CN116817756B

CN116817756B - Linearity measuring method and linearity measuring device

Info

Publication number: CN116817756B
Application number: CN202311099382.3A
Authority: CN
Inventors: 阮迪超; 杨灏; 金少峰
Original assignee: Shenzhen Sincevision Technology Co ltd
Current assignee: Shenzhen Sincevision Technology Co ltd
Priority date: 2023-08-30
Filing date: 2023-08-30
Publication date: 2023-11-17
Anticipated expiration: 2043-08-30
Also published as: CN116817756A

Abstract

The application provides a linearity measuring method and a linearity measuring device. The linearity measurement method comprises the following steps: receiving a diffraction beam obtained by irradiating a collimated beam to an auxiliary measuring plate, wherein the auxiliary measuring plate is provided with a plurality of openings which are arranged at intervals along a preset direction and are parallel to each other, and the openings are provided with two edges which are oppositely arranged along the preset direction; converting the diffracted light beam into a waveform signal, wherein the waveform signal comprises a plurality of diffraction peak groups, and one diffraction peak group corresponds to two edges of one opening; and obtaining a first data set according to the abscissa of the diffraction peak groups, obtaining a second data set according to the coordinates of the edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set. The linearity measuring method provided by the application has the advantages of high measuring speed and low measuring cost on the linearity of the sensor, thereby improving the production efficiency of the sensor.

Description

Linearity measuring method and linearity measuring device

Technical Field

The application relates to the field of measurement level, in particular to a linearity measurement method and a linearity measurement device.

Background

The deviation correcting sensor has higher precision requirement, and the linearity of the representative parameter directly influences the quality of the product. The sensing transmitting head in the deviation correcting sensor has a complex structure, is easily influenced by assembly tolerance in the assembly process, and is difficult to judge whether the linearity is qualified from the appearance of the light spots, so that no effective evaluation and control means are available for the linearity, and only after a finished product is assembled, a precise displacement machine is used for simulating a measured object to gradually take a measuring point and then calculate a result, thereby greatly increasing the production cost and uncertainty.

Disclosure of Invention

In a first aspect, the present application provides a linearity measurement method, the linearity measurement method comprising:

receiving a diffraction beam obtained by irradiating a collimated beam to an auxiliary measuring plate, wherein the auxiliary measuring plate is provided with a plurality of openings which are arranged at intervals along a preset direction and are parallel to each other, and the openings are provided with two edges which are oppositely arranged along the preset direction;

converting the diffracted light beam into a waveform signal, wherein the waveform signal comprises a plurality of diffraction peak groups, and one diffraction peak group corresponds to two edges of one opening; a kind of electronic device with high-pressure air-conditioning system

And obtaining a first data set according to the abscissa of the diffraction peak groups, obtaining a second data set according to the coordinates of the edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set.

The obtaining a first data set according to the abscissa of the diffraction peak groups, obtaining a second data set according to the coordinates of the edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set, including:

calculating the centroid of each edge diffraction peak to obtain the first data set (X1, X2, xn), wherein the set of diffraction peaks comprises one or both of the edge diffraction peaks, n being the total number of the edge diffraction peaks;

calculating coordinates of a plurality of said edges in said preset direction to obtain said second data set (Y1, Y2,.. Ym), wherein m corresponds to the total number of said edges;

obtaining a fitting function x=ay+b according to the first data set and the second data set, wherein a is a unitary nth function about Y, N is a constant greater than or equal to 0, and b is a constant greater than or equal to 0; a kind of electronic device with high-pressure air-conditioning system

And calculating the maximum difference value Xdiff between the first data set and aY+b, and calculating the linearity of the sensor according to the maximum difference value Xdiff and the measuring range of the sensor, wherein Xn-X1 corresponds to the measuring range.

Wherein said calculating the centroid of each edge diffraction peak to obtain said first data set (X1, X2,..xn), comprises:

selecting the edge diffraction peak, and reading the maximum value Zmax of the edge diffraction peak;

reading a first minimum Zmin1 of the edge diffraction peak adjacent to the maximum Zmax along the negative direction of the abscissa, and reading a second minimum Zmin2 of the edge diffraction peak adjacent to the maximum Zmax along the positive direction of the abscissa;

taking the first minimum value Zmin1 and the second minimum value Zmin2 as sampling points to cut off, and selecting a preset number of sampling points;

calculating the abscissa of the mass center of the edge diffraction peak according to the abscissa and the ordinate of the preset number of sampling points; a kind of electronic device with high-pressure air-conditioning system

The first data set (X1, X2,) is derived from the abscissa of the centroids of the plurality of edge diffraction peaks.

The method for measuring the linearity of the sensor further comprises the steps of after obtaining a first data set according to the abscissa of the diffraction peak groups, obtaining a second data set according to the coordinates of the edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set:

Judging the linearity of the sensor and the preset linearity;

stopping measurement when the linearity of the sensor is smaller than or equal to the preset linearity;

and when the linearity of the sensor is greater than the preset linearity, adjusting an emission sensing head for emitting the collimated light beam, and reselecting the first data set to recalculate the linearity of the sensor.

When the linearity of the sensor is greater than the preset linearity, the adjusting the emission sensing head emitting the collimated light beam and reselecting the first data set to recalculate the linearity of the sensor includes:

adjusting at least one of the posture of a laser of the emission sensing head and the position of a first lens group of the emission sensing head in the direction perpendicular to the direction of the laser pointing to the first lens group, wherein a light beam emitted by the laser is emitted sequentially through the first lens group, a reflecting mirror group and a second lens group;

and in the process of adjusting the emission sensor head, calculating the linearity of the sensor in real time, and stopping adjusting the emission sensor head and stopping measuring when the linearity of the sensor is smaller than or equal to the preset linearity.

The method for measuring linearity comprises the steps of receiving a collimated light beam, irradiating the collimated light beam to an auxiliary measuring plate to obtain a diffracted light beam, wherein the auxiliary measuring plate is provided with a plurality of holes which are arranged at intervals along a preset direction and are parallel to each other, and before the holes are provided with two edges which are oppositely arranged along the preset direction, the method for measuring linearity further comprises the following steps:

and correcting parallelism among an emitting surface for emitting the collimated light beam, an auxiliary measuring plate and a receiving surface for receiving the diffracted light beam.

Wherein, the correction is emergent the collimation between the emitting surface of collimated light beam, auxiliary measurement board and the receiving surface of receiving the diffraction light beam includes:

providing a reflector and a lens, arranging the reflector on the surface of the auxiliary measuring plate facing the emitting surface, and arranging the lens between the emitting surface and the reflector;

emitting a collimated light beam perpendicular to the emitting surface to the reflecting mirror, wherein the collimated light beam penetrates through the lens from one side of the emitting surface and forms a first light spot on the lens, and the collimated light beam is reflected to the lens through the reflecting mirror to form a second light spot;

adjusting the posture of at least one of the auxiliary measuring plate and the emitting surface until the first light spot and the second light spot coincide;

The reflector is arranged on the receiving surface, and the lens is arranged between the auxiliary measuring plate and the reflector;

emitting a collimated light beam perpendicular to the emitting surface to the reflecting mirror, wherein the collimated light beam penetrates through the lens from one side of the emitting surface and forms a third light spot on the lens, and the collimated light beam is reflected to the lens through the reflecting mirror to form a fourth light spot; a kind of electronic device with high-pressure air-conditioning system

And adjusting the posture of the receiving surface until the third light spot and the fourth light spot coincide.

The application provides a linearity measurement method, in the assembly process of an emission sensing head of a sensor, an auxiliary measurement plate is arranged between the emission sensing head of the sensor and a receiving sensing head of the sensor, the auxiliary measurement plate is provided with a plurality of openings which are arranged at intervals along a preset direction and are parallel, the openings are provided with two edges which are arranged oppositely along the preset direction, a collimated light beam emitted by the emission sensing head contacts with the auxiliary measurement plate and then interferes to form a diffraction light beam, the diffraction light beam is received by the receiving sensing head, a plurality of diffraction peak groups are obtained by converting the diffraction light beam into a waveform signal, the linearity of the sensor can be calculated according to the abscissa information of the diffraction peak groups and the coordinate information of a plurality of edges on the auxiliary measurement plate in the preset direction, and in the assembly process of the emission sensing head, the linearity measurement method can rapidly measure the linearity of the sensor for a plurality of times in real time so as to assist the assembly of the emission sensing head. Therefore, the linearity measuring method provided by the application has the advantages of high measuring speed and low measuring cost for the linearity of the sensor, thereby improving the production efficiency of the sensor.

In a second aspect, the present application also provides a linearity measuring apparatus, comprising:

the auxiliary measuring plate is provided with a plurality of holes which are arranged at intervals along a preset direction and are parallel to each other, and the holes are provided with two edges which are oppositely arranged along the preset direction;

the receiving sensing head is arranged on one side of the auxiliary measuring plate and is used for receiving the diffraction light beam obtained by irradiating the collimated light beam to the auxiliary measuring plate; a kind of electronic device with high-pressure air-conditioning system

A processor electrically connected to the receiving sensor head, the processor configured to: converting the diffraction light beam into a waveform signal, wherein the waveform signal comprises a plurality of diffraction peak groups, one diffraction peak group corresponds to two edges of one opening, a first data set is obtained according to the abscissa of the plurality of diffraction peak groups, a second data set is obtained according to the coordinates of the plurality of edges in the preset direction, and the linearity of the sensor is obtained according to the first data set and the second data set.

Wherein, linearity measuring device still includes the bearing assembly, the bearing assembly includes:

the bracket is used for bearing the first lens group, the reflecting mirror group and the second lens group of the emission sensing head;

The adjusting frame is borne on the bracket and is used for installing the laser of the emission sensing head and adjusting the posture of the laser; a kind of electronic device with high-pressure air-conditioning system

The adjusting piece is connected with the bracket in a matching way and is used for adjusting the position of the first lens group in the direction perpendicular to the direction of the laser pointing to the first lens group;

the light beams emitted by the laser are emitted out through the first lens group, the reflecting mirror group and the second lens group in sequence;

the processor is also used for measuring the linearity of the sensor in real time in the process of adjusting the transmitting sensor head and judging the linearity of the sensor and the preset linearity, wherein the sensor consists of the transmitting sensor head and the receiving sensor head.

The linearity measuring device provided by the application can measure the linearity of the sensor in the assembly process of the transmitting sensor head, and has the advantages of high measuring speed and low measuring cost, thereby improving the production efficiency of the sensor.

In a third aspect, the present application also provides a linearity measuring apparatus, comprising:

a computer-readable storage medium storing a computer-readable program; a kind of electronic device with high-pressure air-conditioning system

A processor for reading and invoking the computer readable program to perform the linearity measurement method as described in the first aspect.

The linearity measuring device provided by the application can call the linearity measuring method in the assembly process of the transmitting sensor head so as to measure the linearity of the sensor in the assembly process of the transmitting sensor head, and has the advantages of high measuring speed and low measuring cost, thereby improving the production efficiency of the sensor.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

Fig. 1 is a flowchart of a linearity measurement method according to an embodiment of the present application.

FIG. 2 is a schematic diagram of an optical path for receiving a diffracted beam according to an embodiment of the application.

FIG. 3 is a schematic view of the collimated beam of FIG. 2 impinging on an auxiliary measurement plate in one embodiment.

Fig. 4 is a schematic diagram of the waveform signal of the diffracted beam obtained in fig. 3.

FIG. 5 is a schematic view of the collimated beam of FIG. 2 impinging on an auxiliary measurement plate in another embodiment.

Fig. 6 is a schematic diagram of the waveform signal of the diffracted beam obtained in fig. 5.

FIG. 7 is a schematic view of the collimated beam of FIG. 2 impinging on an auxiliary measurement plate in yet another embodiment.

Fig. 8 is a schematic diagram of the waveform signal of the diffracted beam obtained in fig. 7.

Fig. 9 is a flow chart of linearity calculation for the sensor of fig. 1.

FIG. 10 is a schematic diagram of the fitting function of FIG. 9 in one embodiment.

FIG. 11 is a flow chart of the first data set obtained in FIG. 9.

Fig. 12 is an enlarged partial schematic view at I in fig. 4.

Fig. 13 is a flow chart of a determination of the linearity of the sensor of fig. 1.

FIG. 14 is a flow chart of the adjustment of the emission sensor head of FIG. 13.

FIG. 15 is a schematic diagram of a transmitting sensor head according to an embodiment of the present application.

FIG. 16 is a schematic view of the transmitting sensor head of FIG. 15 from another perspective.

FIG. 17 is a schematic view of the emission sensor head of FIG. 15 emitting collimated light beams.

Fig. 18 is a flowchart of the correction of parallelism in fig. 1.

Fig. 19 is a flowchart of a specific step of correcting parallelism in fig. 18.

FIG. 20 is a schematic diagram of correcting parallelism between the emitting surface of an outgoing collimated beam and an auxiliary measuring plate.

Fig. 21 is a graph of correcting parallelism between the emitting surface of an outgoing collimated beam and the receiving surface of a received diffracted beam.

Fig. 22 is a schematic structural diagram of a linearity measuring device according to an embodiment of the present application.

Fig. 23 is an electrical connection block diagram of a linearity measuring device according to an embodiment of the present application.

Reference numerals: a linearity measuring device 1; an auxiliary measuring plate 11; an opening 111; an edge 1111; receiving a sense head 12; a processor 13; a carrier assembly 14; a bracket 141; an adjusting frame 142; an adjusting member 143; a computer-readable storage medium 15; diffraction peak set 2; edge diffraction peak 21; a centroid 211; a transmitting sensor head 3; a laser 31; a first lens group 32; a mirror group 33; a second lens group 34; a reflecting mirror 4; and a lens 5.

Detailed Description

The following description of the embodiments of the present application will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present application, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without any inventive effort, are intended to be within the scope of the application.

The terms first, second and the like in the description and in the claims and in the above-described figures are used for distinguishing between different objects and not necessarily for describing a sequential or chronological order. Furthermore, the terms "comprise" and "have," as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those listed steps or elements but may include other steps or elements not listed or inherent to such process, method, article, or apparatus.

Reference herein to "an embodiment" or "implementation" means that a particular feature, structure, or characteristic described in connection with the embodiment or implementation may be included in at least one embodiment of the application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.

The deviation correcting sensor is also called an opposite-type edge measuring sensor, and is a sensor for realizing measurement by utilizing the linear propagation or diffraction characteristics of light, and the deviation correcting sensor is a sensor capable of detecting the edge position of an object, such as edge measurement, width measurement, interval measurement and the like. Specifically, for example, the deviation correcting sensor includes a transmitting sensor head and a receiving sensor head, the transmitting sensor head and the receiving sensor head are usually disposed at two sides of the measured object, the transmitting sensor head outputs a collimated beam to the receiving sensor head, in this process, the measured object can shield part of the beam, the beam diffracts at the edge of the measured object, the beam signal received by the receiving sensor head can be converted into a waveform signal, the waveform signal at least includes an edge diffraction signal of the beam itself and an edge diffraction signal generated by the contact of the beam with the measured object, the relative positional relationship between the transmitting sensor head, the receiving sensor head and the measured object can be obtained by measuring the distance between the two diffraction signals, and if the distance between the two diffraction signals is kept unchanged, the relative positions between the transmitting sensor head, the receiving sensor head and the measured object are kept unchanged.

However, the sensing transmitting head in the deviation correcting sensor has a complex structure, is easily influenced by assembly tolerance in the assembly process, and is difficult to judge whether the linearity is qualified from the appearance of the light spots, so that no effective evaluation and control means are available for the linearity, and only after a finished product is assembled, a precise displacement machine is used for simulating the measured object to gradually take the measuring points and then calculate the result, thereby greatly increasing the production cost and uncertainty.

In order to realize the real-time detection of the linearity of the deviation correcting sensor, so as to reduce the production cost and the uncertainty of production, the application provides a linearity measuring method. Referring to fig. 1 to 8, fig. 1 is a flowchart of a linearity measurement method according to an embodiment of the present application; FIG. 2 is a schematic diagram of an optical path for receiving a diffracted beam according to an embodiment of the application; FIG. 3 is a schematic view of the collimated beam of FIG. 2 impinging on an auxiliary measurement plate in one embodiment; FIG. 4 is a schematic diagram of the waveform signal of the diffracted beam obtained in FIG. 3; FIG. 5 is a schematic view of the collimated beam of FIG. 2 impinging on an auxiliary measurement plate in another embodiment; FIG. 6 is a schematic diagram of the waveform signal of the diffracted beam obtained in FIG. 5; FIG. 7 is a schematic view of the collimated beam of FIG. 2 impinging on an auxiliary measurement plate in yet another embodiment; fig. 8 is a schematic diagram of the waveform signal of the diffracted beam obtained in fig. 7. In the present embodiment, the linearity measuring method includes steps S100, S200 and S300, and the steps S100, S200 and S300 will be described in detail.

S100, receiving the diffraction beam obtained by irradiating the collimated beam to the auxiliary measuring plate 11.

The auxiliary measuring plate 11 has a plurality of openings 111 spaced apart and parallel along a predetermined direction, and the openings 111 have two edges 1111 disposed opposite to each other along the predetermined direction.

In this embodiment, the surface of the auxiliary measuring plate 11 facing the collimated light beam has a first long side parallel to the preset direction, and the opening 111 has two first short sides parallel to the preset direction and disposed opposite to each other. The collimated light beam irradiates the auxiliary measuring plate 11 and forms a light spot on the auxiliary measuring plate 11, the light spot having a second long side parallel to the preset direction and a second short side perpendicular to the preset direction. In an embodiment of the present application, the second short side is smaller than a distance between the first short sides disposed oppositely, and the second short side is located between the two first short sides disposed oppositely, so as to avoid clutter caused by contact between the collimated light beam and the first short sides. Optionally, the auxiliary measuring board 11 is a high-precision hollowed-out flat board, so that the space tolerance between the openings 111 and the space tolerance between the two edges 1111 of the openings 111 are smaller than the linearity requirement of the sensor, for example, the space tolerance between the openings 111 and the space tolerance between the two edges 1111 of the openings 111 are 1/10, 1/5, 1/20, or the like of the linearity requirement of the sensor, which is specifically designed according to the model and application requirement of the sensor that are actually measured, and is not limited herein. Wherein, the preset direction is the Y direction shown in FIG. 3.

In an embodiment (please refer to fig. 3 and 7), the second long side is smaller than the first long side, and the second long side is located in a plane of the auxiliary measuring plate 11 facing the collimated light beam, that is, the light spot is not in contact with two sides of the auxiliary measuring plate 11 opposite to each other along the preset direction. The collimated beam contacts and diffracts with the edge 1111 of the aperture 111 to form a diffracted beam.

In another embodiment (refer to fig. 5), the second long side is larger than the first long side, and the light spot contacts two sides of the auxiliary measuring plate 11 opposite to each other along the preset direction, so that the collimated light beam diffracts not only the edge 1111 of the opening 111, but also two sides of the auxiliary measuring plate 11 opposite to each other along the preset direction to form a diffracted light beam.

It will be appreciated that in other embodiments, the collimated light beam may be diffracted only by a portion of the edge 1111 of the aperture 111, or by one of two sides of the collimated light beam opposite to the auxiliary measuring plate 11 along the predetermined direction, as long as the edges 1111 or sides that are diffracted by the collimated light beam are parallel to each other and have a known distance.

And S200, converting the diffracted light beam into a waveform signal.

Wherein the waveform signal includes a plurality of diffraction peak sets 2, and one diffraction peak set 2 corresponds to two edges 1111 of one opening 111.

In the present embodiment, the diffraction peak groups 2 include one edge diffraction peak 21 or two edge diffraction peaks 21, and the number of the edge diffraction peaks 21 included in each diffraction peak group 2 is the same or different. Specifically, in one embodiment (please refer to fig. 3 and 4), the dimension of the opening 111 in the predetermined direction is larger than the predetermined dimension, the collimated light beam diffracts at the opening 111 at the edge 1111, each of the diffraction peak groups 2 includes two edge diffraction peaks 21, each of the diffraction peak groups 2 corresponds to two edges 1111 of one of the openings 111, and one of the edge diffraction peaks 21 corresponds to one of the edges 1111. In another embodiment (please refer to fig. 5 and 6), the dimension of the opening 111 in the preset direction is larger than the preset dimension, the collimated light beam diffracts at the edge 1111 of the opening 111, the two diffraction peak groups 2 at two ends of the waveform signal include one edge diffraction peak 21, the two diffraction peak groups 2 correspond to two sides of the auxiliary measuring plate 11 opposite to each other along the preset direction, and one edge diffraction peak 21 corresponds to one side; the other diffraction peak groups 2 except for the two diffraction peak groups 2 at both ends of the waveform signal include two edge diffraction peaks 21, and each diffraction peak group 2 corresponds to two edges 1111 of the aperture 111, and one edge diffraction peak 21 corresponds to one edge 1111. In yet another embodiment (please refer to fig. 7 and 8), the dimension of the opening 111 in the preset direction is smaller than or equal to the preset dimension, so that the collimated beam is subjected to single slit diffraction at the opening 111, each of the diffraction peak groups 2 includes one edge diffraction peak 21, and one of the edge diffraction peaks 21 corresponds to one of the openings 111, wherein the edge diffraction peak 21 is also referred to as a single slit diffraction peak. In addition, in the embodiments corresponding to fig. 7 and 8, the distance between the auxiliary measuring plate 11 and the receiving surface receiving the diffracted light beam is smaller than in the embodiments of fig. 3 to 6. In addition, in the embodiments corresponding to fig. 7 and 8, since the size of the opening 111 in the preset direction is smaller, more openings 111 can be provided on the auxiliary measuring board with the same size to obtain more measuring points, thereby improving the linearity measuring accuracy of the sensor.

S300, a first data set is obtained according to the abscissa of the diffraction peak groups 2, a second data set is obtained according to the coordinates of the edges 1111 in the preset direction, and the linearity of the sensor is obtained according to the first data set and the second data set.

In this embodiment, the first data set is obtained according to an abscissa of a preset point of each diffraction peak set 2 in the waveform signal. The second data set is obtained from the coordinates of the respective edges 1111 of the auxiliary measuring plate 11 in the predetermined direction, i.e., from the relative distance between the respective edges 1111. Since one of the diffraction peak sets 2 corresponds to two edges 1111 of one of the apertures 111, the linearity of the sensor can be obtained according to the relationship between the first data set and the second data set. The sensor is a correction sensor, and is also called a correlation type edge measurement sensor.

Optionally, the waveform signal may be displayed through an oscilloscope, a computer display, or other components with a display function. The linearity of the sensor can be calculated by the processor 13, the upper computer and other components with calculation functions.

Wherein the greater the number of the apertures 111 of the auxiliary measuring plate 11, and the greater the number of the apertures 111 interfering with the collimated light beam, the higher the accuracy of the linearity measurement of the sensor. The number of the holes 111 of the auxiliary measuring plate 11 is specifically set according to the actual measuring accuracy requirement, and the number of the holes 111 in the drawings of the present application is merely illustrative and not limited herein.

In the assembly process of the emission sensor head 3 of the sensor, the auxiliary measuring plate 11 is arranged between the emission sensor head 3 and the receiving sensor head 12, so that the collimated light beam emitted by the emission sensor head 3 interferes with the edge 1111 of the opening 111 to obtain a diffracted light beam, the diffracted light beam is received by the receiving sensor head 12, a waveform signal comprising a plurality of diffraction peak groups 2 can be obtained according to the diffracted light beam, in the assembly process of the emission sensor head 3, the linearity of the sensor can be calculated in real time according to the waveform signal and the auxiliary measuring plate 11, the calculation result is not needed after the measured object is simulated to gradually take a measuring point by using a precise displacement machine after the assembly of the emission sensor head 3 is completed, and the linearity measurement efficiency of the emission sensor head 3 is improved. Alternatively, the linearity of the sensor may be calculated a plurality of times by intercepting the waveform signals at a plurality of time points in combination with the arrangement of the openings 111 on the auxiliary measuring board 11, so as to improve the calculation accuracy of the linearity of the sensor by a plurality of measurements; or, at a preset refresh frequency, the linearity of the sensor is measured once every time the waveform signal is refreshed, so as to improve the calculation accuracy of the linearity of the sensor and the timeliness of the real-time measurement of the linearity of the sensor, thereby assisting the assembly of the emission sensor head 3.

In other words, the method for evaluating linearity is introduced in the assembly process of the emission sensor head 3, so that the linearity of the emission sensor head 3 is measured in real time, and the assembly yield of the emission sensor head 3 is improved. In addition, the auxiliary measuring plate 11 is introduced while providing a plurality of measuring points, shortening the measuring time of the linearity of the sensor, reducing the cost and volume of the measuring apparatus, thereby improving the production efficiency.

In summary, the present application provides a linearity measurement method, in the assembly process of the emission sensor head 3 of the sensor, an auxiliary measurement plate 11 is disposed between the emission sensor head 3 of the sensor and the receiving sensor head 12 of the sensor, the auxiliary measurement plate 11 has a plurality of openings 111 disposed at intervals along a preset direction and parallel to each other, the openings 111 have two edges 1111 disposed opposite to each other along the preset direction, and the collimated light beam emitted from the emission sensor head 3 interferes with the auxiliary measurement plate 11 to form a diffraction light beam and is received by the receiving sensor head 12, a plurality of diffraction peak groups 2 are obtained by converting the diffraction light beam into a waveform signal, and the linearity of the sensor can be calculated according to the abscissa information of the diffraction peak groups 2 and the coordinate information of the edges 1111 on the auxiliary measurement plate 11 in the preset direction, and in the assembly process of the emission sensor head 3, the linearity measurement method can rapidly measure the linearity of the emission sensor head 3 in real time. Therefore, the linearity measuring method provided by the application has the advantages of high measuring speed and low measuring cost for the linearity of the sensor, thereby improving the production efficiency of the sensor.

Referring to fig. 2-10, fig. 9 is a flow chart of linearity calculation of the sensor in fig. 1; FIG. 10 is a schematic diagram of the fitting function of FIG. 9 in one embodiment. In the present embodiment, the step S300 includes steps 310, S320, S330 and S340. Steps 310, S320, S330 and S340 will be schematically described in the embodiments corresponding to fig. 3 and 4.

S310, calculating the centroid 211 of each edge diffraction peak 21 to obtain the first data set (X1, X2,..xn).

Wherein one of the diffraction peak groups 2 includes two of the edge diffraction peaks 21, and n is the total number of the edge diffraction peaks 21.

In this embodiment, the first data set is composed of the abscissa of the centroid 211 of the edge diffraction peak 21, specifically, a preset number p of sampling points are selected on the edge diffraction peak 21, and then the abscissa xi= (x1×zi1+.+ xij×zij)/(zi1+ + Zij), where Xij is the abscissa of the jth sampling point in the ith edge diffraction peak 21, and Zij is the ordinate of the jth sampling point in the ith edge diffraction peak 21, and Zij is the corresponding signal strength at Xij. Wherein i is more than 0 and less than or equal to n, and j is more than 0 and less than or equal to p. In this embodiment, the centroid 211 may represent a weight center of the signal intensity distribution of the edge diffraction peak 21, and the centroid 211 of the edge diffraction peak 21 is selected as the first data set, so that the calculation accuracy of the linearity of the sensor may be improved.

S320, calculating coordinates of a plurality of the edges 1111 in the preset direction to obtain the second data set (Y1, Y2,..ym).

Where m is the total number of edges 1111.

In this embodiment, the preset direction is the Y direction in fig. 3, and in the embodiments corresponding to fig. 3 and 4, the total number of the edges 1111 is the same as the number of the edge diffraction peaks 21, that is, m=n.

And S330, obtaining a fitting function X=ay+b according to the first data set and the second data set.

Where a is a unitary Nth order function with respect to Y, N is a constant greater than or equal to 0, and b is a constant greater than or equal to 0. When N is equal to 0, a is a constant that is not equal to 0.

In this embodiment, the fitting function x=ay+b may be obtained by fitting according to a one-to-one correspondence between the first data set and each data in the second data set. When a is a constant that is not equal to 0, the fitting function is a straight line, and the relationship between the first data set and the second data set can be intuitively displayed.

Optionally, when a is a constant different from 0 and the weights of the spots are consistent, the fitting function is obtained directly according to the first data set and the second data set. When a is a constant which is not equal to 0 and the detection weights of all the spots are inconsistent, according to a preset weight distribution, corresponding weight coefficients are given to corresponding data in the first data set, and then the data are fitted with the second data set to obtain the fitting function, for example, the first data set can be converted into (K1X 1, K2X2, and KnXn) according to the preset weight distribution, wherein Kq is the weight coefficient, and q is more than or equal to 1 and less than or equal to n. And performing function fitting through preset weight distribution of the detection weight of the light spot, so that the detection accuracy of the linearity of the sensor is improved.

Optionally, N may be a constant greater than 0, so that the fitting function is a curve, and the type of the fitting function is specifically selected according to the type of the sensor and the actual requirement. The straight line of the fitting function in fig. 10 of this embodiment is merely illustrative, and the type of the fitting function is not limited.

S340, calculating the maximum difference value Xdiff between the first data set and aY+b, and calculating the linearity of the sensor according to the maximum difference value Xdiff and the measuring range of the sensor.

Wherein Xn-X1 corresponds to the measuring range.

In this embodiment, the difference between each first data in the first data set and the fitting function is calculated, and the maximum difference Xdiff is selected, that is, the maximum deviation value between the first data set and the fitting function, so as to calculate and obtain the linearity l=xdiff/(Xn-X1) of the sensor.

Steps 310, S320, S330 and S340 are schematically illustrated in the embodiments corresponding to fig. 3 and 4. In the embodiment corresponding to fig. 5 and 6, the linearity calculation of the sensor may be performed by using steps 310, 320, 330 and 340, except that the number of the edge diffraction peaks 21 included in the diffraction peak set 2 is different, but still one of the edge diffraction peaks 21 corresponds to one of the edges 1111. In the embodiment corresponding to fig. 7 and 8, the above steps 310, S320, S330 and S340 may be used to calculate the linearity of the sensor, where the difference is that the number of the edge diffraction peaks 21 included in the diffraction peak group 2 is different, and the edge diffraction peaks 21 are single slit diffraction peaks, each of the single slit diffraction peaks corresponds to one of the openings 111, and m corresponds to the total number of the edges 1111, but m is half of the total number of the edges 1111, that is, m is the total number of the openings 111.

Referring to fig. 4, 11 and 12, fig. 11 is a flowchart of fig. 9 for obtaining a first data set; fig. 12 is an enlarged partial schematic view at I in fig. 4. In the present embodiment, the step S310 includes steps S311, S312, S313, S314, and S315, and the steps S311, S312, S313, S314, and S315 will be described in detail.

S311, selecting the edge diffraction peak 21, and reading the maximum value Zmax of the edge diffraction peak 21.

S312, a first minimum Zmin1 of the edge diffraction peak 21 adjacent to the maximum Zmax is read in the negative direction of the abscissa, and a second minimum Zmin2 of the edge diffraction peak 21 adjacent to the maximum Zmax is read in the positive direction of the abscissa.

S313, taking the first minimum value Zmin1 and the second minimum value Zmin2 as sampling points to cut off, and selecting a preset number of sampling points.

S314, calculating the abscissa of the centroid 211 of the edge diffraction peak 21 according to the abscissa and the ordinate of the preset number of sampling points.

S315, deriving a first data set (X1, X2,..xn) from the abscissa of the centroids 211 of the plurality of edge diffraction peaks 21.

In this embodiment, after selecting the maximum Zmax of the edge diffraction peak 21, selecting the first minimum Zmin1 and the second minimum Zmin2 closest to two sides of the maximum Zmax as the point-taking cut-off, so as to avoid that sampling points caused by different width of the edge diffraction peak 21, left-right asymmetry, noise interference and other problems are selected to deviate from the edge diffraction peak 21, thereby improving the calculation accuracy of the centroid 211 and further improving the calculation accuracy of the linearity of the sensor.

Further, between step S312 and step S313, it is further determined whether at least one of the first minimum value Zmin1 and the second minimum value Zmin2 is less than or equal to a preset value, where the preset value is adjacent to a value of 0. If so, step S313 is performed, and if not, step S311 is re-entered to re-select the edge diffraction peak 21, specifically, to select an adjacent peak as a new edge diffraction peak 21 in the positive/negative direction of the abscissa in the originally selected edge diffraction peak 21. In this embodiment, by determining whether at least one of the first minimum Zmin1 and the second minimum Zmin2 is smaller than or equal to a preset value, it is possible to avoid selecting a noise signal with a larger amplitude when selecting the edge diffraction peak 21.

Referring to fig. 2, 10 and 13, fig. 13 is a flowchart of determining the linearity of the sensor in fig. 1. In the present embodiment, after the step S300, the linearity measuring method further includes the steps S400 and S500, and the steps S400 and S500 will be described in detail.

S400, judging the linearity of the sensor and the preset linearity.

And stopping measurement when the linearity of the sensor is smaller than or equal to the preset linearity.

When the linearity of the sensor is greater than the preset linearity, step S500 is performed.

S500, adjusting the emission sensing head 3 emitting the collimated light beam.

During the operation of step S500 or after completion of step S500, step S100 is re-performed and the first data set is re-selected to re-calculate the linearity of the sensor.

In this embodiment, after the linearity of the sensor is calculated, the linearity of the sensor needs to be evaluated, and when the linearity of the sensor is less than or equal to the preset linearity, it indicates that the relative positions of the internal devices in the emission sensor head 3 meet the requirements, and the emission sensor head 3 may be packaged to complete the assembly of the emission sensor head 3, and the measurement is stopped.

When the linearity of the sensor is greater than the preset linearity, it indicates that the overall adjustment of the emission sensor head 3 is required, or the relative positions of the internal devices of the emission sensor head 3 are adjusted, and steps S100, S200, and S300 are repeated until the linearity of the sensor is less than or equal to the preset linearity. In the process of adjusting the relative positions of the internal devices in the emission sensor head 3, the linearity of the sensor can be calculated in real time, namely, each time the relative positions of the internal devices in the emission sensor head 3 are adjusted, the linearity of the sensor can be calculated in real time, thereby being beneficial to the adjustment of the emission sensor head 3 and improving the assembly efficiency of the emission sensor head 3. Therefore, the method for evaluating linearity is introduced into the emission sensor head 3 in the embodiment, so that the whole or part of internal devices of the emission sensor head 3 are adjusted in real time to meet the linearity requirement, and the assembly yield of the emission sensor head 3 is improved.

Referring to fig. 14-17, fig. 14 is a flowchart illustrating the adjustment of the emission sensor head in fig. 13; FIG. 15 is a schematic diagram of a transmitting sensor head according to an embodiment of the present application; FIG. 16 is a schematic view of the emission sensor head of FIG. 15 from another perspective; FIG. 17 is a schematic view of the emission sensor head of FIG. 15 emitting collimated light beams. In the present embodiment, step S500 includes step S510, and step S510 will be described in detail below.

S510 of adjusting at least one of the posture of the laser 31 of the emission sensor head 3, the position of the first lens group 32 of the emission sensor head 3 in the direction perpendicular to the direction in which the laser 31 is directed to the first lens group 32.

The light beam emitted from the laser 31 is emitted through the first lens group 32, the reflecting mirror group 33 and the second lens group 34 in sequence.

The linearity of the sensor is calculated in real time during adjustment of the emission sensor head 3. When the linearity of the sensor is less than or equal to the preset linearity, the adjustment of the emission sensor head 3 is stopped, and the measurement is stopped.

In the present embodiment, the emission sensor head 3 includes a laser 31, a first lens group 32, a mirror group 33, and a second lens group 34. The laser 31 is configured to emit a light beam, the first lens group 32 includes at least a negative lens, the first lens group 32 is configured to diverge the light beam emitted from the laser 31, the mirror group 33 is configured to reflect the light beam transmitted through the first lens group 32 to the second lens group 34, the second lens group 34 includes at least a positive lens, and the second lens group 34 is configured to collimate the light beam reflected by the emission lens group into the collimated light beam and emit the collimated light beam. The direction of the outgoing collimated light beam can be adjusted by adjusting the posture of the laser 31, and the assembly error of the first lens group 32 can be compensated by adjusting the position of the first lens group 32 in the direction perpendicular to the direction of the laser 31 pointing to the first lens group 32, so that the collimated light beam outgoing from the emission sensor head 3 can be changed by adjusting at least one of the posture of the laser 31 and the position of the first lens group 32 in the direction perpendicular to the direction of the laser 31 pointing to the first lens group 32, thereby changing the calculated linearity of the sensor, and the real-time feedback can be obtained by the real-time change of the linearity of the sensor, thereby facilitating the adjustment of the emission sensor head 3, improving the adjustment efficiency of the emission sensor head 3, that is, improving the assembly efficiency of the emission sensor head 3.

Referring to fig. 2, 18-21, fig. 18 is a flowchart of correcting parallelism in fig. 1; FIG. 19 is a flowchart showing a specific step of correcting parallelism in FIG. 18; FIG. 20 is a schematic illustration of correcting parallelism between the emitting surface of an outgoing collimated beam and an auxiliary measuring plate; fig. 21 is a graph of correcting parallelism between the emitting surface of an outgoing collimated beam and the receiving surface of a received diffracted beam. In this embodiment, before the step S100, the method further includes a step S600 of correcting parallelism between the emission surface from which the collimated light beam is emitted, the auxiliary measuring plate 11, and the receiving surface from which the diffracted light beam is received.

In this embodiment, before step S100, the parallelism between the emitting surface from which the collimated light beam is emitted, the auxiliary measuring plate 11, and the receiving surface from which the diffracted light beam is received, that is, the parallelism between the emitting sensor head 3, the auxiliary measuring plate 11, and the receiving sensor head 12 is corrected, which is advantageous for improving the measurement accuracy of the linearity of the sensor.

Specifically, step S600 includes steps S610, S620, S630, S640, S650, and S66.

S610, providing a reflecting mirror 4 and a lens 5, and disposing the reflecting mirror 4 on a surface of the auxiliary measuring plate 11 facing the emitting surface, and disposing the lens 5 between the emitting surface and the reflecting mirror 4.

S620, emitting the collimated light beam perpendicular to the emitting surface to the reflecting mirror 4.

Wherein the collimated light beam passes through the lens 5 via the emitting surface side and forms a first light spot on the lens 5, and the collimated light beam is reflected to the lens 5 via the reflecting mirror 4 to form a second light spot.

And S630, adjusting the posture of at least one of the auxiliary measuring plate 11 and the emitting surface until the first light spot and the second light spot coincide.

S640, disposing the reflecting mirror 4 on the receiving surface, and disposing the lens 5 between the auxiliary measuring plate 11 and the reflecting mirror 4.

S650, emitting a collimated light beam perpendicular to the emitting surface to the reflecting mirror 4.

Wherein the collimated light beam passes through the lens 5 via the emitting surface side and forms a third light spot on the lens 5, and the collimated light beam is reflected to the lens 5 via the reflecting mirror 4 to form a fourth light spot.

And S660, adjusting the gesture of the receiving surface until the third light spot and the fourth light spot coincide.

In this embodiment, by providing the lens 5 and the reflecting mirror 4 and using the light spot overlapping manner, the parallelism between the emitting surface emitting the collimated light beam, the auxiliary measuring plate 11, and the receiving surface receiving the diffracted light beam can be quickly adjusted, so that the parallelism between the emitting sensor head 3, the auxiliary measuring plate 11, and the receiving sensor head 12 can be quickly corrected, and the correction efficiency can be improved.

The application also provides a linearity measuring device 1. Referring to fig. 3 and 22, fig. 22 is a schematic structural diagram of a linearity measuring device according to an embodiment of the present application. In this embodiment, the linearity measuring device 1 includes an auxiliary measuring board 11, a receiving sensor head 12, and a processor 13. The auxiliary measuring plate 11 has a plurality of openings 111 arranged at intervals in a predetermined direction and parallel thereto, and the openings 111 have two edges 1111 arranged opposite to each other in the predetermined direction. The receiving sensor head 12 is disposed at one side of the auxiliary measuring plate 11, and is configured to receive a diffracted beam obtained by irradiating the auxiliary measuring plate 11 with a collimated beam. The processor 13 is electrically connected to the receiving sensor head 12, and the processor 13 is used in the steps S100 to S300.

In this embodiment, the processor 13 may be used to implement not only the steps S100 to S300, but also the steps corresponding to any of the foregoing embodiments, and the detailed implementation process is described in detail above and will not be repeated here.

The linearity measuring device 1 provided by the embodiment of the application can measure the linearity of the sensor in the assembly process of the transmitting sensor head 3, has high measuring speed and low measuring cost, and thus improves the production efficiency of the sensor.

Referring to fig. 15, 16 and 22, in the present embodiment, the linearity measuring apparatus 1 further includes a carrier assembly 14. The bearing assembly 14 includes a bracket 141, an adjusting bracket 142 and an adjusting member 143. The support 141 is used for carrying the first lens group 32, the reflecting mirror group 33 and the second lens group 34 of the emission sensor head 3. The adjusting frame 142 is carried by the bracket 141. The adjusting frame 142 is used for installing the laser 31 of the emission sensor head 3 and also used for adjusting the posture of the laser 31. The adjusting member 143 is cooperatively connected with the bracket 141 for adjusting the position of the first lens group 32 in a direction perpendicular to the direction in which the laser 31 is directed toward the first lens group 32. The light beam emitted from the laser 31 is emitted sequentially through the first lens group 32, the reflecting mirror group 33 and the second lens group 34. The processor 13 is further configured to measure the linearity of the sensor in real time during the adjustment of the emission sensor head 3, and determine the magnitude of the linearity of the sensor and a preset linearity. Wherein the sensor is composed of the transmitting sensor head 3 and the receiving sensor head 12.

In this embodiment, the adjustment of the emission sensor head 3 has been described in detail in the foregoing embodiments, and will not be described in detail herein.

The application also provides a linearity measuring device 1. Referring to fig. 23, fig. 23 is an electrical connection block diagram of a linearity measuring device according to an embodiment of the present application. In the present embodiment, the linearity measuring apparatus 1 includes a computer-readable storage medium 15 and a processor 13. The computer-readable storage medium 15 stores a computer-readable program. The processor 13 is configured to read and call the computer readable program to perform the linearity measurement method according to any of the foregoing embodiments.

In this embodiment, the processor 13 reads and invokes the computer readable program to execute the linearity measurement method according to any of the above embodiments, and the linearity measurement method has been described in detail above, and will not be described herein.

The linearity measuring device 1 provided by the embodiment of the application can call the linearity measuring method in the assembly process of the transmitting sensor head 3 so as to measure the linearity of the sensor in the assembly process of the transmitting sensor head 3, and has high measuring speed and low measuring cost, thereby improving the production efficiency of the sensor.

While embodiments of the present application have been shown and described above, it should be understood that the above embodiments are illustrative and not to be construed as limiting the application, and that variations, modifications, alternatives and alternatives to the above embodiments may be made by those skilled in the art within the scope of the application, which is also to be regarded as being within the scope of the application.

Claims

1. A linearity measurement method, characterized in that the linearity measurement method comprises:

Obtaining a first data set according to the abscissa of the diffraction peak groups, obtaining a second data set according to the coordinates of the edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set, wherein the obtaining the first data set according to the abscissa of the diffraction peak groups, obtaining the second data set according to the coordinates of the edges in the preset direction, and obtaining the linearity of the sensor according to the first data set and the second data set includes:

calculating the centroid of each edge diffraction peak to obtain the first data set (X1, X2, xn), wherein the set of diffraction peaks comprises one or both of the edge diffraction peaks, n being the total number of the edge diffraction peaks; wherein said calculating the centroid of each edge diffraction peak to obtain said first data set (X1, X2,..xn), comprises:

Deriving the first data set (X1, X2,) from the abscissa of the centroids of the plurality of edge diffraction peaks;

2. The linearity measurement method according to claim 1, wherein after said obtaining a first data set from the abscissa of said plurality of diffraction peak groups, obtaining a second data set from the coordinates of a plurality of said edges in said preset direction, and obtaining the linearity of the sensor from said first data set and said second data set, said linearity measurement method further comprises:

judging the linearity of the sensor and the preset linearity;

3. The method of claim 2, wherein when the linearity of the sensor is greater than the preset linearity, the adjusting the emission sensor head emitting the collimated light beam and re-selecting the first data set to re-calculate the linearity of the sensor comprises:

4. The method of claim 1, wherein before the receiving the diffracted beam of the collimated beam irradiated to the auxiliary measuring plate, the auxiliary measuring plate has a plurality of openings spaced apart and parallel along a predetermined direction, and the openings have two edges disposed opposite to each other along the predetermined direction, the method further comprises:

5. The method of claim 4, wherein correcting parallelism between an emission surface from which the collimated light beam exits, an auxiliary measuring plate, and a receiving surface from which the diffracted light beam is received, comprises:

6. A linearity measuring device, characterized in that the linearity measuring device comprises:

A processor electrically connected to the receiving sensor head, the processor configured to: converting the diffracted light beam into a waveform signal, wherein the waveform signal comprises a plurality of diffraction peak groups, one diffraction peak group corresponds to two edges of one opening, a first data set is obtained according to the abscissa of the plurality of diffraction peak groups, a second data set is obtained according to the coordinates of the plurality of edges in the preset direction, and the linearity of the sensor is obtained according to the first data set and the second data set;

7. The linearity measurement device of claim 6, further comprising a carrier assembly, said carrier assembly comprising:

8. A linearity measuring device, characterized in that the linearity measuring device comprises:

A processor for reading and invoking the computer readable program to perform the linearity measurement method of any of claims 1-5.