CN118130058A - Wavefront measurement precision improving method of optical focusing system - Google Patents
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- G—PHYSICS
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- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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Abstract
The invention discloses a wavefront measurement precision improving method of an optical focusing system, which comprises the following steps: 1) Acquiring a focus position of a tested optical focusing system; 2) Correcting wavefront measurement errors; 3) The corrected wavefront is calculated. The method disclosed by the invention is simple to operate, has strong applicability, reduces the requirements on the mirror surface machining precision, and has great popularization value.
Description
Technical Field
The invention relates to the technical field of optical systems, in particular to a wavefront measurement precision improving method of an optical focusing system.
Background
Wavefront aberration, which is a typical optical performance index, can guide optical path optimization design, phase modulation, and imaging analysis, and is convenient to detect, and is therefore often used for evaluating optical systems. The inverse Hartmann (Hartmann) detection method adopts non-purpose-made devices such as a screen for projecting stripes, a CCD camera, a displacement table and the like, has strong universality and high theoretical precision, and is easy to influence by systematic errors in actual measurement precision. At present, correction for system structural errors is mainly divided into two types of methods. The first method is based on the high-precision calibration element to realize the calculation of the structural parameters and errors in the system, and the influence of the errors is restrained from the source. The second method is to analyze the influence of various errors of the measuring system on the wavefront measurement, strip the influence amount of the errors from the measured wavefront aberration, and inhibit the influence of the errors from the result. Aiming at the overcorrection problem, a high-precision structural error correction method based on Zernike polynomials is further provided, different Zernike polynomial coefficient weight distributions are correspondingly introduced aiming at different structural error types, and different types of structural errors are corrected step by step, so that the overcorrection problem is effectively avoided, and high-precision measurement of a free curved surface with a large dynamic range is realized.
However, the error correction method needs to know the surface shape parameters of the measured mirror surface, and is only suitable for the condition that the difference between the processing surface shape and the design surface shape is not large, so that the processing method has extremely high requirements and has no universality and applicability. The existing inverse Hartmann wavefront measurement method is difficult to find a simple and universal method for improving the measurement accuracy.
Disclosure of Invention
In view of the above-mentioned defects or shortcomings in the prior art, it is desirable to provide a wavefront measurement precision improving method of an optical focusing system, which is simple to operate, has strong applicability, reduces the requirements on mirror surface machining precision, and has great popularization value.
The invention provides a wavefront measurement precision improving method of an optical focusing system, which comprises the following steps:
1) Acquiring a focus position of a tested optical focusing system;
2) Correcting wavefront measurement errors; the ideal wavefront of the optical focusing system to be measured is set as A (x, y), the random error of the measuring system at the moment t is set as eta (x, y, t), the reference position is defined at the focus position of the optical focusing system to be measured, and after the optical focusing system to be measured is sequentially conjugated and translated along the orthogonal direction of the reference position for s, the detection wavefront W (x, y) of the optical focusing system to be measured can be obtained as follows:
calculating to obtain detection differential wave fronts of the detected optical focusing system in two orthogonal directions:
The Taylor formula expansion can be carried out on the detected differential wave fronts of the detected optical focusing system in two orthogonal directions to obtain:
Wherein, And/>Is an ideal differential wavefront; /(I)Is an error term;
When the translation distance s of the optical focusing system to be detected is increased, the error term is reduced, and the detection error is effectively restrained; however, when the translation distance s is too large, an algorithm error is introduced;
Wave front simulation is carried out on the optical focusing system to be tested through ray tracing, and when the translation distance s is larger than s max, the algorithm error exceeds the error allowable range; setting a translation distance s as an input quantity by adopting an optimization algorithm, wherein the translation distance s ranges from 0 to s max, the wave front PV value is an objective function, and when the wave front PV value does not exceed the error allowable range, obtaining a range value of a corrected translation distance s a;
taking the value in the range value of the corrected translation distance s a as the translation distance s, and calculating to obtain the corrected differential wavefront as follows:
3) Calculating a corrected wavefront:
wherein, (x, y) represents a normalized sampling point of the measured optical focusing system under a rectangular coordinate system, C k is a k term Zernike polynomial coefficient, and Z k (x, y) is a k term orthogonalized Zernike polynomial;
C＝(ΔZTΔZ)-1ΔZT·ΔWa；
Where C is the coefficient of the Zernike polynomial and ΔZ is the basis function of the Zernike polynomial.
Further, the step of acquiring the focal position of the optical focusing system to be measured includes the following steps:
Acquiring a first unfolding phase of a tested optical focusing system, and extracting a transverse phase, a longitudinal phase and a corresponding first pixel index in the first unfolding phase; acquiring a second unfolding phase of the optical focusing system to be tested, which corresponds to the first unfolding phase, and extracting a transverse phase, a longitudinal phase and a corresponding second pixel index at the second unfolding phase;
And obtaining a plurality of groups of corresponding first pixel indexes and second pixel indexes, making differences between the point distances of the first pixel indexes and the second pixel indexes corresponding to each group, fitting a difference curve, and obtaining the focal position of the optical focusing system to be tested when the difference is 0.
Further, the first unfolding phase is obtained on a small-period four-step phase shift fringe set in a space unwrapping mode, the small-period four-step phase shift fringe set is a small-period four-step phase shift fringe set which is projected transversely and longitudinally on a screen by a tested optical focusing system by a picture taking device, and the screen is positioned at a position 1 on an optical axis of the tested optical focusing system;
The second unfolding phase is obtained on a small-period four-step phase shift fringe set in a space unwrapping mode, the small-period four-step phase shift fringe set is a small-period four-step phase shift fringe set which is projected on a screen by a tested optical focusing system through a picture collecting device in the transverse and longitudinal directions, and the screen is positioned at a position 2 on the optical axis of the tested optical focusing system; the position 2 is a position where the screen at the position 1 moves a distance along the optical axis of the optical focusing system to be measured.
Further, the transverse phase and the longitudinal phase are four points selected in a cross manner at the center of the first unfolding phase or the second unfolding phase.
Further, each group of corresponding first pixel index and second pixel index is obtained after the position of the image acquisition device is moved along the optical axis of the optical focusing system to be measured.
Further, the image acquisition device comprises a CCD camera.
Further, the focus position is the pinhole diaphragm position of the CCD camera corresponding to the difference value of 0.
Compared with the prior art, the invention has the beneficial effects that:
(1) The method obtains the range value of the corrected translation distance s a through the conjugate difference method and the optimization algorithm, can greatly reduce random errors and systematic errors of a measuring system through correcting the range value of the translation distance s a, effectively improves the measuring precision and reliability of wavefront detection, does not need to measure the surface shape parameters of a mirror surface, does not need a mirror surface processing method with high difficulty and strict processing requirements, and has universality and applicability.
(2) The method of the invention focuses through the measured optical focusing system of the phase auxiliary focusing algorithm, can rapidly and accurately determine the focus position, improves focusing efficiency and accuracy, eliminates defocusing errors, and further improves wavefront detection accuracy.
It should be understood that the description in this summary is not intended to limit the critical or essential features of the embodiments of the invention, nor is it intended to limit the scope of the invention. Other features of the present invention will become apparent from the description that follows.
Drawings
Other features, objects and advantages of the present invention will become more apparent upon reading of the detailed description of non-limiting embodiments, made with reference to the accompanying drawings in which:
FIG. 1 is a schematic view of the front and back positions of defocus;
FIG. 2 is a flow chart of a phase assisted focusing algorithm;
FIG. 3 is a light path diagram of a phase assisted focusing algorithm;
FIG. 4 is a graph of the difference between the first pixel index and the second pixel index;
FIG. 5 is a schematic diagram of the translation distance s of the optical focusing system under test;
FIG. 6 a is a schematic diagram of an ideal wavefront of the optical focusing system under test; b, a diagram of a detected wavefront after Gaussian noise is added to an ideal wavefront; c, a wave front differential diagram obtained by ideal wave front without adding noise error;
FIG. 7 a is a graph showing the relationship between the translation distance s simulated by the wavefront differential reconstruction algorithm and the reconstruction error under the fixed random error; and b, under different random errors, the graph is a graph of the relation between the translation distance s simulated by the wave front differential reconstruction algorithm and the reconstruction error.
Detailed Description
The invention is described in further detail below with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be noted that, for convenience of description, only the portions related to the invention are shown in the drawings.
It should be noted that, without conflict, the embodiments of the present invention and features of the embodiments may be combined with each other. The invention will be described in detail below with reference to the drawings in connection with embodiments.
Example 1
Referring to fig. 1 to 7, an embodiment of the present invention provides a wavefront measurement accuracy improving method of an optical focusing system, including the following steps:
1) Acquiring a focus position of a tested optical focusing system;
Acquiring a first unfolding phase of the optical focusing system to be tested in a space unwrapping mode, wherein the first unfolding phase is an unfolding phase of a small-period four-step phase shift fringe set of which the CCD camera is transverse and longitudinal on a screen positioned at a position 1 through the optical focusing system to be tested; selecting four points in a cross manner at the center of the first unfolding phase to extract a transverse phase, a longitudinal phase and a corresponding first pixel index;
Acquiring a second unfolding phase of the optical focusing system to be tested in a space unwrapping mode, wherein the second unfolding phase is an unfolding phase of a transverse and longitudinal small-period four-step phase shift fringe set projected by the CCD camera on a screen positioned at a position 2 through the optical focusing system to be tested; selecting four points in a cross manner at the center of the second unfolding phase to extract a transverse phase, a longitudinal phase and a corresponding second pixel index; as shown in fig. 3, the position 2 is a position where the screen at the position 1 is moved a distance along the optical axis of the optical focusing system to be measured;
Acquiring a plurality of groups of corresponding first pixel indexes and second pixel indexes, wherein each group of corresponding first pixel indexes and second pixel indexes are acquired after the position of a CCD camera is moved along the optical axis of a tested optical focusing system; the point spacing of the first pixel index and the second pixel index corresponding to each group is differenced, a difference curve (shown in figure 4) is fitted, and when the difference is 0, the pinhole diaphragm position of the corresponding CCD camera is the focal position of the optical focusing system to be tested;
2) Correcting wavefront measurement errors;
The ideal wavefront of the optical focusing system to be measured is set as A (x, y), the random error of the measuring system at the moment t is set as eta (x, y, t), the reference position is defined at the focus position of the optical focusing system to be measured, and after the optical focusing system to be measured is sequentially conjugated and translated along the orthogonal direction of the reference position for s, the detection wavefront W (x, y) of the optical focusing system to be measured can be obtained as follows:
calculating to obtain detection differential wave fronts of the detected optical focusing system in two orthogonal directions:
The Taylor formula expansion can be carried out on the detected differential wave fronts of the detected optical focusing system in two orthogonal directions to obtain:
Wherein, And/>Is an ideal wavefront difference; /(I)Is an error term;
When the translation distance s of the optical focusing system to be detected is increased, the error term is reduced, and the detection error is effectively restrained; however, when the translation distance s is too large, an algorithm error is introduced;
Wave front simulation is carried out on the optical focusing system to be tested through ray tracing, and when the translation distance s is larger than s max, the algorithm error exceeds the error allowable range; setting a translation distance s as an input quantity by adopting an optimization algorithm, wherein the translation distance s ranges from 0 to s max, the wave front PV value is an objective function, and when the wave front PV value does not exceed the error allowable range, obtaining a range value of a corrected translation distance s a;
taking the value in the range value of the corrected translation distance s a as the translation distance s, and calculating to obtain the corrected differential wavefront as follows:
3) Calculating a corrected wavefront:
wherein, (x, y) represents a normalized sampling point of the measured optical focusing system under a rectangular coordinate system, C k is a k term Zernike polynomial coefficient, and Z k (x, y) is a k term orthogonalized Zernike polynomial;
C＝(ΔZTΔZ)-1ΔZT·ΔWa；
Where C is the coefficient of the Zernike polynomial and ΔZ is the basis function of the Zernike polynomial.
In the embodiment, a detection personnel builds a reverse Hartmann optical detection system, wherein the detection system comprises a picture acquisition device, a detected optical focusing system and a screen which are sequentially arranged along the optical axis direction; the image acquisition device comprises a CCD camera with a small aperture diaphragm; the screen is fixedly arranged on the displacement table.
Moving the screen to a position 1, wherein the CCD camera projects a transverse and longitudinal small-period four-step phase shift fringe set on the screen through the optical focusing system to be detected, and the detection system acquires a transverse phase, a longitudinal phase and a corresponding first pixel index through the small-period four-step phase shift fringe set; the screen is then moved to position 2 and the corresponding second pixel index is obtained.
And then, a plurality of groups of corresponding first pixel indexes and second pixel indexes are obtained by moving the CCD camera, and a difference curve is fitted to obtain the focus position of the optical focusing system to be tested. The focus position obtained through the phase auxiliary focusing algorithm has high accuracy, and ensures the detection precision. The fitted difference curves are shown in fig. 4, wherein one curve is the pixel point spacing between the first pixel index and the second pixel index in the horizontal direction, and the other curve is the pixel point spacing between the first pixel index and the second pixel index in the vertical direction.
And after the focal position is obtained, taking the focal position as a reference position, sequentially carrying out conjugate translation s on the orthogonal direction of the reference position of the optical focusing system to be measured, and obtaining the differential wavefront of the optical focusing system to be measured through a conjugate difference method. The larger the translation distance s is, the smaller the error term is, so that the random error can be effectively restrained. However, when the translation distance s is too large, an algorithm error is introduced; therefore, the range value of the proper correction translation distance s a can be obtained, so that the system error can be reduced, and the random error can be reduced.
Wave front simulation is carried out on the optical focusing system to be tested through ray tracing, and when the translation distance s is larger than s max, the algorithm error exceeds the error allowable range; and setting the translation distance s as an input quantity by adopting an optimization algorithm, wherein the translation distance s ranges from 0 to s max, the wave front PV value is an objective function, and when the wave front PV value is minimum, the range value of the corrected translation distance s a is obtained. As shown in fig. 7.
The corrected differential wavefront Δw a is calculated by correcting the translation distance s a, and the corrected wavefront W (x, y) a is calculated by correcting the differential wavefront Δw a.
The corrected wavefront W (x, y) a is obtained by the method, the measurement accuracy and reliability of wavefront detection are effectively improved, the surface shape parameters of the mirror surface are not required to be measured, a mirror surface processing method with high difficulty and strict processing requirements are not required, and the universality and the applicability are further improved.
Example 2
And taking the plano-convex lens model as a tested optical focusing system for simulation verification.
S1: ideal wavefront data of the plano-convex lens model is obtained, and as shown in a graph a in fig. 6, the wavefront PV value is 118.31 mu m; as shown in fig. 6c, the wavefront aberration value is 1.56 μm; the detection wavefront obtained by adding Gaussian noise with the mean value of 0 and the standard deviation of 1 μm is shown in a graph b in FIG. 6;
s2: setting the conjugate translation distance s as 1mm, and normalizing the wavefront data on a unit circle;
S3: differentiating the wavefront data with noise in the X-axis direction and the Y-axis direction respectively;
S4: performing wavefront differential reconstruction, wherein the calculated wavefront aberration PV value is 1.61 mu m, and the residual error compared with the ideal wavefront differential is 50nm;
S5: and simulating the wavefront aberration of the plano-convex lens model under the condition of no difference in the prior art to obtain the wavefront aberration PV value of 2.31 mu m and the residual error of 750nm.
Through comparison, the system error and the random error of the measuring system are greatly reduced through a conjugate difference method, and the wavefront measuring precision improving method of the optical focusing system is applied to a reverse Hartmann optical detection system, so that the measuring precision and reliability are effectively improved, the surface shape parameters of a mirror surface are not required to be measured, and a mirror surface processing method with high difficulty and strict processing requirements are not required, so that the method has universality and applicability.
In the description of the present specification, the terms "one embodiment," "some embodiments," and the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above is only a preferred embodiment of the present application, and is not intended to limit the present application, but various modifications and variations can be made to the present application by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (7)
1. The wavefront measurement precision improving method of the optical focusing system is characterized by comprising the following steps of:
1) Acquiring a focus position of a tested optical focusing system;
2) Correcting wavefront measurement errors; the ideal wavefront of the optical focusing system to be measured is set as A (x, y), the random error of the measuring system at the moment t is set as eta (x, y, t), the reference position is defined at the focus position of the optical focusing system to be measured, and after the optical focusing system to be measured is sequentially conjugated and translated along the orthogonal direction of the reference position for s, the detection wavefront W (x, y) of the optical focusing system to be measured can be obtained as follows:
calculating to obtain detection differential wave fronts of the detected optical focusing system in two orthogonal directions:
The Taylor formula expansion can be carried out on the detected differential wave fronts of the detected optical focusing system in two orthogonal directions to obtain:
Wherein, And/>Is an ideal differential wavefront; /(I)Is an error term;
When the translation distance s of the optical focusing system to be detected is increased, the error term is reduced, and the detection error is effectively restrained; however, when the translation distance s is too large, an algorithm error is introduced;
Wave front simulation is carried out on the optical focusing system to be tested through ray tracing, and when the translation distance s is larger than s max, the algorithm error exceeds the error allowable range; setting a translation distance s as an input quantity by adopting an optimization algorithm, wherein the translation distance s ranges from 0 to s max, the wave front PV value is an objective function, and when the wave front PV value does not exceed the error allowable range, obtaining a range value of a corrected translation distance s a;
The corrected differential wavefront is:
3) Calculating a corrected wavefront:
wherein, (x, y) represents a normalized sampling point of the measured optical focusing system under a rectangular coordinate system, C k is a k term Zernike polynomial coefficient, and Z k (x, y) is a k term orthogonalized Zernike polynomial;
C＝(ΔZTΔZ)-1ΔZT·ΔWa；
Where C is the coefficient of the Zernike polynomial and ΔZ is the basis function of the Zernike polynomial.
2. The method for improving the wavefront measurement accuracy of an optical focusing system according to claim 1, wherein said acquiring the focal position of the optical focusing system under test comprises the steps of:
Acquiring a first unfolding phase of a tested optical focusing system, and extracting a transverse phase, a longitudinal phase and a corresponding first pixel index in the first unfolding phase; acquiring a second unfolding phase of the optical focusing system to be tested, which corresponds to the first unfolding phase, and extracting a transverse phase, a longitudinal phase and a corresponding second pixel index at the second unfolding phase;
And obtaining a plurality of groups of corresponding first pixel indexes and second pixel indexes, making differences between the point distances of the first pixel indexes and the second pixel indexes corresponding to each group, fitting a difference curve, and obtaining the focal position of the optical focusing system to be tested when the difference is 0.
3. The method for improving the wavefront measurement precision of an optical focusing system according to claim 2, wherein the first unwrapped phase is obtained on a small-period four-step phase-shift fringe set by a spatial unwrapping manner, the small-period four-step phase-shift fringe set is a small-period four-step phase-shift fringe set of which a picture-taking device projects a transverse direction and a longitudinal direction on a screen through the optical focusing system to be measured, and the screen is located at a position 1 on an optical axis of the optical focusing system to be measured;
The second unfolding phase is obtained on a small-period four-step phase shift fringe set in a space unwrapping mode, the small-period four-step phase shift fringe set is a small-period four-step phase shift fringe set which is projected on a screen by a tested optical focusing system through a picture collecting device in the transverse and longitudinal directions, and the screen is positioned at a position 2 on the optical axis of the tested optical focusing system; the position 2 is a position where the screen at the position 1 moves a distance along the optical axis of the optical focusing system to be measured.
4. The method for improving the wavefront measurement accuracy of an optical focusing system according to claim 2, wherein the lateral phase and the longitudinal phase are four points selected in a cross-like manner at the center of the first unwrapped phase or the second unwrapped phase.
5. A method for improving wavefront measurement accuracy of an optical focusing system according to claim 3, wherein each set of corresponding first and second pixel indexes is obtained by moving the position of the image capturing device along the optical axis of the optical focusing system under test.
6. A wavefront measurement accuracy enhancing method of an optical focusing system as recited in claim 3 wherein said image capturing device comprises a CCD camera.
7. The method for improving wavefront measurement accuracy of an optical focusing system according to claim 6, wherein the focal position is a pinhole diaphragm position of the CCD camera corresponding to a difference of 0.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6570143B1 (en) * | 1998-09-23 | 2003-05-27 | Isis Innovation Limited | Wavefront sensing device |
| CN104236855A (en) * | 2014-09-09 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | Method for measuring wave aberration of Schwarzschild optical system |
| CN104819781A (en) * | 2015-04-21 | 2015-08-05 | 中国科学院上海光学精密机械研究所 | Improvement and reconstruction method for reconstructing blocking wavefront with area method |
| CN104949763A (en) * | 2015-06-16 | 2015-09-30 | 四川大学 | Lens wavefront aberration measurement method based on inverse hartmann principle |
| CN108061639A (en) * | 2017-12-13 | 2018-05-22 | 中国科学院光电技术研究所 | Large dynamic range and high precision phase difference method wavefront measuring instrument combined with adaptive optics technology |
| CN108225187A (en) * | 2018-01-29 | 2018-06-29 | 清华大学深圳研究生院 | A kind of non-spherical lens error detection method based on wavefront sensing |
-
2024
- 2024-03-15 CN CN202410298504.XA patent/CN118130058A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6570143B1 (en) * | 1998-09-23 | 2003-05-27 | Isis Innovation Limited | Wavefront sensing device |
| CN104236855A (en) * | 2014-09-09 | 2014-12-24 | 中国科学院上海光学精密机械研究所 | Method for measuring wave aberration of Schwarzschild optical system |
| CN104819781A (en) * | 2015-04-21 | 2015-08-05 | 中国科学院上海光学精密机械研究所 | Improvement and reconstruction method for reconstructing blocking wavefront with area method |
| CN104949763A (en) * | 2015-06-16 | 2015-09-30 | 四川大学 | Lens wavefront aberration measurement method based on inverse hartmann principle |
| CN108061639A (en) * | 2017-12-13 | 2018-05-22 | 中国科学院光电技术研究所 | Large dynamic range and high precision phase difference method wavefront measuring instrument combined with adaptive optics technology |
| CN108225187A (en) * | 2018-01-29 | 2018-06-29 | 清华大学深圳研究生院 | A kind of non-spherical lens error detection method based on wavefront sensing |
Non-Patent Citations (2)
| Title |
|---|
| 粘伟 等: "大口径空间相机波前像差拟合与校正研究", 《光学与光电技术》, 31 December 2018 (2018-12-31), pages 50 - 55 * |
| 龙潇: "基于自适应光学技术的相位差法波前测量关键技术研究", 《中国优秀硕士学位论文全文数据库基础科学辑》, 15 February 2021 (2021-02-15), pages 1 - 62 * |
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