CN117023970A - Variable-section deposition cavity for OVD (over-the-counter dielectric) process - Google Patents
Variable-section deposition cavity for OVD (over-the-counter dielectric) process Download PDFInfo
- Publication number
- CN117023970A CN117023970A CN202310879632.9A CN202310879632A CN117023970A CN 117023970 A CN117023970 A CN 117023970A CN 202310879632 A CN202310879632 A CN 202310879632A CN 117023970 A CN117023970 A CN 117023970A
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- Prior art keywords
- deposition
- cavity
- chamber
- section
- deposition chamber
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- 230000008021 deposition Effects 0.000 title claims abstract description 99
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000005192 partition Methods 0.000 claims abstract description 29
- 239000000843 powder Substances 0.000 claims abstract description 24
- 229910003460 diamond Inorganic materials 0.000 claims 3
- 239000010432 diamond Substances 0.000 claims 3
- 238000005137 deposition process Methods 0.000 abstract description 8
- 230000000630 rising effect Effects 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 70
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000001105 regulatory effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 208000005156 Dehydration Diseases 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000001089 thermophoresis Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
The invention relates to a variable cross section deposition cavity for an OVD process, which comprises a deposition cavity, wherein one end of the deposition cavity is communicated with an air inlet cavity, a row of blast lamps which are vertically arranged at intervals are vertically arranged at the side of the air inlet cavity, an upper rotary chuck and a lower rotary chuck are arranged in the deposition cavity, the upper rotary chuck and the lower rotary chuck or the blast lamps are connected with an up-down moving device, and the other end of the deposition cavity is connected with an air suction cavity. According to the invention, when the powder rod diameter is increased, the movable partition board slowly and continuously moves towards the two sides of the front side wall and the rear side wall under the drive of the translation telescopic propelling device, so that the distance between the periphery of the powder rod and the front side wall and the rear side wall of the deposition cavity is kept relatively constant, the air flow can still keep an initial laminar state under the condition of flow change caused by heat rising, and the generation of turbulent flow is reduced, thereby keeping the stability of the air flow field in the deposition process.
Description
Technical Field
The invention relates to a variable cross-section deposition cavity for an OVD (optical variable density) process, belonging to the technical field of optical fiber perform and optical quartz glass manufacturing equipment.
Background
Direct synthesis and indirect synthesis based on the principle of flame hydrolysis deposition (Flame Hydrolysis Deposition) are the mainstream technology for large-scale preparation of high-purity quartz glass in the current industrial production, while the outside-tube vapor deposition method (Outside Vapor Deposition, OVD) in the indirect synthesis is mainly applied to preparation of cylindrical quartz glass, optical fiber preforms and the like. During deposition of the OVD process, the silicon-containing feedstock, typically silicon tetrachloride (SiCl 4 ) Or organosilicon (octamethyl cyclotetrasiloxane, C) 8 H 24 O 4 Si 4 D4), hydrolysis in oxyhydrogen flame to produce silicon dioxide (SiO) 2 ) And doped SiO 2 Particles, siO 2 The particles are deposited layer by layer on the rotating core rod by thermophoresis to form a porous soot preform. Then, the quartz preform is obtained by dehydration treatment to remove water and metal impurities and sintering and vitrification at a temperature ranging from 1100 ℃ to 1500 ℃.
The deposition cavity is the most important part of deposition equipment in the OVD process, deposition reaction is carried out in the deposition cavity, the deposition cavity provides air inlet, air suction and high-temperature combustion fields for the deposition process, and can provide a proper flow field for torch deposition in a complex fluid environment, so that the deposition reaction is ensured to be carried out continuously, and qualified powder bars are obtained. Therefore, the performance of the deposition cavity directly influences the shape, density and collection rate of the powder rod, and is a key for determining whether the OVD deposition equipment is advanced. The transverse section of the existing deposition cavity is a fixed rectangle, the longitudinal section is a uniform section, namely the areas through which the air flows are equal from the air inlet cavity to the air suction cavity, and the flow rate of the air flow entering the cavity is consistent. Along with the continuous progress of deposition combustion, the temperature in the cavity is increased, the outer diameter of the prefabricated member powder rod is increased continuously, the diameter range can be increased from phi 40mm to phi 800mm, the increase of the outer diameter of the powder rod can reduce the gas flow cross section, so that the gas flow is reduced, dust cannot be timely pumped away, turbulence is caused, meanwhile, the temperature of a deposition area and the prefabricated member powder rod is uneven up and down due to upward movement of air convection heat, turbulence is also generated in a negative-pressure deposition cavity, the temperature of the deposition area and the change and fluctuation of air flow directly influence the temperature gradient distribution and the stability of a gas flow field in the deposition process, the deposition rate of the powder rod is reduced, the powder rod is unevenly deposited up and down, and the deposition quality is reduced. This phenomenon is more serious especially when depositing large diameter powder rods. In order to solve the problems, a deposition cavity with a larger cross section width is mostly adopted, and the problems can be alleviated, but the problems of overlarge initial air draft, large difference of front and rear gas flow areas and poor temperature gradient distribution and gas flow field stability in the deposition process still exist.
Disclosure of Invention
The invention aims to solve the technical problem of providing a variable-section deposition cavity for an OVD process aiming at the defects in the prior art, which can keep the stability of an air flow field in the deposition process, save energy, reduce emission and improve the deposition quality and efficiency.
The invention adopts the technical proposal for solving the problems that: the device comprises a deposition cavity, one end of the deposition cavity is communicated with an air inlet cavity, a row of blast lamps which are vertically arranged at intervals are vertically arranged at the side of the air inlet cavity, an upper rotary chuck and a lower rotary chuck are arranged in the deposition cavity, the upper rotary chuck and the lower rotary chuck or the blast lamps are connected with an up-down moving device, the other end of the deposition cavity is connected with an air suction cavity, and the device is characterized in that movable partition plates are symmetrically arranged on the inner sides of the front side wall and the rear side wall of the deposition cavity respectively, and the rear side of the movable partition plates are connected with a telescopic propelling device to form the deposition cavity with an adjustable transverse section.
According to the scheme, the width of the movable partition plate is the same as or basically the same as the width of the front side wall and the rear side wall, and the height of the movable partition plate is larger than or equal to the effective length of the deposited powder rod.
According to the scheme, the transverse section of the deposition cavity is rectangular.
According to the scheme, the front side wall and the rear side wall of the deposition cavity extend inwards from one end of the air inlet cavity to one section of the air suction cavity, and the transverse section of the deposition cavity is in an isosceles trapezoid shape.
According to the scheme, the unilateral included angle between the front side wall and the rear side wall of the deposition cavity and the central line of the transverse section of the deposition cavity is 10-20 degrees, and the two movable partition plates are arranged in parallel with the front side wall and the rear side wall.
According to the scheme, the telescopic propulsion device is a translational telescopic propulsion device.
According to the scheme, the translation telescopic propulsion device comprises a diamond-shaped telescopic frame and a telescopic driving oil cylinder or an air cylinder connected with one end of the diamond-shaped telescopic frame, and the other end of the diamond-shaped telescopic frame is hinged with the movable partition plate.
According to the scheme, the blast lamp is connected with the front-back moving device.
According to the scheme, when the movable partition plates are deposited, the movable partition plates slowly and continuously move towards the two sides of the front side wall and the rear side wall under the drive of the translation telescopic propelling device along with the increase of the diameter of the powder rod, namely the distance between the periphery of the powder rod and the front side wall and the rear side wall of the deposition cavity is greater than or equal to G, and G is 175-500 mm.
According to the scheme, the air inlet cavity is positioned at one side of the back of the blast lamp, the front of the air inlet cavity is communicated with the deposition cavity, and the rear of the air inlet cavity is connected with the sub-air inlet cavity which is divided up and down.
According to the scheme, the air suction cavity is positioned on one side of the front of the blast lamp, the front of the air suction cavity is communicated with the deposition cavity, the rear of the air suction cavity is connected with the sub air suction cavities which are vertically separated, the air outlet of each sub air suction cavity is connected with the air quantity regulating valve in series and used for regulating the flow of the extracted air, and the air outlet of each sub air suction cavity is communicated with the air suction pipeline.
According to the scheme, the sub air inlet cavity is provided with 6-12 layers up and down corresponding to the air inlet cavity, each layer is divided into 2-4 grids, the sub air suction cavity is provided with 6-12 layers up and down corresponding to the air suction cavity, and each layer is divided into 2-4 grids.
The invention has the beneficial effects that: 1. the front side wall and the rear side wall of the deposition cavity are provided with movable partition plates, a deposition cavity with an adjustable transverse section is formed, the movable partition plates slowly and continuously move towards the two sides of the front side wall and the rear side wall under the drive of a translational telescopic propelling device during deposition, namely, the distance between the front side wall and the rear side wall of the deposition cavity is increased along with the increase of the diameter of the powder rod, so that the distance between the periphery of the powder rod and the front side wall and the rear side wall of the deposition cavity is kept relatively constant, the transverse section of the deposition cavity is continuously and slowly increased, the distance between the periphery of the powder rod in the deposition cavity and the front side wall and the rear side wall of the deposition cavity is kept relatively unchanged, the air flow is kept to slowly flow in the deposition cavity, the air flow can still keep an initial laminar state under the condition of flow change caused by heat rising, and turbulent flow is reduced, and therefore, the stability of an air flow field in the deposition process is kept. 2. The arrangement of the translation telescopic propulsion device can facilitate the automatic synchronous control of the movable partition plate, ensure the consistency of the deposition process to the greatest extent, ensure the smoothness of the air suction flow and the stability of the deposition state, and improve the deposition quality and efficiency. 3. The arrangement of the sub air inlet cavity and the sub air exhaust cavity is convenient for gradient adjustment of air inlet quantity and air exhaust quantity, the air inlet and air exhaust quantity which can be adjusted in a region can be increased to the greatest extent, the negative influence of a thermal field is reduced, the environment of the flow field is improved, and conditions are provided for realizing uniform laminar flow field. 4. The movable partition board is arranged in the deposition cavity, and is ventilated back and forth to cool the movable partition board, so that the movable partition board can normally operate at high temperature and reduce deformation. 5. The invention has simple and reasonable structure and arrangement, low manufacturing cost and easy implementation, and is particularly suitable for deposition manufacturing of large-diameter prefabricated bars.
Drawings
FIG. 1 is a cross-sectional block diagram of one embodiment of the present invention.
FIG. 2 is a cross-sectional block diagram of a deposition process according to one embodiment of the invention.
Fig. 3 is a longitudinal section sectional structural view of one embodiment of the present invention.
Fig. 4 is a cross-sectional structural view of an embodiment of the present invention in another direction of a longitudinal section.
Fig. 5 is a front cross-sectional structural view of one embodiment of the present invention.
Detailed Description
The invention is further described below with reference to the drawings and examples.
Embodiment one: the device comprises a deposition cavity, wherein the transverse section of the deposition cavity is rectangular, the inner sides of the front side wall and the rear side wall 5 of the deposition cavity are symmetrically provided with movable partition boards 2 respectively, the two movable partition boards are arranged in parallel with each other and are parallel to the front side wall and the rear side wall, the rear faces of the movable partition boards are connected with a telescopic propelling device 3, the width of the movable partition boards is basically the same as that of the front side wall and the rear side wall, a gap is reserved slightly, and the height of the movable partition boards is larger than the effective length of a deposition powder rod. The telescopic propulsion device is a translational telescopic propulsion device, the translational telescopic propulsion device comprises a diamond-shaped telescopic frame, one end of the diamond-shaped telescopic frame extends out of the front side wall or the rear side wall and is hinged with the telescopic cylinder, the front section is hinged with the front side wall and the rear side wall, and the other end of the diamond-shaped telescopic frame is hinged with the rear of the movable partition plate, so that a deposition cavity with an adjustable transverse section is formed. The left and right sides of the translation telescopic propulsion device are provided with 2 devices, and the translation telescopic propulsion device can synchronously stretch. One end of the deposition cavity is communicated with the air inlet cavity 1, the air inlet cavity is positioned at one side of the back of the blast lamp, the front of the air inlet cavity is communicated with the deposition cavity, the back of the air inlet cavity is connected with the sub air inlet cavity which is divided up and down, the sub air inlet cavity is correspondingly provided with 8 layers up and down, each layer is divided into 4 grids, the 4 grids comprise a left grid gear 9, a right grid gear 9 and a middle 2 separation gears 10, left side A1-A8 sub air inlet cavities, right side D1-D8 sub air inlet cavities, middle B1-B8 and C1-C8 sub air inlet cavities are formed, a row of blast lamps 7 which are vertically arranged in the middle of the air inlet cavity side are vertically arranged, the blast lamp is connected with an up-down moving device through a blast lamp bracket 8 and is connected with a front-back moving device, an up-down rotating chuck is arranged in the middle of the deposition cavity, the up-down rotating chuck comprises an up chuck 13 and a down chuck 13 and a driving shaft 16 connected with the upper rotating chuck and the down rotating chuck, the driving shaft is connected with the driving device 14 through the bearing seat 15, the upper chuck and the lower chuck are driven to rotate, the upper rotary chuck and the lower rotary chuck are used for clamping a deposition target rod, the other end of the deposition cavity is connected with the exhaust cavity 6, the exhaust cavity is positioned at one side in front of the blast lamp, the front of the exhaust cavity is communicated with the deposition cavity, the rear of the exhaust cavity is connected with sub exhaust cavities which are vertically separated, an air quantity regulating valve is connected in series at an air outlet of each sub exhaust cavity for regulating the flow quantity of the extracted air, the air outlet of each sub exhaust cavity is communicated with an exhaust pipeline, the sub exhaust cavities are provided with 8 layers up and down corresponding to the exhaust cavities, each layer is divided into 3 grids, each grid comprises a left grid gear 11, a right grid gear 12 and a middle grid gear 12, left side L1-L8 sub air inlet cavities, right side R1-R8 sub air inlet cavities and middle M1-M8 sub air inlet cavities are formed. When the movable partition plates are deposited, the movable partition plates slowly and continuously move towards the two sides of the front side wall and the rear side wall under the drive of the translation telescopic propelling device along with the increase of the diameter of the powder rod, namely the distance between the front side wall and the rear side wall of the deposition cavity is increased along with the increase of the diameter of the powder rod, so that the distance between the periphery of the powder rod and the front side wall and the rear side wall of the deposition cavity is larger than or equal to G, G is the optimal single-side deposition distance, and the range is 175-500 mm, and can be generally 200-350 mm.
Embodiment two: the second embodiment of the invention is mainly characterized in that the front and rear side walls of the deposition cavity extend inwards from one end of the air inlet cavity to a section of the air suction cavity in an inclined mode, the transverse section of the deposition cavity is in an isosceles trapezoid shape, the single-side included angle between the front and rear side walls of the deposition cavity and the central line of the transverse section of the deposition cavity is 10-20 degrees, and the two movable partition plates are arranged in parallel with the front and rear side walls. The remaining structure is substantially the same as that of the first embodiment.
Claims (12)
1. The variable section deposition cavity for OVD process includes deposition cavity, one end of the deposition cavity is connected with air inlet cavity, one row of blast lamps with vertical interval are installed in the air inlet cavity, one upper and one lower rotation chucks or blast lamps are installed inside the deposition cavity, and the other end of the deposition cavity is connected with the air exhaust cavity.
2. A variable cross-section deposition chamber for use in an OVD process as claimed in claim 1, wherein the width of said movable partition is the same or substantially the same as the width of the front and rear sidewalls, and the height of the movable partition is greater than or equal to the effective length of the deposited powder rod.
3. A variable cross-section deposition chamber for use in an OVD process as claimed in claim 1 or claim 2, wherein the deposition chamber has a rectangular transverse cross-section.
4. A variable cross section deposition chamber for use in an OVD process as claimed in claim 1 or claim 2, wherein the front and rear side walls of the deposition chamber extend obliquely inwardly from one end of the air inlet chamber to a section of the air outlet chamber, the transverse cross section being in the shape of an isosceles trapezoid.
5. The deposition chamber of claim 4, wherein the front and rear side walls of the deposition chamber are at an included angle of 10-20 degrees to the center line of the transverse cross section of the deposition chamber, and the two movable baffles are disposed parallel to the front and rear side walls.
6. A variable cross-section deposition chamber for use in an OVD process as claimed in claim 1 or claim 2, wherein the telescopic propulsion means is a translational telescopic propulsion means.
7. The deposition chamber of claim 6, wherein the translational expansion propulsion unit comprises a diamond expansion frame and an expansion driving cylinder or cylinder connected with one end of the diamond expansion frame, and the other end of the diamond expansion frame is hinged with the movable partition plate.
8. A variable cross-section deposition chamber for use in an OVD process as claimed in claim 1 or claim 2, wherein the torch is connected to a back and forth moving means.
9. The deposition chamber with variable cross section for OVD process according to claim 1 or 2, wherein the movable partition plate moves slowly and continuously along with the increase of the diameter of the powder rod under the drive of the translational telescopic pushing device, i.e. the distance between the front and rear movable partition plates increases along with the increase of the diameter of the powder rod, so that the distance between the periphery of the powder rod and the front and rear side walls of the deposition chamber is greater than or equal to G, and G is 175 mm-500 mm.
10. A variable cross-section deposition chamber for use in an OVD process as claimed in claim 1 or claim 2, wherein the inlet chamber is located on the rear side of the torch, the front of the inlet chamber being in communication with the deposition chamber, the rear of the inlet chamber being coupled to a sub-inlet chamber which is spaced vertically.
11. The deposition chamber with variable cross section for OVD process as claimed in claim 10, wherein the suction chamber is located at a front side of the torch, a front of the suction chamber is communicated with the deposition chamber, a sub suction chamber divided up and down is connected at a rear of the suction chamber, an air quantity adjusting valve is connected in series at an air outlet of each sub suction chamber for adjusting flow of extracted air, and an air outlet of the sub suction chamber is communicated with the suction pipe.
12. The deposition chamber with variable cross section for OVD process of claim 11, wherein the sub-air intake chamber is provided with 6-12 layers up and down corresponding to the air intake chamber, each layer is divided into 2-4 grids, the sub-air exhaust chamber is provided with 6-12 layers up and down corresponding to the air exhaust chamber, and each layer is divided into 2-4 grids.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310879632.9A CN117023970A (en) | 2023-07-17 | 2023-07-17 | Variable-section deposition cavity for OVD (over-the-counter dielectric) process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310879632.9A CN117023970A (en) | 2023-07-17 | 2023-07-17 | Variable-section deposition cavity for OVD (over-the-counter dielectric) process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117023970A true CN117023970A (en) | 2023-11-10 |
Family
ID=88630794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310879632.9A Pending CN117023970A (en) | 2023-07-17 | 2023-07-17 | Variable-section deposition cavity for OVD (over-the-counter dielectric) process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117023970A (en) |
-
2023
- 2023-07-17 CN CN202310879632.9A patent/CN117023970A/en active Pending
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