CN117369217A - Photoetching machine, pollution prevention device for illuminating lamp room and design method thereof - Google Patents
Photoetching machine, pollution prevention device for illuminating lamp room and design method thereof Download PDFInfo
- Publication number
- CN117369217A CN117369217A CN202210772111.9A CN202210772111A CN117369217A CN 117369217 A CN117369217 A CN 117369217A CN 202210772111 A CN202210772111 A CN 202210772111A CN 117369217 A CN117369217 A CN 117369217A
- Authority
- CN
- China
- Prior art keywords
- illumination
- lamp room
- optical glass
- lamp
- lighting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000013461 design Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 17
- 230000002265 prevention Effects 0.000 title claims description 30
- 238000001259 photo etching Methods 0.000 title abstract description 10
- 238000005286 illumination Methods 0.000 claims abstract description 160
- 239000005304 optical glass Substances 0.000 claims abstract description 135
- 230000003287 optical effect Effects 0.000 claims description 32
- 238000011109 contamination Methods 0.000 claims description 24
- 230000004888 barrier function Effects 0.000 claims description 6
- 238000000265 homogenisation Methods 0.000 claims description 6
- 239000003344 environmental pollutant Substances 0.000 abstract description 7
- 231100000719 pollutant Toxicity 0.000 abstract description 7
- 238000002955 isolation Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 238000004088 simulation Methods 0.000 description 10
- 238000009826 distribution Methods 0.000 description 8
- 230000001012 protector Effects 0.000 description 8
- 239000000428 dust Substances 0.000 description 7
- 238000005457 optimization Methods 0.000 description 6
- 230000007774 longterm Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000001154 acute effect Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000010146 3D printing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000739 chaotic effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000013433 optimization analysis Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Abstract
The invention provides a photoetching machine, an anti-pollution device for an illumination lamp room and a design method thereof, wherein the anti-pollution device can form air protection layers on two side surfaces of optical glass by arranging an illumination side protection device with a double-flow-channel structure and a lamp room side protection device with a single-flow-channel structure, so that the protection of the two side surfaces of the optical glass can be realized, and further pollutants can be prevented from polluting the surface of the optical glass.
Description
Technical Field
The invention relates to the technical field of optics, in particular to a photoetching machine, an anti-pollution device for an illumination lamp room and a design method thereof.
Background
Photolithography, a very important process in the manufacture of semiconductors, is a process of sequentially transferring a series of chip patterns on a reticle to corresponding layers of a silicon wafer by exposure, and is considered as a core step in the manufacture of large-scale integrated circuits. A series of complex and time-consuming photolithography processes in semiconductor fabrication are mainly performed by corresponding photolithography machines.
In the construction of a lithographic apparatus, highly sensitive devices such as lamp houses require a stable operating environment based on low vibration. While lighting modules with various movable mechanisms, such as direct connection to the lamp housing, would not guarantee low vibration design and operation requirements of the lamp housing. This feature allows for non-hermetic connection designs in the lithographic machine structure. Such designs would inevitably expose the optical elements, including the optical glass, directly to the factory environment. In addition, the shutters present herein require the use of air convection for cooling when closed, such as the application of an air extraction unit or the acceleration of the occurrence of the above-mentioned contamination. The illuminated side surface of the optical glass will thus produce surface contamination in a predictable short period of time, causing rapid degradation of the illumination of the machine. In addition, the complex internal flow fields caused by the open space in the lamp chamber and the internal heat dissipation cause the lamp chamber side surfaces of the optical glass to also need effective protection.
Therefore, there is a need for a protection device capable of simultaneously protecting both side surfaces of an optical glass in a limited space so as to satisfy the exposure quality of a lithographic apparatus in long-term operation.
Disclosure of Invention
The invention aims to provide a photoetching machine, an anti-pollution device for an illumination lamp room and a design method thereof, so as to protect the two side surfaces of optical glass.
To achieve the above and other related objects, the present invention provides an anti-pollution device for a lighting lamp room, comprising:
an illumination side guard provided in a double flow path structure for homogenizing a flow rate of gas introduced into the illumination side guard to form an air protection layer on a first surface of the optical glass;
and the lamp room side protection device is arranged into a single-flow-channel structure and is used for homogenizing the flow rate of the gas flowing into the lamp room side protection device so as to form an air protection layer on the second surface of the optical glass, and the optical glass is arranged between the lamp room side protection device and the illumination side protection device.
Optionally, in the anti-pollution device for lighting a lamp room, the lamp room side protection device includes: the light room side inner side circulation flow channel, the light room side inner side air inlet and the light room side air outlet, wherein the gas output by the light room side inner side air inlet flows to the second surface of the optical glass through the light room side inner side circulation flow channel and flows back to the light room side air outlet through the second surface of the optical glass, a plurality of non-uniformly distributed air outlet holes are formed in the light room side inner side circulation flow channel, and the gas flows to the second surface of the optical glass through the air outlet holes in the light room side circulation flow channel.
Optionally, in the anti-pollution device for illuminating a lamp room, a direction of the side of the lamp room is perpendicular to an optical axis direction of the optical glass.
Optionally, in the anti-pollution device for lighting a lamp room, the lamp room side protection device further comprises a lamp room side airflow homogenizing baffle, the lamp room side airflow homogenizing baffle is opposite to the lamp room side air inlet, and the gas output by the lamp room side air inlet is homogenized by the lamp room side airflow homogenizing baffle.
Optionally, in the anti-pollution device for lighting a lamp room, the lamp room side protection device further includes a first deflector and a second deflector, the first deflector and the second deflector are disposed at positions close to the air outlet hole of the lamp room side inner circulation flow channel, a first gap is formed between the first deflector and the second deflector, and the gas output by the lamp room side inner circulation flow channel passes through the first gap to the second surface of the optical glass.
Optionally, in the anti-pollution device for lighting a lamp room, a width of the first gap is not greater than 3mm.
Optionally, in the anti-pollution device for lighting a lamp room, the first flow guiding plate has a first flow guiding surface for guiding gas, the second flow guiding plate has a second flow guiding surface for guiding gas, and the gas flow guiding direction is changed by adjusting an included angle beta between the first flow guiding surface and a direction perpendicular to the optical axis of the optical glass and pointing to the center along the edge of the optical glass and/or an included angle theta between the second flow guiding surface and the optical glass pointing to the optical axis direction of the lamp room side protecting device along the lighting side protecting device, wherein the included angle beta ranges from 45 degrees to 90 degrees; the included angle theta is 75-86 degrees.
Optionally, in the anti-pollution device for lighting a lamp room, the lamp room side protection device further comprises an isolation baffle, and the isolation baffle is disposed at a position where the lamp room side protection device is in contact with an external device structure.
Optionally, in the anti-pollution device for lighting a lamp room, the lighting side protection device includes: the optical glass comprises an illumination side air inlet, an illumination side air outlet, an illumination side inner side circulating flow channel and an illumination side outer side circulating flow channel, wherein the air output by the illumination side air inlet sequentially passes through the illumination side outer side circulating flow channel and the illumination side inner side circulating flow channel to the first surface of the optical glass, and flows back to the illumination side air outlet through the first surface of the optical glass, a plurality of non-uniformly distributed air outlet holes are formed in the illumination side inner side circulating flow channel and the illumination side outer side circulating flow channel, and the air flows into the illumination side inner side circulating flow channel through the air outlet holes of the illumination side outer side circulating flow channel in the illumination side outer side circulating flow channel, and flows into the first surface of the optical glass through the air outlet holes of the illumination side inner side circulating flow channel.
Optionally, in the anti-pollution device for lighting a lamp room, a direction of the lighting side is perpendicular to an optical axis direction of the optical glass.
Optionally, in the anti-pollution device for lighting a lamp room, the anti-pollution device further includes a lighting side cover plate, the lighting side protection device further includes a lighting side air flow homogenizing baffle, the lighting side cover plate is connected with one end of the lighting side protection device far away from the lamp room side protection device, the lighting side air flow homogenizing baffle is disposed at a position close to an air outlet hole of the lighting side inner side circulation flow channel, a second gap exists between the lighting side air flow homogenizing baffle and the lighting side cover plate, and air output by the lighting side inner side circulation flow channel passes through the second gap to the first surface of the optical glass.
Optionally, in the anti-pollution device for lighting a lamp room, a width of the second gap is not greater than 2.5mm.
Optionally, in the anti-pollution device for an illumination lamp room, the illumination side air flow homogenizing baffle includes a homogenizing surface for homogenizing air and a third guiding surface for guiding air opposite to the homogenizing surface, and the air guiding direction is changed by adjusting an angle α of the third guiding surface to a direction perpendicular to an optical axis of the optical glass and directed to an edge along a center of the optical glass, the angle α being in a range of 40 ° to 50 °.
To achieve the above and other related objects, the present invention also provides a lithographic apparatus comprising an optical assembly for illuminating a lamp chamber, the optical assembly comprising an adapter ring, an optical glass and the above-mentioned anti-contamination device for illuminating a lamp chamber, the optical glass being fixed in the anti-contamination device by the adapter ring.
To achieve the above and other related objects, the present invention also provides a method for designing an anti-pollution device for a lighting lamp room, applied to the above-mentioned anti-pollution device, comprising the steps of:
setting an input gas flow parameter and an output gas flow parameter;
and adjusting the structure of the illumination side protection device with a double-channel structure and the structure of the lamp room side protection device with a single-channel structure according to the input gas flow parameter and the output gas flow parameter, wherein the illumination side protection device and the lamp room side protection device structure form the anti-pollution device.
Optionally, in the design method of the pollution prevention apparatus for lighting a lamp room, the adjusting the structure of the lamp room side protection apparatus with a single flow path structure according to the input gas flow parameter and the output gas flow parameter includes:
Adjusting the width of the first gap according to the input gas flow parameter and the output gas flow parameter;
adjusting the flow guide angles of the first flow guide plate and the second flow guide plate to enable the output gas to cover the second surface of the optical glass; and/or
The structure for adjusting the illumination side protection device with a double-channel structure according to the input gas flow parameter and the output gas flow parameter comprises the following steps:
adjusting the width of the second gap according to the input gas flow parameter and the output gas flow parameter;
the angle of the illumination-side airflow homogenizing baffle is adjusted so that the output gas covers the first surface of the optical glass.
Compared with the prior art, the technical scheme of the invention has the following beneficial effects:
according to the invention, through the double-channel structural design of the illumination side protection device and the single-channel structural design of the lamp room side protection device, uniform air outlet flow fields can be formed on the two side surfaces of the optical glass, so that the two side surfaces of the optical glass are protected, and the exposure quality of the photoetching device under long-term operation is further met.
Secondly, the invention sets up the non-uniformly distributed lamp room side air outlet on the inside circulation flow passage of the lamp room side, set up the lamp room side air flow homogenizing baffle near the position of the said lamp room side air inlet and set up the non-uniformly distributed lighting side air outlet on the inside circulation flow passage of lighting side and outside circulation flow passage of lighting side, can help to finish the uniform distribution of flow velocity inside lamp room side and lighting side, guarantee the surface on both sides of the optical glass forms the uniform air outlet flow field, and form the air protective layer that can resist the lateral disturbance effectively, prevent the pollutant from polluting the optical glass surface, can maintain the high optical characteristic of the system, raise product life, production efficiency and product yield.
In addition, the invention can enhance the lateral disturbance resistance of the lamp room side under the condition of low flow rate by arranging the isolation baffle on the lamp room side protection device.
Furthermore, the first guide plate and the second guide plate are arranged on the lamp room side protection device, and the gap width between the first guide plate and the second guide plate and the guide angle between the first guide plate and the second guide plate are adjusted, so that the first surface of the optical glass can be fully covered by the slow-flow gas after guide. The illumination side air flow homogenizing baffle is arranged on the illumination side protecting device, and the output high-speed air can be fully covered on the first surface of the optical glass by adjusting the gap width between the illumination side air flow homogenizing baffle and the cover plate and the angle of the illumination side air flow homogenizing baffle, so that an air protecting layer is continuously formed under long-term operation, pollutants can be effectively prevented from contacting the optical glass, and the imaging quality of the optical glass is improved.
In addition, the invention designs the anti-pollution device for the lighting lamp room in the limited space by extracting the key component structure and the design parameters, can improve the imaging quality of the optical glass, and can be effectively expanded into the design of the anti-pollution device for the lighting lamp room in different limited spaces.
Drawings
FIG. 1 is a schematic view of a contamination prevention apparatus for illuminating a lamp room in an embodiment of the present invention;
fig. 2 to 4 are schematic structural views of corresponding structures in an anti-pollution device for lighting a lamp room in an embodiment of the invention;
FIG. 5 is a side view of a contamination prevention device for illuminating a lamp housing in an embodiment of the present invention;
FIGS. 6 to 8 are schematic views showing the structure of an illumination side protection apparatus according to an embodiment of the present invention;
FIG. 9 is a cross-sectional view of an anti-contamination apparatus for a lighting lamp housing in an embodiment of the invention;
FIG. 10 is a block diagram of a region B in the anti-pollution device of FIG. 9;
FIGS. 11 a-11 c are schematic illustrations of different arrangements of illumination side airflow homogenizing baffles in an embodiment of the present invention;
fig. 12 to 13 are schematic structural views of a lamp room side guard in an embodiment of the invention;
FIG. 14 is a block diagram of area A in the anti-pollution device of FIG. 9;
FIGS. 15a to 15c are schematic illustrations of the structure of a second, different baffle arrangement in an embodiment of the present invention;
FIG. 16 is a schematic view of the internal gas flow of a contamination prevention device for illuminating a lamp chamber in one embodiment of the present invention;
in the figures 1 to 16 of the drawings,
the anti-pollution device comprises a 1-pollution prevention device, a 11-lamp room side protection device, a 111-lamp room side inlet, a 112-lamp room side inner circulating flow passage, a 1121-lamp room side outlet hole, a 113-lamp room side powder cleaning hole, a 114-isolation baffle, a 115-first guide plate, a 1151-first guide surface, a 116-second guide plate, a 1161-second guide surface, a 118-lamp room side airflow homogenizing baffle, a 12-illumination side protection device, a 121-illumination side inlet, a 122-illumination side inner circulating flow passage, a 1221-illumination side inner outlet hole, a 123-illumination side outer circulating flow passage, a 1231-illumination side outlet hole, a 124-illumination side airflow homogenizing baffle, a 1241-third guide surface, a 1242-homogenizing surface, a 125-illumination side powder cleaning hole, a 13-switching ring, 14-optical glass and a 15-illumination side cover plate.
Detailed Description
The photolithography machine, the pollution prevention device for illuminating the lamp room and the design method thereof according to the present invention will be described in further detail with reference to the accompanying drawings and the specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the invention.
Referring to fig. 1 to 4, the present invention provides an anti-pollution device 1 for a lighting lamp room, comprising: lamp house side guard 11, lighting side guard 12, and lighting side cover 15. In this embodiment, the positions of the illumination side protection device 12, the lamp room side protection device 11, the optical glass 14, and the illumination side cover plate 15 are in the order of pointing to the lamp room side along the illumination side: an illumination side cover plate 15, an illumination side protector 12, an optical glass 14, and a lamp room side protector 11. The optical glass 14 is installed between the illumination side protector 12 and the lamp room side protector 11, and is fixed by using the adapter ring 13, and then the lamp room side protector 11 is used for additional fixing, so as to prevent the optical glass 14 from falling off. The lighting side protection device 12, the adapter ring 13 and the lamp room side protection device 11 are distributed with a plurality of screw holes, and the fixation between the lighting side protection device 12, the adapter ring 13 and the lamp room side protection device can be realized through bolts. The lighting side cover plate 15 is mounted to an end of the lighting side guard 12 remote from the lamp house side guard 11. The optical glass 14, the adapter ring 13 and the illumination side cover plate 15 in this embodiment are structural features in the prior art, and are not described herein.
Referring to fig. 5 to 8, the illumination side protection apparatus 12 is designed with a dual-channel structure by analyzing the available space inside the apparatus, and the illumination side protection apparatus 12 specifically includes: an illumination side inlet 121, an illumination side outlet (not shown), an illumination side inner circulation flow path 122 and an illumination side outer circulation flow path 123, wherein the distance between the illumination side outer circulation flow path 123 and the center point of the illumination side guard 12 is greater than the distance between the illumination side inner circulation flow path 122 and the center point of the illumination side guard 12, that is, the illumination side inner circulation flow path 122 is located inside the illumination side outer circulation flow path 123. The gas output from the illumination side gas inlet 121 sequentially passes through the illumination side outer circulation flow channel 123 and the illumination side inner circulation flow channel 122 to the first surface of the optical glass 14, and flows back to the illumination side gas outlet through the first surface of the optical glass 14. A surface of the optical glass 14 on a side away from the lamp room side guard 11 serves as a first surface of the optical glass 14.
The illumination side guard 12 is embodied as a ring-shaped structure, and the central region of the ring-shaped structure serves as the illumination side air outlet, i.e. the ring-shaped structure surrounds the illumination side air outlet.
The illumination side inner circulation flow channel 122 and the illumination side outer circulation flow channel 123 are provided with a plurality of air outlet holes. Specifically, the inner surface of the illumination-side inner circulation flow channel 122 is provided with a plurality of illumination-side inner air outlet holes 1221, the inner surface of the illumination-side outer circulation flow channel 123 is provided with a plurality of illumination-side outer air outlet holes 1231, and the air flows into the illumination-side inner circulation flow channel 122 through the illumination-side outer air outlet holes 1231 in the illumination-side outer circulation flow channel 123 and flows to the first surface of the optical glass 14 through the illumination-side inner air outlet holes 1221. The number of air outlet holes on each flow channel structure on the illumination side guard 12 may be selected as desired.
The positions of the air outlets on each flow channel structure can be uniformly distributed on the flow channel structure, and the air outlets can be unevenly distributed on the flow channel structure, namely the distances between the adjacent air outlets can be the same or different. Since the gas pressure is greater closer to the illumination side inlet 121 and the gas flow rate is also greater, the arrangement density of the gas outlet holes on each flow path structure is preferably increased with the distance from the illumination side inlet 121 in order to better homogenize the gas inputted from the illumination side inlet 121. I.e. the farther from the illumination side inlet 121, the closer the distance between adjacent outlet holes.
The shape of the outlet holes in each flow channel structure of the illumination side guard 12 may be chosen to be different in different use cases, such as circular or square, and in this embodiment is seen to be a circular aperture. In addition, the aperture of the air outlet hole on each flow channel structure of the illumination side protection device 12 may be uniform or non-uniform. Since the gas pressure and the gas flow rate are increased as the gas inlet 121 is closer to the illumination side, the gas needs to be homogenized more well by unevenly setting the aperture of the gas outlet hole in each flow path structure, and thus, it is preferable that the aperture of the gas outlet hole in each flow path structure is uneven. Further, the aperture (i.e., diameter) of the outlet aperture on each flow channel structure increases with increasing distance from the illumination side inlet 121. Still further, the diameter range of the air outlet hole on each flow channel structure can be controlled within the range of 0.8 mm-1.5 mm according to the requirements of 3D printing precision and design parameters, and the distribution can be optimized according to the flow velocity distribution.
Fig. 9 is a cross-sectional view of the contamination prevention device 1, and fig. 10 is a structural view of a region B in the contamination prevention device 1. Referring to fig. 9 and 10, in order to further homogenize the gas, in other embodiments, the illumination side protection device 12 may further include an illumination side gas flow homogenizing baffle 124, which has a second gap with the illumination side cover plate 15, and the gas output from the illumination side inner circulation flow channel 122 passes through the second gap to the first surface of the optical glass 14. The illumination side air flow homogenizing baffle 124 is disposed near the illumination side inner air outlet hole 1221, and the air outputted from the illumination side inner air outlet hole 1221 is homogenized by the illumination side air flow homogenizing baffle 124.
Referring to fig. 10, the present embodiment can adjust the flow direction of the gas passing through the illumination side gas flow homogenizing baffle 124 and the coverage area of the first surface of the optical glass to be protected by adjusting the illumination side gas flow homogenizing baffle 124. The illumination side gas flow homogenizing baffle 124 comprises a homogenizing surface 1242 for gas homogenization and a third flow guiding surface 1241 for gas flow guiding opposite the homogenizing surface 1242. The present embodiment changes the gas guiding direction by adjusting the included angle α between the third guiding surface 1241 and the direction perpendicular to the optical axis of the optical glass and pointing to the edge along the center of the optical glass. That is, an acute angle formed between the third diversion surface 1241 and the vertical surface of the optical glass 14 in the optical axis direction is used as the included angle α. At large draft flow rates (e.g., 4 m/s), the lateral disturbance prevention capability can be increased by increasing the included angle α. But at low suction flow rates this design reduces its protection. Under the current design and environmental constraint, the range of the included angle alpha is preferably 40-50 degrees, and the included angle alpha can be adjusted according to different pumping flow rates and protection environments. For example, fig. 11a to 11c show that the angle α can be set to 40 °, 45 °, and 50 °. Depending on the angle α of the third flow guiding surface 1241, the angle between the homogenizing surface 1242 and the direction perpendicular to the optical axis of the optical glass and pointing to the edge along the center of the optical glass needs to be set within a range of not more than 90 °. The included angle of the homogenizing surface 1242 is matched with the change of the included angle alpha of the third diversion surface 1241, so that the side disturbance protection capability can be improved while the gas is homogenized.
The width of the second gap can adjust the output gas flow rate, and plays a certain role in homogenizing the gas. Further, the width of the second gap is not greater than 2.5mm. For example, through simulation analysis, the gap width between the illumination-side airflow homogenizing baffle 124 and the illumination-side cover plate 15 (fixed to 1.5mm after simulation optimization) was locked so that the flow rate of the exhaust gas was set to about 0.8m/s. And by adjusting the angle of the illumination side airflow homogenizing baffle 124 to 45 degrees, the high-speed airflow can be fully covered on the surface of the optical glass. The included angle between the illumination side cover plate 15 and the horizontal direction is 90 degrees, that is, the illumination side cover plate 15 is parallel to the vertical plane of the optical axis direction of the optical glass, and the flow guiding angle is 90 degrees, so that the illumination side cover plate 15 has no flow guiding function to the surface of the optical glass 14. Mainly because the air outlet flow velocity of the illumination side protection device 12 is relatively high, the first surface of the optical glass 14 can be fully covered without adjusting the flow guiding angle.
The illumination side guard 12 also includes an illumination side dust aperture 125, which is preferably positioned in a 150 ° opposite orientation to the illumination side inlet 121, see fig. 6. The illumination side dust removing hole 125 is mainly used for removing dust of new equipment, and can be sealed in the later period when the new equipment works normally to prevent air leakage.
In this embodiment, since the interaction of the illumination side inner circulation flow channel 122, the illumination side outer circulation flow channel 123, the illumination side air flow homogenizing baffle 124, etc. conveys the air inputted from the illumination side air inlet 121 to the optical glass 14, the air flows back vertically, so that the illumination side air inlet 121 and the optical axis direction of the optical glass 14 are at 90 ° each other, that is, the direction of the illumination side air inlet 121 is perpendicular to the optical axis direction of the optical glass 14, and an effective protection effect is achieved by forming an air protection air layer capable of resisting lateral disturbance on the first surface of the optical glass 14 to be protected.
Referring to fig. 12 and 13, the lamp chamber side guard 11 is provided in a single flow path structure for homogenizing the flow rate of the gas introduced into the lamp chamber side guard 11 to form an air protection layer on the second surface of the optical glass 14 by analyzing the space available inside the apparatus. Clean CDA (compressed air) flows as an intake fluid into both the lamp room side guard 11 and the illumination side guard 12.
The lamp room side guard 11 specifically includes: a lamp room side inlet 111, a lamp room side inner circulation flow path 112, and a lamp room side outlet (not shown). The lamp room side protection device 11 is specifically an annular structure, and the central area of the annular structure serves as the lamp room side air outlet, i.e. the annular structure surrounds the lamp room side air outlet.
The gas outputted from the lamp room side gas inlet 111 passes through the lamp room side inner circulation flow path 112 to the second surface of the optical glass 14, and flows back to the lamp room side gas outlet through the second surface of the optical glass 14. The surface of the optical glass 14 close to the lamp room side guard 11 serves as a second surface of the optical glass 14. The lamp chamber side inlet 111 is positioned in the same orientation as the lamp illumination side inlet 121, facilitating overall inlet air path setup, see fig. 5.
The lamp room side inner circulation flow path 112 is provided with a plurality of gas outlet holes, namely, a lamp room side gas outlet hole 1121, and the lamp room side gas outlet hole 1121 is used for conveying the gas in the lamp room side inner circulation flow path 112 to the second surface of the optical glass 14. The plurality of lamp chamber side air outlet holes 1121 are provided on the inner side surface of the lamp chamber side inner circulation flow channel 112, and the number of the lamp chamber side air outlet holes 1121 may be selected as needed.
The lamp chamber side air outlet holes 1121 may be uniformly distributed in the lamp chamber side inner circulation flow path 112 or may be unevenly distributed in the lamp chamber side inner circulation flow path 112. That is, the distances between the adjacent lamp chamber side gas outlet holes 1121 may be the same or different. Since the gas pressure is larger closer to the lamp chamber side gas inlet 111 and the gas flow rate is also larger, the arrangement density of the lamp chamber side gas outlet 1121 is preferably increased with the distance from the lamp chamber side gas inlet 111 in order to better homogenize the gas output from the lamp chamber side gas inlet 111. I.e., the farther from the lamp chamber side air inlet 111, the closer the distance between adjacent lamp chamber side air outlet holes 1121.
The shape of the lamp chamber side air outlet 1121 may be selected in different situations, such as circular or square, and in this embodiment, is a small circular hole. The aperture of the lamp chamber side air outlet port 1121 may be uniform or non-uniform. Since the gas pressure increases as the gas flow increases as the gas pressure approaches the lamp chamber side gas inlet 111, the gas needs to be homogenized more easily by unevenly setting the aperture of the lamp chamber side gas outlet 1121, and therefore, the aperture of the lamp chamber side gas outlet 1121 is preferably uneven. Further, the aperture of the lamp chamber side outlet port 1121 increases with the distance from the lamp chamber side inlet port 111. Still further, the diameter range of the air outlet hole on each flow channel structure can be controlled within the range of 0.8 mm-1.5 mm according to the requirements of 3D printing precision and design parameters, and the distribution can be optimized according to the flow velocity distribution. The design of the lamp room side protection device 11 ensures that a uniform air outlet flow field is formed on the second surface of the optical glass 14 to be protected, and an air protection layer which can effectively resist lateral disturbance is formed, so that pollutants are prevented from polluting the surface of the optical glass.
In addition, in order to avoid the problem of insufficient uniformity distribution of the gas outlet flow rate caused by the single flow channel structure of the lamp room side protection device 11, a lamp room side gas flow homogenizing baffle 118 is disposed at a position opposite to the lamp room side gas inlet 111, as can be seen in fig. 13. That is, the lamp room side guard 11 may further include a lamp room side gas flow homogenizing baffle 118, and the gas outputted from the lamp room side gas flow 111 is homogenized by the lamp room side gas flow homogenizing baffle 118. The present embodiment achieves internal flow velocity uniformity distribution by analyzing the internal available space, and the lamp chamber side guard 11 uses a single flow path structure, the lamp chamber side gas outlet port 1121 and the lamp chamber side gas flow uniformity baffle 118 which are not uniformly distributed in pore size.
Referring to fig. 14, there is shown a structural view of a region a in the contamination prevention device 1. The lamp room side protection device 11 may further include a first deflector 115 and a second deflector 116, where the first deflector 115 and the second deflector 116 are disposed at positions close to the air outlet of the lamp room side inner circulation flow channel 112, the directions of the first deflector 115 and the second deflector 116 form a certain included angle, and a first gap exists between the first deflector 115 and the second deflector 116. The gas outputted from the lamp room side inner circulation flow path 112 passes through the first gap to the second surface of the optical glass 14. The range of the certain included angle is preferably 45-135 degrees. The first deflector 115 is disposed near the lamp chamber side air outlet 1121, and deflects the gas outputted from the lamp chamber side air outlet 1121 for the first time, for example, the first deflector 115 deflects the gas along the direction perpendicular to the optical axis of the optical glass 14 to be close to the optical axis of the optical glass 14. The gas output from the first deflector 115 passes through the first gap to the second deflector 116, and the second deflector 116 performs the second flow guiding on the gas output from the lamp chamber side gas outlet 1121. The system design requirements can be satisfied by only changing the configurations of the first deflector 115 and the second deflector 116 according to the requirements and standard changes of the lamp room side protection. The first deflector 115 has a first deflector surface 1151 for deflecting gas, the second deflector 116 has a second deflector surface 1161 for deflecting gas, the second deflector surface 1161 is a surface of the second deflector 116 near to the first deflector 115, and the gas deflecting direction is changed by adjusting an angle β between the first deflector surface 1151 and a direction perpendicular to an optical axis of the optical glass 14 and pointing to the center along an edge of the optical glass 14 and/or an angle θ between the second deflector surface 1161 and the optical glass 14 pointing to the optical axis direction of the lamp room side protective device 11 along the illumination side protective device 12, and the angle β is preferably 45 ° to 90 °; the included angle θ is preferably in the range of 75 ° to 86 °. That is, an acute angle or a right angle formed between the first guide surface 1151 and a vertical plane in the optical axis direction of the optical glass 14 is the included angle β, and an acute angle formed between the second guide surface 1161 and a vertical plane in the optical axis direction of the optical glass 14 and the included angle θ are complementary angles. It was found that 81 ° is the limit value of the flow guide angle of the second flow guide surface 1161 on the lamp chamber side. When the air flow is less than 75 degrees, the surface of the optical glass cannot be covered by the air flow, and the protection performance is reduced; above 75 ° the airflow may be evenly covered, but above 86 ° the barrier performance begins to decrease. Referring to fig. 15a to 15c, the angles θ are shown as 75 °,81 ° and 86 °, respectively.
In this embodiment, the width of the first gap between the first baffle 115 and the second baffle 116 can adjust the output gas flow rate, which also plays a role in homogenizing the gas. The width of the first gap is preferably not more than 3mm.
In this embodiment, in order to consider the isolation requirement of the lamp room side protector 11 from the external device structure, the lamp room side protector 11 further includes an isolation baffle 114, and the isolation baffle 114 is disposed at a position where the lamp room side protector 11 contacts the external device structure, see fig. 9. The lamp room side guard 11 is therefore more resistant to lateral disturbances at low flow rates than the lighting side guard 12 due to the presence of the isolation barrier 114.
The lamp room side guard 11 further includes a lamp room side gas outlet for exhausting gas on the second surface of the optical glass. In this embodiment, since the gas outputted from the lamp chamber side gas inlet 111 is supplied to the optical glass 14 by the interaction of the inner circulation flow path 122, the lamp chamber side gas flow homogenizing baffle 118, the first baffle 115, the second baffle 116, etc., the gas is vertically reversed, so that the direction of the lamp chamber side gas inlet 111 is preferably 90 ° to the optical axis direction of the optical glass 14, that is, the direction of the lamp chamber side gas inlet 111 is perpendicular to the optical axis direction of the optical glass 14, and an effective partial protection effect is achieved by forming an air protecting gas layer against lateral disturbance on the second surface of the optical glass 14 to be protected.
The lamp room side guard 11 may further comprise a lamp room side dust hole 113, which is preferably placed in a 180 deg. opposite orientation to the lamp room side dust hole 111. The lamp room side dust removing hole 113 is mainly used for removing dust of new equipment, and can be sealed in the later period when the new equipment works normally, so that air leakage is prevented.
Referring to fig. 16, the anti-pollution device 1 of the present embodiment has the following principle: clean CDA flows as an intake fluid into both the lamp room side guard 11 and the illumination side guard 12. By analyzing the internally available space, the lamp room side guard 11 uses a single flow path structure, and the gas outlet holes and the gas flow homogenizing baffle of non-uniform pore size distribution accomplish internal flow velocity homogenizing distribution. The illumination side protection device 12 fully utilizes the internal space, is provided with an inner side and an outer side double-sided flow channel, and completes internal gas flow velocity homogenization through the gas outlet holes with non-uniform aperture in the illumination side inner side and outer side circulation flow channels. The design ensures that a uniform air outlet flow field is formed on the surface of the optical glass to be protected, and an air protection layer capable of effectively resisting lateral disturbance is formed, so that pollutants are prevented from polluting the surface of the optical glass. The contaminants are typically organic volatiles and particulates having a particle size of less than 0.01 mm.
The invention also provides a design method of the anti-pollution device for the lighting lamp room, which comprises the following steps:
step S1: setting an input gas flow parameter and an output gas flow parameter;
step S2: the structures of the lamp room side guard 11 and the illumination side guard 12 are adjusted according to the input gas flow rate parameter and the output gas flow rate parameter.
In step S1, the greater the flow rate of gas input to the contamination prevention device 1, the better the effect after homogenization, but the higher the cost. Therefore, in the present embodiment, the input gas flow rate of the lamp room side guard 11 is preferably not higher than 15L/min, and the input gas flow rate of the illumination side guard 12 is preferably not higher than 25L/min. And the output gas flow is set according to the process requirements. I.e. the input gas flow parameters include two, namely the input gas flow parameters of the lamp room side guard 11 and the input gas flow parameters of the lighting side guard 12. The output gas flow rate parameters also include two, namely, the output gas flow rate parameter of the lamp room side guard 11 and the output gas flow rate parameter of the illumination side guard 12. The lamp room side guard 11 is adjusted according to the input gas flow parameter and the output gas flow parameter of the lamp room side guard 11, and the structure of the lighting side guard 12 is adjusted according to the input gas flow parameter and the output gas flow parameter of the lighting side guard 12.
In step S2, the lamp room side guard 11 and the lighting side guard 12 are similar in the protection key design elements, but different in the protection key design elements. Since the isolation barrier 114 is present on the lamp room side guard 11, the lamp room side guard 11 is more resistant to lateral disturbances at low flow rates than the lighting side guard 12 due to the presence of the isolation barrier 114. Therefore, the lamp room side protection device 11 is designed with an emphasis on forming an air protection layer of which the surface layer is in a fluidized state for effective protection in a slow flow state. The structure of the lamp room side protection device 11 according to the gas flow rate comprises:
adjusting the width of the first gap according to the input gas flow parameter and the output gas flow parameter;
the flow guiding angles of the first flow guiding plate 115 and the second flow guiding plate 116 are adjusted so that the output gas covers the second surface of the optical glass 14.
The adjusting the width of the first gap according to the input gas flow parameter and the output gas flow parameter is specifically: the first gap width between the first baffle 115 and the second baffle 116 is adjusted according to the gas flow rate, so that the flow rate of the homogenized gas is stabilized at a first set value. The first set value is the output gas flow parameter.
For example, under 15L/min of the intake air flow constraint, the gap width between the first baffle 115 and the second baffle 116 was first adjusted to 2mm (a value after simulation optimization) so that the post-homogenization outlet flow rate (output gas flow rate) was stabilized to about 0.3m/s (set contaminant diffusion rate 0.1 m/s). Then, the flow guiding angle (i.e., the included angle θ) of the second flow guiding plate 116 is adjusted to 81 ° (the value after simulation optimization), and the air outlet angle (i.e., the included angle β) of the first flow guiding plate 115 is adjusted to 62 ° (the value after simulation optimization), so that the slow-outflow air flow can effectively cover the second surface of the optical glass 14.
The design of the illumination side protection device 12 is different from that of the lamp room side protection device 11, and the lateral disturbance of the external flow field of the illumination side protection device 12 is larger due to the existence of the exhaust cooling device. Thus, the illumination side guard 12 requires a design to enhance the exit flow rate of the high velocity exit flow after homogenization. The structure of the illumination side protection device 12 according to the gas flow rate comprises:
adjusting the width of the second gap according to the input gas flow parameter and the output gas flow parameter;
the angle of the illumination-side gas flow homogenizing baffle 124 is adjusted so that the output gas covers the first surface of the optical glass 14.
The adjusting the width of the second gap according to the input gas flow parameter and the output gas flow parameter is specifically: the gap width between the illumination-side gas flow homogenizing baffle 124 and the illumination-side cover plate 15 is adjusted according to the gas flow rate parameter so that the flow rate of the homogenized gas is stabilized at the second set value. The second set value is the output gas flow parameter.
For example, through simulation analysis, the gap width between the illumination-side gas flow homogenizing baffle 124 and the illumination-side cover plate 15 was set to 1.5mm (a value after simulation optimization) under the 25L/min gas inflow constraint, so that the gas outflow rate (the gas outflow rate) was set to about 0.8m/s. And by adjusting the illumination side air flow homogenizing baffle 124 angle (i.e., angle α) to 45 ° (a value after simulation optimization), the high-speed air flow can also be fully covered on the first surface of the optical glass 14. In the illumination protection device, the guide angle of the illumination side cover plate 15 is 90 degrees, that is, the guide effect on the surface of the optical glass is not generated. Mainly because the air outlet flow velocity of the illumination side protection device 12 is relatively high, the first surface of the optical glass 14 can be fully covered without adjusting the flow guiding angle.
The main design parameters of this embodiment are the lamp room side airflow homogenizing baffle 118, the illumination side airflow homogenizing baffle 124, the first deflector 115 and the second deflector 116. Specifically, the flow guiding change angles of the first flow guiding plate 115 and the second flow guiding plate 116, the heights and angles of the lamp room side air flow homogenizing baffle 118 and the illumination side air flow homogenizing baffle 124, and the like. The specific structure of the anti-pollution device for effectively covering the surface of the optical glass to be protected under the conditions of different high and low air flows in a limited space (7 mm-10 mm) is deduced through simulation optimization analysis.
The invention detects the different air inlet flow of the anti-pollution device 1 and the pollution protection performance of the optical glass under the condition of lateral disturbance. That is, the contamination degree of the surface of the optical glass to be protected can be controlled to be 0.5% or less under the conditions that the intake air flow rate of the illumination-side protecting device 12 is 15L/min and the intake air flow rate of the illumination-side protecting device 12 is 25L/min and the condition that there is lateral disturbance. Therefore, the contamination prevention device 1 has effective contamination prevention under simulation analysis; but also limited space and effectiveness of the guard against chaotic disturbances.
Secondly, the invention also passes through the continuous pollution prevention effectiveness verification test for 4 hours, and no pollution tendency of the surface of the test paper is found. The anti-pollution device 1 provided by the invention has proved that the pollution of the optical glass can be effectively prevented within the time range of 6 months through the verification of 5 machines operated under different environments, and the accelerated reduction of the illuminance of the mercury lamp due to the pollution of the surface of the optical glass is avoided.
In summary, by the double-channel structural design of the illumination side protection device and the single-channel structural design of the lamp room side protection device, uniform air outlet flow fields can be formed on the surfaces of the two sides of the optical glass, so that the two sides of the optical glass are protected, and the exposure quality of the photoetching device under long-term operation is further met.
And secondly, the lamp room side air outlet holes which are unevenly distributed are arranged on the lamp room side inner side circulation flow passage, the lamp room side air flow homogenizing baffle is arranged at a position close to the lamp room side air inlet, and the illumination side air outlet holes which are unevenly distributed are arranged on the illumination side inner side circulation flow passage and the illumination side outer side circulation flow passage, so that the uniform distribution of flow velocity inside the lamp room side and the illumination side can be facilitated, uniform air outlet flow fields are formed on the surfaces of the two sides of the optical glass, an air protection layer which can effectively resist lateral disturbance is formed, and pollutants are prevented from polluting the surface of the optical glass.
In addition, the invention can enhance the lateral disturbance resistance of the lamp room side under the condition of low flow rate by arranging the isolation baffle on the lamp room side protection device.
Furthermore, the first guide plate and the second guide plate are arranged on the lamp room side protection device, and the slow-flow air flow can fully cover the first surface of the optical glass by adjusting the gap width between the first guide plate and the second guide plate and the guide angle of the first guide plate and matching with the air outlet angle of the second guide plate. The illumination side air flow homogenizing baffle is arranged on the illumination side protection device, and the high-speed air flow can be fully covered on the first surface of the optical glass by adjusting the width of a gap between the illumination side air flow homogenizing baffle and the cover plate and the angle of the illumination side air flow homogenizing baffle.
In addition, the invention designs the anti-pollution device which can provide effective protection in the limited space by extracting the key component structure and the design parameters, can improve the imaging quality of the optical glass, and can be effectively expanded into the design of the anti-pollution device in different limited spaces.
In addition, the invention also provides a photoetching machine, which comprises an optical assembly for illuminating the lamp room, wherein the optical assembly comprises an adapter ring, optical glass and the anti-pollution device for illuminating the lamp room in the embodiment, and the optical glass is fixed in the anti-pollution device through the adapter ring.
The photoetching machine adopts the anti-pollution device in the embodiment, can realize the protection of two sides of the optical glass, prevents pollutants from polluting the surface of the optical glass, and further can meet the exposure quality of the photoetching machine under long-term operation.
It will be appreciated that although the invention has been described above in terms of preferred embodiments, the above embodiments are not intended to limit the invention. Many possible variations and modifications of the disclosed technology can be made by anyone skilled in the art without departing from the scope of the technology, or the technology can be modified to be equivalent. Therefore, any simple modification, equivalent variation and modification of the above embodiments according to the technical substance of the present invention still fall within the scope of the technical solution of the present invention.
It is also to be understood that this invention is not limited to the particular methodology, compounds, materials, manufacturing techniques, uses, and applications described herein, as such may vary. It should also be understood that the terminology described herein is for the purpose of describing particular embodiments only, and is not intended to limit the scope of the present invention. It must be noted that, as used herein and in the appended claims, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to "a step" means a reference to one or more steps, and may include sub-steps. All conjunctions used should be understood in the broadest sense. Thus, the word "or" should be understood as having the definition of a logical "or" rather than a logical exclusive or "unless the context clearly indicates the contrary. Structures described herein will be understood to also refer to the functional equivalents of such structures. Language that may be construed as approximate should be construed unless the context clearly indicates the contrary.
Claims (16)
1. A contamination prevention device for a lighting fixture, the contamination prevention device comprising:
An illumination side guard provided in a double flow path structure for homogenizing a flow rate of gas introduced into the illumination side guard to form an air protection layer on a first surface of the optical glass;
and the lamp room side protection device is arranged into a single-flow-channel structure and is used for homogenizing the flow rate of the gas flowing into the lamp room side protection device so as to form an air protection layer on the second surface of the optical glass, and the optical glass is arranged between the lamp room side protection device and the illumination side protection device.
2. The anti-pollution device for illuminating a lamp room according to claim 1, wherein the lamp room side guard comprises: the light room side inner side circulation flow channel, the light room side inner side air inlet and the light room side air outlet, wherein the gas output by the light room side inner side air inlet flows to the second surface of the optical glass through the light room side inner side circulation flow channel and flows back to the light room side air outlet through the second surface of the optical glass, a plurality of non-uniformly distributed air outlet holes are formed in the light room side inner side circulation flow channel, and the gas flows to the second surface of the optical glass through the air outlet holes in the light room side circulation flow channel.
3. The contamination prevention apparatus for illuminating a lamp room according to claim 2, wherein a direction of the lamp room side is perpendicular to an optical axis direction of the optical glass.
4. The pollution prevention apparatus for illuminating a lamp room according to claim 2, wherein the lamp room side protection apparatus further comprises a lamp room side airflow homogenizing baffle, and the lamp room side airflow homogenizing baffle is disposed opposite to the lamp room side airflow homogenizing baffle, and the gas outputted from the lamp room side is homogenized by the lamp room side airflow homogenizing baffle.
5. The pollution prevention apparatus for illuminating a lamp room according to claim 2, wherein the lamp room side protection apparatus further comprises a first baffle and a second baffle provided at positions close to the air outlet hole of the lamp room side inner circulation flow path, a first gap being present between the first baffle and the second baffle, and the gas outputted from the lamp room side inner circulation flow path passing through the first gap to the second surface of the optical glass.
6. The anti-contamination apparatus for a lighting lamp chamber of claim 5, wherein the width of the first gap is no greater than 3mm.
7. The pollution prevention apparatus for a lighting lamp room according to claim 5, wherein the first deflector has a first deflector surface for guiding a gas, the second deflector has a second deflector surface for guiding a gas, and a gas guiding direction is changed by adjusting an angle β of the first deflector surface to a direction perpendicular to an optical axis of the optical glass and directed toward a center along an edge of the optical glass and/or an angle θ of the second deflector surface to an optical axis direction of the optical glass directed toward the lamp room side shield along the lighting side shield, the angle β ranging from 45 ° to 90 °; the included angle theta is 75-86 degrees.
8. The anti-pollution device for illuminating a lamp room according to claim 2, wherein the lamp room side guard further comprises a barrier plate, and the barrier plate is provided at a position where the lamp room side guard is in contact with an external device structure.
9. The pollution prevention apparatus for illuminating a lamp room according to claim 1, wherein the illumination side guard comprises: the optical glass comprises an illumination side air inlet, an illumination side air outlet, an illumination side inner side circulating flow channel and an illumination side outer side circulating flow channel, wherein the air output by the illumination side air inlet sequentially passes through the illumination side outer side circulating flow channel and the illumination side inner side circulating flow channel to the first surface of the optical glass, and flows back to the illumination side air outlet through the first surface of the optical glass, a plurality of non-uniformly distributed air outlet holes are formed in the illumination side inner side circulating flow channel and the illumination side outer side circulating flow channel, and the air flows into the illumination side inner side circulating flow channel through the air outlet holes of the illumination side outer side circulating flow channel in the illumination side outer side circulating flow channel, and flows into the first surface of the optical glass through the air outlet holes of the illumination side inner side circulating flow channel.
10. The contamination prevention apparatus for an illumination lamp room according to claim 9, wherein a direction of the illumination side is perpendicular to an optical axis direction of the optical glass.
11. The pollution prevention apparatus for a lighting lamp room according to claim 9, wherein the pollution prevention apparatus further comprises a lighting side cover plate, the lighting side guard further comprises a lighting side air flow homogenizing baffle, the lighting side cover plate is connected with one end of the lighting side guard away from the lamp room side guard, the lighting side air flow homogenizing baffle is arranged at a position close to an air outlet hole of the lighting side inner circulation flow channel, a second gap exists between the lighting side air flow homogenizing baffle and the lighting side cover plate, and the air output from the lighting side inner circulation flow channel passes through the second gap to the first surface of the optical glass.
12. The anti-contamination apparatus for a lighting lamp chamber of claim 11, wherein the width of the second gap is not greater than 2.5mm.
13. The contamination prevention apparatus for an illumination lamp chamber according to claim 11, wherein the illumination side air flow homogenizing baffle includes a homogenizing surface for air homogenization and a third guiding surface for air guiding opposite to the homogenizing surface, and the air guiding direction is changed by adjusting an angle α of the third guiding surface to a direction perpendicular to an optical axis of the optical glass and directed to an edge along a center of the optical glass, the angle α being in a range of 40 ° to 50 °.
14. A lithographic apparatus comprising an optical assembly for illuminating a lamp house, the optical assembly comprising an adapter ring, an optical glass and a contamination prevention device for illuminating a lamp house according to any one of claims 1 to 13, the optical glass being secured within the contamination prevention device by the adapter ring.
15. A design method of an anti-pollution device for a lighting lamp room, applied to the anti-pollution device for a lighting lamp room as set forth in any one of claims 1 to 13, comprising the steps of:
setting an input gas flow parameter and an output gas flow parameter;
and adjusting the structure of the illumination side protection device with a double-channel structure and the structure of the lamp room side protection device with a single-channel structure according to the input gas flow parameter and the output gas flow parameter, wherein the illumination side protection device and the lamp room side protection device structure form the anti-pollution device.
16. The method of designing a pollution prevention apparatus for a lighting lamp room according to claim 15, wherein the adjusting the structure of the lamp room-side protection apparatus having the single-flow path structure according to the input gas flow parameter and the output gas flow parameter comprises:
Adjusting the width of the first gap according to the input gas flow parameter and the output gas flow parameter;
adjusting the flow guide angles of the first flow guide plate and the second flow guide plate to enable the output gas to cover the second surface of the optical glass; and/or
The structure for adjusting the illumination side protection device with a double-channel structure according to the input gas flow parameter and the output gas flow parameter comprises the following steps:
adjusting the width of the second gap according to the input gas flow parameter and the output gas flow parameter; and adjusting the angle of the illumination side airflow homogenizing baffle to enable the output gas to cover the first surface of the optical glass.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210772111.9A CN117369217A (en) | 2022-06-30 | 2022-06-30 | Photoetching machine, pollution prevention device for illuminating lamp room and design method thereof |
| TW112122585A TWI843603B (en) | 2022-06-30 | 2023-06-16 | Photolithography machine, anti-pollution device for lighting room and design method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210772111.9A CN117369217A (en) | 2022-06-30 | 2022-06-30 | Photoetching machine, pollution prevention device for illuminating lamp room and design method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117369217A true CN117369217A (en) | 2024-01-09 |
Family
ID=89391621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210772111.9A Pending CN117369217A (en) | 2022-06-30 | 2022-06-30 | Photoetching machine, pollution prevention device for illuminating lamp room and design method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117369217A (en) |
-
2022
- 2022-06-30 CN CN202210772111.9A patent/CN117369217A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| TW202403466A (en) | 2024-01-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7738076B2 (en) | Exposure apparatus and device manufacturing method | |
| US20070119131A1 (en) | Chemical filter arrangement for asemiconductor manufacturing apparatus | |
| CN114460814B (en) | Lithographic apparatus, gas bath device and gas bath generator | |
| CN117369217A (en) | Photoetching machine, pollution prevention device for illuminating lamp room and design method thereof | |
| CN106094444B (en) | A kind of dynamic gas for extreme ultra violet lithography is locked | |
| WO2009069817A2 (en) | Illumination optical apparatus, exposure apparatus, and method for producing device | |
| KR102209252B1 (en) | Exposure apparatus and article manufacturing method | |
| KR101939225B1 (en) | A baffle assembly and an apparatus for treating a substrate with the baffle | |
| TWI843603B (en) | Photolithography machine, anti-pollution device for lighting room and design method thereof | |
| US6762412B1 (en) | Optical apparatus, exposure apparatus using the same, and gas introduction method | |
| CN115390365A (en) | Gas bath generator and lithographic apparatus | |
| JP2006322659A (en) | Air cleaner for clean room | |
| CN110959139B (en) | Particle suppression systems and methods | |
| KR101461052B1 (en) | Valve assembly and substrates treating apparatus having the same | |
| CN110764368A (en) | Objective contamination prevention device | |
| CN116736640A (en) | Anti-pollution protection device, objective lens and photoetching machine | |
| US10094618B2 (en) | Ambient laminar gas flow distribution in laser processing systems | |
| CN116954032A (en) | Dynamic gas isolation device and lithography equipment | |
| CN112466771B (en) | Semiconductor device with a plurality of semiconductor chips | |
| JP2001028331A (en) | Optical device, aligner using the same, gas flow-in method | |
| KR20240071143A (en) | Air conditioning system and air conditioning method using thereof | |
| CN117518727A (en) | Anti-pollution device, anti-pollution method and photoetching equipment | |
| JP6710178B2 (en) | Semiconductor manufacturing equipment | |
| KR20240085443A (en) | Clean tent | |
| CN117008423A (en) | Optical lens radiating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |