CN117742084A - Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field - Google Patents
Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field Download PDFInfo
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- CN117742084A CN117742084A CN202311854125.6A CN202311854125A CN117742084A CN 117742084 A CN117742084 A CN 117742084A CN 202311854125 A CN202311854125 A CN 202311854125A CN 117742084 A CN117742084 A CN 117742084A
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- immersion liquid
- flow field
- liquid supply
- objective lens
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- 239000007788 liquid Substances 0.000 title claims abstract description 143
- 238000007654 immersion Methods 0.000 title claims abstract description 138
- 238000011084 recovery Methods 0.000 title claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 238000005086 pumping Methods 0.000 claims description 16
- 239000012530 fluid Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 abstract description 6
- 230000001965 increasing effect Effects 0.000 abstract description 5
- 230000000087 stabilizing effect Effects 0.000 abstract description 2
- 230000001629 suppression Effects 0.000 abstract 1
- 238000002347 injection Methods 0.000 description 11
- 239000007924 injection Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 8
- 238000000671 immersion lithography Methods 0.000 description 8
- 238000007789 sealing Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000010349 pulsation Effects 0.000 description 3
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- 230000003749 cleanliness Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
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- 239000000356 contaminant Substances 0.000 description 1
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- 238000004088 simulation Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
Abstract
The invention relates to an immersion liquid supply and recovery device for improving pressure characteristics of an immersion flow field. The invention has a top groove arranged on the top surface of the immersion liquid supply and recovery device, the gap between the surrounding surface and the side surface of the objective lens is communicated with the top groove, the top groove is provided with a groove outer side surface opposite to the side surface of the objective lens, and the surrounding surface is farther from the side surface of the objective lens than the groove outer side surface. The width of the surrounding surface from the side surface of the objective lens is changed in the circumferential direction, so that the surrounding surface is farther from the side surface of the objective lens than the other circumferential positions at the two ends of the substrate in the moving direction, thereby increasing the local gap volume between the immersion liquid supply and recovery device and the end objective lens, reducing the lifting height of the top liquid level when the immersion liquid is locally accumulated or reduced, realizing the suppression of the pressure fluctuation of the immersion flow field and the amplitude of the top liquid level sloshing, further stabilizing the pressure of the immersion flow field, ensuring the stability of the optical property of the immersion flow field and ensuring the exposure quality.
Description
Technical Field
The invention belongs to the technical field of immersion liquid recovery of an immersion lithography machine, and relates to an immersion liquid supply and recovery device for improving pressure characteristics of an immersion flow field.
Background
A photolithography machine is one of the core equipment for manufacturing very large scale integrated circuits, which precisely projects a circuit pattern on a reticle onto a photoresist-coated substrate using an optical system and modifies the photoresist exposure, thereby leaving circuit pattern information on the substrate. It includes a laser light source, a projection objective system, a projection reticle containing a circuit pattern, and a substrate coated with a photosensitive photoresist.
In contrast to a dry lithographic apparatus in which the intermediate medium is a gas, an immersion lithographic (Immersion Lithography) apparatus increases the resolution and depth of focus of the lithographic apparatus by filling the gap between the last projection objective and the substrate with a liquid of a certain high refractive index, and by increasing the refractive index (n) of the gap liquid medium to increase the Numerical Aperture (NA) of the projection objective. In the current mainstream lithography technology, immersion lithography is widely used because of its good inheritance from earlier dry lithography. For filling with immersion liquid, however, the solution widely used is the local immersion method, i.e. the use of an immersion liquid supply and recovery device to confine the liquid to a local area between the lower surface of the last projection objective and the upper surface of the substrate. Maintaining the optical consistency and transparency of the immersion liquid in the exposure area is critical to ensuring the quality of immersion lithography exposure. Therefore, in the prior art, the immersion flow field is updated in real time through liquid injection and recovery, and photochemical pollutants, local heat, micro-nano bubbles and the like are timely taken away from the core exposure area, so that the high purity and uniformity of the immersion liquid are ensured.
As shown in fig. 1 and 2, the projection objective system in the immersion lithography machine has a terminal objective 1 nearest to a substrate 2, and a first gap 11 is formed between the terminal objective 1 and the substrate 2; an immersion liquid supply and recovery device 3 is provided around the end objective lens 1, the immersion liquid supply and recovery device 3 supplying an immersion liquid LQ into the first gap 11, the immersion liquid supply and recovery device 3 having a center through hole 31 for passing the exposure laser beam from the end objective lens 1; when the exposure laser beam carrying the circuit pattern information passes through the end objective lens 1, the exposure laser beam enters the immersion liquid LQ, passes through the immersion liquid LQ and then is projected on the substrate 2; for an exposure laser beam with a wavelength of 193nm commonly used in an immersion lithography machine, the immersion liquid LQ may use ultrapure water, and the refractive index of the ultrapure water for 193nm laser is greater than that of air, so that, compared with a dry lithography machine, the exposure laser beam of the immersion lithography machine can be converged into a smaller-scale exposure target area after passing through the end objective lens 1 and the immersion liquid LQ, thereby forming a smaller-scale circuit pattern on a substrate, and improving the exposure resolution of the lithography machine. In order to avoid that the immersion liquid supply and recovery device 3 transmits vibrations and thermal disturbances to the end objective 1 to disturb its optical properties, the immersion liquid supply and recovery device 3 is arranged not to be in contact with the end objective 1, so that a second gap 12 is formed between the end objective 1 and the immersion liquid supply and recovery device 3. Since existing immersion lithography machines move the substrate 3 relative to the end objective 1 according to the scanning stepping principle during exposure, the exposure laser beam scanningly projects a single circuit pattern into a single target area of the substrate 2 and stepwisely projects the same circuit pattern into multiple target areas of the substrate 2; since the substrate 2 moves relative to the end objective 1 and the immersion liquid supply and recovery device 3 is stationary relative to the end objective 1, the substrate 2 moves relative to the immersion liquid supply and recovery device 3, and a third gap 13 exists between the substrate 2 and the immersion liquid supply and recovery device 3.
Since the laser beam heats the immersion liquid LQ during exposure, the photoresist on the substrate 2 undergoes a photochemical reaction that may produce a release of contaminants into the immersion liquid LQ, and a change in the temperature and cleanliness of the immersion liquid LQ will result in a change in its optical properties; the immersion liquid supply and recovery device 3 is thus arranged to drive the continuous flow of immersion liquid LQ for maintenance of its temperature and cleanliness, in particular, a main liquid injection port 4 is arranged in the immersion liquid supply and recovery device 3 towards the second gap 12, the immersion liquid LQ being supplied to the second gap 12 via the main liquid injection port 4 using the immersion liquid supply system LS; a main pumping outlet 5 facing the second gap 12 and located at the opposite side of the main liquid injection port 4 is provided in the immersion liquid supply and recovery device 3, and the main pumping system VM is used to pump the immersion liquid LQ through the main pumping outlet 5; most of the immersion liquid LQ flows from the main liquid injection port 4 into the second gap 12 and then into the first gap 11, and then the immersion liquid in the first gap 11 and the second gap 12 is pumped out by the main pumping port 5; a part of the immersion liquid LQ flows into the third gap 13, and in order to avoid that a large amount of immersion liquid LQ remains on the surface of the substrate 2 to cause a photolithography defect of the substrate 2 and avoid that the immersion liquid LQ wets other components to cause damage, the immersion liquid supply and recovery device 3 is provided with a sealing pumping port 6 on the surface facing the substrate 2, and the sealing pumping port 6 can be a circle of uniformly arranged small holes or annular gaps, and the immersion liquid LQ in the third gap 13 is pumped out through the sealing pumping port 6 by using the sealing pumping system VC. In order to avoid that the substrate 2 pulls the immersion liquid LQ during the scanning and stepping movement, and to avoid that the substrate 2 is separated from the constraint of the sealing pump drainage port 6 due to excessive pulling of the immersion liquid LQ during the high-speed movement, an airtight seal 7 is arranged on the radial outer side of the sealing pump drainage port 6 in the immersion liquid supply and recovery device 3, a gas supply system AS is used for supplying a gas flow to the third gap 13 through the airtight seal 7, and under the action of the increased pressure and the purging of the gas flow, the constraint capacity of the sealing pump drainage port 6 on the immersion liquid LQ is also enhanced. The main pumping port 5 and the sealing pumping port 6 completely pump out the immersion liquid LQ, a meniscus 20 is formed between the immersion liquid LQ and the peripheral gas, and an immersion liquid space surrounded by the meniscus 20 is an immersion flow field.
Pulling the immersion liquid LQ during the scanning and stepping movement of the substrate 2 causes a pressure increase or decrease in the immersion flow field due to the viscous force, so that the pressure in the region facing the direction of movement of the substrate 2 increases and the pressure in the region facing away from the direction of movement of the substrate 2 decreases. In the second gap 12, the top level 21 of the submerged flow field exists as a free level which will push the top level 21 up if the pressure in the submerged flow field increases; the rise of the top liquid level 21 causes, on the one hand, the risk of overflow of the immersion liquid LQ from the upper surface of the feed-in liquid supply-recovery device 3 to other areas of the lithographic apparatus, and, on the other hand, since the pressure of the immersion flow field is related to the height of the free liquid level, the rise and fall of the top liquid level 21 will cause fluctuations in the pressure in the immersion flow field, which will affect the exposure quality. For example, as shown in FIG. 3, the substrate 2 is subjected to a step movement 41 in the-X direction relative to the end objective 1 and the immersion liquid supply and recovery device 3, the immersion liquid in the-X side region of the first gap 11 facing the direction of movement of the substrate 2 accumulates and the pressure increases due to the effect of viscous forces, while the immersion liquid in the +X side region facing away from the direction of movement of the substrate 2 decreases and the pressure decreases, resulting in an increase in the-X side top liquid surface 21 and a decrease in the +X side top liquid surface 21 in the second gap 12, the-X side top liquid surface 21 may overflow the top of the immersion liquid supply and recovery device 3 causing immersion liquid to remain, and the +X side top liquid surface 21 may come out of contact with the main pump 5 causing a decrease in pumping power for the immersion liquid; in addition, the scanning and stepping movements can be generally regarded as being performed reciprocally, and when the substrate 2 performs the stepping movement 41 in the +X direction with respect to the end objective lens 1 and the immersion liquid supply/recovery device 3, the top liquid surface 21 on the +X side in the second gap 12 is caused to descend and the top liquid surface 21 on the +X side is caused to ascend; this "sloshing" of the top liquid surface 21 causes a decrease in the working efficiency of the main filling port 4 and the main pumping port 5, as well as the introduction of adverse pressure pulsations into the immersion fluid flow field.
Disclosure of Invention
The invention aims to provide an immersion liquid supply and recovery device for improving the pressure characteristic of an immersion flow field, so as to inhibit the phenomenon of up-and-down oscillation of a top liquid level.
The invention has a surrounding surface surrounding the side surface of the objective, a gap is formed between the surrounding surface and the side surface of the objective, and two opposite ends of the surrounding surface on the horizontal section are provided with an immersion liquid supply opening and an immersion liquid pumping opening; the width between the surrounding surface and the side of the objective lens varies in the circumferential direction in at least one horizontal section of the surrounding surface.
The surrounding surfaces are located farther from the side of the objective lens than the other circumferential positions at both ends of the substrate movement in one direction.
The surrounding surfaces are located farther from the side of the objective lens than the other circumferential positions at both ends of the substrate movement in the two directions perpendicular to each other.
The surrounding surface is located farther from the side of the objective lens than other circumferential positions in the vicinity of the immersion liquid supply opening and the immersion liquid discharge opening.
The surrounding surface is farther from the side surface of the objective lens than other circumferential positions near both ends of the vertical direction connecting the immersion liquid supply opening and the immersion liquid suction opening.
The invention can also be a surrounding surface which surrounds the side surface of the objective lens, a gap is formed between the surrounding surface and the side surface of the objective lens, and the two opposite ends of the surrounding surface on the horizontal section are provided with an immersion liquid supply opening and an immersion liquid pumping opening; the immersion liquid supply and recovery device is characterized by further comprising a top groove arranged on the top surface of the immersion liquid supply and recovery device, wherein a gap between the surrounding surface and the side surface of the objective lens is communicated with the top groove, the top groove is provided with a groove outer side surface opposite to the side surface of the objective lens, and the groove outer side surface is farther away from the side surface of the objective lens than the surrounding surface.
The immersion liquid is supplied through an immersion liquid supply opening in the surrounding surface such that a top level of the immersion liquid is located radially inward of the top tank when the substrate is stationary.
The groove outer sides are farther from the objective side than the other circumferential positions at both ends of the substrate movement in one direction.
The groove outer side faces are farther from the objective lens side faces than other circumferential positions at both ends of the substrate movement direction perpendicular to each other.
The tank outer side is farther from the objective side in the vicinity of the immersion liquid supply opening and the immersion liquid discharge opening than in other circumferential positions.
The width of the surrounding surface of the immersion liquid supply and recovery device from the side surface of the objective lens is changed in the circumferential direction, so that the surrounding surface is farther from the side surface of the objective lens than other circumferential positions at two ends of the substrate in the moving direction, the local gap volume between the immersion liquid supply and recovery device and the end objective lens is increased, the lifting height of the top liquid level is reduced when the immersion liquid is locally accumulated or reduced, the pressure fluctuation of the immersion flow field and the amplitude of the top liquid level are inhibited, the pressure of the immersion flow field is more stable, the optical property of the immersion flow field is ensured to be stable, and the exposure quality is ensured.
Drawings
FIG. 1 is a schematic longitudinal cross-sectional view of an immersion liquid supply recovery device and an immersion flow field;
FIG. 2 is a schematic bottom view of the immersion liquid supply and recovery apparatus;
FIG. 3 is a schematic illustration of a substrate pull resulting in a change in the top liquid level;
FIG. 4 is a graph showing the pressure distribution of the immersion flow field in the first gap when the substrate is subjected to a step motion;
FIG. 5 is a schematic diagram of a first embodiment of the present invention;
FIG. 6 is a schematic diagram of a second gap according to a first embodiment of the present invention;
FIG. 7 is a schematic diagram of a second gap according to a second embodiment of the present invention;
FIG. 8 is a schematic diagram of a third embodiment of a second gap;
FIG. 9 is a schematic diagram of a fourth embodiment of the present invention;
fig. 10 is a schematic diagram of a second gap according to a fourth embodiment of the present invention.
Detailed Description
Example 1
Through fluid simulation of the immersion flow field, it was found that the pressure distribution in the immersion flow field radially inside the through holes 31 exhibited the configuration shown in fig. 4 when the substrate was subjected to the step motion 41 in the-X direction. In fig. 4, the isobars 50 depict the pressure distribution pattern in the immersion flow field, with a local high-pressure region 51 on the side of the main injection port 4 facing the substrate movement direction and a local low-pressure region 52 on the side of the main extraction port 5 facing away from the substrate movement direction. The substrate pulls the immersion liquid in the first gap 11 toward the-X side, and the immersion liquid is blocked by the through hole 31 to accumulate, so that pressure accumulation is generated on the-X direction side of the through hole 31, and the top liquid level 21 is also raised; the substrate pulls the immersion liquid away from the +x side of the first gap 11, causing a pressure reduction on the +x side of the through hole 31 and also causing the top liquid level 21 to drop.
As shown in fig. 5 and 6, in the present invention, the horizontal width of the second gap is set to be varied in the circumferential direction with respect to such phenomenon and cause of the pressure distribution of the immersion flow field and the fluctuation of the top liquid level. Specifically, the end objective 1 has an objective side 122, and the immersion liquid supply and recovery device 3 has a surrounding surface 121 facing the objective side 122, and a second gap 12 is formed between the surrounding surface 121 and the objective side 122; as shown in fig. 6, the second gap 12 is taken along a horizontal plane, and the width D of the second gap 12 varies in the circumferential direction; objective lens side 122 is generally circular in cross section, and may be provided with a surrounding surface 121 having an elliptical cross section, which will achieve a satisfactory second gap 12. Surrounding surface 121 may be located further from objective side 122 than elsewhere circumferentially around surrounding surface 121 near main port 4 and main pump outlet 5 to achieve a larger local volume, such that when stepping motion 41 causes immersion liquid near main port 4 and main pump outlet 5 to accumulate or decrease, top liquid level 21 may rise or fall less, enhancing the cushioning effect of second gap 12 against pressure rise or fall, thereby stabilizing the pressure in the immersion flow field. It will be appreciated that the horizontal cross-sectional shape of circumferential surface 121 need not be elliptical, but may be other shapes having non-equal circumferential positions from objective side 122.
Example two
As shown in fig. 7, the horizontal cross section of the set surrounding surface 121 is elliptical, and is farther from the objective lens side surface 122 at both ends away from the main injection port 4 and the main suction port 5. Typically, the substrate scanning movement direction 42 is set along the Y-axis direction, that is, the vertical direction of the connection line between the main liquid injection port 4 and the main liquid pumping port 5; in addition, in order to obtain higher lithographic efficiency, a scanning motion with a longer path is expected to have a higher speed than a stepping motion, so that the pulling action on the immersion liquid is stronger when the substrate is in the scanning motion, and the raising and lowering effects on the top liquid surface 21 are also stronger; the wider width of the second gap 12 in the Y-axis direction is advantageous in suppressing disturbance of the substrate scanning motion to the height of the top liquid surface 21.
The rest of the implementation is the same as in example one.
Example III
As shown in fig. 8, surrounding surface 121 is provided in a diamond shape, wherein surrounding surface 121 is farther from objective side 122 than other positions in the circumferential direction at both ends of the X-axis and Y-axis. This arrangement has a suppressing effect on both the substrate scanning movement and the step movement on the disturbance of the height of the top liquid surface 21.
The rest of the implementation is the same as in example one.
Example IV
As shown in fig. 9 and 10, a top groove 14 is provided on the top surface of the immersion liquid supply and recovery device 3, the top groove 14 communicates with the second gap 12 and is opposite to the objective lens side surface 122, and the top groove 14 is located above the main liquid injection port 4 and the main liquid extraction port 5; the top liquid level 21 is located radially inward of the top tank 14 when the immersion liquid is supplied to bring the substrate to rest. Since the top tank 14 has a horizontal width and volume that is wider than the second gap 12, the pressure fluctuations of the submerged flow field have less effect on the height of the top liquid surface 21 in the top tank 14; in addition, the provision of the top groove 14 can keep the width of the second gap 12 unchanged while suppressing pressure pulsation, so that the change in flow resistance of the immersion liquid discharge flow path from the main liquid injection port 4 is small, the immersion liquid can be made to flow into the second gap 12 and the first gap 11 more easily, and the power of supplying the immersion liquid through the main liquid injection port 4 can be prevented from being excessively increased. Top groove 14 has a groove outer side 123, and a top groove width d is formed between groove outer side 123 and objective side 122; the horizontal cross section of the top groove outer side 123 may be provided in a diamond shape, and further from the objective lens side 122 than other positions in the circumferential direction at both ends of the X-axis and the Y-axis, the disturbance of the scanning and stepping movement of the substrate to the height of the top liquid surface 21 can be suppressed better. Of course, similarly to the first or second embodiment, the groove outer surface 123 may be provided so that the horizontal cross section is an ellipse having both ends farther from the objective lens side 122 in the X direction or both ends farther from the objective lens side 122 in the Y direction, so as to enhance the suppressing effect of the pressure pulsation for the local position where the pressure fluctuation of the immersion flow field is large.
The foregoing and construction describes the basic principles, principal features and advantages of the present invention product, as will be appreciated by those skilled in the art. The foregoing examples and description are provided to illustrate the principles of the invention and to provide various changes and modifications without departing from the spirit and scope of the invention as defined by the appended claims. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (5)
1. An immersion liquid supply recovery device for improving pressure characteristics of an immersion flow field is characterized in that: the immersion liquid pump comprises a surrounding surface surrounding the side surface of the objective, wherein a gap is formed between the surrounding surface and the side surface of the objective, and an immersion liquid supply opening and an immersion liquid pumping opening are arranged at two opposite ends of the horizontal section of the surrounding surface; the immersion liquid supply and recovery device is characterized by further comprising a top groove arranged on the top surface of the immersion liquid supply and recovery device, wherein a gap between the surrounding surface and the side surface of the objective lens is communicated with the top groove, the top groove is provided with a groove outer side surface opposite to the side surface of the objective lens, and the groove outer side surface is farther away from the side surface of the objective lens than the surrounding surface.
2. The immersion fluid supply and recovery apparatus for improving the pressure characteristics of an immersion flow field according to claim 1 wherein: the immersion liquid is supplied through an immersion liquid supply opening in the surrounding surface such that a top level of the immersion liquid is located radially inward of the top tank when the substrate is stationary.
3. The immersion fluid supply and recovery apparatus for improving the pressure characteristics of an immersion flow field according to claim 1 wherein: the groove outer sides are farther from the objective side than the other circumferential positions at both ends of the substrate movement in one direction.
4. The immersion fluid supply and recovery apparatus for improving the pressure characteristics of an immersion flow field according to claim 1 wherein: the groove outer side faces are farther from the objective lens side faces than other circumferential positions at both ends of the substrate movement direction perpendicular to each other.
5. The immersion fluid supply and recovery apparatus for improving the pressure characteristics of an immersion flow field according to claim 1 wherein: the tank outer side is farther from the objective side in the vicinity of the immersion liquid supply opening and the immersion liquid discharge opening than in other circumferential positions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311854125.6A CN117742084A (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311854125.6A CN117742084A (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field |
| CN202011561135.7A CN112650028B (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field |
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| CN202011561135.7A Division CN112650028B (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field |
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| CN117742084A true CN117742084A (en) | 2024-03-22 |
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| CN202311854125.6A Pending CN117742084A (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field |
| CN202011561135.7A Active CN112650028B (en) | 2020-12-25 | 2020-12-25 | Immersion liquid supply recovery device for improving pressure characteristic of immersion flow field |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101639631B (en) * | 2004-06-10 | 2012-07-18 | 尼康股份有限公司 | Exposure apparatus, exposure method, and method for producing elements |
| US9176393B2 (en) * | 2008-05-28 | 2015-11-03 | Asml Netherlands B.V. | Lithographic apparatus and a method of operating the apparatus |
| NL2007182A (en) * | 2010-08-23 | 2012-02-27 | Asml Netherlands Bv | Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method. |
| NL2008979A (en) * | 2011-07-11 | 2013-01-14 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
| US20130135594A1 (en) * | 2011-11-25 | 2013-05-30 | Nikon Corporation | Liquid immersion member, immersion exposure apparatus, exposure method, device manufacturing method, program, and recording medium |
| US9323160B2 (en) * | 2012-04-10 | 2016-04-26 | Nikon Corporation | Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium |
| CN108020992B (en) * | 2016-10-31 | 2019-11-26 | 上海微电子装备（集团）股份有限公司 | A kind of liquid feed apparatus of immersion and method |
| CN112068401B (en) * | 2020-09-03 | 2023-08-11 | 浙江启尔机电技术有限公司 | Immersion liquid supply and recovery device with gas-liquid separation pumping and exhausting functions |
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| CN112650028B (en) | 2024-02-09 |
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