CN117784853A - Temperature control method and temperature control device for electrostatic chuck - Google Patents
Temperature control method and temperature control device for electrostatic chuck Download PDFInfo
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- CN117784853A CN117784853A CN202211152494.6A CN202211152494A CN117784853A CN 117784853 A CN117784853 A CN 117784853A CN 202211152494 A CN202211152494 A CN 202211152494A CN 117784853 A CN117784853 A CN 117784853A
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Abstract
An electrostatic chuck temperature control method and a temperature control device, the temperature control method comprises: heating the electrostatic chuck according to target heating power corresponding to target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches a first preset temperature, wherein the first preset temperature is lower than the target temperature, and the difference between the target temperature and the first preset temperature is within a first preset threshold range; and controlling the heating power of the electrostatic chuck through PID control, and adjusting the temperature of the electrostatic chuck to the target temperature. According to the temperature control method, the heating power of the heating device is utilized at the maximum efficiency, so that the electrostatic chuck can be heated up quickly, and the defect of low heating speed of the electrostatic chuck caused by traditional PID control is overcome.
Description
Technical Field
The invention belongs to the field of semiconductor equipment, and particularly relates to a temperature control method and a temperature control device for an electrostatic chuck.
Background
Electrostatic chucks (Electro Static Chuck, ESC) are widely used in integrated circuit or MEMS device fabrication processes, particularly in plasma etching processes. The electrostatic chuck is used to secure, support and control the surface temperature of the wafer within the reaction chamber.
Fig. 1 shows a schematic diagram of a conventional ESC temperature control system. As shown in fig. 1, the lower electrode 1 includes an electrostatic chuck 1-1 with embedded electrodes, a heater 1-2, and a base 1-3, wherein the electrostatic chuck 1-1 is used for adsorbing a wafer, and a cooling water path is embedded in the base 1-3. The cooling water channel is internally communicated with cooling water with constant temperature, and the temperature of the lower electrode 1 is regulated by changing the power of the heater. The temperature measuring element 2 can be an optical fiber or a thermocouple, the signal acquisition module 3 acquires a temperature signal obtained by the temperature measuring element 2 and feeds the temperature signal back to the temperature controller 4, the temperature controller 4 compares the real-time temperature with the target temperature, and the output power of the heater is regulated through a PID algorithm. The power adjusting device 5 can be a solid state relay SSR, and the duty ratio is adjusted through the output of the temperature controller 4 to realize different power outputs. The power supply system 6 supplies power to the heater 1-2 through the power adjusting device 5.
The ESC temperature control system shown in fig. 1 adopts PID control, and in the temperature rising stage, the temperature of the electrostatic chuck is more and more close to the target temperature along with the rising of the temperature, so that the output power is gradually reduced, and the temperature rising rate is affected; in the cooling stage, along with the reduction of the temperature, the temperature of the electrostatic chuck is more and more close to the target temperature, the output power is gradually increased, and the cooling rate is limited. The rate of rise and fall of this control scheme is therefore slow. Fig. 2 illustrates a temperature power profile of the ESC temperature control system of fig. 1 during a ramp up and down.
Disclosure of Invention
The invention aims to provide a temperature control method and a temperature control device for an electrostatic chuck, so as to improve the temperature rise and fall rate of the electrostatic chuck.
In order to achieve the above object, the present invention provides a temperature control method for an electrostatic chuck, comprising:
heating the electrostatic chuck according to a target heating power corresponding to a target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches a first preset temperature, wherein the first preset temperature is lower than the target temperature, and the difference between the target temperature and the first preset temperature is within a first preset threshold range;
and controlling the heating power of the electrostatic chuck through PID control, and adjusting the temperature of the electrostatic chuck to the target temperature.
Preferably, the target heating power corresponding to the target temperature of the electrostatic chuck is determined based on a preset relationship between the temperature of the electrostatic chuck and the heating power.
Preferably, the preset relationship is obtained by:
performing a heating test on the electrostatic chuck to obtain a plurality of temperature values and corresponding heating power values;
fitting the plurality of temperature values and the corresponding heating power values to obtain the preset relation;
wherein the preset relationship is a linear relationship.
Preferably, the target temperature is a first process temperature, the current temperature is less than the first process temperature, the method further comprises:
before the electrostatic chuck is heated according to target heating power corresponding to the target temperature of the electrostatic chuck, the electrostatic chuck is heated by first heating power until the current temperature of the electrostatic chuck reaches a second preset temperature, the first heating power is constant, and the second preset temperature is lower than the first preset temperature.
Preferably, the target temperature ranges from 55 ℃ to 65 ℃, the first preset threshold range is from 0.5 ℃ to 1 ℃, the difference between the target temperature and the second preset temperature is within a second preset threshold range, and the second preset threshold range is from 1 ℃ to 2 ℃.
Preferably, the first heating power is a maximum output power of a heating device of the electrostatic chuck.
Preferably, the target temperature is a second process temperature, the current temperature is greater than the second process temperature, the method further comprising:
and before the electrostatic chuck is heated according to the target heating power corresponding to the target temperature of the electrostatic chuck, setting the heating power to zero until the current temperature of the electrostatic chuck reaches a third preset temperature, wherein the third preset temperature is lower than the first preset temperature.
Preferably, the target temperature is in a range of 35-45 ℃, the first preset threshold range is 0.5-1 ℃, the difference between the target temperature and the third preset temperature is in a third preset threshold range, and the third preset threshold range is 1-2 ℃.
Preferably, the electrostatic chuck comprises a plurality of heating areas, the heating areas are circular or annular, and the heating areas are sleeved in sequence along the radial direction of the electrostatic chuck;
and when the temperatures of all the heating areas reach the first preset temperature, controlling the heating power of each heating area through PID control, and adjusting the temperature of each heating area to the target temperature.
Another aspect of the present invention provides an electrostatic chuck temperature control device, including:
the heating device is arranged at the bottom of the electrostatic chuck;
the temperature collector is used for collecting the temperature of the electrostatic chuck;
and the temperature controller is used for executing the temperature control method based on the temperature acquired by the temperature acquisition device so as to control the heating device.
Preferably, the electrostatic chuck comprises a plurality of heating areas, the heating areas are circular or annular, and the heating areas are sleeved in sequence along the radial direction of the electrostatic chuck; the heating device and the temperature collector are multiple, and each heating area is provided with one heating device and one temperature collector;
the temperature controller executes the temperature control method for each heating area based on the temperature acquired by the corresponding temperature acquisition device so as to control the corresponding heating device.
The invention has the beneficial effects that:
1. before the temperature of the electrostatic chuck reaches a first preset temperature, heating the electrostatic chuck according to target heating power corresponding to the target temperature of the electrostatic chuck so as to avoid temperature overshoot; when the temperature of the electrostatic chuck reaches a first preset temperature, the heating power of the electrostatic chuck is controlled through PID control, and the current temperature of the electrostatic chuck is adjusted to be maintained at a target temperature. The method can avoid temperature overshoot, shortens the time required for adjusting the temperature of the electrostatic chuck to the target temperature, realizes quick temperature rise of the electrostatic chuck, and avoids the defect of low temperature rise speed of the electrostatic chuck caused by traditional PID control.
2. Under the condition that the electrostatic chuck comprises a plurality of heating areas, when the temperatures of all the heating areas reach a first preset temperature, the heating power of each heating area is controlled through PID control, so that the mutual influence among the areas is avoided, and the heating efficiency is reduced.
Additional features and advantages of the invention will be set forth in the detailed description which follows.
Drawings
The foregoing and other objects, features and advantages of the invention will be apparent from the following more particular descriptions of exemplary embodiments of the invention as illustrated in the accompanying drawings wherein like reference numbers generally represent like parts throughout the exemplary embodiments of the invention.
Fig. 1 shows a schematic diagram of a conventional ESC temperature control system.
Fig. 2 shows a temperature power profile of a prior art ESC temperature control system during a ramp up and down.
Fig. 3 shows a temperature-heating power graph of an electrostatic chuck temperature control method according to an embodiment of the present invention.
Fig. 4 shows a graph of temperature and power versus time for an electrostatic chuck temperature control method according to one embodiment of the invention.
Fig. 5 shows a temperature control curve comparison of the prior art and an electrostatic chuck temperature control method according to an embodiment of the present invention.
FIG. 6 shows a schematic diagram of an electrostatic chuck temperature control device in accordance with an embodiment of the present invention.
Reference numerals illustrate:
1 a lower electrode; 1-1 an electrostatic chuck; 1-2 heaters; 1-3 substrates; 2 a temperature measuring element; 3, a signal acquisition module; 4, a temperature controller; 5 a power adjusting device; 6, a power supply system;
101 a first heating zone; 102 a second heating zone; 103 a third heating zone; 104 a fourth heating zone; 105 a first temperature harvester; 106 a second temperature collector; 107 a third temperature harvester; and 108, a fourth temperature collector.
Detailed Description
Preferred embodiments of the present invention will be described in more detail below. While the preferred embodiments of the present invention are described below, it should be understood that the present invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
The embodiment of the invention provides a temperature control method of an electrostatic chuck, which comprises the following steps:
heating the electrostatic chuck according to target heating power corresponding to target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches a first preset temperature, wherein the first preset temperature is lower than the target temperature, and the difference between the target temperature and the first preset temperature is within a first preset threshold range;
and controlling the heating power of the electrostatic chuck through PID control, and adjusting the temperature of the electrostatic chuck to the target temperature.
When the current temperature of the electrostatic chuck approaches to the target temperature and does not reach the first preset temperature, the electrostatic chuck is heated by the target heating power instead of the maximum output power of the heating device, so that the temperature overshoot of the electrostatic chuck can be avoided, the process of temperature returning to the target temperature is avoided, and the overall temperature rising speed of the electrostatic chuck is improved; after the temperature of the electrostatic chuck reaches a first preset temperature, the heating power of the electrostatic chuck is controlled through PID control, and the temperature of the electrostatic chuck is adjusted to be maintained at a target temperature. The method can avoid temperature overshoot, shortens the time required for adjusting the temperature of the electrostatic chuck back to the target temperature, realizes quick temperature rise of the electrostatic chuck, and avoids the defect of low temperature rise speed of the electrostatic chuck caused by traditional PID control.
The target heating power corresponding to the target temperature of the electrostatic chuck may be determined based on a preset relationship between the temperature of the electrostatic chuck and the heating power. Optionally, the preset relationship is obtained by:
step a: and carrying out a heating test on the electrostatic chuck to obtain a plurality of temperature values and corresponding heating power values. In the test process, each temperature value and the corresponding heating power value can be recorded by taking the fixed temperature difference as the step length in the range defined by the highest working temperature and the lowest working temperature of the electrostatic chuck. For example, in the range of 30 to 70 ℃, the heating power corresponding to each temperature value is recorded with a step size of 5 ℃.
Step b: fitting the temperature values and the corresponding heating power values to obtain a preset relation. The electrostatic chuck generally uses a resistive heater as a heating means, so that the temperature and the heating power are approximately linearly related as shown in fig. 4. Other types of preset relationships between temperature and heating power are possible when other types of heating devices are used with the electrostatic chuck, as will be readily appreciated by those skilled in the art.
The target temperature is a first process temperature, and when the current temperature is less than the first process temperature, that is, when the electrostatic chuck needs to be heated, the method further includes:
before the electrostatic chuck is heated according to target heating power corresponding to the target temperature of the electrostatic chuck, the electrostatic chuck is heated by the first heating power until the current temperature of the electrostatic chuck reaches a second preset temperature, the first heating power is constant, and the second preset temperature is lower than the first preset temperature.
In this case, the target temperature is the temperature at which the wafer is processed, which ranges from 55 to 65 ℃. Preferably, the first preset threshold range is 0.5-1 ℃, the difference between the target temperature and the second preset temperature is within the second preset threshold range, and the second preset threshold range is 1-2 ℃.
Preferably, the first heating power is the maximum output power of the heating device of the electrostatic chuck, so that the electrostatic chuck can be heated with maximum efficiency, and the heating speed of the electrostatic chuck is increased
Alternatively, the target temperature is a second process temperature, and when the current temperature is greater than the second process temperature, that is, when the electrostatic chuck needs to be cooled, the method further includes:
before the electrostatic chuck is heated according to the target heating power corresponding to the target temperature of the electrostatic chuck, the heating power is set to zero until the current temperature of the electrostatic chuck reaches a third preset temperature, and the third preset temperature is lower than the first preset temperature. The electrostatic chuck is typically cooled by a water cooling device, the temperature of the cooling water being constant, for example 20 ℃. When the electrostatic chuck needs to be cooled, heating is stopped (namely, the heating power is zero), and the electrostatic chuck is cooled under the action of cooling water of the water cooling device until the current temperature of the electrostatic chuck reaches a third preset temperature, so that the electrostatic chuck can be cooled as soon as possible, and the cooling speed of the electrostatic chuck is improved.
In this case, the target temperature ranges from 35 to 45 ℃, the first preset threshold range is from 0.5 to 1 ℃, the difference between the target temperature and the third preset temperature is within the third preset threshold range, and the third preset threshold range is from 1 to 2 ℃.
Preferably, the electrostatic chuck may be zone heated. In this case, the electrostatic chuck includes a plurality of heating regions, the heating regions are circular or ring-shaped, and the plurality of heating regions are sequentially sleeved in a radial direction of the electrostatic chuck. The temperature control method of the electrostatic chuck is implemented for each heating area, wherein when the temperatures of all the heating areas reach a first preset temperature, the heating power of each heating area is controlled through PID control, and the temperatures of the heating areas are adjusted to the target temperature, so that the influence of the areas on each other is avoided, and the heating efficiency is reduced.
An electrostatic chuck temperature control method according to an embodiment of the present invention is described in detail below with reference to the accompanying drawings. Fig. 3 shows a temperature-heating power graph of an electrostatic chuck in an electrostatic chuck temperature control method, fig. 4 shows a graph of temperature and power change with time in the electrostatic chuck temperature control method, and fig. 5 shows a temperature control graph of the prior art and the electrostatic chuck temperature control method according to an embodiment of the present invention. Referring to fig. 3 to 5, the electrostatic chuck temperature control method includes the steps of:
step 1: and heating the electrostatic chuck with the first heating power until the current temperature of the electrostatic chuck reaches a second preset temperature.
In this embodiment, the target temperature is set to 60 ℃ of the first process temperature at this time. The current temperature (40 ℃) of the electrostatic chuck is less than the target temperature, and the electrostatic chuck needs to be heated. At this time, the electrostatic chuck is heated with the first heating power until the current temperature of the electrostatic chuck reaches the second preset temperature, wherein the first heating power is constant, and is preferably the maximum output power of the heating device of the electrostatic chuck, so that the electrostatic chuck can be heated with the maximum efficiency, and the heating speed of the electrostatic chuck is increased. The second preset temperature is lower than the target temperature, the difference DeltaT 2 between the second preset temperature and the target temperature is within a second preset threshold range, and the second preset threshold range is 1-2 ℃.
In the graph shown in fig. 4, the temperature of the electrostatic chuck at this stage corresponds to the B-C segment of the temperature curve, during which the heating power remains unchanged and is typically the maximum output power of the heating device, and the temperature of the electrostatic chuck rapidly rises to reach the second preset temperature, i.e., the temperature corresponding to point C.
Step 2: and heating the electrostatic chuck according to the target heating power corresponding to the target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches a first preset temperature.
And after the temperature of the electrostatic chuck reaches the second preset temperature, heating the electrostatic chuck according to the target heating power corresponding to the target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches the first preset temperature. The first preset temperature is lower than the target temperature and higher than the second preset temperature, and a difference DeltaT 1 between the target temperature and the first preset temperature is within a first preset threshold range, and the first preset threshold range can be within a range of 0.5-1 ℃. Wherein, as previously described, the target heating power corresponding to the target temperature of the electrostatic chuck is determined based on a preset relationship between the temperature of the electrostatic chuck and the heating power. When the current temperature of the electrostatic chuck is close to the target temperature, the electrostatic chuck is heated by the target heating power instead of the maximum output power of the heating device, so that the temperature overshoot of the electrostatic chuck can be avoided, the process of temperature callback to the heating target temperature is avoided, and the overall temperature rising speed of the electrostatic chuck is improved.
In the graph shown in fig. 4, the temperature of the electrostatic chuck at this stage corresponds to the C-D segment of the temperature curve, and in this process, the heating power remains unchanged, and becomes the target heating power corresponding to the target temperature of the electrostatic chuck, and the temperature of the electrostatic chuck gradually increases to reach the first preset temperature, i.e., the temperature corresponding to the point D.
Step 3: and controlling the heating power of the electrostatic chuck through PID control, and adjusting the temperature of the electrostatic chuck to the target temperature.
After the temperature of the electrostatic chuck reaches a first predetermined temperature, an acceptable temperature range for the process to proceed is reached. At this time, the heating power of the electrostatic chuck is controlled by PID control, and the temperature of the electrostatic chuck is adjusted to a target temperature, even if the difference between the temperature of the electrostatic chuck and the target temperature is smaller than a preset temperature difference, the preset temperature difference is within a first preset threshold range. In the early stage of the PID control, the heating power may be slightly greater than the target heating power corresponding to the target temperature, resulting in a slight fluctuation in the temperature of the electrostatic chuck, as shown in the section D-E of the graph of fig. 4, which is a normal phenomenon. Subsequently, the temperature of the electrostatic chuck was stabilized at the target temperature (60 ℃) under PID control, as shown in sections E-F of the graph of FIG. 4.
Step 4: the heating power is set to zero until the current temperature of the electrostatic chuck reaches a third preset temperature.
After the process is completed, the electrostatic chuck needs to be cooled. The heating power is set to be zero, the heating device stops heating, the electrostatic chuck is cooled under the action of cooling water of the water cooling device until the current temperature of the electrostatic chuck reaches a third preset temperature, and therefore the electrostatic chuck can be cooled as soon as possible, and the cooling speed of the electrostatic chuck is improved. At this time, the target temperature is set to 40 ℃ of the second process temperature, the third preset temperature is lower than the target temperature, the difference between the target temperature and the third preset temperature is within a third preset threshold range, and the third preset threshold range is 1-2 ℃.
In the graph shown in fig. 4, the temperature of the electrostatic chuck at this stage corresponds to the F-G segment of the temperature curve, and in this process, the heating power is zero, and the temperature of the electrostatic chuck rapidly decreases to reach a third preset temperature, i.e., the temperature corresponding to the point G.
Step 5: and heating the electrostatic chuck according to the target heating power corresponding to the target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches a first preset temperature.
And (2) after the temperature of the electrostatic chuck reaches a third preset temperature, heating the electrostatic chuck according to the target heating power corresponding to the target temperature of the electrostatic chuck, and until the current temperature of the electrostatic chuck reaches the first preset temperature. The first preset temperature is lower than the target temperature (40 ℃) and higher than the third preset temperature, the difference value between the target temperature and the first preset temperature is within a first preset threshold range, and the first preset threshold range is still within a range of 0.5-1 ℃.
In the graph shown in fig. 4, the temperature of the electrostatic chuck at this stage corresponds to the G-H segment on the graph, and in this process, the heating power remains unchanged, and is the target heating power corresponding to the target temperature (40 ℃) of the electrostatic chuck, and the temperature of the electrostatic chuck gradually increases to reach the first preset temperature, i.e., the temperature corresponding to the point H.
Step 6: and controlling the heating power of the electrostatic chuck through PID control, and adjusting the temperature of the electrostatic chuck to the target temperature.
After the temperature of the electrostatic chuck reaches a first preset temperature, the heating power of the electrostatic chuck is controlled through PID control, the temperature of the electrostatic chuck is adjusted to a target temperature, and even if the difference between the temperature of the electrostatic chuck and the target temperature is smaller than a preset temperature difference, the preset temperature difference is within a first preset threshold range. In the early stage of the PID control, the heating power may be slightly greater than the target heating power corresponding to the target temperature, resulting in a slight fluctuation in the temperature of the electrostatic chuck, as shown in the section H-I of the graph of fig. 4, which is a normal phenomenon. Subsequently, the temperature of the electrostatic chuck was stabilized at the target temperature (40 ℃) under PID control, as shown in sections I-J of the graph of FIG. 4.
Fig. 5 shows a comparison of temperature control curves of the prior art and the temperature control method of the electrostatic chuck according to the embodiment of the present invention, and it can be seen from fig. 5 that the temperature control method of the present invention has a faster temperature rise rate, which is significantly superior to the prior art.
Preferably, the electrostatic chuck may be zone heated. In this case, the electrostatic chuck includes a plurality of heating regions, the heating regions are circular or ring-shaped, and the plurality of heating regions are sequentially sleeved in a radial direction of the electrostatic chuck. The temperature control method of the electrostatic chuck is implemented for each heating area, and the minimum value of the current temperatures of the heating areas is used as the current temperature of the electrostatic chuck, namely when the temperatures of all the heating areas reach the first preset temperature, the heating power of each heating area is controlled through PID control, and the temperature of each heating area is adjusted to the target temperature, so that the influence of the areas on each other is avoided, and the heating efficiency is reduced.
The embodiment of the invention also provides an electrostatic chuck temperature control device, which comprises:
the heating device is arranged at the bottom of the electrostatic chuck;
the temperature collector is used for collecting the temperature of the electrostatic chuck;
and the temperature controller is used for executing the temperature control method based on the temperature acquired by the temperature acquisition device so as to control the heating device.
Preferably, the electrostatic chuck comprises a plurality of heating areas, the heating areas are circular or annular, and the heating areas are sleeved in sequence along the radial direction of the electrostatic chuck; the heating device and the temperature collector are multiple, and each heating area is provided with one heating device and one temperature collector;
the temperature controller executes the temperature control method for each heating area based on the temperature acquired by the corresponding temperature acquisition device so as to control the corresponding heating device.
In order to flexibly control the temperature of each part of the electrostatic chuck, the electrostatic chuck can be divided into a plurality of heating areas. FIG. 6 shows a schematic diagram of an electrostatic chuck temperature control device in accordance with an embodiment of the present invention. As shown in fig. 6, the electrostatic chuck includes a first heating region 101 to a fourth heating region 104, wherein the first heating region 101 is circular, and the second heating region to the fourth heating region are circular, and the heating regions are sleeved in sequence along the radial direction of the electrostatic chuck. Each heating region is provided with a heating device (for example, a heater) and a temperature collector (respectively, a first temperature collector 105 to a fourth temperature collector 108) for heating the heating region and collecting the temperature of the electrostatic chuck corresponding to the heating region.
For each heating area, the temperature controller executes the temperature control method based on the temperature acquired by the temperature acquisition device corresponding to the heating area, and controls the heating device corresponding to the heating area by taking the minimum value of the current temperatures of the heating areas as the current temperature of the electrostatic chuck, namely, when the temperatures of all the heating areas reach the first preset temperature, the heating power of each heating area is controlled through PID control, and the temperature of each heating area is adjusted to the target temperature, so that the mutual influence among the areas is avoided, and the heating efficiency is reduced.
The foregoing description of embodiments of the invention has been presented for purposes of illustration and description, and is not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the various embodiments described.
Claims (11)
1. An electrostatic chuck temperature control method, comprising:
heating the electrostatic chuck according to a target heating power corresponding to a target temperature of the electrostatic chuck until the current temperature of the electrostatic chuck reaches a first preset temperature, wherein the first preset temperature is lower than the target temperature, and the difference between the target temperature and the first preset temperature is within a first preset threshold range;
and controlling the heating power of the electrostatic chuck through PID control, and adjusting the temperature of the electrostatic chuck to the target temperature.
2. The method of claim 1, wherein the target heating power corresponding to the target temperature of the electrostatic chuck is determined based on a preset relationship between the temperature of the electrostatic chuck and the heating power.
3. The method of claim 2, wherein the predetermined relationship is obtained by:
performing a heating test on the electrostatic chuck to obtain a plurality of temperature values and corresponding heating power values;
fitting the plurality of temperature values and the corresponding heating power values to obtain the preset relation;
wherein the preset relationship is a linear relationship.
4. The method of claim 1, wherein the target temperature is a first process temperature, the current temperature being less than the first process temperature, the method further comprising:
before the electrostatic chuck is heated according to target heating power corresponding to the target temperature of the electrostatic chuck, the electrostatic chuck is heated by first heating power until the current temperature of the electrostatic chuck reaches a second preset temperature, the first heating power is constant, and the second preset temperature is lower than the first preset temperature.
5. The method of claim 4, wherein the first process temperature is in a range of 55-65 ℃, the first preset threshold range is 0.5-1 ℃, the difference between the target temperature and the second preset temperature is in a second preset threshold range, and the second preset threshold range is 1-2 ℃.
6. The method of claim 4, wherein the first heating power is a maximum output power of a heating device of the electrostatic chuck.
7. The method of claim 1, wherein the target temperature is a second process temperature, the current temperature being greater than the second process temperature, the method further comprising:
and before the electrostatic chuck is heated according to the target heating power corresponding to the target temperature of the electrostatic chuck, setting the heating power to zero until the current temperature of the electrostatic chuck reaches a third preset temperature, wherein the third preset temperature is lower than the first preset temperature.
8. The method of claim 7, wherein the second process temperature is in a range of 35-45 ℃, the first preset threshold range is 0.5-1 ℃, the difference between the target temperature and the third preset temperature is in a third preset threshold range, and the third preset threshold range is 1-2 ℃.
9. The method according to claim 1, wherein the electrostatic chuck comprises a plurality of heating areas, the heating areas are circular or ring-shaped, and the plurality of heating areas are sleeved in sequence along the radial direction of the electrostatic chuck;
and when the temperatures of all the heating areas reach the first preset temperature, controlling the heating power of each heating area through PID control, and adjusting the temperature of each heating area to the target temperature.
10. An electrostatic chuck temperature control device, comprising:
the heating device is arranged at the bottom of the electrostatic chuck;
the temperature collector is used for collecting the temperature of the electrostatic chuck;
a temperature controller for performing the temperature control method according to any one of claims 1 to 9 based on the temperature acquired by the temperature collector to control the heating device.
11. The electrostatic chuck temperature control device of claim 10, wherein the electrostatic chuck comprises a plurality of heating areas, the heating areas are circular or annular, and the plurality of heating areas are sleeved in sequence along the radial direction of the electrostatic chuck; the heating device and the temperature collector are multiple, and each heating area is provided with one heating device and one temperature collector;
the temperature controller performs the temperature control method according to claim 9 for each heating region based on the temperature acquired by the corresponding temperature collector to control the corresponding heating device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211152494.6A CN117784853A (en) | 2022-09-21 | 2022-09-21 | Temperature control method and temperature control device for electrostatic chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211152494.6A CN117784853A (en) | 2022-09-21 | 2022-09-21 | Temperature control method and temperature control device for electrostatic chuck |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117784853A true CN117784853A (en) | 2024-03-29 |
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Family Applications (1)
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|---|---|---|---|
| CN202211152494.6A Pending CN117784853A (en) | 2022-09-21 | 2022-09-21 | Temperature control method and temperature control device for electrostatic chuck |
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| Country | Link |
|---|---|
| CN (1) | CN117784853A (en) |
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- 2022-09-21 CN CN202211152494.6A patent/CN117784853A/en active Pending
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