintains the second duration to complete the hydrogen permeation process of the quartz window.
Further, in some embodiments of the present invention, the curing station further includes a counter configured to count the number of times the ultraviolet curing process is performed and trigger the hydrogen permeation process when the number of times reaches a preset number of times threshold, and/or a timer configured to count the last time the hydrogen permeation process is performed to a current time period and trigger the hydrogen permeation process when the current time period reaches a preset time period threshold, and/or a sensor configured to monitor the transmittance of the quartz window and trigger the hydrogen permeation process when the transmittance of the quartz window is lower than the preset transmittance threshold.
Further, in some embodiments of the present invention, the process chamber further includes a UV light source for providing a first UV light to the sample to UV cure the film deposited thereon, and a reflecting device for reflecting a second UV light dissipated by the UV light source toward the sample to UV cure the film deposited thereon.
In addition, the control method of the ultraviolet curing machine provided by the second aspect of the invention comprises the steps of providing a process environment with a first temperature and a first pressure for a sample in a process chamber through a temperature control module and a pressure control module to perform an ultraviolet curing process on a film deposited on the sample, providing a process environment with a second temperature and a second pressure for a quartz window in the process chamber through the temperature control module and the pressure control module, and providing hydrogen into the process chamber through a hydrogen pipeline to perform a hydrogen permeation process on the quartz window.
Further, in some embodiments of the present invention, the step of providing a process environment of a second temperature and a second pressure to a quartz window in a process chamber via the temperature control module and the pressure control module and providing hydrogen to the process chamber via a hydrogen conduit to perform a hydrogen permeation process to the quartz window includes controlling the hydrogen conduit to provide hydrogen to the process chamber at a preset first flow rate during a first stage of the hydrogen permeation process, controlling the pressure control device to control the gas pressure in the process chamber to the second pressure and controlling the temperature control device to control the temperature in the process chamber to the second temperature, determining that the hydrogen permeation process enters the second stage in response to a duration of the first stage reaching a preset first duration, thereby controlling the hydrogen conduit to reduce the flow rate of hydrogen to the process chamber to a preset second flow rate and controlling the pressure control device to reduce the gas pressure in the process chamber to a preset third stage, and determining that the hydrogen permeation process window has completed in response to the second duration reaching the preset second duration.
Further, in some embodiments of the present invention, the step of providing a process environment of a second temperature and a second pressure to a quartz window in a process chamber via the temperature control module and the pressure control module, and providing hydrogen to the process chamber via a hydrogen pipeline, so as to perform a hydrogen permeation process on the quartz window, and the control method of the uv curing apparatus includes counting the number of times of performing the uv curing process, and triggering the hydrogen permeation process when the number of times reaches a preset number of times threshold, and/or counting the last time the hydrogen permeation process is performed to a current time period, and triggering the hydrogen permeation process when the current time period reaches a preset time period threshold, and/or monitoring the transmittance of the quartz window, and triggering the hydrogen permeation process when the transmittance of the quartz window is lower than the preset transmittance threshold.
Further, a computer-readable storage medium according to a third aspect of the present invention has stored thereon computer instructions. When the computer instructions are executed by the processor, the control method of the ultraviolet curing machine according to the second aspect of the invention is implemented.
Drawings
The above features and advantages of the present invention will be better understood after reading the detailed description of embodiments of the present disclosure in conjunction with the following drawings. In the drawings, the components are not necessarily to scale and components having similar related features or characteristics may have the same or similar reference numerals.
Fig. 1 illustrates a schematic structure of an uv curing station according to some embodiments of the present invention.
Fig. 2 illustrates a schematic structural diagram of a hydrogen pipeline provided according to some embodiments of the present invention.
Fig. 3 illustrates a control method of an ultraviolet curing machine according to some embodiments of the present invention.
Reference numerals:
10. Process chamber
101. Quartz window
102. Voltage-controlled module
1031. Heating plate
1032. Heating jacket
104. Ultraviolet light source
105. Reflection device
20. Hydrogen pipeline
201. Manual valve
202. Filter device
203. Diaphragm valve
204. Pressure gauge
205. Voltage regulator
206. Mass flow controller
30. Air source
Detailed Description
Further advantages and effects of the present invention will become apparent to those skilled in the art from the disclosure of the present specification, by describing the embodiments of the present invention with specific examples. While the description of the invention will be presented in connection with a preferred embodiment, it is not intended to limit the inventive features to that embodiment. Rather, the purpose of the invention described in connection with the embodiments is to cover other alternatives or modifications, which may be extended by the claims based on the invention. The following description contains many specific details for the purpose of providing a thorough understanding of the present invention. The invention may be practiced without these specific details. Furthermore, some specific details are omitted from the description in order to avoid obscuring the invention.
In the description of the present invention, unless explicitly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected, mechanically connected, electrically connected, directly connected, indirectly connected via an intervening medium, or in communication between two elements. The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
In addition, the terms "upper", "lower", "left", "right", "top", "bottom", "horizontal", "vertical" as used in the following description should be understood as referring to the orientation depicted in this paragraph and the associated drawings. This relative terminology is for convenience only and is not intended to be limiting of the invention as it is described in terms of the apparatus being manufactured or operated in a particular orientation.
It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various elements, regions, layers and/or sections, these elements, regions, layers and/or sections should not be limited by these terms and these terms are merely used to distinguish between different elements, regions, layers and/or sections. Accordingly, a first component, region, layer, and/or section discussed below could be termed a second component, region, layer, and/or section without departing from some embodiments of the present invention.
As described above, the existing ultraviolet curing machine generally needs to be disassembled, assembled and replaced at regular intervals to ensure the normal operation of the equipment, so that the defects of complex flow and long maintenance period exist, and external pollution is easy to enter the process chamber.
In order to overcome the defects in the prior art, the invention provides an ultraviolet curing machine, a control method of the ultraviolet curing machine and a computer readable storage medium, wherein the original temperature control module and pressure control module of the ultraviolet curing machine can be utilized to carry out in-situ hydrogen permeation treatment of the quartz window without disassembly, so that the service life of the quartz window is prolonged, the working efficiency of the machine is improved, and the working quality of the machine is improved.
In some non-limiting embodiments, the control method of the uv curing apparatus according to the second aspect of the present invention may be implemented based on the uv curing apparatus according to the first aspect of the present invention. Specifically, the uv curing station may be configured with a memory and a processor. The memory includes, but is not limited to, the above-described computer-readable storage medium provided by the third aspect of the present invention, having stored thereon computer instructions. The processor is connected to the memory and configured to execute computer instructions stored on the memory to implement the method for controlling an uv curing station according to the second aspect of the present invention.
Please refer to fig. 1 and fig. 2. Fig. 1 illustrates a schematic structure of an uv curing station according to some embodiments of the present invention. Fig. 2 illustrates a schematic structural diagram of a hydrogen pipeline provided according to some embodiments of the present invention.
As shown in fig. 1 and 2, the uv curing apparatus includes a process chamber 10 and a hydrogen gas line 20. The process chamber 10 includes a quartz window 101, a pressure control module 102, a temperature control module, an ultraviolet light source 104, and a reflecting device 105. The quartz window 101 is used to close the upper space of the process chamber 10 and allow ultraviolet light provided by the upper ultraviolet light source 104 and/or the reflecting means 105 to irradiate the sample within the observation process chamber 10 through the quartz window 101 to perform an ultraviolet curing process thereon. The temperature control module and the pressure control module 102 are used for providing a corresponding process environment with a first temperature and a first pressure in an ultraviolet curing process of a sample, and providing a corresponding process environment with a second temperature and a second pressure in a hydrogen permeation process of the quartz window 101. The uv light source 104 is disposed above the quartz window 101 for providing a first uv light to a sample in the process chamber 10 for uv curing of a film deposited thereon. The reflecting means 105 surrounds the upper portion of the ultraviolet light source 104 for reflecting the second ultraviolet light dissipated from the ultraviolet light source 104 toward the sample to ultraviolet-cure the thin film deposited thereon. The first end of the hydrogen pipe 20 is connected to the hydrogen source 30 and the second end thereof is connected to the process chamber 10 for supplying hydrogen gas into the process chamber 10 during a hydrogen permeation process to the quartz window 101.
Further, in some embodiments, the temperature control module described above includes a heating plate 1031 and a heating jacket 1032. The heating plate 1031 is disposed inside the process chamber 10 for carrying and heating the sample to perform an ultraviolet curing process thereon. The heating jacket 1032 is disposed in front of the process chamber 10 and surrounds the hydrogen pipe 20 for preheating the hydrogen gas introduced into the process chamber 10 to perform a hydrogen permeation process to the quartz window 101.
Further, as shown in fig. 2, the above-described hydrogen gas pipe 20 may include therein a manual valve 201 and a filter 202. The manual valve 201 is used to close the hydrogen pipe 20 during the uv curing process and to open the hydrogen pipe 20 during the hydrogen permeation process. The filter 202 is used to filter the hydrogen gas introduced into the process chamber 10 to prevent impurities from contaminating the process chamber 10.
Further, in some embodiments, the hydrogen pipe 20 may preferably further include a diaphragm valve 203, a pressure gauge 204, a pressure regulator 205, and a mass flow controller 206 for adjusting the pressure and flow of the hydrogen gas introduced into the process chamber 10 to meet the requirements of the hydrogen permeation process.
Furthermore, in some embodiments, the curing station may also include a counter, timer, and/or sensor. The counter is used for counting the times of implementing the ultraviolet curing process, and triggering the hydrogen permeation process when the times reach a preset time threshold (for example, 5-100 times). The timer is used for counting the current time of implementing the last hydrogen permeation process, and triggering the hydrogen permeation process when the current time reaches a preset time threshold (for example, 300-500 hours). The sensor is used for monitoring the transmittance of the quartz window 101, and triggering the hydrogen permeation process when the transmittance of the quartz window 101 is lower than a preset transmittance threshold (for example, 70% -80%).
The working principle of the uv curing apparatus will be described below with reference to some embodiments of the wafer position detection method. It will be appreciated by those skilled in the art that these examples of the control method of the uv curing station are merely some non-limiting embodiments provided by the present invention, and are intended to clearly illustrate the main concept of the present invention and to provide some embodiments for public implementation, not to limit the overall functions or the overall operation of the uv curing station. Similarly, the control method of the uv curing apparatus is just some non-limiting embodiments provided by the present invention, and the execution main body or the execution sequence of each step in the control method of the uv curing apparatus is not limited.
Referring to fig. 1 to 3 in combination, fig. 3 illustrates a control method of an uv curing apparatus according to some embodiments of the present invention.
As shown in fig. 1-3, during operation of the uv curing apparatus, the uv curing apparatus may first provide a first temperature and a first pressure process environment to a sample in the process chamber 10 via its temperature control module (e.g., the heating plate 1031) and the pressure control module 102, and provide uv light to the sample via the uv light source 104 and the reflection device 105 to perform a uv curing process on a thin film deposited on the sample.
Meanwhile, in some embodiments, the uv curing machine may preferably monitor the state of the quartz window 101 in real time by using a counter, a timer and/or a sensor configured therein, and determine the timing of triggering the hydrogen permeation process according to a trigger signal provided by the same.
For example, the uv curing station may count the number of times of performing the uv curing process by using a counter, and trigger the hydrogen permeation process when the number of times reaches a preset number of times threshold (for example, 5-100 times).
For another example, the uv light curing station may count the last hydrogen permeation process to the current time period by a timer, and trigger the hydrogen permeation process when the last hydrogen permeation process reaches a preset time period threshold (e.g., 300-500 hours).
For another example, the uv curing station may monitor the transmittance of the quartz window 101 via a sensor, and trigger the hydrogen permeation process when the transmittance of the quartz window 101 is lower than a preset transmittance threshold (e.g., 70% -80%).
Then, in response to the trigger signal provided by the counter, the timer, the sensor, and/or the trigger instruction manually provided by the user, the uv curing apparatus may exit the sample in the process chamber and switch the process mode, provide the process environment with the second temperature and the second pressure to the quartz window 101 in the process chamber 10 via the temperature control module (e.g. the heating plate 1031) and the pressure control module 102, and provide the hydrogen with the corresponding temperature to the process chamber 10 via the temperature control module (e.g. the heating sleeve 1032) and the hydrogen pipeline 20, so as to perform the disassembly-free in-situ hydrogen permeation process on the quartz window 101.
Specifically, in the first stage of the hydrogen permeation process, the uv curing apparatus can control the hydrogen pipe 20 to supply hydrogen to the process chamber 10 at a predetermined first flow rate (e.g. 400-6000 sccm), control the pressure control device 102 to control the pressure in the process chamber 10 at a second pressure (e.g. 5 atm), and control the temperature control device to control the temperature in the process chamber 10 at a second temperature (e.g. 200-500 ℃).
Then, in response to the duration of the first stage reaching a preset first duration (for example, 80-120 hours), the ultraviolet curing machine can determine that the hydrogen permeation process of the first stage is completed, and start the second stage of the hydrogen permeation process. Then, in the second stage of the hydrogen permeation process, the uv curing apparatus can control the hydrogen pipe 20 to reduce the flow rate of the hydrogen introduced into the process chamber 10 to a predetermined second flow rate (e.g. 300-2000 sccm), and control the pressure control device 102 to reduce the pressure in the process chamber 10 to a predetermined third pressure (e.g. 3 atm).
And then, in response to the duration of the second stage reaching a preset second duration (for example, 400-800 hours), the ultraviolet curing machine can determine that the hydrogen permeation process for the quartz window 101 is completed.
In this way, compared with the prior art that the quartz window 101 needs to be disassembled first and then subjected to hydrogen permeation treatment by using professional equipment, the invention can utilize the hydrogen pipeline 20 additionally arranged on the ultraviolet curing machine to introduce hydrogen into the process chamber 10, and utilize the original pressure control module 102 and temperature control module of the ultraviolet curing machine to precisely control the pressure and temperature of the gas in the chamber so as to directly perform the disassembly-free in-situ hydrogen permeation treatment on the quartz window 101, thereby improving the hydrogen molecular content in the glass of the quartz window 101 to 3X 10 18molecules/cm3 and recovering the transmittance of the quartz window 101 with reduced transmittance at the wavelength of 200-300 nm (for example: 215 nm) to more than 86%.
In summary, the invention provides an ultraviolet curing machine, a control method of the ultraviolet curing machine, and a computer readable storage medium, which can utilize the original temperature control module and pressure control module of the ultraviolet curing machine to perform dismounting-free hydrogen permeation treatment on a quartz window 101, thereby prolonging the service life of the quartz window, improving the working efficiency of the machine, and improving the working quality of the machine.
While, for purposes of simplicity of explanation, the methodologies are shown and described as a series of acts, it is to be understood and appreciated that the methodologies are not limited by the order of acts, as some acts may, in accordance with one or more embodiments, occur in different orders and/or concurrently with other acts from that shown and described herein or not shown and described herein, as would be understood and appreciated by those skilled in the art.
The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (9)
1. An ultraviolet curing machine, comprising:
A process chamber including a quartz window, a temperature control module and a pressure control module, wherein the quartz window is used for closing the process chamber and allowing ultraviolet light to irradiate a sample in the process chamber through the quartz window so as to perform an ultraviolet curing process on the sample, the temperature control module and the pressure control module are used for providing a corresponding process environment with a first temperature and a first pressure in the ultraviolet curing process of the sample and providing a corresponding process environment with a second temperature and a second pressure in a hydrogen permeation process of the quartz window, and
And the hydrogen pipeline is connected with the process chamber and is used for providing hydrogen to the process chamber in the hydrogen permeation process of the quartz window, wherein in the first stage of the hydrogen permeation process, the hydrogen pipeline provides hydrogen to the process chamber according to a preset first flow, the pressure control module controls the air pressure in the process chamber at the second pressure, the temperature control module controls the temperature in the process chamber at the second temperature, the hydrogen permeation process enters the second stage in response to the duration of the first stage reaching the preset first duration, the hydrogen pipeline reduces the flow of the hydrogen introduced into the process chamber to the preset second flow, and the pressure control module reduces the air pressure in the process chamber to the preset third pressure and maintains the second duration to complete the hydrogen permeation process of the quartz window.
2. The uv curing station of claim 1, wherein the temperature control module comprises:
A heating plate arranged in the process chamber for bearing and heating the sample to perform the ultraviolet light curing process, and/or
The heating sleeve is arranged in front of the process chamber and surrounds the hydrogen pipeline and is used for preheating the hydrogen introduced into the process chamber so as to perform the hydrogen permeation process on the quartz window.
3. The uv curing station of claim 1, wherein the hydrogen line comprises:
A manual valve for closing the hydrogen pipeline in the ultraviolet curing process and opening the hydrogen pipeline in the hydrogen permeation process, and/or
And the filter is used for carrying out filtering pretreatment on the hydrogen introduced into the process chamber so as to prevent impurities from polluting the process chamber.
4. The uv curing tool of claim 3, wherein the hydrogen line further comprises a diaphragm valve, a pressure gauge, a pressure regulator, and a mass flow controller for regulating the pressure and flow of hydrogen gas into the process chamber to meet the hydrogen permeation process requirements.
5. The uv curing station of claim 1, further comprising
A counter for counting the times of implementing the ultraviolet light curing process and triggering the hydrogen permeation process when the times reach a preset time threshold value, and/or
A timer for counting the last time the hydrogen permeation process is implemented to the current time and triggering the hydrogen permeation process when the last time reaches a preset time threshold value, and/or
And the sensor is used for monitoring the transmittance of the quartz window and triggering the hydrogen permeation process when the transmittance of the quartz window is lower than a preset transmittance threshold value.
6. The uv curing station of claim 1, wherein the process chamber further comprises:
An ultraviolet light source for providing a first ultraviolet light to the sample to ultraviolet light cure the thin film deposited thereon, and
And the reflecting device is used for reflecting the second ultraviolet light dissipated by the ultraviolet light source to the sample so as to ultraviolet light solidify the film deposited on the reflecting device.
7. The control method of the ultraviolet curing machine is characterized by comprising the following steps:
providing a process environment with a first temperature and a first pressure to a sample in a process chamber through a temperature control module and a pressure control module in the ultraviolet curing machine according to any one of claims 1-6, so as to perform an ultraviolet curing process on a film deposited on the sample;
In the first stage of the hydrogen permeation process, controlling the hydrogen pipeline to provide hydrogen for the process chamber according to a preset first flow, controlling the pressure control module to control the air pressure in the process chamber at the second pressure, and controlling the temperature control module to control the temperature in the process chamber at the second temperature;
And controlling the hydrogen pipeline to reduce the flow rate of the hydrogen introduced into the process chamber to a preset second flow rate and controlling the pressure control module to reduce the air pressure in the process chamber to a preset third pressure
And responding to the duration time of the second stage reaching a preset second duration time, and judging that the hydrogen permeation process of the quartz window is finished.
8. The method of claim 7, wherein the step of providing a process environment at a second temperature and a second pressure to a quartz window in a process chamber via the temperature control module and the pressure control module and providing hydrogen to the process chamber via a hydrogen pipeline to perform a hydrogen permeation process to the quartz window comprises:
Counting the times of implementing the ultraviolet light curing process, triggering the hydrogen permeation process when the times reach a preset time threshold value, and/or
Counting the last time the hydrogen permeation process is implemented to the current time, triggering the hydrogen permeation process when the last time reaches a preset time threshold value, and/or
And monitoring the transmittance of the quartz window, and triggering the hydrogen permeation process when the transmittance of the quartz window is lower than a preset transmittance threshold.
9. A computer-readable storage medium having stored thereon computer instructions, which when executed by a processor, implement the method of controlling an uv curing station according to claim 7 or 8.
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| CN211134521U (en) * | 2019-09-24 | 2020-07-31 | 上海华力微电子有限公司 | Ultraviolet light curing device |
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| US9287154B2 (en) * | 2012-06-01 | 2016-03-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | UV curing system for semiconductors |
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|---|---|---|---|---|
| CN211134521U (en) * | 2019-09-24 | 2020-07-31 | 上海华力微电子有限公司 | Ultraviolet light curing device |
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