CN117489809A - Control method and control system of gate valve device and semiconductor device - Google Patents
Control method and control system of gate valve device and semiconductor device Download PDFInfo
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- CN117489809A CN117489809A CN202311736158.0A CN202311736158A CN117489809A CN 117489809 A CN117489809 A CN 117489809A CN 202311736158 A CN202311736158 A CN 202311736158A CN 117489809 A CN117489809 A CN 117489809A
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- 238000000034 method Methods 0.000 title claims abstract description 65
- 239000004065 semiconductor Substances 0.000 title claims abstract description 26
- 230000007246 mechanism Effects 0.000 claims abstract description 92
- 230000009471 action Effects 0.000 claims abstract description 47
- 238000009423 ventilation Methods 0.000 claims description 4
- 230000002159 abnormal effect Effects 0.000 abstract description 9
- 230000008569 process Effects 0.000 description 31
- 230000005540 biological transmission Effects 0.000 description 13
- 238000012546 transfer Methods 0.000 description 11
- 235000012431 wafers Nutrition 0.000 description 10
- 238000001514 detection method Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000003908 quality control method Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/0254—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor being operated by particular means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K37/00—Special means in or on valves or other cut-off apparatus for indicating or recording operation thereof, or for enabling an alarm to be given
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The application discloses a control method, a control system and a semiconductor device of a gate valve device, wherein the gate valve device is applied to the semiconductor device, and the control method comprises the following steps: receiving a control signal, wherein the control signal is a signal for controlling the action of a valve plate control mechanism; acquiring the air pressure state in each air passage; judging whether the air pressure states in all the air paths are in a stable state or not; when the air pressure state of each air passage is in a stable state, the opening and closing states of the air inlets of each air passage are controlled according to the control signals so as to control the valve plate control mechanism to act. According to the control method of the door valve device, before the door valve device performs the switching action, the air pressure state in the air path of air supply is detected, and after the air pressure state of the air path is determined to be in a stable state, the switching operation is performed, so that the problem that the door valve device is abnormal in switching due to unstable air pressure of the air path of air supply is avoided.
Description
Technical Field
The present disclosure relates to the field of gate valve control technologies, and in particular, to a control method, a control system, and a semiconductor device for a gate valve device.
Background
High vacuum Gate Valve devices (Gate Valve) are widely used in physical vapor deposition (PVD, physical Vapor Deposition) or chemical vapor deposition (CVD, (Chemical Vapor Deposition) apparatuses for achieving high vacuum isolation and small-range pressure control of process chambers in deposition apparatuses, such as vacuum coating apparatuses, where a Gate Valve device is required to seal vacuum chambers.
Disclosure of Invention
The application discloses a control method, a control system and semiconductor equipment of a gate valve device, which are used for solving the problem of abnormal opening and closing of the gate valve device caused by unstable air pressure of an air path of air supply.
In a first aspect, the present application discloses a control method of a gate valve device, where the gate valve device is applied to a semiconductor device, the gate valve device includes an air path, a valve plate, and a valve plate control mechanism, each of the air paths is a channel for providing air to the valve plate control mechanism, the valve plate is disposed in a matching manner with a connection port of a chamber of the semiconductor device, and the valve plate control mechanism is used for controlling a position of the valve plate, and the control method includes:
receiving a control signal, wherein the control signal is a signal for controlling the valve plate control mechanism to act;
acquiring the air pressure state in each air passage;
judging whether the air pressure states in the air paths are all in a stable state or not;
when the air pressure state of each air channel is in a stable state, the opening and closing states of the air inlets of each air channel are controlled according to the control signals so as to control the valve plate control mechanism to act.
In an exemplary embodiment, the control signal includes one of a closing signal and an opening signal, the closing signal is a signal for controlling the valve plate control mechanism to perform a closing action so that the valve plate closes the connection port, and the opening signal is a signal for controlling the valve plate control mechanism to perform an opening action so that the valve plate opens the connection port.
In an exemplary embodiment, the air paths include a first air path and a second air path, and when the control signal is an opening signal, the ventilation state of each air path is controlled according to the control signal, so as to control the valve plate control mechanism to act, including:
the first air inlet of the first air channel is controlled to be opened so as to supply air to the valve plate control mechanism, so that the valve plate control mechanism is in a state to be actuated;
controlling a second air inlet of the second air channel to be opened so that the valve plate control mechanism executes an opening action;
judging whether the opening action is executed in place, and locking the opening state of the valve plate control mechanism when the opening action is executed in place.
In an exemplary embodiment, locking the open state of the valve plate control mechanism includes:
and controlling the first air inlet of the first air channel to be closed so as to stop supplying air to the valve plate control mechanism, so that the valve plate control mechanism is in a locking state.
In an exemplary embodiment, when the control signal is a closing signal, the ventilation state of each air path is controlled according to the control signal, so as to control the valve plate to perform actions, including:
a first air inlet of the first air channel is controlled to be opened so as to ventilate the valve plate control mechanism, so that the valve plate control mechanism is in a state to be actuated;
and controlling a second air inlet of the second air channel to be closed so as to stop supplying air to the valve plate control mechanism, so that the valve plate control mechanism executes closing action.
In an exemplary embodiment, after controlling the air inlet of the second air path to be closed, the method further includes:
judging whether the closing action is executed in place or not;
and when the closing action is executed in place, confirming the opening state of the first air inlet and the closing state of the second air inlet so as to confirm that the closing action of the valve plate control mechanism is executed successfully.
In an exemplary embodiment, determining whether the air pressure state in each air path is in a stable state includes:
respectively acquiring a plurality of air pressure values of each air circuit in preset time;
judging whether a plurality of air pressure values corresponding to the air paths are all in a preset range, and determining that the air pressure state in each air path is in a stable state when the air pressure values are in the preset range.
In an exemplary embodiment, the control method further includes:
and when the air pressure state in at least one air channel is not in a stable state, adjusting the air pressure state of the air channel which is not in the stable state.
In a second aspect, the present application discloses a control system of a gate valve apparatus, the control system comprising:
the receiving device is used for receiving a control signal, wherein the control signal is a signal for controlling the valve plate control mechanism to act;
the acquisition device is used for acquiring the air pressure state in each air passage;
the judging device is used for judging whether the air pressure state in each air path is in a stable state or not;
and the control device is used for controlling the opening and closing states of the air inlets of the air channels according to the control signals when the air pressure states of the air channels are in a stable state so as to control the valve plate control mechanism to act.
In a third aspect, the present application discloses a semiconductor device comprising a control system of the gate valve arrangement according to the second aspect.
In the control method, the control system and the semiconductor device of the gate valve device, before the valve plate control mechanism is controlled to act, the air pressure state in the air channel for providing air for the valve plate control mechanism is preferentially obtained so as to judge whether the air pressure state in each air channel is in a stable state or not; when the air pressure state of each air passage is in a stable state, the opening and closing state of the air inlets of each air passage is controlled according to the control signal so as to control the valve plate control mechanism to act, and the problem of abnormal opening and closing of the gate valve device caused by unstable air pressure of the air passages is avoided.
Drawings
In order to more clearly describe the technical solutions in the embodiments or the background of the present application, the following description will describe the drawings that are required to be used in the embodiments or the background of the present application.
Fig. 1 is a schematic structural view of a gate valve device according to an exemplary embodiment of the present application.
Fig. 2 is a schematic structural view of chambers connected in a semiconductor epitaxial apparatus according to an exemplary embodiment of the present application.
Fig. 3 is a flowchart of a control method of a gate valve device according to an exemplary embodiment of the present application.
Fig. 4 is a schematic flow chart of an opening action performed by the gate valve device according to the exemplary embodiment of the present application.
Fig. 5 is a schematic flow chart of a gate valve device according to an exemplary embodiment of the present application.
Fig. 6 is a block diagram of a control system of a gate valve device according to an exemplary embodiment of the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be described below with reference to the drawings in the embodiments of the present application. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present disclosure, are within the scope of the present disclosure.
As an alternative implementation of the disclosure, as shown in fig. 1, fig. 1 is a schematic structural diagram of a gate valve device provided in the disclosure. The gate valve apparatus 100 is applied to a semiconductor device, which may be a semiconductor etching device, a semiconductor deposition device, a semiconductor epitaxial device, or the like, for example. As shown in fig. 2, fig. 2 schematically illustrates a schematic structure of chambers connected in a semiconductor epitaxial apparatus including a loading chamber (not shown), a transfer chamber 30, and a process chamber 20. In the semiconductor manufacturing process, the process chamber 20 is a chamber for performing process growth, and the chamber has extremely high requirements on sealability and stability. The transfer chamber 30 is a transition chamber for wafers from the loading chamber, which is a chamber for loading wafers, to the process chamber 20, and a robot (not shown) is mounted inside the transfer chamber 30. For example, the wafer is transported on the semiconductor epitaxial device as follows: wafers enter the loading chamber from the outside, and the robot arm takes the wafers out of the loading chamber and sends the wafers into the process chamber 20 through the transmission chamber 30 for epitaxial growth. The three chambers have high requirements on tightness, and can be completely communicated when the three chambers are required to be communicated, and the condition of complete sealing is also achieved when the three chambers are required to be sealed. The sealing between the various chambers, such as the process chamber 20 and the transfer chamber 30, and the transfer chamber 30 and the loading chamber is accomplished by a gate valve assembly 100.
As shown in fig. 1 and 2, the transmission chamber 30 may be connected to the process chamber 20 through a flange, and have connectors 10 communicating with each other, and a gate valve device 100 is disposed at a position corresponding to the connectors 10, where the gate valve device 100 includes a gas path, a valve plate 120, and a valve plate control mechanism 110, and the gate valve device 100 may be controlled to be opened or closed by the gas path. Referring to fig. 1, for example, the gate valve apparatus 100 has two gas paths, namely, a first gas path 200 and a second gas path 300, each of which is a path for supplying gas to the valve plate control mechanism 110, and the valve plate 120 is disposed in matching with the connection port 10 between the process chamber 20 and the transfer chamber 30 of the semiconductor device, and the valve plate control mechanism 110 is used for controlling the position of the valve plate 120 so as to seal and open the connection port 10. In the process of semiconductor manufacturing technology, the control of the surface quality of the wafer is particularly important, besides the surface quality control of the deposition technology, the quality control of the wafer in the transmission process plays a key role, and the wafer has good technology and transmission environment and stable equipment, which is an important condition of mass production technology and scientific research technology equipment.
However, referring to fig. 1, in the related art, the valve plate control mechanism 110 is usually driven to reciprocate linearly by directly ventilating the valve plate control mechanism 100 to drive the valve plate 120 to reciprocate linearly up and down, so as to realize the opening and closing operation of the connection port 10 between the process chamber 20 and the transmission chamber 30, and the control method is easy to cause fluctuation of the valve plate 120 in the opening and closing process due to pressure fluctuation of the power gas, for example, fluctuation of one path of gas pressure in the first gas path 200 and the second gas path 300 is caused suddenly, so that the valve plate control mechanism 110 may be blocked in the opening and closing process, or uncontrolled repeated movement of the valve plate control mechanism is not controlled, so that the functions of opening and closing the connection port 10 by the valve plate 120 cannot be completely and effectively realized, floating dust in the process chamber 20 and impurities in other chambers float, the environment inside the process chamber 20 is changed, the quality index of the wafer is abnormal, and related property loss is caused.
In order to solve the above technical problems, an embodiment of the present application discloses a method for controlling a gate valve device, as shown in fig. 3, fig. 3 is a flowchart of the method for controlling a gate valve device disclosed in the embodiment of the present application, and the method for controlling a gate valve device provided in the present application is described in detail with reference to fig. 1 to 3. Referring to fig. 1, the control method of the gate valve device includes:
step S110, receiving a control signal, wherein the control signal is a signal for controlling the valve plate control mechanism to act;
step S120, acquiring the air pressure state in each air path;
step S130, judging whether the air pressure state in each air path is in a stable state;
and step 140, when the air pressure state of each air passage is in a stable state, controlling the opening and closing states of the air inlets of each air passage according to the control signals so as to control the valve plate control mechanism to act.
Illustratively, referring to fig. 1 and 2, the opening and closing of the gate valve apparatus 100 between the process chamber 20 and the transfer chamber 30 is described as an example. In the semiconductor manufacturing process, when the process chamber 20 and the transmission chamber 30 are required to be connected and disconnected, the gate valve device 100 needs to be controlled to be opened and closed to seal and open the connection port 10 between the process chamber 20 and the transmission chamber 30, so that a control signal for controlling the action of the valve plate control mechanism 110 can be sent out through an automatic control program, wherein the control signal is a closing signal for controlling the valve plate control mechanism 110 to perform a closing action so as to enable the valve plate 120 to close the connection port 10, or the control signal is an opening signal for controlling the valve plate control mechanism 110 to perform an opening action so as to enable the valve plate 120 to open the connection port 10.
For example, before the control signal is sent, whether the operating environments in the process chamber 20 and the transmission chamber 30 meet the operating conditions may be detected, so that the gate valve device 100 is controlled to perform actions to ensure the operation safety of the equipment when the operating environments meet the operating conditions. For example, the pressure difference between the process chamber 20 and the transfer chamber 30 may be detected, and when the pressure difference between the two chambers meets a preset condition, for example, the pressure difference between the process chamber 20 and the transfer chamber 30 is not more than 50mbar, a control signal may be sent to prevent the pressure difference between the two chambers from being too large, so that the gate valve device 100 is not opened, or the environment in the chamber is suddenly changed due to the transient pressure change. For example, it is also possible to detect whether the gas types in the process chamber 20 and the transfer chamber 30 are the same, and detect whether the gas types are air, so as to determine that the gas types in the process chamber 20 and the transfer chamber 30 are the same, and send out a control signal when the gas types are detected to be not air, so as to prevent accidents caused by different gas types, where the judgment of the gas types can be detected and identified by the gas sensor, and also can be judged by the control logic.
Illustratively, referring to fig. 1, the first air path 200 and the second air path 300 connected to the valve plate control mechanism 110 are both filled with air, so as to avoid the problem of abnormal opening and closing caused by unstable air pressure state of the air path for supplying air when the door valve device 100 is opened and closed, and before the door valve device 100 performs the action, the air pressure states in the first air path 200 and the second air path 300 are preferentially acquired; and then judging whether the air pressure states in the first air channel 200 and the second air channel 300 are in a stable state or not respectively, so as to judge whether the air pressure in the first air channel 200 and the second air channel 300 has air pressure fluctuation or not according to the air pressure states. When the air pressure states of the first air path 200 and the second air path 300 are in the stable state, the air pressure in each air path is relatively stable, and no air pressure fluctuation exists, and then the opening and closing states of the air inlets of the first air path 200 and the second air path 300 are controlled according to the control signal to control the valve plate control mechanism 110 to act, so as to prevent the phenomenon that the door valve device 100 cannot be normally opened or closed due to the air pressure fluctuation.
In the control method of the gate valve device, before the valve plate control mechanism is controlled to act, the air pressure state in the air path for providing air for the valve plate control mechanism is preferentially obtained, so as to judge whether the air pressure state in each air path is in a stable state or not; when the air pressure state of each air passage is in a stable state, the opening and closing state of the air inlets of each air passage is controlled according to the control signal so as to control the valve plate control mechanism to act, and the problem of abnormal opening and closing of the gate valve device caused by unstable air pressure of the air passages is avoided.
In this embodiment, the control method of the gate valve device is not limited to be implemented by various platforms such as a PLC, a single chip microcomputer, and an upper computer, and various programming languages. According to the control method of the door valve device, before the door valve device performs the switching action, the air pressure state in the air passage of air supply is detected, the switching operation is performed after the air pressure state of the air passage is determined to be in a stable state, so that the problem that the door valve device is abnormal in switching caused by unstable air pressure of the air passage of air supply is avoided, dust caused by abnormal switching in a cavity is obviously improved, and the equipment can guarantee the running stability in a longer period.
Illustratively, referring to fig. 1, the valve plate control mechanism 110 includes a housing 160, a valve shaft 130, a closing sensor 140, and an opening sensor 150, and the first air path 200 may be connected to the housing 160 through a first air inlet (not shown) having a first valve 210 for controlling the opening and closing of the first air inlet to supply air to the valve shaft 130. The second air path 300 may be connected to the housing 160 through a second air inlet (not shown) having a second valve 310 for controlling the opening and closing of the second air inlet to supply air to the door valve shaft 130. The off-position sensor 140 is a sensor that detects whether the position of the valve plate 120 is closed in place to determine whether the closing action of the valve plate control mechanism 110 is in place. The open position sensor 150 is a sensor that detects whether the position of the valve plate 120 is open in place to determine whether the opening action of the valve plate control mechanism 110 is in place.
Referring to fig. 1, for example, the body of the valve shaft 130 is movably connected to the housing 160, one end of the valve shaft 130 is fixedly connected to the valve plate 120, and the valve shaft 130 can reciprocate linearly up and down according to the air supply states of the first air path 200 and the second air path 300, so as to drive the valve plate 120 to reciprocate linearly up and down, thereby closing or opening the connection port 10.
For example, referring to fig. 1, the open sensor 150 includes a detection end 151 of the open sensor and an open magnetic switch 152, the detection end 151 of the open sensor may be disposed at a lower portion of the housing 160, and correspondingly, the open magnetic switch 152 may be disposed at a lower portion of the door valve shaft 130. The off-position sensor 140 includes a detection end 141 of the off-position sensor and an off-position magnetic switch 142, and the detection end 141 of the off-position sensor may be disposed at an upper portion of the housing 160, and the off-position magnetic switch 142 may be disposed at an upper portion of the door valve shaft 130.
The process of opening the control gate valve device will be described in detail with reference to fig. 1 and 4. Referring to fig. 4, a schematic flow chart of an opening operation performed by the gate valve device is exemplarily shown. When the control signal is an opening signal, the control gate valve device executes an opening action process comprising:
step S310, acquiring the air pressure state in each air path.
Specifically, referring to fig. 1, a first air pressure sensor 220 may be provided on the first air path 200 to detect the air pressure of the first air path 200, and a second air pressure sensor 320 may be provided on the second air path 300 to detect the air pressure of the second air path 300. Illustratively, the first air pressure sensor 220 and the second air pressure sensor 320 are, for example, piezoresistive sensors, and the principle thereof is to use the characteristic that the resistance value changes with the deformation of the diaphragm to achieve the measurement of the air pressure.
Step 320, judging whether the air pressure states of the air paths are all in a stable state.
In this step, illustratively, determining whether the air pressure state within each air path is in a steady state includes:
step S311, respectively acquiring a plurality of air pressure values of each air path in preset time;
step S312, judging whether a plurality of air pressure values corresponding to each air path are all in a preset range, and determining that the air pressure state in each air path is in a stable state when each air pressure value is in the preset range.
Specifically, a plurality of first air pressure values of the first air path 200 within a preset time may be acquired by the first air pressure sensor 220, and a plurality of second air pressure values of the second air path 300 within a preset time may be acquired by the second air pressure sensor 320; then, whether the first air pressure values and the second air pressure values are in the preset range is determined, and when the first air pressure values and the second air pressure values are in the preset range, the air pressure state of the first air circuit 200 and the air pressure state of the second air circuit 300 are determined to be in a stable state. In this embodiment, the preset ranges of the first air path 200 and the second air path 300 for determining the air pressure state may be the same or different. For example, taking the case that the air pressure states of the first air path 200 and the second air path 300 are in the same preset range, for example, the preset range is between 0.4MPa and 0.8MPa, when the first air pressure values of the first air path 200 are between 0.4MPa and 0.8MPa and the second air pressure values of the second air path 300 are between 0.4MPa and 0.8MPa, it can be determined that the air pressure states of the first air path 200 and the second air path 300 are both in the stable state.
Illustratively, the determination conditions for determining whether the air pressure state of the first air path 200 and the air pressure state of the second air path 300 are in a stable state may be: in at least one preset period, the first air pressure values of the first air path 200 and the second air pressure values of the second air path 300 are within the fluctuation range of the preset range, and then it may be determined that the air pressure state of the first air path 200 and the air pressure state of the second air path 300 are both in a stable state. The preset period is, for example, 1-2 seconds, the preset range can be used as a standard range, for example, the standard range can take a value of 0.4-0.6 MPa, and the fluctuation range can take a value of 2% -5%. For example, two preset periods are selected, and the two preset periods may be two continuous periods or two periods with interval time, and the duration of the preset periods is 2 seconds, for example. In each 2 second period, when the first air pressure values of the first air path 200 and the second air pressure values of the second air path 300 fluctuate within 5% of the standard range (0.4 MPa-0.6 MPa), the air pressure states of the first air path 200 and the second air path 300 are both in a stable state. The duration of the preset period, the period number to be met and the fluctuation range can be adjusted according to actual conditions.
Step S330, the first air inlet of the first air path is controlled to be opened.
In step S320, after determining that the air pressure state of the first air path 200 and the air pressure state of the second air path 300 are both in the stable state, the first air inlet of the first air path 200 is controlled to be opened. Referring to fig. 1, the first valve 210 may be controlled to be opened so as to supply air to the valve shaft 130 through the first air passage 200, so that the valve plate control mechanism 110 is in a state to be actuated. In the step, under the condition that the air pressure state of each air passage is determined to be in a stable state, the follow-up action is continuously executed.
Step S340, controlling the second air inlet of the second air path to open.
In this step, referring to fig. 1, after a certain period of time, for example, after 10 ms has elapsed after the first air inlet is opened, the second valve 310 may be controlled to be opened to control the second air inlet of the second air path 300 to be opened, so that air is supplied to the valve shaft 130 through the second air path 300, so that the valve plate control mechanism 110 performs an opening action, and thus the valve shaft 130 is controlled to move downward to drive the position of the valve plate 120 to move slowly, so as to open the connection port 10 between the process chamber 20 and the transmission chamber 30.
Step S350, determining whether the opening operation of the valve plate control mechanism is executed in place.
For example, referring to fig. 1, when the valve plate control mechanism 110 is controlled to perform the opening motion, whether the detection end 151 of the opening sensor receives the signal of the opening magnetic switch 152 may be detected to determine whether the opening motion of the valve plate control mechanism 110 is in place. When the detection end 151 of the opening sensor receives the opening magnetic switch 152, the opening magnetic switch 152 is turned on, and the opening action of the valve plate control mechanism 110 is determined to be in place, so that the position of the valve plate 120 is determined to have completely opened the connection port 10 between the process chamber 20 and the transmission chamber 30.
When the opening action is performed in place, step S360: the open state of the valve plate control mechanism is locked.
In order to eliminate the phenomenon that the valve plate control mechanism 110 is abnormally operated due to unstable air pressure of the air supply air path, so that the valve plate 120 is not tightly sealed against the connection port 10, after the opening operation of the valve plate control mechanism 110 is determined to be in place, the first valve 210 of the first air inlet can be controlled to be closed to stop the air supply of the first air path 200 to the valve shaft 130, so that the valve plate control mechanism 110 is in a state of being out of operation and becomes in a locking state, and the valve plate 120 is locked at a position of completely opening the connection port 10 between the process chamber 20 and the transmission chamber 30.
When the opening operation is not performed in place, step S370 prompts failure of the opening operation.
In this step, a user alarm message may be provided to indicate to the user that the opening of the door valve device is not in place, and the user may make a relevant adjustment to the device according to the status.
Illustratively, the method of controlling the gate valve apparatus further comprises: when the air pressure state in at least one air channel is not in a stable state, step S380 is executed to adjust the air pressure state of the air channel which is not in the stable state. In this embodiment, when an air channel with an unstable air pressure state is detected, the air pressure state in the air channel can be adjusted by re-supplying air to the air channel, so that after the air pressure state of the unstable air channel reaches a stable state, the air pressure condition of each air channel is acquired again.
Referring to fig. 5, a schematic flow chart of the closing action performed by the control gate valve device is shown. A method of controlling the gate valve device to perform the closing operation will be described in detail with reference to fig. 1 and 5. When the control signal is a closing signal, the control gate valve device performs a closing action process including:
step S410, acquiring the air pressure state in each air path.
Step S420, judging whether the air pressure states of all the air paths are in a stable state.
Step S430, controlling the first air inlet of the first air path to be opened.
The steps S410 to S430 in this embodiment are the same as the implementation manners of the steps S310 to S330 in the foregoing embodiments, and are not repeated here.
Step S440, the second air inlet of the second air path is controlled to be closed.
In this step, after a certain period of time, for example, after 10 ms has elapsed after the first air inlet is opened, the second valve 310 is controlled to be closed, so as to stop the second air path 300 from supplying air to the valve shaft 130, so that the valve plate control mechanism 110 performs a closing action, and thus the valve shaft 130 is controlled to move upwards to drive the valve plate 120 to move slowly, so as to close the connection port 10 between the process chamber 20 and the transmission chamber 30.
Step S450, determining whether the closing operation of the valve plate control mechanism is performed in place.
For example, referring to fig. 1, when the valve plate control mechanism 110 is controlled to perform a closing action, whether the detection end 141 of the closing sensor receives a signal of the off-position magnetic switch 142 may be detected to determine whether the closing action of the valve plate control mechanism 110 is in place. When the detection end 141 of the off-position sensor receives the signal of the off-position magnetic switch 142, the off-position magnetic switch 142 is turned on, and the closing action of the valve plate control mechanism 110 is determined to be in place, so that the position of the valve plate 120 is determined to have completely closed the connection port 10 between the process chamber 20 and the transmission chamber 30.
When the closing action is performed in place, step S460: and confirming the opening state of the first air inlet and the closing state of the second air inlet so as to confirm that the closing action of the valve plate control mechanism is successfully executed.
In this step, after the closing operation is performed in place, after timing for 10 ms, the opening state of the first valve 210 and the opening state of the second valve 310 may be detected to confirm the opening state of the first air inlet and the closing state of the second air inlet, and if the first air inlet is kept in the opening state and the second air inlet is still kept in the closing state, it is determined that the closing operation of the valve plate control mechanism 110 is successfully performed, so as to prevent the occurrence of erroneous judgment due to the fact that the unexpected opening operation is not found after the closing operation of the valve plate control mechanism 110 is performed in place.
When the closing action is not performed in place, step S470, a failure of the closing action is prompted.
In this step, a user alarm message may be provided to indicate to the user that the closing action of the door valve device is not in place, and the user may make a relevant adjustment to the device according to the status.
Illustratively, the method of controlling the gate valve apparatus further comprises: when the air pressure state in at least one air channel is not in a stable state, step S480 is executed to adjust the air pressure state of the air channel which is not in a stable state. The step S480 in this embodiment is the same as the implementation of the step S380 in the above embodiment, and will not be described herein.
The embodiment of the application discloses a control system of a gate valve device, as shown in fig. 6, and fig. 6 is a block diagram of the control system of the gate valve device disclosed in the embodiment of the application. Referring to fig. 6, the control system of the gate valve device includes:
a receiving device 610, configured to receive a control signal, where the control signal is a signal for controlling the valve plate control mechanism to operate;
an acquiring device 620, configured to acquire an air pressure state in each air path;
a judging device 630, configured to judge whether the air pressure state in each air path is in a stable state;
and the control device 640 is used for controlling the opening and closing states of the air inlets of the air paths according to the control signals when the air pressure state of each air path is in a stable state so as to control the valve plate control mechanism to act.
In the control system of the gate valve device, before the valve plate control mechanism is controlled to act, the air pressure state in the air path for providing air for the valve plate control mechanism is preferentially obtained, so as to judge whether the air pressure state in each air path is in a stable state or not; when the air pressure state of each air passage is in a stable state, the opening and closing state of the air inlets of each air passage is controlled according to the control signal so as to control the valve plate control mechanism to act, and the problem of abnormal opening and closing of the gate valve device caused by unstable air pressure of the air passages is avoided.
The embodiment of the application discloses a semiconductor device, which comprises the control system of the gate valve device provided by the embodiment.
The technical features of the above embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples only represent a few embodiments of the present specification, which are described in more detail and are not to be construed as limiting the scope of the claims. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the present description, which is within the scope of the present description. Accordingly, the protection scope of the patent should be determined by the appended claims.
Claims (10)
1. A control method of a gate valve device, wherein the gate valve device is applied to a semiconductor apparatus, the gate valve device includes gas paths, a valve plate, and a valve plate control mechanism, each of the gas paths is a channel for supplying gas to the valve plate control mechanism, the valve plate is arranged in matching with a connection port of a chamber of the semiconductor apparatus, the valve plate control mechanism is used for controlling a position of the valve plate, the control method includes:
receiving a control signal, wherein the control signal is a signal for controlling the valve plate control mechanism to act;
acquiring the air pressure state in each air passage;
judging whether the air pressure states in the air paths are all in a stable state or not;
when the air pressure state of each air channel is in a stable state, the opening and closing states of the air inlets of each air channel are controlled according to the control signals so as to control the valve plate control mechanism to act.
2. The method according to claim 1, wherein the control signal includes one of a closing signal and an opening signal, the closing signal being a signal for controlling the valve plate control mechanism to perform a closing action so that the valve plate closes the connection port, and the opening signal being a signal for controlling the valve plate control mechanism to perform an opening action so that the valve plate opens the connection port.
3. The method of claim 2, wherein the air paths include a first air path and a second air path, and when the control signal is an on signal, controlling the ventilation state of each air path according to the control signal to control the valve plate control mechanism to act, comprising:
the first air inlet of the first air channel is controlled to be opened so as to supply air to the valve plate control mechanism, so that the valve plate control mechanism is in a state to be actuated;
controlling a second air inlet of the second air channel to be opened so that the valve plate control mechanism executes an opening action;
judging whether the opening action is executed in place, and locking the opening state of the valve plate control mechanism when the opening action is executed in place.
4. A control method of a gate valve apparatus according to claim 3, wherein locking the open state of the valve plate control mechanism comprises:
and controlling the first air inlet of the first air channel to be closed so as to stop supplying air to the valve plate control mechanism, so that the valve plate control mechanism is in a locking state.
5. A control method of a gate valve apparatus according to claim 3, wherein when the control signal is a closing signal, controlling the ventilation state of each gas passage according to the control signal to control the valve plate to perform an action comprises:
a first air inlet of the first air channel is controlled to be opened so as to ventilate the valve plate control mechanism, so that the valve plate control mechanism is in a state to be actuated;
and controlling a second air inlet of the second air channel to be closed so as to stop supplying air to the valve plate control mechanism, so that the valve plate control mechanism executes closing action.
6. The method of controlling a gate valve apparatus according to claim 5, further comprising, after controlling the intake port of the second air path to close:
judging whether the closing action is executed in place or not;
and when the closing action is executed in place, confirming the opening state of the first air inlet and the closing state of the second air inlet so as to confirm that the closing action of the valve plate control mechanism is executed successfully.
7. The method of controlling a gate valve device according to any one of claims 1 to 6, wherein determining whether or not the air pressure state in each of the air paths is in a steady state comprises:
respectively acquiring a plurality of air pressure values of each air circuit in preset time;
judging whether a plurality of air pressure values corresponding to the air paths are all in a preset range, and determining that the air pressure state in each air path is in a stable state when the air pressure values are in the preset range.
8. The control method of a gate valve device according to claim 7, characterized in that the control method further comprises:
and when the air pressure state in at least one air channel is not in a stable state, adjusting the air pressure state of the air channel which is not in the stable state.
9. A control system for a door valve apparatus, the control system comprising:
the receiving device is used for receiving a control signal, wherein the control signal is a signal for controlling the valve plate control mechanism to act;
the acquisition device is used for acquiring the air pressure state in each air passage;
the judging device is used for judging whether the air pressure state in each air path is in a stable state or not;
and the control device is used for controlling the opening and closing states of the air inlets of the air channels according to the control signals when the air pressure states of the air channels are in a stable state so as to control the valve plate control mechanism to act.
10. A semiconductor device, characterized in that the semiconductor device comprises the control system of the gate valve apparatus according to claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311736158.0A CN117489809A (en) | 2023-12-15 | 2023-12-15 | Control method and control system of gate valve device and semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311736158.0A CN117489809A (en) | 2023-12-15 | 2023-12-15 | Control method and control system of gate valve device and semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117489809A true CN117489809A (en) | 2024-02-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311736158.0A Pending CN117489809A (en) | 2023-12-15 | 2023-12-15 | Control method and control system of gate valve device and semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117489809A (en) |
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2023
- 2023-12-15 CN CN202311736158.0A patent/CN117489809A/en active Pending
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