CN218710830U - Air inlet structure of plasma enhanced chemical vapor deposition system - Google Patents
Air inlet structure of plasma enhanced chemical vapor deposition system Download PDFInfo
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- CN218710830U CN218710830U CN202221857637.9U CN202221857637U CN218710830U CN 218710830 U CN218710830 U CN 218710830U CN 202221857637 U CN202221857637 U CN 202221857637U CN 218710830 U CN218710830 U CN 218710830U
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- air inlet
- water faucet
- gondola water
- air
- chemical vapor
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model belongs to the technical field of plasma enhanced chemical vapor deposition, and discloses an air inlet structure of a plasma enhanced chemical vapor deposition system, which comprises a vacuum chamber, a shower head air inlet device, a rotary heating deposition table, an air inlet valve, an air inlet pipe, a vacuum sealing component and an air source; gondola water faucet air inlet unit, rotatory heating deposit platform all set up in the vacuum chamber, gondola water faucet air inlet unit corresponds with rotatory heating deposit platform, the admission valve passes through intake-tube connection with gondola water faucet air inlet unit. The main superiority of this scheme is presented and is adopted the gondola water faucet structure of different aperture constitution bleeder vents, and the diameter size of bleeder vent is directly proportional rather than apart from the distance length of intake pipe (promptly the bleeder vent is more nearly apart from the mouth of pipe of admitting air, and the aperture is less, and gaseous atmospheric pressure reduces and compensaties the effect of air output through the aperture increase, has avoided traditional air inlet structure to lead to the gas field to distribute unevenly, can obtain the fine film of homogeneity.
Description
Technical Field
The utility model relates to a plasma enhanced chemical vapor deposition technical field, more specifically says, relates to a plasma enhanced chemical vapor deposition system's inlet structure.
Background
A plasma enhanced chemical vapor deposition apparatus for performing plasma enhanced chemical vapor deposition generally includes an air inlet structure, a plasma generator, a reaction chamber, an air outlet structure, a control device, and the like.
The existing plasma enhanced chemical vapor deposition air inlet structure mainly adopts a common air inlet pipe diffusion air inlet structure and has the main defects that the air field distribution is not uniform during air inlet, so that the air field of a substrate table is not uniform, and the deposited material is not uniform
SUMMERY OF THE UTILITY MODEL
To the problem that exists among the prior art, the utility model aims to provide a plasma enhanced chemical vapor deposition system's inlet structure.
In order to solve the above problems, the utility model adopts the following technical proposal.
An air inlet structure of a plasma enhanced chemical vapor deposition system comprises a vacuum chamber, a shower head air inlet device, a rotary heating deposition table, an air inlet valve, an air inlet pipe, a vacuum sealing assembly and an air source;
the shower head air inlet device and the rotary heating deposition table are arranged in a vacuum chamber, the shower head air inlet device corresponds to the rotary heating deposition table, the air inlet valve is connected with the shower head air inlet device through an air inlet pipe, the air inlet pipe is fixed on a top plate of the vacuum chamber through a vacuum sealing assembly, and the air inlet pipe is connected with an air source;
the gondola water faucet air inlet unit includes gondola water faucet dish, gondola water faucet orifice plate and a plurality of bleeder vent, the gondola water faucet orifice plate is located the bottom of gondola water faucet dish and corresponds with rotatory heating deposit platform, the bleeder vent is seted up on the gondola water faucet orifice plate, the diameter size of bleeder vent is directly proportional with the distance length of intake pipe.
Compared with the prior art, the utility model has the advantages of:
the main superiority of this scheme is presented and is adopted the gondola water faucet structure of different aperture constitution bleeder vents, and the diameter size of bleeder vent is directly proportional rather than apart from the distance length of intake pipe (promptly the bleeder vent is more nearly apart from the mouth of pipe of admitting air, and the aperture is less, and gaseous atmospheric pressure reduces and compensaties the effect of air output through the aperture increase, has avoided traditional air inlet structure to lead to the gas field to distribute unevenly, can obtain the fine film of homogeneity.
Drawings
Fig. 1 is a schematic structural view of the present invention;
fig. 2 is a schematic structural view of the air holes of the present invention.
The reference numbers in the figures illustrate:
1. a vacuum chamber; 2. a shower air inlet device; 21. a shower tray; 22. a shower orifice plate; 23. air holes are formed; 3. rotating the heating deposition table; 4. an intake valve; 5. an air inlet pipe; 6. a vacuum seal assembly; 7. and (4) a gas source.
Detailed Description
The technical solution in the embodiment of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiment of the present invention;
referring to fig. 1-2, an air inlet structure of a plasma enhanced chemical vapor deposition system includes a vacuum chamber 1, a shower head air inlet device 2, a rotary heating deposition table 3, an air inlet valve 4, an air inlet pipe 5, a vacuum sealing assembly 6, and an air source 7; the sprinkler gas inlet device 2 and the rotary heating deposition table 3 are both arranged in the vacuum chamber 1, the sprinkler gas inlet device 2 corresponds to the rotary heating deposition table 3, the gas inlet valve 4 is connected with the sprinkler gas inlet device 2 through the gas inlet pipe 5, the gas inlet pipe 5 is fixed on a top plate of the vacuum chamber 1 through the vacuum sealing assembly 6, and the gas inlet pipe 5 is connected with the gas source 7; the shower air inlet device 2 comprises a shower tray 21, a shower orifice plate 22 and a plurality of air holes 23, the shower orifice plate 22 is positioned at the bottom of the shower tray 21 and corresponds to the rotary heating deposition table 3, the air holes 23 are formed in the shower orifice plate 22, and the diameter of the air holes 23 is in direct proportion to the distance between the air holes 23 and the air inlet pipe 5 (namely, the closer the distance between the air inlet pipe 5 and the air holes 23 is, the smaller the aperture of the air holes 23 is).
In the structure, when the shower head air inlet device works, the air inlet valve 4 is opened, and working gas (plasma) flows out of the air source 7, enters the shower head disc 21 of the shower head air inlet device 2 through the air inlet valve 4 and the air inlet pipe 5, and then flows out of each air hole 23 of the shower head disc 21;
wherein, the place pressure nearest from intake pipe 5 is the biggest, comes equilibrium gas concentration through reducing the aperture, and the place farthest from intake pipe 5, the partial pressure difference is minimum, comes equilibrium gas field concentration through increasing the aperture, finally realizes through adjusting 23 aperture sizes of bleeder vent that the gas field degree of consistency reaches unanimous effect.
The above description is only the preferred embodiment of the present invention; the scope of the present invention is not limited thereto. Any person skilled in the art should also be able to cover the technical scope of the present invention by replacing or changing the technical solution and the improvement concept of the present invention with equivalents and modifications within the technical scope of the present invention.
Claims (1)
1. A kind of plasma enhances the inlet structure of the chemical vapor deposition system, characterized by that: comprises a vacuum chamber (1), a shower head air inlet device (2), a rotary heating deposition table (3), an air inlet valve (4), an air inlet pipe (5), a vacuum sealing assembly (6) and an air source (7);
the shower head air inlet device (2) and the rotary heating deposition table (3) are arranged in the vacuum chamber (1), the shower head air inlet device (2) corresponds to the rotary heating deposition table (3), the air inlet valve (4) is connected with the shower head air inlet device (2) through an air inlet pipe (5), the air inlet pipe (5) is fixed on a top plate of the vacuum chamber (1) through a vacuum sealing assembly (6), and the air inlet pipe (5) is connected with an air source;
gondola water faucet air inlet unit (2) are including gondola water faucet dish (21), gondola water faucet orifice plate (22) and a plurality of bleeder vent (23), gondola water faucet orifice plate (22) are located the bottom of gondola water faucet dish (21) and correspond with rotatory heating deposit platform (3), bleeder vent (23) are seted up on gondola water faucet orifice plate (22), the diameter size of bleeder vent (23) is directly proportional with the distance length of intake pipe (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221857637.9U CN218710830U (en) | 2022-07-19 | 2022-07-19 | Air inlet structure of plasma enhanced chemical vapor deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221857637.9U CN218710830U (en) | 2022-07-19 | 2022-07-19 | Air inlet structure of plasma enhanced chemical vapor deposition system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218710830U true CN218710830U (en) | 2023-03-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221857637.9U Active CN218710830U (en) | 2022-07-19 | 2022-07-19 | Air inlet structure of plasma enhanced chemical vapor deposition system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218710830U (en) |
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2022
- 2022-07-19 CN CN202221857637.9U patent/CN218710830U/en active Active
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