CN116695061B - Uniform air supply device for vacuum plating of alumina film - Google Patents
Uniform air supply device for vacuum plating of alumina film Download PDFInfo
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- CN116695061B CN116695061B CN202310943157.7A CN202310943157A CN116695061B CN 116695061 B CN116695061 B CN 116695061B CN 202310943157 A CN202310943157 A CN 202310943157A CN 116695061 B CN116695061 B CN 116695061B
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- 238000007747 plating Methods 0.000 title claims abstract description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims description 12
- 238000013016 damping Methods 0.000 claims abstract description 32
- 230000003068 static effect Effects 0.000 claims abstract description 13
- 230000007246 mechanism Effects 0.000 claims abstract description 10
- 230000000149 penetrating effect Effects 0.000 claims abstract description 8
- 238000009792 diffusion process Methods 0.000 claims description 17
- 238000007789 sealing Methods 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000001771 vacuum deposition Methods 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 97
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 8
- 239000001301 oxygen Substances 0.000 abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 abstract description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract description 7
- 230000001105 regulatory effect Effects 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 239000011148 porous material Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The invention relates to a uniform air supply device for a vacuum plating aluminum oxide film, which comprises a lower die and an upper die, wherein the upper surface of the lower die is provided with a groove, the upper surface of the groove is provided with a main cavity, the upper die is fixedly arranged in the groove and seals the top of the main cavity, the top of the upper die is provided with an air inlet hole in a penetrating way, the top of the lower die shell is provided with a plurality of air exhaust holes close to the edge of the groove, the air exhaust holes are internally provided with air pressure regulating mechanisms, under the distribution efficiency of the main cavity, more uniform air enters the air exhaust holes through a secondary channel, and damping diaphragms are arranged in the air exhaust holes, so that the aperture of the diaphragms can be regulated for oxygen with different concentrations to homogenize the output air; meanwhile, the gas flows through the gas homogenizing holes of the damping diaphragm, the dynamic pressure of the gas entering the output pipeline is increased relative to that of the main cavity, and meanwhile, the gas static pressure in the buffer gap is increased, so that the uniform output of the gas is realized.
Description
Technical Field
The invention relates to a vacuum coating air supply device, in particular to a uniform air supply device for vacuum coating aluminum oxide films.
Background
In the prior art, when producing an alumina film, oxygen and aluminum vapor are generally introduced into a vacuum reaction vessel to react to obtain the alumina film, namely aluminum is gasified into aluminum vapor at a high temperature and introduced into the reaction vessel, and oxygen is introduced into the reaction vessel.
At present, an oxygen supply device generally adopts a circular tube with the diameter of about 12 mm, tiny holes are drilled at equal distance or equal difference on a straight line, gas is input from one end or is input from two ends at the same time, the gas is distributed in the circular tube through gas static pressure, and then the gas is output to a reaction environment through the tiny holes; the method has the defects of poor uniformity of gas distribution, uneven gas quality output by each micro hole, easy blockage of the micro hole, inconvenient cleaning operation and the like because of the incapability of uniform gas when the gas input amount is smaller, and therefore, the invention aims to provide a uniform gas supply device for vacuum aluminum oxide film plating.
Disclosure of Invention
The invention aims to solve the defects in the background technology by providing a uniform air supply device for vacuum plating of an alumina film.
The technical scheme adopted by the invention is as follows:
the utility model provides a even air feeder of vacuum plating alumina membrane, including bed die and last mould, the bed die upper surface is seted up flutedly, the main cavity body has been seted up to the recess upper surface, go up mould fixed mounting in the recess and seal the main cavity body top, just go up the mould top and run through and set up the inlet port, the bed die casing top is close to recess edge and has seted up a plurality of exhaust holes, a plurality of all be provided with air pressure adjustment mechanism in the exhaust hole, air pressure adjustment mechanism is used for adjusting the dynamic pressure of exhaust hole internal gas, just the recess lateral wall has seted up the second grade passageway with exhaust hole intercommunication, still includes:
the air inlet pipeline is arranged in the air inlet hole and is used for conveying air into the main cavity;
the output pipeline is arranged in the exhaust hole and is used for uniformly outputting gas.
As a preferred technical scheme of the invention: the bottom of the exhaust hole is of a conical structure, a through hole communicated with the secondary channel is formed in the bottom of the conical structure in a penetrating mode, the aperture of the through hole is smaller than that of the exhaust hole, and the aperture of the through hole is smaller than that of the secondary channel.
As a preferred technical scheme of the invention: the air pressure adjusting mechanism comprises a limiting ring and a damping diaphragm arranged below the limiting ring, wherein the limiting ring is installed in the exhaust hole in a threaded mode, and a buffer gap is reserved between the limiting ring and the conical structure.
As a preferred technical scheme of the invention: the damping diaphragm is arranged in the buffer gap, and an air homogenizing hole is formed in the center of the damping diaphragm in a penetrating manner.
As a preferred technical scheme of the invention: when the upper die is fixedly arranged in the groove, the top of the main cavity is in a sealing state, the air inlet is communicated with the main cavity, and the air inlet is positioned at the center of the top of the main cavity.
As a preferred technical scheme of the invention: the output pipeline comprises a gas pipe, one end of the gas pipe is provided with a connecting seat, the other end of the gas pipe is provided with a diffusion cap in a threaded manner, and the diffusion cap is in a vertical state.
As a preferred technical scheme of the invention: the connecting seat is arranged in the exhaust hole in a threaded mode, the aperture size of the gas transmission pipe is the same as that of the pipeline of the connecting seat, and the output pipeline is of a Z-shaped structure.
As a preferred technical scheme of the invention: the aperture size of the diffusion cap is larger than that of the gas pipe.
As a preferred technical scheme of the invention: the pressure relief hole communicated with the secondary channel is formed in one side of the lower die shell in a penetrating mode, and a sealing plug is arranged in the pressure relief hole.
Compared with the prior art, the invention has the beneficial effects that:
1. in the uniform air supply device of the vacuum plating aluminum oxide film, under the distribution efficiency of the main cavity, more uniform gas enters the exhaust hole through the secondary channel, the damping diaphragm is arranged in the exhaust hole, and the aperture of the diaphragm can be adjusted for oxygen with different concentrations to homogenize the output gas; meanwhile, the gas flows through the gas homogenizing holes of the damping diaphragm, the dynamic pressure of the gas entering the output pipeline is increased relative to that of the main cavity, and meanwhile, the gas static pressure in the buffer gap is increased, so that the uniform output of the gas is realized.
2. In the uniform air supply device of the vacuum plating aluminum oxide film, the diffusion cap is vertically arranged on the air pipe, and because gas molecules are heavy, the diffusion cap is vertically arranged, and because of self-damping of the gas, only enough gas molecules can flow out correspondingly, meanwhile, the aperture of the diffusion cap is larger than that of the air pipe, and the air passage is changed from small to large from dynamic pressure to static pressure, thereby being beneficial to gas diffusion and reaction at an outlet and facilitating cleaning of a pipeline; meanwhile, a plurality of output pipelines form a batch gas transmission pipeline, so that the gas transmission efficiency is improved.
Drawings
Fig. 1 is a schematic overall structure of a preferred embodiment of the present invention.
Fig. 2 is a schematic view of the lower die structure according to the preferred embodiment of the present invention.
Fig. 3 is a schematic view of the structure of fig. 2 a according to a preferred embodiment of the present invention.
Fig. 4 is a schematic view of the upper die structure in the preferred embodiment of the invention.
Fig. 5 is a schematic diagram of the structure of the output pipeline in the preferred embodiment of the invention.
Fig. 6 is a schematic view of a partial cross-sectional structure of a mold in a preferred embodiment of the invention.
Fig. 7 is a schematic view of the structure of fig. 6B according to a preferred embodiment of the present invention.
FIG. 8 is a second schematic view of a partial cross-sectional structure of a mold in a preferred embodiment of the invention.
FIG. 9 is a schematic view of an application environment of the air supply uniformity device in the present invention.
The meaning of each label in the figure is:
1. a lower die; 101. a groove; 102. a main cavity;
103. a secondary channel; 104. an exhaust hole; 1041. a limiting ring; 1042. damping membrane; 1043. a through hole;
105. a second screw hole;
2. an upper die; 201. an air inlet hole; 202. a first screw hole;
3. an air intake line;
4. an output line; 401. a gas pipe; 402. a connecting seat; 403. a diffusion cap.
Detailed Description
It should be noted that, under the condition of no conflict, the embodiments of the present embodiments and features in the embodiments may be combined with each other, and the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and obviously, the described embodiments are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1:
referring to fig. 1-8, an objective of the present embodiment is to provide a uniform air supply device for vacuum aluminum oxide film plating, including a lower mold 1 and an upper mold 2, the upper surface of the lower mold 1 is provided with a groove 101, the upper surface of the groove 101 is provided with a main cavity 102, the upper mold 2 is fixedly installed in the groove 101 and seals the top of the main cavity 102, concretely, the peripheral edge of the upper surface of the upper mold 2 is provided with a first screw hole 202, the surface of the lower mold 1 is provided with a second screw hole 105 adapted to the first screw hole 202, when the upper mold 2 is required to be fixedly installed in the groove 101, one end of a bolt penetrates into the first screw hole 202 and is threadedly installed in the second screw hole 105, the upper mold 2 is fixedly installed in the groove 101 through threads, and the top of the upper mold 2 is provided with an air inlet 201, when the upper mold 2 is fixedly installed in the groove 101, the top of the main cavity 102 is in a sealing state, and the air inlet 201 is communicated with the main cavity 102, and when the air is introduced into the air inlet 201 through the air inlet pipeline 3, the air inlet 3, the air can rapidly and uniformly spread to the air inlet 3, and is exhausted to the main cavity 102, and the air inlet 3 is distributed in the air inlet 3, and the air inlet 3 is discharged into the air inlet 3, and the air inlet 3 is gradually and the air inlet 3 is exhausted to the air inlet 3, and the air inlet 3 is gradually and the air inlet 3 is distributed in order to realize the air inlet 3.
In order to ensure that gas can be uniformly discharged through multiple paths, a plurality of exhaust holes 104 are formed in the top of the shell of the lower die 1 and close to the edge of the groove 101, so that the gas discharged from the exhaust holes 104 is uniformly and stably ensured, and therefore, air pressure adjusting mechanisms are arranged in the exhaust holes 104, wherein the air pressure adjusting mechanisms are used for adjusting the dynamic pressure of the gas in the exhaust holes 104, the side wall of the groove 101 is provided with a secondary channel 103 communicated with the exhaust holes 104, the groove 101 is communicated with the exhaust holes 104 through the secondary channel 103, the gas enters the main cavity 102 from the air inlet pipeline 3, at the moment, the gas is transferred into static pressure by dynamic pressure, the first gas distribution is realized, the gas is distributed into all branch conveying channels along with the increase of the pressure and weight of the gas in the main cavity 102, the relatively uniform gas enters the exhaust holes 104 through the secondary channel 103, the gas flows through the uniform air holes of the damping diaphragms 1042, the dynamic pressure of the gas in the output pipeline 4 is increased relative to the main cavity 102, and the gas static pressure in the buffer clearance is increased, and the uniform gas output is realized;
damping diaphragm 1042 is slidably mounted within the buffer gap, wherein: the air pressure adjusting mechanism comprises a limiting ring 1041 and a damping diaphragm 1042 arranged below the limiting ring 1041, wherein the limiting ring 1041 is arranged in the air exhaust hole 104 in a threaded manner, a buffer gap is reserved between the limiting ring 1041 and the conical structure, the limiting ring 1041 is used for limiting the sliding range of the damping diaphragm 1042, and the buffer gap is used for guaranteeing the static pressure of air and realizing uniform output of air;
because damping diaphragm 1042 slidable mounting is in the buffer gap, and damping diaphragm 1042 center department runs through and has offered even gas pocket, damping diaphragm 1042 outer wall and exhaust hole 104 inner wall closely laminate, when gas promotes damping diaphragm 1042 constantly change, damping diaphragm 1042 slides along exhaust hole 104 inner wall, be used for guaranteeing the gas dynamic pressure that flows through even gas pocket stable, and even gas pocket is less than exhaust hole 104 internal diameter size, therefore, gas when gas flows through-hole 1043, gas dynamic pressure increases, and gas promotes damping diaphragm 1042, adjust gas stability through damping diaphragm 1042, consume surplus energy through damping diaphragm 1042 gliding damping structure to the gas that gets into in the exhaust hole 104, realize the buffering to the gas, improve gas stability, the gas can be full of toper structure and buffer gap gradually, finally, gas gets into gas pipe 401 through even gas pocket, make the gas static pressure in the gas pipe 401 promote, the aperture of even gas pocket can change according to oxygen concentration's difference, make output gas homogenization.
The lower die 1 is provided with the output pipelines 4, the output pipelines 4 are arranged in the exhaust holes 104, a plurality of output pipelines 4 form batch gas transmission pipelines, the gas transmission efficiency is improved, the bottom of the exhaust holes 104 is of a conical structure, enough buffer gaps are reserved for enabling gas to enter the buffer gaps, the gas dynamic pressure is reduced, the static pressure is increased, excessive energy pushes the damping diaphragm 1042 to keep the static pressure in the buffer gaps stable, the bottom of the conical structure is provided with through holes 1043 communicated with the secondary channels 103 in a penetrating way, the aperture of each through hole 1043 is smaller than that of each exhaust hole 104, the aperture of each through hole 1043 is smaller than that of each secondary channel 103, and the output pipelines 4 are used for uniformly outputting the gas;
further, the output pipeline 4 comprises a gas pipe 401, one end of the gas pipe 401 is provided with a connecting seat 402, the other end of the gas pipe 401 is provided with a diffusion cap 403 in a threaded manner, in order to facilitate the disassembly of the output pipeline 4, the connecting seat 402 is arranged in the exhaust hole 104 in a threaded manner, the bottom of the connecting seat 402 is tightly contacted with the upper surface of the limiting ring 1041, the pore size of the gas pipe 401 is the same as that of a pipeline of the connecting seat 402, the pore size of the gas pipe 401 is smaller than that of the exhaust hole 104, the pore size of a uniform gas hole is smaller than that of the gas pipe 401, the pressure at the outlet position is ensured to be the same, the uniform and stable flow of the exhausted gas is ensured, the output pipeline 4 is in a Z-shaped structure, and the diffusion cap 403 is in a vertical state, and because gas molecules are heavy, the diffusion cap 403 is vertically arranged, and is also a self-damping gas is deposited in a vertically arranged part through the weight of the gas itself, and can not flow out in an overflow state until the vertical part is full of the gas molecules; further, the aperture size of the diffusion cap 403 is larger than that of the air delivery pipe 401, so that the output air passage of the air is changed from small to large, further the dynamic pressure of the air is reduced, the static pressure is increased, the diffusion and reaction of the outlet air are facilitated, and meanwhile, the service life of the breathable pipeline is prolonged, and the pipeline is convenient to clean.
It is to be added that an electromagnetic stop valve is installed at the inlet end of the air inlet pipeline 3, and the electromagnetic stop valve is used for effectively controlling the stop air passage and controlling the opening and closing of the air inlet pipeline 3.
Further, in order to guarantee the stability performance of the die, a pressure relief hole communicated with the secondary channel 103 is formed in one side of the shell of the lower die 1 in a penetrating mode, a sealing plug is arranged in the pressure relief hole, sealing plug threads are arranged in the pressure relief hole, and the pressure relief hole is used for discharging redundant gas in the main cavity 102.
The whole gas circuit structure of mould has adopted two parameters of gravity and the pressure of fluid to make gas evenly distributed, simultaneously set up damping diaphragm 1042 to the exhaust hole 104 of every output gas, can adjust the aperture of diaphragm and make output gas homogenization to the oxygen of different concentration, in the gas is carried main cavity 102 by intake pipe 3, in order to make the even follow every exhaust hole 104 output of gas in the mould, gas is through dynamic pressure and static pressure's change, finally make the even stability of gas flow in the output pipe 4, because the gas molecule is weight, and then diffusion cap 403 adopts vertical arrangement, guarantee that only sufficient gas molecule will have corresponding outflow.
Uniform air supply device for vacuum plating of alumina film the air supply uniform device of the embodiment of the invention is applied to a vacuum coating process, as shown in fig. 9, and the area where the evaporation boat is located in fig. 9 is a vacuum coating chamber. The aluminum wires on the aluminum wire tray are sent into a vacuum coating chamber through a wire feeder, heated by a heating electrode and evaporated into an upper vacuum chamber through an evaporation boat, and a cold roller drives a plastic film to pass through the vacuum chamber, so that evaporated aluminum vapor and oxygen input by the air supply uniformity device provided by the invention react to form an aluminum oxide film to be coated on the surface of the plastic film.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present disclosure describes embodiments, not every embodiment is provided with a separate embodiment, and that this description is provided for clarity only, and that the disclosure is not limited to the embodiments described in detail below, and that the embodiments described in the examples may be combined as appropriate to form other embodiments that will be apparent to those skilled in the art.
Claims (5)
1. The utility model provides a even air feeder of vacuum coating alumina membrane, includes bed die (1) and last mould (2), its characterized in that: the utility model provides a recess (101) has been seted up to bed die (1) upper surface, main cavity (102) have been seted up to recess (101) upper surface, go up mould (2) fixed mounting in recess (101) and seal main cavity (102) top, just go up mould (2) top and run through and set up inlet port (201), a plurality of exhaust holes (104) have been seted up near recess (101) edge in bed die (1) casing top, a plurality of all be provided with atmospheric pressure adjustment mechanism in exhaust hole (104), atmospheric pressure adjustment mechanism is used for adjusting the dynamic pressure of the interior gaseous of exhaust hole (104), just recess (101) lateral wall has been seted up second grade passageway (103) with exhaust hole (104) intercommunication, still includes:
an air inlet pipeline (3), wherein the air inlet pipeline (3) is arranged in the air inlet hole (201), and the air inlet pipeline (3) is used for conveying air into the main cavity (102);
the output pipeline (4) is arranged in the exhaust hole (104), and the output pipeline (4) is used for uniformly outputting gas;
the bottom of the exhaust hole (104) is of a conical structure, a through hole (1043) communicated with the secondary channel (103) is formed in the bottom of the conical structure in a penetrating mode, the aperture of the through hole (1043) is smaller than that of the exhaust hole (104), and the aperture of the through hole (1043) is smaller than that of the secondary channel (103);
the air pressure adjusting mechanism comprises a limiting ring (1041) and a damping diaphragm (1042) arranged below the limiting ring (1041), wherein the limiting ring (1041) is installed in the exhaust hole (104) in a threaded mode, a buffer gap is reserved between the limiting ring (1041) and the conical structure, the damping diaphragm (1042) is installed in the buffer gap in a sliding mode, the limiting ring (1041) is installed in the exhaust hole (104) in a threaded mode, the limiting ring (1041) is used for limiting the sliding range of the damping diaphragm (1042), the buffer gap is used for guaranteeing air static pressure, and even output of air is achieved;
the center of the damping diaphragm (1042) is provided with a uniform air hole in a penetrating mode, the outer wall of the damping diaphragm (1042) is tightly attached to the inner wall of the air exhaust hole (104), and when the air pushes the damping diaphragm (1042) to change continuously, the damping diaphragm (1042) slides along the inner wall of the air exhaust hole (104);
the output pipeline (4) comprises a gas pipe (401), a connecting seat (402) is arranged at one end of the gas pipe (401), a diffusion cap (403) is arranged at the other end of the gas pipe (401) in a threaded mode, and the diffusion cap (403) is in a vertical state.
2. The uniform gas supply device for vacuum plating of alumina film according to claim 1, wherein: when the upper die (2) is fixedly arranged in the groove (101), the top of the main cavity (102) is in a sealing state, the air inlet holes (201) are communicated with the main cavity (102), and the air inlet holes (201) are positioned at the center of the top of the main cavity (102).
3. The uniform gas supply device for vacuum plating of alumina film according to claim 1, wherein: the connecting seat (402) is arranged in the exhaust hole (104) in a threaded mode, the aperture size of the gas transmission pipe (401) is the same as that of the pipeline of the connecting seat (402), and the output pipeline (4) is of a Z-shaped structure.
4. The uniform gas supply device for vacuum plating of alumina film according to claim 1, wherein: the aperture size of the diffusion cap (403) is larger than the aperture size of the air delivery pipe (401).
5. The uniform gas supply device for vacuum plating of alumina film according to claim 1, wherein: and one side of the shell of the lower die (1) is penetrated and provided with a pressure relief hole communicated with the secondary channel (103), and a sealing plug is arranged in the pressure relief hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310943157.7A CN116695061B (en) | 2023-07-31 | 2023-07-31 | Uniform air supply device for vacuum plating of alumina film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310943157.7A CN116695061B (en) | 2023-07-31 | 2023-07-31 | Uniform air supply device for vacuum plating of alumina film |
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| CN116695061A CN116695061A (en) | 2023-09-05 |
| CN116695061B true CN116695061B (en) | 2023-11-03 |
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| CN210065897U (en) * | 2019-05-30 | 2020-02-14 | 深圳市创基真空科技有限公司 | Air inlet system of vacuum coating machine |
| CN111424264A (en) * | 2020-04-27 | 2020-07-17 | 深圳市原速光电科技有限公司 | Thin film material deposition reaction device |
| TW202229634A (en) * | 2021-01-22 | 2022-08-01 | 大陸商北京北方華創微電子裝備有限公司 | Gas inlet assembly of process chamber, gas inlet apparatus, and semiconductor processing equipment |
| CN114743903A (en) * | 2022-05-25 | 2022-07-12 | 北京北方华创微电子装备有限公司 | Air inlet device and semiconductor process equipment |
| CN115011933A (en) * | 2022-07-01 | 2022-09-06 | 上海宇泽机电设备有限公司 | Gas supply device and spray module |
| CN116103640A (en) * | 2023-04-07 | 2023-05-12 | 上海陛通半导体能源科技股份有限公司 | ALD reaction cavity device and ALD film plating equipment |
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| CN116695061A (en) | 2023-09-05 |
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