CN117220124B - High-energy high-repetition-frequency nanosecond laser system - Google Patents
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Abstract
The invention relates to a high-energy high-repetition-frequency nanosecond laser system, wherein the local oscillation stage of the system can realize 1KHz,5mJ and 10ns laser output by using an LD end surface continuous pumping acousto-optic Q switch Q-switching technology; the first-stage amplification stage of the system can amplify the seed laser energy of 5mJ to 10mJ by an LD end-pumped traveling wave amplification technology; furthermore, a shaping output unit is arranged in the system, and a plurality of lenses with different curvatures are arranged in the shaping output unit, so that the thermal lens effect can be counteracted, and finally 100mJ,500Hz-2kHz,10ns,1064nm nearly parallel light laser output is obtained.
Description
Technical Field
The invention relates to the technical field of all-solid-state lasers, in particular to a high-energy high-repetition-frequency nanosecond laser system.
Background
A high-frequency high-energy nanosecond laser is a nanosecond pulse laser capable of outputting high frequency and high energy, which operates with a pulse width of the order of nanoseconds, and has a high pulse energy.
In the scientific research field, the high-frequency high-energy nanosecond laser can be used as a pumping source of a dye laser, an OPO (optical fiber), a titanium precious stone laser and also can be used for particle image velocimetry; in the photovoltaic field, such lasers can be used for ablation of conductive and insulating layers of thin film solar cells and crystalline silicon solar cells; in the display field, the method can be used for laser stripping, texturing of a conductive layer and ordered transverse crystallization of a silicon wafer. Therefore, the laser with 500Hz-2kHz repetition frequency, 100mJ single pulse energy and 10ns pulse width index has clear market demands and economic benefits.
The all-fiber laser can realize the indexes, the oscillating stage and the amplifying stage are all realized by all-fibers, and the laser is finally output by the fibers.
An LD end-pumped slab laser (innoslave technology) may also be implemented, and a currently known solution is to use a fiber laser as a seed source, and the innoslave technology is used as an amplifying unit to output the above-mentioned index.
However, the two implementations have obvious defects, wherein the fiber laser adopts an all-fiber scheme, the final output is transmitted by the fiber, the output divergence angle is large, the application is limited, and the problem of subsequent second harmonic waves cannot be solved; the InnoSlab technology can realize similar indexes, but has higher technical difficulty, no similar products exist in China at present, components are required to depend on import, and domestic devices cannot meet the use requirements.
Disclosure of Invention
The invention discloses a high-energy high-repetition-frequency nanosecond laser system, and aims to solve the technical problems in the prior art. The invention adopts the following technical scheme:
the embodiment of the invention provides a high-energy high-repetition-frequency nanosecond laser system, which comprises a continuous laser seed light source, a primary amplifying stage, an isolator, a beam expander group and a shaping output unit which are sequentially arranged along a light path;
the continuous laser seed light source is used for outputting local oscillation light of continuous LD end-face pumping and acousto-optic Q-switching;
the first-stage amplifying stage is used for carrying out first-stage LD end-face pumping amplification on the local oscillation light;
the isolator is used for blocking the return light;
the beam expander group is used for matching the laser light spots to the target size;
the shaping output unit comprises a thermal compensation lens, a collimating lens, a Nd: YAG crystal and at least one pair of LD side pumping modules, and can amplify and shape laser through traveling wave amplification or total reflection and output the laser into a beam of nearly parallel light.
The continuous laser seed light source comprises a first LD pumping source, a first collimating lens group, a first folding cavity lens, a first Nd YAG crystal, a second folding cavity lens, an acousto-optic Q-switching module, a rear cavity lens, a first TFP and an output lens which are sequentially arranged along a light path; the acousto-optic Q-switching module is used for generating 10ns pulse width laser after Q switching, and the output mirror is used for outputting local oscillation light.
As the preferable technical scheme, the first-stage amplifying stage comprises a first plano-convex lens, a first 45-degree total reflection mirror, a first 45-degree reflection mirror, a second LD pumping source, a second collimating lens group and a second Nd: YAG crystal.
As an optimized technical scheme, a second TFP is arranged between the continuous laser seed light source and the primary amplifying stage; a second 45-degree reflecting mirror is arranged between the first-stage amplifying stage and the isolator; a second 45-degree total reflection mirror is arranged between the isolator and the beam expanding lens group.
As a preferable technical scheme, the isolator comprises a third TFP, a first 1/2 wave plate, a Faraday rotator and a fourth TFP which are sequentially arranged along the optical path.
As the preferable technical scheme, the beam expander group comprises a 2-time beam expander ocular and a 2-time beam expander objective, and the two are used for matching the laser spots to be 5mm.
As a preferable technical scheme, the shaping output unit comprises a first polaroid, a second 1/2 wave plate, a first collimating lens, a first soft side diaphragm, a first LD side pumping module, a first thermal compensating lens, a first 90-degree rotor, a second soft side diaphragm, a second LD side pumping module, a second collimating lens, a third 45-degree total reflection mirror, a fourth 45-degree total reflection mirror, a second polaroid, a third soft side diaphragm, a third LD side pumping module, a second thermal compensating lens, a second 90-degree rotor, a fourth soft side diaphragm, a fourth LD side pumping module, a third collimating lens, a first 1.35-fold beam reducing eyepiece, a second 1.35-fold beam reducing eyepiece, a fifth 45-degree total reflection mirror and a sixth 45-degree total reflection mirror which are sequentially arranged along an optical path.
As an optimal technical scheme, the first soft edge diaphragm, the second soft edge diaphragm, the third soft edge diaphragm and the fourth soft edge diaphragm are used for limiting the aperture of the light spot and preventing sputtering;
the first collimating lens, the second collimating lens, the third collimating lens, the first thermal compensation lens and the second thermal compensation lens are all used for matching the thermal lens effect;
the first LD side pumping module, the second LD side pumping module, the third LD side pumping module and the fourth LD side pumping module are all configured as CW continuous Bar strips;
the first 1.35-fold beam eye piece and the second 1.35-fold beam eye piece are used for collimating output light spots;
the third 45-degree total reflection mirror, the fourth 45-degree total reflection mirror, the fifth 45-degree total reflection mirror and the sixth 45-degree total reflection mirror are all used for refracting the light path, so that the direction of output laser is in the same direction as the direction of local oscillation light.
As a preferable technical scheme, the shaping output unit comprises a first polaroid, a first collimating lens, a first soft edge diaphragm, a first LD side pumping module, a first thermal compensation lens, a 90-degree rotor, a second soft edge diaphragm, a second LD side pumping module, a third soft edge diaphragm, a 1/4 wave plate, a 0-degree total reflection mirror, a third polaroid, a fifth 45-degree total reflection mirror and a sixth 45-degree total reflection mirror which are sequentially arranged along an optical path, wherein the sixth 45-degree total reflection mirror is used for outputting nearly parallel light laser.
As an optimal technical scheme, the first soft edge diaphragm, the second soft edge diaphragm and the third soft edge diaphragm are used for limiting the aperture of the light spot and preventing sputtering;
the first collimating lens and the first thermal compensation lens are used for matching the thermal lens effect;
the second LD side pumping module can obtain 33mJ energy after amplifying the laser in a single pass;
the 0-degree total reflection mirror is used for reflecting the single-pass light back to the second LD side pumping module to carry out second-pass amplification;
the first LD side pumping module can obtain 100mJ energy after performing second-pass amplification on laser;
the third polaroid, the fifth 45-degree total reflection mirror and the sixth 45-degree total reflection mirror are all used for refracting the light path, so that the direction of output laser is in the same direction as the direction of local oscillation light.
One embodiment of the above invention has the following advantages or benefits:
the invention mainly provides a high-energy high-repetition-frequency nanosecond laser system, wherein the local oscillator stage of the system can realize 1KHz,5mJ and 10ns laser output by using an LD end surface continuous pumping acousto-optic Q switch Q-switching technology; the first-stage amplification stage of the system can amplify the seed laser energy of 5mJ to 10mJ by an LD end-pumped traveling wave amplification technology; furthermore, a shaping output unit is arranged in the system, and a plurality of lenses with different curvatures are arranged in the shaping output unit, so that the thermal lens effect can be counteracted, and finally 100mJ,500Hz-2kHz,10ns,1064nm nearly parallel light laser output is obtained.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the description of the embodiments are briefly described below to form a part of the present invention, and the exemplary embodiments of the present invention and the description thereof illustrate the present invention and do not constitute undue limitations of the present invention. In the drawings:
fig. 1 is a block diagram of a high-energy high-repetition-rate nanosecond laser system in a preferred embodiment disclosed in example 1 of the present invention;
fig. 2 is a block diagram of a high-energy high-repetition-rate nanosecond laser system in a preferred embodiment disclosed in example 2 of the present invention.
Reference numerals illustrate:
first LD pumping source 1, first collimating lens group 2, first folding chamber mirror 3, first Nd: YAG crystal 4, second folding cavity mirror 5, acousto-optic Q-switching module 6, back cavity mirror 7, first TFP8, output mirror 9, second TFP10, first plano-convex lens 11, first 45 DEG total reflection mirror 12, first 45 DEG reflection mirror 13, second LD pumping source 14, second collimating lens group 15, second Nd: YAG crystal 16, second 45 ° mirror 17, third TFP18, first 1/2 wave plate 19, faraday rotator 20, fourth TFP21, second 45 ° total reflection mirror 22,2 x beam expander objective lens 23,2 x beam expander objective lens 24, first polarizer 25, second 1/2 wave plate 26, first collimating lens 27, first soft side stop 28, first LD side pump module 29, first thermal compensation lens 30, first 90 ° rotor 31, second soft side stop 32, second LD side pump module 33, second collimating lens 34, third 45 ° total reflection mirror 35, fourth 45 ° total reflection mirror 36, second polarizer 37, third soft side aperture 38, third LD side pump module 39, second thermal compensation lens 40, second 90 ° rotor 41, fourth soft side stop 42, fourth LD side pump module 43, third collimating lens 44, first 1.35 x beam expander eyepiece 45, second 1.35 x beam expander eyepiece 46, fifth 45 ° total reflection mirror 47, sixth 45 ° total reflection mirror 45, fourth 45 ° total reflection mirror 50, third 45 ° total reflection mirror 50.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to specific embodiments of the present invention and corresponding drawings. In the description of the present invention, it should be noted that the term "or" is generally employed in its sense including "and/or" unless the content clearly dictates otherwise.
In the description of the present invention, the terms "first," "second," and the like are used merely to distinguish between descriptions and are not to be construed as indicating or implying relative importance.
It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
Referring to fig. 1, the embodiment discloses a high-energy high-repetition-frequency nanosecond laser system, which comprises a continuous laser seed light source, a first-stage amplifying stage, an isolator, a beam expanding lens group and a shaping output unit which are sequentially arranged along a light path, and by the system, the problem of large divergence angle of an optical fiber laser can be solved, the problem of beam caliber matching caused by a thermal lens effect is avoided, and near-parallel light output can be finally realized.
In a preferred embodiment, the continuous laser seed light source is used for outputting local oscillation light of continuous LD end-face pumping and acousto-optic Q-switching; preferably, the continuous laser seed light source comprises a first LD pumping source 1, a first collimating lens group 2, a first folding cavity lens 3, a first Nd-YAG crystal 4, a second folding cavity lens 5, an acousto-optic Q-switching module 6, a rear cavity lens 7, a first TFP8 and an output lens 9 which are sequentially arranged along the light path.
Preferably, the first collimating lens 27 group comprises three sequentially arranged plano-convex lenses, which are fiber collimating and focusing combinations; the first folding cavity mirror 3 and the second folding cavity mirror 5 are both plano-convex lenses for changing the direction of the light path; the rear cavity mirror 7 is a total reflection mirror; the first TFP8 is a polarizer for selecting a polarization state; the output mirror 9 is used for outputting local oscillation light.
Preferably, the first Nd: YAG crystal 4 is pumped through the end face of the continuous light LD, Q is adjusted through an acousto-optic Q switch, 5mJ,500Hz-2kHz,5-10ns local oscillation light is obtained, and finally the local oscillation light is output through an output mirror 9.
Preferably, a second TFP10 is also provided between the continuous laser seed light source and the primary amplifying stage, the second TFP10 being an analyzer device.
In a preferred embodiment, the first-stage amplification stage is used for carrying out first-stage LD end-pumped amplification on the local oscillation light; preferably, the first-stage amplifying stage comprises a first plano-convex lens 11, a first 45-degree total reflection mirror 12, a first 45-degree reflection mirror 13, a second LD pump source 14, a second collimating lens group 15, and a second Nd: YAG crystal 16.
Preferably, the first plano-convex lens 11 is used to compress the light spot to match the amplification stage pump light; the first 45-degree total reflection mirror 12 and the first 45-degree reflection mirror 13 are both used for optical path transmission and are coupled with an amplifying stage, and the second collimating lens group 15 comprises three plano-convex lenses which are sequentially arranged and are optical fiber collimating and focusing combinations; the second Nd-YAG crystal 16 is the working substance of the amplifier stage.
Preferably, the first-order amplification stage is capable of amplifying 5mJ seed laser energy to 10mJ by LD end-pumped traveling wave amplification techniques.
Preferably, between the primary amplifier stage and the isolator, a second 45 ° mirror 17 is also provided for refracting the light path.
In a preferred embodiment, an isolator is used to block the return light; preferably, the isolator comprises a third TFP18, a first 1/2 wave plate 19, a Faraday rotator 20, and a fourth TFP21, arranged in that order along the optical path.
Preferably, a second 45-degree total reflection mirror 22 for turning the light path is arranged between the isolator and the beam expander group.
In a preferred embodiment, a beam expander group is used to match the laser spot to the target size, and the beam expander group includes a 2-fold beam expander eyepiece 23 and a 2-fold beam expander objective 24, both of which are used to match the laser spot to 5mm.
In a preferred embodiment, the shaping output unit is capable of amplifying and shaping the laser light by traveling wave amplification or total reflection, and outputting the laser light as a beam of nearly parallel light.
In a preferred embodiment, the shaping output unit includes a first polarizer 25, a second 1/2 wave plate 26, a first collimating lens 27, a first soft side stop 28, a first LD side pumping module 29, a first thermal compensating lens 30, a first 90 ° rotator 31, a second soft side stop 32, a second LD side pumping module 33, a second Nd YAG crystal 16, a second collimating lens 34, a third 45 ° total reflection mirror 35, a fourth 45 ° total reflection mirror 36, a second polarizer 37, a third soft side stop 38, a third LD side pumping module 39, a second thermal compensating lens 40, a second 90 ° rotator 41, a fourth soft side stop 42, a fourth LD side pumping module 43, a third collimating lens 44, a first 1.35 x-ray eyepiece 45, a second 1.35 x-ray eyepiece 46, a fifth 45 ° total reflection mirror 47, and a sixth 45 ° total reflection mirror 48, which are sequentially arranged along the optical path, and finally, the sixth 45 ° total reflection mirror 48 is used for outputting the near parallel light.
Preferably, the first polarizing plate 25 and the second polarizing plate 37 are used for polarization detection; the second 1/2 wave plate 26 is used to change the polarization state; the first collimating lens 27, the second collimating lens 34, the third collimating lens 44, the first thermal compensation lens 30, and the second thermal compensation lens 40 are all used to match the thermal lens effect; the first soft-edge diaphragm 28, the second soft-edge diaphragm 32, the third soft-edge diaphragm 38 and the fourth soft-edge diaphragm 42 are used for limiting the aperture of the light spot and preventing sputtering; the first 90 ° rotor 31 and the second 90 ° rotor 41 are used to change the polarization state; the first 1.35 x beam eyepiece 45 and the second 1.35 x beam eyepiece 46 are used to collimate the output spot; the third 45 ° total reflection mirror 35, the fourth 45 ° total reflection mirror 36, the fifth 45 ° total reflection mirror 47 and the sixth 45 ° total reflection mirror 48 are all used for refracting the optical path so that the direction of the output laser light and the direction of the local oscillation light are in the same direction
Preferably, the first LD side pumping module 29, the second LD side pumping module 33, the third LD side pumping module 39 and the fourth LD side pumping module 43 are all configured as CW continuous Bar, and work with a certain duty cycle QCW (pulse), so that the service life of the Bar can be effectively improved. The service life of the traditional QCW Bar is 10-50 hundred million times, the QCW Bar can be used for about 58 days continuously according to 50 hundred million times and 1kHz, and the service life of the CW Bar is about 1 ten thousand hours and can be operated for about 417 days.
In the shaping output unit, the light beam firstly enters a pair of Nd/YAG crystals with the diameter of 5mm, is pumped by the side face of the LD, outputs 33mJ energy, then enters a pair of 7mm Nd/YAG crystals after shaping, and then outputs 100mJ,500Hz-2kHz and 10ns laser.
The thermal lens effect of the Nd-YAG crystal is obvious under the high-frequency pumping of a plurality of LD side pumping modules, and the thermal lens effect of the Nd-YAG crystal is counteracted by matching lenses with different curvatures, so that a beam of nearly parallel light output is obtained.
It should be noted that, the invention point of the present embodiment is to redesign and layout of the optical path structure in the laser system, but not to improve a certain component, any component described in the present embodiment may be purchased directly, and the structure is not repeated in the present embodiment.
In the embodiment, 100mJ,500Hz-2kHz,10ns and 1064nm nearly parallel light laser output is realized by re-arranging the light path structure, so that the method can be applied to the field of high-frequency laser shock peening and is hopeful to replace the traditional shot peening strengthening technology. There is also a clear need in the fields of flow field measurement, tunable pump sources, titanium sapphire pumping, etc.
Example 2
Referring to fig. 2, the present embodiment discloses a high-energy high-repetition-frequency nanosecond laser system by which nearly parallel light output can be achieved.
Preferably, the device comprises a continuous laser seed light source, a primary amplifying stage, an isolator, a beam expander group and a shaping output unit which are sequentially arranged along a light path; the continuous laser seed light source is used for outputting local oscillation light of continuous LD end-face pumping and acousto-optic Q-switching; the first-stage amplification stage is used for carrying out first-stage LD end-face pumping amplification on local oscillation light, and can amplify the laser energy of the seed of 5mJ to 10mJ; a second TFP10 is also arranged between the continuous laser seed light source and the first-stage amplifying stage, and the second TFP10 is an analyzer; the isolator is used for blocking the return light; a second 45-degree reflecting mirror 17 for refracting the light path is arranged between the first-stage amplifying stage and the isolator; a second 45-degree total reflection mirror 22 for turning the light path is arranged between the isolator and the beam expanding lens group; the beam expander group is used for matching the laser light spots to the target size; the shaping output unit can amplify and shape the laser through traveling wave amplification or total reflection and output the laser into a beam of nearly parallel light. In this embodiment, the arrangement of other components except for the shaping output unit is the same as that of embodiment 1 described above, and will not be described here again.
In a preferred embodiment, the shaping output unit includes a first polarizer 25, a first collimating lens 27, a first soft side stop 28, a first LD side pumping module 29, a first thermal compensating lens 30, a 90 ° rotator, a second soft side stop 32, a second LD side pumping module 33, a third soft side stop 38, a 1/4 wave plate 49, a 0 ° total reflection mirror 50, a third polarizer 51, a fifth 45 ° total reflection mirror 47, and a sixth 45 ° total reflection mirror 48, which are sequentially disposed along the optical path, and finally, the sixth 45 ° total reflection mirror 48 is used to output the nearly parallel optical laser light.
Preferably, the first polarizer 25 is used for polarization analysis; the first soft-edge diaphragm 28, the second soft-edge diaphragm 32 and the third soft-edge diaphragm 38 are used for limiting the aperture of the light spot and preventing sputtering; the first collimating lens 27 and the first thermal compensating lens 30 are used to match the thermal lens effect; the fifth 45 ° total reflection mirror 47 and the sixth 45 ° total reflection mirror 48 are both used for refracting the optical path, so that the direction of the output laser is the same as the direction of the local oscillation light; the 1/4 wave plate 49 is used to rotate the polarization state.
Preferably, after the light beam enters the shaping output unit, the second LD side pumping module 33 can obtain 33mJ energy after amplifying the light beam in a single pass, the 0 ° total reflection mirror 50 is used for reflecting the single pass light back to the second LD side pumping module 33 for performing second pass amplification, and the first LD side pumping module 29 can obtain 100mJ energy after amplifying the laser in the second pass.
Specifically, the first LD side pumping module 29 and the second LD side pumping module 33 in this embodiment are the same as those in the above embodiments, and are not described here again.
The thermal lens effect of the Nd-YAG crystal is obvious under the high-frequency pumping of a plurality of LD side pumping modules, and the thermal lens effect of the Nd-YAG crystal is counteracted by matching lenses with different curvatures, so that a beam of nearly parallel light output is obtained.
It should be noted that, the invention point of the present embodiment is to redesign and layout of the optical path structure in the laser system, but not to improve a certain component, any component described in the present embodiment may be purchased directly, and the structure is not repeated in the present embodiment.
It will be understood by those skilled in the art that all of the features disclosed in this specification (including any accompanying claims, abstract and drawings), and all of the processes or units of any method or apparatus so disclosed, may be combined in any combination, except combinations where the features are mutually exclusive. Each feature disclosed in this specification (including any accompanying claims, abstract and drawings), may be replaced by alternative features serving the same, equivalent or similar purpose, unless expressly stated otherwise.
Claims (10)
1. The high-energy high-repetition-frequency nanosecond laser system is characterized by comprising a continuous laser seed light source, a primary amplifying stage, an isolator, a beam expander group and a shaping output unit which are sequentially arranged along a light path;
the continuous laser seed light source is used for outputting local oscillator light of continuous LD end-face pumping and acousto-optic Q-switching, and comprises a first LD pumping source, a first collimating lens group, a first folding cavity lens, a first Nd, a YAG crystal, a second folding cavity lens, an acousto-optic Q-switching module, a rear cavity lens, a first TFP and an output lens, wherein the first LD pumping source, the first collimating lens group, the first folding cavity lens and the first Nd are sequentially arranged along a light path, the acousto-optic Q-switching module is used for generating 10ns pulse width laser after Q-switching, and the output lens is used for outputting the local oscillator light;
the first-stage amplification stage is used for carrying out first-stage LD end-face pumping amplification on the local oscillation light and comprises a first plano-convex lens, a first 45-degree total reflection mirror, a first 45-degree reflection mirror, a second LD pumping source, a second collimating lens group and a second Nd YAG crystal;
the isolator is used for blocking return light;
the beam expander group is used for matching the laser spots to the target size;
the shaping output unit comprises a first polaroid, a second 1/2 wave plate, a first collimating lens, a first soft edge diaphragm, a first LD side pumping module, a first thermal compensation lens, a first 90-degree rotor, a second soft edge diaphragm, a second LD side pumping module, a second collimating lens, a third 45-degree total reflection mirror, a fourth 45-degree total reflection mirror, a second polaroid, a third soft edge diaphragm, a third LD side pumping module, a second thermal compensation lens, a second 90-degree rotor, a fourth soft edge diaphragm, a fourth LD side pumping module, a third collimating lens, a first 1.35-fold beam shrinking eyepiece, a second 1.35-fold beam shrinking eyepiece, a fifth 45-degree total reflection mirror and a sixth 45-degree total reflection mirror which are sequentially arranged along an optical path, wherein the sixth 45-degree total reflection mirror is used for outputting nearly parallel light laser;
the shaping output unit can amplify and shape laser through traveling wave amplification and output the laser as a beam of nearly parallel light, and the output parameters are as follows: the single pulse energy is 100mJ, the repetition frequency is 500Hz-2kHz, the pulse width is 10ns, and the wavelength is 1064nm.
2. The high energy high repetition rate nanosecond laser system of claim 1, further comprising a second TFP between the continuous laser seed light source and the primary amplification stage; a second 45-degree reflecting mirror is arranged between the primary amplifying stage and the isolator; and a second 45-degree total reflection mirror is arranged between the isolator and the beam expanding lens group.
3. The high energy high repetition rate nanosecond laser system of claim 1, wherein the isolator comprises a third TFP, a first 1/2 wave plate, a faraday rotator, and a fourth TFP sequentially disposed along the optical path.
4. The high energy high repetition rate nanosecond laser system of claim 1, wherein the beam expander group comprises a 2-fold beam expander eyepiece and a 2-fold beam expander objective lens for matching the laser spot to 5mm.
5. The high-energy high-repetition-rate nanosecond laser system of claim 1,
the first soft edge diaphragm, the second soft edge diaphragm, the third soft edge diaphragm and the fourth soft edge diaphragm are used for limiting the aperture of the light spot and preventing sputtering;
the first collimating lens, the second collimating lens, the third collimating lens, the first thermal compensation lens and the second thermal compensation lens are all used for matching thermal lens effects;
the first LD side pumping module, the second LD side pumping module, the third LD side pumping module, and the fourth LD side pumping module are all configured as CW continuous Bar;
the first 1.35-fold beam shrinking ocular and the second 1.35-fold beam shrinking ocular are used for collimating output light spots;
the third 45-degree total reflection mirror, the fourth 45-degree total reflection mirror, the fifth 45-degree total reflection mirror and the sixth 45-degree total reflection mirror are all used for refracting the light path, so that the direction of output laser is in the same direction as the direction of the local oscillation light.
6. The high-energy high-repetition-frequency nanosecond laser system is characterized by comprising a continuous laser seed light source, a primary amplifying stage, an isolator, a beam expander group and a shaping output unit which are sequentially arranged along a light path;
the continuous laser seed light source is used for outputting local oscillator light of continuous LD end-face pumping and acousto-optic Q-switching, and comprises a first LD pumping source, a first collimating lens group, a first folding cavity lens, a first Nd, a YAG crystal, a second folding cavity lens, an acousto-optic Q-switching module, a rear cavity lens, a first TFP and an output lens, wherein the first LD pumping source, the first collimating lens group, the first folding cavity lens and the first Nd are sequentially arranged along a light path, the acousto-optic Q-switching module is used for generating 10ns pulse width laser after Q-switching, and the output lens is used for outputting the local oscillator light;
the first-stage amplification stage is used for carrying out first-stage LD end-face pumping amplification on the local oscillation light and comprises a first plano-convex lens, a first 45-degree total reflection mirror, a first 45-degree reflection mirror, a second LD pumping source, a second collimating lens group and a second Nd YAG crystal;
the isolator is used for blocking return light;
the beam expander group is used for matching the laser spots to the target size;
the shaping output unit comprises a first polaroid, a first collimating lens, a first soft edge diaphragm, a first LD side pumping module, a first thermal compensation lens, a 90-degree rotor, a second soft edge diaphragm, a second LD side pumping module, a third soft edge diaphragm, a 1/4 wave plate, a 0-degree total reflection mirror, a third polaroid, a fifth 45-degree total reflection mirror and a sixth 45-degree total reflection mirror which are sequentially arranged along an optical path, wherein the sixth 45-degree total reflection mirror is used for outputting nearly parallel light laser;
the shaping output unit can amplify and shape laser through total reflection and output the laser as a beam of nearly parallel light, and the output parameters are as follows: the single pulse energy is 100mJ, the repetition frequency is 500Hz-2kHz, the pulse width is 10ns, and the wavelength is 1064nm.
7. The high energy high repetition rate nanosecond laser system of claim 6, further comprising a second TFP between the continuous laser seed light source and the primary amplification stage; a second 45-degree reflecting mirror is arranged between the primary amplifying stage and the isolator; and a second 45-degree total reflection mirror is arranged between the isolator and the beam expanding lens group.
8. The high energy high repetition rate nanosecond laser system of claim 6, wherein the isolator comprises a third TFP, a first 1/2 wave plate, a faraday rotator, and a fourth TFP sequentially disposed along the optical path.
9. The high energy high repetition rate nanosecond laser system of claim 6, wherein the beam expander group comprises a 2-fold beam expander eyepiece and a 2-fold beam expander objective lens for matching the laser spot to 5mm.
10. The high-energy high-repetition-rate nanosecond laser system of claim 6, wherein,
the first soft edge diaphragm, the second soft edge diaphragm and the third soft edge diaphragm are used for limiting the aperture of the light spot and preventing sputtering;
the first collimating lens and the first thermal compensation lens are used for matching thermal lens effects;
the second LD side pumping module can obtain 33mJ energy after amplifying the laser in a single pass;
the 0-degree total reflection mirror is used for reflecting the single-pass light back to the second LD side pumping module to carry out second-pass amplification;
the first LD side pumping module can obtain 100mJ energy after amplifying the laser in the second path;
the third polaroid, the fifth 45-degree total reflection mirror and the sixth 45-degree total reflection mirror are all used for refracting the light path, so that the direction of output laser is in the same direction as the direction of the local oscillation light.
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