CN111060029A - Curvature radius measuring device and measuring method thereof - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及薄膜测量技术领域,特别是涉及一种曲率半径测量装置及其测量方法。The invention relates to the technical field of thin film measurement, in particular to a curvature radius measurement device and a measurement method thereof.
背景技术Background technique
薄膜技术被广泛应用于光学、电学、材料等技术领域,但是在薄膜的制造过程中,物理气相沉积等制备工艺都会使形成的薄膜内部存在较大的残余应力,而残余应力会导致薄膜弯曲甚至器件失效,薄膜的曲率半径是评价残余应力最直接的方式,因此在形成薄膜后,测量其曲率半径是一个关键的薄膜测量步骤。Thin film technology is widely used in optical, electrical, material and other technical fields, but in the process of film manufacturing, physical vapor deposition and other preparation processes will cause large residual stress inside the formed film, and the residual stress will cause the film to bend or even When the device fails, the curvature radius of the thin film is the most direct way to evaluate the residual stress. Therefore, after the thin film is formed, measuring its curvature radius is a key thin film measurement step.
单光点线扫描法是一种比较成熟的薄膜曲率半径测量方法,测量光束经过形变的样品表面反射,再经过光程放大后,采集偏移的位置从而计算样品的等效曲率半径,但是单光点线扫描法需要测量多组(通常大于10组)数据后才可以计算一次曲率半径值,单次测量用时大于20秒,而且多组测量数据容易受到如环境振动等干扰,从而影响测量结果。The single-spot line scanning method is a relatively mature method for measuring the curvature radius of thin films. The measuring beam is reflected by the deformed sample surface, and after optical path amplification, the offset position is collected to calculate the equivalent curvature radius of the sample. The light point line scanning method needs to measure multiple groups (usually more than 10 groups) of data before calculating the value of the radius of curvature once. A single measurement takes more than 20 seconds, and multiple groups of measurement data are susceptible to interference such as environmental vibration, which affects the measurement results. .
为了解决单光点线扫描法的测量时间和准确度问题,研究人员提出了平行光阵列法,通过将测量光束改变为平行光阵列,可以通过一次数据采集计算出样品的曲率半径,而且避免了环境干扰对测量准确度的影响。但是平行光阵列法需要高质量的平行光斑点阵,对光学器件的设计要求较高,其中最常用于生成平行光阵列的光学器件Etalon的制造成本很高,而且生成的光束末端亮度较低,因此对激光器强度、传感器敏感度以及样品表面的反射率都有较高的要求。In order to solve the measurement time and accuracy problems of the single-spot line scanning method, the researchers proposed the parallel light array method. By changing the measurement beam to a parallel light array, the radius of curvature of the sample can be calculated through one data acquisition, and it avoids the need for The effect of environmental disturbances on measurement accuracy. However, the parallel light array method requires high-quality parallel light spot arrays, which requires higher design of optical devices. The manufacturing cost of the optical device Etalon, which is most commonly used to generate parallel light arrays, is high, and the brightness of the generated beam ends is low. Therefore, there are high requirements on the laser intensity, sensor sensitivity and reflectivity of the sample surface.
发明内容SUMMARY OF THE INVENTION
基于此,有必要针对现有曲率半径测量方法对激光器强度、传感器敏感度以及样品表面的反射率都要求较高的问题,提供一种曲率半径测量装置及其测量方法。Based on this, it is necessary to provide a curvature radius measurement device and a measurement method for the problems that the existing curvature radius measurement methods have high requirements on laser intensity, sensor sensitivity and reflectivity of the sample surface.
为了实现本发明的目的,本发明采用如下技术方案:In order to realize the purpose of the present invention, the present invention adopts following technical scheme:
一种曲率半径测量装置,包括:A curvature radius measuring device, comprising:
样品台,用于承载待测量的样品;Sample stage, used to carry the sample to be measured;
衍射光阵列产生模块,用于产生并向样品发射衍射光阵列;a diffracted light array generating module, used for generating and emitting a diffracted light array to the sample;
探测分析模块,用于接收所述样品发出的反射光阵列,并根据接收到的反射光阵列的尺寸,获取样品的曲率半径。The detection and analysis module is configured to receive the reflected light array emitted by the sample, and obtain the radius of curvature of the sample according to the size of the received reflected light array.
在其中一个实施例中,所述探测分析模块包括:In one embodiment, the detection and analysis module includes:
传感器成像屏,用于接收所述样品发出的反射光阵列,并将所述反射光阵列的光信号转化为电信号;a sensor imaging screen, used for receiving the reflected light array emitted by the sample, and converting the light signal of the reflected light array into an electrical signal;
分析单元,与所述传感器成像屏电连接,用于根据所述电信号获取样品的曲率半径。The analysis unit is electrically connected to the sensor imaging screen, and is used for acquiring the curvature radius of the sample according to the electrical signal.
在其中一个实施例中,所述衍射光阵列的发射方向垂直于所述样品台,根据以下公式计算样品的曲率半径:In one embodiment, the emission direction of the diffracted light array is perpendicular to the sample stage, and the radius of curvature of the sample is calculated according to the following formula:
其中,in,
R为样品的曲率半径;R is the radius of curvature of the sample;
S为衍射光阵列从所述衍射光阵列产生模块到样品表面的第一路径的长度;S is the length of the first path of the diffracted light array from the diffracted light array generating module to the sample surface;
H为反射光阵列从所述样品表面到传感器成像屏的第二路径的长度;H is the length of the second path of the reflected light array from the sample surface to the sensor imaging screen;
β为所述衍射光阵列的发散角;β is the divergence angle of the diffracted light array;
D为所述反射光阵列在探测器上的实际落点与设定落点之间的距离。D is the distance between the actual landing point and the set landing point of the reflected light array on the detector.
在其中一个实施例中,所述曲率半径测量装置还包括半反半透镜片,所述半反半透镜片设于所述衍射光阵列产生模块与样品台之间,所述半反半透镜片与样品台之间的夹角为45°;In one of the embodiments, the curvature radius measuring device further includes a semi-reflective and semi-mirror sheet, the semi-reflective and semi-mirror sheet is arranged between the diffractive light array generating module and the sample stage, and the semi-reflective and semi-mirror sheet is The included angle with the sample stage is 45°;
衍射光阵列穿过所述半反半透镜片到达样品表面,再经过所述样品表面和半反半透镜片的反射,投射在与所述样品台垂直设置的传感器成像屏上。The diffracted light array passes through the semi-reflection and semi-mirror sheet to reach the surface of the sample, and is then reflected by the sample surface and the semi-reflection and semi-mirror sheet, and is projected on a sensor imaging screen arranged perpendicular to the sample stage.
在其中一个实施例中,所述样品台包括:In one embodiment, the sample stage includes:
台面,用于承载待测量的样品;table top, used to carry the sample to be measured;
二维运动机构,用于带动所述台面水平运动。A two-dimensional motion mechanism is used to drive the table top to move horizontally.
在其中一个实施例中,所述衍射光阵列产生模块包括:In one embodiment, the diffractive light array generating module includes:
激光器,用于发射初始探测光束;a laser for emitting the initial probe beam;
衍射光学镜片,用于将所述初始探测光束转化为衍射光阵列。A diffractive optical lens is used to convert the initial probe beam into a diffractive light array.
本发明的技术方案还提供了一种曲率半径测量方法,包括:The technical scheme of the present invention also provides a method for measuring the radius of curvature, including:
放置样品于样品台上;Place the sample on the sample stage;
发射衍射光阵列至所述样品的表面;emitting an array of diffracted light onto the surface of the sample;
接收样品发出的反射光阵列;Receive the reflected light array emitted by the sample;
根据所述反射光阵列,获取样品的单点曲率半径。According to the reflected light array, the single point curvature radius of the sample is obtained.
在其中一个实施例中,所述放置样品于样品台上的步骤前,还包括:校正曲率半径测量装置的机械参数。In one embodiment, before the step of placing the sample on the sample stage, the method further includes: correcting the mechanical parameters of the curvature radius measuring device.
在其中一个实施例中,所述校正曲率半径测量装置的机械参数的步骤,包括:In one of the embodiments, the step of correcting the mechanical parameters of the radius of curvature measuring device includes:
放置第一校正片于样品台上;Place the first calibration sheet on the sample stage;
发射衍射光阵列至所述第一校正片的表面;transmitting the diffracted light array to the surface of the first correction plate;
接收第一校正片发出的第一反射光阵列;receiving the first reflected light array emitted by the first correction sheet;
更换第一校正片为第二校正片,并重复以上发射衍射光阵列和接收反射光阵列步骤,获取第二反射光阵列;Replace the first calibration sheet with the second calibration sheet, and repeat the above steps of emitting the diffracted light array and receiving the reflected light array to obtain the second reflected light array;
根据所述第一反射光阵列、第二反射光阵列以及第一校正片和第二校正片的曲率半径,获取曲率半径测量装置的机械参数校正数据;According to the curvature radius of the first reflected light array, the second reflected light array and the first correction sheet and the second correction sheet, obtain the mechanical parameter correction data of the curvature radius measuring device;
导入所述校正数据至分析单元。Import the correction data into the analysis unit.
在其中一个实施例中,所述获取单点曲率半径的步骤后,还包括:In one embodiment, after the step of obtaining the single point curvature radius, the step further includes:
按照设定的方向和步长移动样品台;Move the sample stage according to the set direction and step size;
发射衍射光阵列至所述样品的表面;emitting an array of diffracted light onto the surface of the sample;
接收样品发出的反射光阵列;Receive the reflected light array emitted by the sample;
根据所述反射光阵列,获取样品当前位置的单点曲率半径;According to the reflected light array, obtain the single point curvature radius of the current position of the sample;
判定当前位置是否为最终位置,若是,结束测量并输出所述样品的多点曲率半径;否则重复以上移动样品台、发射衍射光阵列和接收反射光阵列步骤,以获取样品下一位置的曲率半径。Determine whether the current position is the final position, if so, end the measurement and output the multi-point curvature radius of the sample; otherwise, repeat the above steps of moving the sample stage, transmitting the diffracted light array and receiving the reflected light array to obtain the curvature radius of the next position of the sample .
在其中一个实施例中,所述获取样品的多点曲率半径的步骤后,还包括:根据所述多点曲率半径,绘制样品的曲率半径分布图。In one embodiment, after the step of acquiring the multi-point curvature radii of the sample, the method further includes: drawing a curvature radius distribution map of the sample according to the multi-point curvature radii.
上述曲率半径测量装置,包括样品台、衍射光阵列产生模块和探测分析模块,通过衍射光阵列产生模块产生并向样品发射衍射光阵列,到达样品表面后,经过样品表面反射发出反射光阵列,探测分析模块接收所述反射光阵列,并根据接收到的反射光阵列的尺寸,获取样品的曲率半径。衍射光阵列中的每束激光都与中心光束都存在一定的夹角,因此与光源距离不同,光斑阵列的大小也会不同,本发明利用衍射光阵列这一距离不同则阵列大小不同的特性,设计了使用衍射光阵列测量曲率半径的数学模型,并基于该数学模型实现了所述曲率半径测量装置,衍射光学器件客制化程度低、易于加工,而且生成的光斑阵列的每个光束亮度相近,有效避免了现有技术中部分光束亮度过低导致对硬件要求较高的问题,从而实现了一种结构简单、测量速度快,而且对激光器、传感器等硬件要求较低的曲率半径测量装置。The above-mentioned curvature radius measuring device includes a sample stage, a diffractive light array generating module and a detection and analysis module. The diffracted light array generating module generates and emits a diffracted light array to the sample. After reaching the sample surface, the reflected light array is reflected on the sample surface and detected. The analysis module receives the reflected light array, and obtains the radius of curvature of the sample according to the size of the received reflected light array. Each laser beam in the diffracted light array has a certain angle with the central beam, so the size of the light spot array will be different depending on the distance from the light source. A mathematical model for measuring the radius of curvature using a diffractive light array is designed, and the device for measuring the radius of curvature is implemented based on the mathematical model. The diffractive optical device is less customized and easy to process, and the brightness of each beam of the generated light spot array is similar , which effectively avoids the problem of high hardware requirements caused by the low brightness of some beams in the prior art, thereby realizing a curvature radius measurement device with simple structure, fast measurement speed, and low hardware requirements such as lasers and sensors.
附图说明Description of drawings
图1为一实施例中的曲率半径测量装置的计算模型示意图;1 is a schematic diagram of a calculation model of a curvature radius measuring device in an embodiment;
图2为一实施例中的曲率半径测量装置的结构示意图;2 is a schematic structural diagram of a curvature radius measuring device in an embodiment;
图3为一实施例中的衍射光阵列示意图;3 is a schematic diagram of a diffracted light array in an embodiment;
图4为一实施例中的曲率半径测量方法的流程图;4 is a flowchart of a method for measuring a radius of curvature in an embodiment;
图5为一实施例中的曲率半径测量方法的S500步骤的流程图;5 is a flowchart of steps S500 of the method for measuring the radius of curvature in an embodiment;
图6为一实施例中的多点曲率半径测量方法的流程图。FIG. 6 is a flowchart of a multi-point curvature radius measurement method in an embodiment.
具体实施方式Detailed ways
为了便于理解本发明,下面将参照相关附图对本发明进行更全面的描述。附图中给出了本发明的首选实施例。但是,本发明可以以许多不同的形式来实现,并不限于本文所描述的实施例。相反地,提供这些实施例的目的是使对本发明的公开内容更加透彻全面。In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the related drawings. Preferred embodiments of the invention are shown in the accompanying drawings. However, the present invention may be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
除非另有定义,本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本发明。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
在本发明的描述中,需要理解的是,术语“上”、“下”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方法或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "vertical", "horizontal", "inner", "outer", etc. is based on the drawings shown in the drawings. The method or positional relationship is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the indicated device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention .
本发明一实施例提供了一种曲率半径测量装置,包括:An embodiment of the present invention provides a curvature radius measurement device, including:
样品台100,用于承载待测量的样品;The
衍射光阵列产生模块200,用于产生并向样品发射衍射光阵列;a diffracted light
探测分析模块,用于接收所述样品发出的反射光阵列,并根据接收到的反射光阵列的尺寸,获取样品的曲率半径。The detection and analysis module is configured to receive the reflected light array emitted by the sample, and obtain the radius of curvature of the sample according to the size of the received reflected light array.
图1为本实施例的曲率半径测量装置的计算模型示意图,衍射光阵列从光源O点出射,发出的衍射光阵列到达样品表面后(图1中加粗实线为所述样品表面),经样品表面的反射,发出反射光阵列到达光接收平面。Fig. 1 is a schematic diagram of the calculation model of the curvature radius measuring device of the present embodiment. The diffracted light array is emitted from the light source point O. After the emitted diffracted light array reaches the surface of the sample (the bold solid line in Fig. 1 is the surface of the sample), Reflection from the sample surface, emits an array of reflected light to the light-receiving plane.
在本计算模型中,假定所述衍射光阵列包括两条光线,其中,出射方向垂直于所述样品表面待测量点的切面方向的光线定义为第一光线,出射方向与所述第一光线方向不同的另一光线定义为第二光线,所述第二光线照射在样品表面的A点,所述第一光线与第二光线之间的夹角为β,O’A与O’O之间的夹角为α(O’为样品所在的虚拟圆的圆心,所述虚拟圆的半径为样品曲率半径R)。首先,假设薄膜样品的曲率半径无穷大,即样品为不存在弯曲的平面,则所述第二光线的反射光线在光接收平面上的设定落点为P1;但是,薄膜样品的实际曲率半径并不是无穷大,那么反射光线在光接收平面上的实际落点为P2,P1和P2的位置之间存在一定的偏移距离D。此外,定义光源O点到样品表面的距离为S,样品表面A点到光接收平面的垂直距离为H,A点到O’O的垂直距离为W,所述参数α、β、R、D、S、H和W满足以下计算公式:In this calculation model, it is assumed that the diffracted light array includes two light rays, wherein the light ray whose exit direction is perpendicular to the tangential direction of the point to be measured on the sample surface is defined as the first light ray, and the exit direction is the same as the direction of the first light ray. Another different ray is defined as the second ray, the second ray irradiates the point A on the surface of the sample, the angle between the first ray and the second ray is β, between O'A and O'O The included angle is α (O' is the center of the virtual circle where the sample is located, and the radius of the virtual circle is the radius of curvature R of the sample). First, assuming that the radius of curvature of the film sample is infinite, that is, the sample is a plane without curvature, the set point of the reflected light of the second light on the light-receiving plane is P1; however, the actual radius of curvature of the film sample is not equal to is not infinite, then the actual landing point of the reflected light on the light receiving plane is P2, and there is a certain offset distance D between the positions of P1 and P2. In addition, define the distance from the light source O point to the sample surface as S, the vertical distance from the sample surface point A to the light receiving plane as H, the vertical distance from A point to O'O as W, the parameters α, β, R, D , S, H and W satisfy the following formulas:
D=KP2-KP1=Htan(2α+β)-Htan(β) (1)D=KP2-KP1=Htan(2α+β)-Htan(β) (1)
此外,薄膜沉积工艺制程所导致的样品弯曲的曲率半径通常大于5m,而第一光线和第二光线照射在样品表面的落点距离不大于5mm,因此,可以得到以下近似计算公式:In addition, the radius of curvature of the sample bending caused by the thin film deposition process is usually greater than 5m, and the distance between the first light and the second light irradiated on the surface of the sample is not greater than 5mm. Therefore, the following approximate calculation formula can be obtained:
W≈Stan(β) (3)W≈Stan(β) (3)
cos(α)≈1 (4)cos(α)≈1 (4)
对所述公式(1)~公式(4)进行求解,可以获得以下曲率半径计算公式:By solving the formulas (1) to (4), the following formulas for calculating the radius of curvature can be obtained:
进一步地,基于前述样品曲率半径通常大于5m,第一光线和第二光线照射在样品表面的距离不大于5mm的前提,样品与样品台100之间的间隙极小,S可以近似等于光源O点到样品台100表面的距离,H可以近似等于样品台100表面到光接收平面的距离,因此S和H可以认为是曲率半径测量装置的固有机械参数。而β为所述衍射光阵列的发散角,因此β为散射光阵列的固有光学参数。则所述曲率半径计算公式中的参数S、H和β均为已知数,根据所述偏移距离D测量结果,即可利用所述曲率半径计算公式获得所述样品的曲率半径R。Further, based on the premise that the radius of curvature of the sample is generally greater than 5 m, and the distance between the first light and the second light irradiated on the surface of the sample is not greater than 5 mm, the gap between the sample and the
根据所述曲率半径计算公式可知,基于本计算模型,可以仅需一次测量即可获得样品表面一个点的曲率半径,而无需连续获取多组数据进行测量,避免了振动等干扰对不同组数据结果的影响,从而实现了测量速度更快、结果更准确的曲率半径测量模型。According to the calculation formula of the radius of curvature, based on this calculation model, the radius of curvature of a point on the surface of the sample can be obtained by only one measurement, without the need to continuously acquire multiple sets of data for measurement, and avoid interference such as vibration on the results of different sets of data. Therefore, a curvature radius measurement model with faster measurement speed and more accurate results is realized.
在一实施例中,所述探测分析模块包括:In one embodiment, the detection and analysis module includes:
传感器成像屏310,用于接收所述样品发出的反射光阵列,并将所述反射光阵列的光信号转化为电信号;a
分析单元,与所述传感器成像屏310电连接,用于根据所述电信号获取样品的曲率半径。The analysis unit is electrically connected to the
如图2所示,所述传感器成像屏310即为前述光接收平面,所述分析单元为与所述传感器成像屏310电连接的数据处理设备,如电脑(图中未示出)。在一示例中,所述传感器成像屏310由CCD图像传感器构成,测量精度为10um,即可以区分落点距离不小于10um的两条光线,从而精确测量相邻光斑距离不小于10um的反射光阵列,传感器成像屏310获取所述反射光阵列后将电信号发送给分析单元,分析单元根据所述曲率半径计算公式获取所述样品的曲率半径。As shown in FIG. 2 , the
在本示例中,曲率半径测量装置的H和S均小于1m,基于所述测量精度为10um的传感器成像屏310,本示例中的曲率半径测量装置可以用于测量曲率半径范围为5m~200m的样品,且系统误差小于±1%。进一步地。可以根据样品的曲率半径选择相应的H和S,如曲率半径较大时,选择更大的样品到传感器成像屏310的距离H,从而放大反射光阵列,以获得更加准确的测量结果。In this example, H and S of the curvature radius measuring device are both less than 1 m. Based on the
在一实施例中,所述衍射光阵列产生模块200包括:In one embodiment, the diffractive light
激光器210,用于发射初始探测光束;a
衍射光学镜片220,用于将所述初始探测光束转化为衍射光阵列。The diffractive
在一示例中,所述衍射光阵列为如图3所示的5×5的光斑阵列,可以理解的是,所述衍射光阵列包含的光斑数量越多,投射到传感器成像屏310上的点也越多,即可以有更多的点用于计算样品的曲率半径,从而获取更高的测量准确度。但是,在激光器210的发光强度不变的前提下,经衍射光学镜片220转化后获得的每个光斑的光强与光斑数量成反比,进一步地,如果形成的衍射光阵列的发散角β不变,每个光斑之间的距离也与光斑数量成反比,而光斑的光强和相邻光斑之间的距离都会对所述传感器成像屏310的测量精度提出相应的要求,越高的测量精度要求即意味着更高的制造难度和制造成本。因此,应当选择恰当的衍射光学镜片220,以生成光斑数量适当的衍射光阵列,从而更好地平衡测量准确度和制造成本之间的关系。In an example, the diffractive light array is a 5×5 light spot array as shown in FIG. 3 . It can be understood that the more light spots the diffracted light array contains, the more spots projected on the
在一实施例中,如图2所示,所述曲率半径测量装置还包括半反半透镜片400,所述半反半透镜片400设于所述衍射光阵列产生模块200与样品台100之间,所述半反半透镜片400与样品台100之间的夹角为45°;In one embodiment, as shown in FIG. 2 , the curvature radius measuring device further includes a semi-reflection and
衍射光阵列穿过所述半反半透镜片400到达样品表面,再经过所述样品表面和半反半透镜片400的反射,投射在与所述样品台100垂直设置的传感器成像屏310上。The diffracted light array passes through the
通过所述半反半透镜片400改变反射光阵列的发射方向,可以防止所述激光器210和衍射光学镜片220遮挡反射光阵列,从而在传感器成像屏310上获取完整的反射光阵列,在本实施例中,S为从衍射光学镜片220到样品表面的路径长度,H为从样品表面到半反半透镜片400的路径长度H1与从半反半透镜片400到传感器成像屏310的路径长度H2之和。By changing the emission direction of the reflected light array by the semi-reflective
在一实施例中,所述样品台100包括台面和二维运动机构,所述台面用于承载待测量的样品,所述二维运动机构用于带动所述台面水平运动,通过所述水平运动,可以根据预设的测量逻辑对样品设定范围内的曲率半径进行测量,从而只需要一次参数设置,即可自动测量并获取样品内多个点的曲率半径测量数据,提高曲率半径测量装置的操作性和灵活性。In one embodiment, the
本发明的技术方案还提供了一种曲率半径测量方法,如图4所示,包括:The technical solution of the present invention also provides a method for measuring the radius of curvature, as shown in FIG. 4 , including:
S100:放置样品于样品台100上;S100: place the sample on the
S200:发射衍射光阵列至所述样品的表面;S200: emit a diffracted light array to the surface of the sample;
S300:接收样品发出的反射光阵列;S300: Receive the reflected light array emitted by the sample;
S400:根据所述反射光阵列,获取样品的单点曲率半径。S400: Acquire the single-point curvature radius of the sample according to the reflected light array.
在一实施例中,所述放置样品于样品台100上的步骤前,还包括S500:校正曲率半径测量装置的机械参数。根据所述曲率半径计算公式可知,需要根据曲率半径测量装置固有的机械参数H和S计算样品的曲率半径,但是所述机械参数H和S会由于外部振动等因素存在一定的变化,从而影响曲率半径的计算结果,因此通过所述校正机械参数的步骤可以进一步提高曲率半径测量装置的准确度。In an embodiment, before the step of placing the sample on the
在一示例中,如图5所示,所述校正曲率半径测量装置的机械参数的步骤,包括:In an example, as shown in FIG. 5 , the step of correcting the mechanical parameters of the curvature radius measuring device includes:
S510:放置第一校正片于样品台100上;S510: place the first calibration sheet on the
S520:发射衍射光阵列至所述第一校正片的表面;S520: Emit the diffracted light array to the surface of the first correction sheet;
S530:接收第一校正片发出的第一反射光阵列;S530: Receive the first reflected light array emitted by the first correction sheet;
S540:更换第一校正片为第二校正片,并重复以上发射衍射光阵列和接收反射光阵列步骤,获取第二反射光阵列;S540: Replace the first correction sheet with the second correction sheet, and repeat the above steps of emitting the diffracted light array and receiving the reflected light array to obtain the second reflected light array;
S550:根据所述第一反射光阵列、第二反射光阵列以及第一校正片和第二校正片的曲率半径,获取曲率半径测量装置的机械参数校正数据;S550: Acquire mechanical parameter correction data of the curvature radius measuring device according to the curvature radius of the first reflected light array, the second reflected light array, and the first correction sheet and the second correction sheet;
S560:导入所述校正数据至分析单元。S560: Import the correction data into the analysis unit.
本示例中已知所述第一校正片的曲率半径为R1,第二校正片的曲率半径为R2,将R1和R2作为已知数代入所述曲率半径计算公式,可以求解H和S准确的校正数据,分析单元则可以根据所述校正数据获得准确的样品曲率半径R。In this example, it is known that the radius of curvature of the first correction sheet is R1, and the radius of curvature of the second correction sheet is R2. By substituting R1 and R2 as known numbers into the calculation formula of the radius of curvature, the exact values of H and S can be solved. Correction data, the analysis unit can obtain the accurate sample curvature radius R according to the correction data.
在一实施例中,如图6所示,所述获取单点曲率半径的步骤后,还包括:In one embodiment, as shown in FIG. 6 , after the step of obtaining the single point curvature radius, the step further includes:
S610:按照设定的方向和步长移动样品台100;S610: Move the
S620:发射衍射光阵列至所述样品的表面;S620: emit a diffracted light array to the surface of the sample;
S630:接收样品发出的反射光阵列;S630: Receive the reflected light array emitted by the sample;
S640:根据所述反射光阵列,获取样品当前位置的单点曲率半径;S640: Acquire the single-point curvature radius of the current position of the sample according to the reflected light array;
S650:判定当前位置是否为最终位置,若是,结束测量并输出所述样品的多点曲率半径;否则重复以上移动样品台100、发射衍射光阵列和接收反射光阵列步骤,以获取样品下一位置的曲率半径。S650: Determine whether the current position is the final position, if so, end the measurement and output the multi-point curvature radius of the sample; otherwise, repeat the above steps of moving the
通过本实施例中的多点测量步骤,可以根据预设的测量逻辑对样品设定范围内的曲率半径进行测量,从而只需要一次参数设置,即可自动测量并获取样品内多个点的曲率半径测量数据,提高曲率半径测量的操作性和灵活性。具体地,操作人员选择样品表面的一测量区域,并设定测量步长,二维运动机构的控制组件自动根据所述测量步长在该测量区域内规划测量路径,每次单点测量后,二维运动机构根据该测量路径控制样品进行运动,直到当前位置为测量路径中的最终位置。Through the multi-point measurement step in this embodiment, the radius of curvature within the set range of the sample can be measured according to the preset measurement logic, so that only one parameter setting is required to automatically measure and obtain the curvature of multiple points in the sample Radius measurement data, improve the operability and flexibility of curvature radius measurement. Specifically, the operator selects a measurement area on the sample surface, and sets the measurement step length, and the control component of the two-dimensional motion mechanism automatically plans the measurement path in the measurement area according to the measurement step length. The two-dimensional motion mechanism controls the sample to move according to the measurement path until the current position is the final position in the measurement path.
在一实施例中,所述获取样品的多点曲率半径的步骤后,还包括:根据所述多点曲率半径,绘制样品的曲率半径分布图。通过所述曲率半径分布图,可以直观的获取和分析样品的曲率半径分布情况,进一步调节薄膜沉积的工艺参数或排除不良样品,从而提高器件整体的生产良率。In an embodiment, after the step of acquiring the multi-point curvature radii of the sample, the method further includes: drawing a curvature radius distribution map of the sample according to the multi-point curvature radii. Through the curvature radius distribution map, the curvature radius distribution of the sample can be intuitively acquired and analyzed, and the process parameters of film deposition can be further adjusted or defective samples can be excluded, thereby improving the overall production yield of the device.
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-described embodiments can be combined arbitrarily. For the sake of brevity, all possible combinations of the technical features in the above-described embodiments are not described. However, as long as there is no contradiction between the combinations of these technical features, All should be regarded as the scope described in this specification.
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only represent several embodiments of the present invention, and the descriptions thereof are specific and detailed, but should not be construed as a limitation on the scope of the invention patent. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can also be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention should be subject to the appended claims.
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