CN116917262A - 缩醛化合物、包含该化合物的添加剂、及包含该化合物的抗蚀剂用组合物 - Google Patents

缩醛化合物、包含该化合物的添加剂、及包含该化合物的抗蚀剂用组合物 Download PDF

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Publication number
CN116917262A
CN116917262A CN202280017394.4A CN202280017394A CN116917262A CN 116917262 A CN116917262 A CN 116917262A CN 202280017394 A CN202280017394 A CN 202280017394A CN 116917262 A CN116917262 A CN 116917262A
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CN
China
Prior art keywords
compound
acetal compound
acid
general formula
compound according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280017394.4A
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English (en)
Chinese (zh)
Inventor
益川友宏
池田明代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maruzen Petrochemical Co Ltd
Original Assignee
Maruzen Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maruzen Petrochemical Co Ltd filed Critical Maruzen Petrochemical Co Ltd
Publication of CN116917262A publication Critical patent/CN116917262A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/30—Compounds having groups
    • C07C43/315—Compounds having groups containing oxygen atoms singly bound to carbon atoms not being acetal carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
    • C07C41/48—Preparation of compounds having groups
    • C07C41/50—Preparation of compounds having groups by reactions producing groups
    • C07C41/54—Preparation of compounds having groups by reactions producing groups by addition of compounds to unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/28—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/29—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by introduction of oxygen-containing functional groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/753—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
CN202280017394.4A 2021-02-26 2022-02-25 缩醛化合物、包含该化合物的添加剂、及包含该化合物的抗蚀剂用组合物 Pending CN116917262A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021-030717 2021-02-26
JP2021030717 2021-02-26
PCT/JP2022/007775 WO2022181740A1 (ja) 2021-02-26 2022-02-25 アセタール化合物、当該化合物を含む添加剤、および当該化合物を含むレジスト用組成物

Publications (1)

Publication Number Publication Date
CN116917262A true CN116917262A (zh) 2023-10-20

Family

ID=83047719

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280017394.4A Pending CN116917262A (zh) 2021-02-26 2022-02-25 缩醛化合物、包含该化合物的添加剂、及包含该化合物的抗蚀剂用组合物

Country Status (7)

Country Link
US (1) US20240043361A1 (https=)
JP (1) JP7711171B2 (https=)
KR (1) KR20230148818A (https=)
CN (1) CN116917262A (https=)
CA (1) CA3211500A1 (https=)
TW (1) TWI894435B (https=)
WO (1) WO2022181740A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060172223A1 (en) * 2004-11-24 2006-08-03 Rohm And Haas Electronic Materials Llc Photoresist compositions
US20070111136A1 (en) * 2003-08-28 2007-05-17 Masahiro Miyasaka Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product
WO2021000053A1 (en) * 2019-07-04 2021-01-07 Canopy Growth Corporation Cannabinoid derivatives

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100491325C (zh) * 2003-10-10 2009-05-27 乐凯集团第二胶片厂 高活性热交联酸可分解化合物及其合成方法
JP2008191218A (ja) 2007-02-01 2008-08-21 Tokyo Ohka Kogyo Co Ltd 厚膜用化学増幅型ポジ型ホトレジスト組成物及び厚膜レジストパターンの製造方法
AU2010330040B2 (en) * 2009-12-07 2013-12-19 Agfa Nv UV-LED curable compositions and inks
WO2021113958A1 (en) * 2019-12-09 2021-06-17 Canopy Growth Corporation Cannabinoid derivatives

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070111136A1 (en) * 2003-08-28 2007-05-17 Masahiro Miyasaka Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product
US20060172223A1 (en) * 2004-11-24 2006-08-03 Rohm And Haas Electronic Materials Llc Photoresist compositions
WO2021000053A1 (en) * 2019-07-04 2021-01-07 Canopy Growth Corporation Cannabinoid derivatives

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
MATTAREI，ANDREA等: "Acetal Derivatives as Prodrugs of Resveratrol", 《MOLECULAR PHARMACEUTICS》, vol. 10, no. 7, 31 December 2013 (2013-12-31), pages 2781 - 2792, XP055961606, DOI: 10.1021/mp400226p *
VYSOTSKAYA，O.V.等: "Functional acetal methacrylates: III. Electrophilic addition of diols to 2-(vinyloxy)ethyl methacrylate", 《RUSSIAN JOURNAL OF ORGANIC CHEMISTRY》, vol. 38, no. 8, 31 December 2002 (2002-12-31), pages 1082 - 1087, XP002528725, DOI: 10.1023/A:1020924804169 *

Also Published As

Publication number Publication date
KR20230148818A (ko) 2023-10-25
US20240043361A1 (en) 2024-02-08
WO2022181740A1 (ja) 2022-09-01
TWI894435B (zh) 2025-08-21
JP7711171B2 (ja) 2025-07-22
CA3211500A1 (en) 2022-09-01
JPWO2022181740A1 (https=) 2022-09-01
TW202302511A (zh) 2023-01-16

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