CN117233899B - Optical path adjusting device and interference lithography equipment - Google Patents

Optical path adjusting device and interference lithography equipment Download PDF

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Publication number
CN117233899B
CN117233899B CN202311510092.3A CN202311510092A CN117233899B CN 117233899 B CN117233899 B CN 117233899B CN 202311510092 A CN202311510092 A CN 202311510092A CN 117233899 B CN117233899 B CN 117233899B
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adjusting arm
adjusting
traction piece
arm
connection structure
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CN117233899A (en
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鲁森
朱翼先
曹耒
杨开明
张鸣
成荣
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Tsinghua University
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Tsinghua University
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Abstract

The invention relates to the technical field of micro-nano structure manufacturing, and provides a light path adjusting device and interference lithography equipment. The light path adjusting device comprises a first adjusting arm, a second adjusting arm, a first traction piece, a second traction piece and a driving mechanism; the first adjusting arm and the second adjusting arm are respectively provided with a mounting mechanism; one end of the first traction piece is connected with the first adjusting arm, and the other end of the first traction piece is connected with the driving mechanism; one end of the second traction piece is connected with the second adjusting arm, and the other end of the second traction piece is connected with the driving mechanism; the driving mechanism is used for driving the first adjusting arm and the second adjusting arm to rotate through the first traction piece and the second traction piece so as to adjust the included angle between the first adjusting arm and the reference plane and the included angle between the second adjusting arm and the reference plane. The invention has simple structure, easy control, and can effectively reduce the system cost and improve the production efficiency when in adjustment.

Description

Optical path adjusting device and interference lithography equipment
Technical Field
The invention relates to the technical field of micro-nano structure manufacturing, in particular to a light path adjusting device and interference lithography equipment.
Background
The large-size high-precision planar grating is a core element of high-end instruments and equipment such as a photoetching machine, a chirped pulse amplifier and the like, and the planar grating manufactured by interference photoetching has the advantages of high precision and no ghost lines and is widely applied to the fields of precision measurement, national defense and military industry and the like. Scanning interferometry lithography may be used in the manufacture of such precision components. However, the light beams emitted by the laser are gaussian beams, and the quality of the light beams is difficult to ensure, so that complex optical systems are required to perform filtering, shaping and other operations on the light beams to obtain high-quality interference patterns.
The period of interference fringes produced by coherent light is related to the wavelength and the interference angle, and the interference angle is changed by adjusting the position and the angle of an output optical fiber in interference photoetching equipment when manufacturing micro-nano structures with different scales.
In the interference lithography apparatus in the prior art, the position and angle of each optical element in the space are respectively adjusted by the optical path adjusting component to change the interference angle. Common optical path adjusting components comprise a reflector angular displacement adjusting table, a reflector linear displacement adjusting table and the like, and the optical path can be adjusted by using the adjusting table, but the required adjusting elements are excessive, and the pose of each optical element in the interference lithography system has a coupling relation, so that the control algorithm of optical path reconstruction is very complex, the system cost is increased, the adjusting time is shortened, and the production efficiency is reduced.
Disclosure of Invention
The invention provides a light path adjusting device and interference lithography equipment, which are used for solving the defects that the position and the angle of each optical element in a space are respectively adjusted by a light path adjusting component to change the interference angle in the prior art, the required adjusting elements in a light path are excessive, the pose of each optical element in an interference lithography system has a coupling relation, a control algorithm is quite complex, the system cost is increased, the adjusting time is shortened, and the production efficiency is reduced.
The invention provides an optical path adjusting device, which comprises a first adjusting arm, a second adjusting arm, a first traction piece, a second traction piece and a driving mechanism, wherein the first traction piece is connected with the first adjusting arm;
the first adjusting arm and the second adjusting arm are a pair of swing arms with a switching shaft arranged at the bottom, and are respectively provided with a mounting mechanism, wherein the mounting mechanisms are used for mounting an emergent end of an optical fiber and a beam shaping assembly corresponding to the emergent end of the optical fiber;
one end of the first traction piece is connected with the first adjusting arm, and the other end of the first traction piece is connected with the driving mechanism;
one end of the second traction piece is connected with the second adjusting arm, and the other end of the second traction piece is connected with the driving mechanism;
the driving mechanism is arranged between the first adjusting arm and the second adjusting arm, and is used for driving the first adjusting arm and the second adjusting arm to rotate through the first traction piece and the second traction piece so as to adjust the included angle between the first adjusting arm and the reference plane and between the second adjusting arm and the reference plane.
According to the present invention, there is provided an optical path adjusting device, the driving mechanism comprising:
a support;
the micro-motion driving structure is respectively connected with the first traction piece and the second traction piece and is suitable for driving one ends of the first traction piece and the second traction piece, which are connected with the micro-motion driving structure, to move;
the coarse movement driving structure is arranged on the supporting piece and connected with the fine movement driving structure, and the coarse movement driving structure is suitable for driving the fine movement driving structure to move.
According to the present invention, there is provided an optical path adjusting device, the micro driving structure includes:
the first micro motor is arranged on the coarse driving structure and is connected with the first traction piece;
and the second micro motor is arranged on the coarse driving structure and is connected with the second traction piece.
According to the present invention, there is provided an optical path adjusting device, further comprising:
the angle measuring mechanism is connected with the first adjusting arm and the second adjusting arm and is used for measuring the included angle between the first adjusting arm and the reference plane and the included angle between the second adjusting arm and the reference plane;
and the controller is electrically connected with the angle measuring mechanism and the driving mechanism and is used for controlling the driving mechanism to operate based on the detection result of the angle measuring mechanism.
According to the light path adjusting device provided by the invention, the light beam shaping assembly comprises a half-wave plate, a focusing mirror, a pinhole filter and a collimating mirror, and the mounting mechanism comprises:
the first connecting structure is used for installing the emergent end of the optical fiber;
the second connecting structure is used for installing a half wave plate;
a third connection structure for mounting a focusing mirror;
a fourth connection structure for mounting a pinhole filter;
a fifth connection structure for mounting the collimator lens;
the first connecting structure, the second connecting structure, the third connecting structure, the fourth connecting structure and the fifth connecting structure are sequentially arranged along the direction close to the rotating shafts of the first adjusting arm and the second adjusting arm.
According to the optical path adjusting device provided by the invention, at least one of the first connecting structure, the second connecting structure, the third connecting structure, the fourth connecting structure and the fifth connecting structure is detachably connected with the first adjusting arm and the second adjusting arm.
According to the optical path adjusting device provided by the invention, at least one of the first connecting structure, the second connecting structure, the third connecting structure, the fourth connecting structure and the fifth connecting structure has the following structural arrangement:
the device comprises a sleeve and a positioning assembly, wherein the sleeve is provided with a through groove along a first direction, a lateral opening is formed in the through groove at the second direction side of the sleeve, the first adjusting arm or the second adjusting arm penetrates through the through groove along the first direction and is suitable for entering and exiting the through groove from the lateral opening, and the positioning assembly is arranged in the sleeve and used for locking the position of the sleeve on the first adjusting arm and the second adjusting arm;
wherein the first direction is perpendicular to the second direction.
According to the present invention, there is provided an optical path adjusting device, the positioning assembly comprising:
the positioning bolt is in threaded fit with the sleeve through a threaded hole formed in the sleeve, and the threaded hole is communicated with the penetrating groove and the outer side of the sleeve;
the cushion block is arranged in the through groove, is rotationally connected with the positioning bolt, and is in contact fit with the first adjusting arm or the second adjusting arm.
According to the light path adjusting device provided by the invention, the first adjusting arm or the second adjusting arm is provided with the matching groove, the matching groove extends along the length direction of the first adjusting arm or the second adjusting arm, and at least part of the cushion block is positioned in the matching groove.
The invention also provides interference lithography equipment, which comprises the light path adjusting device.
According to the optical path adjusting device and the interference lithography equipment, the driving mechanism is operated to adjust the included angle between the first adjusting arm and the second adjusting arm and the reference plane, so that the positions and angles of the emergent end of the optical fiber and the corresponding beam shaping component can be adjusted, the reconstruction of an optical path is realized, the interference angle of coherent light is changed to meet the manufacturing requirements of micro-nano structures with different scales, and the emergent end of the optical fiber and the corresponding beam shaping component are adjusted together through the corresponding first adjusting arm and the corresponding second adjusting arm without arranging an adjusting structure for each optical element independently, so that the optical path adjusting device has the advantages of simple structure and easiness in control, and can effectively reduce the system cost and improve the production efficiency during adjustment.
Drawings
In order to more clearly illustrate the invention or the technical solutions of the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the invention, and other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic view of the overall structure of an optical path adjusting device according to the present invention;
FIG. 2 is a cross-sectional view showing the mating relationship of the first adjusting arm and the mounting mechanism in the optical path adjusting device provided by the present invention;
reference numerals:
1. a first adjustment arm; 2. a second adjustment arm; 3. a first traction member; 4. a second traction member; 5. a support; 6. a coarse driving structure; 7. a first micro motor; 8. a second micro motor; 9. an angle measuring mechanism; 10. a first connection structure; 11. a second connection structure; 12. a third connection structure; 13. a fourth connection structure; 14. a fifth connection structure; 15. a kit; 16. positioning bolts; 17. a cushion block; 18. a through groove; 19. a mating groove; 20. hiding the groove; 21. a laser; 22. a first optical fiber; 23. a second optical fiber; 24. a third optical fiber; 25. a beam splitter; 26. a first half-wave plate; 27. a first focusing mirror; 28. a first pinhole filter; 29. a first collimating mirror; 30. a second half-wave plate; 31. a second focusing mirror; 32. a second pinhole filter; 33. a second collimating mirror; 34. a two-dimensional motion stage; 35. exposing the substrate; 36. a controller; 37. a first exit end; 38. a second exit end; 39. a first coherent light; 40. and second coherent light.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The optical path adjusting apparatus of the present invention, which can be applied to an interference lithography device, is described below with reference to fig. 1 and 2. The interference lithography apparatus comprises a laser 21, a first optical fiber 22, a second optical fiber 23, a third optical fiber 24, a beam splitter 25, a beam shaping assembly comprising a half-wave plate, a focusing mirror, a pinhole filter and a collimator mirror, and a two-dimensional motion stage 34. The laser 21 is connected with the input end of the beam splitter 25 through the first optical fiber 22, the output end of the beam splitter 25 is respectively connected with the second optical fiber 23 and the third optical fiber 24, one end of the second optical fiber 23, which is far away from the beam splitter 25, forms a first emergent end 37, one end of the third optical fiber 24, which is far away from the beam splitter 25, forms a second emergent end 38, and the first coherent light 39, which is split by the beam splitter 25, generated by the laser 21 is emitted from the first emergent end 37, and the split second coherent light 40 is emitted from the second emergent end 38. The first coherent light 39 and the second coherent light 40 are projected onto an exposure substrate 35 on the two-dimensional motion stage 34 after passing through corresponding half-wave plates, focusing mirrors, pinhole filters, and collimator mirrors, respectively. When manufacturing micro-nano structures with different dimensions, the interference angle is required to be changed by adjusting the relative pose of the first outgoing end 37, the second outgoing end 38, the corresponding half-wave plate, the focusing mirror, the pinhole filter and the collimating mirror, the process is complex to operate, the adjustment time is increased, and the production efficiency is reduced. The optical path adjusting device of the embodiment of the present invention aims to solve the above-described problems.
As shown in fig. 1, the optical path adjusting device of the embodiment of the present invention includes a first adjusting arm 1, a second adjusting arm 2, a first drawing member 3, a second drawing member 4, and a driving mechanism.
The first adjusting arm 1 and the second adjusting arm 2 are a pair of swing arms with a switching shaft arranged at the bottom, and the first adjusting arm 1 and the second adjusting arm 2 are preferably connected with each other in a rotating manner at the bottom in the embodiment. The first adjusting arm 1 and the second adjusting arm 2 are respectively provided with a mounting mechanism, and the mounting mechanisms are used for mounting the emergent end of the optical fiber and a beam shaping assembly corresponding to the emergent end of the optical fiber;
one end of the first traction piece 3 is connected with the first adjusting arm 1, and the other end is connected with the driving mechanism;
one end of the second traction piece 4 is connected with the second adjusting arm 2, and the other end is connected with the driving mechanism;
the driving mechanism is arranged between the first adjusting arm 1 and the second adjusting arm 2, and is used for driving the first adjusting arm 1 and the second adjusting arm 2 to rotate through the first traction piece 3 and the second traction piece 4 so as to adjust the included angle between the first adjusting arm 1 and the second adjusting arm 2 and a reference plane (such as a horizontal plane or a vertical plane).
In this embodiment, the driving mechanism drives one end of the first traction member 3 away from the first adjusting arm 1 and one end of the second traction member 4 away from the second adjusting arm 2 to move, and the first traction member 3 and the second traction member 4 are transmitted to the first adjusting arm 1 and the second adjusting arm 2 to enable the first adjusting arm 1 and the second adjusting arm 2 to rotate, so that an included angle between the first adjusting arm 1 and the second adjusting arm 2 and the reference surface is adjusted. The first outgoing end 37 and the beam shaping component corresponding to the first outgoing end 37 are installed through the installation mechanism of the first adjusting arm 1, and the second outgoing end 38 and the beam shaping component corresponding to the second outgoing end 38 are installed through the installation mechanism of the second adjusting arm 2, so that interference angle adjustment can be conveniently performed.
The first traction member 3 and the second traction member 4 according to the embodiment of the present invention may be a rod structure or a traction rope. For example, as shown in fig. 1, the first traction member 3 and the second traction member 4 are both in a rod structure, one end of the first traction member 3 is rotatably connected with the first adjusting arm 1, and the other end is rotatably connected with the driving mechanism; one end of the second traction piece 4 is rotationally connected with the second adjusting arm 2, and the other end is rotationally connected with the driving mechanism. For another example, the first traction member 3 and the second traction member 4 are both traction ropes, one end of the first traction member 3 is fixedly connected with the first adjusting arm 1, and the other end is fixedly connected with the driving mechanism; one end of the second traction piece 4 is fixedly connected with the second adjusting arm 2, and the other end is fixedly connected with the driving mechanism.
Optionally, the lengths of the first traction member 3 and the second traction member 4 are equal, the lengths of the first adjusting arm 1 and the second adjusting arm 2 are equal, and the connection position of the first traction member 3 and the first adjusting arm 1 and the connection position of the second traction member 4 and the second adjusting arm 2 correspond.
In some embodiments of the invention, the drive mechanism comprises a support 5, a jog drive structure and a jog drive structure 6. The support 5 may be a vertically arranged plate structure, and one side of the support 5 is perpendicular to the transfer shaft of the first adjusting arm 1 and the second adjusting arm 2. The micro-motion driving structure is respectively connected with the first traction piece 3 and the second traction piece 4 so as to be suitable for driving one end of the first traction piece 3 and the second traction piece 4 connected with the micro-motion driving structure to move. The coarse driving structure 6 is arranged on the supporting piece 5 and is connected with the fine driving structure, and the coarse driving structure 6 is suitable for driving the fine driving structure to move.
Between the coarse driving structure 6 and the fine driving structure in this embodiment, the coarse driving structure 6 has a faster adjusting speed, and the fine driving structure has a higher adjusting accuracy. The coarse movement driving structure 6 and the micro movement driving structure are linear motors with vertical driving directions, wherein a stator of the coarse movement driving structure 6 is arranged on the supporting piece 5, a stator of the micro movement driving structure is arranged on a rotor of the coarse movement driving structure 6, and the rotor of the micro movement driving structure is connected with the first traction piece 3 and the second traction piece 4. Coarse adjustment of the included angles between the first adjusting arm 1 and the second adjusting arm 2 and the reference surface can be achieved through the coarse-movement driving structure 6, and fine adjustment of the included angles between the first adjusting arm 1 and the second adjusting arm 2 and the reference surface can be achieved through the fine-movement driving structure.
In some embodiments of the present invention, the micro-motion driving structure includes a first micro-motion motor 7 and a second micro-motion motor 8, and the first micro-motion motor 7 and the second micro-motion motor 8 are arranged in a horizontal direction. The stator of the first micro motor 7 is arranged on the coarse movement driving structure 6, in particular on the rotor of the coarse movement motor, the rotor of the first micro motor 7 is connected with the first traction piece 3, the stator of the second micro motor 8 is arranged on the coarse movement driving structure 6, in particular on the rotor of the coarse movement motor, and the rotor of the second micro motor 8 is connected with the second traction piece 4.
The first micro motor 7 and the second micro motor 8 run independently of each other, so that the difference adjustment of the vertical angle of the first adjusting arm 1 and the vertical angle of the second adjusting arm 2 can be realized, and more working condition demands are met.
In some embodiments of the present invention, the optical path adjusting device further includes an angle measuring mechanism 9 and a controller 36. The angle measuring mechanism 9 is connected with the first adjusting arm 1 and the second adjusting arm 2 and is used for measuring the included angle between the first adjusting arm 1 and the second adjusting arm 2 and the reference surface.
The controller 36 is electrically connected to the angle measuring mechanism 9 and the driving mechanism for controlling the driving mechanism to operate based on the detection result of the angle measuring mechanism 9. Specifically, the controller 36 is electrically connected to the angle measuring mechanism 9, the coarse driving structure 6, and the first and second micro motors 7 and 8 in the fine driving structure, and is configured to control operations of the coarse driving structure 6 and the first and second micro motors 7 and 8 in the fine driving structure based on a detection result of the angle measuring mechanism 9.
Optionally, the transfer shafts of the first adjusting arm 1 and the second adjusting arm 2 are respectively rotatably connected to the transfer seats, and the angle measuring mechanism 9 includes a pair of angle sensors, wherein one angle sensor is connected to the transfer shaft of the first adjusting arm 1 and is used for measuring the rotation angle of the first adjusting arm 1, and the other angle sensor is connected to the transfer shaft of the second adjusting arm 2 and is used for measuring the rotation angle of the second adjusting arm 2.
The pair of angle sensors are electrically connected to the controller 36, respectively, and the controller 36 controls the operation of the driving mechanism based on the detection results of the pair of angle sensors. For example, the controller 36 determines a target adjustment angle based on angle information and current angle information of target positions of the first adjustment arm 1 and the second adjustment arm 2, and generates a control instruction based on the target adjustment angle and detection results of a pair of angle sensors, and the driving mechanism performs an adjustment action in response to the control instruction until the first adjustment arm 1 and the second adjustment arm 2 are rotated to the respective target positions, respectively.
In some embodiments of the present invention, the beam shaping assembly comprises a half-wave plate, a focusing mirror, a pinhole filter, and a collimating mirror, and the mounting mechanism comprises a first connection structure 10, a second connection structure 11, a third connection structure 12, a fourth connection structure 13, and a fifth connection structure 14, where the first connection structure 10 is used for mounting an exit end of an optical fiber; the second connection structure 11 is used for mounting a half-wave plate; the third connection structure 12 is used for installing a focusing mirror; the fourth connection structure 13 is used for installing a pinhole filter; the fifth connection structure 14 is used for installing a collimating mirror; the first connection structure 10, the second connection structure 11, the third connection structure 12, the fourth connection structure 13, and the fifth connection structure 14 are sequentially arranged in a direction approaching the rotation axes of the first adjustment arm 1 and the second adjustment arm 2. The outgoing end, the half wave plate, the focusing mirror, the pinhole filter and the collimating mirror of the optical fiber are respectively installed on the first adjusting arm 1 and the second adjusting arm 2 through five connecting structures, so that different components can be respectively debugged, and different use requirements are met.
Optionally, at least one of the first connecting structure 10, the second connecting structure 11, the third connecting structure 12, the fourth connecting structure 13 and the fifth connecting structure 14 is detachably connected with the first adjusting arm 1 and the second adjusting arm 2, and the detachable connection manner may be, for example, a bolt connection or a clamping connection. The detachable connection mode can facilitate the operations such as disassembly, assembly and maintenance, position adjustment and the like of the elements.
Referring to fig. 2, in some embodiments of the present invention, at least one of the first connection structure 10, the second connection structure 11, the third connection structure 12, the fourth connection structure 13, and the fifth connection structure 14 has the following structural arrangement: the device comprises a sleeve 15 and a positioning assembly, wherein the sleeve 15 is provided with a through groove 18 along a first direction, the through groove 18 forms a lateral opening at a second direction side of the sleeve 15, the first adjusting arm 1 or the second adjusting arm 2 is penetrated in the through groove 18 along the first direction and is suitable for entering and exiting the through groove 18 from the lateral opening, and the positioning assembly is arranged on the sleeve 15 and used for locking the position of the sleeve 15 on the first adjusting arm 1 and the second adjusting arm 2; wherein the first direction is perpendicular to the second direction. The first direction may refer to the z-direction in fig. 2 and the second direction may refer to the x-direction in fig. 2.
In this embodiment, any one of the exit end of the optical fiber, the half-wave plate, the focusing mirror, the pinhole filter, and the collimator mirror may be mounted on the package 15. The connection modes of the outgoing end of the optical fiber, the half-wave plate, the focusing lens, the pinhole filter and the collimating lens with the sleeve 15 can be bolt connection, buckle connection or hinge connection, and the like, and are flexibly selected according to the use requirement, and are not particularly limited herein.
The width of the through groove 18 is larger than or equal to that of the first adjusting arm 1 and the second adjusting arm 2, so that the first adjusting arm 1 and the second adjusting arm 2 can be embedded into the through groove 18 through the opening of the through groove 18, and in the length direction of the first adjusting arm 1 and the second adjusting arm 2, the relative sliding between the first adjusting arm 1 or the second adjusting arm 2 and the sleeve 15 is realized, the position of an element on the sleeve 15 is adjusted, and when the sleeve 15 is adjusted to a proper position, the fixing of the relative position between the sleeve 15 and the first adjusting arm 1 or the second adjusting arm 2 correspondingly connected with the sleeve can be realized through the locking function of the positioning component.
Optionally, the width of the through groove 18 is equal to the width of the first adjusting arm 1 or the second adjusting arm 2, so that the sleeve 15 is more stable when fixed on the first adjusting arm 1 or the second adjusting arm 2, and is prevented from deflecting, and the sleeve 15 and the first adjusting arm 1 or the second adjusting arm 2 connected with the sleeve are not easy to shake when sliding relatively.
Optionally, the first connection structure 10, the second connection structure 11, the third connection structure 12, the fourth connection structure 13 and the fifth connection structure 14 have the same structure, so as to reduce the number of open modules and reduce the production difficulty and the production cost.
Optionally, the first adjusting arm 1 and/or the second adjusting arm 2 are provided with graduations arranged along the length direction in order to determine the position of each element.
In some embodiments of the present invention, the positioning assembly includes a positioning bolt 16 and a spacer 17. The positioning bolt 16 is in threaded fit with the sleeve 15 through a threaded hole formed in the sleeve 15, and the threaded hole is communicated with the penetrating groove 18 and the outer side of the sleeve 15; the cushion block 17 is arranged in the through groove 18, is rotatably connected with the positioning bolt 16, and is in contact fit with the first adjusting arm 1 or the second adjusting arm 2.
Specifically, the portions of the sleeve 15 located on both sides of the through groove 18 are provided with screw holes, the axial directions of which are perpendicular to the first and second directions, the screw holes extending from the outside of the sleeve 15 to the through groove 18 to communicate the through groove 18 with the outside of the sleeve 15. The positioning bolt 16 is arranged in the threaded hole in a penetrating way, and is in threaded fit with the threaded hole, one end of the positioning bolt 16 is positioned outside the sleeve 15, the other end of the positioning bolt is positioned in the penetrating groove 18, and the positioning bolt 16 can be rotated through the end positioned outside the sleeve 15 so as to adjust the insertion depth of the positioning bolt 16, and the locking and unlocking functions are realized. The cushion block 17 may be a square, round or polygonal plate structure, one side of the cushion block is suitable for abutting against the side wall of the first adjusting arm 1 or the second adjusting arm 2, the other side of the cushion block is rotatably connected with one end of the positioning bolt 16, which is positioned in the sleeve 15, in a shaft hole matching manner, for example, by arranging the cushion block 17, the positioning bolt 16 can be prevented from directly contacting with the first adjusting arm 1 or the second adjusting arm 2, and the positioning bolt 16 is prevented from damaging the outer wall of the first adjusting arm 1 or the second adjusting arm 2.
Optionally, the first adjusting arm 1 or the second adjusting arm 2 is provided with a mating groove 19, the mating groove 19 extending in the length direction of the first adjusting arm 1 or the second adjusting arm 2, at least part of the spacer 17 being located in the mating groove 19.
Optionally, the shape of the matching groove 19 is matched with the shape of the cushion block 17, two side walls of the cushion block 17 in the width direction of the matching groove 19 are respectively in slidable contact fit with the inner wall of the matching groove 19, so that displacement in the width direction of the matching groove 19 cannot be generated when the cushion block 17 slides along the matching groove 19, and further, in the width direction of the matching groove 19, limit is formed on the sleeve 15 and the first adjusting arm 1 or the second adjusting arm 2 connected with the sleeve. For example, the cross section of the fitting groove 19 is rectangular, the pad 17 is provided in a rectangular plate structure having a width equal to the width of the fitting groove 19, both sides in the width direction of the pad 17 are slidably brought into contact with the side walls of the corresponding sides of the fitting groove 19, respectively, whereby the pad 17 can slide in the length direction (extending direction) of the fitting groove 19, and cannot slide in the width direction of the fitting groove 19.
Optionally, the sleeve 15 is provided with a hiding groove 20, the hiding groove 20 is located on one side wall of the through groove 18, the hiding groove 20 and the threaded hole are located on the same side of the through groove 18 and are mutually connected, the hiding groove 20 is arranged opposite to the matching groove 19, the cushion block 17 is suitable for sliding into the hiding groove 20, and when the cushion block 17 is located in the hiding groove 20, the cushion block 17 is located outside the matching groove 19. In this embodiment, when the positioning bolt 16 is rotated to move the cushion block 17 to the inner hiding groove 20, the cushion block 17 is not in contact with the side wall of the matching groove 19, so that the first adjusting arm 1 or the second adjusting arm 2 can conveniently enter and exit the penetrating groove 18 from the lateral opening, and the other sleeve 15 can be installed or removed between the two adjacent sleeve 15.
The embodiment of the invention also provides interference lithography equipment, which comprises the light path adjusting device.
Optionally, the interferometric lithographic apparatus further comprises a laser 21, a first optical fiber 22, a second optical fiber 23, a third optical fiber 24, a beam splitter 25, a first half-wave plate 26, a first focusing mirror 27, a first pinhole filter 28, a first collimator 29, a second half-wave plate 30, a second focusing mirror 31, a second pinhole filter 32, a second collimator 33 and a two-dimensional motion stage 34. The laser 21 is connected with the input end of the beam splitter 25 through the first optical fiber 22, the output end of the beam splitter 25 is respectively connected with the second optical fiber 23 and the third optical fiber 24, one end of the second optical fiber 23, which is away from the beam splitter 25, forms a first emergent end 37, and one end of the third optical fiber 24, which is away from the beam splitter 25, forms a second emergent end 38. The first exit end 37, the first half-wave plate 26, the first focusing mirror 27, the first pinhole filter 28 and the first collimating mirror 29 are mounted on the mounting mechanism of the first adjusting arm 1, and the second exit end 38, the second half-wave plate 30, the second focusing mirror 31, the second pinhole filter 32 and the second collimating mirror 33 are mounted on the mounting mechanism of the second adjusting arm 2. The two-dimensional movement stage 34 is provided on one axial side of the transfer shaft of the first and second adjusting arms 1 and 2, and the two-dimensional movement stage 34 is used for mounting the exposure substrate 35.
The first outgoing end 37 outgoing beam is first coherent light 39, the first coherent light 39 first passes through the first half-wave plate 26, and the polarization direction of the first coherent light 39 can be adjusted by rotating the first half-wave plate 26; the first coherent light 39 passes through the first focusing mirror 27 after passing through the first half-wave plate 26, and the focused first coherent light 39 is focused at the first pinhole filter 28; the first pinhole filter 28 performs filtering processing on the first coherent light 39 to remove stray light therein and improve beam quality; the light beam emitted from the first pinhole filter 28 is shaped into parallel light by the first collimator 29 and then projected to the exposure substrate 35.
The second emission end 38 emits a second coherent light 40, the second coherent light 40 first passes through the second half-wave plate 30, and the polarization direction of the second coherent light 40 can be adjusted by rotating the second half-wave plate 30; the second coherent light 40 passes through the second focusing mirror 31 after passing through the second half-wave plate 30, and the focal point of the focused second coherent light 40 is located at the second pinhole filter 32; the second pinhole filter 32 performs filtering processing on the second coherent light 40 to remove stray light therein and improve beam quality; the light beam emitted from the second pinhole filter 32 is shaped into parallel light by the second collimator 33 and then projected to the exposure substrate 35, and interferes with the first coherent light 39 to generate an interference pattern required for lithography.
The optical path adjusting device provided by the invention can realize the adjustment of the positions and angles of the emergent end of the optical fiber, the half-wave plate, the focusing mirror, the pinhole filter and the collimating mirror by operating the driving mechanism to adjust the included angles between the first adjusting arm 1 and the second adjusting arm 2 and the reference surface, meets the manufacturing requirements of micro-nano structures with different scales, has a simple structure, is easy to control, can effectively reduce the system cost and the time cost, and improves the production efficiency.
Further, the interference lithography apparatus provided by the invention also has the advantages due to the inclusion of the optical path adjusting device.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims (10)

1. The light path adjusting device is characterized by comprising a first adjusting arm, a second adjusting arm, a first traction piece, a second traction piece and a driving mechanism;
the first adjusting arm and the second adjusting arm are a pair of swing arms with a switching shaft arranged at the bottom, and are respectively provided with a mounting mechanism, wherein the mounting mechanisms are used for mounting an emergent end of an optical fiber and a beam shaping assembly corresponding to the emergent end of the optical fiber;
one end of the first traction piece is connected with the first adjusting arm, and the other end of the first traction piece is connected with the driving mechanism;
one end of the second traction piece is connected with the second adjusting arm, and the other end of the second traction piece is connected with the driving mechanism;
the driving mechanism is arranged between the first adjusting arm and the second adjusting arm and is used for driving the first adjusting arm and the second adjusting arm to rotate through the first traction piece and the second traction piece so as to adjust the included angle between the first adjusting arm and the second adjusting arm and the reference plane;
the driving mechanism includes: the micro-motion driving structure is respectively connected with the first traction piece and the second traction piece and is suitable for driving one ends of the first traction piece and the second traction piece, which are connected with the micro-motion driving structure, to move;
the micro-motion driving structure comprises:
the first micro motor is connected with the first traction piece;
the second micro motor is connected with the second traction piece;
the first micro motor and the second micro motor run independently of each other, and differential adjustment of the vertical angle of the first adjusting arm and the vertical angle of the second adjusting arm is achieved.
2. The optical path adjusting apparatus according to claim 1, wherein the driving mechanism includes:
a support;
the coarse movement driving structure is arranged on the supporting piece and connected with the fine movement driving structure, and the coarse movement driving structure is suitable for driving the fine movement driving structure to move.
3. The optical path adjusting apparatus according to claim 2, wherein
The first micro motor is arranged on the coarse movement driving structure;
the second micro motor is arranged on the coarse movement driving structure.
4. The optical path adjusting apparatus according to claim 1, further comprising:
the angle measuring mechanism is connected with the first adjusting arm and the second adjusting arm and is used for measuring the included angle between the first adjusting arm and the reference plane and the included angle between the second adjusting arm and the reference plane;
and the controller is electrically connected with the angle measuring mechanism and the driving mechanism and is used for controlling the driving mechanism to operate based on the detection result of the angle measuring mechanism.
5. The optical path adjusting apparatus according to claim 1, wherein the beam shaping assembly comprises a half-wave plate, a focusing mirror, a pinhole filter, and a collimator mirror, and the mounting mechanism comprises:
the first connecting structure is used for installing the emergent end of the optical fiber;
the second connecting structure is used for installing a half wave plate;
a third connection structure for mounting a focusing mirror;
a fourth connection structure for mounting a pinhole filter;
a fifth connection structure for mounting the collimator lens;
the first connecting structure, the second connecting structure, the third connecting structure, the fourth connecting structure and the fifth connecting structure are sequentially arranged along the direction close to the rotating shafts of the first adjusting arm and the second adjusting arm.
6. The optical path adjusting apparatus according to claim 5, wherein at least one of the first connection structure, the second connection structure, the third connection structure, the fourth connection structure, and the fifth connection structure is detachably connected to the first adjustment arm and the second adjustment arm.
7. The optical path adjusting device according to claim 5 or 6, wherein at least one of the first connection structure, the second connection structure, the third connection structure, the fourth connection structure, and the fifth connection structure has the following structural arrangement:
the device comprises a sleeve and a positioning assembly, wherein the sleeve is provided with a through groove along a first direction, a lateral opening is formed in the through groove at the second direction side of the sleeve, the first adjusting arm or the second adjusting arm penetrates through the through groove along the first direction and is suitable for entering and exiting the through groove from the lateral opening, and the positioning assembly is arranged in the sleeve and used for locking the position of the sleeve on the first adjusting arm and the second adjusting arm;
wherein the first direction is perpendicular to the second direction.
8. The optical path adjustment device according to claim 7, wherein the positioning assembly comprises:
the positioning bolt is in threaded fit with the sleeve through a threaded hole formed in the sleeve, and the threaded hole is communicated with the penetrating groove and the outer side of the sleeve;
the cushion block is arranged in the through groove, is rotationally connected with the positioning bolt, and is in contact fit with the first adjusting arm or the second adjusting arm.
9. The optical path adjusting device according to claim 8, wherein the first adjusting arm or the second adjusting arm is provided with a fitting groove extending in a length direction of the first adjusting arm or the second adjusting arm, and at least part of the pad is located in the fitting groove.
10. An interference lithographic apparatus comprising an optical path adjustment device according to any one of claims 1 to 9.
CN202311510092.3A 2023-11-14 2023-11-14 Optical path adjusting device and interference lithography equipment Active CN117233899B (en)

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CN206331228U (en) * 2016-11-01 2017-07-14 兰州理工大学 A kind of micro-nano structure Written Device interfered based on rotary sample and double laser beams
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CN213302648U (en) * 2020-10-29 2021-05-28 中船重工安谱(湖北)仪器有限公司 Precise adjusting device with finely adjustable reflection oblique angle
CN116974148A (en) * 2023-05-26 2023-10-31 清华大学 Scanning interference lithography device

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JP2013145863A (en) * 2011-11-29 2013-07-25 Gigaphoton Inc Two-beam interference apparatus and two-beam interference exposure system

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Publication number Priority date Publication date Assignee Title
CN206331228U (en) * 2016-11-01 2017-07-14 兰州理工大学 A kind of micro-nano structure Written Device interfered based on rotary sample and double laser beams
CN206557526U (en) * 2016-11-23 2017-10-13 长春理工大学 A kind of laser interference lithography optical system
CN206464696U (en) * 2017-02-21 2017-09-05 长春理工大学 Multi-beam laser interference micro-nano technology device based on Darman raster and speculum
CN110297326A (en) * 2018-03-23 2019-10-01 宏达国际电子股份有限公司 Adjustment mechanism and head-mounted display apparatus
CN213302648U (en) * 2020-10-29 2021-05-28 中船重工安谱(湖北)仪器有限公司 Precise adjusting device with finely adjustable reflection oblique angle
CN116974148A (en) * 2023-05-26 2023-10-31 清华大学 Scanning interference lithography device

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