CN117249912B - Method and system for detecting large-caliber optical element - Google Patents
Method and system for detecting large-caliber optical element Download PDFInfo
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- CN117249912B CN117249912B CN202311547138.9A CN202311547138A CN117249912B CN 117249912 B CN117249912 B CN 117249912B CN 202311547138 A CN202311547138 A CN 202311547138A CN 117249912 B CN117249912 B CN 117249912B
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- 230000003287 optical effect Effects 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000001514 detection method Methods 0.000 claims abstract description 21
- 238000009826 distribution Methods 0.000 claims abstract description 12
- 239000004973 liquid crystal related substance Substances 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 10
- 239000011159 matrix material Substances 0.000 claims description 4
- 238000012360 testing method Methods 0.000 description 4
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F17/00—Digital computing or data processing equipment or methods, specially adapted for specific functions
- G06F17/10—Complex mathematical operations
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J2009/002—Wavefront phase distribution
Abstract
The invention relates to the technical field of optical detection, in particular to a detection method and a detection system of a large-caliber optical element, wherein the method comprises the following steps: s1, setting a plurality of sub-apertures on a mirror surface of an optical element to be measured, dividing a full aperture into a plurality of edge area apertures and a central area aperture, wherein an overlapping area exists between the central area aperture and the edge area aperture, and each edge area aperture and each central area aperture comprise a certain number of sub-apertures; s2, measuring wave fronts of sub-apertures contained in the aperture of each edge area and the aperture of the central area, and calculating slope distribution; s3, splicing all sub-apertures in the aperture of the edge area and the aperture of the central area to the reference plane, and reconstructing to obtain the wavefront on the full aperture of the optical element to be measured. The invention realizes the detection of the large-caliber optical element in a novel splicing mode, can detect the optical element with the caliber larger than 1.5m, and has the detection repeatability precision smaller than lambda/30.
Description
Technical Field
The invention relates to the technical field of optical devices, in particular to a detection method and a detection system of a large-caliber optical element.
Background
The current common method for detecting large aperture optical system components is generally to use a large planar interferometer, which requires a standard planar mirror of the same size or larger than the optical component to be detected. The large-caliber standard plane mirror has the advantages of high manufacturing difficulty, long manufacturing period, high cost and very difficult self detection, which is the difficulty of indoor detection of a large telescope system.
The sub-aperture splicing interference test technology is an effective means for detecting the large-caliber optical element with low cost and high resolution. The sub-aperture splicing interference test technology is to utilize Hartmann or small-caliber interferometers to detect all parts (namely sub-apertures) of a large-caliber optical mirror surface for multiple times, so that the sub-apertures almost completely cover the whole mirror surface to be tested, and then splice reference surfaces of the sub-apertures to the same reference surface by utilizing a splicing algorithm, thereby recovering the complete surface shape of a full-caliber wave surface. The sub-aperture splicing algorithm commonly used at present comprises a K-T algorithm, an S-F algorithm, an overlapping method and the like. The invention provides a novel sub-aperture splicing method.
Disclosure of Invention
The invention aims to provide a detection method and a detection system for a large-caliber optical element, which are used for splice detection based on a new sub-aperture splicing algorithm.
In order to achieve the above object, the embodiment of the present invention provides the following technical solutions:
in one aspect, the invention provides a method for detecting a large-caliber optical element, comprising the following steps:
s1, setting a plurality of sub-apertures on a mirror surface of an optical element to be measured, dividing a full aperture into a plurality of edge area apertures and a central area aperture, wherein an overlapping area exists between the central area aperture and the edge area aperture, and each edge area aperture and each central area aperture comprise a certain number of sub-apertures;
s2, arranging a first plane mirror and a second plane mirror, wherein the first plane mirror scans the aperture of the central area, the plane where the first plane mirror is positioned is a reference plane, the second plane mirror rotates to scan the aperture of the edge area, the wave fronts of sub-apertures contained in the aperture of each edge area and the aperture of the central area are obtained through measurement, and slope distribution is calculated;
s3, splicing all sub-apertures in the aperture of the edge area and the aperture of the central area to the reference plane, and reconstructing to obtain the wavefront on the full aperture of the optical element to be measured.
In the step S2, obtaining slope distributions of sub-apertures included in the aperture of each edge area and the aperture of the central area, including:
step S21, setting the actual measurement wavefront of the aperture of the kth edge area asThe wave front spliced to the reference plane is +.>There is->(2) Wherein->、/>The slope in the x and y directions measured on the aperture of the kth edge region, +.>、/>The slope in the x and y directions after being spliced to the reference surface are respectively +.>、/>Respectively the inclination errors along the x and y directions, and k is an integer greater than 1;
step S22, selecting the first aperture in the overlapping area of the central area aperture and the edge area apertureA sub-aperture with a firstThe slopes of the sub-aperture in the x and y directions on the aperture of the central region are +.>、/>The slopes in the x and y directions over the aperture in the edge region are +.>、/>The formula (2) includes: /> （3），、/>And->、/>I is an integer greater than 1, both measured;
step S23, obtaining the product from the formula (3)、/>The slope +.f in the x and y directions after the aperture of the kth edge area is spliced to the reference plane can be obtained by substituting the formula (2)>And->；
According to the same processing steps of the kth edge area aperture, the slopes of all sub-apertures on the full aperture are obtained.
In the step S22, N sub-apertures are selected in the overlapping region, N is an integer greater than 1, and the k edge regions are calculated by the following formula (4) to be the tilt errors along the x and y directions respectively、/>，
（4）
In step S23, the result is obtained by the formula (4)、/>And substituting back to formula (2).
In the scheme, the calculated value of the inclination error can be more accurate by selecting a plurality of sub-apertures and calculating the average value.
The step S3 includes:
is provided with、/>Wavefront +.>In->Wavefront slope in x, y direction at sub-aperture, wavefront +.>Expressed by a polynomial:
（5）
wherein, the liquid crystal display device comprises a liquid crystal display device,is polynomial coefficient, then +.>The average slope of the sub-apertures in the x, y directions, respectively, can be expressed as:，/>wherein-> ，；
Expressed as a matrix:
can be abbreviated as:the following steps are: />；
、/>Is of known quantity, is obtained by concatenation, m is the polynomial term,/->Is the K term Zernike polynomial,>for the area of the i-th sub-aperture, +.>For the average slope coefficient of the ith sub-aperture in x-direction,/->For the average slope coefficient of the ith sub-aperture in y-direction, solving the polynomial coefficient +.>Then replace to get the formula (5)A wavefront over the full aperture.
On the other hand, the invention also provides a detection system of the large-caliber optical element, which comprises a detected optical element, a first plane mirror, a second plane mirror, a rotary table, an interferometer, a secondary mirror system and a computer processing system, wherein the rotary table drives the second plane mirror to rotate and scan, the interferometer is used for measuring the wavefront of the sub-aperture, and the computer processing system executes the following operations: setting a plurality of sub-apertures on a mirror surface of the optical element to be measured, and dividing the full aperture into a plurality of edge area apertures, wherein each edge area aperture comprises a certain number of sub-apertures; calculating slope distribution according to the measured wave fronts of the sub-apertures included in the aperture of each edge area and the aperture of the central area, splicing all the sub-apertures in the aperture of the edge area and the aperture of the central area to a reference surface, and reconstructing to obtain the wave fronts on the full aperture of the optical element to be measured.
Compared with the prior art, the invention realizes the detection of the large-caliber optical element in a novel slope splicing mode, can detect the optical element with the caliber larger than 1.5m, and has the detection repeatability precision smaller than lambda/30 and lambda=632.8nm.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the embodiments will be briefly described below, it being understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and other related drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a flowchart of a method for detecting a large-aperture optical element according to an embodiment.
Fig. 2 is a schematic diagram of a regional aperture arrangement in an embodiment.
FIG. 3 is a schematic diagram showing the selection of sub-apertures in the overlapping region in an embodiment.
Fig. 4 is a schematic diagram showing the arrangement of the respective devices in the detection system provided in the embodiment.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the invention, as presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be made by a person skilled in the art without making any inventive effort, are intended to be within the scope of the present invention.
Referring to fig. 4, the detection system for a large-caliber optical element provided in this embodiment includes a measured optical element 12, a plane mirror M1 (i.e. a first plane mirror), a plane mirror M2 (i.e. a second plane mirror 17), a rotary table (not shown), an interferometer 15, a secondary mirror system 16 and a computer processing system, wherein the measured optical element is supported by a support table 18, the interferometer 15 and the secondary mirror system 16 are respectively mounted on a five-dimensional adjusting table 20 to adjust the mounting positions thereof, and all components are mounted on a vibration isolation foundation 19 to reduce measurement errors caused by vibration. The rotating table drives the second plane mirror 17 to rotate and scan, the interferometer 15 is used for measuring the wavefront of the sub-aperture, and the computer processing system performs splicing processing according to the measured data to obtain the wavefront on the full aperture of the optical element to be measured.
Two-dimensional scanning is performed by using two small-caliber (here, small caliber is not an absolute concept but is relative to large caliber of the optical element to be measured) plane mirrors (M1 and M2) mounted on a rotation shaft, the center plane mirror M1 is stationary, and the other plane mirror M2 is rotatable for scanning. A plurality of sampling points (i.e., sub-apertures 13) are set on the mirror surface of the optical element under test, and the full aperture is divided into a plurality of aperture combinations (referred to as zone apertures) of small areas (the small areas are not absolute terms herein, but are relative to the optical element under test) such that each zone aperture contains a certain number of sub-apertures 13, as shown in fig. 2. Let the plane of the plane mirror M1 be the reference plane, there is a certain overlapping area between the central area aperture 14 measured by the plane mirror M1 and the edge area aperture 11 measured by the plane mirror M2. In the measuring process, the rotary table drives the plane mirror M2 to rotate and scan, and the aperture of each area of the mirror surface of the optical element to be measured is measured according to the preset aperture arrangement, so as to obtain the slope distribution of the sub-aperture contained in the aperture of each area.
The number of the aperture of the edge area is shown as 6 in fig. 2, but in practice, the number of the aperture of the edge area is related to the mirror aperture of the optical element to be measured and the aperture size of the plane mirror M2, and the size, number and arrangement of the area aperture and the sub-aperture are determined by the measured mirror size and measurement accuracy, and fig. 2 is only one illustration.
Theoretically, when the plane mirror M2 and the plane mirror M1 are always located on the reference plane in the measurement, the slope distribution in the overlapping area measured twice should be uniform. However, due to the error factors such as the installation of the plane mirror and the movement of the rotating shaft in the actual measurement, the plane mirror M2 is inevitably inclined or translated, and the slope distribution in the overlapping area is no longer equal. And calculating the inclination and translation errors between the regional aperture planes by using the difference value of the two groups of slopes in the overlapped area, and splicing the slopes of the marginal regional aperture to the reference plane after eliminating the errors. All the regional apertures can be spliced on the same plane by the same method to obtain slope distribution on the full aperture, so that the wavefront on the full aperture is reconstructed.
Referring to fig. 1, the method for detecting a large-aperture optical element provided in the present embodiment includes the following steps:
s1, setting a plurality of sub-apertures on a mirror surface of an optical element to be tested, dividing the full aperture into a plurality of edge area apertures and a central area aperture, wherein an overlapping area exists between the central area aperture and the edge area aperture, and each edge area aperture and each central area aperture comprise a certain number of sub-apertures.
As shown in fig. 2, the central area aperture is located at the center of the mirror surface of the optical element to be measured, the edge area apertures are distributed along the circumference of the mirror surface, there is an overlapping area between the edge area aperture and the central area aperture, and there is an overlapping area between adjacent edge area apertures.
S2, the plane mirror M1 scans the aperture of the central area, the plane mirror M2 rotates to scan the aperture of the edge area by taking the plane where the plane mirror M1 is located as a reference plane, wave fronts of sub-apertures contained in the aperture of each edge area and the aperture of the central area are measured, and slope distribution is calculated.
In this embodiment, specifically, let k%，/>Total number of edge area apertures) the measured wavefront of the edge area apertures is +.>The wave front spliced to the reference plane is +.>Therefore, there are:
（1）
wherein, the liquid crystal display device comprises a liquid crystal display device,the amount of wavefront error for the plane mirror M2 deviating from the reference plane, +.>、/>Tilt errors in x, y direction, respectively, ">Is a translational error along the axis of rotation Z. In order to simplify the calculation, the aperture of the central area is set on the reference plane, so that the tilt error and the translation error are both 0. The formula (1) is used for respectively solving the bias of x and y and comprises
Simplified into （2）
Wherein the method comprises the steps of、/>The slope in the x and y directions measured on the aperture of the kth edge region, +.>、/>The slopes in the x and y directions after being spliced to the reference surface are respectively shown. It can be found from the formula (2) that when the measurement object is a slope, the measurement object will not suffer from translational error +.>So that only the tilt error of the aperture in the x, y direction of the edge area is taken into account +.>、/>。
Selecting sub-apertures in the overlapping region of the central region aperture and the edge region aperture（/>，Total number of sub-apertures in the overlapping region), the slopes of the sub-apertures in the x and y directions over the aperture in the central region are set to be respectively、/>The slopes in the x and y directions over the aperture in the edge region are +.>、/>As shown in fig. 3.
The formula (2) includes:
（3）
、/>and->、/>Is measurable, so that theoretically the inclination error of the aperture of the edge region in the x and y directions can be determined from a point on the overlapping region>、/>. However, to ensure the accuracy of the splice, it is preferable to select multiple sub-apertures for calculation.
For example, N sub-apertures are selected in the overlap region, N.ltoreq.M, as can be obtained from equation (3):
（4）
will be、/>The slope in the x-direction and the y-direction after the aperture of the edge area is spliced to the reference surface can be obtained by substituting the formula (2)And->。
And so on, the slope of all sub-apertures on the full aperture can be obtained.
S3, splicing all sub-apertures in the aperture of the edge area and the aperture of the central area to the reference plane, and reconstructing to obtain the wavefront on the full aperture of the optical element to be measured.
In the embodiment, specifically, it is provided that、/>Respectively, the determined wave fronts->In->Wavefront slope in the x, y directions at the sub-aperture. The wavefront is represented by a Zernike polynomial:
（5）
wherein, the liquid crystal display device comprises a liquid crystal display device,for Zernike coefficients, the +.>The average slope of the sub-apertures in the x, y directions, respectively, can be expressed as:
（6）
wherein, the liquid crystal display device comprises a liquid crystal display device, ，/>。/>is the K term Zernike polynomial,>for the area of the i-th sub-aperture, +.>For the average slope coefficient of the ith sub-aperture in x-direction,/->Is the average slope coefficient of the ith sub-aperture in the y-direction.
Expressed as a matrix:
can be abbreviated as:the following steps are: />。
、/>To be of known quantity, the sub-aperture wavefront slope is obtained by stitching, and the Zernike coefficient +.>The wavefront on the full aperture can be obtained by substituting the formula (5).
The embodiment provides a novel slope splicing mode, the detection method can detect the optical element with the diameter even larger than 1.5m, and the detection repeatability precision is smaller than lambda/30, and lambda=632.8 nm.
The foregoing is merely illustrative of the present invention, and the present invention is not limited thereto, and any person skilled in the art will readily recognize that variations or substitutions are within the scope of the present invention.
Claims (6)
1. The detection method of the large-caliber optical element is characterized by comprising the following steps of:
s1, setting a plurality of sub-apertures on a mirror surface of an optical element to be measured, dividing a full aperture into a plurality of edge area apertures and a central area aperture, wherein an overlapping area exists between the central area aperture and the edge area aperture, and each edge area aperture and each central area aperture comprise a certain number of sub-apertures;
s2, arranging a first plane mirror and a second plane mirror, wherein the first plane mirror scans the aperture of the central area, the plane where the first plane mirror is positioned is a reference plane, the second plane mirror rotates to scan the aperture of the edge area, the wave fronts of sub-apertures contained in the aperture of each edge area and the aperture of the central area are obtained through measurement, and slope distribution is calculated;
s3, splicing all sub-apertures in the aperture of the edge area and the aperture of the central area to a reference plane, and reconstructing to obtain the wavefront on the full aperture of the optical element to be measured;
in the step S2, obtaining slope distributions of sub-apertures included in the aperture of each edge area and the aperture of the central area, including:
step S21, setting the actual measurement wavefront of the aperture of the kth edge area asThe wave front spliced to the reference plane isThere is->(2) Wherein->、/>The slope in the x and y directions measured on the aperture of the kth edge region, +.>、/>The slope in the x and y directions after being spliced to the reference surface are respectively +.>、/>Respectively the inclination errors along the x and y directions, and k is an integer greater than 1;
step S22, selecting the first aperture in the overlapping area of the central area aperture and the edge area apertureThe sub-aperture is set at->The slopes of the sub-aperture in the x and y directions on the aperture of the central region are +.>、/>The slopes in the x and y directions over the aperture in the edge region are +.>、/>The formula (2) includes: /> （3），/>、And->、/>I is an integer greater than 1, both measured;
step S23, obtaining the product from the formula (3)、/>The slope +.f in the x and y directions after the aperture of the kth edge area is spliced to the reference plane can be obtained by substituting the formula (2)>And->；
According to the same processing steps of the kth edge area aperture, the slopes of all sub-apertures on the full aperture are obtained.
2. The method according to claim 1, wherein in the step S22, N sub-apertures are selected in the overlapping region, N is an integer greater than 1, and the k edge regions are calculated by the following formula (4) as tilt errors along the x and y directions, respectively、/>，
（4）
In step S23, the result is obtained by the formula (4)、/>And substituting back to formula (2).
3. The method for inspecting a large-caliber optical element according to claim 2, wherein the step S3 includes:
is provided with、/>Wavefront +.>In->Wavefront slope in x, y directions at sub-aperture to provide wavefrontExpressed by a polynomial:
（5）
wherein, the liquid crystal display device comprises a liquid crystal display device,is polynomial coefficient, then +.>The average slope of the sub-apertures in the x, y directions, respectively, can be expressed as: ，/>wherein-> ， ；
Expressed as a matrix:
the abbreviation is:the following steps are: />；
、/>Is of known quantity, is obtained by concatenation, m is the polynomial term,/->Is the K term Zernike polynomial,>for the area of the i-th sub-aperture, +.>For the average slope coefficient of the ith sub-aperture in the x-direction,for the average slope coefficient of the ith sub-aperture in y-direction, solving the polynomial coefficient +.>And then the wave front on the full aperture can be obtained by substituting the formula (5).
4. The detection system of the large-caliber optical element is characterized by comprising an optical element to be detected, a first plane mirror, a second plane mirror, a rotary table, an interferometer, a secondary mirror system and a computer processing system, wherein the rotary table drives the second plane mirror to rotate and scan, the interferometer is used for measuring the wavefront of a sub-aperture, and the computer processing system performs the following operations:
setting a plurality of sub-apertures on a mirror surface of the optical element to be measured, and dividing the full aperture into a plurality of edge area apertures, wherein each edge area aperture comprises a certain number of sub-apertures;
calculating slope distribution according to the wave fronts of the sub-apertures contained in the measured aperture of each edge area and the measured aperture of the central area, splicing all the sub-apertures in the aperture of the edge area and the aperture of the central area to a reference surface, and reconstructing to obtain the wave fronts on the full aperture of the measured optical element;
let the measured wavefront of the kth edge area aperture beThe wave front spliced to the reference plane is +.>There is->(2) Wherein->、/>The slope in the x and y directions measured on the aperture of the kth edge region, +.>、/>The slope in the x and y directions after being spliced to the reference surface are respectively +.>、/>Tilt errors along the x and y directions, respectively;
selecting a first one of the overlapping area of the central area aperture and the edge area apertureThe sub-aperture is set at->The slopes of the sub-aperture in the x and y directions on the aperture of the central region are +.>、/>The slopes in the x and y directions over the aperture in the edge region are +.>、/>The formula (2) includes: /> （3），/>、/>And->、/>Are all obtained by measurement;
will be derived from equation (3)、/>The slope +.f in the x and y directions after the aperture of the kth edge area is spliced to the reference plane can be obtained by substituting the formula (2)>And->；
According to the same processing steps of the kth edge area aperture, the slopes of all sub-apertures on the full aperture are obtained.
5. The system of claim 4, wherein N sub-apertures are selected in the overlapping region, and the k-th edge region is calculated as the tilt error in the x and y directions by the following equation (4)、/>， （4）。
6. The system for inspecting a large-diameter optical component according to claim 5, wherein、/>Wavefront +.>In->Wavefront slope in x, y direction at sub-aperture, wavefront +.>Expressed by a polynomial:
（5）
wherein, the liquid crystal display device comprises a liquid crystal display device,is polynomial coefficient, then +.>The average slope of the sub-apertures in the x, y directions, respectively, can be expressed as: ，/>wherein-> ， ；
Expressed as a matrix:
can be abbreviated as:the following steps are: />；
、/>Is of known quantity, is obtained by concatenation, m is the polynomial term,/->Is the K term Zernike polynomial,>for the area of the i-th sub-aperture, +.>For the average slope coefficient of the ith sub-aperture in the x-direction,for the average slope coefficient of the ith sub-aperture in y-direction, solving the polynomial coefficient +.>And then the wave front on the full aperture can be obtained by substituting the formula (5).
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| CN103257033A (en) * | 2013-05-15 | 2013-08-21 | 中国科学院光电技术研究所 | Window glass transmitted wavefront detection method based on subaperture stitching interference detection |
| CN105423948A (en) * | 2015-12-14 | 2016-03-23 | 中国科学院长春光学精密机械与物理研究所 | Splicing-interference-detection aspheric surface shape apparatus using distorting lens and method thereof |
| KR101861121B1 (en) * | 2016-11-21 | 2018-06-29 | 주식회사 오로스테크놀로지 | A Subaperture Stitching Method for measuring of a Wafer Geometry Metric |
| CN108151888A (en) * | 2017-11-22 | 2018-06-12 | 中国科学院长春光学精密机械与物理研究所 | A kind of method for the error decoupling for being used to scan Hartmann's detection device |
| CN111397505A (en) * | 2020-04-13 | 2020-07-10 | 中国科学院光电技术研究所 | Phase-shift interferometer large-aperture reference plane mirror absolute calibration device and method |
| CN111912607A (en) * | 2020-07-22 | 2020-11-10 | 中国科学院西安光学精密机械研究所 | Large-aperture optical system MTF measuring device and method |
| CN113008518A (en) * | 2021-02-26 | 2021-06-22 | 茂莱（南京）仪器有限公司 | Splicing detection method and system based on shack Hartmann wavefront sensor |
| CN113091637A (en) * | 2021-03-22 | 2021-07-09 | 中国科学院光电技术研究所 | Ultra-high precision plane mirror full-aperture medium-frequency surface shape measuring device and method |
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