CN117099481A - 有机el显示装置 - Google Patents

有机el显示装置 Download PDF

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Publication number
CN117099481A
CN117099481A CN202280026148.5A CN202280026148A CN117099481A CN 117099481 A CN117099481 A CN 117099481A CN 202280026148 A CN202280026148 A CN 202280026148A CN 117099481 A CN117099481 A CN 117099481A
Authority
CN
China
Prior art keywords
colorant
pigment
pixel
group
green
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280026148.5A
Other languages
English (en)
Chinese (zh)
Inventor
小暮健人
日岐宪司
西田和史
常川新司
山内淳
永留大贵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongyang Yihuan Co ltd
Toppan Inc
Artience Co Ltd
Original Assignee
Dongyang Yihuan Co ltd
Toppan Printing Co Ltd
Toyo Ink SC Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongyang Yihuan Co ltd, Toppan Printing Co Ltd, Toyo Ink SC Holdings Co Ltd filed Critical Dongyang Yihuan Co ltd
Publication of CN117099481A publication Critical patent/CN117099481A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
CN202280026148.5A 2021-04-22 2022-03-30 有机el显示装置 Pending CN117099481A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021-072704 2021-04-22
JP2021072704 2021-04-22
PCT/JP2022/016191 WO2022224779A1 (ja) 2021-04-22 2022-03-30 有機ｅｌ表示装置

Publications (1)

Publication Number Publication Date
CN117099481A true CN117099481A (zh) 2023-11-21

Family

ID=81259243

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280026148.5A Pending CN117099481A (zh) 2021-04-22 2022-03-30 有机el显示装置

Country Status (6)

Country Link
US (1) US20240085784A1 (https=)
JP (2) JP7050207B1 (https=)
KR (1) KR102898797B1 (https=)
CN (1) CN117099481A (https=)
TW (1) TWI912507B (https=)
WO (1) WO2022224779A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024029204A1 (ja) * 2022-08-03 2024-02-08 住友化学株式会社 着色硬化性樹脂組成物、カラーフィルタ、表示装置、及び固体撮像素子
CN120936914A (zh) * 2023-03-31 2025-11-11 爱天思株式会社 有机el显示装置用感光性着色组合物、微型led显示装置用感光性着色组合物、硬化膜、有机el显示装置及微型led显示装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11337715A (ja) * 1998-05-21 1999-12-10 Matsushita Electron Corp カラーフィルタおよびこれを用いた固体撮像装置
JP2003255531A (ja) 2002-03-05 2003-09-10 Fujifilm Arch Co Ltd 光硬化性組成物、光硬化膜の製造方法、カラーフィルター及びカラーフィルターの製造方法
JP4985078B2 (ja) 2007-04-24 2012-07-25 凸版印刷株式会社 カラーフィルタ基板およびこれを用いた車載用液晶表示装置
JP2009192664A (ja) 2008-02-13 2009-08-27 Toppan Printing Co Ltd カラーフィルタおよびこれを用いた液晶表示装置
JP2009265641A (ja) 2008-03-31 2009-11-12 Sumitomo Chemical Co Ltd カラーフィルター
JP5412867B2 (ja) 2009-02-19 2014-02-12 凸版印刷株式会社 赤色カラーフィルタ
US8192906B2 (en) 2009-03-13 2012-06-05 Lexmark International, Inc. Black toner formulation
JP2010186560A (ja) * 2010-06-04 2010-08-26 Sharp Corp 光記録媒体
US20130095322A1 (en) 2010-06-16 2013-04-18 M. Technique Co., Ltd. Novel yellow pigment composition, and method for producing yellow pigment microparticles
JP5765059B2 (ja) 2010-08-16 2015-08-19 Jsr株式会社 着色組成物、着色組成物の製造方法、着色パターン、カラーフィルタ、カラー表示素子及びカラーフィルタの製造方法
JP5818728B2 (ja) 2012-03-23 2015-11-18 東洋インキＳｃホールディングス株式会社 固体撮像素子用着色組成物及びカラーフィルタ
JP6762739B2 (ja) 2016-03-17 2020-09-30 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置
CN110268021B (zh) 2017-02-17 2021-07-13 东丽株式会社 着色组合物、使用了该着色组合物的滤色器基板及显示装置
WO2020241328A1 (ja) * 2019-05-29 2020-12-03 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置
JP7315419B2 (ja) 2019-09-11 2023-07-26 東洋インキＳｃホールディングス株式会社 有機ｅｌ表示装置
CN120936914A (zh) 2023-03-31 2025-11-11 爱天思株式会社 有机el显示装置用感光性着色组合物、微型led显示装置用感光性着色组合物、硬化膜、有机el显示装置及微型led显示装置

Also Published As

Publication number Publication date
TWI912507B (zh) 2026-01-21
JPWO2022224779A1 (https=) 2022-10-27
JP2022167753A (ja) 2022-11-04
KR20230173673A (ko) 2023-12-27
WO2022224779A1 (ja) 2022-10-27
TW202242034A (zh) 2022-11-01
KR102898797B1 (ko) 2025-12-11
JP7826296B2 (ja) 2026-03-09
US20240085784A1 (en) 2024-03-14
JP7050207B1 (ja) 2022-04-07

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CB02 Change of applicant information

Country or region after: Japan

Address after: Japan Tokyo central Beijing two chome 2 No. 1

Applicant after: Aitiansi Co.,Ltd.

Applicant after: Dongyang Yihuan Co.,Ltd.

Applicant after: TOPPAN PRINTING Co.,Ltd.

Address before: Japan Tokyo central Beijing two chome 2 No. 1

Applicant before: TOYO INK SC HOLDINGS Co.,Ltd.

Country or region before: Japan

Applicant before: Dongyang Yihuan Co.,Ltd.

Applicant before: TOPPAN PRINTING Co.,Ltd.

CB02 Change of applicant information