CN111060029A - Curvature radius measuring device and measuring method thereof - Google Patents
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- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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Abstract
The invention relates to a curvature radius measuring device and a measuring method thereof, wherein the curvature radius measuring device comprises a sample stage, a diffraction light array generating module and a detection and analysis module, the diffraction light array generating module generates and emits a diffraction light array to a sample, the diffraction light array is reflected by the surface of the sample to emit a reflection light array after reaching the surface of the sample, and the detection and analysis module receives the reflection light array and obtains the curvature radius of the sample according to the size of the received reflection light array. The invention designs a mathematical model for measuring the curvature radius by using the diffraction light array by utilizing the characteristic that the array size is different when the distance between the diffraction light array and the light source is different, and realizes the curvature radius measuring device which has simple structure, high measuring speed and lower requirements on hardware such as a laser, a sensor and the like on the basis of the mathematical model.
Description
Technical Field
The invention relates to the technical field of film measurement, in particular to a curvature radius measuring device and a curvature radius measuring method.
Background
The film technology is widely applied to the technical fields of optics, electricity, materials and the like, but in the manufacturing process of the film, the preparation processes of physical vapor deposition and the like can cause large residual stress to exist in the formed film, the residual stress can cause the film to bend or even cause device failure, the curvature radius of the film is the most direct mode for evaluating the residual stress, and therefore, the measurement of the curvature radius is a key film measurement step after the film is formed.
The single spot-line scanning method is a relatively mature method for measuring the curvature radius of a thin film, wherein a measuring beam is reflected by the surface of a deformed sample, and is amplified by an optical path, and then an offset position is collected, so that the equivalent curvature radius of the sample is calculated, but the single spot-line scanning method needs to measure a plurality of groups (usually more than 10 groups) of data before calculating the value of the curvature radius once, the single measurement lasts more than 20 seconds, and the plurality of groups of measuring data are easily interfered by environmental vibration and the like, so that the measuring result is influenced.
In order to solve the problems of measurement time and accuracy of a single-light point-line scanning method, researchers provide a parallel light array method, by changing a measuring light beam into a parallel light array, the curvature radius of a sample can be calculated through one-time data acquisition, and the influence of environmental interference on the measurement accuracy is avoided. However, the parallel light array method requires a high-quality parallel spot lattice, and has high requirements on the design of optical devices, wherein the optical device Etalon most commonly used for generating the parallel light array has high manufacturing cost, and the generated beam end has low brightness, so that the requirements on the laser intensity, the sensor sensitivity and the reflectivity of the sample surface are high.
Disclosure of Invention
Therefore, it is necessary to provide a curvature radius measuring device and a curvature radius measuring method thereof, aiming at the problem that the conventional curvature radius measuring method has high requirements on laser intensity, sensor sensitivity and reflectivity of a sample surface.
In order to realize the purpose of the invention, the invention adopts the following technical scheme:
a curvature radius measuring device comprising:
the sample stage is used for bearing a sample to be measured;
the diffraction light array generating module is used for generating and emitting diffraction light arrays to the sample;
and the detection analysis module is used for receiving the reflected light array emitted by the sample and acquiring the curvature radius of the sample according to the size of the received reflected light array.
In one embodiment, the probe analysis module comprises:
the sensor imaging screen is used for receiving the reflected light array emitted by the sample and converting the optical signal of the reflected light array into an electrical signal;
and the analysis unit is electrically connected with the sensor imaging screen and used for acquiring the curvature radius of the sample according to the electric signal.
In one embodiment, the emitting direction of the diffraction light array is perpendicular to the sample stage, and the curvature radius of the sample is calculated according to the following formula:
wherein,
r is the curvature radius of the sample;
s is the length of a first path of the diffraction light array from the diffraction light array generation module to the surface of the sample;
h is the length of a second path of the reflected light array from the sample surface to the sensor imaging screen;
β is the divergence angle of the diffracted light array;
and D is the distance between the actual landing point and the set landing point of the reflected light array on the detector.
In one embodiment, the curvature radius measuring device further comprises a semi-reflective and semi-transparent lens, the semi-reflective and semi-transparent lens is arranged between the diffraction light array generating module and the sample stage, and an included angle between the semi-reflective and semi-transparent lens and the sample stage is 45 degrees;
the diffraction light array penetrates through the semi-reflecting and semi-transparent lens to reach the surface of a sample, and is reflected by the surface of the sample and the semi-reflecting and semi-transparent lens to be projected on a sensor imaging screen which is perpendicular to the sample stage.
In one embodiment, the sample stage comprises:
the table top is used for bearing a sample to be measured;
and the two-dimensional movement mechanism is used for driving the table top to move horizontally.
In one embodiment, the diffractive light array generating module comprises:
a laser for emitting an initial probe beam;
a diffractive optic for converting the initial probe beam into a diffracted light array.
The technical scheme of the invention also provides a curvature radius measuring method, which comprises the following steps:
placing a sample on a sample table;
emitting a diffractive light array to a surface of the sample;
receiving a reflected light array emitted by a sample;
and acquiring the single-point curvature radius of the sample according to the reflected light array.
In one embodiment, before the step of placing the sample on the sample stage, the method further includes: and correcting the mechanical parameters of the curvature radius measuring device.
In one embodiment, the step of correcting the mechanical parameter of the curvature radius measuring device comprises:
placing a first correction sheet on a sample table;
emitting a diffraction light array to a surface of the first correction sheet;
receiving a first reflected light array emitted by a first correction sheet;
replacing the first correction sheet with a second correction sheet, repeating the steps of emitting the diffraction light array and receiving the reflected light array to obtain a second reflected light array;
acquiring mechanical parameter correction data of a curvature radius measuring device according to the curvature radii of the first reflection light array, the second reflection light array, the first correction sheet and the second correction sheet;
and importing the correction data to an analysis unit.
In one embodiment, after the step of obtaining the radius of curvature of the single point, the method further includes:
moving the sample stage according to the set direction and step length;
emitting a diffractive light array to a surface of the sample;
receiving a reflected light array emitted by a sample;
acquiring the single-point curvature radius of the current position of the sample according to the reflected light array;
judging whether the current position is the final position, if so, finishing the measurement and outputting the multipoint curvature radius of the sample; otherwise, repeating the steps of moving the sample stage, emitting the diffraction light array and receiving the reflected light array to obtain the curvature radius of the next position of the sample.
In one embodiment, after the step of obtaining the multi-point radius of curvature of the sample, the method further includes: and drawing a curvature radius distribution diagram of the sample according to the multi-point curvature radius.
The curvature radius measuring device comprises a sample stage, a diffraction light array generating module and a detection and analysis module, wherein the diffraction light array generating module generates and emits a diffraction light array to a sample, the diffraction light array is reflected by the surface of the sample to emit a reflected light array after reaching the surface of the sample, and the detection and analysis module receives the reflected light array and obtains the curvature radius of the sample according to the size of the received reflected light array. The invention designs a mathematical model for measuring the curvature radius by using the diffraction light array by utilizing the characteristic that the distance of the diffraction light array is different and the array size is different, and realizes the curvature radius measuring device based on the mathematical model, the customization degree of diffraction optical devices is low, the processing is easy, and the brightness of each beam of the generated light spot array is similar, thereby effectively avoiding the problem of higher requirement on hardware caused by the low brightness of part of beams in the prior art, and realizing the curvature radius measuring device which has simple structure, high measuring speed and lower requirement on hardware such as lasers, sensors and the like.
Drawings
FIG. 1 is a schematic diagram of a calculation model of a curvature radius measuring apparatus according to an embodiment;
FIG. 2 is a schematic diagram of an exemplary embodiment of a radius of curvature measuring device;
FIG. 3 is a schematic diagram of a diffractive light array in one embodiment;
FIG. 4 is a flow diagram of a method of curvature radius measurement in one embodiment;
FIG. 5 is a flowchart of the step S500 of the curvature radius measurement method in one embodiment;
FIG. 6 is a flow chart of a multipoint radius of curvature measurement method in an embodiment.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "vertical", "horizontal", "inner", "outer", etc. indicate orientations or positional relationships based on methods or positional relationships shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the referred devices or elements must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
An embodiment of the present invention provides a curvature radius measuring device, including:
a sample stage 100 for carrying a sample to be measured;
a diffraction light array generating module 200 for generating and emitting a diffraction light array to the sample;
and the detection analysis module is used for receiving the reflected light array emitted by the sample and acquiring the curvature radius of the sample according to the size of the received reflected light array.
Fig. 1 is a schematic view of a calculation model of the curvature radius measuring apparatus according to the present embodiment, in which a diffraction light array is emitted from a light source O, and after the emitted diffraction light array reaches a sample surface (a thick solid line in fig. 1 indicates the sample surface), a reflection light array is emitted to a light receiving plane by reflection on the sample surface.
In the calculation model, it is assumed that the diffraction light array comprises two light rays, wherein a light ray whose outgoing direction is perpendicular to the tangent plane direction of the point to be measured on the sample surface is defined as a first light ray, another light ray whose outgoing direction is different from the first light ray direction is defined as a second light ray, the second light ray irradiates the point a on the sample surface, the included angle between the first light ray and the second light ray is β, the included angle between O ' a and O ' is α (O ' is the center of a virtual circle where the sample is located, the radius of the virtual circle is the radius of curvature R of the sample), first, assuming that the radius of curvature of the film sample is infinite, i.e., the sample is a plane where no bending exists, the set landing point of the reflected light ray of the second light ray on the light receiving plane is P1, but the actual radius of curvature of the film sample is not infinite, then the actual landing point of the reflected light ray on the light receiving plane is P2, a certain offset distance d exists between positions 1 and P2, and furthermore, the distance from the light source O point to the sample surface is defined as a, a distance H, 6778, W, and W are calculated as the following parameters:
D＝KP2-KP1＝Htan(2α+β)-Htan(β) (1)
in addition, the radius of curvature of the sample bend caused by the thin film deposition process is usually larger than 5m, and the distance between the falling points of the first light and the second light irradiated on the sample surface is not larger than 5mm, so that the following approximate calculation formula can be obtained:
W≈Stan(β) (3)
cos(α)≈1 (4)
solving the equations (1) to (4) can obtain the following curvature radius calculation equations:
further, based on the premise that the curvature radius of the sample is usually larger than 5m, and the distance between the first light and the second light irradiated on the surface of the sample is not more than 5mm, the gap between the sample and the sample stage 100 is extremely small, S can be approximately equal to the distance between the point O of the light source and the surface of the sample stage 100, and H can be approximately equal to the distance between the surface of the sample stage 100 and the light receiving plane, so S and H can be considered as intrinsic mechanical parameters of the curvature radius measuring device, and β is the divergence angle of the diffraction light array, so β is the intrinsic optical parameters of the scattering light array.
According to the curvature radius calculation formula, based on the calculation model, the curvature radius of one point on the surface of the sample can be obtained only by one-time measurement without continuously obtaining multiple groups of data for measurement, so that the influence of interference such as vibration on different groups of data results is avoided, and the curvature radius measurement model with higher measurement speed and more accurate results is realized.
In one embodiment, the probe analysis module comprises:
the sensor imaging screen 310 is used for receiving the reflected light array emitted by the sample and converting the optical signal of the reflected light array into an electrical signal;
and the analysis unit is electrically connected with the sensor imaging screen 310 and is used for acquiring the curvature radius of the sample according to the electric signal.
As shown in fig. 2, the sensor imaging screen 310 is the light receiving plane, and the analysis unit is a data processing device, such as a computer (not shown), electrically connected to the sensor imaging screen 310. In an example, the sensor imaging screen 310 is composed of a CCD image sensor, the measurement precision is 10um, that is, two light beams with a falling point distance not less than 10um can be distinguished, so that the distance between adjacent light spots is accurately measured and the reflected light array with a distance not less than 10um is obtained, the sensor imaging screen 310 sends an electric signal to an analysis unit after the reflected light array, and the analysis unit obtains the curvature radius of the sample according to the curvature radius calculation formula.
In the present example, both H and S of the curvature radius measuring device are smaller than 1m, and the curvature radius measuring device in the present example can be used for measuring a sample with a curvature radius range of 5m to 200m based on the sensor imaging screen 310 with a measurement accuracy of 10um, and the system error is smaller than ± 1%. Further, the method is carried out. The corresponding H and S may be selected according to the radius of curvature of the sample, for example, when the radius of curvature is larger, the larger distance H from the sample to the sensor imaging screen 310 may be selected, so as to enlarge the reflected light array, and obtain a more accurate measurement result.
In one embodiment, the diffractive light array generating module 200 comprises:
a laser 210 for emitting an initial probe beam;
a diffractive optic 220 for converting the initial probe beam into a diffracted light array.
In one example, the diffractive optical array is a 5 × 5 array of light spots as shown in fig. 3, it is understood that the diffractive optical array comprises a larger number of light spots, and a larger number of points projected onto the sensor imaging screen 310, i.e. more points can be used to calculate the radius of curvature of the sample, thereby obtaining a higher measurement accuracy.
In an embodiment, as shown in fig. 2, the curvature radius measuring device further includes a transflective lens 400, the transflective lens 400 is disposed between the diffractive light array generating module 200 and the sample stage 100, and an included angle between the transflective lens 400 and the sample stage 100 is 45 °;
the diffracted light array passes through the transflective lens 400 to reach the surface of the sample, and is reflected by the surface of the sample and the transflective lens 400 to be projected on a sensor imaging screen 310 perpendicular to the sample stage 100.
By changing the emitting direction of the reflective array through the transflective lens 400, the laser 210 and the diffractive optical element 220 can be prevented from blocking the reflective array, so as to obtain a complete reflective array on the sensor imaging screen 310, in this embodiment, S is the path length from the diffractive optical element 220 to the sample surface, and H is the sum of the path length H1 from the sample surface to the transflective lens 400 and the path length H2 from the transflective lens 400 to the sensor imaging screen 310.
In an embodiment, the sample stage 100 includes a stage surface and a two-dimensional movement mechanism, the stage surface is used for bearing a sample to be measured, the two-dimensional movement mechanism is used for driving the stage surface to move horizontally, and the curvature radius within a sample setting range can be measured according to a preset measurement logic through the horizontal movement, so that the curvature radius measurement data of a plurality of points in the sample can be automatically measured and obtained only by one-time parameter setting, and the operability and flexibility of the curvature radius measurement device are improved.
The technical scheme of the invention also provides a curvature radius measuring method, as shown in fig. 4, comprising the following steps:
s100: placing a sample on the sample stage 100;
s200: emitting a diffractive light array to a surface of the sample;
s300: receiving a reflected light array emitted by a sample;
s400: and acquiring the single-point curvature radius of the sample according to the reflected light array.
In an embodiment, before the step of placing the sample on the sample stage 100, the method further includes step S500: and correcting the mechanical parameters of the curvature radius measuring device. According to the curvature radius calculation formula, the curvature radius of the sample needs to be calculated according to the mechanical parameters H and S inherent to the curvature radius measuring device, but the mechanical parameters H and S have certain changes due to factors such as external vibration and the like, so that the calculation result of the curvature radius is influenced, and the accuracy of the curvature radius measuring device can be further improved through the step of correcting the mechanical parameters.
In one example, as shown in fig. 5, the step of correcting the mechanical parameter of the curvature radius measuring device includes:
s510: placing a first correction sheet on the sample stage 100;
s520: emitting a diffraction light array to a surface of the first correction sheet;
s530: receiving a first reflected light array emitted by a first correction sheet;
s540: replacing the first correction sheet with a second correction sheet, repeating the steps of emitting the diffraction light array and receiving the reflected light array to obtain a second reflected light array;
s550: acquiring mechanical parameter correction data of a curvature radius measuring device according to the curvature radii of the first reflection light array, the second reflection light array, the first correction sheet and the second correction sheet;
s560: and importing the correction data to an analysis unit.
In this example, when the curvature radius of the first correction sheet is known as R1 and the curvature radius of the second correction sheet is known as R2, R1 and R2 are used as known numbers in the curvature radius calculation formula, accurate correction data of H and S can be obtained, and the analysis unit can obtain an accurate sample curvature radius R from the correction data.
In an embodiment, as shown in fig. 6, after the step of obtaining the radius of curvature of the single point, the method further includes:
s610: moving the sample stage 100 according to the set direction and step length;
s620: emitting a diffractive light array to a surface of the sample;
s630: receiving a reflected light array emitted by a sample;
s640: acquiring the single-point curvature radius of the current position of the sample according to the reflected light array;
s650: judging whether the current position is the final position, if so, finishing the measurement and outputting the multipoint curvature radius of the sample; otherwise, the above steps of moving the sample stage 100, emitting the diffraction light array and receiving the reflected light array are repeated to obtain the radius of curvature of the next position of the sample.
Through the multi-point measurement step in the embodiment, the curvature radius of the sample within the set range can be measured according to the preset measurement logic, so that the curvature radius measurement data of a plurality of points in the sample can be automatically measured and obtained only by once parameter setting, and the operability and flexibility of curvature radius measurement are improved. Specifically, an operator selects a measuring area on the surface of the sample, sets a measuring step length, a control assembly of the two-dimensional movement mechanism automatically plans a measuring path in the measuring area according to the measuring step length, and after each single-point measurement, the two-dimensional movement mechanism controls the sample to move according to the measuring path until the current position is the final position in the measuring path.
In one embodiment, after the step of obtaining the multi-point radius of curvature of the sample, the method further includes: and drawing a curvature radius distribution diagram of the sample according to the multi-point curvature radius. By the curvature radius distribution diagram, the distribution condition of the curvature radius of the sample can be visually obtained and analyzed, the technological parameters of film deposition are further adjusted or bad samples are eliminated, and therefore the overall production yield of the device is improved.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (11)
1. A curvature radius measuring device, comprising:
the sample stage is used for bearing a sample to be measured;
the diffraction light array generating module is used for generating and emitting diffraction light arrays to the sample;
and the detection analysis module is used for receiving the reflected light array emitted by the sample and acquiring the curvature radius of the sample according to the size of the received reflected light array.
2. The radius of curvature measurement device of claim 1, wherein the probe analysis module comprises:
the sensor imaging screen is used for receiving the reflected light array emitted by the sample and converting the optical signal of the reflected light array into an electrical signal;
and the analysis unit is electrically connected with the sensor imaging screen and used for acquiring the curvature radius of the sample according to the electric signal.
3. The radius of curvature measuring device of claim 2, wherein the emitting direction of the diffractive light array is perpendicular to the sample stage, and the radius of curvature of the sample is calculated according to the following formula:
wherein,
r is the curvature radius of the sample;
s is the length of a first path of the diffraction light array from the diffraction light array generation module to the surface of the sample;
h is the length of a second path of the reflected light array from the sample surface to the sensor imaging screen;
β is the divergence angle of the diffracted light array;
and D is the distance between the actual landing point and the set landing point of the reflected light array on the detector.
4. The curvature radius measuring device according to claim 2, further comprising a transflective lens, wherein the transflective lens is disposed between the diffractive light array generating module and the sample stage, and an included angle between the transflective lens and the sample stage is 45 °;
the diffraction light array penetrates through the semi-reflecting and semi-transparent lens to reach the surface of a sample, and is reflected by the surface of the sample and the semi-reflecting and semi-transparent lens to be projected on a sensor imaging screen which is perpendicular to the sample stage.
5. The radius of curvature measuring device of claim 1, wherein the sample stage comprises:
the table top is used for bearing a sample to be measured;
and the two-dimensional movement mechanism is used for driving the table top to move horizontally.
6. The radius of curvature measurement device of claim 1, wherein the diffractive light array generation module comprises:
a laser for emitting an initial probe beam;
a diffractive optic for converting the initial probe beam into a diffracted light array.
7. A curvature radius measurement method includes:
placing a sample on a sample table;
emitting a diffractive light array to a surface of the sample;
receiving a reflected light array emitted by a sample;
and acquiring the single-point curvature radius of the sample according to the reflected light array.
8. The method of claim 7, wherein before the step of placing the sample on the sample stage, the method further comprises: and correcting the mechanical parameters of the curvature radius measuring device.
9. The method of claim 8, wherein the step of correcting the mechanical parameters of the radius of curvature measuring device comprises:
placing a first correction sheet on a sample table;
emitting a diffraction light array to a surface of the first correction sheet;
receiving a first reflected light array emitted by a first correction sheet;
replacing the first correction sheet with a second correction sheet, repeating the steps of emitting the diffraction light array and receiving the reflected light array to obtain a second reflected light array;
acquiring mechanical parameter correction data of a curvature radius measuring device according to the curvature radii of the first reflection light array, the second reflection light array, the first correction sheet and the second correction sheet;
and importing the correction data to an analysis unit.
10. The method of claim 9, wherein the step of obtaining a single point radius of curvature further comprises, after the step of obtaining a single point radius of curvature:
moving the sample stage according to the set direction and step length;
emitting a diffractive light array to a surface of the sample;
receiving a reflected light array emitted by a sample;
acquiring the single-point curvature radius of the current position of the sample according to the reflected light array;
judging whether the current position is the final position, if so, finishing the measurement and outputting the multipoint curvature radius of the sample; otherwise, repeating the steps of moving the sample stage, emitting the diffraction light array and receiving the reflected light array to obtain the curvature radius of the next position of the sample.
11. The method of claim 10, wherein the step of obtaining the multi-point radius of curvature of the sample is followed by the step of: and drawing a curvature radius distribution diagram of the sample according to the multi-point curvature radius.
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| PCT/CN2020/072313 WO2021128517A1 (en) | 2019-12-23 | 2020-01-15 | Radius of curvature measurement apparatus and radius of curvature measurement method |
| US17/797,625 US20230054161A1 (en) | 2019-12-23 | 2020-01-15 | Device and method for measuring curvature radius |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111351445A (en) * | 2020-04-15 | 2020-06-30 | 山东大学 | System and method for measuring and calculating radius and deflection angle of circular curve of road curve |
| CN113776424A (en) * | 2021-08-25 | 2021-12-10 | 中南大学 | Bending radius measuring device and method for flexible piezoelectric composite material |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5912738A (en) * | 1996-11-25 | 1999-06-15 | Sandia Corporation | Measurement of the curvature of a surface using parallel light beams |
| CN101034034A (en) * | 2007-01-31 | 2007-09-12 | 中国人民解放军国防科学技术大学 | Method and device for aspherical mirror diffraction image |
| US20180052115A1 (en) * | 2016-08-19 | 2018-02-22 | Industrial Technology Research Institute | Apparatus for measuring a curvature of a thin film and the method thereof |
| CN211121098U (en) * | 2019-12-23 | 2020-07-28 | 深圳市速普仪器有限公司 | Curvature radius measuring device |
-
2019
- 2019-12-23 CN CN201911338140.9A patent/CN111060029A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5912738A (en) * | 1996-11-25 | 1999-06-15 | Sandia Corporation | Measurement of the curvature of a surface using parallel light beams |
| CN101034034A (en) * | 2007-01-31 | 2007-09-12 | 中国人民解放军国防科学技术大学 | Method and device for aspherical mirror diffraction image |
| US20180052115A1 (en) * | 2016-08-19 | 2018-02-22 | Industrial Technology Research Institute | Apparatus for measuring a curvature of a thin film and the method thereof |
| CN211121098U (en) * | 2019-12-23 | 2020-07-28 | 深圳市速普仪器有限公司 | Curvature radius measuring device |
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