CN118169788A - 半导体透镜制造的优化 - Google Patents

半导体透镜制造的优化 Download PDF

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Publication number
CN118169788A
CN118169788A CN202410469662.7A CN202410469662A CN118169788A CN 118169788 A CN118169788 A CN 118169788A CN 202410469662 A CN202410469662 A CN 202410469662A CN 118169788 A CN118169788 A CN 118169788A
Authority
CN
China
Prior art keywords
lenses
lens
lens array
substrate
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202410469662.7A
Other languages
English (en)
Chinese (zh)
Inventor
理查德·F.·卡森
约翰·R.·约瑟夫
米尔·E.·沃伦
托马斯·A.·威尔科斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lumentum Operations LLC
Original Assignee
Lumentum Operations LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lumentum Operations LLC filed Critical Lumentum Operations LLC
Publication of CN118169788A publication Critical patent/CN118169788A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0043—Inhomogeneous or irregular arrays, e.g. varying shape, size, height
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laser Beam Processing (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Couplings Of Light Guides (AREA)
CN202410469662.7A 2016-04-19 2017-04-14 半导体透镜制造的优化 Pending CN118169788A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US15/133,094 US9927558B2 (en) 2016-04-19 2016-04-19 Semiconductor lens optimization of fabrication
US15/133,094 2016-04-19
CN201780024803.2A CN109416417A (zh) 2016-04-19 2017-04-14 半导体透镜制造的优化
PCT/US2017/027674 WO2017184455A1 (en) 2016-04-19 2017-04-14 Semiconductor lens optimization of fabrication

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201780024803.2A Division CN109416417A (zh) 2016-04-19 2017-04-14 半导体透镜制造的优化

Publications (1)

Publication Number Publication Date
CN118169788A true CN118169788A (zh) 2024-06-11

Family

ID=60038117

Family Applications (2)

Application Number Title Priority Date Filing Date
CN202410469662.7A Pending CN118169788A (zh) 2016-04-19 2017-04-14 半导体透镜制造的优化
CN201780024803.2A Pending CN109416417A (zh) 2016-04-19 2017-04-14 半导体透镜制造的优化

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201780024803.2A Pending CN109416417A (zh) 2016-04-19 2017-04-14 半导体透镜制造的优化

Country Status (7)

Country Link
US (3) US9927558B2 (https=)
EP (2) EP3446160B1 (https=)
JP (2) JP6987783B2 (https=)
CN (2) CN118169788A (https=)
CA (1) CA3018888A1 (https=)
TW (1) TWI650583B (https=)
WO (1) WO2017184455A1 (https=)

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US11095365B2 (en) 2011-08-26 2021-08-17 Lumentum Operations Llc Wide-angle illuminator module
AU2016298390B2 (en) 2015-07-30 2021-09-02 Optipulse Inc. Rigid high power and high speed lasing grid structures
US10630053B2 (en) 2015-07-30 2020-04-21 Optipulse Inc. High power laser grid structure
US9927558B2 (en) 2016-04-19 2018-03-27 Trilumina Corp. Semiconductor lens optimization of fabrication
WO2018232410A1 (en) * 2017-06-16 2018-12-20 Optipulse Inc. Graphene lens structures for use with light engine and grid laser structures
US10958350B2 (en) 2017-08-11 2021-03-23 Optipulse Inc. Laser grid structures for wireless high speed data transfers
US10374705B2 (en) 2017-09-06 2019-08-06 Optipulse Inc. Method and apparatus for alignment of a line-of-sight communications link
JP2020149032A (ja) * 2018-10-05 2020-09-17 株式会社リコー 光学素子、表示装置、表示システムおよび移動体
CN111381334B (zh) * 2018-12-28 2021-06-15 中国科学院长春光学精密机械与物理研究所 一种用于光学系统中光路组件的对准方法
EP4073585A1 (en) * 2019-12-10 2022-10-19 TRUMPF Photonic Components GmbH Method of lithographically forming an optical structure in a semiconductor substrate

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Also Published As

Publication number Publication date
TW201802497A (zh) 2018-01-16
WO2017184455A1 (en) 2017-10-26
EP3446160A4 (en) 2019-12-18
US11187831B2 (en) 2021-11-30
US9927558B2 (en) 2018-03-27
JP2022043095A (ja) 2022-03-15
EP3446160A1 (en) 2019-02-27
CA3018888A1 (en) 2017-10-26
EP4224220A1 (en) 2023-08-09
TWI650583B (zh) 2019-02-11
US20180172885A1 (en) 2018-06-21
US20170299781A1 (en) 2017-10-19
JP7402855B2 (ja) 2023-12-21
CN109416417A (zh) 2019-03-01
EP3446160B1 (en) 2023-11-08
JP2019514073A (ja) 2019-05-30
US20220082733A1 (en) 2022-03-17
JP6987783B2 (ja) 2022-01-05

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