CN117784514A - Mask plate, preparation method thereof and exposure device - Google Patents

Abstract

The application discloses a mask plate and a preparation method and an exposure device thereof, wherein the mask plate comprises a first mask region and a second mask region, the first mask region comprises a plurality of first shading regions, and a first light transmission region is arranged between two adjacent first shading regions along a first direction; the second mask region and the first mask region are arranged along the first direction, the second mask region comprises a plurality of second shading regions, and a second light transmission region is arranged between two adjacent second shading regions along the first direction; the width of the second light transmission area is larger than that of the first light transmission area, the second light transmission area comprises a first preset light transmission area and a second preset light transmission area, the second preset light transmission area is located on two sides of the first preset light transmission area along the first direction, the width of the first preset light transmission area is larger than that of the second preset light transmission area, and the width of the second preset light transmission area, which is at least partially close to the first preset light transmission area, is larger than that of the second preset light transmission area, which is far away from the first preset light transmission area. The mask plate provided by the application can improve the film preparation yield.

Description

Mask plate, preparation method thereof and exposure device

Technical Field

The application belongs to the technical field of display, and particularly relates to a mask plate, a preparation method thereof and an exposure device.

Background

In the preparation process of the display panel, an exposure process is often adopted to realize the patterning of the film layer, but exposure degrees of the photosensitive substrates at different positions are different, so that the risk of reduced preparation yield is easily caused.

Disclosure of Invention

The embodiment of the application provides a mask plate, a preparation method thereof and an exposure device, which can effectively reduce the difference between the line width in a film layer formed by exposure after the mask plate is used for masking and the ideal line width, and further can improve the preparation yield of the film layer.

An embodiment of a first aspect of the present application provides a mask plate, including:

the first mask region comprises a plurality of first shading regions, and a first light transmission region is arranged between two adjacent first shading regions along a first direction;

the second mask region and the first mask region are arranged along a first direction, the second mask region comprises a plurality of second shading regions, and a second light transmission region is arranged between two adjacent second shading regions along the first direction;

the width of the second light transmission area is larger than that of the first light transmission area, the second light transmission area comprises a first preset light transmission area and a second preset light transmission area, the second preset light transmission area is located on two sides of the first preset light transmission area along the first direction, the width of the first preset light transmission area is larger than that of the second preset light transmission area, and in the second preset light transmission area, the width of the second preset light transmission area, which is at least partially close to the first preset light transmission area, is larger than that of the second preset light transmission area far away from the first preset light transmission area.

The embodiment of the second aspect of the present application further provides a method for preparing a mask, including:

providing a substrate;

forming a shading layer on one side of the substrate, and patterning to form a first mask region and a second mask region, wherein the first mask region comprises a plurality of first shading regions, and a first light transmission region is arranged between two adjacent first shading regions along a first direction; the second mask region and the first mask region are arranged along a first direction, the second mask region comprises a plurality of second shading regions, and a second light transmission region is arranged between two adjacent second shading regions along the first direction; the widths of the first light transmission area and the second light transmission area are equal to a second preset width, the second light transmission area comprises a first preset light transmission area and a second preset light transmission area, and the second preset light transmission area is positioned on two sides of the first preset light transmission area along the first direction so as to form a mask plate to be formed;

patterning the film layer to be patterned by using the mask plate to be formed to form a first actual linear part, calculating a difference value between the line width of the first actual linear part and a preset line width of the first linear part, and obtaining a compensation value according to the difference value;

and compensating the width of the second light transmission area in the mask plate to be formed according to the compensation value, so that the width of the first preset light transmission area is larger than the width of the second preset light transmission area, and the width of the second preset light transmission area which is at least partially close to the first preset light transmission area in the second preset light transmission area is larger than the width of the second preset light transmission area which is far away from the first preset light transmission area.

The embodiment of the third aspect of the application also provides an exposure device, which can perform scanning exposure on a material to be exposed, and comprises a light source, a mask plate and a plurality of lenses, wherein the light source, the mask plate and the lenses are sequentially arranged; the orthographic projection portions of adjacent lenses in a preset direction are overlapped to form an overlapped position, the preset direction is perpendicular to the first direction, and the second mask area of the mask plate is arranged corresponding to the overlapped position.

The mask plate provided by the application is used for film patterning, and particularly can be used for forming a whole layer of continuous wires and the like. The mask plate that this application provided includes first mask district and second mask district, and first mask district includes a plurality of first shading district, includes first printing opacity district between two adjacent first shading districts along first direction. The second mask region and the first mask region are arranged along the first direction, the second mask region comprises a plurality of second shading regions, and a second light transmission region is arranged between two adjacent second shading regions along the first direction. The first light-transmitting region and the second light-transmitting region can be used for forming a first linear portion, the width of the first light-transmitting region can be equal to the ideal line width of the first linear portion, the width of the second light-transmitting region can be larger than the ideal line width of the first linear portion, namely, the opening extending along the first direction in the first mask region of the mask plate is consistent with the ideal line width of the first linear portion to be manufactured in the region of the mask plate, and the opening extending along the first direction in the second mask region of the mask plate is larger than the ideal line width of the first linear portion to be manufactured in the region of the mask plate.

Specifically, the exposure device may scan in a second direction perpendicular to the first direction, the first light-transmitting region may be opposite to the middle position of the lens in the exposure device, that is, the middle position of the lens scans across the first light-transmitting region in the second direction, the second light-transmitting region may be opposite to the overlapping position of the lens, that is, the overlapping position of the lens scans across the second light-transmitting region in the second direction, and since there is still a certain difference between the overlapping position of the lens and the middle position in the exposure device, specifically, the light intensity exposure effect of the overlapping position is weaker than that of the middle position, the width of the second light-transmitting region is greater than that of the first light-transmitting region, so that the line width difference of the region of the film layer opposite to the first light-transmitting region and the second light-transmitting region can be reduced; meanwhile, as the overlapping position of the lenses in the exposure device is along two sides of the middle overlapping region, namely, as the light intensity exposure effect is gradually reduced from one side close to the middle position of the two lenses in the overlapping position of the two lenses, the second light transmission region is arranged to comprise a first preset light transmission region and a second preset light transmission region, the second preset light transmission region is positioned on two sides of the first preset light transmission region along the first direction, the width of the first preset light transmission region is larger than that of the second preset light transmission region, and in the second preset light transmission region, the width of the second preset light transmission region at least partially close to the first preset light transmission region is larger than that of the second preset light transmission region far away from the first preset light transmission region, so that the exposure difference can be compensated, the line width difference between the position, which is opposite to the first preset light transmission region and the second preset light transmission region, in the film layer can be effectively reduced, and the difference between the line width and the ideal line width in the film layer formed by the exposure after the mask plate mask can be further improved.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments of the present application will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is an exposure state reference diagram of an exposure apparatus in the related art;

fig. 2 is a schematic structural diagram of a mask provided in an embodiment of the present application;

fig. 3 is a schematic structural diagram of another mask provided in an embodiment of the present application;

fig. 4 is a schematic structural diagram of another mask provided in an embodiment of the present application;

fig. 5 is a schematic structural diagram of another mask provided in an embodiment of the present application;

fig. 6 is a flowchart of a method for preparing a mask according to an embodiment of the present application;

fig. 7 to 10 are schematic diagrams of film layer change in a method for manufacturing a mask according to an embodiment of the present application;

fig. 11 is a schematic structural view of an exposure apparatus according to an embodiment of the present application.

In the accompanying drawings:

10-projection area; 101-an intermediate region; 102-edge area; 201-an overlapping position; 202-an intermediate position; 1-a mask plate; 11-a first mask region; x-a first direction; 111-a first light-shielding region; 112-a first light transmission region; 113-a third light transmission region; 12-a second mask region; 121-a second light-shielding region; 122-a second light transmission region; 123-a first preset light transmission area; 124-a second predetermined light transmission area; 125-a fourth light transmission region; 13-a first light transmissive group; 14-a second light transmissive group; y-a second direction; 15-a communication part; 16-a substrate; 17-a light shielding layer; 2-an exposure device; 21-a light source; 22-lens.

Detailed Description

Features and exemplary embodiments of various aspects of the present application are described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present application. It will be apparent, however, to one skilled in the art that the present application may be practiced without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present application by showing an example of the present application.

It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises an element.

The inventors have found that, as shown in fig. 1, in the course of scanning by a lens in an exposure apparatus, light passes through the lens and is projected onto a photosensitive resin layer coated on a substrate to expose the photosensitive resin layer, wherein the light passes through each lens and is projected onto a plane on which the photosensitive resin layer is located, forming a projection area 10, and the projection area 10 includes a middle area 101 and an edge area 102. The lens is movable relative to the substrate in a scanning direction and the projection area 10 is moved over the photosensitive resin layer with the lens to effect a scanning exposure of the components used in a large-size display device. Since there is a difference in the optical performance of the intermediate position 202 and the optical performance of the edge position of each lens, there is a difference in the exposure degree of the edge region 102 of the projection region 10 from the exposure degree of the intermediate region 101 of the projection region 10. Therefore, overlapping a part of the adjacent lenses in the arrangement direction of the adjacent lenses forms an overlapping position 201 such that the edge regions 102 of the projection region 10 overlap to form an overlapping region to reduce the light intensity difference of the edge regions 102 and the intermediate region 101.

Although the photosensitive resin layer falling into the overlap region is repeatedly exposed by the edge positions of the two lenses of the overlap region 201, since there is still a certain difference between the overlap region 201 and the intermediate region 202, and since the overlap region 201 is gradually reduced in light intensity exposure along the middle of the overlap region to both sides of the overlap region, i.e., the center of the overlap region 201 from the side near the intermediate region 202 of the two lenses in the overlap region 201 of the two lenses, the developed line width of the portion of the photosensitive resin layer falling into the overlap region is different from the developed line width of the portion of the photosensitive resin layer falling into the intermediate region 101, and the line width of the portion of the photosensitive resin layer falling into the overlap region is also not uniform, the line width of the portion of the photosensitive resin layer falling into the overlap region is gradually increased toward the two connected intermediate regions 101, thereby causing the uneven brightness of the display panel or the film pattern to be etched to be covered with the photosensitive resin layer, resulting in the uneven brightness of the display panel.

Based on the research on the problems, the inventor provides a mask plate, a preparation method thereof and an exposure device, so as to reduce the difference between the line width in an exposure forming film layer and the ideal line width and improve the film layer preparation yield.

In order to better understand the present application, a mask plate, a preparation method thereof, and an exposure apparatus according to an embodiment of the present application are described in detail below with reference to fig. 1 to 11.

Referring to fig. 2, an embodiment of the present application provides a mask 1, which includes a first mask region 11 and a second mask region 12. The first mask region 11 includes a plurality of first light-shielding regions 111, and a first light-transmitting region 112 is included between two adjacent first light-shielding regions 111 along the first direction x; the second mask region 12 and the first mask region 11 are arranged along the first direction x, the second mask region 12 comprises a plurality of second light shielding regions 121, and a second light transmitting region 122 is arranged between two adjacent second light shielding regions 121 along the first direction x; the width of the second light-transmitting area 122 is greater than the width of the first light-transmitting area 112, the second light-transmitting area 122 includes a first preset light-transmitting area 123 and a second preset light-transmitting area 124, the second preset light-transmitting area 124 is located at two sides of the first preset light-transmitting area 123 along the first direction x, the width D1 of the first preset light-transmitting area 123 is greater than the width D2 (or D3) of the second preset light-transmitting area 124, and in the second preset light-transmitting area 124, the width D2 of the second preset light-transmitting area 124, which is at least partially close to the first preset light-transmitting area 123, is greater than the width D3 of the second preset light-transmitting area 124, which is far away from the first preset light-transmitting area 123.

The mask plate 1 provided by the application is used for performing film patterning, and optionally, the mask plate 1 in the embodiment of the application can be used for manufacturing a mesh-shaped shading layer pattern or can also be used for manufacturing a mesh-shaped conductor layer pattern. The mask plate 1 provided by the application comprises a first mask region 11 and a second mask region 12, wherein the first mask region 11 comprises a plurality of first shading regions 111, and a first light transmission region 112 is arranged between two adjacent first shading regions 111 along a first direction x. The second mask region 12 and the first mask region 11 are arranged along the first direction x, the second mask region 12 includes a plurality of second light shielding regions 121, and a second light transmitting region 122 is included between two adjacent second light shielding regions 121 along the first direction x. The first light-transmitting region 112 and the second light-transmitting region 122 may be used to form a first linear portion, where the width of the first light-transmitting region 112 may be equal to the desired line width of the first linear portion, and the width of the second light-transmitting region 122 may be greater than the desired line width of the first linear portion, i.e., the opening extending along the first direction x in the first mask region 11 of the mask 1 is consistent with the desired line width of the first linear portion to be manufactured in the region of the mask 1, and the opening extending along the first direction x in the second mask region 12 of the mask 1 is greater than the desired line width of the first linear portion to be manufactured in the region of the mask 1.

Specifically, the exposure device may scan along a second direction y perpendicular to the first direction x, the first light-transmitting region 112 may be opposite to the middle position of the lens in the exposure device, that is, the middle position of the lens scans across the first light-transmitting region 112 along the second direction y, and the second light-transmitting region 122 may be opposite to the overlapping position of the lens, that is, the overlapping position of the lens scans across the second light-transmitting region 122 along the second direction y, since there is still a certain difference between the overlapping position of the lens and the middle position in the exposure device, specifically, the light intensity exposure effect of the overlapping position is weaker than that of the middle position, so that the width of the second light-transmitting region 122 is greater than that of the first light-transmitting region 112 and the second light-transmitting region 122 in the film layer, and thus the line width difference of the region opposite to the first light-transmitting region 122 in the film layer can be reduced; meanwhile, since the overlapping position of the lenses in the exposure apparatus is along two sides of the middle overlapping region, that is, since the light intensity exposure effect is gradually reduced from one side near the middle position of the two lenses to the center of the overlapping position in the overlapping position of the two lenses, the second light transmitting region 122 is set to include the first preset light transmitting region 123 and the second preset light transmitting region 124, the second preset light transmitting region 124 is located at two sides of the first preset light transmitting region 123 along the first direction x, the width of the first preset light transmitting region 123 is larger than the width of the second preset light transmitting region 124, and in the second preset light transmitting region 124, the width of the second preset light transmitting region 124 at least partially near the first preset light transmitting region 123 is larger than the width of the second preset light transmitting region 124 far from the first preset light transmitting region 123, so that the exposure difference can be compensated, the line width of the position opposite to the first preset light transmitting region 123 and the second preset light transmitting region 124 in the film layer can be reduced, and the line width difference between the film forming layer and the ideal film layer can be effectively reduced after the mask 1 is exposed, and the film layer can be further prepared.

In the above embodiment, the width of the second preset light-transmitting region 124 may be symmetrically disposed with respect to the first preset light-transmitting region 123, and since the light intensity exposure effect is gradually reduced from the center of the overlapping position near the middle position of the two lenses in the overlapping position of the two lenses, the line width formed by the light-transmitting region of the same width is gradually reduced from the center of the overlapping position near the middle position of the lenses, and in the above mask, the second preset light-transmitting region 124 having the smaller width is disposed opposite to the center of the overlapping position of the two lenses by disposing the first preset light-transmitting region 123 having the larger width opposite to the two sides of the center of the overlapping position of the two lenses, so that the first preset light-transmitting region 123 may be subjected to a larger light intensity exposure effect, and the second preset light-transmitting region 124 may be subjected to a smaller light intensity exposure effect, so that the uniformity of the line width in the region formed by the mask of the second preset light-transmitting region 122 may be further improved.

In one possible embodiment, as shown in fig. 3, the second mask region 12 includes a plurality of first light-transmitting groups 13, each first light-transmitting group 13 includes a plurality of second preset light-transmitting regions 124 arranged along a first direction x, the second preset light-transmitting regions 124 in each first light-transmitting group 13 have a first preset width, and the first preset widths of different first light-transmitting groups 13 gradually decrease from a direction close to the first preset light-transmitting region 123 to a direction far from the first preset light-transmitting region 123 along the first direction x. Taking the mask plate shown in fig. 3 as an example, the first preset width of the second preset light-transmitting area 124 in the first light-transmitting group 13 disposed adjacent to the first preset light-transmitting area 123 is D2, D2< D1, and the first preset width of the second preset light-transmitting area 124 in the other first light-transmitting group 13 separated from the first preset light-transmitting area 123 by one first light-transmitting group 13 is D3, D3< D2< D1.

In the above embodiment, the second preset light-transmitting area 124 in the second mask area 12 is divided into the plurality of first light-transmitting groups 13, and each first light-transmitting group 13 includes a plurality of second preset light-transmitting areas 124, and the plurality of second preset light-transmitting areas 124 in each first light-transmitting group 13 are arranged along the first direction x, and the second preset light-transmitting areas 124 in each first light-transmitting group 13 have a first preset width, that is, the widths of the second preset light-transmitting areas 124 in each first light-transmitting group 13 are equal, so that the difficulty in designing and manufacturing the second mask area 12 can be conveniently reduced; the first preset widths of the different first light transmission groups 13 gradually decrease from the direction close to the first preset light transmission region 123 to the direction far from the first preset light transmission region 123 along the first direction x, so that the second mask region 12 can reduce the preparation difficulty and simultaneously consider the uniformity of the line width in the region formed by the second mask region 12 after masking.

In a possible embodiment, as shown in fig. 3, the light-transmitting device further includes a second light-transmitting group 14, where the number of the second light-transmitting groups 14 is one, and the first light-transmitting groups 13 located on two sides of the second light-transmitting group 14 along the first direction x and symmetrically distributed about the second light-transmitting group 14 include a first preset light-transmitting area 123.

In the above embodiment, the number of the first light-transmitting groups 13 is an even number.

In the above embodiment, along the first direction x, the first light-transmitting groups 13 located on both sides of the second light-transmitting group 14 are symmetrically distributed about the second light-transmitting group 14 specifically as follows: when the two sides of the second light-transmitting group 14 respectively include one first light-transmitting group 13, the first preset widths in the two first light-transmitting groups 13 are the same. When the two sides of the second light-transmitting group 14 each include a plurality of first light-transmitting groups 13, the first preset widths of the two first light-transmitting groups 13 with respect to the same distance between the second light-transmitting groups 14 on the two sides of the second light-transmitting group 14 are the same, wherein the "same distance" may be that the minimum distance between one second preset light-transmitting area 124 in the first light-transmitting group 13 near the second light-transmitting group 14 and one first preset light-transmitting area 123 in the second light-transmitting group 14 near the first light-transmitting group 13 is the same.

In the above embodiment, the second mask region 12 includes the first light-transmitting group 13 and the second light-transmitting group 14, the first light-transmitting group 13 includes the second preset light-transmitting region 124, the second light-transmitting group 14 includes the first preset light-transmitting region 123, since the light intensity exposure effect gradually decreases from one side near the middle position of the two lenses in the overlapped position of the two lenses to the center of the overlapped position, the light intensity exposure effect at the center of the overlapped position is symmetrically distributed at both sides of the overlapped position, the first light-transmitting group 13 is arranged to be symmetrically distributed with respect to the second light-transmitting group 14, so that the uniformity of the line width in the region formed after the masking by the second mask region 12 can be improved, and the difficulty of designing and manufacturing in the second mask region 12 can be reduced by arranging the second light-transmitting group 14 including the plurality of second preset light-transmitting regions 124.

In one possible embodiment, as shown in fig. 4, the number of the first preset light-transmitting areas 123 in the second light-transmitting group 14 is plural, and the width D3 of the first preset light-transmitting areas 123 is the same.

In the above embodiment, the widths of the first preset light-transmitting areas 123 in the second light-transmitting group 14 are set to be the same, so that the number of the widths of the differentiated first preset light-transmitting areas 123 in the second mask area 12 can be reduced, and the difficulty in designing and manufacturing in the second mask area 12 can be reduced.

In another possible embodiment, as shown in fig. 3, the number of the first preset light-transmitting areas 123 in the second light-transmitting group 14 is one. So as to facilitate a better alignment with the center of the overlapping position of the two lenses.

In a possible embodiment, as shown in fig. 5, the first mask region 11 further includes a plurality of third light-transmitting regions 113, and the third light-transmitting regions 113 are located between two first light-shielding regions 111 adjacent in the second direction y; the second mask region 12 further includes a fourth light-transmitting region 125, and the fourth light-transmitting region 125 is located between the second light-shielding regions 121 adjacent to each other along the second direction y, wherein the second direction y is perpendicular to the first direction x, and a width of the fourth light-transmitting region 125 is greater than a width of the third light-transmitting region 113.

In the above embodiment, both the third light-transmitting region 113 and the fourth light-transmitting region 125 may be used to form the second linear portion, the width of the third light-transmitting region 113 may be equal to the ideal line width of the second linear portion, and the width of the fourth light-transmitting region 125 may be greater than the ideal line width of the second linear portion, that is, the opening extending along the second direction y in the first mask region 11 of the mask plate 1 is consistent with the ideal line width of the second linear portion to be manufactured in the region of the mask plate 1, and the opening extending along the second direction y in the second mask region 12 of the mask plate 1 is greater than the ideal line width of the second linear portion to be manufactured in the region of the mask plate 1. Since the overlapping position in the lens has a weaker exposure effect than the intermediate position, setting the width of the fourth light-transmitting region 125 to be larger than the width of the third light-transmitting region 113 can reduce the line width difference between the second linear portion formed through the mask of the fourth light-transmitting region 125 and the second linear portion formed through the mask of the fourth light-transmitting region 125.

In one possible embodiment, as shown in fig. 5, the first light transmitting region 112, the second light transmitting region 122, the third light transmitting region 113 and the fourth light transmitting region 125 are communicated through the communication portion 15, and the width of the communication portion 15 located in the second mask region 12 is greater than the width of the communication portion 15 located in the first mask region 11.

Specifically, the width of the communication portion 15 may include a width in the first direction x and a width in the second direction y, and the width of the communication portion 15 located in the second mask region 12 is greater than the width of the communication portion 15 located in the first mask region 11 includes: the width of the communication portion 15 located in the second mask region 12 in the first direction x is larger than the width of the communication portion 15 located in the first mask region 11 in the first direction x; the width of the communication portion 15 located in the second mask region 12 along the second direction y is greater than the width of the communication portion 15 located in the first mask region 11 along the second direction y, so that a good communication effect between the first linear portion and the second linear portion can be achieved.

In one possible embodiment, as shown in fig. 5, the first light-shielding regions 111 are arranged in an array, a third light-transmitting region 113 is formed between two columns of first light-shielding regions 111 adjacent in the row direction, the second light-shielding regions 121 are arranged in an array, and a fourth light-transmitting region 125 is formed between two columns of second light-shielding regions 121 adjacent in the row direction.

In the above embodiment, the first light shielding regions 111 are arranged in an array in the first mask region 11, and the second light shielding regions 121 are arranged in an array in the second mask region 12, so that the first linear portions and the second linear portions having uniform line widths are formed.

The application also provides a preparation method of the mask plate 1, as shown in fig. 6, comprising the following steps:

s200, as shown in fig. 7, a substrate 16 is provided.

S400, as shown in fig. 7 and 8, forming a light shielding layer 17 on one side of a substrate 16, and patterning the light shielding layer to form a first mask region 11 and a second mask region 12, wherein the first mask region 11 includes a plurality of first light shielding regions 111, and a first light transmitting region 112 is included between two adjacent first light shielding regions 111 along a first direction x; the second mask region 12 and the first mask region 11 are arranged along the first direction x, the second mask region 12 comprises a plurality of second light shielding regions 121, and a second light transmitting region 122 is arranged between two adjacent second light shielding regions 121 along the first direction x; the widths of the first light-transmitting area 112 and the second light-transmitting area 122 are equal to a second preset width, the second light-transmitting area 122 comprises a first preset light-transmitting area 123 and a second preset light-transmitting area 124, and the second preset light-transmitting areas 124 are located on two sides of the first preset light-transmitting area 123 along the first direction x so as to form a mask plate to be formed.

Specifically, the first light-transmitting region 112 and the second light-transmitting region 122 can be used to form a first linear portion, and in the mask to be formed, the widths of the first light-transmitting region 112 and the second light-transmitting region 122 are equal to a second preset width, wherein the second preset width can be an ideal width of the first linear portion.

And S600, patterning the film layer to be patterned by using the mask plate to be formed to form a first actual linear part, calculating a difference value between the line width of the first actual linear part and a preset line width of the first linear part, and obtaining a compensation value according to the difference value.

In the process of patterning the film layer to be patterned by using the mask plate to be formed, the middle position of the lens in the exposure device can be opposite to the first mask region 11, and the overlapping position of the lens can be opposite to the second mask region 12. The preset line width of the first linear portion, that is, the ideal line width of the first linear portion, may be a second preset width, and a difference between the line width of the first actual linear portion and the second preset width is calculated to obtain a compensation value, where the line width of the first actual linear portion formed through the first mask region 11 may be the same as the second preset width, and the line width of the first actual linear portion formed through the second mask region 12 may be smaller than the second preset width.

S800, as shown in FIG. 9, the width of the second transparent region 122 in the mask plate to be formed is compensated according to the compensation value, so that the width of the first preset transparent region 123 is larger than the width of the second preset transparent region 124, and the width of the second preset transparent region 124, at least partially close to the first preset transparent region 123, in the second preset transparent region 124 is larger than the width of the second preset transparent region 124 far from the first preset transparent region 123. Specifically, in fig. 9, the width D1 of the first preset light transmitting region 123 is greater than the width D2 or D3 of the second preset light transmitting region 124, and the width D2 of the second preset light transmitting region 124 near the first preset light transmitting region 123 is greater than the width D3 of the second preset light transmitting region 124 far from the first preset light transmitting region 123.

Since the light intensity exposure effect gradually decreases from the center of the overlapping position of the two lenses to the center of the overlapping position from the side near the middle position of the two lenses, the line width of the first linear portion formed by masking the second mask region 12 from the center in the first direction x to the both sides in the second mask region 12 can be gradually decreased. Therefore, in the step S800, the first preset light-transmitting region 123 and the second preset light-transmitting region 124 in the second light-transmitting region 122 can be respectively compensated, so that the width of the first preset light-transmitting region 123 is greater than the width of the second preset light-transmitting region 124, and the width of the second preset light-transmitting region 124 at least partially close to the first preset light-transmitting region 123 in the second preset light-transmitting region 124 is greater than the width of the second preset light-transmitting region 124 far from the first preset light-transmitting region 123, so that the uniformity of the line width of the first linear portion formed by the mask of the second mask region 12 is better.

In the above embodiment, obtaining the compensation value according to the difference value includes: the largest difference between the line width of the first actual linear portion and the second preset value is a first compensation value, the width of the first preset light transmitting area 123 is compensated by the first compensation value, the difference between the first compensation value and the preset gradient value is used as a second compensation value, and the width of the second preset light transmitting area 124 is compensated by the second compensation value, wherein the second compensation value corresponding to the second preset light transmitting area 124 at least partially close to the first preset light transmitting area 123 is larger than the second compensation value corresponding to the second preset light transmitting area 124 far away from the first preset light transmitting area 123.

Specifically, a maximum difference between the line width of the first actual linear portion formed through the second mask region 12 and the second preset width is calculated as a first compensation value, and the first preset light-transmitting region 123 is compensated according to the first compensation value, so as to increase the width of the first preset light-transmitting region 123. Then, by using the difference between the first compensation value and the preset gradient value as the second compensation value, specifically, the minimum difference between the line width of the first actual linear portion formed by the second mask region 12 and the second preset width can be calculated as the minimum compensation value, and the preset gradient value can be calculated according to the difference between the first compensation value and the minimum compensation value and the number of the second preset light transmitting regions 124. When the number of the second preset light-transmitting areas 124 is greater, the second preset light-transmitting areas 124 may be divided into a plurality of first light-transmitting groups 13, each first light-transmitting group 13 includes a plurality of second preset light-transmitting areas 124, the second compensation values corresponding to the second preset light-transmitting areas 124 in each first light-transmitting group 13 are the same, at this time, the preset gradient value may be the difference between the first compensation value and the minimum compensation value divided by the number of the first light-transmitting groups 13 located on one side of the first preset light-transmitting area 123, and the first light-transmitting groups 13 located on one side of the first preset light-transmitting area 123 are numbered from 1, and the second compensation value corresponding to the second preset light-transmitting area 124 in each first light-transmitting group 13 is the product of the number of the first light-transmitting group 13 and the preset gradient value plus the first compensation value. Therefore, the uniformity of the line width of the film layer formed in the second shielding region can be improved, and the preparation of the second shielding region is facilitated.

Specifically, when the number of the second preset light transmitting regions 124 is greater, only the line widths of the preset number of the first actual linear portions may be measured, and particularly, the line widths of the uniformly distributed 50 first actual linear portions may be measured. When the number of the second preset light-transmitting regions 124 is smaller, the actual difference between the line width of the first actual linear portion formed in the second mask region 12 and the second preset width can be used as the compensation value of the second light-transmitting region 122.

In one possible embodiment, as shown in fig. 10, further comprising:

patterning the light shielding layer 17 to form a third light transmitting region 113 and a fourth light transmitting region 125, wherein the third light transmitting region 113 is located in the first mask region 11, and the third light transmitting region 113 is located between two adjacent first light shielding regions 111 along the second direction y; the fourth light-transmitting region 125 is located in the second mask region 12, and the fourth light-transmitting region 125 is located between the second light-shielding regions 121 adjacent to each other along the second direction y, wherein the second direction y is perpendicular to the first direction x. So as to form a full-face continuous film layer.

In one possible embodiment, compensating the width of the second light-transmitting region 122 in the mask to be molded according to the compensation value includes:

the light shielding layer 17 is further patterned according to the compensation value to increase the width of the second light shielding region 121.

In the above embodiment, further patterning the light shielding layer 17 includes removing a portion of the light shielding layer 17 by an etching process to increase the width of the second light shielding region 121. Etching processes include, but are not limited to, photolithography, dry etching, and the like.

The application also provides an exposure device 2, which can be used for forming a patterned film layer on the substrate 3, wherein the exposure device 2 can scan and expose a material to be exposed, and the exposure device 2 comprises a light source 21, any one of the mask plates 1 provided in the above embodiment and a plurality of lenses 22 which are sequentially arranged; the orthographic projection portions of the adjacent lenses 22 in the preset direction overlap to form overlapping positions, and the preset direction is perpendicular to the first direction x, and the second mask area 12 of the mask plate 1 is arranged corresponding to the overlapping positions.

In the exposure device 2, the second mask region 12 of the mask plate 1 is arranged corresponding to the overlapping position, so that the problem of non-uniformity of the line width caused by the difference between the overlapping position and the middle position of the lens 22 can be improved by compensating the second mask region 12, thereby being beneficial to improving the uniformity of the line width of the film layer formed by the exposure device 2, reducing the difference between the film layer and the ideal line width, and improving the preparation yield.

These examples are not intended to be exhaustive or to limit the invention to the precise forms disclosed, and claimed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best utilize the invention and various modifications as are suited to the particular use contemplated. This application is to be limited only by the claims and the full scope and equivalents thereof.

Claims (12)

1. A mask plate, comprising:

the first mask region comprises a plurality of first shading regions, and a first light transmission region is arranged between two adjacent first shading regions along a first direction;

the second mask region and the first mask region are arranged along a first direction, the second mask region comprises a plurality of second shading regions, and a second light transmission region is arranged between two adjacent second shading regions along the first direction;

the width of the second light transmission area is larger than that of the first light transmission area, the second light transmission area comprises a first preset light transmission area and a second preset light transmission area, the second preset light transmission area is located on two sides of the first preset light transmission area along the first direction, the width of the first preset light transmission area is larger than that of the second preset light transmission area, and in the second preset light transmission area, the width of the second preset light transmission area, which is at least partially close to the first preset light transmission area, is larger than that of the second preset light transmission area far away from the first preset light transmission area.

2. The mask plate according to claim 1, wherein the second mask region includes a plurality of first light-transmitting groups, each of the first light-transmitting groups includes a plurality of second preset light-transmitting regions arranged along the first direction, the second preset light-transmitting regions in each of the first light-transmitting groups have a first preset width, and the first preset widths of the different first light-transmitting groups gradually decrease from a direction close to the first preset light-transmitting region to a direction far from the first preset light-transmitting region along the first direction.

3. The mask plate according to claim 2, further comprising a second light-transmitting group, wherein the number of the second light-transmitting groups is one, the first light-transmitting region is included, and each of the first light-transmitting groups located at two sides of the second light-transmitting group is symmetrically distributed with respect to the second light-transmitting group along the first direction.

4. The mask plate according to claim 3, wherein the number of the first preset light transmission areas in the second light transmission group is a plurality of, and the widths of the first preset light transmission areas are the same.

5. The mask plate according to claim 1, wherein the first mask region further comprises a plurality of third light-transmitting regions, the third light-transmitting regions being located between two of the first light-shielding regions adjacent in the second direction; the second mask region further comprises a fourth light-transmitting region, the fourth light-transmitting region is located between the second light-shielding regions adjacent to each other along the second direction, the second direction is perpendicular to the first direction, and the width of the fourth light-transmitting region is larger than that of the third light-transmitting region.

6. The mask plate according to claim 5, wherein the first light-transmitting region, the second light-transmitting region, the third light-transmitting region and the fourth light-transmitting region are communicated through a communication portion, and a width of the communication portion located in the second mask region is larger than a width of the communication portion located in the first mask region.

7. The mask plate according to claim 5, wherein the first light-shielding regions are arranged in an array, the third light-transmitting region is formed between two adjacent columns of the first light-shielding regions in a row direction, the second light-shielding regions are arranged in an array, and the fourth light-transmitting region is formed between two adjacent columns of the second light-shielding regions in a row direction.

8. The preparation method of the mask plate is characterized by comprising the following steps:

providing a substrate;

forming a shading layer on one side of the substrate, and patterning to form a first mask region and a second mask region, wherein the first mask region comprises a plurality of first shading regions, and a first light transmission region is arranged between two adjacent first shading regions along a first direction; the second mask region and the first mask region are arranged along a first direction, the second mask region comprises a plurality of second shading regions, and a second light transmission region is arranged between two adjacent second shading regions along the first direction; the widths of the first light transmission area and the second light transmission area are equal to a second preset width, the second light transmission area comprises a first preset light transmission area and a second preset light transmission area, and the second preset light transmission area is positioned on two sides of the first preset light transmission area along the first direction so as to form a mask plate to be formed;

patterning the film layer to be patterned by using the mask plate to be formed to form a first actual linear part, calculating a difference value between the line width of the first actual linear part and a preset line width of the first linear part, and obtaining a compensation value according to the difference value;

and compensating the width of the second light transmission area in the mask plate to be formed according to the compensation value, so that the width of the first preset light transmission area is larger than the width of the second preset light transmission area, and the width of the second preset light transmission area which is at least partially close to the first preset light transmission area in the second preset light transmission area is larger than the width of the second preset light transmission area which is far away from the first preset light transmission area.

9. The method according to claim 8, wherein,

obtaining a compensation value from the difference value includes: the largest difference between the line width of the first actual linear part and the second preset value is a first compensation value, the width of the first preset light transmission area is compensated by the first compensation value, the difference between the first compensation value and a preset gradient value is used as a second compensation value, and the width of the second preset light transmission area is compensated by the second compensation value, wherein the second compensation value corresponding to the second preset light transmission area at least partially close to the first preset light transmission area is larger than the second compensation value corresponding to the second preset light transmission area far away from the first preset light transmission area.

10. The method of manufacturing according to claim 8, further comprising:

patterning the shading layer to form a third light-transmitting region and a fourth light-transmitting region, wherein the third light-transmitting region is positioned in the first mask region, and the third light-transmitting region is positioned between two adjacent first shading regions along a second direction; the fourth light-transmitting area is located in the second mask area, and the fourth light-transmitting area is located between the second light-shielding areas adjacent to each other along the second direction, wherein the second direction is perpendicular to the first direction.

11. The method according to claim 8, wherein compensating the width of the second light-transmitting region in the mask to be molded according to the compensation value comprises:

and further patterning the light shielding layer according to the compensation value to increase the width of the second light shielding region.

12. An exposure device capable of scanning exposure of a material to be exposed, comprising a light source, a mask plate according to any one of claims 1 to 7 and a plurality of lenses arranged in this order; the orthographic projection portions of adjacent lenses in a preset direction are overlapped to form an overlapped position, the preset direction is perpendicular to the first direction, and the second mask area of the mask plate is arranged corresponding to the overlapped position.