CN110764368A - Objective contamination prevention device - Google Patents
Objective contamination prevention device Download PDFInfo
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- CN110764368A CN110764368A CN201810844511.XA CN201810844511A CN110764368A CN 110764368 A CN110764368 A CN 110764368A CN 201810844511 A CN201810844511 A CN 201810844511A CN 110764368 A CN110764368 A CN 110764368A
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- 238000011109 contamination Methods 0.000 title claims description 41
- 230000002265 prevention Effects 0.000 title claims description 32
- 238000007664 blowing Methods 0.000 claims abstract description 72
- 238000005086 pumping Methods 0.000 claims description 45
- 238000005273 aeration Methods 0.000 claims description 19
- 238000001459 lithography Methods 0.000 abstract description 2
- 230000001681 protective effect Effects 0.000 description 9
- 239000003344 environmental pollutant Substances 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 231100000719 pollutant Toxicity 0.000 description 7
- 238000001259 photo etching Methods 0.000 description 6
- 238000009423 ventilation Methods 0.000 description 5
- 230000003449 preventive effect Effects 0.000 description 4
- 230000036961 partial effect Effects 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses an objective lens anti-pollution device which is arranged on a lens of an objective lens, and the objective lens anti-pollution device comprises a shell and a first vent plate with a plurality of first vent holes, wherein the shell is provided with a light through hole, the first vent plate is arranged in the shell, is positioned around the light through hole and surrounds a shell of the shell to form a blowing cavity, the blowing cavity is communicated with an air inlet on the shell, the blowing cavity is provided with two blowing openings, the two blowing openings are oppositely arranged on two sides of the light through hole, the distances between the two blowing openings and the air inlet are the same, and the first vent plate is arranged at the blowing openings. Foretell objective anti-pollution device can form the malleation chamber of even stable distribution below objective, and the distribution of cover gas is even in the malleation chamber, can not appear the phenomenon that some regions do not have cover gas to avoid lens local pollution in order to guarantee the objective transmissivity, can effectively guarantee the exposure precision of lithography machine.
Description
Technical Field
The invention relates to the technical field of photoetching, in particular to an objective lens pollution prevention device.
Background
In the exposure process of the photoetching machine, an organic solvent in photoresist on the surface of a silicon wafer is heated and then volatilized, and volatilized organic matters can adhere to a lens on the lower surface of an objective lens to pollute the lens, so that the transmittance of light in the lens is influenced, and the exposure precision is influenced. Moreover, the film layer on the surface of the lens can react with the photoresist under the action of light energy to form a carbon compound on the surface of the lens, which also influences the transmittance of the objective lens.
In order to prevent the lens from being polluted, the traditional technology carries out lens protection by adding a protective film device. However, the protective film has high cost, high breakage rate and inconvenient replacement operation, so that the use and maintenance cost of the protective film device is high. In order to save the lens protection cost, the invention patent of chinese patent publication No. CN107783283A discloses a lens contamination prevention device and method, which forms a protective layer gas by a blowing device to protect the lens from contamination. However, the blowing device of the device simply blows gas from one side to the other side, and the blown gas is unevenly distributed in the light transmission area, so that the gas distribution of the protective layer is uneven, partial area is often free from protective gas to cause local pollution of the lens, and sometimes even the pollution of the lens is accelerated. Therefore, the existing lens anti-pollution device easily causes local pollution to the lens, the lens protection effect is poor, and the exposure precision of the photoetching machine is influenced to a certain extent.
Disclosure of Invention
The invention aims to provide an objective anti-pollution device to solve the technical problem that the exposure precision of a photoetching machine is influenced because an objective lens in the prior art is easy to have local pollution.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides an objective anti-pollution device, install on the camera lens of objective, objective anti-pollution device includes the casing, logical unthreaded hole has been seted up on the casing, this objective anti-pollution device is still including the first breather plate that has a plurality of first air vents, first breather plate sets up in the casing, be located logical unthreaded hole around and around forming the air blowing chamber with the shell of casing, air blowing chamber and the air inlet intercommunication on the casing, air blowing chamber has two gas blowing mouths, two gas blowing mouths set up relatively in logical unthreaded hole both sides, first breather plate sets up in gas blowing mouth department.
In one embodiment, the objective contamination prevention device further comprises a second vent plate having a plurality of second vent holes, the second vent plate is disposed in the blowing chamber and is parallel to the first vent plate, and the aperture of the second vent holes is larger than that of the first vent holes.
In one embodiment, the number of the second vent plates is multiple, the multiple second vent plates are arranged in the blowing cavity at intervals in parallel, and the aperture of the second vent hole of the second vent plate close to the first vent plate is smaller than that of the second vent hole of the second vent plate far away from the first vent plate.
In one embodiment, the first aeration panel and the second aeration panel are each microwell plates.
In one embodiment, the first aeration panel is disposed obliquely on the bottom plate of the housing.
In one embodiment, assuming that a normal of the bottom plate of the housing is an X direction, a maximum value of an included angle between the first air-permeable plate and the X direction is:
wherein:
theta is an angle of an included angle between the first ventilation plate and the X direction;
a vertical distance of the center of the first vent hole closest to the bottom plate of the housing on the first vent plate from the lens surface of the objective lens
b horizontal distance of center of the first vent hole closest to the bottom plate of the housing on the first vent plate from the lens center of the objective lens.
In one embodiment, the minimum value of the angle between the first aeration panel and the second direction is 0.8 times the maximum value of the angle between the first aeration panel and the X direction.
In one embodiment, the objective lens contamination prevention device further comprises a guide plate, the guide plate is arranged in the blowing cavity, and the guide plate is located between the air inlet and the blowing port.
In one embodiment, the distance between the two air blowing openings and the air inlet is the same.
In one embodiment, the objective anti-contamination device further comprises a pumping baffle, the pumping baffle is arranged between the air blowing cavity and the side wall of the shell, the pumping baffle, the side wall of the shell and a bottom plate of the shell between the pumping baffle and the side wall of the shell are enclosed to form a pumping cavity, a plurality of pumping holes are formed in the bottom plate of the shell between the pumping baffle and the side wall of the shell, pumping ports are formed in the side wall of the shell, and the pumping holes and the pumping ports are communicated with the pumping cavity.
In one embodiment, the objective lens contamination prevention device further comprises a cover plate, and the housing and the cover plate are connected through fixing columns.
In one embodiment, the housing extends outward to form a lug, and the lug is provided with a mounting hole.
Foretell objective anti-pollution device, including apron, casing and the first breather plate that has a plurality of first air vents, all seted up on apron and the casing and led to the unthreaded hole, seted up the air blowing chamber around leading to the unthreaded hole on the casing, air blowing chamber and the air inlet intercommunication on the casing, the chamber of blowing has two gas mouths, and two gas mouths set up relatively and lead to the unthreaded hole both sides, and first breather plate sets up in the casing, and the breather plate setting is in gas blowing mouthful department.
When the objective anti-pollution device is used, the objective anti-pollution device is arranged on a lens of the objective, the light through hole is positioned below the objective, and the light through area is formed below the objective. When the objective anti-pollution device works, the air inlet is connected with a positive pressure air source, positive pressure air is uniformly blown out from air blowing ports on two sides of the light through hole through the first vent plate, the positive pressure air is uniformly and stably distributed in the light through area, and positive pressure cavity isolated pollutants which are uniformly and stably distributed are formed in the light through area below the objective lens, so that the pollutants are ensured not to volatilize to the bottom of the objective lens.
Foretell objective anti-pollution device can form the malleation chamber of even stable distribution below objective, and the distribution of cover gas is even in the malleation chamber, can not appear the phenomenon that some regions do not have cover gas to avoid lens local pollution in order to guarantee the objective transmissivity, can effectively guarantee the exposure precision of lithography machine.
Drawings
FIG. 1 is a schematic view of the contamination prevention device for an objective lens in one embodiment;
FIG. 2 is an exploded view of the contamination prevention device of the objective lens in one embodiment;
FIG. 3 is a top view of the housing in one embodiment;
FIG. 4 is a schematic view showing a mounting structure of the contamination preventive device for an objective lens and the objective lens in one embodiment;
FIG. 5 is a sectional view showing a mounting structure of the contamination preventive device for an objective lens and the objective lens in one embodiment;
fig. 6 is a schematic diagram illustrating the calculation of the inclination angle of the first aeration panel according to one embodiment.
Description of reference numerals:
10-objective contamination prevention device, 20-objective;
11-cover plate, 12-shell, 13-first ventilating plate, 14-light through hole, 15-second ventilating plate, 16-guide plate, 17-pumping baffle plate,
121-a blowing cavity, 122-an air inlet, 123-a pumping cavity, 124-a pumping port, 125-a fixing column and 126-a lug;
1231-evacuation holes.
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
Referring to fig. 1 to 6, an objective contamination prevention device 10 of an embodiment includes a housing 12 and a first vent plate 13 having a plurality of first vent holes. The shell 12 is provided with a light through hole 14, the first vent plate 13 is arranged in the shell 12, the first vent plate is positioned around the light through hole 14 and surrounds with the shell of the shell 12 to form a blowing cavity, the blowing cavity 121 is communicated with an air inlet 122 on the shell, the blowing cavity 121 is provided with two blowing openings, the two blowing openings are oppositely arranged at two sides of the light through hole 14, and the first vent plate 13 is arranged at the blowing opening.
The two air blowing ports of the objective contamination preventing device 10 are oppositely arranged on two sides of the light through hole 14, and positive pressure air can be uniformly blown out from two sides of the light through hole 14. Moreover, the first vent plate 13 is arranged at the air blowing opening, the air is blown out from the first vent hole through the first vent plate 13, and the plurality of first air blowing holes in the first vent plate 13 can homogenize the air flow of the blown-out air, so that the air is further ensured to be uniformly blown out from two sides of the light through hole 14. The objective contamination prevention device 10 is mounted on the objective lens 20 in use, and the light-passing hole 14 is located below the objective lens 20 to form a light-passing region below the objective lens 20. When the objective anti-pollution device 10 works, the air inlet 122 is connected with a positive pressure air source, positive pressure air is uniformly blown out from the air blowing ports at two sides of the light through hole 14 through the first vent plate 13, the positive pressure air is uniformly and stably distributed in the light through area, and positive pressure cavity isolated pollutants which are uniformly and stably distributed are formed in the light through area below the objective lens 20, so that the pollutants are ensured not to be volatilized to the bottom of the objective lens 20. The objective anti-pollution device 10 can form the positive pressure cavity which is uniformly and stably distributed below the objective lens 20, the protective gas in the positive pressure cavity is uniformly distributed, and the phenomenon that the partial area does not have the protective gas can not occur, so that the lens is prevented from being locally polluted to ensure the transmittance of the objective lens 20, and the exposure precision of the photoetching machine can be effectively ensured.
In one embodiment, the objective contamination prevention device 10 further includes a second vent plate 15 having a plurality of second vent holes, the second vent plate 15 is disposed in the blowing chamber 121, the second vent plate 15 is disposed in parallel with the first vent plate 13 at a distance, and the aperture of the second vent holes is larger than the aperture of the first vent holes. In this embodiment, the second vent plate 15 is disposed in the blowing cavity 121, the second vent plate 15 is located inside the first vent plate 13, the aperture of the second vent hole on the second vent plate 15 is larger than the aperture of the first vent plate 13 on the first vent plate 13, the second vent plate 15 can perform preliminary homogenization treatment on the gas in the blowing cavity 121 before the gas reaches the first vent plate 13, the aperture of the vent holes of the second vent plate 15 and the first vent plate 13 is reduced layer by layer, homogenization can be performed on the gas layer by layer, it is ensured that the gas passing through the first vent plate 13 is uniform, and the distribution uniformity of the gas in the positive pressure cavity is further improved.
In one embodiment, the number of the second vent plates 15 is two, two second vent plates 15 are arranged in the blowing cavity 121 in parallel and at intervals, and the aperture of the second vent holes of the second vent plates 15 close to the first vent plate 13 in the two second vent plates 12 is smaller than that of the second vent holes of the second vent plates 15 far from the first vent plate 13. In this embodiment, two second vent plates 15 are disposed in the blowing cavity 121, and the pore diameter of the second vent holes of the second vent plate 15 closer to the first vent plate 13 is smaller, so that the two layers of the second vent plates 15 and the first vent plate 13 homogenize the gas in multiple layers, and the uniformity of the gas passing through the third vent holes 13 is further ensured. In this embodiment, the objective contamination preventive device 10 includes two second vent plates 15, in other embodiments, multiple layers of the second vent plates 15 may be further disposed in the air blowing chamber 121, and the above two layers of the second vent plates 15 are only one embodiment and are not particularly limited. Specifically, in one embodiment, the first aeration panel 13 and the second aeration panel 15 are each microwell plates. Further, in one embodiment, the objective contamination preventive device 10 described above may also be provided with the first vent plate 13 only at the air blowing port, and not with the second vent plate 15 in the air blowing chamber 121, in which case the aperture of the first vent hole needs to be small enough to ensure the uniformity of the blown air, and specifically, the aperture of the first vent hole cannot be larger than 100 μm.
In one embodiment, to ensure the first aeration panel 13 and the second aeration panel 15 are stably connected to the housing 12, the first aeration panel 13 and the second aeration panel 15 are integrally formed. In other embodiments, the first aeration plate 13 and the second aeration plate 15 can be detachably connected to the housing 12 for easy replacement, and can be set according to specific requirements in practical applications, and this embodiment is not limited in particular.
In one embodiment, the objective contamination prevention device 10 further comprises a baffle 16, the baffle 16 being disposed within the insufflation chamber 121, the baffle 16 being located between the air inlet 122 and the insufflation port. In this embodiment, the guide plate 16 is arranged between the air inlet and the air blowing opening, the guide plate 16 and the side wall of the air blowing cavity 121 are arranged at intervals, a ventilation channel is formed between the guide plate 16 and the side wall of the air blowing cavity 121, air flows to the two sides of the air blowing opening through the ventilation channel after entering the air blowing cavity 121, the guide plate 16 can guide the air entering the air blowing cavity 121, the air is ensured to uniformly flow into the two sides of the light through hole 14, and the uniformity of the blown air is further improved.
In one embodiment, both of the blow ports are located the same distance from the air inlet 122. In this embodiment, the distance between the two air blowing openings and the air inlet 122 is the same, so that the flow rate and the speed of the air blown out by the two air blowing openings are the same, the uniformity of the air blown into the positive pressure cavity from the two sides is further improved, and the uniformity of the air distribution in the positive pressure cavity is ensured.
In one embodiment, the objective contamination prevention device 10 further includes a pumping baffle 17, the pumping baffle 17 is disposed between the blowing cavity 121 and the side wall of the housing 12, the pumping baffle 17, the side wall of the housing 12 and the bottom plate of the housing 12 between the pumping baffle 17 and the side wall of the housing 12 are enclosed to form a pumping cavity 123, a plurality of pumping holes 1231 are opened on the bottom plate of the housing 12 between the pumping baffle 17 and the side wall of the housing 12, a pumping port 124 is opened on the side wall of the housing, and both the pumping holes 1231 and the pumping port 124 are communicated with the pumping cavity 123. Specifically, the pumping port 124 is connected to a vacuum pump through an air pipe structure, and when the objective contamination prevention device 10 works, the vacuum pump works to pump the volatile pollutants below the objective lens 20 into the pumping cavity 123 through the pumping hole 1231 and pump out through the pumping port 124, so that the concentration of the pollutants around the objective lens 20 can be effectively reduced, and the objective lens 20 is further protected from contamination.
As shown in fig. 2 and 3, in the above embodiment, the number of the air inlet 122 and the number of the pumping port 124 are both one, and the air inlet 122 and the pumping port 124 are oppositely disposed on both sides of the housing 12. However, it should be noted that the above embodiments are not limited to the specific number and the specific arrangement position of the air inlets 122 and the exhaust ports 124. For example, in one embodiment, the number of the air inlets 122 and the exhaust ports 124 may also be two, wherein the two exhaust ports 124 are symmetrically disposed on two sides of the housing 12, and the two air inlets 122 are disposed opposite to the two air blowing holes, respectively. Specifically, one of the two air inlets 122 is disposed opposite to the second louver 15 whose one side of the light passing hole 14 is farthest from the light passing hole 14, and the other is disposed opposite to the second louver 15 whose other side of the light passing hole 14 is farthest from the light passing hole 14. Further, in one embodiment, the number of the pumping ports 124 may be more than two, and more than two pumping ports 124 may be arranged on the casing 12 at intervals along the circumferential direction. Therefore, the number and the arrangement positions of the air inlets 122 and the exhaust ports 124 can be specifically selected according to actual needs in practical applications, and the above embodiment is not particularly limited.
In one embodiment, the objective contamination prevention device 10 further includes a cover plate 11, and the housing 12 is connected to the cover plate 11 through a fixing post 125. Specifically, the housing 12 is provided with a fixing post 125, the cover plate 11 is provided with a through hole, and a fastener passes through the through hole to be connected with the fixing post 125 so as to fix the housing 12 and the cover plate 11. Specifically, the fastening member may be a screw, and the fixing pillar 125 has a threaded hole. In other embodiments, the fixing posts may be disposed on the cover plate 11, and the through holes may be disposed on the housing 12.
Further, in one embodiment, the housing 12 is formed with a lug 126 extending outward, and the lug 126 is provided with a mounting hole. Specifically, the housing 12 is connected to the objective lens 20 through the lug 126, so as to mount the objective lens contamination prevention device 10, when the objective lens contamination prevention device 10 is mounted on the objective lens 20, the lug 126 and the objective lens 20 are locked by fastening members (such as screws) penetrating through mounting holes on the lug 126, and the mounting operation is simple and convenient.
In one embodiment, the first aeration panel 13 is provided obliquely on the bottom plate of the housing 12. Specifically, an end of the first air-channeled plate 13, which is away from the bottom plate of the housing 12, is obliquely disposed toward the inside of the air-blowing chamber 121. The air in the blowing cavity 121 flows to the first vent plate 13 through the second vent plate 15, and finally flows out through the first vent plate 13, and in order to ensure that the air flows to the first vent plate 13 in the blowing cavity 121 along the direction parallel to the bottom plate of the housing 12, the second vent plate 15 is arranged perpendicular to the bottom plate of the housing 12. And for avoiding two gas blow-off mouth blow off the direct subtend of gas and cause the gas uniformity in the positive pressure chamber that gas distribution is inhomogeneous to influence at the intersection, in this embodiment, set up first breather plate 13 slope, the one end that casing 12's bottom plate was kept away from to first breather plate 13 is to blowing in chamber 121 slope to make two gas blow off mouth blow off the gas all from lower supreme lens center to objective 20 that flows in, thereby avoid two gas blow off mouth blow off the direct subtend of gas and cause gas distribution inhomogeneous at the intersection, improve the uniformity of gas distribution in the positive pressure chamber.
Specifically, the inclination angle of the first vent plate 13 is such that the gas can be blown to the lens center of the objective lens 20 to avoid local contamination of the lens due to the absence of the shielding gas at the lens center, and to ensure that the gas can be blown to the lens center through the first vent plate 13, at least the gas blown from the first vent hole of the first vent plate 13 closest to the bottom plate of the housing 12 can be blown to the lens center. Therefore, as shown in fig. 5 and 6, in one embodiment, the normal of the bottom plate of the housing is taken as the X direction, and the maximum value of the included angle between the first ventilation plate 13 and the X direction is:
wherein:
theta is an angle of an included angle between the first ventilation plate and the X direction;
a vertical distance of the center of the first vent hole closest to the bottom plate of the housing on the first vent plate from the lens surface of the objective lens
b horizontal distance of center of the first vent hole closest to the bottom plate of the housing on the first vent plate from the lens center of the objective lens.
Specifically, as shown in fig. 6, when the line connecting the center of the first vent hole on the first vent plate 13 closest to the bottom plate of the housing 12 and the lens center of the objective lens 20 is perpendicular to the first vent plate 13, it can be ensured that the gas blown out from the first vent hole on the first vent plate 13 closest to the bottom plate of the housing 12 can be blown to the lens center, and if the first vent plate 13 is tilted into the blowing chamber 121, the gas blown out from the first vent hole on the first vent plate 13 closest to the bottom plate of the housing 12 cannot be blown to the lens center, and a protective gas leak may occur at the lens center
a is the vertical distance from the center of the first vent hole closest to the bottom plate of the housing 12 on the first vent plate 13 to the lens center of the objective lens 20; b is the radial distance of the center of the first vent hole in the first vent plate 13 closest to the bottom plate of the housing 12 from the lens center of the objective lens 20. In summary, the maximum value of the included angle between the first aeration plate 13 and the X direction is
As can be seen from the above embodiments, in order to ensure that the gas passing through the first vent plate 13 can be blown to the lens center, the angle between the first vent plate 13 and the X direction cannot be larger than θ. When the included angle between the first vent plate 13 and the X direction is smaller than or equal to θ, the gas passing through the first vent plate 13 can be blown to the center of the objective lens, but in order to avoid the uneven distribution of the gas caused by the mixing of the gas blown out from the two gas blowing openings at the intersection, the included angle between the first vent plate 13 and the X direction is not too small. In one embodiment, the minimum value of the angle of the first aeration panel 13 to the X-direction is 0.8 times the maximum value of the angle of the first aeration panel 13 to the X-direction.
The objective anti-pollution device 10 can form the positive pressure cavity which is uniformly and stably distributed below the objective lens 20, the protective gas in the positive pressure cavity is uniformly distributed, the phenomenon that the partial area does not have the protective gas can not occur, and pollutants below the objective lens 20 can be isolated. In addition, the casing 12 is provided with a pumping chamber 123, which can reduce the concentration of the contaminants around the objective lens 20 by vacuum-absorbing the contaminants around the objective lens, thereby further protecting the objective lens 20 from contamination. The objective lens contamination prevention device 10 can effectively ensure that the objective lens 20 is not polluted, and is beneficial to improving the exposure precision of the photoetching machine.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (12)
1. The utility model provides an objective anti-pollution device (10), installs on the camera lens of objective (20), objective anti-pollution device (10) includes casing (12), logical unthreaded hole (14) have been seted up on casing (12), its characterized in that, still including first breather plate (13) that has a plurality of first air vents, first breather plate (13) set up in casing (12), be located lead to the unthreaded hole (14) around and with the shell of casing (12) is around forming air blowing chamber (121), air blowing chamber (121) with air inlet (122) intercommunication on casing (12), air blowing chamber (121) have two gas blowing mouths, two the gas blowing mouth sets up relatively logical unthreaded hole (14) both sides, first breather plate (13) set up air blowing mouth department.
2. The objective contamination prevention device (10) according to claim 1, further comprising a second vent plate (15) having a plurality of second vent holes, the second vent plate (15) being disposed in the air blowing chamber (121) and being disposed in parallel with the first vent plate (13), and the second vent holes having a larger aperture than the first vent holes.
3. The objective contamination prevention device (10) according to claim 2, wherein the number of the second vent plates (15) is plural, the plural second vent plates (15) are arranged in the air blowing chamber (121) in parallel at intervals, and of the plural second vent plates (15), the aperture of the second vent holes of the second vent plates (15) close to the first vent plate (13) is smaller than the aperture of the second vent holes of the second vent plates (15) far from the first vent plate (13).
4. The objective contamination prevention device (10) according to claim 2 or 3, wherein the first vent plate (13) and the second vent plate (15) are each a micro-perforated plate.
5. The objective contamination prevention device (10) according to claim 1, wherein the first vent plate (13) is arranged obliquely on a base plate of the housing (12).
6. The objective contamination prevention device (10) according to claim 5, wherein assuming that the normal of the bottom plate of the housing (12) is the X direction, the maximum value of the angle of the first vent plate (13) to the X direction is:
wherein:
theta is an included angle between the first aeration plate (13) and the X direction;
a is a vertical distance of a center of a first vent hole on the first vent plate (13) closest to a bottom plate of the housing (12) from a lens surface of the objective lens;
b is the horizontal distance of the center of the first vent hole on the first vent plate (13) closest to the bottom plate of the housing (12) from the lens center of the objective lens.
7. The objective contamination prevention device (10) according to claim 6, wherein the minimum value of the angle of the first vent plate (13) to the second direction is 0.8 times the maximum value of the angle of the first vent plate (13) to the X direction.
8. The objective contamination prevention device (10) according to claim 1, further comprising a deflector (16), the deflector (16) being disposed within the blowing chamber (121), the deflector (16) being located between the air inlet (122) and the blowing port.
9. The objective contamination prevention device (10) according to claim 1, wherein the two blow ports are at the same distance from the air inlet port (122).
10. The objective contamination prevention device (10) according to claim 1, further comprising a pumping baffle (17), wherein the pumping baffle (17) is disposed between the blowing chamber (121) and the side wall of the housing (12), the pumping baffle (17), the side wall of the housing (12) and a bottom plate of the housing (12) between the pumping baffle (17) and the side wall of the housing (12) are enclosed to form a pumping chamber (123), a plurality of pumping holes (1231) are opened on the bottom plate of the housing (12) between the pumping baffle (17) and the side wall of the housing (12), a pumping port (124) is opened on the side wall of the housing (12), and the pumping holes (1231) and the pumping port (124) are both communicated with the pumping chamber (123).
11. The objective contamination prevention device (10) according to claim 1, wherein the objective contamination prevention device (10) further comprises a cover plate (11), and the housing and the cover plate are connected by fixing posts (125).
12. The objective contamination prevention device (10) according to claim 1, wherein the housing (12) has a lug (126) extending outward, and the lug (126) has a mounting hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810844511.XA CN110764368A (en) | 2018-07-27 | 2018-07-27 | Objective contamination prevention device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810844511.XA CN110764368A (en) | 2018-07-27 | 2018-07-27 | Objective contamination prevention device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110764368A true CN110764368A (en) | 2020-02-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810844511.XA Pending CN110764368A (en) | 2018-07-27 | 2018-07-27 | Objective contamination prevention device |
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| Country | Link |
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| CN (1) | CN110764368A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023138251A1 (en) * | 2022-01-20 | 2023-07-27 | 中国科学院微电子研究所 | Photolithography device, gas bath apparatus and gas bath generator thereof |
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Application publication date: 20200207 |